- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/115 - Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
Patent holdings for IPC class G03F 7/115
Total number of patents in this class: 8
10-year publication summary
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1
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0
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3
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2
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1
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0
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0
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2
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1
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0
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| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| LG Chem, Ltd. | 17701 |
1 |
| FUJIFILM Corporation | 28960 |
1 |
| Shin-Etsu Chemical Co., Ltd. | 5508 |
1 |
| Asahi Kasei Kabushiki Kaisha | 2593 |
1 |
| The Australian National University | 189 |
1 |
| Planxwell Ltd. | 3 |
1 |
| MacDermid Graphics Solutions, LLC | 116 |
1 |
| Resonac Corporation | 2524 |
1 |
| Other owners | 0 |