- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Patent holdings for IPC class G03F 7/027
Total number of patents in this class: 2624
10-year publication summary
|
170
|
200
|
212
|
192
|
186
|
213
|
152
|
166
|
173
|
117
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 30512 |
600 |
| Toray Industries, Inc. | 7096 |
92 |
| Hitachi Chemical Company, Ltd. | 2245 |
77 |
| Resonac Corporation | 3516 |
75 |
| Asahi Kasei Kabushiki Kaisha | 2828 |
69 |
| LG Chem, Ltd. | 17921 |
66 |
| Mitsubishi Chemical Corporation | 4721 |
55 |
| Taiyo Ink Mfg. Co., Ltd. | 200 |
48 |
| Samsung SDI Co., Ltd. | 10556 |
46 |
| Boe Technology Group Co., Ltd. | 44004 |
37 |
| JSR Corporation | 2555 |
36 |
| Nissan Chemical Corporation | 2218 |
35 |
| Tokyo Ohka Kogyo Co., Ltd. | 1560 |
32 |
| Canon Inc. | 43768 |
29 |
| Sumitomo Chemical Company, Limited | 8996 |
29 |
| Taiyo Holdings Co., Ltd. | 316 |
29 |
| DIC Corporation | 3961 |
28 |
| Showa Denko Materials Co., Ltd. | 624 |
27 |
| Adeka Corporation | 1376 |
25 |
| DONGWOO FINE-CHEM Co., Ltd. | 1429 |
24 |
| Other owners | 1165 |