Shinryo Corporation

Japan

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        Patent 65
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        United States 30
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Date
2024 October 1
2024 6
2023 6
2022 6
2021 4
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IPC Class
C08K 7/06 - Elements 7
B23K 35/26 - Selection of soldering or welding materials proper with the principal constituent melting at less than 400°C 5
A23L 29/20 - Foods or foodstuffs containing additivesPreparation or treatment thereof containing gelling or thickening agents 4
A23L 33/10 - Modifying nutritive qualities of foodsDietetic productsPreparation or treatment thereof using additives 4
A61K 8/19 - Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients 4
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NICE Class
01 - Chemical and biological materials for industrial, scientific and agricultural use 5
03 - Cosmetics and toiletries; cleaning, bleaching, polishing and abrasive preparations 3
05 - Pharmaceutical, veterinary and sanitary products 3
16 - Paper, cardboard and goods made from these materials 3
17 - Rubber and plastic; packing and insulating materials 2
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Status
Pending 8
Registered / In Force 65

1.

BURNING FURNACE, PROCESSING DEVICE, AND BURNING METHOD FOR RESIN-CONTAINING COMPOSITE MATERIAL

      
Application Number JP2024004333
Publication Number 2024/209788
Status In Force
Filing Date 2024-02-08
Publication Date 2024-10-10
Owner SHINRYO CORPORATION (Japan)
Inventor Matsuoka, Daisuke

Abstract

Provided is a burning furnace in which, when a resin-containing composite material, e.g., a solar panel, is heat-treated, the burning-furnace main body is prevented from corroding during thermal recycling and in which device maintenance is easy. Burning furnaces (13, 15) are for pyrolyzing and removing the resin of a resin-containing composite material (3), and have a heating structure for heating the burning furnaces (13, 15) with the heat of a discharge gas from a combustion device (4) in which a pyrolysis gas resulting from the pyrolysis of the resin and discharged from the burning furnaces (13, 15) is burned. The heating structure has indirect heat exchangers (812, 822).

IPC Classes  ?

  • B09B 3/40 - Destroying solid waste or transforming solid waste into something useful or harmless involving thermal treatment, e.g. evaporation
  • F23G 5/46 - Recuperation of heat
  • F27B 9/36 - Arrangements of heating devices
  • B09B 101/15 - Electronic waste

2.

COMBUSTION DEVICE FOR THERMAL DECOMPOSITION GAS FROM RESIN, AND COMBUSTION METHOD

      
Application Number JP2024004331
Publication Number 2024/176860
Status In Force
Filing Date 2024-02-08
Publication Date 2024-08-29
Owner SHINRYO CORPORATION (Japan)
Inventor Matsuoka, Daisuke

Abstract

Provided is a combustion device, etc., with which it is possible to stably obtain an effect for reducing NOx and uncombusted gas contained in a gas after a thermal decomposition gas from a resin is combusted. A combustion device (10) for a thermal decomposition gas from a resin in a resin-containing composite, the combustion device (10) combusting the thermal decomposition gas, which is generated when the resin is thermally decomposed, the combustion device (10) comprising a supply unit (4) that supplies air containing the thermal decomposition gas, and a combustion chamber (5) for the air supplied from the supply unit (4), the supply unit (4) having parallel pipes including a first pipe through which the thermal decomposition gas is channeled and a second pipe through which air is channeled, the parallel pipes having a linking part via which the first and second pipes are linked and which is used for channeling the thermal decomposition gas within the first pipe into the second pipe, the bottom section of the first pipe in the parallel pipes on the combustion-chamber (5) side being closed, and the bottom section of the second pipe on the combustion-chamber (5) side having an opening for supplying the air into the combustion chamber (5).

IPC Classes  ?

  • F23G 7/06 - Methods or apparatus, e.g. incinerators, specially adapted for combustion of specific waste or low grade fuels, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
  • F23D 14/02 - Premix gas burners, i.e. in which gaseous fuel is mixed with combustion air upstream of the combustion zone
  • F23D 14/62 - Mixing devicesMixing tubes
  • F23G 5/027 - Methods or apparatus, e.g. incinerators, specially adapted for combustion of waste or low-grade fuels including pretreatment pyrolising or gasifying

3.

PELLET, MOLDED PRODUCT, AND METHOD FOR PRODUCING PELLET

      
Application Number 18609029
Status Pending
Filing Date 2024-03-19
First Publication Date 2024-08-15
Owner
  • MITSUBISHI CHEMICAL CORPORATION (Japan)
  • SHINRYO CORPORATION (Japan)
Inventor
  • Takashima, Shoichi
  • Sasaka, Ryo

Abstract

To provide a pellet which is formed from a composition comprising 5 to 65 parts by mass of recycled carbon fibers as a heated product of carbon fiber reinforced resin, and 0.05 to 25 parts by mass of a nonmetal salt-based flame retardant, relative to 100 parts by mass of a polycarbonate resin having a terminal hydroxyl group content of 150 to 800 ppm.

IPC Classes  ?

  • B29C 45/00 - Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mouldApparatus therefor
  • B29C 48/00 - Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired formApparatus therefor
  • B29C 48/04 - Particle-shaped
  • B29C 48/285 - Feeding the extrusion material to the extruder
  • B29C 48/88 - Thermal treatment of the stream of extruded material, e.g. cooling
  • B29K 69/00 - Use of polycarbonates as moulding material
  • B29K 105/12 - Condition, form or state of moulded material containing reinforcements, fillers or inserts of short lengths, e.g. chopped filaments, staple fibres or bristles
  • B29K 105/26 - Scrap
  • B29K 307/04 - Carbon
  • C08K 5/5399 - Phosphorus bound to nitrogen
  • C08K 7/06 - Elements

4.

METHOD FOR IMPROVING ADHESION OF YTTRIUM-BASED THIN FILM

      
Application Number 18527081
Status Pending
Filing Date 2023-12-01
First Publication Date 2024-07-11
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Yanai, Yuriko
  • Ozaki, Yoshitaka
  • Matsumura, Tomohiro

Abstract

A method for more easily improving adhesion of an yttrium-based thin film to an aluminum substrate in a coated aluminum member having the yttrium-based thin film formed on the aluminum substrate is provided. A method for improving adhesion of an yttrium-based thin film to an aluminum substrate in a coated aluminum member having the yttrium-based thin film formed on the aluminum substrate comprises a BHF treatment step of bringing a surface of the yttrium-based thin film into contact with a buffered hydrofluoric acid solution.

IPC Classes  ?

5.

PELLET, MOLDED PRODUCT, AND METHOD FOR PRODUCING PELLET

      
Application Number 18609036
Status Pending
Filing Date 2024-03-19
First Publication Date 2024-07-04
Owner
  • MITSUBISHI CHEMICAL CORPORATION (Japan)
  • SHINRYO CORPORATION (Japan)
Inventor
  • Takashima, Shoichi
  • Sasaka, Ryo

Abstract

To provide a pellet formed from a composition comprising 5 to 65 parts by mass of recycled carbon fibers as a heated product of carbon fiber reinforced resin, and 0.01 to 0.30 parts by mass of a metal salt-based flame retardant, relative to 100 parts by mass of a polycarbonate resin.

IPC Classes  ?

  • C08K 5/42 - Sulfonic acidsDerivatives thereof
  • C08J 3/20 - Compounding polymers with additives, e.g. colouring
  • C08J 5/04 - Reinforcing macromolecular compounds with loose or coherent fibrous material
  • C08K 7/06 - Elements

6.

RESIN COMPOSITION, PELLET AND MOLDED ARTICLE

      
Application Number 18609014
Status Pending
Filing Date 2024-03-19
First Publication Date 2024-07-04
Owner
  • MITSUBISHI CHEMICAL CORPORATION (Japan)
  • SHINRYO CORPORATION (Japan)
Inventor
  • Takashima, Shoichi
  • Muto, Fumihiro
  • Arita, Hiroyuki
  • Sasaka, Ryo
  • Suzuki, Takayuki

Abstract

To provide a resin composition, a pellet and a molded article formed from the resin composition. The resin composition contains: 100 parts by mass of a thermoplastic resin; 5 to 50 parts by mass of a recycled carbon fiber; and 5 to 60 parts by mass of a flame retardant; wherein the recycled carbon fiber is a baked product of a composite of a resin and a carbon fiber, and comprises a residue derived from the resin at a percentage of 108 by mass or more of the content of the recycled carbon fiber.

IPC Classes  ?

  • C08K 13/08 - Ingredients of unknown constitution and ingredients covered by the main groups
  • C08L 67/02 - Polyesters derived from dicarboxylic acids and dihydroxy compounds
  • C08K 3/22 - OxidesHydroxides of metals
  • C08K 5/136 - Phenols containing halogens
  • C08K 5/3492 - Triazines
  • C08K 5/5313 - Phosphinic compounds, e.g. R2=P(:O)OR'
  • C08K 9/04 - Ingredients treated with organic substances
  • C08K 9/08 - Ingredients agglomerated by treatment with a binding agent

7.

LOW MELTING-POINT BONDING MEMBER, METHOD FOR PRODUCING SAME, SEMICONDUCTOR ELECTRONIC CIRCUIT, AND METHOD FOR MOUNTING SAID SEMICONDUCTOR ELECTRONIC CIRCUIT

      
Application Number 18043854
Status Pending
Filing Date 2021-08-27
First Publication Date 2023-11-02
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Nishi, Hirotoshi
  • Sawai, Takeshi
  • Shirokawa, Kenichirou
  • Omae, Souichirou

Abstract

A low melting-point bonding member includes a low melting-point alloy containing Bi: 46 mass % or more and 72 mass % or less, In: 26 mass % or more and 54 mass % or less, and Sn: 2 mass % or less when a total amount of Bi, In, and Sn is 100 mass % and having a melting point of 86 to 111° C. A method for producing a low melting-point bonding member, including a plating step of performing a plating process including at least Bi plating and In plating and forming, on an object to be plated, a plating layer containing Bi: 46 mass % or more and 72 mass % or less, In: 26 mass % or more and 54 mass % or less, and Sn: 2 mass % or less when a total amount of Bi, In, and Sn is 100 mass %.

IPC Classes  ?

  • B23K 35/26 - Selection of soldering or welding materials proper with the principal constituent melting at less than 400°C
  • C22C 12/00 - Alloys based on antimony or bismuth
  • C22C 28/00 - Alloys based on a metal not provided for in groups
  • B23K 1/00 - Soldering, e.g. brazing, or unsoldering
  • H05K 3/34 - Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering

8.

RESIN COMPOSITION, PELLET AND MOLDED ARTICLE, AND PROCESS FOR PRODUCING RESIN COMPOSITION

      
Application Number 18327471
Status Pending
Filing Date 2023-06-01
First Publication Date 2023-09-28
Owner
  • MITSUBISHI CHEMICAL CORPORATION (Japan)
  • SHINRYO CORPORATION (Japan)
Inventor
  • Takashima, Shoichi
  • Muto, Fumihiro
  • Suzuki, Takayuki
  • Arita, Hiroyuki

Abstract

Provided is a resin composition contains, with respect to 100 parts by mass of a thermoplastic resin, 10 to 70 parts by mass of a recycled carbon fiber; and 0.1 to 15 parts by mass of a functional group-containing compound; wherein the recycled carbon fiber is a baked product of a composite of an epoxy resin and a carbon fiber, and comprises 5% by mass or more of a residue derived from the epoxy resin; and an ISO multi-purpose test specimen with a thickness of 4 mm obtained by molding the resin composition has a maximum flexural strength of 130 MPa or more in accordance with ISO 178.

IPC Classes  ?

9.

RESIN COMPOSITION, PELLETS AND MOLDED ARTICLE

      
Application Number JP2022042606
Publication Number 2023/090374
Status In Force
Filing Date 2022-11-16
Publication Date 2023-05-25
Owner
  • MITSUBISHI ENGINEERING-PLASTICS CORPORATION (Japan)
  • SHINRYO CORPORATION (Japan)
Inventor
  • Takashima Shoichi
  • Muto Fumihiro
  • Arita Hiroyuki
  • Sasaka Ryo
  • Suzuki Takayuki

Abstract

This resin composition obtained using a crystalline thermoplastic resin and regenerated carbon fibers, ensures sufficient mechanical strength and exhibits excellent productivity and flame resistance. A molded article and pellets formed from the resin composition contain 100 parts by mass of the provided thermoplastic resin, 5-50 parts by mass of regenerated carbon fibers, and 5-60 parts by mass of flame retardant. The regenerated carbon fibers are a baked product of a composite material comprising resin and carbon fibers, and contain a resin-derived residue that comprises at least 10 mass% of the regenerated fibers.

IPC Classes  ?

  • C08L 101/00 - Compositions of unspecified macromolecular compounds
  • C08K 3/11 - Compounds containing metals of Groups 4 to 10 or of Groups 14 to 16 of the Periodic Table
  • C08K 5/1515 - Three-membered rings
  • C08K 7/06 - Elements
  • C08L 63/00 - Compositions of epoxy resinsCompositions of derivatives of epoxy resins
  • C08L 67/02 - Polyesters derived from dicarboxylic acids and dihydroxy compounds

10.

PELLETS, MOLDED PRODUCT, AND PELLET MANUFACTURING METHOD

      
Application Number JP2022041640
Publication Number 2023/085298
Status In Force
Filing Date 2022-11-09
Publication Date 2023-05-19
Owner
  • MITSUBISHI ENGINEERING-PLASTICS CORPORATION (Japan)
  • SHINRYO CORPORATION (Japan)
Inventor
  • Takashima Shoichi
  • Sasaka Ryo

Abstract

Provided are: pellets that make it possible to provide a molded product that contains a polycarbonate resin and recycled carbon fibers, that has a mechanical strength close to the case in which the same quantity of virgin carbon fibers are contained therein, and that exhibits excellent flame resistance; a molded product; and a pellet manufacturing method. The pellets are formed from a composition containing 5-65 parts by mass of the recycled carbon fibers, which are the heated product of a carbon fiber-reinforced resin, and 0.05-25 parts by mass of a non-metallic salt-based flame retardant per 100 parts by mass of the polycarbonate resin, which has a terminal hydroxyl group content of 150-800 ppm.

IPC Classes  ?

  • C08L 69/00 - Compositions of polycarbonatesCompositions of derivatives of polycarbonates
  • B29C 70/40 - Shaping or impregnating by compression
  • C08J 5/06 - Reinforcing macromolecular compounds with loose or coherent fibrous material using pretreated fibrous materials
  • C08K 3/04 - Carbon
  • C08K 5/521 - Esters of phosphoric acids, e.g. of H3PO4
  • C08K 7/06 - Elements

11.

PELLETS, MOLDED ARTICLE, AND METHOD FOR PRODUCING PELLETS

      
Application Number JP2022041639
Publication Number 2023/085297
Status In Force
Filing Date 2022-11-09
Publication Date 2023-05-19
Owner
  • MITSUBISHI ENGINEERING-PLASTICS CORPORATION (Japan)
  • SHINRYO CORPORATION (Japan)
Inventor
  • Takashima Shoichi
  • Sasaka Ryo

Abstract

Provided are: pellets capable of providing a molded article which comprises a polycarbonate resin and recycled carbon fibers and which has mechanical strength close to that of molded articles containing virgin carbon fibers in the same amount and has excellent flame retardancy; the molded article; and a method for producing the pellets. The pellets are ones formed from a composition comprising 100 parts by mass of a polycarbonate resin, 5-65 parts by mass of recycled carbon fibers obtained by heating a carbon-fiber-reinforced resin, and 0.01-0.30 parts by mass of a metal salt flame retardant.

IPC Classes  ?

  • C08J 3/12 - Powdering or granulating
  • B29B 9/14 - Making granules characterised by structure or composition fibre-reinforced
  • C08K 3/04 - Carbon
  • C08K 5/42 - Sulfonic acidsDerivatives thereof
  • C08K 7/06 - Elements
  • C08L 69/00 - Compositions of polycarbonatesCompositions of derivatives of polycarbonates

12.

METHOD FOR PRODUCING RECLAIMED CARBON FIBERS

      
Application Number JP2022032798
Publication Number 2023/037943
Status In Force
Filing Date 2022-08-31
Publication Date 2023-03-16
Owner
  • MITSUBISHI CHEMICAL CORPORATION (Japan)
  • SHINRYO CORPORATION (Japan)
Inventor
  • Ikeda Masashi
  • Saitoh Hiroshi

Abstract

The present invention provides a technique which can be advantageously used when producing reclaimed short carbon fibers suitable for use as a reinforcement material for FRPs, by removing the resin matrix through pyrolysis from either a carbon-fiber prepreg that may be a CFSMC or a CFRP that may be a cured CFSMC. This method for producing regenerated carbon fibers comprises: subjecting a CFSMC or a cured CFSMC to a primary heat treatment to obtain a carbon-fiber mass having a structure in which a plurality of carbon fibers are bound to each other by a pyrolysis product of the heat-curing resin; and sandwiching the object to be treated, which comprises the carbon-fiber mass, between a first gas-permeable sheet and a second gas-permeable sheet and subjecting it to a secondary heat treatment in an oxidizing atmosphere to thereby remove the pyrolysis product of the heat-curing resin from the object.

IPC Classes  ?

  • C08J 11/12 - Recovery or working-up of waste materials of polymers by chemically breaking down the molecular chains of polymers or breaking of crosslinks, e.g. devulcanisation by dry-heat treatment only

13.

SN-BI-IN-BASED LOW MELTING-POINT JOINING MEMBER, PRODUCTION METHOD THEREFOR, SEMICONDUCTOR ELECTRONIC CIRCUIT, AND MOUNTING METHOD THEREFOR

      
Application Number 17641568
Status Pending
Filing Date 2020-09-04
First Publication Date 2022-12-15
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Nishi, Hirotoshi
  • Sawai, Takeshi
  • Shirokawa, Kenichirou
  • Omae, Souichirou

Abstract

Provided are a Sn—Bi—In-based low melting-point joining member used in a Pb-free electroconductive joining method in mounting a semiconductor component, and is usable for low-temperature joining, and a manufacturing method therefor. Provided are a Sn—Bi—In-based low melting-point joining member used in a Pb-free electroconductive joining method in mounting a semiconductor component, and is usable for low-temperature joining, and a manufacturing method therefor. A Sn—Bi—In-based low melting-point joining member, including a Sn—Bi—In alloy that has a composition within a range represented by a quadrangle in a Sn—Bi—In ternary phase diagram, a first quadrangle having four vertices including: Point 1 (1, 69, 30), Point 2 (26, 52, 22), Point 3 (40, 10, 50), and Point 4 (1, 25, 74), where Point (x, y, z) is defined as a point of x mass % Sn, y mass % Bi and z mass % In, and that also has a melting point of 60 to 110° C. As well as a method for producing a Sn—Bi—In-based low melting-point joining member, including a plating step of forming a plated laminate on an object to be plated, the plated laminate including a laminated plating layer obtained by performing Sn plating, Bi plating, and In plating respectively such that the laminated plating layer has a composition within the range represented by the first quadrangle.

IPC Classes  ?

  • B23K 35/26 - Selection of soldering or welding materials proper with the principal constituent melting at less than 400°C
  • H01L 23/00 - Details of semiconductor or other solid state devices
  • C22C 13/02 - Alloys based on tin with antimony or bismuth as the next major constituent
  • B23K 1/00 - Soldering, e.g. brazing, or unsoldering

14.

METHOD FOR IMPROVING ADHESION OF YTTRIUM-BASED THIN FILM

      
Application Number JP2022022659
Publication Number 2022/259983
Status In Force
Filing Date 2022-06-03
Publication Date 2022-12-15
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Yanai, Yuriko
  • Ozaki, Yoshitaka
  • Matsumura, Tomohiro

Abstract

Provided is a method for improving the adhesion of a yttrium-based thin film, the method making it possible to more easily improve the adhesion of a yttrium-based thin film to an aluminum base material of a coated aluminum member in which the yttrium-based thin film is formed on the aluminum base material. Provided is a method for improving the adhesion of a yttrium-based thin film to an aluminum base material of a coated aluminum member in which a yttrium-based thin film is formed on the aluminum base material, wherein said method for improving the adhesion of a yttrium-based thin film has a BHF treatment step for bringing a buffered hydrofluoric acid solution into contact with the surface of the yttrium-based thin film.

IPC Classes  ?

15.

RESIN COMPOSITION, PELLET, MOLDED ARTICLE AND METHOD FOR PRODUCING RESIN COMPOSITION

      
Application Number JP2021045107
Publication Number 2022/124332
Status In Force
Filing Date 2021-12-08
Publication Date 2022-06-16
Owner
  • MITSUBISHI ENGINEERING-PLASTICS CORPORATION (Japan)
  • SHINRYO CORPORATION (Japan)
Inventor
  • Takashima Shoichi
  • Muto Fumihiro
  • Suzuki Takayuki
  • Arita Hiroyuki

Abstract

Provided is a resin composition obtained using a thermoplastic resin and regenerated carbon fibers, the resin composition exhibiting improved mechanical strength and excellent productivity. The present invention also provides: a pellet and molded article formed from the resin composition; and a method for producing the resin composition. Relative to 100 parts by mass of a thermoplastic resin, this resin composition contains 10-70 parts by mass of regenerated carbon fibers and 0.1-15 parts by mass of a functional group-containing compound. The regenerated carbon fibers: are obtained by firing a composite material of an epoxy resin and carbon fibers; and contain 5 mass% or more of a residue derived from the epoxy resin. When the resin composition is formed into an ISO multipurpose test piece having a thickness of 4 mm, the maximum bending strength thereof is 130 MPa or more.

IPC Classes  ?

  • C08K 7/04 - Fibres or whiskers inorganic
  • C08L 67/02 - Polyesters derived from dicarboxylic acids and dihydroxy compounds
  • C08L 101/00 - Compositions of unspecified macromolecular compounds
  • C08L 63/00 - Compositions of epoxy resinsCompositions of derivatives of epoxy resins

16.

Washing method of semiconductor manufacturing device component having gas holes

      
Application Number 17577461
Grant Number 11753714
Status In Force
Filing Date 2022-01-18
First Publication Date 2022-05-05
Grant Date 2023-09-12
Owner Shinryo Corporation (Japan)
Inventor
  • Matsumura, Tomohiro
  • Matsumoto, Akihiro

Abstract

A method for cleaning a semiconductor fabrication equipment part having gas holes used in single-wafer type semiconductor fabrication equipment for processing semiconductor wafers, wherein the semiconductor fabrication equipment part having gas holes is formed of aluminum or an aluminum alloy, and has a distribution plate having a plurality of gas holes, the method including: a step (1) of scanning a gas injection surface of the distribution plate, which is a surface facing the wafer, with a laser beam; and a step (2) of bringing the gas injection surface and insides of the gas holes into contact with a cleaning liquid containing an inorganic acid.

IPC Classes  ?

  • B08B 7/00 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass
  • C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • B08B 3/08 - Cleaning involving contact with liquid the liquid having chemical or dissolving effect
  • C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

17.

LOW MELTING-POINT BONDING MEMBER, METHOD FOR PRODUCING SAME, SEMICONDUCTOR ELECTRONIC CIRCUIT, AND METHOD FOR MOUNTING SAID SEMICONDUCTOR ELECTRONIC CIRCUIT

      
Application Number JP2021031505
Publication Number 2022/050185
Status In Force
Filing Date 2021-08-27
Publication Date 2022-03-10
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Nishi, Hirotoshi
  • Sawai, Takeshi
  • Shirokawa, Kenichirou
  • Omae, Souichirou

Abstract

The present invention provides: a low melting-point bonding member which is used in a Pb-free electroconductive bonding method for the mounting of a semiconductor component, and which enables low-temperature bonding; and a method for producing this low melting-point bonding member. A low melting-point bonding member which contains a low melting-point alloy that contains, if the total of Bi, In and Sn is taken as 100% by mass, from 46% by mass to 72% by mass of Bi, from 26% by mass to 54% by mass of In and 2% by mass or less of Sn, while having a melting point of from 86°C to 111°C. A method for producing a low melting-point bonding member, said method comprising a plating step wherein a plating treatment including at least Bi plating and In plating is carried out so as to form a plating layer, which contains, if the total of Bi, In and Sn is taken as 100% by mass, from 46% by mass to 72% by mass of Bi, from 26% by mass to 54% by mass of In and 2% by mass or less of Sn, on a material to be plated.

IPC Classes  ?

  • C22C 12/00 - Alloys based on antimony or bismuth
  • C22C 28/00 - Alloys based on a metal not provided for in groups
  • B23K 35/26 - Selection of soldering or welding materials proper with the principal constituent melting at less than 400°C
  • H05K 3/34 - Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering

18.

SN-IN-BASED LOW MELTING-POINT JOINING MEMBER, PRODUCTION METHOD THEREFOR, SEMICONDUCTOR ELECTRONIC CIRCUIT, AND MOUNTING METHOD THEREFOR

      
Application Number JP2021031507
Publication Number 2022/050186
Status In Force
Filing Date 2021-08-27
Publication Date 2022-03-10
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Nishi, Hirotoshi
  • Sawai, Takeshi
  • Shirokawa, Kenichirou
  • Omae, Souichirou

Abstract

Provided are: a Sn-In-based low melting-point joining member that is used in a Pb-free conductive joining method when mounting a semiconductor component and that is usable in low-temperature joining; and a method for producing same. This method is for producing a Sn-In-based low melting-point joining member, the method comprising a plating step for forming, on a to-be-plated object, a laminate plating layer containing 46-51 mass% of Sn and 49-54 mass% of In when the total of Sn and In is 100 mass%, by performing a process of forming a plating at least including a Sn plating and an In plating. The present invention pertains to: a Sn-In-based low melting-point joining member having a laminate plating layer that includes a SnIn layer containing Sn and In and that contains, when the total of Sn and In is 100 mass%, 46-51 mass% of Sn and 49-54 mass% of In; and a Sn-In-based low melting-point joining member obtained by heating said joining member.

IPC Classes  ?

  • C22C 13/00 - Alloys based on tin
  • C22C 28/00 - Alloys based on a metal not provided for in groups
  • B23K 35/14 - Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape not specially designed for use as electrodes for soldering
  • B23K 35/26 - Selection of soldering or welding materials proper with the principal constituent melting at less than 400°C
  • H01L 21/60 - Attaching leads or other conductive members, to be used for carrying current to or from the device in operation

19.

COMPOSITION, PELLET, MOLDED PRODUCT AND COMPOSITION PRODUCTION METHOD

      
Application Number JP2021017374
Publication Number 2021/230132
Status In Force
Filing Date 2021-05-06
Publication Date 2021-11-18
Owner
  • MITSUBISHI ENGINEERING-PLASTICS CORPORATION (Japan)
  • SHINRYO CORPORATION (Japan)
Inventor
  • Nishino Yohei
  • Takada Seiichi
  • Arita Hiroyuki

Abstract

A composition is provided which contains a polycarbonate resin and recycled carbon fibers and which has mechanical strength as close as possible to the case of adding virgin carbon fibers; a pellet, a molded product and a composition production method are also provided. This composition contains 5-65 parts by mass of the recycled carbon fibers, which are the heated product of a carbon fiber reinforced resin, per 100 parts by mass of the polycarbonate resin, which has a terminal hydroxyl group content of 150-800 ppm.

IPC Classes  ?

  • C08G 64/04 - Aromatic polycarbonates
  • C08J 3/20 - Compounding polymers with additives, e.g. colouring
  • C08J 11/12 - Recovery or working-up of waste materials of polymers by chemically breaking down the molecular chains of polymers or breaking of crosslinks, e.g. devulcanisation by dry-heat treatment only
  • C08K 7/06 - Elements
  • C08L 69/00 - Compositions of polycarbonatesCompositions of derivatives of polycarbonates

20.

Shinryo Healthcare

      
Application Number 1588919
Status Registered
Filing Date 2020-12-28
Registration Date 2020-12-28
Owner SHINRYO CORPORATION (Japan)
NICE Classes  ?
  • 03 - Cosmetics and toiletries; cleaning, bleaching, polishing and abrasive preparations
  • 05 - Pharmaceutical, veterinary and sanitary products
  • 16 - Paper, cardboard and goods made from these materials

Goods & Services

Cosmetics; cosmetic creams; hair creams; skin creams; soaps; non-medicated soaps; cosmetic soaps; hair shampoo; hair conditioners; hair treatment preparations; dentifrices; toothpaste; perfumery; incense. Pharmaceutical preparations; antivirals; antiviral spray; towels of paper impregnated with antivirals; dietary supplements; nutritional supplements; lacteal flour for babies; dietetic beverages adapted for medical purposes; dietetic foods adapted for medical purposes; beverages for babies; food for babies. Hygienic hand towels of paper; towels of paper.

21.

SN-BI-IN-BASED LOW MELTING-POINT JOINING MEMBER, PRODUCTION METHOD THEREFOR, SEMICONDUCTOR ELECTRONIC CIRCUIT, AND MOUNTING METHOD THEREFOR

      
Application Number JP2020033647
Publication Number 2021/049437
Status In Force
Filing Date 2020-09-04
Publication Date 2021-03-18
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Nishi, Hirotoshi
  • Sawai, Takeshi
  • Shirokawa, Kenichirou
  • Omae, Souichirou

Abstract

Provided are an Sn-Bi-In-based low melting-point joining member used in a Pb-free electroconductive joining method in mounting a semiconductor component and usable for low-temperature joining, and a production method therefor. The Sn-Bi-In-based low melting-point joining member contains an Sn-Bi-In alloy that is rated for 60 to 110°C. If, in an Sn-Bi-In ternary phase diagram, a point is noted (x, y, z) where Sn amounts to x% by mass, Bi amounts to y% by mass, and In amounts to z% by mass, the alloy has a composition falling within the limits of a first quadrangle having four points as vertices: point 1 (1, 69, 30), point 2 (26, 52, 22), point 3 (40, 10, 50), and point 4 (1, 25, 74). In addition, the production method for the Sn-Bi-In-based low melting-point joining member has a plating step for forming, over an object to be plated, a plating layered object containing a layered plating layer obtained by performing Sn-plating, Bi-plating, and In-plating, respectively, in such a manner as to yield the composition falling within the limits of the first quadrangle.

IPC Classes  ?

  • B23K 1/00 - Soldering, e.g. brazing, or unsoldering
  • C22C 12/00 - Alloys based on antimony or bismuth
  • C22C 28/00 - Alloys based on a metal not provided for in groups
  • C22C 30/04 - Alloys containing less than 50% by weight of each constituent containing tin or lead
  • B23K 35/26 - Selection of soldering or welding materials proper with the principal constituent melting at less than 400°C

22.

WASHING METHOD OF SEMICONDUCTOR MANUFACTURING DEVICE COMPONENT HAVING GAS HOLES

      
Application Number JP2020032168
Publication Number 2021/039838
Status In Force
Filing Date 2020-08-26
Publication Date 2021-03-04
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Matsumura Tomohiro
  • Matsumoto Akihiro

Abstract

In this method of washing a semiconductor manufacturing device component having gas holes used in a single-wafer semiconductor manufacturing device for processing semiconductor wafers, the semiconductor manufacturing device component having gas holes is provided with a dispersion plate which is formed from aluminum or an aluminum alloy and which has a plurality of gas holes, and involves a step (1) for scanning a laser beam on the gas injection surface, which is the surface of the dispersion plate facing the wafer, and a step (2) for bringing the gas injection surface and the inside of the gas holes into contact with a cleaning liquid that contains an inorganic acid.

IPC Classes  ?

  • B08B 3/04 - Cleaning involving contact with liquid
  • B08B 7/00 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass
  • H01L 21/3065 - Plasma etchingReactive-ion etching
  • H01L 21/31 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to form insulating layers thereon, e.g. for masking or by using photolithographic techniquesAfter-treatment of these layersSelection of materials for these layers
  • C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

23.

SHINRYO HEALTHCARE

      
Application Number 210316900
Status Registered
Filing Date 2020-12-28
Registration Date 2023-12-29
Owner SHINRYO CORPORATION (Japan)
NICE Classes  ?
  • 03 - Cosmetics and toiletries; cleaning, bleaching, polishing and abrasive preparations
  • 05 - Pharmaceutical, veterinary and sanitary products
  • 16 - Paper, cardboard and goods made from these materials

Goods & Services

(1) Cosmetics; cosmetic creams; hair creams; skin creams; soaps, namely body soaps, facial soaps, cosmetic soaps and perfumed soaps; hair shampoo; hair conditioners; non-medicated hair treatment preparations for cosmetic purposes; dentifrices; toothpaste; perfumery; incense. (2) Towels of paper impregnated with antivirals; dietary supplements for general health and well-being; lacteal flour for babies; beverages for babies; food for babies. (3) Hygienic hand towels of paper; towels of paper. (4) Antivirals; antiviral spray.

24.

SHINRYO HEALTHCARE

      
Serial Number 79309879
Status Registered
Filing Date 2020-12-28
Registration Date 2022-03-15
Owner SHINRYO CORPORATION (Japan)
NICE Classes  ?
  • 03 - Cosmetics and toiletries; cleaning, bleaching, polishing and abrasive preparations
  • 05 - Pharmaceutical, veterinary and sanitary products
  • 16 - Paper, cardboard and goods made from these materials

Goods & Services

Cosmetics; cosmetic creams; hair creams; skin creams; non-medicated soaps; cosmetic soaps; hair shampoo; hair conditioners; non-medicated hair treatment preparations for cosmetic purposes; dentifrices; toothpaste; perfumery; incense Antivirals; antiviral spray; towels of paper impregnated with antivirals; dietary supplements; nutritional supplements; lacteal flour for babies; dietetic beverages adapted for medical purposes; dietetic foods adapted for medical purposes; beverages for babies; food for babies Hygienic hand towels of paper; towels of paper

25.

reCina

      
Application Number 1546457
Status Registered
Filing Date 2020-06-12
Registration Date 2020-06-12
Owner SHINRYO CORPORATION (Japan)
NICE Classes  ?
  • 01 - Chemical and biological materials for industrial, scientific and agricultural use
  • 17 - Rubber and plastic; packing and insulating materials
  • 22 - Rope, netting, tents, awnings, sails and sacks; padding and stuffing materials
  • 23 - Yarns and threads for textile use
  • 24 - Textiles and textile goods

Goods & Services

Unprocessed synthetic resins in the form of pellets; unsaturated polyester resins; unprocessed plastics; industrial chemicals. Carbon fibers, not for textile use; regenerated fibers, not for textile use; synthetic fibers, not for textile use; chemical fibers, not for textile use; carbon fiber thread, not for textile use; regenerated fiber thread, not for textile use; synthetic fiber thread, not for textile use; threads of rubber, other than for textile use; covered rubber threads, other than for textile use; chemical fiber thread, not for textile use; polyester sheeting; polyester sheet material; semi-processed plastic substances in the form of pellets; plastic substances, semi-processed. Carbon fibers for textile use; regenerated fibers for textile use; raw textile fibers. Carbon fiber thread and yarn for textile use; regenerated fiber thread and yarn for textile use; thread. Non-woven textile fabrics; felt; fabrics for textile use.

26.

RECINA

      
Serial Number 79292023
Status Registered
Filing Date 2020-06-12
Registration Date 2021-07-20
Owner SHINRYO CORPORATION (Japan)
NICE Classes  ?
  • 01 - Chemical and biological materials for industrial, scientific and agricultural use
  • 17 - Rubber and plastic; packing and insulating materials
  • 22 - Rope, netting, tents, awnings, sails and sacks; padding and stuffing materials
  • 23 - Yarns and threads for textile use
  • 24 - Textiles and textile goods

Goods & Services

Unprocessed synthetic resins in the form of pellets; unprocessed, unsaturated polyester resins; unprocessed plastics; industrial chemicals Carbon fibers, not for textile use; regenerated fibers, not for textile use; synthetic fibers, not for textile use, namely, synthetic fibers for use in the reinforcement of plastics; chemical fibers, not for textile use; carbon fiber thread, not for textile use; regenerated fiber thread, not for textile use; synthetic fiber thread, not for textile use; threads of rubber, other than for textile use; covered rubber threads, other than for textile use; chemical fiber thread, not for textile use; polyester sheeting for use in the manufacture of antistatic sheets and panels, light-blocking and blackout sheets and panels, thermal collector and heat-collecting sheets and panels; polyester sheet material for use in the manufacture of antistatic sheets and panels, light-blocking and blackout sheets and panels, thermal collector and heat-collecting sheets and panels; semi-processed plastic substances in the form of pellets; plastic substances, semi-processed Carbon fibers for textile use; regenerated fibers for textile use; raw textile fibers Carbon fiber thread and yarn for textile use; regenerated fiber thread and yarn for textile use; thread Non-woven textile fabrics; felt; fabrics for textile use

27.

Method of producing reclaimed carbon fiber bundles, reclaimed carbon fibers, or reclaimed milled carbon fibers, device for producing reclaimed carbon fiber bundles, method of producing carbon fiber reinforced resin, and reclaimed carbon fiber bundles

      
Application Number 16682279
Grant Number 11359060
Status In Force
Filing Date 2019-11-13
First Publication Date 2020-03-12
Grant Date 2022-06-14
Owner Shinryo Corporation (Japan)
Inventor
  • Toyoshima, Hirokazu
  • Takeda, Tooru
  • Hara, Takahisa
  • Masuda, Koujirou
  • Yamaguchi, Yasuo
  • Nakamura, Masatoshi
  • Maruta, Yousuke
  • Satou, Masaki

Abstract

There are provided a method of producing reclaimed carbon fibers in which, even if a carbon fiber reinforced resin is not heated at 800° C. or higher, pieces of carbon fiber base material that are contained in the carbon fiber reinforced resin can be directly collected, and the variation in the resin residue content in the collected pieces of carbon fiber base material can be reduced, a device for producing reclaimed carbon fibers that can be used in the production method, and a method of producing a carbon fiber reinforced resin in which reclaimed carbon fibers can be effectively used. A method of producing reclaimed carbon fiber bundles which is a method of obtaining pieces of carbon fiber base material as reclaimed carbon fiber bundles from a carbon fiber reinforced resin (100) containing a plurality of sheet-like pieces of carbon fiber base material and a matrix resin, including heating the carbon fiber reinforced resin (100) and thermally decomposing the matrix resin to obtain a heat-treated product (102); and crushing the heat-treated product (102) and separating the plurality of pieces of carbon fiber base material into individual reclaimed carbon fiber bundles.

IPC Classes  ?

  • C08J 5/04 - Reinforcing macromolecular compounds with loose or coherent fibrous material
  • B29B 17/04 - Disintegrating plastics
  • B29K 105/06 - Condition, form or state of moulded material containing reinforcements, fillers or inserts
  • B29K 307/04 - Carbon

28.

METHOD FOR PRODUCING HYDROGEN GAS-CONTAINING MATERIAL AND DEVICE FOR PRODUCING HYDROGEN GAS-CONTAINING MATERIAL

      
Application Number 16474315
Status Pending
Filing Date 2018-01-09
First Publication Date 2019-11-07
Owner Shinryo Corporation (Japan)
Inventor
  • Toyonaga, Ken
  • Shibahara, Yuu
  • Inoue, Kazumi
  • Suetsugu, Yukihito
  • Nishio, Daisuke
  • Toyoshima, Hirokazu
  • Takeda, Tooru

Abstract

There are provided a method for producing a hydrogen gas-containing material in which higher safety than in a production method of the related art is secured and which is simple and has high production efficiency, and a method for producing a hydrogen gas-containing material and a device for producing a hydrogen gas-containing material in which it is possible to prevent nitrogen gas from being mixed into the hydrogen gas-containing material produced by the production method and it is easy to control an amount of hydrogen contained in the hydrogen gas-containing material. As one aspect, there is provided a method for producing a hydrogen gas-containing material including mixing a liquid composition containing a gelling agent or a thickener and a liquid medium with hydrogen gas in a line mixer (20) and cooling the liquid composition containing hydrogen gas in a liquid-transfer pipe (22) connected to the line mixer (20) and causing the liquid composition containing hydrogen gas to gel or thicken.

IPC Classes  ?

  • A23L 29/20 - Foods or foodstuffs containing additivesPreparation or treatment thereof containing gelling or thickening agents
  • A23L 33/10 - Modifying nutritive qualities of foodsDietetic productsPreparation or treatment thereof using additives

29.

CREAM AND MANUFACTURING METHOD THEREFOR

      
Application Number JP2018036288
Publication Number 2019/069811
Status In Force
Filing Date 2018-09-28
Publication Date 2019-04-11
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Shibahara Yuu
  • Toyonaga Ken
  • Nishio Daisuke
  • Toyoshima Hirokazu
  • Takeda Tooru

Abstract

Provided are: a cream that contains a high percentage of hydrogen gas and has few harmful effects on the skin; and a manufacturing method therefor. The cream according to the present invention is one in which bubble-state hydrogen gas is incorporated into a composition that comprises a fatty acid salt having 10 or more carbon atoms, a fatty acid having 10 or more carbon atoms, and a liquid medium, wherein the content percentage of the bubble-state hydrogen gas with respect to the cream is 0.1-100 vol% [v/w]. The cream manufacturing method according to the present invention comprises: preparing a composition that comprises a fatty acid salt having 10 or more carbon atoms, a fatty acid having 10 or more carbon atoms, and a liquid medium; incorporating bubble-state hydrogen gas into the composition; and increasing the viscosity of the composition containing the bubble-state hydrogen gas.

IPC Classes  ?

  • A61K 8/19 - Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
  • A61K 8/04 - DispersionsEmulsions
  • A61K 8/36 - Carboxylic acidsSalts or anhydrides thereof
  • A61Q 19/08 - Anti-ageing preparations

30.

METHOD FOR PRODUCING SHIKIMIC ACID

      
Application Number JP2018031182
Publication Number 2019/039553
Status In Force
Filing Date 2018-08-23
Publication Date 2019-02-28
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Utsumi, Kazuo
  • Nakamura, Yasushi
  • Toyoshima, Hirokazu
  • Takeda, Tooru

Abstract

Provided is a method for producing shikimic acid, by which shikimic acid is able to be obtained with high yield. A method for producing shikimic acid, which comprises a step for collecting shikimic acid from a solution that contains shikimic acid, and which is characterized in that the step for collecting shikimic acid comprises a step (P1) wherein the solution that contains shikimic acid is treated with a hydrophobic synthetic adsorbent, thereby obtaining a treated solution, and a step (P2) wherein a fractionation containing shikimic acid is obtained from a treated solution, which has been subjected to at least the step (P1), by means of ion exchange chromatography using an amphoteric ion exchange resin.

IPC Classes  ?

  • C07C 51/47 - SeparationPurificationStabilisationUse of additives by solid-liquid treatmentSeparationPurificationStabilisationUse of additives by chemisorption
  • C07C 62/32 - Unsaturated compounds containing hydroxy or O-metal groups

31.

JELLY, JELLY IN CONTAINER, AND METHOD FOR PRODUCING JELLY

      
Application Number JP2018027869
Publication Number 2019/022126
Status In Force
Filing Date 2018-07-25
Publication Date 2019-01-31
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Inoue Kazumi
  • Toyonaga Ken
  • Nishio Daisuke
  • Toyoshima Hirokazu
  • Takeda Tooru

Abstract

Provided are: a jelly having a high hydrogen gas content; a jelly in a container; and a method for producing jelly having a high hydrogen gas content. This jelly includes: a jelly main body which includes water, a thickening polysaccharide, and a foamable protein; and hydrogen gas in a bubble state which is contained in the jelly main body. Also provided is a jelly in a container obtained by filling a container 10 with the jelly. Furthermore, provided is a method for producing jelly which includes: a step (I) in which a jelly starting material including water, a thickening polysaccharide, and a foamable protein is prepared; a step (II) in which the jelly starting material is made to contain hydrogen gas in a bubble state; and a step (III) in which the jelly starting material containing the hydrogen gas in the bubble state is cooled and gelatinized to obtain a jelly containing the hydrogen gas in the bubble state.

IPC Classes  ?

  • A23L 29/20 - Foods or foodstuffs containing additivesPreparation or treatment thereof containing gelling or thickening agents
  • A23L 29/256 - Foods or foodstuffs containing additivesPreparation or treatment thereof containing gelling or thickening agents of vegetable origin from seaweeds, e.g. alginates, agar or carrageenan
  • A23L 29/269 - Foods or foodstuffs containing additivesPreparation or treatment thereof containing gelling or thickening agents of microbial origin, e.g. xanthan or dextran
  • A23L 29/281 - Proteins, e.g. gelatin or collagen

32.

GUMMY, GUMMY IN CONTAINER, AND METHOD FOR PRODUCING GUMMY

      
Application Number JP2018028084
Publication Number 2019/022197
Status In Force
Filing Date 2018-07-26
Publication Date 2019-01-31
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Inoue Kazumi
  • Nishio Daisuke
  • Toyoshima Hirokazu
  • Takeda Tooru

Abstract

Provided is a hydrogen gas-containing gummy from which a large amount of hydrogen gas is released in the mouth by increasing the frequency of mastication. This gummy includes a gummy main body having a moisture content of 6-30 mass%, and hydrogen gas in a bubble state. It is preferable that the content of hydrogen gas in the bubble state in the gummy be 0.1-70 vol% [v/w].

IPC Classes  ?

  • A23G 3/34 - Sweetmeats, confectionery or marzipanProcesses for the preparation thereof
  • A23G 3/52 - Aerated, foamed, cellular or porous products
  • A23L 29/281 - Proteins, e.g. gelatin or collagen
  • A23L 33/16 - Inorganic salts, minerals or trace elements

33.

Gas-containing base material and manufacturing method therefor

      
Application Number 16149449
Grant Number 10905635
Status In Force
Filing Date 2018-10-02
First Publication Date 2019-01-31
Grant Date 2021-02-02
Owner Shinryo Corporation (Japan)
Inventor
  • Takeda, Tooru
  • Toyoshima, Hirokazu
  • Sawai, Takeshi
  • Inoue, Kazumi

Abstract

A gas-containing base material including a functional-gas-containing composition, where the composition is a gel-like composition having a gelation temperature in a range of 0.5° C. or higher and 65° C. or lower at which a liquid form is able to be changed to a solid form by cooling, and where the composition contains an amount of a bubble state functional gas which exceeds a saturated solubility when the composition is in a liquid form.

IPC Classes  ?

  • A61K 8/02 - Cosmetics or similar toiletry preparations characterised by special physical form
  • B01F 5/16 - Turbo-mixers
  • B01F 5/06 - Mixers in which the components are pressed together through slits, orifices, or screens
  • A23L 33/10 - Modifying nutritive qualities of foodsDietetic productsPreparation or treatment thereof using additives
  • A61K 9/00 - Medicinal preparations characterised by special physical form
  • A61K 47/42 - ProteinsPolypeptidesDegradation products thereofDerivatives thereof, e.g. albumin, gelatin or zein
  • A61K 47/02 - Inorganic compounds
  • A61K 47/36 - PolysaccharidesDerivatives thereof, e.g. gums, starch, alginate, dextrin, hyaluronic acid, chitosan, inulin, agar or pectin
  • A61K 8/19 - Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
  • A61K 8/73 - Polysaccharides
  • A61K 8/65 - CollagenGelatinKeratinDerivatives or degradation products thereof
  • B01J 13/00 - Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided forMaking microcapsules or microballoons
  • A23P 30/40 - Foaming or whipping
  • A61Q 19/00 - Preparations for care of the skin

34.

METHODS FOR PRODUCING REGENERATED CARBON FIBER BUNDLES, REGENERATED CARBON FIBERS AND REGENERATED MILLED CARBON FIBERS, APPARATUS FOR PRODUCING REGENERATED CARBON FIBER BUNDLES, METHOD FOR PRODUCING CARBON FIBER-REINFORCED RESIN, AND REGENERATED CARBON FIBER BUNDLES

      
Application Number JP2018017784
Publication Number 2018/212016
Status In Force
Filing Date 2018-05-08
Publication Date 2018-11-22
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Toyoshima Hirokazu
  • Takeda Tooru
  • Hara Takahisa
  • Masuda Koujirou
  • Yamaguchi Yasuo
  • Nakamura Masatoshi
  • Maruta Yousuke
  • Satou Masaki

Abstract

Provided are: a method for producing regenerated carbon fibers, whereby it becomes possible to collect a carbon fiber base material in the state as contained in a carbon fiber-reinforced resin without needing to heat the carbon fiber-reinforced resin at 800°C or higher and it also becomes possible to reduce the variation in resin residue content in the collected carbon fiber base material; an apparatus for producing regenerated carbon fibers, which can be utilized for the aforementioned production method; and a method for producing a carbon fiber-reinforced resin, in which regenerated carbon fibers can be used effectively. A method for producing regenerated carbon fiber bundles, which can obtain multiple sheet-like carbon fiber base materials in the form of regenerated carbon fiber bundles from a carbon fiber-reinforced resin (100) containing the carbon fiber base materials and a matrix resin, said method including: heating the carbon fiber-reinforced resin (100) to thermally decompose the matrix resin, thereby obtaining a heat-treated product (102); and disintegrating the heat-treated product (102) to separate the multiple carbon fiber base materials into individual regenerated carbon fiber bundles.

IPC Classes  ?

  • C08J 11/12 - Recovery or working-up of waste materials of polymers by chemically breaking down the molecular chains of polymers or breaking of crosslinks, e.g. devulcanisation by dry-heat treatment only
  • B29B 17/04 - Disintegrating plastics
  • C08J 5/04 - Reinforcing macromolecular compounds with loose or coherent fibrous material

35.

HYDROGEN GAS-CONTAINING GEL, AND FOOD AND COSMETIC CONTAINING SAME

      
Application Number JP2017047223
Publication Number 2018/131505
Status In Force
Filing Date 2017-12-28
Publication Date 2018-07-19
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Shibahara Yuu
  • Toyonaga Ken
  • Inoue Kazumi
  • Suetsugu Yukihito
  • Nishio Daisuke
  • Toyoshima Hirokazu
  • Takeda Tooru

Abstract

Provided are: a hydrogen gas-containing gel from which hydrogen gas does not easily escape during storage even when hydrogen gas is contained in a high concentration; and a food and a cosmetic containing the hydrogen gas-containing gel. The hydrogen gas-containing gel includes a gel, hydrogen gas dissolved in the gel, and bubble hydrogen gas contained in the gel, wherein the content of the bubble hydrogen gas in the hydrogen gas-containing gel is 0.1-70 vol% (v/w), and the gel melting temperature of the gel is 40°C or higher, or the gel does not have a gel melting temperature.

IPC Classes  ?

  • A23L 29/20 - Foods or foodstuffs containing additivesPreparation or treatment thereof containing gelling or thickening agents
  • A23L 9/10 - PuddingsDry powder puddings
  • A61K 8/19 - Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
  • A61Q 5/02 - Preparations for cleaning the hair
  • A61Q 9/02 - Shaving preparations
  • A61Q 19/00 - Preparations for care of the skin
  • A61Q 19/10 - Washing or bathing preparations

36.

HYDROGEN GAS INHALATOR AND HYDROGEN GAS INHALATION METHOD

      
Application Number JP2018000004
Publication Number 2018/131526
Status In Force
Filing Date 2018-01-04
Publication Date 2018-07-19
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Toyoshima Hirokazu
  • Toyonaga Ken
  • Shibahara Yuu
  • Inoue Kazumi
  • Suetsugu Yukihito
  • Nishio Daisuke
  • Takeda Tooru

Abstract

Provided is a hydrogen gas inhalator and a hydrogen gas inhalation method that allow easy inhalation of a sufficient amount of hydrogen gas into the body. A hydrogen gas inhalator (1) comprises a hydrogen gas-containing material (10), an aluminum pouch (12) (container) housing the hydrogen gas-containing material (10), and a mask (14) (inhalator) enabling inhalation of hydrogen gas generated from the hydrogen gas-containing material (10) inside the aluminum pouch (12). The hydrogen gas-containing material (10) includes: hydrogen gas dissolved in a base material that includes a liquid solvent; and hydrogen gas in the form of gas bubbles contained in the base material. The content ratio of hydrogen gas in the form of gas bubbles in the hydrogen gas-containing material (10) is 0.1 to 70 vol% [v/w].

IPC Classes  ?

  • A61M 15/02 - Inhalators with activated or ionized gasesOzone-inhalators
  • A61M 16/10 - Preparation of respiratory gases or vapours
  • C01B 3/00 - HydrogenGaseous mixtures containing hydrogenSeparation of hydrogen from mixtures containing itPurification of hydrogen
  • A61M 16/06 - Respiratory or anaesthetic masks

37.

METHOD FOR PRODUCING HYDROGEN GAS-CONTAINING MATERIAL AND DEVICE FOR PRODUCING HYDROGEN GAS-CONTAINING MATERIAL

      
Application Number JP2018000168
Publication Number 2018/131559
Status In Force
Filing Date 2018-01-09
Publication Date 2018-07-19
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Toyonaga Ken
  • Shibahara Yuu
  • Inoue Kazumi
  • Suetsugu Yukihito
  • Nishio Daisuke
  • Toyoshima Hirokazu
  • Takeda Tooru

Abstract

Provided is a method for producing a hydrogen gas-containing material, the method ensuring higher safety than conventional production methods, being simple, and exhibiting high efficiency in production, wherein comingling of nitrogen gas into the hydrogen gas-containing material produced in this production method can be prevented, and the amount of hydrogen to be contained in the hydrogen gas-containing material is easy to adjust. Also provided is a device for producing hydrogen gas-containing material. In one embodiment, provided is a method for producing a hydrogen gas-containing material, the method comprising: mixing, in a line mixer 20, hydrogen gas and a liquid composition that includes a gelling agent or a thickener and a liquid solvent; cooling down, in a liquid-transfer piping 22 connected to the line mixer 20, the liquid composition including hydrogen gas; and gelling or thickening the liquid composition including hydrogen gas.

IPC Classes  ?

  • A23L 29/20 - Foods or foodstuffs containing additivesPreparation or treatment thereof containing gelling or thickening agents
  • A23L 5/00 - Preparation or treatment of foods or foodstuffs, in generalFood or foodstuffs obtained therebyMaterials therefor
  • A23L 33/10 - Modifying nutritive qualities of foodsDietetic productsPreparation or treatment thereof using additives
  • A61K 8/81 - Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds

38.

SHEET FOR SKIN

      
Application Number JP2017047291
Publication Number 2018/128167
Status In Force
Filing Date 2017-12-28
Publication Date 2018-07-12
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Inoue Kazumi
  • Shibahara Yuu
  • Toyonaga Ken
  • Suetsugu Yukihito
  • Nishio Daisuke
  • Toyoshima Hirokazu
  • Takeda Tooru

Abstract

Provided is a sheet which is for skin and is capable of supplying a greater quantity of hydrogen gas to skin compared to a conventional sheet for skin. This sheet (1) for skin has a hydrogen gas-containing layer (10), the hydrogen gas-containing layer (10) comprising: hydrogen gas dissolved in a base material (12) including a liquid medium; and hydrogen gas (14) in a bubble state included in the base material (12). In the hydrogen gas-containing layer (10), the content of the hydrogen gas (14) in a bubble state is 0.1-70 volume% [v/w].

IPC Classes  ?

  • A61K 8/19 - Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
  • A45D 44/22 - Face shaping devices, e.g. chin strapsWrinkle removers, e.g. stretching the skin
  • A61K 8/02 - Cosmetics or similar toiletry preparations characterised by special physical form
  • A61Q 19/00 - Preparations for care of the skin

39.

GAS-CONTAINING BASE MATERIAL AND MANUFACTURING METHOD THEREFOR

      
Application Number JP2017014987
Publication Number 2017/179621
Status In Force
Filing Date 2017-04-12
Publication Date 2017-10-19
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Takeda Tooru
  • Toyoshima Hirokazu
  • Sawai Takeshi
  • Inoue Kazumi

Abstract

Provided are a gas-containing base material capable of containing and holding a functional gas in high concentrations, and a manufacturing method therefor. The manufacturing method for a gas-containing base material comprising a functional gas-containing composition has the following steps. Step (1): A step for supplying a functional gas while maintaining a feedstock composition that can assume a solid form from a liquid form by cooling and has a gelling temperature in the range of 0.5°C to 65°C at a temperature at which said feedstock composition is in a liquid form and evenly dispersing the functional gas as microbubbles in an amount exceeding the saturated solubility for the feedstock composition in the liquid state. Step (2): A step for transferring, filling and sealing the liquid feedstock composition obtained, in which functional gas microbubbles have been dispersed, in a filling container. Step (3): A step for cooling the obtained liquid feedstock composition, which is inside the sealed filling container and in which microbubbles of the functional gas have been dispersed, to the gelling temperature of the feedstock composition or below, and solidifying.

IPC Classes  ?

  • B01J 13/00 - Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided forMaking microcapsules or microballoons
  • A23L 29/231 - PectinDerivatives thereof
  • A23L 29/244 - Foods or foodstuffs containing additivesPreparation or treatment thereof containing gelling or thickening agents of vegetable origin from corms, tubers or roots, e.g. glucomannan
  • A23L 29/256 - Foods or foodstuffs containing additivesPreparation or treatment thereof containing gelling or thickening agents of vegetable origin from seaweeds, e.g. alginates, agar or carrageenan
  • A23L 29/269 - Foods or foodstuffs containing additivesPreparation or treatment thereof containing gelling or thickening agents of microbial origin, e.g. xanthan or dextran
  • A23L 29/281 - Proteins, e.g. gelatin or collagen
  • A23L 33/10 - Modifying nutritive qualities of foodsDietetic productsPreparation or treatment thereof using additives
  • A61K 8/02 - Cosmetics or similar toiletry preparations characterised by special physical form
  • A61Q 19/00 - Preparations for care of the skin
  • B01F 3/04 - Mixing, e.g. dispersing, emulsifying, according to the phases to be mixed gases or vapours with liquids

40.

Sealing material for solar cell and crosslinking aid

      
Application Number 14782132
Grant Number 09527983
Status In Force
Filing Date 2014-05-19
First Publication Date 2016-03-10
Grant Date 2016-12-27
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Yamaura, Mabuko
  • Orikasa, Yukio
  • Senzaki, Kazuya

Abstract

The present invention provides a sealing material for a solar cell used in a solar power generation system having a system voltage of 600 V or more. The sealing material is constituted of a heat-crosslinking resin composition comprising an ethylene copolymer, a crosslinking agent and a crosslinking aid that comprises a polyfunctional monomer having 4 or more (meth)acryloyl groups in combination with triallyl isocyanurate.

IPC Classes  ?

41.

Crosslinking resin composition and sealing material

      
Application Number 14768098
Grant Number 09932471
Status In Force
Filing Date 2014-02-21
First Publication Date 2015-12-31
Grant Date 2018-04-03
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Yamaura, Mabuko
  • Orikasa, Yukio
  • Senzaki, Kazuya

Abstract

The present invention provides a crosslinking resin composition comprising an ethylene copolymer and a crosslinking aid, in which the crosslinked product of the resin composition has excellent insulation properties (volume resistivity value). The present invention provides a heat-crosslinking resin composition comprising an ethylene copolymer, a crosslinking agent and a urethane poly(meth)acrylate as a crosslinking aid, and (2) a radiation-crosslinking resin composition comprising an ethylene copolymer and a urethane poly(meth)acrylate as a crosslinking aid.

IPC Classes  ?

  • H01L 31/048 - Encapsulation of modules
  • C08L 31/04 - Homopolymers or copolymers of vinyl acetate
  • C09K 3/10 - Materials not provided for elsewhere for sealing or packing joints or covers
  • C08F 299/06 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
  • C08K 5/00 - Use of organic ingredients
  • C09J 123/08 - Copolymers of ethene

42.

Crosslinking aid and practical application thereof

      
Application Number 14767678
Grant Number 09428672
Status In Force
Filing Date 2014-02-21
First Publication Date 2015-12-10
Grant Date 2016-08-30
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Yamaura, Mabuko
  • Orikasa, Yukio
  • Senzaki, Kazuya

Abstract

The present invention provides a crosslinking aid comprising triallyl isocyanurate (TAIC), which serves for obtaining an adhesive resin exhibiting excellent insulation properties while maintaining good transparency, adhesive properties, heat resistance and flexibility of conventional crosslinked ethylene-vinyl acetate copolymers. The crosslinking aid of the present invention comprises a urethane poly(meth)acrylate in combination with triallyl isocyanurate.

IPC Classes  ?

  • C08J 3/24 - Crosslinking, e.g. vulcanising, of macromolecules
  • C09J 123/08 - Copolymers of ethene
  • C09J 131/04 - Homopolymers or copolymers of vinyl acetate
  • C08K 5/3492 - Triazines
  • C09J 123/36 - Adhesives based on homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bondAdhesives based on derivatives of such polymers modified by chemical after-treatment by reaction with nitrogen-containing compounds, e.g. by nitration
  • C08K 5/20 - Carboxylic acid amides
  • H01L 31/048 - Encapsulation of modules

43.

ALDEHYDE REMOVING AGENT, ALDEHYDE REMOVING APPARATUS, AND METHOD FOR OPERATING ALDEHYDE REMOVING APPARATUS

      
Application Number JP2011073933
Publication Number 2013/057791
Status In Force
Filing Date 2011-10-18
Publication Date 2013-04-25
Owner Shinryo Corporation (Japan)
Inventor
  • Maeda, Yasuhiro
  • Tang, Huaipeng

Abstract

The present invention is an aldehyde removing agent which contains an amino acid, an alkaline salt, an antioxidant and a chelating agent. The present invention is also an aldehyde removing apparatus which is configured of an aldehyde removing unit and a remover liquid supplying unit and removes an aldehyde using an aqueous solution of the aldehyde removing agent. The aldehyde removing unit comprises a dustproof filter, an aldehyde removing section, a blower, and a drain-up pump; and the remover liquid supplying unit comprises a retainer tank, a valve for switching flow channels, a pump for remover liquid transportation, and a pure water supplying device.

IPC Classes  ?

  • A61L 9/01 - Deodorant compositions
  • A61L 9/16 - Disinfection, sterilisation or deodorisation of air using physical phenomena
  • B01D 53/14 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by absorption

44.

Triazine derivatives and application thereof

      
Application Number 13579376
Grant Number 08987383
Status In Force
Filing Date 2011-02-03
First Publication Date 2013-01-24
Grant Date 2015-03-24
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Yamaura, Mabuko
  • Orikasa, Yukio
  • Senzaki, Kazuya
  • Kagawa, Takashi

Abstract

The object of the present invention is to provide a novel triazine derivative which is excellent in the heat resistance and rapid in the cross-linking rate, and can be suitably used as a crosslinking agent. The present invention relates to a triazine derivative represented by the general formula (I). (In the formula (I), Y and X are each independently, represents a diallylamino group, mono-allylamino group, allyloxy group or methallyloxy group; and Z represents an allyloxy group or methallyloxy group).

IPC Classes  ?

  • C07D 251/46 - One nitrogen atom with oxygen or sulfur atoms attached to the two other ring carbon atoms
  • C07D 251/26 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms
  • C07D 251/52 - Two nitrogen atoms with an oxygen or sulfur atom attached to the third ring carbon atom
  • C08K 5/3492 - Triazines
  • C08C 19/22 - Incorporating nitrogen atoms into the molecule
  • C07D 251/40 - Nitrogen atoms
  • C08C 19/28 - Reaction with compounds containing carbon-to-carbon unsaturated bonds
  • C07D 251/70 - Other substituted melamines
  • C07D 251/30 - Only oxygen atoms
  • C08K 5/00 - Use of organic ingredients
  • C08L 23/08 - Copolymers of ethene

45.

WAFER SEPARATION DEVICE

      
Application Number JP2012062519
Publication Number 2012/172911
Status In Force
Filing Date 2012-05-16
Publication Date 2012-12-20
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Kayahashi, Masashi
  • Yasaka, Hideaki
  • Uryu, Hirokazu

Abstract

Provided is a wafer separation device with which it is possible to separate, one by one, wafers (W) that are formed by slicing an ingot and to easily and uniformly clean the front and back surfaces of the wafers. The separation device (2) includes: a holder (20) that holds wafers formed by slicing an ingot, which is bonded to a support base (C) with an adhesive, into rectangular slices that include a portion of the support base, the holder holding the wafers in a state where the wafers are suspended from the support base; and a separation hand (22) for separating the wafers at the portion of the support base by suctionally attaching to the wafers one by one.

IPC Classes  ?

  • H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
  • B08B 3/04 - Cleaning involving contact with liquid
  • B65G 49/07 - Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for semiconductor wafers
  • H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting

46.

METHOD AND DEVICE FOR PRODUCING WAFER

      
Application Number JP2012062518
Publication Number 2012/172910
Status In Force
Filing Date 2012-05-16
Publication Date 2012-12-20
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Kayahashi, Masashi
  • Yasaka, Hideaki
  • Uryu, Hirokazu

Abstract

Provided are a method and a device for producing wafers, with which it is possible to separate, one by one, wafers that are formed by slicing an ingot and to easily and uniformly clean the front and back surfaces of the wafers. Wafers (W) are formed by slicing an ingot, which is bonded to a support base with an adhesive, into rectangular slices that include a portion of the support base, and the wafers (W) are separated one by one at the portion of the support base by a separation device (2). The front and back surfaces of the separated wafers (W) are cleaned one by one by a cleaning device (3), and the wafers (W) are immersed in a stripping tank (5), whereby the cut pieces of the support base and the adhesive are stripped from the wafers (W).

IPC Classes  ?

  • H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting

47.

Coating solution for heat-sensitive color-developing layer, and heat-sensitive recording material

      
Application Number 13262701
Grant Number 08470735
Status In Force
Filing Date 2010-04-02
First Publication Date 2012-06-21
Grant Date 2013-06-25
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Aosaki, Yoshimune
  • Kaneko, Mai
  • Ohse, Katsuto
  • Sato, Yukiko

Abstract

Provided are a coating solution for a thermosensitive color developing layer of excellent storability wherein color development during its storage or during producing a thermal recording material is suppressed, and a thermal recording material with excellent print portion (image portion) storability and suppressed staining in the background color (white background). A coating solution for a thermosensitive color developing layer, which comprises a colorless or pale-colored electron-donating leuco dye, a hindered phenol compound and, as an electron-accepting developer, a diphenylsulfone derivative represented by the following formula (1): wherein the aforementioned hindered phenol compound has an average particle size (D50) of not more than 0.5 μm, and the coating solution has a color tone a* of not less than −4.0 as measured according to JIS Z 8729 and a whiteness W of not less than 62 as measured according to JIS Z 8715.

IPC Classes  ?

48.

Triallyl isocyanurate, triallyl cyanurate and process for producing triallyl isocyanurate

      
Application Number 13287270
Grant Number 08431697
Status In Force
Filing Date 2011-11-02
First Publication Date 2012-04-19
Grant Date 2013-04-30
Owner SHINRYO CORPORATION (Japan)
Inventor Yamaura, Mabuko

Abstract

The present invention provides triallyl isocyanurate comprising a less amount of corrosive substances by identifying the corrosive substances among impurities included in the triallyl isocyanurate. Triallyl isocyanurate of the present invention comprises an organic chlorine compound represented by the following general formula (I) in an amount of not more than 100 ppm: 2 is a chlorine atom.

IPC Classes  ?

  • C07D 251/34 - Cyanuric or isocyanuric esters
  • C07D 251/26 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms
  • C07D 239/30 - Halogen atoms or nitro radicals
  • C07D 239/34 - One oxygen atom

49.

Triallyl isocyanurate and process for producing the same

      
Application Number 13287275
Grant Number 08674092
Status In Force
Filing Date 2011-11-02
First Publication Date 2012-04-19
Grant Date 2014-03-18
Owner SHINRYO CORPORATION (Japan)
Inventor Yamaura, Mabuko

Abstract

The present invention provides triallyl isocyanurate comprising a less amount of corrosive substances by identifying the corrosive substances among impurities included in the triallyl isocyanurate. Triallyl isocyanurate of the present invention comprises an organic chlorine compound represented by the following chemical formula (I) in an amount of not more than 500 ppm: wherein a bond expressed by a wavy line indicates that the organic chlorine compound is a cis-type compound, a trans-type compound or a mixture comprising the cis-type and trans-type compounds at an optional ratio.

IPC Classes  ?

  • C07D 251/34 - Cyanuric or isocyanuric esters
  • C07D 251/26 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms

50.

Method of storing triallyl isocyanurate

      
Application Number 13287283
Grant Number 08691984
Status In Force
Filing Date 2011-11-02
First Publication Date 2012-04-19
Grant Date 2014-04-08
Owner SHINRYO CORPORATION (Japan)
Inventor Yamaura, Mabuko

Abstract

The present invention provides a method of storing TAIC in which TAIC is prevented from suffering from freezing and solidification during storage thereof in the winter season. In the method of the present invention, the triallyl isocyanurate is mixed with a silane coupling agent to prepare a composition comprising both thereof, and the resulting composition is stored. In the preferred embodiment of the present invention, the silane coupling agent is used in an amount of 5 to 30% by weight based on the weight of the triallyl isocyanurate, and γ-methacryloxypropyl trimethoxysilane is used as the silane coupling agent.

IPC Classes  ?

  • C07D 251/34 - Cyanuric or isocyanuric esters
  • C07D 251/26 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms
  • C07D 239/30 - Halogen atoms or nitro radicals
  • C07D 239/34 - One oxygen atom
  • C08F 26/06 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
  • C08K 5/3492 - Triazines

51.

Adhesive resin composition and bonding method

      
Application Number 13267066
Grant Number 08430990
Status In Force
Filing Date 2011-10-06
First Publication Date 2012-02-02
Grant Date 2013-04-30
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Yamauchi, Satoshi
  • Kaneko, Yoshiko
  • Kujira, Katsufumi
  • Sakamoto, Shouji

Abstract

The present invention relates to an inexpensive adhesive resin composition which is applicable even to a base material having a poor bonding property. The adhesive resin composition comprises (A) a polymer having no radical-polymerizable double bond and (B) a radical generating agent in which the radical generating agent (B) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). In the preferred embodiment of the present invention, the adhesive resin composition further comprises (C) a radical-polymerizable monomer wherein the monomer (C) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). The radical-polymerizable monomer (C) is a glycidyl group-containing monomer, and the glycidyl group-containing monomer is 4-hydroxybutyl acrylate glycidyl ether.

IPC Classes  ?

  • B05D 5/10 - Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an adhesive surface
  • H05H 1/24 - Generating plasma
  • C09J 175/08 - Polyurethanes from polyethers
  • C09J 175/06 - Polyurethanes from polyesters
  • C09J 163/00 - Adhesives based on epoxy resinsAdhesives based on derivatives of epoxy resins
  • C09J 133/02 - Homopolymers or copolymers of acidsMetal or ammonium salts thereof

52.

ETCHING SOLUTION, AND METHOD FOR PROCESSING SURFACE OF SILICON SUBSTRATE

      
Application Number JP2011061293
Publication Number 2011/145604
Status In Force
Filing Date 2011-05-17
Publication Date 2011-11-24
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Sawai, Takeshi
  • Ishikawa, Makoto
  • Shirahama, Toshiki
  • Otsubo, Hiroshi

Abstract

Disclosed is an etching solution which enables the formation of a silicon substrate having fine pyramid-like depressions and protrusions (a textured structure) in a steady manner without requiring the use of any conventional etching inhibitor such as isopropyl alcohol. Specifically disclosed is an etching solution in which a silicon substrate is to be immersed to form pyramid-like depressions and protrusions on the surface of the substrate, and which is characterized by comprising at least one component selected from compounds (A) each represented by general formula (1) and alkali salts thereof and an alkali hydroxide (B) at a concentration of 0.1 to 30 wt% inclusive. (In the formula, R represents one of an alkyl group, an alkenyl group and an alkynyl group each having 4 to 15 inclusive of carbon atoms; and X represents a sulfonic acid group.) By using the etching solution, it becomes possible to form a fine textured structure on the surface of a silicon substrate.

IPC Classes  ?

  • H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching
  • H01L 21/308 - Chemical or electrical treatment, e.g. electrolytic etching using masks
  • H01L 31/04 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof adapted as photovoltaic [PV] conversion devices

53.

METHOD FOR RECOVERING PURIFIED SILICON-CONTAINING POWDER

      
Application Number JP2010073124
Publication Number 2011/078219
Status In Force
Filing Date 2010-12-22
Publication Date 2011-06-30
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Sawai, Takeshi
  • Moriya, Daisuke
  • Shirahama, Toshiki
  • Nakamura, Masatoshi

Abstract

Disclosed is a method which removes surface oxides and metal impurities from a starting material silicon-containing powder containing surface oxides and metal impurities, avoids surface re-oxidation of the silicon-containing powder during purification and efficiently recovers recoverable purified silicon-containing powder. The method for recovering purified silicon-containing powder involves: an acid wash step in which the starting material silicon-containing powder having one portion or all of the surface covered by silicon dioxide is contacted with an acid wash solution, which contains a non-ionic surfactant with HLB value of 11 or less and/or an anionic surfactant with HLB value of 11 or less, and hydrofluoric acid, and the surface of the aforementioned silicon-containing powder is washed, resulting in a silicon-containing powder (a); a water wash step in which the silicon-containing powder (a) is washed with water, resulting in a silicon-containing powder (b); a solid-liquid separation step in which the solids and liquids of the silicon-containing powder (b) are separated, resulting in silicon-containing powder (c); and a drying step for drying the silicon-containing powder (c).

IPC Classes  ?

54.

Thermosensitive recording medium

      
Application Number 12674296
Grant Number 08492308
Status In Force
Filing Date 2008-08-21
First Publication Date 2011-06-02
Grant Date 2013-07-23
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Kurihara, Tatsuyuki
  • Nagai, Tatsuo
  • Midorikawa, Yoshimi
  • Ogino, Akihito
  • Suga, Mamoru
  • Aosaki, Yoshimune

Abstract

The present invention provides a thermosensitive recording medium with excellent color developing sensitivity, moist heat resistance and plasticizer resistance, as well as excellent heat resistance, background coloring, light resistance and the like in the printed image. A diphenyl sulfone derivative containing a hydroxyl group on one end and an alkoxy group on the other end has a higher melting point than the one containing hydroxyl groups on both ends. As a result, the thermosensitive recording medium obtained using the diphenyl sulfone derivative as the color developing agent in the thermosensitive color developing layer has excellent heat resistance. However the color developing sensitivity of the thermosensitive recording medium generally declines simultaneously, when a color developing agent with a high melting point is ordinarily used. The thermosensitive recording medium of the present invention that uses a combination of the diphenyl sulfone derivative and a specific phenol derivative in the thermosensitive color developing layer has a good color developing sensitivity and an improved balance among the properties such as moist heat resistance, plasticizer resistance and the like.

IPC Classes  ?

  • B41M 5/333 - Colour developing components therefor, e.g. acidic compounds

55.

Crosslinking agent, and crosslinking polymer composition and molded product formed of the same

      
Application Number 12991970
Grant Number 08445600
Status In Force
Filing Date 2009-05-11
First Publication Date 2011-05-05
Grant Date 2013-05-21
Owner SHINRYO CORPORATION (Japan)
Inventor Yamaura, Mabuko

Abstract

The present invention provides a crosslinking agent which is excellent in processing characteristics and crosslinking performance, and is capable of preventing staining of a molded product upon molding in a metal mold which tends to be induced when using the crosslinking agent together with a triallyl isocyanurate. The crosslinking agent of the present invention comprises an isocyanurate derivative represented by the following general formula (I): 3 is a hydrocarbon group having 1 to 3 carbon atoms which may have a substituent group; and n is an integer of 1 or 2.

IPC Classes  ?

  • C08C 19/22 - Incorporating nitrogen atoms into the molecule
  • C08F 8/06 - Oxidation
  • C08F 8/30 - Introducing nitrogen atoms or nitrogen-containing groups
  • C07D 251/04 - Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having no double bonds between ring members or between ring members and non-ring members

56.

METHOD FOR REMOVAL OF HARD COATING FILM IN SUPERHARD MATERIAL, AND METHOD FOR PRODUCTION OF SUPERHARD MATERIAL

      
Application Number JP2010062835
Publication Number 2011/013766
Status In Force
Filing Date 2010-07-29
Publication Date 2011-02-03
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Ishikawa, Makoto
  • Nishio, Daisuke
  • Sawai, Takeshi
  • Yashiro, Hitoshi

Abstract

Disclosed is a method for removing a hard coating film in a superhard material, which can selectively remove a hard coating film provided on the surface of a superhard material such as a superhard tool and a mold, and can minimize the deterioration in a superhard base material. Specifically disclosed is a method for removing a hard coating film in a superhard material in which the surface of a superhard base material is coated with the hard coating film, wherein the superhard base material is produced by sintering superhard alloy particles each comprising a carbide of at least one element selected from the group consisting of Group-4 elements, Group-5 elements and Group-6 elements with a binder metal comprising at least one element selected from the group consisting of Fe, Co, Cu and Ni or an alloy containing any one element selected from the preceding group, and wherein the hard coating film comprises a nitride, a carbide, a carbonitride, an oxide or a boride of at least one element selected from the group consisting of Group-4 elements, Group-5 elements, Group-6 elements, Group-13 elements and Group-14 elements (excluding carbon). The method comprises bringing the superhard material into contact with an alkaline solution at a temperature ranging from 100 to 250°C inclusive.

IPC Classes  ?

57.

Adhesive resin composition and bonding method

      
Application Number 12524364
Grant Number 08062469
Status In Force
Filing Date 2008-02-05
First Publication Date 2010-04-22
Grant Date 2011-11-22
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Yamauchi, Satoshi
  • Kaneko, Yoshiko
  • Kujira, Katsufumi
  • Sakamoto, Shouji

Abstract

The present invention relates to an inexpensive adhesive resin composition which is applicable even to a base material having a poor bonding property. The adhesive resin composition comprises (A) a polymer having no radical-polymerizable double bond and (B) a radical generating agent in which the radical generating agent (B) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). In the preferred embodiment of the present invention, the adhesive resin composition further comprises (C) a radical-polymerizable monomer wherein the monomer (C) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). The radical-polymerizable monomer (C) is a glycidyl group-containing monomer, and the glycidyl group-containing monomer is 4-hydroxybutyl acrylate glycidyl ether.

IPC Classes  ?

  • B32B 7/12 - Interconnection of layers using interposed adhesives or interposed materials with bonding properties
  • C08F 8/14 - Esterification
  • C08G 65/32 - Polymers modified by chemical after-treatment
  • C08L 77/06 - Polyamides derived from polyamines and polycarboxylic acids
  • C09J 163/00 - Adhesives based on epoxy resinsAdhesives based on derivatives of epoxy resins

58.

POLLUTED AIR PURIFICATION SYSTEM FOR PLAY FACILITY

      
Application Number JP2008057419
Publication Number 2009/128147
Status In Force
Filing Date 2008-04-16
Publication Date 2009-10-22
Owner Shinryo Corporation (Japan)
Inventor
  • Maeda, Yasuhiro
  • Tang, Huaipeng
  • Kimura, Fumio
  • Ueda, Toshikastu
  • Kobayashi, Norikazu

Abstract

In a polluted air purification system for a play facility, airflow controllers (15) constituted to be capable of jetting air obliquely upward are provided on both of the right and left sides of a game machine (11) installed in the game facility (19) and each of the airflow controllers (15) has an airflow of 22 m3/h or more and is installed at a height of 800 to 1500 mm above the floor to prevent diffusion of cigarette smoke by the attraction effect of the jetted out airflow to accelerate rising of the cigarette smoke. The rising air is sucked through the suction port (26) of an air purifier (13) disposed above the game machine (11).

IPC Classes  ?

  • A63F 7/02 - Indoor games using small moving playing bodies, e.g. balls, discs or blocks using falling playing bodies or playing bodies running on an inclined surface, e.g. pinball games

59.

Antigen exposure chamber system

      
Application Number 12088568
Grant Number 08029729
Status In Force
Filing Date 2005-09-28
First Publication Date 2009-10-15
Grant Date 2011-10-04
Owner Shinryo Corporation (Japan)
Inventor
  • Tang, Huaipeng
  • Seta, Akihiro
  • Anai, Toshihiro
  • Ueda, Toshikatsu
  • Okuda, Minoru
  • Hashigucci, Kazuhiro
  • Okubo, Kimihiro

Abstract

An object of the present invention is to solve the problems in conventional art antigen exposure chambers, and specifically, to provide an antigen exposure chamber system capable of simultaneously exposing a large number of test objects in a chamber to a uniform antigen (pollen, mite or house dust, etc.) in all seasons. In order to achieve the above object, in an antigen exposure chamber system according to the present invention, an outdoor air is supplied via an outdoor air diffuser 2 provided in a ceiling surface of an exposure chamber 1 into the exposure chamber from the ceiling surface of the exposure chamber in a horizontal direction, a fan unit 15, including a supply port and a suction port, is provided in each of the four corners of the exposure chamber to provide a circulating flow of air flowing with circulation in the horizontal direction in the exposure chamber, an air exhaust port 4 is provided at a floor surface of the exposure chamber to exhaust an air from the floor surface of the exposure chamber, an antigen is supplied from an antigen supply device to the outdoor air diffuser provided on the ceiling surface so that the antigen is mixed with the outdoor air, and a uniform concentration antigen exposure is enabled by the circulating flow of air.

IPC Classes  ?

  • F24F 7/06 - Ventilation with ducting systems with forced air circulation, e.g. by fan

60.

TOBACCO ODOR ELIMINATING APPARATUS

      
Application Number JP2008055701
Publication Number 2009/118836
Status In Force
Filing Date 2008-03-26
Publication Date 2009-10-01
Owner Shinryo Corporation (Japan)
Inventor
  • Maeda, Yasuhiro
  • Kimura, Fumio
  • Ueda, Toshikatsu
  • Tang, Huaipeng
  • Kobayashi, Norikazu

Abstract

A tobacco odor eliminating apparatus (10) for eliminating any tobacco malodor contained in ventilation air, characterized by having a chemical deodorizing equipment (13) capable of cleaning the ventilation air with the use of a chemical liquid containing a chemical of food additive, the food additive containing at least one chemical selected from among an alkaline gas eliminating chemical, an acidic gas eliminating chemical and an aldehyde gas eliminating chemical. As the ventilation air is cleaned by the use of a chemical safe to human health consisting of a food additive, the apparatus can be employed in indoor circulating systems.

IPC Classes  ?

  • A61L 9/14 - Disinfection, sterilisation or deodorisation of air using sprayed or atomised substances
  • A61L 9/00 - Disinfection, sterilisation or deodorisation of air

61.

SEISMIC ISOLATED TOILET SYSTEM

      
Application Number JP2008051058
Publication Number 2009/093327
Status In Force
Filing Date 2008-01-25
Publication Date 2009-07-30
Owner SHINRYO CORPORATION (Japan)
Inventor Tanaka, Hisao

Abstract

A toilet system which reduces a burden on a user of the toilet by reducing rocking (horizontal rocking in particular) during traveling when the toilet system is installed in a speedily traveling train etc. by seismic isolation. The seismic isolated toilet system is realized by disposing a seismic isolation apparatus (9) between an assembly composed of a structure (8) which has to be installed and the fixed structure parts (5, 6, 7) of a toilet booth (1) and an assembly composed of the floor (4) of the toilet booth and a toilet unit (3) installed on the floor. In order to connect a water supply/drainage system to the toilet unit (3), a water supply apparatus and a water drainage apparatus mounted to the fixed structure parts of the toilet booth are connected with the toilet unit through flexible pipelines (16, 17).

IPC Classes  ?

62.

Antigen supply device

      
Application Number 12088520
Grant Number 08262988
Status In Force
Filing Date 2005-09-28
First Publication Date 2009-06-18
Grant Date 2012-09-11
Owner Shinryo Corporation (Japan)
Inventor
  • Tang, Huaipeng
  • Seta, Akihiro
  • Okuda, Minoru
  • Hashigucci, Kazuhiro
  • Okubo, Kimihiro

Abstract

An antigen supply device 1 according to the present invention is mainly configured by a cylindrical member 3 extending in the vertical direction. An air suction port 5 for sucking the air in the antigen exposure chamber is provided at a lower end of the cylindrical member. An axial fan 6 that generates a flow of the air flowing upward in an axial direction of the cylindrical member is attached above the air suction port of the cylindrical member. Moreover, a supply port 4 through which high-concentration antigens are jetted from a dust feeder on the outside of the antigen exposure chamber is provided above the axial fan of the cylindrical member. The antigen supply device 1 is disposed near the outdoor air diffuser of the antigen exposure chamber, and configured to blow out high-concentration antigens, which are supplied from the dust feeder on the outside of the antigen exposure chamber, to the outdoor air diffuser 2 from an upper end of the cylindrical member after mixing the antigens with the air in the antigen exposure chamber sucked from the air suction port and diluting the antigens, and moreover mix the antigens with the outdoor air from the outdoor air diffuser to fill the antigen exposure chamber A with the mixture of the antigens and the outdoor air.

IPC Classes  ?

  • F24F 7/06 - Ventilation with ducting systems with forced air circulation, e.g. by fan
  • B01L 3/00 - Containers or dishes for laboratory use, e.g. laboratory glasswareDroppers

63.

Antigen exposure chamber and method of cleaning and drying the same

      
Application Number 12088516
Grant Number 07819987
Status In Force
Filing Date 2005-09-28
First Publication Date 2009-06-11
Grant Date 2010-10-26
Owner Shinryo Corporation (Japan)
Inventor
  • Fujita, Toshio
  • Tang, Huaipeng
  • Seta, Akihiro
  • Okuda, Minoru
  • Hashigucci, Kazuhiro
  • Okubo, Kimihiro

Abstract

An antigen exposure chamber for quickly performing cleaning and drying with high quality is provided. The antigen exposure chamber of the present invention includes: a cleaning water supply device for supplying cleaning water for cleaning the antigen exposure chamber; cleaning nozzles for jetting the cleaning water supplied from the cleaning water supply device into the antigen exposure chamber and ducts of fan units to clean the antigen exposure chamber and the ducts; a floor surface of the antigen exposure chamber; and an exhaust device provided below the floor surface to exhaust air from the floor surface of the antigen exposure chamber and collect and drain the cleaning water during cleaning.

IPC Classes  ?

  • B08B 3/04 - Cleaning involving contact with liquid

64.

AIR-CONDITIONING METHOD AND AIR-CONDITIONING APPARATUS FOR CLEAN ROOMS

      
Application Number JP2007072078
Publication Number 2009/001486
Status In Force
Filing Date 2007-11-14
Publication Date 2008-12-31
Owner Shinryo Corporation (Japan)
Inventor
  • Sahara, Yasuhiko
  • Nakamura, Koji
  • Terui, Hayato

Abstract

In a clean room system, a duct for housing a dry coil is eliminated to improve the space efficiency. The air mixing ratio in an air supply passage over a ceiling member is enhanced to stabilize the air supply temperature. A dry coil with a fan is arranged on the floor of a clean room chamber thereby to induce a circulation air so that the circulation air in the clean room may blow as a jet toward the ceiling face from an air blow-off nozzle disposed on the upper portion of the dry coil with the fan. This jet is circulated into an air passage from an opening portion formed in the ceiling member. Thus, the clean air is utilized in the clean room while being recirculated.

IPC Classes  ?

  • F24F 7/06 - Ventilation with ducting systems with forced air circulation, e.g. by fan

65.

Biphenyltetracarboxylic acid dianhydride and process for producing the same, and polyimide formed from the same and process for producing the same

      
Application Number 11570812
Grant Number 07842824
Status In Force
Filing Date 2005-06-28
First Publication Date 2008-03-13
Grant Date 2010-11-30
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Mikami, Hiroshi
  • Nitta, Makoto
  • Noguchi, Naoki

Abstract

To provide a process for producing BPDA whereby high productivity is attained while high purity is maintained. 5 Pa to a maximum temperature in a range of from 210° C. to 250° C. in such a manner that the temperature rising rate is higher than 50° C./hr for a period of at least ¼ of the time for the temperature rise from 60° C. to 210° C., and the temperature is maintained to be from 150° C. to 250° C. for from 0.5 to 10 hours.

IPC Classes  ?

  • C07D 307/89 - Benzo [c] furansHydrogenated benzo [c] furans with two oxygen atoms directly attached in positions 1 and 3
  • C08G 69/32 - Polyamides derived from amino carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound

66.

METHOD OF ICE MAKING, AND ICE MAKING APPARATUS, USING SUPERCOOLED WATER

      
Application Number JP2006311707
Publication Number 2007/069356
Status In Force
Filing Date 2006-06-12
Publication Date 2007-06-21
Owner Shinryo Corporation (Japan)
Inventor
  • Yamada, Ikuhiro
  • Ogawa, Takahiro

Abstract

A method of ice making, and ice making apparatus, in which with respect to the supercooled water produced by a supercooling unit, the supercooling is annulled without liberating of the supercooled water into the atmosphere. Supercooled water is introduced in a vertical cylindrical housing in the horizontal direction and tangential direction from an inferior portion thereof. While annulling the supercooling by swirling flow, produced ice is collected in the vicinity of cylinder axis. Through a nozzle disposed in the vicinity of cylinder axis above the inferior portion, supercooled water and ice in the form of jet flow are fed under pressure to the center area of the cylindrical housing. In the center area, the jet flow runs so as to realize vertical convection, thereby annulling the supercooling of the rest of supercooled water. Thus, most of the supercooling is annulled by the jet flow and the swirling flow.

IPC Classes  ?

  • F25C 1/00 - Producing ice
  • F25C 3/04 - Processes or apparatus specially adapted for producing ice or snow for winter sports or similar recreational purposes, e.g. for sporting installationsProducing artificial snow for sledging or ski trailsProducing artificial snow

67.

LOW REFLECTIVITY MACHINING METHOD FOR SOLAR CELL SILICON SUBSTRATE, AND SOLAR CELL SILICON SUBSTRATE

      
Application Number JP2005019727
Publication Number 2007/049347
Status In Force
Filing Date 2005-10-26
Publication Date 2007-05-03
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Nakashima, Yoshihiro
  • Tahara, Minoru
  • Asahi, Nobuo
  • Otsubo, Hiroshi

Abstract

[PROBLEMS] To provide a low reflectivity machining method for a solar cell silicon substrate, by which reflectivity can be reduced by stably forming fine irregularities on the surface of a single crystal or polycrystalline silicon substrate to be used for a solar cell, and to provide a solar cell silicon substrate manufactured by such method. [MEANS FOR SOLVING PROBLEMS] The method is provided for machining the surface of the single crystal or polycrystalline silicon substrate (A) to be used for the solar cell to provide a low reflectivity. The method is provided with a first step of roughening the surface of the silicon substrate (A) by performing chemical or physical processing; a second step of performing a first plasma treatment to the surface of the roughened silicon substrate (A) by using oxygen gas under a depressurized state; and a third step of forming fine irregularities on the surface of the roughened silicon substrate (A) by performing a second plasma treatment to the surface of the silicon substrate (A) after the first plasma treatment, under a depressurized state by using a halogen gas.

IPC Classes  ?

  • H01L 31/0236 - Special surface textures
  • H01L 31/18 - Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

68.

ANTIGEN EXPOSURE ROOM SYSTEM

      
Application Number JP2005017865
Publication Number 2007/037000
Status In Force
Filing Date 2005-09-28
Publication Date 2007-04-05
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Tang, Huaipeng
  • Seta, Akihiro
  • Anai, Toshihiro
  • Ueda, Toshikatsu
  • Okuda, Minoru
  • Hashigucci, Kazuhiro
  • Okubo, Kimihiro

Abstract

An antigen exposure room system for solving problems with prior-art antigen exposure room and allowing a large number of persons of inspection object in a room to be exposed simultaneously and uniformly to antigen (pollen, tick, house dust, and the like) in all seasons. In the inventive antigen exposure room system, an outer air outlet (2) provided in the ceiling surface of an exposure room (1) supplies outside air from the ceiling surface into the exposure room in the horizontal direction, a fan unit (15) having an air outlet and an air inlet is provided at each of four corners of the exposure room such that air flow swirling in the horizontal direction is supplied into the exposure room, and an exhaust opening (4) is provided in the floor surface of the exposure room such that the air is discharged from the floor surface of the exposure room. Antigen is supplied from an antigen supply unit to the outside air outlet provided in the ceiling surface so that it is mixed with the outside air thus achieving antigen exposure with uniform concentration through swirling air flow.

IPC Classes  ?

  • C12M 1/00 - Apparatus for enzymology or microbiology

69.

ANTIGEN SUPPLY UNIT

      
Application Number JP2005017866
Publication Number 2007/037001
Status In Force
Filing Date 2005-09-28
Publication Date 2007-04-05
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Tang, Huaipeng
  • Seta, Akihiro
  • Okuda, Minoru
  • Hashigucci, Kazuhiro
  • Okubo, Kimihiro

Abstract

An antigen supply unit (1) principally comprising a tubular body (3) extending in the vertical direction, wherein an air inlet (5) for sucking air in an antigen exposure room is provided at the lower end of the tubular body, an axial fan (6) producing air flow flowing upward in the axial direction of the tubular body is fixed above the air inlet of the tubular body, and a supply opening (4) to which high concentration antigen is ejected from a dust feeder on the outside of the antigen exposure room is provided above the axial fan of the tubular body. The antigen supply unit (1) is installed in close proximity to the outside air outlet of the antigen exposure room and high concentration antigen supplied from the dust feeder on the outside of the antigen exposure room is mixed with air in the antigen exposure room sucked from the air inlet and diluted. It is then blown from the upper end of the tubular body toward the outside air outlet (2) and mixed with outside air from the outside air outlet before filling the antigen exposure room (A).

IPC Classes  ?

  • C12M 1/00 - Apparatus for enzymology or microbiology

70.

ANTIGEN EXPOSURE CHAMBER AND METHOD OF WASHING/DRYING THE SAME

      
Application Number JP2005017867
Publication Number 2007/037002
Status In Force
Filing Date 2005-09-28
Publication Date 2007-04-05
Owner SHINRYO CORPORATION (Japan)
Inventor
  • Fujita, Toshio
  • Tang, Huaipeng
  • Seta, Akihiro
  • Okuda, Minoru
  • Hashigucci, Kazuhiro
  • Okubo, Kimihiro

Abstract

An antigen exposure chamber whose washing and drying can be performed speedily in high quality; and a method of washing/drying the antigen exposure chamber. There is provided an antigen exposure chamber including a washing water feeding unit for feeding of a washing water for washing of the antigen exposure chamber; a washing nozzle connected to the washing water feeding unit and designed so as to inject the washing water fed from the washing water feeding unit into the interior of the antigen exposure chamber and a duct of fan unit to thereby conduct washing; a floor surface of the antigen exposure chamber; and a discharge unit disposed below the floor surface and designed so as to carry out not only evacuation from the floor surface of the antigen exposure chamber but also at the time of washing, collecting and draining of the washing water.

IPC Classes  ?

  • C12M 1/00 - Apparatus for enzymology or microbiology
  • B08B 3/02 - Cleaning by the force of jets or sprays
  • B08B 3/10 - Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration

71.

TAIC

      
Application Number 003308459
Status Registered
Filing Date 2003-08-11
Registration Date 2005-10-06
Owner Shinryo Corporation (Japan)
NICE Classes  ? 01 - Chemical and biological materials for industrial, scientific and agricultural use

Goods & Services

Chemicals and chemical compositions, namely, triallylisocyanurate for use in resins and polymers such as homopolymers and copolymers and cross-linking agent in polymer systems.

72.

TAIC

      
Application Number 035853000
Status Registered
Filing Date 1972-11-07
Registration Date 1973-09-21
Owner Shinryo Corporation (Japan)
NICE Classes  ? 01 - Chemical and biological materials for industrial, scientific and agricultural use

Goods & Services

(1) Chemicals and chemical compositions-namely, triallyl isocyanurate, for use in resins and polymers, such as homopolymers and copolymers and as cross-linking agent in polymer systems.

73.

TAIC

      
Serial Number 72349727
Status Registered
Filing Date 1970-01-27
Registration Date 1971-06-08
Owner SHINRYO CORPORATION (Japan)
NICE Classes  ? 01 - Chemical and biological materials for industrial, scientific and agricultural use

Goods & Services

CHEMICALS AND CHEMICAL COMPOSITIONS-NAMELY, TRIALLYL ISOCYANURATE, FOR USE IN RESINS AND POLYMERS, SUCH AS HOMOPOLYMERS AND COPOLYMERS AND AS CROSS-LINKING AGENT IN POLYMER SYSTEMS