- All sections
- H - Electricity
- H05H - Plasma technique production of accelerated electrically-charged particles or of neutronsproduction or acceleration of neutral molecular or atomic beams
- H05H 1/26 - Plasma torches
Patent holdings for IPC class H05H 1/26
Total number of patents in this class: 297
10-year publication summary
|
19
|
22
|
23
|
19
|
22
|
23
|
20
|
35
|
20
|
14
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Fuji Corporation | 3647 |
28 |
| Niterra Co., Ltd. | 1401 |
14 |
| 6K Inc | 135 |
9 |
| The ESAB Group, Inc. | 346 |
8 |
| Sekisui Chemical Co., Ltd. | 3614 |
6 |
| Tekna Plasma Systems Inc. | 65 |
6 |
| Oerlikon Metco (US) Inc. | 215 |
5 |
| Pyrogenesis Canada, Inc. | 66 |
5 |
| Agilent Technologies, Inc. | 2634 |
4 |
| General Fusion Inc. | 81 |
4 |
| Hypertherm, Inc. | 680 |
4 |
| Korea Basic Science Institute | 325 |
4 |
| Illinois Tool Works Inc. | 11863 |
3 |
| FUJIFILM Corporation | 30514 |
3 |
| Tokyo Electron Limited | 13807 |
3 |
| Elemental Scientific, Inc. | 292 |
3 |
| Foret Plasma Labs, LLC | 64 |
3 |
| Fuji Machine Mfg. Co., Ltd. | 979 |
3 |
| Kjellberg-stiftung | 73 |
3 |
| Korea Hydro & Nuclear Power Co., Ltd. | 562 |
3 |
| Other owners | 176 |