- All sections
- C - Chemistrymetallurgy
- C08F - Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C08F 20/24 - Esters containing halogen containing perhaloalkyl radicals
Patent holdings for IPC class C08F 20/24
Total number of patents in this class: 54
10-year publication summary
|
4
|
2
|
2
|
3
|
5
|
8
|
3
|
1
|
2
|
1
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Agc, Inc. | 5577 |
6 |
| FUJIFILM Corporation | 30594 |
5 |
| Central Glass Company, Limited | 1297 |
4 |
| Unimatec Co., Ltd. | 235 |
4 |
| Daikin Industries, Ltd. | 10502 |
3 |
| Asahi Glass Company, Limited | 2606 |
2 |
| Cabot Corporation | 542 |
2 |
| Dexerials Corporation | 2001 |
2 |
| Donaldson Company, Inc. | 1608 |
2 |
| Inha-Industry Partnership Institute | 170 |
2 |
| Kyushu University, National University Corporation | 1729 |
2 |
| Jiangsu Favored Nanotechnology Co., LTD | 170 |
2 |
| 3m Innovative Properties Company | 17458 |
1 |
| The Sherwin-Williams Company | 506 |
1 |
| Canon Inc. | 44051 |
1 |
| Intel Corporation | 47178 |
1 |
| Nikon Corporation | 7230 |
1 |
| Sumitomo Chemical Company, Limited | 8968 |
1 |
| Shin-Etsu Chemical Co., Ltd. | 6120 |
1 |
| Daikin America, Inc. | 62 |
1 |
| Other owners | 10 |