- All sections
- C - Chemistrymetallurgy
- C08F - Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C08F 222/24 - Esters containing sulfur
Patent holdings for IPC class C08F 222/24
Total number of patents in this class: 57
10-year publication summary
|
8
|
5
|
5
|
2
|
5
|
3
|
6
|
2
|
5
|
6
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 30594 |
15 |
| Shin-Etsu Chemical Co., Ltd. | 6120 |
4 |
| Zeon Corporation | 4161 |
4 |
| Sumitomo Chemical Company, Limited | 8968 |
3 |
| 3m Innovative Properties Company | 17458 |
2 |
| Canon Inc. | 44051 |
2 |
| JSR Corporation | 2552 |
2 |
| Shijiazhuang Chengzhi Yonghua Display Material Co., Ltd. | 205 |
2 |
| Tokyo Ohka Kogyo Co., Ltd. | 1569 |
2 |
| Centre National de La Recherche Scientifique | 11059 |
1 |
| Eastman Kodak Company | 2589 |
1 |
| Samsung SDI Co., Ltd. | 10719 |
1 |
| PPG Industries Ohio, Inc. | 3324 |
1 |
| Mitsui Chemicals, Inc. | 3259 |
1 |
| BL Technologies, Inc. | 839 |
1 |
| e Ink Corporation | 1556 |
1 |
| Ecole Nationale Superieure de Chimie de Montpellier | 236 |
1 |
| Ivoclar Vivadent AG | 1041 |
1 |
| Jiangnan University | 1637 |
1 |
| Rohm and Haas Electronic Materials LLC | 149 |
1 |
| Other owners | 10 |