Provided are a hydrogen gas production system and a hydrogen gas production method, with which it is possible to produce a high-purity hydrogen gas at a low cost by recovering a high-purity hydrogen gas at a high recovery rate without using a large-scale device. A hydrogen gas production system 100 according to the present invention comprises: a degassing device 20 that degasses raw water; an electrolysis device 30 that generates a hydrogen gas by electrolyzing the raw water degassed by the degassing device 20; piping 62 that connects the degassing device 20 and the electrolysis device 30 and that partitions a flow path through which the raw water is fed from the degassing device 20 to the electrolysis device 30; and a first oxygen gas supply device 40 that supplies an oxygen gas as a degassing gas to the degassing device 20.
C25B 15/08 - Supplying or removing reactants or electrolytesRegeneration of electrolytes
C01B 3/02 - Production of hydrogen or of gaseous mixtures containing hydrogen
C01B 4/00 - Hydrogen isotopesInorganic compounds thereof prepared by isotope exchange, e.g. NH3 + D2 → NH2D + HD
C25B 1/04 - Hydrogen or oxygen by electrolysis of water
C25B 9/00 - Cells or assemblies of cellsConstructional parts of cellsAssemblies of constructional parts, e.g. electrode-diaphragm assembliesProcess-related cell features
C25B 9/77 - Assemblies comprising two or more cells of the filter-press type having diaphragms
The purpose of the present invention is to provide a degradable gas quantitative analysis method which exhibits excellent degradable gas quantitative analysis operability and accuracy. The present invention is a method for quantitatively analyzing a degradable gas contained in a sample by using a gas chromatograph equipped with a pulse discharge ionization detector, wherein the pulse discharge ionization detector is calibrated using a prescribed alternative gas as a standard gas before introducing the sample into the gas chromatograph.
G01N 27/62 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosolsInvestigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electric discharges, e.g. emission of cathode
An object of the present invention is to provide a pressure swing adsorption gas separation apparatus that can separate strong adsorbate components with high purity without allowing weak adsorbate components to contaminate the strong adsorbate component-storage tank. The present invention provides a pressure swing adsorption gas separation apparatus (100) including a raw material gas-storage tank (1) that stores a mixed gas of a target component and at least one component other than the target component as a raw material gas; a strong adsorbate component-storage tank (2) that stores strong adsorbate components; a weak adsorbate component-storage tank (3) that stores strong adsorbate components; a compressor (4) that compresses a gas of the raw material gas-storage tank (1) or the strong adsorbate component-storage tank (2); a compressor (5) that compresses a gas of the strong adsorbate component-storage tank (3); and four adsorption columns of a lower column (10B), lower column (11B), upper column (10U), and upper column (11U).
The purpose of the present invention is to provide a vapor phase growth apparatus in which automatic delivery to an MOCVD reaction furnace and automatic delivery to a dry cleaning furnace are possible. The present invention provides a vapor phase growth device (1) which comprises: a reaction chamber (10) in which an MOCVD reaction furnace (16) for growing a crystal on a wafer (W) that is held by a reaction furnace member (25) is housed; a first conveyance chamber (45) in which a first conveyance unit for conveying the reaction furnace member and the wafer is housed, and which is disposed adjacent to the reaction chamber and is able to communicate with the reaction chamber; and a cleaning chamber (65) in which a dry cleaning furnace (66) for cleaning the reaction furnace member is housed, and which is disposed adjacent to the first conveyance chamber and is able to communicate with the first conveyance chamber.
H01L 21/205 - Deposition of semiconductor materials on a substrate, e.g. epitaxial growth using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
5.
GAS PURIFICATION METHOD AND GAS PURIFICATION DEVICE
The present invention provides a gas purification method and a gas purification device with which it is possible to efficiently utilize regeneration gas without the need for a compressor or the like, and to reduce the amount of exhaust gas from regeneration gas and improve the product gas recovery rate. The present invention provides a gas purification method in which an adsorption step for adsorbing and removing impurities in a raw material gas (G1) using three adsorption towers (2A, 2B, 2C) and a regeneration step for heating the adsorption towers (2A, 2B, 2C) to separate impurities from the adsorption towers (2A, 2B, 2C) are repeatedly performed. At least one of the adsorption towers (2A, 2B, 2C) performs the adsorption step, and at least part of a purified gas G2 obtained by removing impurities from the raw material gas (G1) and discharged from the adsorption towers in the adsorption step is used as a regeneration gas (G3) for purging the adsorption towers (2A, 2B, 2C) in the regeneration step. When at least two adsorption towers (2B, 2C) among the three adsorption towers (2A, 2B, 2C) perform the regeneration step, the regeneration gas (G3) is sequentially circulated to each adsorption tower (2B, 2C) that performs the regeneration step.
B01D 53/04 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
A temperature adjusting system is a temperature adjusting system that cools a part in a plasma processing chamber and includes: a condenser that condenses a temperature adjusting medium that is in a gaseous state at normal temperature and normal pressure; a heat exchanger that cools the temperature adjusting medium that has been condensed by the condenser; a temperature adjusting unit that cools the part by heat exchange with the temperature adjusting medium that has been cooled by the heat exchanger; and a pump that circulates the temperature adjusting medium.
Provided is a hydrogen gas production system capable of producing, with a high recovery rate, a hydrogen gas having a deuterium D content ratio equal to or higher than that in raw material water. A hydrogen gas production system 100 according to the present invention comprises: a first tank 10 that accommodates raw material water including heavy water; an electrolysis device 30 that electrolyzes the raw material water to generate a hydrogen gas; a reservoir 50 that stores the hydrogen gas; a liquid feed device 20 that feeds the raw material water from the first tank 10 to the electrolysis device 30; and a gas feed device 40 that feeds the hydrogen gas generated in the electrolysis device 30 to the reservoir 50. In the system 100, the liquid feed device 20 is controlled so as to replenish the raw material water from the first tank 10 to the electrolysis device 30 as the raw material water remaining in the electrolysis device 30 decreases, the gas feed device 40 is controlled so as to continuously feed the hydrogen gas generated in the electrolysis device 30 to the reservoir 50 before, during, and after the replenishment, and the reservoir 50 stores the hydrogen gas generated in the electrolysis device 30 before, during, and after the replenishment.
C25B 9/00 - Cells or assemblies of cellsConstructional parts of cellsAssemblies of constructional parts, e.g. electrode-diaphragm assembliesProcess-related cell features
C25B 1/04 - Hydrogen or oxygen by electrolysis of water
C25B 9/19 - Cells comprising dimensionally-stable non-movable electrodesAssemblies of constructional parts thereof with diaphragms
NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY (Japan)
Inventor
Yoshinaga Junya
Pyou Kuxanshi
Ikenaga Kazutada
Kumagai Yoshinao
Goto Ken
Sasaki Shogo
Abstract
Provided is a method for producing a crystalline film, wherein multiple feedstock gases are converged at a convergence position to obtain a mixed gas having trimethylgallium, oxygen, and a silicon dopant contained in argon, the temperature at the convergence position is set to be 850-1100°C so as to heat the obtained mixed gas from the convergence position, the heated mixed gas is guided onto the surface of a substrate 2, and a β-gallium oxide crystalline film is grown on the surface of the substrate 2.
H01L 21/365 - Deposition of semiconductor materials on a substrate, e.g. epitaxial growth using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition
9.
CONDUCTIVE PASTE, CONDUCTIVE FILM-COATED SUBSTRATE, AND METHOD FOR PRODUCING CONDUCTIVE FILM-COATED SUBSTRATE
An object of the present invention is to provide a conductive paste that can form a conductive film with excellent conductivity and that does not easily scatter copper fine particles even when sintered with irradiation energy that can sufficiently remove a binder resin, a conductive film-coated film using the conductive paste, and a method for producing a conductive film-coated substrate. The present invention provides a conductive paste containing copper fine particles with an average particle size of 300 nm or less, copper coarse particles with an average particle size of 3 to 11 μm, a binder resin, and a dispersion medium, wherein a content of the binder resin is 0.1 to 2.0 parts by mass with respect to a total of 100 parts by mass of the copper fine particles and the copper coarse particles; a conductive film-coated substrate including a substrate and a sintered body of the conductive paste provided on the substrate; and a method for producing a conductive film-coated substrate including providing a film containing the conductive paste a substrate; and applying a sintering treatment to the film.
One object of the present invention is to provide a multilayer structure manufacturing device and a multilayer structure manufacturing method, which enable control to accelerate the cooling rate in any layer region and facilitates the development of a desired metal structure by controlling the cooling rate. The present invention provides a multilayer structure manufacturing device (1A) including a laser oscillator (14), a chamber (3), a build stage (4) including a powder bed (8) of metal powder M that is movable in the vertical direction in the chamber (3), a plurality of temperature measurement probes (5A, 5B) that measure the temperature of the metal layer or the multilayer structure (20) in the process of being manufactured, and a plurality of temperature adjustment probes (6A, 6B) that adjust the temperature of the metal layer or the multilayer structure (20) in the process of being manufactured, and the temperature measurement probe (5A) and the temperature adjustment probe (5B) are embedded inside the powder bed (5) of the build stage (4).
B22F 10/28 - Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
B22F 10/64 - Treatment of workpieces or articles after build-up by thermal means
B22F 12/00 - Apparatus or devices specially adapted for additive manufacturingAuxiliary means for additive manufacturingCombinations of additive manufacturing apparatus or devices with other processing apparatus or devices
The present invention provides composite copper nanoparticles that have high dispersibility in organic solvents, have little thermal shrinkage even when sintered at 300° C. or higher, and can form smooth electrode films. The present invention provides composite copper nanoparticles in which the surface of the copper nanoparticles is modified with a silane coupling agent, wherein the copper nanoparticles have a film containing cuprous oxide and copper carbonate on at least a part of the surface, wherein when the entire composite copper nanoparticles are taken as 100% by mass, a mass carbon concentration is 0.5 to 1.5% by mass, wherein a mass carbon concentration caused by the silane coupling agent in the mass carbon concentration is 0.5 to 1.2% by mass, and wherein when a total mass of the composite copper nanoparticles is 100% by mass, a mass silicon concentration is in a range from 0.05 to 0.11% by mas
B22F 1/0545 - Dispersions or suspensions of nanosized particles
B22F 1/102 - Metallic powder coated with organic material
B22F 9/20 - Making metallic powder or suspensions thereofApparatus or devices specially adapted therefor using chemical processes with reduction of metal compounds starting from solid metal compounds
12.
DRY ICE CLEANING APPARATUS FOR SEMICONDUCTOR WAFERS AND METHOD FOR CLEANING SEMICONDUCTOR WAFERS
An object of the present invention is to provide a dry ice cleaning apparatus for a semiconductor wafer and a method for cleaning a semiconductor wafer that can reduce the amount of particles remaining on the surface of a semiconductor wafer, suppress a decrease of cleaning effects due to ice formation, and continuously and effectively clean a large amount of semiconductor wafers. The present invention provides a dry ice cleaning apparatus for a semiconductor wafer including a cleaning chamber (1) into which the semiconductor wafers (W) are sequentially carried in and which has an internal space (11) for cleaning the semiconductor wafers (W), an inject cleaning nozzle (5) that is disposed in the internal space (11) of the cleaning chamber (1) and injects the dry ice (D) toward the cleaning surface of the semiconductor wafer (w), and a transfer robot (2) that is disposed in the internal space (11) of the cleaning chamber (1) and sequentially carries the semiconductor wafers (W) from the outside of the cleaning chamber (1) into the internal space (11); and wherein while the transfer robot (2) holding the semiconductor wafer (W) carried into the internal space (11) non-horizontally, the inject cleaning nozzle (5) injects the dry ice (D) onto the semiconductor wafer (W).
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
B24C 1/00 - Methods for use of abrasive blasting for producing particular effectsUse of auxiliary equipment in connection with such methods
B24C 3/32 - Abrasive blasting machines or devicesPlants designed for abrasive blasting of particular work, e.g. the internal surfaces of cylinder blocks
The storage device has: a storage tank that stores a solid or liquid storage material; a solvent tank that stores a solvent; a channel portion that can supply an inert gas to the solvent tank, that can evacuate gas from the storage tank, that can supply the solvent from the solvent tank to the storage tank by supplying the inert gas to the solvent tank and evacuating gas from the storage tank, and that can evacuate the solvent from the storage tank by supplying the inert gas to the storage tank; and a detection portion that detects the storage material in the solvent supplied to the storage tank.
The purpose of the present invention is to provide a hydrogen combustion furnace in which the amount of NOx emissions can be reduced. Provided is a hydrogen combustion furnace (1) comprising: a combustion furnace body (2) having a burner (3); a first path (L1) for supplying hydrogen to the burner (3); a second path (L2) for supplying a combustion-supporting gas containing oxygen to the burner (3); a third path (L3) for drawing exhaust gas out of the combustion furnace body (2); a first control device (7) for adjusting the amount of hydrogen to be supplied; a second control device (8) for adjusting the amount of combustion-supporting gas to be supplied; a gas analysis device (5) for analyzing components in the exhaust gas; and a control device (6). The control device (6) controls the first control device (7) and the second control device (8), on the basis of analysis values obtained from the gas analysis device (5), such that hydrogen is incompletely combusted in the combustion furnace body (2).
F23N 1/02 - Regulating fuel supply conjointly with air supply
F23C 99/00 - Subject matter not provided for in other groups of this subclass
F23D 14/22 - Non-premix gas burners, i.e. in which gaseous fuel is mixed with combustion air on arrival at the combustion zone with separate air and gas feed ducts, e.g. with ducts running parallel or crossing each other
F23J 15/00 - Arrangements of devices for treating smoke or fumes
F23K 5/00 - Feeding or distributing other fuel to combustion apparatus
F23L 15/00 - Heating of air supplied for combustion
The techniques described herein relate to hydrogen peroxide plasma surface modification. In some embodiments, a method includes providing a mixture including hydrogen peroxide vapor from a source, wherein a concentration of the hydrogen peroxide vapor in the mixture is substantially stable over time. The method further includes forming a hydrogen peroxide plasma from the mixture and exposing a material to the hydrogen peroxide plasma in a chamber.
Provided is a porous metal complex-containing film that can be produced by a simple process, has a high yield when produced, and has a high detection sensitivity when used as a detection element. Also provided are a detection element provided with this film and a method for producing a porous metal complex-containing film. The porous metal complex-containing film includes: a filter having an internal void and having optical transparency and gas permeability; and a porous metal complex fixed to the void. The porous metal complex contains metal ions and organic ligands that coordinate with the metal ions. The median diameter of the porous metal complex on a volume basis is 0.1 μm to 3 μm.
G01N 21/78 - Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour
The techniques described herein relate to hydrogen peroxide plasma surface modification. In some embodiments, a method includes providing a mixture including hydrogen peroxide vapor from a source, wherein a concentration of the hydrogen peroxide vapor in the mixture is substantially stable over time. The method further includes forming a hydrogen peroxide plasma from the mixture and exposing a material to the hydrogen peroxide plasma in a chamber.
C23C 16/513 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
C23C 16/52 - Controlling or regulating the coating process
C23C 16/22 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
Provided is a gas supply method comprising: an impurities removal step for discharging an exhaust gas, which comprises an impurity gas generated as a result of vaporization of impurities in a solid material in a container (2), from the container (2) through a discharge line (5); and a gas supply step for supplying a supply gas, which comprises a film-forming material gas that is generated as a result of vaporization of a main component in the solid material excluding the impurities in the solid material in the container (2), from the container (2) to a film formation chamber through a supply line (9). The impurities removal step has a first temperature stage where the temperature in the container (2) is retained in a first temperature range, a second temperature stage where the temperature in the container (2) is retained within a second temperature range, and a first temperature-rising stage where the temperature in the container (2) is risen in a stepwise manner from the second temperature stage to the first temperature stage.
C23C 16/448 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
H01L 21/31 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to form insulating layers thereon, e.g. for masking or by using photolithographic techniquesAfter-treatment of these layersSelection of materials for these layers
Provided are an air separation method and an air separation device that enable improvement of an argon recovery rate while maintaining, or suppressing decreases in, an oxygen recovery rate. The air separation method includes: a high-pressure separation step of separating high-pressure raw material air; a turbine air generation step of generating medium-pressure turbine air; a turbine air compression step of generating high-pressure turbine air; a turbine air adiabatic expansion step of generating low-pressure turbine air; a low-pressure separation step of separating low-pressure turbine air; an argon separation step of separating argon enriched liquefied oxygen; an argon condensation step of generating liquefied argon and low-pressure oxygen gas; a high-pressure nitrogen condensation step of generating high-pressure liquefied nitrogen and medium-pressure oxygen gas; and a product argon extraction step of extracting the argon. The turbine air compression step includes a raw-material air bypass step of compressing the medium-pressure turbine air using energy generated by the turbine air adiabatic expansion step, and further branching off a portion of the high-pressure raw material air and merging the portion with the high-pressure turbine air after decompression.
F25J 3/04 - Processes or apparatus for separating the constituents of gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
F25J 3/06 - Processes or apparatus for separating the constituents of gaseous mixtures involving the use of liquefaction or solidification by partial condensation
21.
DEUTERIUM RECOVERY METHOD AND DEUTERIUM RECOVERY EQUIPMENT
An object of the present invention is to provide a deuterium recovery method and deuterium recovery equipment that can recover and reuse deuterium or deuterium compounds used in semiconductor manufacturing processes. The present invention provides a deuterium recovery method including: generating heavy water in an exhaust gas containing deuterium gas in a semiconductor manufacturing process.
C01B 4/00 - Hydrogen isotopesInorganic compounds thereof prepared by isotope exchange, e.g. NH3 + D2 → NH2D + HD
B01D 53/00 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols
Provided is a transfer-type sheet-like bonding material in which: (I) cracking is sufficiently suppressed; (II) excellent transferability is achieved even under moderate transfer conditions such that sintering of copper particles does not progress; and (III) sufficient bond strength can be ensured even in the case of low temperature bonding at 250°C or less. The transfer-type sheet-like bonding material is characterized by comprising a resin base plate and a paste applied and dried on the resin base plate, the paste containing copper particles, a reducing agent, a solvent, and an organic material containing a resin and optionally a plasticizer; and by having a glass transition temperature of -35°C to 25°C.
B22F 1/0545 - Dispersions or suspensions of nanosized particles
B22F 1/107 - Metallic powder containing lubricating or binding agentsMetallic powder containing organic material containing organic material comprising solvents, e.g. for slip casting
B22F 7/08 - Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
B22F 9/00 - Making metallic powder or suspensions thereofApparatus or devices specially adapted therefor
23.
SHEET-LIKE JOINING MATERIAL AND METHOD FOR PRODUCING SAME, AND JOINED BODY AND METHOD FOR PRODUCING SAME
The purpose of the present invention is to provide a joining material which makes it possible to achieve sufficient joining strength even in low-temperature joining at 250°C or lower and also makes it possible to achieve such joining that unevenness between the sintering state in a center part and the sintering state in a pressured edge portion in a pressure-joined surface is unlikely to occur. Provided is a sheet-like joining material comprising copper particles and a reducing agent that reduces the copper particles, the sheet-like joining material being characterized in that the copper particles include copper fine particles that have an average particle diameter of 300 nm or less and copper coarse particles that are contained optionally and have an average particle diameter of 3 μm to 11 μm inclusive, the content of the copper fine particles relative to the total content of the copper fine particles and the copper coarse particles is 50% by mass to 100% by mass inclusive, the reducing agent comprises triethanolamine, and the content of the triethanolamine is 1.5% by mass to 10.0% by mass inclusive relative to the total content of the copper fine particles and the copper coarse particles.
B22F 1/10 - Metallic powder containing lubricating or binding agentsMetallic powder containing organic material
B22F 1/00 - Metallic powderTreatment of metallic powder, e.g. to facilitate working or to improve properties
B22F 1/052 - Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
B22F 3/14 - Both compacting and sintering simultaneously
B22F 7/08 - Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
The invention relates to a medical gas supply device that supplies hydrogen gas to inhalation gas, including: an inhalation gas path that is connected to an inhalation line on an artificial respirator side; a hydrogen gas introduction path that is connected to a hydrogen gas supplier; a merging point where these two paths merge; a tank that is provided downstream of the merging point, includes a gas inlet and a gas outlet, has a diameter larger than that of the inhalation gas path, and mixes inhalation gas and hydrogen gas to form a mixed gas; a mixed gas supply path that connects the gas outlet and a patient-side inhalation line; a flow meter that is provided in the inhalation gas path; a flow rate controller that is provided in the medical gas introduction path; and a control unit that is connected to the flow meter and the flow rate controller.
The purpose of the present invention is to provide a layered structure manufacturing device with which it is possible to perform simple modelling of a layered structure. Selected is a layered structure manufacturing device comprising a casing (2) in which a shield gas atmosphere is formed in a space inside thereof, an analysis unit (3) that analyzes the component of the shield gas atmosphere, a control unit (4) having a function of controlling the shield gas atmosphere so as to be constituted from a required component, a modelling unit (7) that forms a modelling solidification layer (25a) and models a connected body (25) in which the modelling solidification layers (25a) are layered, a drying unit (8) for heating and drying the connected body (25), a powder removal unit (9) for removing unneeded raw material powder from the dried connected body (25), and a powder recovery unit (10) for recovering the unneeded raw material powder. The modelling unit (7), the drying unit (8), the powder removal unit (9), and the powder recovery unit (10) are located in the space inside the casing (2).
B22F 12/90 - Means for process control, e.g. cameras or sensors
B29C 64/165 - Processes of additive manufacturing using a combination of solid and fluid materials, e.g. a powder selectively bound by a liquid binder, catalyst, inhibitor or energy absorber
An air purification device according to the present invention removes impurities from raw air by the thermal swing adsorption method to thereby purify the raw air, and includes two adsorption columns which each are packed with an adsorbent capable of adsorbing the impurities and in which an air purification treatment for purifying the raw air with the adsorbent and a regeneration treatment for restoring the adsorbing ability of the adsorbent can be alternately performed. One of the two adsorption columns which is in the course of the regeneration treatment is flow-purged at a pressure equal to that in the other of the two adsorption columns which is in the course of the air purification treatment, and is then switched to the air purification treatment.
B01D 53/04 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
27.
DISTILLATION DEVICE AND METHOD FOR OPERATING DISTILLATION DEVICE
A purpose of the present invention is to provide a distillation device which can be started up in a shortened time. The present invention provides a distillation device (1) comprising: one or more packed columns (D) which each have a structured packing inside and in which gas/liquid contacting occurs to concentrate high-boiling-point components on the liquid side and low-boiling-point components on the gas side; one or more evaporators (R) each for vaporizing at least some of a descending liquid in the packed column and introducing some of the vapor as an ascending gas into the packed column; one or more condensers (C) each for liquefying at least some of an ascending gas in the packed column and introducing some of the liquid as a circulation liquid into the packed column; a liquid supply path (L5) located between at least one of the evaporators (R) and an upper portion of at least one of the packed columns (D); one or more liquid-retaining vessels (H) located in the liquid supply path; and one or more gas supply paths (L7) each located at a lower portion of the packed column D to which the liquid supply path (L5) is connected.
The techniques described herein relate to a method for etching an ashable hard mask (AHM) on a substrate. The method includes forming a plasma from a gas mixture, wherein the gas mixture includes hydrogen peroxide vapor with a concentration greater than 0.1% by volume, wherein the concentration of the hydrogen peroxide vapor in the gas mixture is substantially stable over time, and wherein the plasma comprises hydrogen peroxide species. The method further includes etching the AHM by exposing the AHM to the plasma.
The techniques described herein relate to a method for etching an ashable hard mask (AHM) on a substrate. The method includes forming a plasma from a gas mixture, wherein the gas mixture includes hydrogen peroxide vapor with a concentration greater than 0.1% by volume, wherein the concentration of the hydrogen peroxide vapor in the gas mixture is substantially stable over time, and wherein the plasma comprises hydrogen peroxide species. The method further includes etching the AHM by exposing the AHM to the plasma.
The object of the present invention is to provide a stable isotope enrichment device and a stable isotope enrichment method capable of reducing the discharge amount of toxic or combustible substances or substances causing environmental load in the atmosphere and reducing the amount of raw materials used. The present invention provides a stable isotope enrichment device, including: a distillation column group in which a plurality of distillation columns are connected in a cascade; a raw material supply line (30) that supplies a raw material into a first distillation column (1); a product line (31) that withdraws a product from another distillation column located on the secondary side of the first distillation column (1); an isotope-depleted fluid withdraw line (32) that withdraws an isotope-depleted gas or an isotope-depleted liquid from the first distillation column (1) or another distillation column located on the primary side of the one distillation column (1); an isotope exchange reactor (22) at which the isotope-depleted gas or the isotope-depleted liquid is subjected to an isotope exchange reaction, the isotope-depleted gas or the isotope-depleted liquid is regenerated such that the concentration of molecules containing a target stable isotope in the isotope-depleted gas or the isotope-depleted liquid approaches the natural abundance ratio, and an isotope-regenerated gas or an isotope-regenerated liquid is produced; and an isotope-regenerated fluid return line (33) that re-supplies the isotope-regenerated gas or the isotope-regenerated liquid into the first distillation column (1).
A turbo-Brayton refrigeration machine (11) includes a first circulation path (L1) in which a first refrigerant circulates, a second circulation path (L2) in which a second refrigerant which is a cooling target circulates, a subcooler (22) disposed over the first circulation path (L1) and the second circulation path (L2) and configured to have a single heat-exchanging unit, and an expansion turbine (21) positioned on a primary side of the subcooler (22) in the first circulation path (L1), in which the pressure ratio of the expansion turbine (21) is the pressure ratio at which the outlet temperature of the expansion turbine (21) is higher than a freezing point of the second refrigerant.
F25B 9/14 - Compression machines, plants or systems, in which the refrigerant is air or other gas of low boiling point characterised by the cycle used, e.g. Stirling cycle
32.
CONTRAST AGENT FOR DETECTING CARTILAGE DAMAGE AND METHOD AND PROGRAM FOR EXAMINING CARTILAGE DAMAGE USING SAID CONTRAST AGENT
The present invention provides: an MRI contrast agent for detecting cartilage damage, which comprises 17O-labeled water; and a method and a program for detecting cartilage damage using the contrast agent. According to the present invention, it becomes possible to detect a damage in a cartilage, particularly a minor damage in the surface layer of a cartilage which has been difficult to detect so far, by using 17O-labeled water as a contrast agent.
A61B 5/055 - Detecting, measuring or recording for diagnosis by means of electric currents or magnetic fieldsMeasuring using microwaves or radio waves involving electronic [EMR] or nuclear [NMR] magnetic resonance, e.g. magnetic resonance imaging
G01R 33/50 - NMR imaging systems based on the determination of relaxation times
The present invention addresses the problem of providing a mixed gas supply device that can safely and stably supply a mixed gas containing a film-forming material gas. The present invention provides a mixed gas supply device (1) that supplies a mixed gas including at least one type of gas of a film-forming material S while adjusting the concentration of the film-forming material S in the mixed gas, the mixed gas supply device comprising: a raw material container (2) in which the film-forming material S is accommodated; a first heater (3) that heats the raw material container (2); a carrier gas introduction path (L1) for introducing carrier gas into the raw material container (2); a mixed gas lead-out path (L2) for leading the mixed gas out of the raw material container (2); a second heater (6) that heats the mixed gas lead-out path (L2); a pressure regulator (8) located in the mixed gas lead-out path (L2) and adjusting the pressure in the raw material container (2); a mixed gas measuring device (9) located in the mixed gas lead-out path (L2) on the primary side or secondary side of the pressure regulator (8) and measuring the concentration or flow rate of the mixed gas; and one or more buffer tanks (10) located in the mixed gas lead-out path (L2).
C23C 16/448 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
H01L 21/31 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to form insulating layers thereon, e.g. for masking or by using photolithographic techniquesAfter-treatment of these layersSelection of materials for these layers
Provided is, as a radioactive halogen labeling precursor compound that is highly reactive and stable, a compound represented by the following general formula (II):
Provided is, as a radioactive halogen labeling precursor compound that is highly reactive and stable, a compound represented by the following general formula (II):
Provided is, as a radioactive halogen labeling precursor compound that is highly reactive and stable, a compound represented by the following general formula (II):
wherein R1 and R2 each independently represent an alkyl group having 5 to 20 carbon atoms, X1 and X2 each independently represent a halogen atom, and R3 represents a monovalent group derived from a sugar, or the like.
C07D 319/06 - 1,3-DioxanesHydrogenated 1,3-dioxanes not condensed with other rings
C07D 405/06 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
C07D 407/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
C07C 309/83 - Halides of sulfonic acids having halosulfonyl groups bound to acyclic carbon atoms of a carbon skeleton substituted by nitrogen atoms, not being part of nitro or nitroso groups
C07B 59/00 - Introduction of isotopes of elements into organic compounds
35.
COMPOSITE COPPER NANOPARTICLES, AND METHOD FOR MANUFACTURING COMPOSITE COPPER NANOPARTICLES
One purpose of the present invention is to provide composite copper nanoparticles that have a high dispersibility with respect to an organic solvent and with which it is possible to form a smooth electroconductive film. Provided are composite copper nanoparticles in which the surface of copper nanoparticles is modified with a silane coupling agent, the copper nanoparticles having, on at least a part of the surface thereof, a coating containing copper oxide. The mass concentration of carbon due to the silane coupling agent in the composite copper nanoparticles is 0.1-1.2 mass% relative to the total mass of the composite copper nanoparticles, or the number of surface groups derived from the silane coupling agent on the surface of the composite copper nanoparticles is 1.0-13.0 inclusive per 1 nm2 of the surface area of the composite copper nanoparticles.
B22F 1/00 - Metallic powderTreatment of metallic powder, e.g. to facilitate working or to improve properties
B22F 1/052 - Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
B22F 1/102 - Metallic powder coated with organic material
The purpose of the present invention is to provide a heat exchanger that is used in an air separation device having a low pressure column, a high pressure column, and a mixing column, and can suppress an increase in equipment costs. A heat exchanger according to the present invention is used in an air separation device 1100 having a low pressure column (600), a high pressure column (500), and a mixing column (400), and is characterized by being configured from plates and fins, and by using at least one cold flow gas (at least one among C2 and C3) extracted from the low pressure column (600) and a cold flow gas (C1) extracted from the mixing column (400) to cool a warm flow gas (at least one from among W1, W2, and W3) that is at least a portion of a raw material air, and at least one warm flow fluid (at least one from among W4 and W5) extracted from the mixing column (400), and heating a cold flow fluid (C6) that is extracted from the low pressure column (600) through a pressure boosting pump (800) and supplied to the mixing column (400).
F25J 5/00 - Arrangements of cold-exchangers or cold-accumulators in separation or liquefaction plants
F25J 3/04 - Processes or apparatus for separating the constituents of gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
F28D 9/00 - Heat-exchange apparatus having stationary plate-like or laminated conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall
F28F 3/08 - Elements constructed for building-up into stacks, e.g. capable of being taken apart for cleaning
37.
RADIOLABELED ACTIVATED ESTER AND PRECURSOR THEREOF
NATIONAL UNIVERSITY CORPORATION CHIBA UNIVERSITY (Japan)
TAIYO NIPPON SANSO CORPORATION (Japan)
Inventor
Tanaka, Hiroshi
Uehara, Tomoya
Abstract
Provided as a precursor of a radioactive halogen-labeled compound is a compound represented by general formula (I) [in the formula, R1represents a leaving group that can undergo nucleophilic substitution by a halide ion, R2represents a leaving group in which nucleophilic substitution proceeds by an amino group, and R3 represents a hydrogen atom or a halogen atom.].
A61K 51/00 - Preparations containing radioactive substances for use in therapy or testing in vivo
C07D 405/06 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
38.
AROMATIC COMPOUND, MIXTURE, MOLECULAR PROBE FOR HYPERPOLARIZATION, METABOLITE, DIAGNOSTIC AGENT, DERIVATIZATION AGENT, NAPHTHALENE DERIVATIVE, CATECHOL DERIVATIVE, AND COMPOUND
An aromatic compound configured from a stable isotope, wherein two adjacent carbon atoms are 13C, the nuclear spin quantum number of the other atoms to which the two adjacent carbon atoms bond is 0, and a hydrogen atom that has a spin coupling constant and bonds with the 13C nucleus via a carbon atom is substituted with a deuterium atom. In this aromatic compound, the relaxation time of the 13C nucleus excited by a DNP device is longer than in the past.
C07C 63/36 - Polycyclic acids with carboxyl groups bound to condensed ring systems containing two rings containing one carboxyl group
A61K 31/045 - Hydroxy compounds, e.g. alcoholsSalts thereof, e.g. alcoholates
A61K 31/136 - Amines, e.g. amantadine having aromatic rings, e.g. methadone having the amino group directly attached to the aromatic ring, e.g. benzeneamine
A61K 31/192 - Carboxylic acids, e.g. valproic acid having aromatic groups, e.g. sulindac, 2-aryl-propionic acids, ethacrynic acid
A61K 31/198 - Alpha-amino acids, e.g. alanine or edetic acid [EDTA]
C07C 229/36 - Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton containing six-membered aromatic rings with at least one amino group and one carboxyl group bound to the same carbon atom of the carbon skeleton
C07C 255/04 - Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms of an acyclic and saturated carbon skeleton containing two cyano groups bound to the carbon skeleton
The purpose of the present invention is to provide a method for manufacturing a layered structure in which it is easy to control the crystal structure in the layered structure. A method for manufacturing a layered structure is selected in which: a gas flow parallel to the surface of a powder bed is provided; an energy beam is radiated while being scanned in a first direction to form a first melt-solidified layer; an energy beam is radiated while being scanned in a second direction intersecting the first direction to form a second melt-solidified layer; a first accumulation thickness of the powder bed and a first heat input amount of the energy beam are adjusted to control the layering thickness of the first melt-solidified layer and the penetration depth of the first melt-solidified layer; a second accumulation thickness of the powder bed and a second heat input amount of the energy beam are adjusted to control the layering thickness of the second melt-solidified layer and the penetration depth of the second melt-solidified layer; the angle α1 between the first direction and the gas flow direction is adjusted to control the first heat input amount; the angle α2 between the second direction and the gas flow direction is adjusted to control the second heat input amount; and the residual thickness of the first melt-solidified layer and the residual thickness of the second melt-solidified layer in the crystal structure are controlled.
The present invention addresses the problem of providing a solid material container with which it is possible to ascertain the remaining amount of solid material in the container in a standard state. Provided is a solid material container (11) comprising: a bottomed cylindrical container body (11A) having a barrel part (14), the center axis C of which extends in the vertical direction; a lid (11B) that closes off the top surface, i.e., the opening of the container body (11A); and a plurality of thermocouples (15), wherein the thermocouples (15) are inserted in the horizontal direction from outside to inside in the circumferential direction of the barrel part (14), tips (15a) of the thermocouples (15) are positioned at the center of the barrel part (14), and the plurality of thermocouples (15) are respectively disposed at two or more different heights with gaps therebetween in the vertical direction of the barrel part (14).
C23C 16/448 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
B01J 4/00 - Feed devicesFeed or outlet control devices
F17C 7/00 - Methods or apparatus for discharging liquefied, solidified, or compressed gases from pressure vessels, not covered by another subclass
H01L 21/205 - Deposition of semiconductor materials on a substrate, e.g. epitaxial growth using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition
41.
STORAGE FOR POWDER MATERIAL FOR METAL 3D PRINTER, AND METHOD FOR STORING POWDER MATERIAL FOR METAL 3D PRINTER
A storage for powder material for metal 3D printer comprises: a storage body that includes an enclosed space thereinside in which at least one storage container accommodating a powder material for a metal 3D printer can be placed; a purge gas feeding channel that feeds a purge gas containing air as a material into the enclosed space; and an oxygen/moisture removal device that is positioned on the purge gas feeding channel and removes oxygen and moisture from the air. The storage can provide a storage environment suitable for the powder material for a metal 3D printer without a restriction of an installation location.
B01D 53/04 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
B01D 53/22 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by diffusion
B33Y 30/00 - Apparatus for additive manufacturingDetails thereof or accessories therefor
The present disclosure relates to gas recovery systems and methods, and systems including gas recovery systems. In some embodiments, a gas recovery system includes a gas inlet, a compressor, a buffer tank, a variable speed microturbine, one or more sensors, and a control system. A gas input into the gas inlet can be output from a processing tool, and the gas can include hydrogen or ammonia gas. The gas can be used to produce electrical power using the first variable speed microturbine. The sensor, for example, a gas analyzer, a flow meter, or a pressure sensor, can be between the gas inlet and the variable speed microturbine. The control system can be configured to control a speed of the variable speed microturbine in response to a measurement from the sensor.
B01D 53/14 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by absorption
B01D 53/78 - Liquid phase processes with gas-liquid contact
B01D 53/30 - Controlling by gas-analysis apparatus
The object of the present invention is to provide a stable isotope concentrating device that has high energy efficiency and can reduce equipment costs, and provides a stable isotope concentrating device including a distillation column group in which multiple distillation columns are cascaded, and the distillation column group includes: a tray column group including one or more tray columns; and a packing column group including one or more packing columns, and the packing column group is located on a secondary side of the tray column group.
The present disclosure relates to gas recovery systems and methods, and systems including gas recovery systems. In some embodiments, a gas recovery system includes a gas inlet, a compressor, a buffer tank, a variable speed microturbine, one or more sensors, and a control system. A gas input into the gas inlet can be output from a processing tool, and the gas can include hydrogen or ammonia gas. The gas can be used to produce electrical power using the first variable speed microturbine. The sensor, for example, a gas analyzer, a flow meter, or a pressure sensor, can be between the gas inlet and the variable speed microturbine. The control system can be configured to control a speed of the variable speed microturbine in response to a measurement from the sensor.
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
B01D 53/14 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by absorption
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
A gas separation method in which a rare as a first introduced gas and an impurity gas as a second introduced gas, are introduced into a raw material gas. Each of the flow rates of the first and second introduced gases is controlled based on the flow rates of the rare gas and impurity gas in the discharged gas from a rare gas using facility. A gas separation device includes an introduction pipe for introducing rare gas in a separation gas container into a raw material gas, an introduction pipe for introducing impurity gases in the separation gas container into the raw material gas, a flow meter provided in a supply pipe for supplying a discharged gas of a rare gas using facility, and an arithmetic device electrically connected to each of the flow meter the flow rate controller, and the flow rate controller.
B01D 53/04 - Separation of gases or vapoursRecovering vapours of volatile solvents from gasesChemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
A method for producing a bonding material having a plate shape or a sheet shape includes a mixture producing step in which fine copper particles having an average particle diameter of 300 nm or less, coarse copper particles having an average particle diameter of 3 μm or more and 11 μm or less, and a reducing agent which reduces the fine copper particles and the coarse copper particles are mixed to produce a mixture: and a molding step in which the mixture is formed in a plate shape or a sheet shape.
B22F 1/00 - Metallic powderTreatment of metallic powder, e.g. to facilitate working or to improve properties
B22F 1/06 - Metallic powder characterised by the shape of the particles
B22F 7/08 - Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
B23K 35/30 - Selection of soldering or welding materials proper with the principal constituent melting at less than 1550°C
B22F 1/05 - Metallic powder characterised by the size or surface area of the particles
B22F 1/052 - Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
B22F 1/145 - Chemical treatment, e.g. passivation or decarburisation
B23K 35/02 - Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
47.
BONDING MATERIAL, METHOD FOR PRODUCING BONDING MATERIAL, AND BONDED BODY
A bonded body includes a first bonded member, a second bonded member, and a bonding material. The bonding material is located between the first bonded member and the second bonded member. The bonding material includes fine copper particles having an average particle diameter of 300 nm or less; coarse copper particles having an average particle diameter of 3 μm or more and 11 μm or less; and a reducing agent which reduces the fine copper particles and the coarse copper particles.
B22F 1/00 - Metallic powderTreatment of metallic powder, e.g. to facilitate working or to improve properties
B22F 1/06 - Metallic powder characterised by the shape of the particles
B22F 7/08 - Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting of composite workpieces or articles from parts, e.g. to form tipped tools with one or more parts not made from powder
B23K 35/30 - Selection of soldering or welding materials proper with the principal constituent melting at less than 1550°C
B22F 1/05 - Metallic powder characterised by the size or surface area of the particles
B22F 1/052 - Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
B22F 1/145 - Chemical treatment, e.g. passivation or decarburisation
B23K 35/02 - Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
48.
MELTING/REFINING FURNACE FOR COLD IRON SOURCES, AND MELTING/REFINING FURNACE OPERATION METHOD
The object of the present invention is to provide a melting/refining furnace for cold iron sources and an operation method for a melting/refining furnace that can increase the heating efficiency of the raw material without causing oxidation of the raw material, reduce the amount of power consumption required for melting the raw material, shorten the melting and refining time, improve the productivity, and reduce costs, and the present invention provides a melting/refining furnace including: one or more through-holes (21) provided to penetrate a furnace wall (2A) of an electric furnace (2); and an oxygen burner-lance (3) provided in the through-hole (21), wherein the oxygen burner-lance (3) includes at least one combustion-supporting gas supply pipe (31) and at least one fuel gas supply pipe (32) which have an opening communicating with an inside of the electric furnace (2), and wherein a high-temperature gas generator (10) is provided in any one or more of the combustion-supporting gas supply pipes (31).
An object of the present invention is to provide a carbon stable isotope enrichment method that does not require safety measures against combustibility and toxicity and that enables high-concentration 13C enrichment without isotope scrambling, and the present invention provides a carbon stable isotope enrichment method including a distillation step for enriching carbon tetrafluoride stable isotope molecules containing 13C by distilling raw material carbon tetrafluoride containing multiple types of carbon tetrafluoride stable isotope molecules in a distillation column group in which multiple distillation columns are cascaded.
Provided is a gas purification device for which the amount of loss of refined gas can be reduced while increases in device price and device size are suppressed and the recovery benefits can be maximized. In a gas purification device 1 comprising a compressor 51 that compresses a raw material gas and adsorption towers 10, 20 into which the compressed raw material gas is introduced and which is filled with an adsorbent, the adsorption towers 10, 20 purify the raw material gas by pressure swing adsorption for separating gas by sequentially performing an adsorption process and a regeneration process. The gas purification device 1 comprises a residual gas recovery path L13 connecting the outlet side of the adsorption towers 10, 20 and the suction side of the compressor 51, and the residual gas recovery path L13 is provided with a pressure regulator such as a pressure reducing valve 30. The gas purification device 1 comprises a mass flow controller 31 in a raw material gas supply path L10 on the discharge side of the compressor 51 and a bypass path L14 that bypasses the mass flow controller, and a valve 32 is provided thereto.
Provided is a temperature adjusting system for cooling a member in a plasma processing chamber, wherein said system comprises: a condenser that condenses a temperature-adjusting medium which is gaseous at atmospheric temperature and atmospheric pressure; a heat exchanger that cools the temperature-adjusting medium which was condensed by the condenser; a temperature adjusting unit that cools a member by performing heat exchange using the temperature adjusting medium which was cooled by the heat exchanger; and a pump that causes the temperature adjusting medium to circulate.
The purpose of the present invention is to provide a refrigeration machine control method, a refrigeration machine control program, and a refrigeration machine, whereby it is possible to improve the cooldown speed while preventing surging in the cooldown of a turbo compressor. The present invention provides a method for controlling a refrigeration machine (101), the method comprising: a first step for opening a bypass valve (12); a second step for starting an expansion turbine (15); a step for starting a turbo compressor (11) at a rotational speed at which no-load operation is possible; a step for increasing the rotational speed of the turbo compressor (11) so that the relationship between the compressor flow rate and the pressure ratio is on the low flow rate, high pressure ratio side within an operable range; a step for closing the bypass valve (12); and a step for cooling down until the measurement value of a thermometer (16) reaches a predetermined value.
The purpose of the present invention is to provide a pressure-fluctuation-adsorption-type gas separation device with which it is possible to separate easy-to-adsorb components at a high purity without allowing admixing of difficult-to-adsorb components in a tank for retaining the easy-to-adsorb components. Provided is a pressure-fluctuation-adsorption-type gas separation device (100) comprising: a raw-material gas retention tank (1) for retaining, as a raw-material gas, a mixed gas containing target components and at least one type of other components; an easy-to-adsorb component retention tank (2) for retaining easy-to-adsorb components; a difficult-to-adsorb component retention tank (3) for retaining difficult-to-adsorb components; a compressor (4) for compressing gas in the raw-material gas retention tank (1) or the easy-to-adsorb component retention tank (2); a compressor (5) for compressing gas in the easy-to-adsorb component retention tank (2); and four adsorption columns, including a lower column (10B), a lower column (11B), an upper column (10U), and an upper column (11U).
One object of the present invention is to provide a method for producing a metal nitride film that has a high film formation rate and excellent productivity. The present invention provides a method for producing a metal nitride film in which a metal nitride film is formed on at least a part of a surface of a substrate to be processed by chemical vapor deposition using a metal compound raw material and a nitrogen-containing compound raw material, wherein the nitrogen-containing compound raw material contains hydrazine and ammonia.
C23C 16/30 - Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
C23C 16/52 - Controlling or regulating the coating process
55.
SAMPLE SUPPORT, IONIZATION METHOD, AND MASS SPECTROMETRY METHOD
NATIONAL UNIVERSITY CORPORATION FUKUSHIMA UNIVERSITY (Japan)
Inventor
Kotani, Masahiro
Ohmura, Takayuki
Wakimura, Akari
Terauchi, Tsutomu
Taira, Shu
Naito, Yasuhide
Abstract
A sample support is a sample support used for ionizing components of a sample, and includes: a substrate including a first surface, a second surface on a side opposite to the first surface, and a plurality of through holes opening to the first surface and the second surface; a conductive layer provided at least on the first surface; and a derivatizing agent provided to the plurality of through holes to derivatize the components.
H01J 49/04 - Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locksArrangements for external adjustment of electron- or ion-optical components
H01J 49/00 - Particle spectrometers or separator tubes
H01J 49/16 - Ion sourcesIon guns using surface ionisation, e.g. field-, thermionic- or photo-emission
56.
DRY ICE CLEANING APPARATUS FOR SEMICONDUCTOR WAFERS AND METHOD FOR CLEANING SEMICONDUCTOR WAFERS
A problem is to provide a dry ice cleaning apparatus for semiconductor wafers and a method for cleaning semiconductor wafers that can reduce the amount of particles, etc. on the surface of semiconductor wafers, prevent deterioration of cleaning efficiency due to ice formation, and continuously and effectively clean a large number of semiconductor wafers. Provided is a dry ice cleaning apparatus for semiconductor wafers including a cleaning chamber (1) into which semiconductor wafers (W) are sequentially carried and which has an internal space (11) for cleaning the semiconductor wafers (W), a jet cleaning nozzle (5) that is disposed in the internal space (11) of the cleaning chamber (1) and jets dry ice (D) toward the cleaning surface of the semiconductor wafer (W), and a transfer robot (2) that is disposed in the internal space (11) of the cleaning chamber (1) and sequentially carries the semiconductor wafers (W) from the outside of the cleaning chamber (1) into the internal space (11), wherein the jet cleaning nozzle (5) jets dry ice (D) onto the semiconductor wafer (W) while the semiconductor wafer (W) carried into the internal space (11) is held by the transfer robot (2) non-horizontally.
B08B 7/00 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass
H01L 21/304 - Mechanical treatment, e.g. grinding, polishing, cutting
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
The object of the present invention is to provide a stable isotope concentration method that reduces equipment cost and power without prolonging the start-up time and enables efficient concentration, and the present invention provides a stable isotope concentration method using multiple cascaded distillation columns (1st column to mth column; m is an integer of 2 or more), wherein the method includes a step in which one of gas and liquid is supplied from a position in the vicinity of the bottom of a (n−1)th column to a position in the vicinity of the top of an nth column (1
The purpose of the present invention is to provide: a conductive paste that makes it possible to form a conductive film that has excellent conductivity and does not readily release fine copper particles, even when sintered by radiation with radiant energy that can sufficiently remove a binder resin; a conductive film–coated substrate that uses the conductive paste; and a production method for the conductive film–coated substrate. The present invention provides: a conductive paste that contains fine copper particles that have an average particle size of no more than 300 nm, coarse copper particles that have an average particle size of 3–11 μm, a binder resin, and a dispersion medium, there being 0.1–2.0 parts by mass of the binder resin per 100 total parts by mass of the fine copper particles and the coarse copper particles; a conductive film–coated substrate that comprises a substrate and a sintered product of the conductive paste that is provided on the substrate; and a production method for the conductive film–coated substrate that involves providing a film that includes the conductive paste on the substrate and then sintering the film.
H01B 1/22 - Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
H01B 5/14 - Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
H05K 3/12 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using printing techniques to apply the conductive material
An object of the present invention is to provide a container for cryopreservation and transportation which is excellent in maintainability and can appropriately control the temperature of an object to be frozen. The present invention provides a container for cryopreservation and transportation used to transport an object to be frozen, including: a thermal insulation container having an upper opening; a thermal insulation lid which closes the upper opening of the thermal insulation container; and a cooling unit which is held in the thermal insulation container while absorbing liquid nitrogen, wherein a housing space for accommodating a storage tool for storing the object to be frozen is provided inside the thermal insulation container, and the cooling unit is detachable through the upper opening of the thermal insulation container while the storage tool located in the housing space is housed in the thermal insulation container.
F25D 3/10 - Devices using other cold materialsDevices using cold-storage bodies using liquefied gases, e.g. liquid air
B65D 81/38 - Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents with thermal insulation
60.
MULTISTAGE BATH CONDENSER-REBOILER AND CRYOGENIC AIR SEPARATION UNIT USING THE SAME
One object of the present invention is to provide a multistage bath condenser-reboiler capable of suppressing a decrease in condensation efficiency and making it compact. The present invention provides a multistage bath condenser-reboiler, including: a heat exchange core including a heat exchange section formed by adjacently stacking an evaporation passage through which liquid to be evaporated flows, and which is partitioned into a plurality of stages, and a condensation passage through which gas is condensed by heat exchange with the liquid; a liquid reservoir which is configured to store liquid which is supplied into the evaporation passage or flowed out from the evaporation passage; and a liquid communication passage which is configured to flow the liquid in the liquid reservoir from an upper liquid reservoir into a lower liquid reservoir; and the liquid reservoir is provided for each evaporation passage partitioned into the plurality of stages on at least one side surface in a width direction of the heat exchanger core, which is orthogonal to a stacking direction of the condensation passage and the evaporation passage, wherein the condensation passage is divided at least two stages, and wherein the multistage bath condenser-reboiler further comprises: a gas header which is provided at the top of each stage of the condensation passage to supply the gas into the condensation passage of each stage; condensation inlet flow channels which introduce the gas supplied in the gas header into the condensation passage; a liquid header which is provided at the bottom of each stage of the condensation passage, and collects liquid generated by condensation of the gas in the condensation passage, and condensation outlet flow channels which flow out the liquid generated by condensation into the liquid header.
F25J 3/04 - Processes or apparatus for separating the constituents of gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
F28D 9/00 - Heat-exchange apparatus having stationary plate-like or laminated conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall
F28F 3/02 - Elements or assemblies thereof with means for increasing heat-transfer area, e.g. with fins, with recesses, with corrugations
61.
ARGON TOWER FOR AIR SEPARATION DEVICE, AND AIR SEPARATION DEVICE
The objective of the present invention is to provide an argon tower for an air separation device, wherein the height of a distillation column can be reduced without reducing distillation performance. The present invention employs an argon tower (11) for an air separation device, said argon tower having upper sections and lower sections, wherein the bed lengths are identical for all of the upper sections and are identical for all of the lower sections, the upper section length is no greater than 72% of the total bed length, and the upper bed length is at least 1.25 times the lower bed length.
F25J 3/04 - Processes or apparatus for separating the constituents of gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
F25J 3/02 - Processes or apparatus for separating the constituents of gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
The objective of the present invention is to provide a deuterium recovery method and deuterium recovery equipment capable of recovering and reusing deuterium or a compound thereof used in a semiconductor manufacturing process. The present invention provides a deuterium recovery method comprising a heavy water generation step for generating heavy water in exhaust gas that contains deuterium gas in the semiconductor manufacturing process.
C25B 9/00 - Cells or assemblies of cellsConstructional parts of cellsAssemblies of constructional parts, e.g. electrode-diaphragm assembliesProcess-related cell features
63.
OXYGEN ISOTOPE CONCENTRATION METHOD AND OXYGEN ISOTOPE CONCENTRATION APPARATUS
The purpose of the present invention is to provide an oxygen isotope concentration method and an oxygen isotope concentration apparatus, whereby it becomes possible to feed ozone safely and stably without the need to increase the size of an apparatus. Provided is an oxygen isotope concentration method comprising: a photoreaction step for irradiating a first mixed fluid (F1) prepared by mixing ozone with a diluent substance (DS) with a laser beam to selectively decompose ozone containing an oxygen isotope and thereby generate oxygen containing an oxygen isotope, thereby producing a second mixed fluid (F2) containing oxygen, ozone and the diluent substance (DS) in a mixed state; a liquid reservoir part introduction step for introducing the second mixed fluid (F2) to a liquid reservoir part (10) to liquefy the second mixed fluid (F2); and a separation step for introducing the liquefied second mixed fluid (F2) to a separation column (21) by the action of a liquid head pressure generated by liquefying the second mixed fluid (F2) and storing the liquefied second mixed fluid (F2) in the liquid reservoir part (10) to distill the liquefied second mixed fluid (F2), thereby separating the liquefied second mixed fluid (F2) into a third mixed fluid (F3) which contains ozone and the diluent substance (DS) in a mixed state and a product oxygen (PO) in which a heavy oxygen isotope component is concentrated. In the method, the liquid reservoir part (10) can store the liquefied second mixed fluid (F2) without being affected by heat input.
The purpose of the present invention is to provide a multilayer structure manufacturing device and manufacturing method with which control is possible to promote cooling speed in a discretionary layering region and with which it is easy to realize a desired metal structure with the control of the cooling speed. Provided is a multilayer structure manufacturing device (1A) comprising: a laser oscillator (14); a chamber (3); a shaping stage (4) having a powder head (8) for metal powder M capable of moving in the vertical direction inside the chamber (3); a plurality of temperature measurement probes (5A, 5B) that measure the temperature of the metal layer or a layered structure (20) being manufactured; and one or more temperature adjustment probes (6A, 6B) that adjust the temperature of the metal layer or the multilayer structure (20) being manufactured. The temperature measurement probe 5A and the temperature adjustment probe (6A) are embedded inside the powder head (8) of the shaping stage (4).
Provided are composite copper nanoparticles which has high dispersibility in an organic solvent, are rarely thermally shrunk when being sintered at 300°C or higher, and can be formed into a smooth electrode membrane. Composite copper nanoparticles are selected, in which the surface of each of copper nanoparticles is modified with a silane coupling agent, each of the copper nanoparticles has a coating film containing cuprous oxide and copper carbonate on at least a portion of the surface thereof, the mass carbon concentration is 0.5 to 1.5% by mass in which the whole concentration of the composite copper nanoparticles is 100% by mass, the mass carbon concentration associated with the silane coupling agent is 0.5 to 1.2% by mass in the above-mentioned mass carbon concentration, and the mass silicon concentration is 0.05 to 0.11% by mass in which the whole concentration of the composite copper nanoparticles is 100% by mass.
B22F 1/0545 - Dispersions or suspensions of nanosized particles
B22F 1/102 - Metallic powder coated with organic material
B22F 9/20 - Making metallic powder or suspensions thereofApparatus or devices specially adapted therefor using chemical processes with reduction of metal compounds starting from solid metal compounds
H01B 5/00 - Non-insulated conductors or conductive bodies characterised by their form
66.
COOLING/CIRCULATION DEVICE AND COOLING/CIRCULATION METHOD FOR SECONDARY REFRIGERANT
A cooling/circulation device for a secondary refrigerant which keeps device costs low and stably circulates a secondary refrigerant, wherein the cooling/circulation device 1 comprises: a liquefied gas supply line 2; a secondary refrigerant reserve tank 5 in which a secondary refrigerant is stored as a liquid; a secondary refrigerant circulation line 8 whereby secondary refrigerant supplied from the secondary refrigerant reserve tank 5 is made to circulate; and a secondary refrigerant heat exchanger 9 that performs heat exchange between the liquefied gas in the liquefied gas supply line 2 and the secondary refrigerant in the secondary refrigerant circulation line 8. After being led out to the secondary refrigerant heat exchanger 9, the liquefied gas supply line 2 is inserted into the secondary refrigerant reserve tank 5 and forms a secondary refrigerant condensation section 17 whereby secondary refrigerant supplied to the secondary refrigerant reserve tank 5 is condensed and liquefied. A temperature control valve 14 in which the control state switches in accordance with the height of the liquid level of the secondary refrigerant stored in the secondary refrigerant reserve tank 5 is provided to the liquefied gas supply line 2.
An object of the present invention is to provide a laminating-printing system which can further improve the quality of laminated-printed objects. The present invention provides a laminating-printing system including a laminating-printing unit (10) which prints the layers and sequentially laminates the layers; and a concentration adjusting unit (30) which adjusts the concentration of gas components in the shield gas, the laminating-printing unit (10) including: an irradiation section including an irradiation source of energy rays to irradiate the powder material, and a printing section including a chamber filled with the shield gas and a printing stage on which the layers are printed and laminated, and the concentration adjusting unit (30) including: a purification section which removes a first gas component which is an impurity in the shield gas based on the powder material; and a supply section which supplies a second gas component selected based on the powder material inside of the chamber as needed.
One object of the present invention is to provide an apparatus for producing inorganic spheroidized particles which can significantly reduce the amount of warming gas generated and suppress the generation of soot during combustion. The present invention provides an apparatus (10) for producing inorganic spheroidized particles, including a burner (11) for producing inorganic spheroidized particles, a vertical spheroidizing furnace (15), an ammonia supply source (12), an oxygen supply source (13), an ammonia supply line (L1) located between the ammonia supply source (12) and the burner (11) for producing inorganic spheroidized particles, and an oxygen supply line (L2) located between the oxygen supply source (13) and the burner (11) for producing inorganic spheroidized particles.
The object of the present invention is to provide a high-temperature oxygen generation device and a high-temperature oxygen generation method which can efficiently supply preheated high-temperature oxygen gas regardless of pressure conditions from normal pressure to high pressure, without requiring upsizing or expansion of the equipment, and the present invention provides a high-temperature oxygen generation device (10) in which a high-temperature gas (G4) and an oxygen gas (G3) to be heated are mixed to generate a high-temperature oxygen gas (G5), wherein the high-temperature oxygen generation device (10) includes a burner (1) which generates the high-temperature gas (G4), and a preheating chamber (7) which is provided on the downstream side of the burner (1) and mixes the high-temperature gas (G4) and the oxygen gas (G3) to be heated, and the burner (1) includes a combustion chamber (5) which forms a flame by a fuel gas (G1) and an oxygen gas (G2) for combustion, a fuel flow path (2) which supplies the fuel gas (G1) into the combustion chamber (5), a first oxygen flow path (3) and a second oxygen flow path (4) which supply the oxygen gas (G2) for combustion into the combustion chamber (5), and a flow path (6) for oxygen to be heated which communicates with the preheating chamber (7), and supplies the oxygen gas (G3) to be heated toward the preheating chamber (7).
F23D 14/22 - Non-premix gas burners, i.e. in which gaseous fuel is mixed with combustion air on arrival at the combustion zone with separate air and gas feed ducts, e.g. with ducts running parallel or crossing each other
BURNER FOR PRODUCING INORGANIC SPHEROIDIZED PARTICLES, APPARATUS FOR PRODUCING INORGANIC SPHEROIDIZED PARTICLES, AND METHOD FOR PRODUCING INORGANIC SPHEROIDIZED PARTICLES
One object of the present invention is to provide a burner for producing inorganic spheroidized particles which can efficiently melt and spheroidize even organic powder with a large particle size distribution. The present invention provides a burner for producing inorganic spheroidized particles, including; a raw material powder supply path configured to supply inorganic powder as raw material powder; a first fuel gas supply path (3A) configured to supply a first fuel gas; and a first combustion-supporting gas supply path (4A) configured to supply a first combustion-supporting gas; wherein the raw material powder supply path includes: a first supply path (2A) configured to extend in an axial direction of the burner (1); a first collision wall (2D) configured to be located at the top of the first supply path (2A); a plurality of second supply paths (2B) configured to be branched from the top of the first supply path (2A), and extend radially from the center of the burner (1); one or more dispersion chambers (2C) configured to be located at the top of the second supply path (2B), and have a space in which the cross-sectional area is larger than the cross-sectional area in the second supply path (2B); and one or more raw material ejection holes (2a) configured to communicate with the dispersion chamber (2C).
F23D 14/02 - Premix gas burners, i.e. in which gaseous fuel is mixed with combustion air upstream of the combustion zone
F23D 14/70 - Baffles or like flow-disturbing devices
F27B 1/06 - Shaft or like vertical or substantially vertical furnaces of other than up-draught type
F27B 1/08 - Shaft or like vertical or substantially vertical furnaces heated otherwise than by solid fuel mixed with charge
71.
BURNER FOR PRODUCING INORGANIC SPHEROIDIZED PARTICLES, APPARATUS FOR PRODUCING INORGANIC SPHEROIDIZED PARTICLES, AND METHOD FOR PRODUCING INORGANIC SPHEROIDIZED PARTICLES
One object of the present invention is to provide a burner for producing inorganic spheroidized particles which can significantly reduce the amount of warming gas generated and suppress the generation of soot during combustion. The present invention provides a burner (1) for producing inorganic spheroidized particles, including a raw material powder supply path (2A) which supplies inorganic powder as raw material powder; a first fuel gas supply path (3A) which supplies a first fuel gas containing no carbon source; and a first combustion-supporting gas supply path (4A) which supplies a first combustion-supporting gas.
B01J 2/16 - Processes or devices for granulating materials, in generalRendering particulate materials free flowing in general, e.g. making them hydrophobic by suspending the powder material in a gas, e.g. in fluidised beds or as a falling curtain
F23D 14/02 - Premix gas burners, i.e. in which gaseous fuel is mixed with combustion air upstream of the combustion zone
F23D 14/22 - Non-premix gas burners, i.e. in which gaseous fuel is mixed with combustion air on arrival at the combustion zone with separate air and gas feed ducts, e.g. with ducts running parallel or crossing each other
F23D 14/58 - Nozzles characterised by the shape or arrangement of the outlet or outlets from the nozzle, e.g. of annular configuration
F23D 14/68 - Treating the combustion air or gas, e.g. by filtering or moistening
The present invention relates to cylinder packages utilized in the delivery of highly toxic and/or flammable compounds to semiconductor manufacturers. More specifically, the present invention provides a cartridge adapted to removably attach to the gas outlet of a gas discharge passageway in a cylinder valve provided on a toxic gas containing cylinder package, the cartridge comprising a cylindrically shaped housing having at least one end fitted with a barrier member permeable to the toxic gas contained within the cylinder package and the housing containing a toxic-gas getter material.
The present invention relates to cylinder packages utilized in the delivery of highly toxic and/or flammable compounds to semiconductor manufacturers. More specifically, the present invention provides a cartridge adapted to removably attach to the gas outlet of a gas discharge passageway in a cylinder valve provided on a toxic gas containing cylinder package, the cartridge comprising a cylindrically shaped housing having at least one end fitted with a barrier member permeable to the toxic gas contained within the cylinder package and the housing containing a toxic-gas getter material.
F16K 24/04 - Devices, e.g. valves, for venting or aerating enclosures for venting only
F17C 11/00 - Use of gas-solvents or gas-sorbents in vessels
B01J 20/28 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof characterised by their form or physical properties
B01J 20/08 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising oxides or hydroxides of metals not provided for in group comprising aluminium oxide or hydroxideSolid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising oxides or hydroxides of metals not provided for in group comprising bauxite
B01J 20/02 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material
B01J 20/04 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising compounds of alkali metals, alkaline earth metals or magnesium
B01J 20/22 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising organic material
B01J 20/10 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
B01J 20/20 - Solid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising free carbonSolid sorbent compositions or filter aid compositionsSorbents for chromatographyProcesses for preparing, regenerating or reactivating thereof comprising inorganic material comprising carbon obtained by carbonising processes
The present disclosure provides techniques for suppression of hydrogen degradation. In some embodiments, a method for decreasing an amount or rate of hydrogen degradation of a material, includes: (a) exposing a material to gaseous hydrogen peroxide; and (b) forming a hydroxyl layer on the surface of the material within a chamber. The hydroxyl layer can decrease an amount or rate of hydrogen degradation of the material when exposed to hydrogen. In some embodiments, a system includes: a chamber; a material within the chamber; an inlet to the chamber; a hydrogen peroxide source coupled to the inlet via a conduit; and an outlet from the chamber for removing species from the chamber. The system can be configured to perform the method for decreasing an amount or rate of hydrogen degradation of a material.
C23F 11/18 - Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using inorganic inhibitors
This turbo Brayton refrigeration machine (11) is characterized by comprising a first circulation path (L1) in which a first refrigerant circulates, a second circulation path (L2) in which a second refrigerant that is to be cooled circulates, a sub-cooler (22) that is disposed spanning the first circulation path (L1) and the second circulation path (L2) and that has a single heat exchange unit, and an expansion turbine (21) that is positioned on the primary side of the sub-cooler (22) in the first circulation path (L1), the turbo Brayton refrigeration machine (11) being further characterized in that the pressure ratio in the expansion turbine (21) is such that the outlet temperature of the expansion turbine (21) is higher than the condensation point of the second refrigerant.
An air separation device for distilling air at a low temperature, includes a high-pressure column to separate high-pressure raw material air into high-pressure nitrogen gas and high-pressure oxygen-enriched liquefied air; a low-pressure column to separate the high-pressure oxygen-enriched liquefied air into low-pressure nitrogen gas, low-pressure liquefied oxygen, and argon-enriched liquefied oxygen; an argon column to separate the argon-enriched liquefied oxygen having a pressure higher than the pressure into argon gas and medium-pressure liquefied oxygen; first and second indirect heat-exchangers; first and second gas-liquid separation chambers; a first/second passage which communicates the gas/liquid phase of the low-pressure column and the gas phase of the second gas-liquid separation chamber; and a first/second opening/closing mechanism located on the first/second passage.
F25J 3/04 - Processes or apparatus for separating the constituents of gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
77.
PROTEIN PRODUCTION METHOD AND CELL-FREE PROTEIN SYNTHESIS KIT
The object of the present invention is to provide a protein production method capable of producing an active protein with high efficiency even at a low temperature, and a cell-free protein synthesis kit. A protein production method including producing a protein with a reaction solution of a cell-free protein synthesis system containing either one or both of a cold shock protein and a nucleic acid containing a coding region encoding an amino acid sequence of the cold shock protein. A cell-free protein synthesis kit including one or both of a cold shock protein and a nucleic acid containing a coding region encoding an amino acid sequence of the cold shock protein, and a reaction solution of a cell-free protein synthesis system.
The present invention provides, as a radioactive halogen-labeled precursor compound that is highly stable and reactive, a compound represented by general formula (II) [in the formula, R1and R2each independently represent an alkyl group having 5-20 carbon atoms, X1and X2each independently represent a halogen atom, and R3 represents a monovalent group derived from a sugar].
C07C 309/84 - Halides of sulfonic acids having halosulfonyl groups bound to acyclic carbon atoms of a carbon skeleton substituted by carboxyl groups
C07D 319/06 - 1,3-DioxanesHydrogenated 1,3-dioxanes not condensed with other rings
C07D 405/06 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
C07D 407/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
C07F 13/00 - Compounds containing elements of Groups 7 or 17 of the Periodic Table
The purpose of the present invention is to provide a torch suitable for disposing a non-consumable electrode rotatably around a centrally positioned filler wire. Provided is a torch comprising: a wire guide (2) which feeds a filler wire W toward a tip end; a rotation cylinder (3) which is attached so as to surround the wire guide (2) and be rotatable about the axis of the wire guide (2); a torch body (4) which holds therein the rotation cylinder 3 such that the rotation cylinder (3) protrudes from the tip end side thereof; and a torch nozzle (7) which is attached to the tip end side of the rotation cylinder (3) so as to surround the tip end side of the wire guide (2) and which discharges a shield gas (G) from the tip end thereof. Provided to the torch nozzle (7) is a non-consumable electrode (T) that extends toward the tip end of the filler wire W. The orientation of the non-consumable electrode (T) facing the filler wire (W) can be changed by rotation of the rotation cylinder (3).
An object of the present invention is to provide a freezing transport container which can store large samples such as bag shapes and allows easy removal and installation of a cryogenic liquefied gas absorber which is impregnated with cryogenic liquefied gas such as liquid nitrogen, and a cryogenic liquefied gas absorber case which can be installed in the freezing transport container, and the present invention provides a freezing transport container (1) including a main body (3) which has a heat-insulating structure, an opening (3a) at the top, and a bottomed tubular shape, and a lid (5) which is installed at the opening (3a) of the main body (3) so as to open and close the opening (3a) of the main body (3), wherein the main body (3) has the same diameter at the opening (3a) at the top and the bottom, the freezing transport container (1) further includes a cryogenic liquefied gas absorber case (7) which is installed removably at the bottom of the main body (3), and the cryogenic liquefied gas absorber case (7) includes a case portion (11) which has a bottomed tubular shape and a cryogenic liquefied gas absorber (13) which is installed replaceably inside the case portion (11).
The purpose of the present invention is to provide a freezer control method, a freezer control program, and a freezer that enable suppression of rapid change in the rotation speed of a turbo compressor, and the present invention provides a freezer control method comprising: a second-control-mode shifting instruction step for giving an instruction for shifting from a first control mode to a second control mode; a second-temperature-regulator set value revision step for revising the set value (SV2) for a second temperature regulator from SV21 to PV21, which is a present value (PV2) for the second temperature regulator; a second-temperature-regulator manipulated variable revision step for revising the manipulated variable (MV2) of the second temperature regulator to MV11, which is the manipulated variable (MV1) of a first temperature regulator; a second control point switching step for switching the rotation speed control for the turbo compressor from that dependent on the manipulated variable (MV1) of the first temperature regulator to that dependent on the manipulated variable (MV2) of the second temperature regulator; and a second-temperature-regulator set value chronological-change step for chronologically changing the set value (SV2) for the second temperature regulator from PV21 to SV21.
The purpose of the present invention is to provide a device and method that are for enrichment of stable isotopes, that enable reduction in the emission amount of toxic and flammable substances, or substances having an environmental impact in the atmosphere, and that enable reduction in the amount of materials used. The present invention provides a stable isotope enrichment device comprising: a distillation column group including a plurality of distillation columns connected in a cascade; a material feed line (30) that feeds materials to a first distillation column (1); a product extraction line (31) that extracts a product from another distillation column located on the secondary side of the first distillation column (1); an isotope-depleted fluid withdrawal line (32) through which an isotope-depleted gas or isotope-depleted liquid is withdrawn from the first distillation column (1) or another distillation column located on the primary side of the first distillation column (1); an isotope exchange reactor (22) that regenerates the isotope-depleted gas or isotope-depleted liquid to form an isotope-regenerated gas or isotope-regenerated liquid, by subjecting the isotope-depleted gas or isotope-depleted liquid to an isotope exchange reaction so as to cause the concentration of stable isotope molecules in the isotope-depleted gas or isotope-depleted liquid to approach the natural abundance ratio; and an isotope-regenerated fluid feedback line (33) that feeds the isotope-regenerated gas or isotope-regenerated liquid back to the first distillation column (1).
In order to provide a stable isotope concentrating device with which it is possible to increase energy efficiency and to reduce installation costs, the present invention provides a stable isotope concentrating device (100) comprising a distillation column group in which a plurality of distillation columns are cascade-connected, the distillation column group having a shelf column group formed from one or more shelf columns and a filling column group formed from one or more filling columns, and the filling column group being positioned on the secondary side of the shelf column group.
NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY (Japan)
TAIYO NIPPON SANSO CORPORATION (Japan)
Inventor
Onodera Tomohiro
Kudo Kohsuke
Hosokawa Yoshiaki
Iwasaki Norimasa
Kameda Hiroyuki
Abstract
The present invention provides: an MRI contrast agent for detecting cartilage damage, which comprises 17O-labeled water; and a method and a program for detecting cartilage damage using the contrast agent. According to the present invention, it becomes possible to detect a damage in a cartilage, particularly a minor damage in the surface layer of a cartilage which has been difficult to detect so far, by using 17O-labeled water as a contrast agent.
A61B 5/055 - Detecting, measuring or recording for diagnosis by means of electric currents or magnetic fieldsMeasuring using microwaves or radio waves involving electronic [EMR] or nuclear [NMR] magnetic resonance, e.g. magnetic resonance imaging
85.
COMPOSITION FOR FLUORORESIN-CONTAINING COATING, COATING FILM, AND SUBSTRATE
One object of the present invention is to provide a composition for a fluororesin-containing coating which is less contaminated by carbon nanotubes, has sufficient conductivity, and has excellent workability at the time of coating. The present invention provides a composition for a fluororesin-containing coating containing carbon nanotubes, a fluororesin, and a dispersion medium, and the amount of the carbon nanotubes is 0.01˜0.5% by mass with respect to 100% by mass of the total of the fluororesin and the carbon nanotubes.
B22F 1/145 - Chemical treatment, e.g. passivation or decarburisation
B22F 9/22 - Making metallic powder or suspensions thereofApparatus or devices specially adapted therefor using chemical processes with reduction of metal compounds starting from solid metal compounds using gaseous reductors
B22F 1/16 - Metallic particles coated with a non-metal
The purpose of the present invention is to provide a gas separation method and a gas separation device with which it is possible to ensure high purity and recovery rate of a separated noble gas while reusing exhaust gasses from a facility in which the noble gas is used. Provided are: a gas separation method characterized by introducing a noble gas separated through pressure adsorption as a first introduction gas and a separated impurity gas as a second introduction gas into a raw material gas, and controlling the flow rate of the first introduction gas and the flow rate of the second introduction gas on the basis of the flow rate of each of the noble gas and the impurity gas in the exhaust gasses from a facility (20) in which the noble gas is used; and a gas separation device (1) comprising an introduction pipe (L6) for introducing the noble gas in a separation gas container 6 into the raw material gas, an introduction pipe (L7) for introducing the impurity gas in a separation gas container (7) into the raw material gas, a flowmeter (2) provided in a supply pipe (L1) for supplying the exhaust gasses from the facility (20) in which the noble gas is used, and a computation device (12), wherein the computation device (12) is electrically connected to the flowmeter (2), a flow rate controller (8), and a flow rate controller (9).
One object of the present invention is to provide a compact multistage liquid storage-type condenser-evaporator capable of producing two kinds of gases having different compositions without increasing power, and a nitrogen production device using the multistage liquid storage-type condenser-evaporator without increasing the power for producing nitrogen, and the present invention provides a multistage liquid storage-type condenser-evaporator including a bottom liquid storage section which is configured to store the liquid supplied into the bottom evaporation passage without circulating, and a fluid collection section which is configured to collect the fluid which flows out from the bottom evaporation passage and discharge to the outside without returning into the bottom liquid storage section.
F25J 3/04 - Processes or apparatus for separating the constituents of gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
C01B 21/04 - Purification or separation of nitrogen
F25J 5/00 - Arrangements of cold-exchangers or cold-accumulators in separation or liquefaction plants
F28D 9/00 - Heat-exchange apparatus having stationary plate-like or laminated conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall
F28D 21/00 - Heat-exchange apparatus not covered by any of the groups
The purpose of the present invention is to provide a carbon stable isotope enrichment method with which it is possible to enrich 13C to a high concentration without performing isotope scrambling and without requiring safety measures against flammability and toxicity. The present invention provides a carbon stable isotope enrichment method that includes a distillation step for distilling raw-material carbon tetrafluoride that contains a plurality of types of carbon tetrafluoride stable isotope molecules in a distillation column group in which a plurality of distillation columns are cascade-connected, and enriching carbon tetrafluoride stable isotope molecules including 13C.
C07C 17/383 - SeparationPurificationStabilisationUse of additives by distillation
90.
Cleaning apparatus for component for semiconductor production apparatus, cleaning method for component of semiconductor production apparatus, and cleaning system for component of semiconductor production apparatus
The object of the present invention is to provide a cleaning apparatus for a component of a semiconductor production apparatus, which is capable of preventing the attachment of reaction products into the cleaning processing furnace by a simple structure, the present invention provides a cleaning apparatus (1) for a component of a semiconductor production apparatus including: a cleaning processing furnace (2) which is configured to house the component (10) of a semiconductor production apparatus; a heating device (3); a gas introduction pipe (4); a gas discharge pipe (5); a decompression device (6); a first temperature control device (7); a second temperature control device (8); and a purge gas supply device (9).
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
The present disclosure provides techniques for suppression of hydrogen degradation. In some embodiments, a method for decreasing the amount or rate of hydrogen degradation of a material, includes: (a) exposing a material to gaseous hydrogen peroxide; (b) forming a hydroxyl layer on the surface of the material within a chamber; and (c) after forming the hydroxyl layer, exposing the material to hydrogen during a controlled process or application.
C23F 11/18 - Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using inorganic inhibitors
92.
MIXED-GAS SUPPLY DEVICE, DEVICE FOR PRODUCING METAL NITRIDE FILM, AND METHOD FOR PRODUCING METAL NITRIDE FILM
In order to provide a method for producing a metal nitride film having high film formation speed and exceptional productivity, the present invention provides a method for producing a metal nitride film, the method comprising forming, by chemical vapor deposition in which a metal-compound raw material and a nitrogen-containing-compound raw material are used, a metal nitride film on at least a portion of the surface of a substrate to be processed, wherein the nitrogen-containing-compound raw material includes hydrazine and ammonia.
C23C 16/448 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
H01L 21/31 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to form insulating layers thereon, e.g. for masking or by using photolithographic techniquesAfter-treatment of these layersSelection of materials for these layers
H01L 21/318 - Inorganic layers composed of nitrides
93.
SAMPLE SUPPORT, IONIZATION METHOD, AND MASS SPECTROMETRY METHOD
NATIONAL UNIVERSITY CORPORATION FUKUSHIMA UNIVERSITY (Japan)
Inventor
Kotani Masahiro
Ohmura Takayuki
Wakimura Akari
Terauchi Tsutomu
Taira Shu
Naito Yasuhide
Abstract
A sample support (1) is used for ionization of sample components and comprises: a substrate (2) having a first surface (2a), a second surface (2b) on the opposite side to the first surface, and a plurality of through-holes (2c) that are open to the first surface and the second surface; an electroconductive layer (5) provided at least on the first surface; and a derivatization agent (6) that is provided to the plurality of through-holes and that is for derivatizing the components.
H01J 49/04 - Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locksArrangements for external adjustment of electron- or ion-optical components
G01N 27/62 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosolsInvestigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electric discharges, e.g. emission of cathode
94.
MELTING/REFINING FURNACE FOR COLD IRON SOURCES, AND MELTING/REFINING FURNACE OPERATION METHOD
The purpose of the present invention is to provide a melting/refining furnace for cold iron sources and a melting/refining furnace operation method, whereby it becomes possible to improve the heating efficiency of a raw material and reduce the amount of electric power required for the melting of the raw material without causing the oxidization of the raw material, and to reduce a melting/refining time, and to improve productivity and reduce cost. The present invention provides a melting/refining furnace which is equipped with at least one through-hole (21) configured to penetrate through a furnace wall (2A) of an electric furnace (2) and an oxygen burner lance (3) arranged at the through-hole (21), in which the oxygen burner lance (3) has at least one combustion enhancing gas supply tube (31) and at least one fuel gas supply tube (32) each having an opening communicating with the inside of the electric furnace (2), and a high-temperature gas generation device 10 is provided in at least one of the combustion enhancing gas supply tubes (31).
The present disclosure provides techniques for suppression of hydrogen degradation. In some embodiments, a method for decreasing the amount or rate of hydrogen degradation of a material, includes: (a) exposing a material to gaseous hydrogen peroxide; (b) forming a hydroxyl layer on the surface of the material within a chamber; and (c) after forming the hydroxyl layer, exposing the material to hydrogen during a controlled process or application.
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
One object of the present invention is to provide a production method for powder that can produce powder which can suppress foaming of a melt and can produce a molded-article with good conductivity and appearance by melt-molding, the present invention provides a production method for powder containing a composite resin (2, 21, 22, 23) containing a thermomeltable resin (2a) and a conductive filler (2b), wherein the production method comprises: a dispersion preparing step in which a raw material powder containing the thermomeltable resin (2a), the conductive filler (2b), a dispersion medium in which the raw material powder and the conductive filler (2b) are dispersed, and a dispersant (3) for dispersing the conductive filler (2b) in the dispersion medium are mixed to prepare the dispersion: an intermediate powder recovering step in which the dispersion medium is removed from the dispersion and recovering an intermediate powder containing the composite resin (2, 21, 22, 23) and the dispersant (3); and a dispersant removing step in which the dispersant (3) is removed from the intermediate powder.
C08J 3/215 - Compounding polymers with additives, e.g. colouring in the presence of a liquid phase the polymer being premixed with a liquid phase at least one additive being also premixed with a liquid phase
B29B 9/12 - Making granules characterised by structure or composition
C08L 27/18 - Homopolymers or copolymers of tetrafluoroethene
The purpose of the present invention is to provide a stable isotope concentrating method which reduces equipment costs and power without prolonging activation time, and by which efficient concentration is possible. The present invention provides a stable isotope concentrating method that separates stable isotopes and uses a plurality of cascade-connected distillation towers (first through mth towers, m being an integer of 2 or higher), wherein one of either a gas or liquid is supplied from a position near the bottom of an (n-1)th tower to a position near the top of an nth (1
A helium circulation system includes a refrigerator configured to cool a gas refrigerant into a liquid refrigerant; a first path configured to feed the liquid refrigerant from the refrigerator to a Dewar; a second path configured to feed the gas refrigerant from the Dewar to a vaporized gas collector via the refrigerator; a third path configured to feed the gas refrigerant from the vaporized gas collector to the refrigerator; a fourth path configured to feed the gas refrigerant from the Dewar to the vaporized gas collector without via the refrigerator; and a control unit configured to feed the liquid refrigerant through the first path while feeding the gas refrigerant through the third path when the refrigerator is driven, and feed the gas refrigerant through the second path while feeding the gas refrigerant the fourth path, when the refrigerator is stopped.
F25J 1/02 - Processes or apparatus for liquefying or solidifying gases or gaseous mixtures requiring the use of refrigeration, e.g. of helium or hydrogen
F25J 1/00 - Processes or apparatus for liquefying or solidifying gases or gaseous mixtures
With the intention of providing a frozen transport container having excellent maintenance characteristics and being capable of proper temperature control of an object to be frozen, the present invention provides a frozen transport container (1A) to be used in transportation of frozen objects to be frozen, wherein: the frozen transport container is equipped with an insulated container (2) having an open upper section, an insulated lid (3) that closes an upper opening (2a) of the insulated container 2, and a cold storage unit (4) held inside the insulated container (2) with liquid nitrogen absorbed; a housing space (K) for housing a storage tool (50) for storing an object to be frozen is provided on the inside of the insulated container (2), and the cold storage unit (4) is detachable through the upper opening (2a) of the insulated container (2) while the storage tool (50) located in the housing space (K) is housed inside the insulated container (2).
C12M 1/00 - Apparatus for enzymology or microbiology
B65D 81/18 - Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents providing specific environment for contents, e.g. temperature above or below ambient
C12N 1/04 - Preserving or maintaining viable microorganisms
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
