- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Patent holdings for IPC class G03F 7/027
Total number of patents in this class: 2563
10-year publication summary
|
169
|
200
|
211
|
192
|
184
|
209
|
149
|
166
|
171
|
50
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| FUJIFILM Corporation | 30206 |
589 |
| Toray Industries, Inc. | 7032 |
89 |
| Hitachi Chemical Company, Ltd. | 2279 |
77 |
| Resonac Corporation | 3167 |
68 |
| LG Chem, Ltd. | 17805 |
67 |
| Asahi Kasei Kabushiki Kaisha | 2772 |
61 |
| Mitsubishi Chemical Corporation | 4687 |
58 |
| Taiyo Ink Mfg. Co., Ltd. | 205 |
50 |
| Samsung SDI Co., Ltd. | 9658 |
44 |
| JSR Corporation | 2548 |
38 |
| Boe Technology Group Co., Ltd. | 42854 |
37 |
| Nissan Chemical Corporation | 2145 |
35 |
| Tokyo Ohka Kogyo Co., Ltd. | 1542 |
32 |
| Canon Inc. | 42139 |
29 |
| Sumitomo Chemical Company, Limited | 9046 |
29 |
| DIC Corporation | 3899 |
28 |
| Taiyo Holdings Co., Ltd. | 304 |
27 |
| Showa Denko Materials Co., Ltd. | 624 |
27 |
| DONGWOO FINE-CHEM Co., Ltd. | 1404 |
24 |
| Adeka Corporation | 1367 |
23 |
| Other owners | 1131 |