- All sections
- C - Chemistrymetallurgy
- C08F - Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C08F 224/00 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
Patent holdings for IPC class C08F 224/00
Total number of patents in this class: 192
10-year publication summary
|
29
|
18
|
21
|
6
|
13
|
12
|
9
|
10
|
4
|
1
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Shin-Etsu Chemical Co., Ltd. | 5460 |
23 |
| Tokyo Ohka Kogyo Co., Ltd. | 1504 |
11 |
| FUJIFILM Corporation | 28841 |
10 |
| Sumitomo Chemical Company, Limited | 8997 |
8 |
| Daikin Industries, Ltd. | 9852 |
5 |
| Eastman Kodak Company | 3035 |
4 |
| JSR Corporation | 2476 |
4 |
| Drexel University | 973 |
4 |
| Nissan Chemical Industries, Ltd. | 1756 |
4 |
| BASF SE | 20458 |
3 |
| Asahi Glass Company, Limited | 2876 |
3 |
| Henkel AG & Co. KGaA | 10365 |
3 |
| The United States of America as represented by the Secretary of the Army | 1186 |
3 |
| Construction Research & Technology GmbH | 653 |
3 |
| Kuraray Co., Ltd. | 3468 |
3 |
| 3m Innovative Properties Company | 17976 |
2 |
| Samsung Display Co., Ltd. | 32942 |
2 |
| Xerox Corporation | 7073 |
2 |
| DSM IP Assets B.V. | 5790 |
2 |
| Showa Denko K.K. | 2331 |
2 |
| Other owners | 91 |