- All sections
- C - Chemistrymetallurgy
- C08F - Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C08F 220/16 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
Patent holdings for IPC class C08F 220/16
Total number of patents in this class: 132
10-year publication summary
|
5
|
14
|
27
|
11
|
18
|
8
|
4
|
3
|
6
|
0
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Shin-Etsu Chemical Co., Ltd. | 5486 |
13 |
| FUJIFILM Corporation | 28873 |
10 |
| JSR Corporation | 2485 |
7 |
| Tokyo Ohka Kogyo Co., Ltd. | 1507 |
7 |
| Xerox Corporation | 7063 |
5 |
| Centre National de La Recherche Scientifique | 10163 |
4 |
| Nitto Denko Corporation | 8106 |
4 |
| Ecole Superieure de Physique et de Chimie Industrielles de La Ville de Paris | 326 |
4 |
| LG Chem, Ltd. | 17677 |
3 |
| Sumitomo Chemical Company, Limited | 9004 |
3 |
| Dow Global Technologies LLC | 10206 |
3 |
| DIC Corporation | 3694 |
3 |
| Unilever PLC | 3301 |
2 |
| BASF SE | 20548 |
2 |
| The Sherwin-Williams Company | 559 |
2 |
| Kao Corporation | 4935 |
2 |
| Hoya Corporation | 2742 |
2 |
| Mitsubishi Chemical Corporation | 4458 |
2 |
| Denka Company Limited | 2475 |
2 |
| Kemira Oyj | 1212 |
2 |
| Other owners | 50 |