Provided are: a composition for forming a hole transporting layer for perovskite solar cells, which is inexpensive and does not need to be used together with a dopant; and a compound which can be contained in a composition for forming a hole transporting layer. A compound represented by general formula (I) (wherein Ar represents an aryl group; A represents a structure represented by formula (II); Z's independently represent a hydrogen atom, a structure represented by general formula (III), or a structure represented by formula (IV), and maybe the same as or different from each other, wherein a case where each of Z's is a hydrogen atom is excluded; Y's independently represents at least one member selected from the group mentioned below; R1 and R2 independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R1 and R2 may together form a ring having one or two oxygen atoms; ×'s independently represent an alkyl group, an alkoxy group, an alkylthio group, a monoalkylamino group or a dialkylamino group each of which may be substituted by a halogen atom; k represents 0 or 1; l represents 2 or 3; m represents an integer of 1 to 6; and r represents 1 or 2; wherein, when k is 0, 1 is 3, m is 1 and all of three bonds of A are bonded to Z.
Provided are: a composition for forming a hole transporting layer for perovskite solar cells, which is inexpensive and does not need to be used together with a dopant; and a compound which can be contained in a composition for forming a hole transporting layer. A compound represented by general formula (I) (wherein Ar represents an aryl group; A represents a structure represented by formula (II); Z's independently represent a hydrogen atom, a structure represented by general formula (III), or a structure represented by formula (IV), and maybe the same as or different from each other, wherein a case where each of Z's is a hydrogen atom is excluded; Y's independently represents at least one member selected from the group mentioned below; R1 and R2 independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R1 and R2 may together form a ring having one or two oxygen atoms; ×'s independently represent an alkyl group, an alkoxy group, an alkylthio group, a monoalkylamino group or a dialkylamino group each of which may be substituted by a halogen atom; k represents 0 or 1; l represents 2 or 3; m represents an integer of 1 to 6; and r represents 1 or 2; wherein, when k is 0, 1 is 3, m is 1 and all of three bonds of A are bonded to Z.
C07C 217/92 - Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of non-condensed six-membered aromatic rings of the same non-condensed six-membered aromatic ring the nitrogen atom of at least one of the amino groups being further bound to a carbon atom of a six-membered aromatic ring
C07D 209/86 - CarbazolesHydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
C07C 211/54 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to two or three six-membered aromatic rings
H01L 51/42 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
C07C 223/06 - Compounds containing amino and —CHO groups bound to the same carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
C07C 323/36 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to a carbon atom of the same non-condensed six-membered aromatic ring the thio group being a sulfide group the sulfur atom of the sulfide group being further bound to an acyclic carbon atom
C07D 333/26 - Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulfur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
C07D 333/22 - Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
C07D 519/00 - Heterocyclic compounds containing more than one system of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring system not provided for in groups or
NATIONAL INSTITUTES FOR QUANTUM AND RADIOLOGICAL SCIENCE AND TECHNOLOGY (Japan)
Inventor
Miura Taichi
Nakayama Fumiaki
Takahashi Keiko
Kawano Mitsuko
Matsuzaki Yuji
Yuasa Noriyuki
Habu Masato
Iwaki Jun
Nishihara Shoko
Abstract
The purpose of the present invention is to provide a novel use of sulfated hyaluronic acid. The present invention provides a composition for a subject who has been exposed to radiation or who is at a risk of being exposed to radiation, the composition being for reducing and/or preventing one or more adverse effects associated with the exposure to radiation. The composition is characterized by including a sulfated hyaluronic acid. The present invention also provides a composition that contains as an active ingredient a fibroblast growth factor for use at an affected site where bleeding needs to be arrested, and that further contains a sulfated hyaluronic acid to protect the fibroblast growth factor.
Provided are: a composition for forming a hole transporting layer for perovskite solar cells, which is inexpensive and does not need to be used together with a dopant; and a compound which can be contained in a composition for forming a hole transporting layer. A compound represented by general formula (I) (wherein Ar represents an aryl group; A represents a structure represented by formula (II); Z's independently represent a hydrogen atom, a structure represented by general formula (III), or a structure represented by formula (IV), and may be the same as or different from each other, wherein a case where each of Z's is a hydrogen atom is excluded; Y's independently represents at least one member selected from the group mentioned below; R1and R2independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R1and R2 may together form a ring having one or two oxygen atoms; X's independently represent an alkyl group, an alkoxy group, an alkylthio group, a monoalkylamino group or a dialkylamino group each of which may be substituted by a halogen atom; k represents 0 or 1; l represents 2 or 3; m represents an integer of 1 to 6; and r represents 1 or 2; wherein, when k is 0, l is 3, m is 1 and all of three bonds of A are bonded to Z.) AA and
C07C 211/54 - Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to two or three six-membered aromatic rings
C07C 217/84 - Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of non-condensed six-membered aromatic rings of the same non-condensed six-membered aromatic ring the oxygen atom of at least one of the etherified hydroxy groups being further bound to an acyclic carbon atom
C07C 323/25 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
C07D 333/20 - Radicals substituted by singly bound hetero atoms other than halogen by nitrogen atoms
H01L 51/44 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Details of devices
The purpose of the present invention is to provide a cell culture method for hPSC that is suitable for industrial cell production and a substrate for cell culture. For example, the purpose of the present invention is to provide a culture method, whereby hPSC can be cultured and proliferated while maintaining the undifferentiated state or while maintaining the pluripotency without using supporting cells (feeder cells) impeding large-scaled cell production, and a culture substrate. Provided is a method for culturing pluripotent stem cells while maintaining the undifferentiated state, said method comprising a step for culturing cells in a medium containing sulfated hyaluronic acid but containing neither supporting cells nor bFGF, characterized in that the sulfated hyaluronic acid has a degree of sulfation of 7% or greater in terms of S content. Also provided is a substrate for cell culture that is coated with sulfated hyaluronic acid having a degree of sulfation of 7% or greater in terms of S content.
An embodiment of the present invention provides: an endo-M variant having an amino acid sequence in which the amino acid residue at position 251 of the amino acid sequence represented by SEQ ID NO: 1 is asparagines or alanine, and having an activity for catalyzing a hydrolysis reaction represented by the following reaction formula (1) (X is a group derived from carbohydrates, and Y is a monovalent substituent); or an endo-M variant having an amino acid sequence in which the amino acid residue at position 251 of the amino acid sequence represented by SEQ ID NO: 1 is asparagines or alanine, having a modified amino acid sequence having at least 80% homology to the amino acid sequence via deletion, addition or substitution of one or a plurality of amino acid residues other than the amino acid residue at position 251 of the amino acid sequence represented by SEQ ID. NO: 1, and having an activity for catalyzing the hydrolysis reaction represented by the following reaction formula (1).
An embodiment of the present invention provides a production method for producing glycopeptides or glycoproteins by reacting a sugar chain receptor with a sugar chain donor represented by general formula (1) (wherein X1 to X6 are sugar-derived groups or H, and Z1 is H or GlcNAc) in the presence of a mutant endo-β-N-acetylglucosaminidase (endoenzyme variant) that has an amino acid sequence in which the amino acid residue 175 of the amino acid sequence represented by SEQ ID NO: 1 is glutamine or alanine, or that has an amino acid sequence in which the amino acid residue 175 of the amino acid sequence represented by SEQ ID NO: 1 is glutamine or alanine and has an amino acid sequence that has been modified by deleting, adding or substituting one or a plurality of amino acid residues other than amino acid residue 175 of the amino acid sequence represented by SEQ ID NO: 1 so as to be at least 80% homologous with the aforementioned amino acid sequence.
A novel hyaluronidase inhibitor can be provided by using dermatan sulfate or a pharmacologically acceptable salt thereof, preferably dermatan sulfate or a pharmacologically acceptable salt thereof having a weight average molecular weight of 10,000 to 50,000 as an active ingredient of a mammalian hyaluronidase inhibitor. The hyaluronidase inhibitor can overcome a problem that hyaluronic acid (which is conventionally used in a pharmaceutical or cosmetic product) is degraded by hyaluronidase to lose its desirable effect.
Disclosed are: a hyaluronic acid composition which is purified by, in a purification process, subjecting a biological tissue to a treatment with a protease and a molecular weight fractionation and concentrating or lyophilizing the resulting product without performing a treatment with a quaternary ammonium salt or an organic solvent (e.g., an alcohol); a hyaluronic acid composition having a resistance against the activity of a mammalian hyaluronidase; an inhibitor of the decomposition of a glucosaminoglycan comprising the composition as an active ingredient; and a pharmaceutical, food or cosmetic comprising the composition as an active ingredient.
