- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Patent holdings for IPC class G03F 7/027
Total number of patents in this class: 2528
10-year publication summary
|
150
|
169
|
200
|
211
|
192
|
184
|
209
|
148
|
166
|
155
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 29728 |
571 |
| Toray Industries, Inc. | 7005 |
89 |
| Hitachi Chemical Company, Ltd. | 2327 |
80 |
| LG Chem, Ltd. | 17674 |
68 |
| Resonac Corporation | 2951 |
61 |
| Mitsubishi Chemical Corporation | 4583 |
58 |
| Asahi Kasei Kabushiki Kaisha | 2711 |
57 |
| Taiyo Ink Mfg. Co., Ltd. | 210 |
51 |
| Samsung SDI Co., Ltd. | 8904 |
39 |
| JSR Corporation | 2532 |
38 |
| Boe Technology Group Co., Ltd. | 41733 |
37 |
| Nissan Chemical Corporation | 2084 |
33 |
| Tokyo Ohka Kogyo Co., Ltd. | 1551 |
31 |
| Canon Inc. | 40733 |
29 |
| Sumitomo Chemical Company, Limited | 9089 |
29 |
| DIC Corporation | 3827 |
28 |
| Showa Denko Materials Co., Ltd. | 624 |
27 |
| Taiyo Holdings Co., Ltd. | 289 |
25 |
| Asahi Glass Company, Limited | 2745 |
24 |
| DONGWOO FINE-CHEM Co., Ltd. | 1374 |
24 |
| Other owners | 1129 |