- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/035 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
Patent holdings for IPC class G03F 7/035
Total number of patents in this class: 111
10-year publication summary
|
10
|
8
|
8
|
6
|
3
|
7
|
5
|
0
|
2
|
3
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Covestro Deutschland AG | 2856 |
25 |
| FUJIFILM Corporation | 30849 |
18 |
| LG Chem, Ltd. | 17997 |
8 |
| Kaneka Corporation | 4841 |
7 |
| Bayer MaterialScience AG | 699 |
6 |
| Eastman Kodak Company | 2562 |
4 |
| Taiyo Ink Mfg. Co., Ltd. | 200 |
4 |
| Bayer Intellectual Property GmbH | 2346 |
3 |
| Taiyo Holdings Co., Ltd. | 341 |
3 |
| Tokyo Ohka Kogyo Co., Ltd. | 1558 |
3 |
| Korea Advanced Institute of Science and Technology | 4736 |
2 |
| Nissan Chemical Industries, Ltd. | 1623 |
2 |
| Toyobo Co., Ltd. | 2570 |
2 |
| META Platforms Technologies, LLC | 6554 |
2 |
| DuPont Electronic Materials International, LLC | 431 |
2 |
| BASF SE | 21334 |
1 |
| Merck Patent GmbH | 5761 |
1 |
| Samsung SDI Co., Ltd. | 11033 |
1 |
| Cheil Industries Inc. | 804 |
1 |
| Nitto Denko Corporation | 8642 |
1 |
| Other owners | 15 |