- All sections
- C - Chemistry; metallurgy
- C25F - Processes for the electrolytic removal of materials from objects; apparatus therefor
- C25F 3/26 - Polishing of heavy metals of refractory metals
Patent holdings for IPC class C25F 3/26
Total number of patents in this class: 44
10-year publication summary
0
|
2
|
2
|
3
|
1
|
8
|
7
|
7
|
4
|
0
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Consolidated Nuclear Security, LLC | 125 |
3 |
Toshiba Materials Co., Ltd. | 627 |
3 |
Hirtenberger Engineered Surfaces GmbH | 19 |
3 |
BIOTRONIK AG | 404 |
2 |
Faraday Technology, Inc. | 32 |
2 |
Kabushiki Kaisha Toshiba, doing business as Toshiba Corporation | 6218 |
2 |
Centrum Pre Vyuzitie Pokrocilych Materialov Slovenskej Akademie Vied, Verejna Vyskumna Institucia | 5 |
2 |
Ustav Anorganickej Chemie Slovenskej Akademie Vied, Verejna Vyskumna Institucia | 3 |
2 |
Siemens AG | 24575 |
1 |
Honeywell International Inc. | 14009 |
1 |
Abbott Laboratories Vascular Enterprises Limited | 57 |
1 |
Toshiba Corporation | 12022 |
1 |
Koninklijke Philips N.V. | 23916 |
1 |
Brown University | 625 |
1 |
Cilag GmbH International | 5972 |
1 |
City University of Hong Kong | 769 |
1 |
Dong-eui University Industry-Academic Cooperation Foundation | 17 |
1 |
Istituto Nazionale di Fisica Nucleare | 92 |
1 |
Jefferson Science Associates, LLC | 105 |
1 |
MetCon LLC | 3 |
1 |
Other owners | 13 |