- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Patent holdings for IPC class G03F 7/027
Total number of patents in this class: 2669
10-year publication summary
|
170
|
200
|
212
|
192
|
186
|
214
|
153
|
166
|
173
|
169
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 30808 |
616 |
| Toray Industries, Inc. | 7161 |
94 |
| Resonac Corporation | 3761 |
81 |
| Hitachi Chemical Company, Ltd. | 2219 |
76 |
| Asahi Kasei Kabushiki Kaisha | 2875 |
74 |
| LG Chem, Ltd. | 17986 |
67 |
| Mitsubishi Chemical Corporation | 4767 |
55 |
| Samsung SDI Co., Ltd. | 10988 |
48 |
| Taiyo Ink Mfg. Co., Ltd. | 200 |
48 |
| Boe Technology Group Co., Ltd. | 44746 |
37 |
| Nissan Chemical Corporation | 2307 |
36 |
| JSR Corporation | 2562 |
35 |
| Taiyo Holdings Co., Ltd. | 341 |
35 |
| Tokyo Ohka Kogyo Co., Ltd. | 1560 |
32 |
| Canon Inc. | 44490 |
29 |
| Sumitomo Chemical Company, Limited | 8992 |
29 |
| DIC Corporation | 4000 |
28 |
| HD MicroSystems, Ltd. | 72 |
27 |
| Showa Denko Materials Co., Ltd. | 624 |
27 |
| Adeka Corporation | 1389 |
25 |
| Other owners | 1170 |