Provided are: a compound suitable for use as a photoacid generator for resist compositions that has favorable sensitivity to actinic energy such as EB and EUV, has excellent resolution in lithography, and can reduce line width roughness (LWR) in fine patterns; and a resist composition containing said compound. Provided is an onium salt of formula (1). In formula (1), A-is a sulfonic acid anion or a carboxylic acid anion, and Q is any selected from the group consisting of a hydrogen atom; a fluorine atom; and linear, branched, or cyclic alkyl groups having 1-30 carbon atoms that may have a substituent. T is selected from the group consisting of a single bond; linear, branched, or cyclic alkylene groups having 1-30 carbon atoms that may have a substituent; linear, branched, or cyclic alkenylene groups having 2-30 carbon atoms that may have a substituent; arylenes group having 5-30 carbon atoms that may have a substituent; and heteroarylene groups having 3-30 carbon atoms that may have a substituent. L is a single bond or a divalent heteroatom-containing group. Z is a group represented by formula (2) and bonds with the L in place of any one hydrogen atom in said formula (2). M+is a monovalent onium cation. In formula (2), G is selected from the group consisting of -CO-, -C(=S)-, and -C(R122-. The two R1s may be the same or may be different. The two R1s may form a ring structure by the R1s bonding to each other directly by a single bond or through any one intermediary selected from the group consisting of an oxygen atom, a sulfur atom, and alkylene groups.
C07C 309/11 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing etherified hydroxy groups bound to the carbon skeleton with the oxygen atom of at least one of the etherified hydroxy groups further bound to a carbon atom of a six-membered aromatic ring
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
C07C 309/13 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
C07C 309/17 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing carboxyl groups bound to the carbon skeleton
C08F 12/00 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
C08F 20/12 - Esters of monohydric alcohols or phenols
Provided are: a polymer which mitigates sensitivity decrease caused by a decrease in energy application density in patterning performed by irradiation with strong particle beams or electromagnetic waves of particles and photon energy and which is used in a resist composition having excellent development contrast characteristics and etching resistance; a resist composition containing said polymer; a method for manufacturing a member using said resist composition; and a pattern formation method. The polymer includes: a unit A which has an onium salt structure and generates acid by irradiation with particle beams or electromagnetic waves; and an organometallic compound-containing unit B having a metal atom selected from the group consisting of Sn, Sb, Ge, Bi, and Te, wherein the unit A is a polymer represented by formula (1). (In general formula (1), R1is one selected from the group consisting of a hydrogen atom, a linear, branched, or cyclic C1–C6 alkyl group, and a linear, branched, or cyclic C2–C6 alkenyl group, and at least one hydrogen atom in the alkyl group and alkenyl group in R1may be substituted with a substituent; L is one selected from the group consisting of a direct bond, a carbonyl oxy group, a carbonyl amino group, a phenylene diyl group, a naphthalene diyl group, a phenylene diyl oxy group, a naphthalene diyl oxy group, a phenylene diyl carbonyl oxy group, a naphthalene diyl carbonyl oxy group, a phenylene diyl oxy carbonyl group, and a naphthalene diyl oxy carbonyl group; Sp is one among a direct bond, a linear, branched, or cyclic C1–C6 alkylene group which may have a substituent, and a linear, branched, or cyclic C2–C6 alkenylene group which may have a substituent, and at least one methylene group in Sp may be substituted with a divalent heteroatom-containing group; M+is a sulfonium cation group or an iodonium cation group; X-is a monovalent anion group; f is an integer of 2-4, and f X-bonded to R, f M+corresponding to X-, f R1, f L, and f Sp may be respectively the same as or different from each other; and R is a C1-C6 f-valent hydrocarbon group which may have a substituent, at least one hydrogen atom in R may be substituted with a substituent, and at least one methylene group in R may be substituted with a divalent heteroatom-containing group.)
C08F 8/00 - Chemical modification by after-treatment
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
The present invention provides a method for producing a patterned base material, the method being capable of removing an unintended cured layer, while maintaining a desired pattern mask. The present invention provides a method for producing a patterned base material, the method comprising: a first removal step (A) in which a precursor pattern mask in cured layer composite body, which comprises a base material and the precursor pattern mask that is formed of a cured layer formed on the base material and has a recessed part and a projected part, is processed with a first remover liquid so as to remove at least a part of the cured layer corresponding to the thickness of the cured layer in the recessed part, thereby obtaining a resist composite body which has a specific pattern mask from which the base material positioned in the recessed part is exposed; a surface treatment step (B) in which a surface treatment is performed on the resist composite body via the specific pattern mask, thereby obtaining a surface-treated composite body; and a second removal step (C) in which the specific pattern mask of the surface-treated composite body is removed by means of a second remover liquid, thereby obtaining a patterned base material. With respect to this method for producing a patterned base material, the removal conditions in the first removal step (A) and the removal conditions in the second removal step (C) are different from each other.
A curable composition for imprinting comprising component (A), which is a bifunctional (meth)acrylate monomer represented by general formula (1), component (B), which is a bifunctional urethane (meth)acrylate monomer represented by general formula (2), and component (C), which is a monofunctional monomer.
Provided are: a compound suitable for use as a photodisintegrable base for resist compositions which have satisfactory sensitivity to actinic energy, e.g., EB or EUV, have excellent resolution in lithography, and can give fine patterns reduced in line width roughness (LWR); and a resist composition containing the compound. The photoacid generator according to the present invention comprises an onium salt compound of formula (1). (In formula (1), R1and R2are each independently one selected from the group consisting of a hydrogen atom, an optionally substituted, linear, branched, or cyclic, C1-C30 alkyl group, an optionally substituted, linear, branched, or cyclic, C2-C30 alkenyl group, an optionally substituted, C5-C30 aryl group, and an optionally substituted, C3-C30 heteroaryl group, at least either thereof is not a hydrogen atom; when the R1and the R2have methylene groups, then at least one of the methylene groups of the R1and R2may have been replaced by a divalent group containing a heteroatom, the R1and the R2may be bonded to each other directly by a single bond or via an atom or group selected from the group consisting of an oxygen atom, a sulfur atom, a nitrogen-atom-containing group, a methylene group, and a carbonyl group, thereby forming a ring structure together with the nitrogen atom bonded thereto, at least the R1or the R22nn-; n is an integer of 1 or larger; and M+ is a monovalent onium cation.)
C07C 231/12 - Preparation of carboxylic acid amides by reactions not involving the formation of carboxamide groups
C07C 233/15 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a six-membered aromatic ring
C07D 211/34 - Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring carbon atoms with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
A sulfonium salt represented by a following general formula (1),
A sulfonium salt represented by a following general formula (1),
A sulfonium salt represented by a following general formula (1),
wherein in the general formula (1), each of R1 to R3 is independently an alkyl group, an aryl group, or a heteroaryl group;
A sulfonium salt represented by a following general formula (1),
wherein in the general formula (1), each of R1 to R3 is independently an alkyl group, an aryl group, or a heteroaryl group;
at least one carbon-carbon single bond contained in the alkyl group is optionally substituted with a carbon-carbon double bond or a carbon-carbon triple bond;
A sulfonium salt represented by a following general formula (1),
wherein in the general formula (1), each of R1 to R3 is independently an alkyl group, an aryl group, or a heteroaryl group;
at least one carbon-carbon single bond contained in the alkyl group is optionally substituted with a carbon-carbon double bond or a carbon-carbon triple bond;
at least one methylene group contained in the alkyl group is optionally substituted with at least one divalent heteroatom-containing group;
A sulfonium salt represented by a following general formula (1),
wherein in the general formula (1), each of R1 to R3 is independently an alkyl group, an aryl group, or a heteroaryl group;
at least one carbon-carbon single bond contained in the alkyl group is optionally substituted with a carbon-carbon double bond or a carbon-carbon triple bond;
at least one methylene group contained in the alkyl group is optionally substituted with at least one divalent heteroatom-containing group;
Ar1 is an arylene group;
A sulfonium salt represented by a following general formula (1),
wherein in the general formula (1), each of R1 to R3 is independently an alkyl group, an aryl group, or a heteroaryl group;
at least one carbon-carbon single bond contained in the alkyl group is optionally substituted with a carbon-carbon double bond or a carbon-carbon triple bond;
at least one methylene group contained in the alkyl group is optionally substituted with at least one divalent heteroatom-containing group;
Ar1 is an arylene group;
at least one of R1, R2, R3 and Ar1 has at least one substituent (R);
A sulfonium salt represented by a following general formula (1),
wherein in the general formula (1), each of R1 to R3 is independently an alkyl group, an aryl group, or a heteroaryl group;
at least one carbon-carbon single bond contained in the alkyl group is optionally substituted with a carbon-carbon double bond or a carbon-carbon triple bond;
at least one methylene group contained in the alkyl group is optionally substituted with at least one divalent heteroatom-containing group;
Ar1 is an arylene group;
at least one of R1, R2, R3 and Ar1 has at least one substituent (R);
at least two of R1 to R3, Ar1, and substituent (R) optionally form a ring;
A sulfonium salt represented by a following general formula (1),
wherein in the general formula (1), each of R1 to R3 is independently an alkyl group, an aryl group, or a heteroaryl group;
at least one carbon-carbon single bond contained in the alkyl group is optionally substituted with a carbon-carbon double bond or a carbon-carbon triple bond;
at least one methylene group contained in the alkyl group is optionally substituted with at least one divalent heteroatom-containing group;
Ar1 is an arylene group;
at least one of R1, R2, R3 and Ar1 has at least one substituent (R);
at least two of R1 to R3, Ar1, and substituent (R) optionally form a ring;
A is a divalent group selected from a group consisting of —S—, —SO—, and —SO2—;
A sulfonium salt represented by a following general formula (1),
wherein in the general formula (1), each of R1 to R3 is independently an alkyl group, an aryl group, or a heteroaryl group;
at least one carbon-carbon single bond contained in the alkyl group is optionally substituted with a carbon-carbon double bond or a carbon-carbon triple bond;
at least one methylene group contained in the alkyl group is optionally substituted with at least one divalent heteroatom-containing group;
Ar1 is an arylene group;
at least one of R1, R2, R3 and Ar1 has at least one substituent (R);
at least two of R1 to R3, Ar1, and substituent (R) optionally form a ring;
A is a divalent group selected from a group consisting of —S—, —SO—, and —SO2—;
Ar1 is substituted with A at an ortho-position with respect to a sulfonio group (S+); and
A sulfonium salt represented by a following general formula (1),
wherein in the general formula (1), each of R1 to R3 is independently an alkyl group, an aryl group, or a heteroaryl group;
at least one carbon-carbon single bond contained in the alkyl group is optionally substituted with a carbon-carbon double bond or a carbon-carbon triple bond;
at least one methylene group contained in the alkyl group is optionally substituted with at least one divalent heteroatom-containing group;
Ar1 is an arylene group;
at least one of R1, R2, R3 and Ar1 has at least one substituent (R);
at least two of R1 to R3, Ar1, and substituent (R) optionally form a ring;
A is a divalent group selected from a group consisting of —S—, —SO—, and —SO2—;
Ar1 is substituted with A at an ortho-position with respect to a sulfonio group (S+); and
X− is an anion.
C07C 309/06 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
A cell culture substrate having a high cell-adhesion portion and a low cell-adhesion portion, wherein; an adhesiveness to a cell of the high cell-adhesion portion and an adhesiveness to a cell of the low cell-adhesion portion are different from each other, the adhesiveness to the cell of the high cell-adhesion portion to cells is higher than the adhesiveness of the low cell-adhesion portion to the cell; and the high cell-adhesion portion has a cell adhesion layer containing two or more kinds of cell adhesion substances on the surface.
This curable composition for imprinting is a composition containing: a component (A) that is a bifunctional (meth)acrylate monomer represented by general formula (1); and a component (B) that is a bifunctional urethane (meth)acrylate monomer represented by general formula (2).
C08F 299/06 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
B29C 59/02 - Surface shaping, e.g. embossingApparatus therefor by mechanical means, e.g. pressing
9.
ONIUM SALT, PHOTOACID GENERATOR, COMPOSITION, AND METHOD FOR PRODUCING DEVICE USING SAME
Provided is an onium salt for a resist composition which is highly sensitive to particle rays or electromagnetic waves, and specifically, to electron rays or extreme ultraviolet radiation. The onium salt is represented by a formula selected from general formulas (1) and (2). (In formulas (1) and (2), R1is any one selected from the group consisting of: a straight-chain, branched or cyclic alkyl group which has a carbon number of 1-12 and may have a substituent group; a straight-chain, branched or cyclic alkenyl group which has a carbon number of 2-12 and may have a substituent group; an aryl group which has a carbon number of 6-14 and may have a substituent group; and a heteroaryl group which has a carbon number of 3-12 and may have a substituent group. R2, R3and R4each independently represent an atom or group selected from the group consisting of an alkyl group, a hydroxy group, a mercapto group, an alkoxy group, an alkyl carbonyl group, an aryl carbonyl group, a heteroaryl carbonyl group, an alkoxy carbonyl group, an aryloxy carbonyl group, a heteroaryloxy carbonyl group, an aryl sulfanyl carbonyl group, a heteroaryl sulfanyl carbonyl group, an aryl sulfanyl group, a heteroaryl sulfanyl group, an alkyl sulfanyl group, an aryl group, a heteroaryl group, an aryloxy group, a heteroaryloxy group, an alkyl sulfinyl group, an aryl sulfinyl group, a heteroaryl sulfinyl group, an alkyl sulfonyl group, an aryl sulfonyl group, a heteroaryl sulfonyl group, an aryl sulfonyl group, a heteroaryl sulfonyl group, a (meth)acryloyloxy group, a hydroxy(poly)alkyleneoxy group, an alkylamino group, a dialkylamino group, a cyano group, a nitro group and a halogen atom. When R2, R3and R4have a carbon, the carbon number thereof is 1-12. When R2, R3and R4have a hydrogen atom, said hydrogen atom may be substituted with a substituent group. R1and a ring from among the benzene ring to which R2bonds and the benzene ring to which R3bonds may directly form a ring structure via a single bond, or may form said ring structure along with a sulfur atom to which the same bond with an atom or group selected from the group consisting of an oxygen atom, a sulfur atom, a nitrogen atom-containing group and a methylene group interposed therebetween. When R1has a methylene group, one or more of said methylene groups may be substituted with a divalent heteroatom-containing group. R5and R6each independently represent one group selected from the group consisting of: a straight-chain, branched or cyclic alkyl group which has a carbon number of 1-12 and may have a substituent group; a straight-chain, branched or cyclic alkenyl group which has a carbon number of 2-12 and may have a substituent group; an aryl group which has a carbon number of 6-14 and may have a substituent group; and a heteroaryl group which has a carbon number of 3-12 and may have a substituent group. R5and R6may form a ring structure by directly bonding with one another via a single bond, or may form said ring structure by bonding with one another with an atom or group selected from the group consisting of an oxygen atom, a sulfur atom and an alkylene group interposed therebetween. One or more methylene groups in R5and R6may be substituted with a divalent heteroatom-containing group. L1represents one bond or group selected from the group consisting of: a direct bond; a straight-chain, branched or cyclic alkylene group having a carbon number of 1-12; an alkenylene group having a carbon number of 2-12; and a sulfinyl group, a sulfonyl group and a carbonyl group. Y is an oxygen atom or a sulfur atom. a is an integer of 0-4. b is an integer of 0-3. c is an integer of 1-5. d is an integer of 0-2. e is an integer of 1-4. (However, when R1and one ring among the benzene ring to which R2bonds and the benzene ring to which R3bonds form the ring structure along with the sulfur atom, a is 0-3 or b is 0-2 in formula (1) and a is 0-3 or d is 0-1 in formula (2).) One or more of the benzene rings in formulas (1) and (2) may be a six-membered heteroaromatic ring which has a heteroatom in the ring. When the benzene ring to which R4bonds in formulas (1) and (2) is said heteroaromatic ring, e is 0-4. When there are two or more R4present in formulas (1) and (2), two of the R4may form a ring structure by coupling with one another. X-is a monovalent anion group. f is an integer of 1-3. When f is two or more, X- may be the same as one another or differ from one another. R is an organic group having a valence of f.)
C07D 409/04 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring- member bond
The present invention provides a method for manufacturing an imprint molded product, comprising: a step (a) of forming a curable composition layer by using a curable composition; a step (b) of bringing the curable composition layer into contact with a mold having an uneven pattern; a step (c) of curing the curable composition layer to obtain a cured layer having an uneven pattern; and a step (d) of performing at least one surface treatment selected from the group consisting of plasma irradiation or corona treatment on at least a part of the cured layer to obtain an imprint molded product having a first surface, wherein a center line average roughness of the first surface is made 0.5 nm or more by the surface treatment.
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
B29C 59/02 - Surface shaping, e.g. embossingApparatus therefor by mechanical means, e.g. pressing
B29C 59/10 - Surface shaping, e.g. embossingApparatus therefor by electric discharge treatment
B29C 59/14 - Surface shaping, e.g. embossingApparatus therefor by plasma treatment
C08J 7/00 - Chemical treatment or coating of shaped articles made of macromolecular substances
11.
POLYMER, RESIST COMPOSITION CONTAINING SAID POLYMER, METHOD FOR MANUFACTURING MEMBER USING SAME, PATTERN FORMATION METHOD, AND METHOD FOR FORMING REVERSAL PATTERN
Provided are: a polymer used in a resist composition which has high absorption efficiency and which is superior in the characteristics of sensitivity, resolution, and pattern performance, and whereby the effects of decreased sensitivity and worsening of pattern roughness that occur due to a decrease in energy application density are mitigated in patterning formed by particles and irradiation with electromagnetic waves or a particle beam having high photon energy; a resist composition containing the polymer; and a method for manufacturing a member using the polymer and the resist composition. The polymer includes: a unit A that has an onium salt structure and generates acid by irradiating a particle beam or an electromagnetic wave; and a unit B having a structure that bonds as a result of acid catalyst reaction. The unit A is indicated by formula (1). (In general formula (1), R1is any one selected from the group consisting of a hydrogen atom, a linear, branched, or cyclic C1–6 alkyl group, and a linear, branched, or cyclic C1–6 alkenyl group. At least one hydrogen atom in an alkyl group or alkenyl group in R1can be substituted with a substituent. L is any one selected from the group consisting of a direct bond, a carbonyl oxy group, a carbonyl amino group, a phenylene diyl group, a naphthalene diyl group, a phenylene diyl oxy group, a naphthalene diyl oxy group, a phenylene diyl carbonyl oxy group, a naphthalene diyl carbonyl oxy group, a phenylene diyl oxy carbonyl group, and a naphthalene diyl oxy carbonyl group. Sp is a direct bond, a linear, branched, or cyclic C1–6 alkylene group that may have a substituent, or a linear, branched, or cyclic C1–6 alkenylene group that may have a substituent. At least one methylene group among the Sp can be substituted by a divalent heteroatom-containing group. M+represents a sulfonium ion or an iodonium ion. X– represents a monovalent anion having an organic group including at least one selected from the group consisting of a hydroxyl group and a sulfonyl group.)
PHOTOCURABLE RESIN COMPOSITION FOR IMPRINT MOLDING, RESIN MOLD, METHOD FOR FORMING PATTERN USING SAID RESIN MOLD, COMPOSITE MATERIAL HAVING SAID RESIN MOLD, METHOD FOR PRODUCING SAID COMPOSITE MATERIAL, AND METHOD FOR PRODUCING OPTICAL MEMBER
This photocurable resin composition for imprint molding contains a component (a): a fluorine-containing (meth)acrylate monomer having at least one (meth)acryloyloxy group and/or a dialkylsiloxane-containing (meth)acrylate monomer having at least one (meth)acryloyloxy group; and a component (b): a non-cyclic difunctional (meth)acrylate monomer represented by formula (1), which has two (meth)acryloyloxy groups. The blending ratio of component (a) and component (b) is 1-97 to 99-3 in terms of mass ratio. The molecular weight of component (b) is 700 or less.
C08F 2/46 - Polymerisation initiated by wave energy or particle radiation
C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
C08G 61/04 - Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
This sulfonium salt is represented by general formula (1). (In general formula (1), R1to R322-; Ar1is an arylene group having 6-30 carbon atoms; at least one of R1to R3and Ar1has at least one substituent group (R) selected from the group consisting of a monovalent organic group having 1-20 carbon atoms, an amino group, a hydroxyl group, a cyano group, a nitro group and a halogen atom; at least two of R1to R3, Ar1and the substituent group (R) may form a ring with a sulfur atom and/or A bonded to R1to R3or Ar122-; A in Ar1is substituted at the ortho-position with respect to a sulfonio group (S+); and X- is an anion.)
Provided is an onium salt represented by general formula (1). (In general formula (1), X is any n-valent organic group selected from the group consisting of an aromatic group having 6-50 carbon atoms, a heteroaromatic group having 4-50 carbon atoms, an aliphatic group having 3-50 carbon atoms, and a heteroaliphatic group having 3-50 carbon atoms; the aromatic group, the heteroaromatic group, the aliphatic group, and the heteroaliphatic group may each have at least one bond selected from the group consisting of a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-carbon triple bond; the aromatic group, the heteroaromatic group, the aliphatic group, and the heteroaliphatic group may each have a substituent; Ctn2+ is an organic cation; n is an integer of 3-10; n1 and n2 are each independently an integer of 1-10; and n, n1, and n2 satisfy the condition of n=n1×n2.)
C07C 63/313 - Monocyclic acids containing more than three carboxyl groups
C07C 229/16 - Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of hydrocarbon radicals substituted by amino or carboxyl groups, e.g. ethylenediamine-tetra-acetic acid, iminodiacetic acids
C07C 279/18 - Derivatives of guanidine, i.e. compounds containing the group the singly-bound nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of guanidine groups bound to carbon atoms of six-membered aromatic rings
C08G 59/68 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the catalysts used
C08G 18/18 - Catalysts containing secondary or tertiary amines or salts thereof
This cell culture substrate has a high cell adhesion portion and a low cell adhesion portion, wherein: the high cell adhesion portion and the low cell adhesion portion have different levels of cell adhesiveness; the cell adhesiveness of the high cell adhesion portion is higher than the cell adhesiveness of the low cell adhesion portion; and the high cell adhesion portion has, on the surface thereof, a cell adhesive layer including two or more cell adhesive materials.
A long-life catalyst which can be easily and inexpensively manufactured and has high activity and suppressed leakage of metal. A catalyst according to some embodiments includes: a substrate; and a first metal atom as a catalytic center. The substrate contains a non-metallic atom and a second metal atom, and the non-metallic atom is any one selected from the group consisting of a group 15 element, a group 16 element and a group 17 element.
B01J 31/06 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing polymers
B01J 31/12 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing organo-metallic compounds or metal hydrides
B01J 31/26 - Catalysts comprising hydrides, coordination complexes or organic compounds containing in addition, inorganic metal compounds not provided for in groups
B01J 31/36 - Catalysts comprising hydrides, coordination complexes or organic compounds containing in addition, inorganic metal compounds not provided for in groups of vanadium, niobium or tantalum
B01J 37/02 - Impregnation, coating or precipitation
C07C 41/30 - Preparation of ethers by reactions not forming ether-oxygen bonds by increasing the number of carbon atoms, e.g. by oligomerisation
C07C 45/00 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds
C07C 45/62 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds by reactions not involving the formation of C=O groups by hydrogenation of carbon-to-carbon double or triple bonds
C07C 67/343 - Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisationPreparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by change of size of the carbon skeleton by increase in the number of carbon atoms
C07C 253/14 - Preparation of carboxylic acid nitriles by reaction of cyanides with halogen-containing compounds with replacement of halogen atoms by cyano groups
C07C 269/06 - Preparation of derivatives of carbamic acid, i.e. compounds containing any of the groups the nitrogen atom not being part of nitro or nitroso groups by reactions not involving the formation of carbamate groups
C07D 209/08 - IndolesHydrogenated indoles with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to carbon atoms of the hetero ring
C07D 239/26 - Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
C07F 7/08 - Compounds having one or more C—Si linkages
18.
POLYMER, RESIST COMPOSITION CONTAINING SAID POLYMER, METHOD FOR MANUFACTURING MEMBER USING SAME, PATTERN FORMATION METHOD, AND METHOD FOR FORMING REVERSAL PATTERN
Provided are: a polymer used in a resist composition which has high absorption efficiency and which is superior in the characteristics of sensitivity, resolution, and pattern performance, and whereby the effects of decreased sensitivity and worsening of pattern roughness that occur due to a decrease in energy application density are mitigated in patterning formed by particles and irradiation with electromagnetic waves or a particle beam having high photon energy; a resist composition containing the polymer; and a method for manufacturing a member using the polymer and the resist composition. The polymer includes: units A having an onium salt structure which is decomposed by irradiation with a particle beam, electromagnetic waves, or the like and undergoes polarity conversion due to conversion from an ionic to a non-ionic state, and also simultaneously generates a radical and an acid; and units B having a structure which bonds by an acid-catalyzed reaction. The units B are preferably units in which a compound represented by general formula (I) or (II) is bonded with an Sp group of formula (1) at any position in the compound.
An onium salt and a composition having high sensitivity and excellent pattern characteristics such as LWR, which is preferably used for a resist composition for a lithography process using two active energy rays of a first active energy ray such as an electron beam or an extreme ultraviolet and a second active energy ray such as UV.
A molded article manufacturing method comprising: a step of pressing a mold having a recess and/or a projection on a surface thereof onto a photo-curable positive electron beam resist; a step of irradiating the photo-curable positive electron beam resist being pressed onto with light for curing, and obtaining a positive electron beam resist molded article having a recess and a projection on a surface thereof; and a step of irradiating the surface of the positive electron beam resist molded article with an electron beam, and partially decomposing the positive electron beam resist molded article in a region that has been irradiated.
A curing agent or a curing accelerator which is easy to synthesize and may cure an epoxy resin and the like, or may accelerate the curing is provided. A curing agent or a curing accelerator according to some embodiments of the present invention has a highly-coordinated silicon structure.
A long life catalyst is provided that is conveniently and inexpensively capable of being produced and that is highly active and has inhibited metal leakage. According to aspects of the present invention, a catalyst is provided that includes: a polymer including a plurality of first structural units and a plurality of second structural units; and metal acting as a catalytic center, wherein at least part of the metal is covered with the polymer, each of the plurality of first structural units has a first atom constituting a main chain of the polymer and a first substituent group bonded to the first atom, a second atom included in each of the plurality of second structural units is bonded to the first atom, and the second atom is different from the first atom, or at least one of all substituent groups on the second atom is different from the first substituent group.
C07C 5/09 - Preparation of hydrocarbons from hydrocarbons containing the same number of carbon atoms by hydrogenation of carbon-to-carbon triple bonds to carbon-to-carbon double bonds
C07C 67/293 - Preparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group by isomerisationPreparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group by change of size of the carbon skeleton
C07C 67/303 - Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by hydrogenation of unsaturated carbon-to-carbon bonds
C07C 69/157 - Acetic acid esters of monohydroxylic compounds of unsaturated alcohols containing six-membered aromatic rings
C07C 69/612 - Esters of carboxylic acids having a carboxyl group bound to an acyclic carbon atom and having a six-membered aromatic ring in the acid moiety
C07C 209/36 - Preparation of compounds containing amino groups bound to a carbon skeleton by reduction of nitrogen-to-oxygen or nitrogen-to-nitrogen bonds by reduction of nitro groups by reduction of nitro groups bound to carbon atoms of six-membered aromatic rings
C07C 1/00 - Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon
C07C 45/32 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds by oxidation with molecular oxygen
C07C 2/00 - Preparation of hydrocarbons from hydrocarbons containing a smaller number of carbon atoms
C07C 49/04 - Saturated compounds containing keto groups bound to acyclic carbon atoms
C07C 51/353 - Preparation of carboxylic acids or their salts, halides, or anhydrides by reactions not involving formation of carboxyl groups by isomerisationPreparation of carboxylic acids or their salts, halides, or anhydrides by reactions not involving formation of carboxyl groups by change of size of the carbon skeleton
B01J 31/06 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing polymers
B01J 31/12 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing organo-metallic compounds or metal hydrides
B01J 21/06 - Silicon, titanium, zirconium or hafniumOxides or hydroxides thereof
B01J 37/18 - Reducing with gases containing free hydrogen
C07B 41/06 - Formation or introduction of functional groups containing oxygen of carbonyl groups
C07B 47/00 - Formation or introduction of functional groups not provided for in groups
C07C 1/32 - Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon starting from compounds containing hetero atoms other than, or in addition to, oxygen or halogen
C07C 2/86 - Preparation of hydrocarbons from hydrocarbons containing a smaller number of carbon atoms by condensation between a hydrocarbon and a non-hydrocarbon
C07C 5/08 - Preparation of hydrocarbons from hydrocarbons containing the same number of carbon atoms by hydrogenation of carbon-to-carbon triple bonds
C07C 45/34 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds by oxidation with molecular oxygen of CHx-moieties in unsaturated compounds
C07F 7/18 - Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
Photosensitive compound, photoacid generator and resist composition containing the photosensitive compound, and method for manufacturing device using the resist composition
A photosensitive compound which can be suitably used for a resist composition having superior sensitivity with respect to light of short wavelength such as KrF and the like, especially to extreme ultraviolet or electron beam, superior resolution and depth of focus in lithography, and can suppress LER (line edge roughness) in fine pattern, a resist composition using the photosensitive compound, and a manufacturing method of a device is provided. A photosensitive compound including a divalent Te atom is provided.
C07F 11/00 - Compounds containing elements of Groups 6 or 16 of the Periodic Table
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
24.
Metal-containing onium salt compound, photodegradable base, resist composition, and method for manufacturing device using said resist composition
A metal-containing onium salt compound suitable for use as a photodegradable base of a resist composition and a resist composition using the metal-containing onium salt compound are provided, the resist composition having excellent sensitivity to ionizing radiation such as extreme ultraviolet (EUV), excellent resolution and focal depth in lithography, and can reduce line width roughness (LWR) in a fine pattern. The onium salt compound including a specific metal is used as the photodegradable base.
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
C07C 309/19 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton containing rings
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
C07C 309/06 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
25.
PHOTO-ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE USING SAID RESIST COMPOSITION
Provided are: a compound which can be used suitably as a photodegradable base in a resist composition that has good sensitivity to an active energy, has excellent resolution in lithography and enables the reduction in line width roughness (LWR) in a fine pattern; and a resist composition prepared using the compound. A photo-acid generator containing an onium salt compound represented by formula (1). (In formula (1), R1and R2independently represent any one selected from the group consisting of a hydrogen atom, a linear, branched or cyclic alkyl group which has 1 to 30 carbon atoms and may have a substituent, a linear, branched or cyclic alkenyl group which has 5 to 30 carbon atoms and may have a substituent, an aryl group which has 5 to 30 carbon atoms and may have a substituent, and a heteroaryl group which has 3 to 30 carbon atoms and may have a substituent, wherein at least one of R1and R2is not a hydrogen atom, a methylene group in at least one of R1and R2may be substituted by a bivalent hetero-atom-containing group when each of R1and R2has a methylene group, and R1and R2may be directly bonded to each other via a single bond or may form a cyclic structure through at least one selected from the group consisting of an oxygen atom, a sulfur atom, a nitrogen-atom-containing group, a methylene group and a carbonyl group in conjunction with a nitrogen atom to which both of R1and R22nn-; n represents an integer of 1 or more; and S and M+ independently represent a monovalent onium cation.)
C07C 235/06 - Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
C07C 235/14 - Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a ring other than a six-membered aromatic ring
C07C 235/16 - Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a six-membered aromatic ring
Synthesis of organic compounds that has chirality is an important technique in the fields of pharmaceuticals, agrichemicals, health foods and the like. However, raw materials of a catalyst used for the synthesis of such compounds are expensive, and the synthesis needs many steps, so that it is difficult to reduce the cost. Linking a catalyst center to a polymer chain or a resin through an organic group enables to use the catalyst repeatedly and produce a chiral compound at low cost.
C07C 249/02 - Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton of compounds containing imino groups
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
C07D 317/28 - Radicals substituted by nitrogen atoms
B01J 31/02 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
C07D 401/06 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
C07D 519/00 - Heterocyclic compounds containing more than one system of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring system not provided for in groups or
B01J 38/00 - Regeneration or reactivation of catalysts, in general
C07D 223/14 - Heterocyclic compounds containing seven-membered rings having one nitrogen atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
C07C 251/24 - Compounds containing nitrogen atoms doubly- bound to a carbon skeleton containing imino groups having carbon atoms of imino groups bound to carbon atoms of six-membered aromatic rings
27.
Polymer, resist composition containing polymer, and method for manufacturing device using same
An object of the present invention is to provide a polymer used for a resist composition having high absorption efficiency for a particle beam or an electromagnetic wave, and excellence in sensitivity, resolution and pattern performance characteristics, and provide a resist composition containing the polymer and a method of manufacturing a device using thereof.
The polymer comprises: a unit A; and a unit B, wherein the unit A has an onium salt structure and generates a first radical by irradiation with a particle beam or an electromagnetic wave, the unit B has a radical generating structure containing at least one multiple bond which is between a carbon atom and a carbon atom or between a carbon atom and a heteroatom, and generates a second radical by irradiation with a particle beam or an electromagnetic wave, and the multiple bond is not one contained in a benzenoid aromatic.
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/031 - Organic compounds not covered by group
28.
PHOTOSENSITIVE COMPOUND, PHOTOACID GENERATOR AND RESIST COMPOSITION CONTAINING SAID PHOTOSENSITIVE COMPOUND, AND METHOD FOR MANUFACTURING DEVICE USING SAID RESIST COMPOSITION
Provided are a photosensitive compound, a photoacid generator, a resist composition using the same, and a method for manufacturing a device, wherein the photosensitive compound has good sensitivity to short-wavelength light such as KrF, particularly to extreme ultraviolet radiation (EUV) or electron beams (EB), enables excellent resolution and depth of focus in lithography, and can be suitably used for a resist composition capable of reducing line edge roughness (LER) in a fine pattern. The photosensitive compound contains divalent Te atoms.
Provided are: a metal-containing onium salt compound suitable for use as a photodisintegrable base for resist compositions which have satisfactory sensitivity to ionizing radiation such as extreme ultraviolet (EUV), are excellent in terms of resolution and focal depth in lithography, and can give fine patterns reduced in line width roughness (LWR); and a resist composition containing the metal-containing onium salt compound. The onium salt compound useful as a photodisintegrable base contains a specific metal.
C07C 309/04 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing only one sulfo group
C07C 309/07 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
Provided are an onium salt and a composition which are appropriately usable in a resist composition for a lithography process, wherein two kinds of active energy rays including first active energy rays such as electron beams or extreme ultraviolet rays and second active energy rays such as UV are used, and which are highly sensitive and have excellent pattern characteristics such as LWR. According to the present invention, an onium salt represented by one formula selected from among general formula (1), general formula (2), general formula (11) and general formula (12) is provided.
G03F 7/40 - Treatment after imagewise removal, e.g. baking
C07C 309/04 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing only one sulfo group
C07C 309/06 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
C07C 309/08 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing hydroxy groups bound to the carbon skeleton
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
C07C 309/19 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton containing rings
C07C 309/24 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of a carbon skeleton containing six-membered aromatic rings
C07C 303/32 - Preparation of esters or amides of sulfuric acidsPreparation of sulfonic acids or of their esters, halides, anhydrides or amides of salts of sulfonic acids
The present invention addresses the problem of providing a curing agent or a cure accelerator that cures an epoxy resin or the like, or facilitates curing thereof, and that is easy to synthesize. The curing agents and the cure accelerators according to some of the embodiments of the present invention have a highly coordinated silicon structure.
Provided is a resist composition that improves acid generation efficiency and is used to produce a photoresist having high sensitivity, high resolution, and high LWR properties. The present invention relates to a compound represented by general formula (1). (1) (In formula (1): Ar1 and Ar2 independently represent a phenylene group optionally having a substituent; R1 represents a member selected from the group consisting of a thioalkoxy phenyl group, an arylthio group, and a thioalkoxy group optionally having a substituent; X represents a member selected from the group consisting of a sulfur atom, an oxygen atom, and a direct bond; R2 represents either an aryl group or an alkyl group optionally having a substituent; each Y independently represents either an oxygen atom or a sulfur atom; R3 and R4 independently represent a linear, branched, or cyclic alkyl group optionally having a substituent; R3 and R4 are optionally bound to each other so as to form a ring structure together with two Y's in the formula; at least one of the carbon-carbon single bonds in the alkyl group included in R1, R2, R3, and R4 is optionally substituted with a carbon-carbon double bond or a carbon-carbon triple bond; and at least one of the methylene groups in the alkyl group included in R1, R2, R3, and R4 is optionally substituted with a heteroatom-containing divalent group.)
C07C 309/06 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
C07C 323/18 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
The present invention addresses the problem of providing a long life catalyst which can be produced simply and inexpensively, which exhibits high activity, and in which metal leakage is suppressed. Provided is a catalyst according to several aspects of the present invention, wherein the catalyst is characterized by containing a substrate and a first metal atom that serves as the catalyst core, with the substrate containing a non-metal atom and a second metal atom, and the non-metal atom being an element selected from the group consisting of elements of groups 15, 16 and 17.
B01J 31/28 - Catalysts comprising hydrides, coordination complexes or organic compounds containing in addition, inorganic metal compounds not provided for in groups of the platinum group metals, iron group metals or copper
C07C 1/32 - Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon starting from compounds containing hetero atoms other than, or in addition to, oxygen or halogen
C07C 15/44 - Cyclic hydrocarbons containing only six-membered aromatic rings as cyclic part substituted by unsaturated hydrocarbon radicals monocyclic the hydrocarbon substituent containing a carbon-to-carbon double bond
C07C 41/30 - Preparation of ethers by reactions not forming ether-oxygen bonds by increasing the number of carbon atoms, e.g. by oligomerisation
C07C 43/205 - Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring the aromatic ring being a non-condensed ring
C07C 45/45 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds by condensation
C07C 45/62 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds by reactions not involving the formation of C=O groups by hydrogenation of carbon-to-carbon double or triple bonds
C07C 47/02 - Saturated compounds having —CHO groups bound to acyclic carbon atoms or to hydrogen
C07C 49/255 - Unsaturated compounds containing keto groups bound to acyclic carbon atoms containing ether groups, groups, groups, or groups
C07C 67/343 - Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisationPreparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by change of size of the carbon skeleton by increase in the number of carbon atoms
C07C 209/10 - Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups by substitution of halogen atoms with formation of amino groups bound to carbon atoms of six-membered aromatic rings or from amines having nitrogen atoms bound to carbon atoms of six-membered aromatic rings
C07C 253/14 - Preparation of carboxylic acid nitriles by reaction of cyanides with halogen-containing compounds with replacement of halogen atoms by cyano groups
C07C 255/50 - Carboxylic acid nitriles having cyano groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
C07C 269/06 - Preparation of derivatives of carbamic acid, i.e. compounds containing any of the groups the nitrogen atom not being part of nitro or nitroso groups by reactions not involving the formation of carbamate groups
C07C 271/22 - Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by carboxyl groups
C07D 209/08 - IndolesHydrogenated indoles with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to carbon atoms of the hetero ring
C07D 239/26 - Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
[Problem] The present invention addresses the problem of providing a radiation-sensitive composition having excellent LWR, CDU, and EL performance, and a compound and polymer used in the same. [Solution] A polymer having structural units (I) including a group represented by formula (1). (In formula (1): R1 and R2 are each independently any group selected from the group consisting of a straight-chain or branched C1-10 monovalent aliphatic hydrocarbon group which may be substituted, a C3-15 monovalent alicyclic hydrocarbon group which may be substituted, a group in which at least one methylene group of the aforementioned aliphatic hydrocarbon group or alicyclic hydrocarbon group is substituted with a divalent heteroatom-containing group, a C6-30 aromatic hydrocarbon group which may be substituted, and a C6-30 aromatic heterocyclic group which may be substituted; R1 and R2 are directly bonded to each other by a single bond, or may form a ring structure via any species selected from the group consisting of an oxygen atom, a sulfur atom, and a methylene group; R3 is a C3-15 monovalent bridged alicyclic hydrocarbon group including at least any species selected from the group consisting of a lactone skeleton, a sultone skeleton, and a lactam skeleton which may be substituted; X is a single bond or a divalent linking group; and * represents a bonding site with the polymer main chain.)
Synthesis of an organic compound with chirality is an important technique in the fields of medicines, pesticides, health foods, etc. However, catalysts to be used for such synthesis are produced from expensive starting materials and, furthermore, the production process therefor involves a number of synthesis steps, which prevents cost reduction. According to the present invention, the catalytic center of a catalyst is bound to a polymer chain or a resin via an organic group so that the catalyst can be used repeatedly. As a result, a chiral compound can be produced at low cost.
C08F 212/14 - Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing hetero atoms
B01J 31/02 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
B01J 31/06 - Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides containing polymers
B01J 38/00 - Regeneration or reactivation of catalysts, in general
C07C 249/02 - Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton of compounds containing imino groups
C07C 251/24 - Compounds containing nitrogen atoms doubly- bound to a carbon skeleton containing imino groups having carbon atoms of imino groups bound to carbon atoms of six-membered aromatic rings
C07D 223/14 - Heterocyclic compounds containing seven-membered rings having one nitrogen atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
C07D 317/28 - Radicals substituted by nitrogen atoms
C07D 401/06 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
C07D 519/00 - Heterocyclic compounds containing more than one system of two or more relevant hetero rings condensed among themselves or condensed with a common carbocyclic ring system not provided for in groups or
C08F 8/00 - Chemical modification by after-treatment
The present invention addresses the problem of providing a polymer used in a resist composition having high absorption efficiency of particle beams or electromagnetic waves and excellent characteristics of sensitivity, resolution, and pattern performance, a resist composition containing the polymer, and a method for manufacturing a device using the polymer and resist composition. The polymer used in the resist composition includes: units A having an onium salt structure and generating a first radical by irradiation with a particle beam or electromagnetic waves; and units B having a radical-generating structure containing at least one multiple bond selected from the group consisting of a multiple bond between a carbon atom and a carbon atom and a multiple bond between a carbon atom and a hetero atom, the units B generating a second radical by irradiation with a particle beam or electromagnetic waves; the multiple bond in the radical-generating structure not being a multiple bond included in a benzene aromatic.
A suitable combination of a composition for formation of a resin mold with a pattern and a composition for formation of resin to which the pattern is transferred from the resin mold is found.
B29C 41/24 - Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped articleApparatus therefor for making articles of indefinite length
Provided is a device manufacturing method which includes the following: a step for forming a first film on a substrate by using a composition which includes a polymerizable monomer and an oxidation inhibitor; and a step for forming a second film by curing the first film in a state where at least a portion of a mold having an uneven pattern is brought into contact with the first film, or after at least a portion of the mold was brought into contact with the first film. The oxidation inhibitor is a hindered amine compound and/or a hindered phenol compound having a molecular weight of at least 700. The composition satisfies the relationship (t0(T)-tx(T))/t0(T)×100≤13.0. The manufacturing method is for a device that includes the substrate and the second film disposed on the substrate. (In the formula, t0(T) is the height of a protrusion of an unevenness of a cured film having such unevenness, the unevenness being obtained as a result of the following: after a coating film is formed using the composition, the coating film is brought into contact with an unevenness of the mold, the unevenness being such that the depth of recesses is 3μm and the line width thereof is 5μm, and in that contact state, the coating film is cured. tx(T) is the height of the protrusion obtained after the cured film is heated from 25ºC to 260ºC over five minutes, is subsequently maintained at 260ºC for five minutes, and then cooled to 25ºC over 30 minutes.)
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
C09D 133/06 - Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G03F 7/028 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
H01L 21/033 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or comprising inorganic layers
C08F 230/02 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
C08F 230/00 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
Provided is a compound which has a Hammett substituent constant σ of -0.05 or lower and which is represented by general formula (1). (1) (In formula (1): Ar1 and Ar2 each independently represent an optionally substituted phenylene group; R1 represents one selected from the group consisting of optionally substituted thioalkoxy groups, arylthio groups, alkoxyphenyl groups, and thioalkoxyphenyl groups; X represents one selected from the group consisting of a sulfur atom, an oxygen atom, and a direct bond; R2 represents one of optionally substituted alkyl groups and phenyl group; Y's each independently represent one of an oxygen atom and a sulfur atom; and R3 and R4 each independently represent one selected from the group consisting of optionally substituted linear, branched, or cyclic alkyl groups, alkenyl groups, and alkynyl groups, the R3 and R4 optionally binding with each other to form a ring structure together with the two Y's in the formula.)
C07C 323/19 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton with singly-bound oxygen atoms bound to acyclic carbon atoms of the carbon skeleton
C07D 317/22 - Radicals substituted by singly bound oxygen or sulfur atoms etherified
Methods for producing an optical element having a cured layer with a concavo-convex structure are described. Such a method includes: forming a composition layer on a base material by using a composition containing a polymerizable compound and a photo initiator; forming a pattern formative layer by pressure-contacting a mold; and forming the cured layer having the concavo-convex structure by photo-curing the pattern formative layer, wherein the polymerizable compound contains (a) a urethane (meth)acrylate monomer, the composition contains 0.005 to 0.5 part by mass of the photo initiator with respect to 100 parts by mass of the polymerizable compound, and the cured layer has a film thickness of the concavo-convex structure within a range of 0.5 mm to 1 cm.
C09D 133/08 - Homopolymers or copolymers of acrylic acid esters
C09D 133/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
C09D 4/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
G11B 7/26 - Apparatus or processes specially adapted for the manufacture of record carriers
C09K 19/20 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters
C09K 19/52 - Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives
C07C 69/602 - Dicarboxylic acid esters having at least two carbon-to-carbon double bonds
C07C 233/55 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by carboxyl groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a six-membered aromatic ring having the carbon atom of the carboxamide group bound to a carbon atom of an unsaturated carbon skeleton
G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
C07C 233/27 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by singly-bound oxygen atoms with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a six-membered aromatic ring having the carbon atom of the carboxamide group bound to a carbon atom of an acyclic unsaturated carbon skeleton
C09K 19/04 - Liquid crystal materials characterised by the chemical structure of the liquid crystal components
A sulfonic acid derivative represented by general formula (1). General formula (1): R1COOCH2CH2CFHCF2SO3-M+ (in said formula (1), R1 is a C1-200 monovalent organic group having at least one hydroxyl group, and may have a substituent other than said hydroxyl group. M+ is a counter cation.)
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
Provided is a catalyst which is able to be easily produced at low cost and has high activity and a long service life, while being suppressed in leakage of a metal. Some embodiments of the present invention provide a catalyst which is characterized by comprising a polymer that contains a plurality of first structural units and a plurality of second structural units and a metal that serves as the catalytic center, and which is also characterized in that: at least a part of the metal is covered by the polymer; each one of the plurality of first structural units has a first atom that constitutes the main chain of the polymer and a first substituent that is bonded to the first atom; a second atom that is contained in each one of the plurality of second structural units is bonded with the first atom; and the second atom is different from the first atom, or alternatively at least one substituent among all the substituents on the second atom is different from the first substituent.
C07C 1/00 - Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon
C07C 2/00 - Preparation of hydrocarbons from hydrocarbons containing a smaller number of carbon atoms
C07C 5/09 - Preparation of hydrocarbons from hydrocarbons containing the same number of carbon atoms by hydrogenation of carbon-to-carbon triple bonds to carbon-to-carbon double bonds
C07C 15/14 - Polycyclic non-condensed hydrocarbons all phenyl groups being directly linked
C07C 15/18 - Polycyclic non-condensed hydrocarbons containing at least one group with formula
C07C 15/52 - Cyclic hydrocarbons containing only six-membered aromatic rings as cyclic part substituted by unsaturated hydrocarbon radicals polycyclic non-condensed containing a group with formula
C07C 15/54 - Cyclic hydrocarbons containing only six-membered aromatic rings as cyclic part substituted by unsaturated hydrocarbon radicals polycyclic non-condensed containing a group with formula
C07C 45/32 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atomsPreparation of chelates of such compounds by oxidation with molecular oxygen
C07C 49/04 - Saturated compounds containing keto groups bound to acyclic carbon atoms
C07C 51/353 - Preparation of carboxylic acids or their salts, halides, or anhydrides by reactions not involving formation of carboxyl groups by isomerisationPreparation of carboxylic acids or their salts, halides, or anhydrides by reactions not involving formation of carboxyl groups by change of size of the carbon skeleton
C07C 67/293 - Preparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group by isomerisationPreparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group by change of size of the carbon skeleton
C07C 67/303 - Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by hydrogenation of unsaturated carbon-to-carbon bonds
C07C 69/157 - Acetic acid esters of monohydroxylic compounds of unsaturated alcohols containing six-membered aromatic rings
C07C 69/612 - Esters of carboxylic acids having a carboxyl group bound to an acyclic carbon atom and having a six-membered aromatic ring in the acid moiety
C07C 209/36 - Preparation of compounds containing amino groups bound to a carbon skeleton by reduction of nitrogen-to-oxygen or nitrogen-to-nitrogen bonds by reduction of nitro groups by reduction of nitro groups bound to carbon atoms of six-membered aromatic rings
Described is a composition comprising: a compound (A) having a substituent (a) being at least either one of an acryloyl group and a methacryloyl group, and a perfluoroalkylene group; and a compound (B) having a substituent (b) being either one of an acryloyl group and a methacryloyl group, and a substituent (c) being either one of an acryloyl group and a methacryloyl group.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
C08F 299/02 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
48.
Curable resin composition, resin mold for imprinting, method for photo imprinting, method for manufacturing semiconductor integrated circuit, and method for manufacturing fine optical element
A curable resin composition comprising: a fluorinated urethane(meth)acrylate represented by formula (1),
4 each independently represents the methyl group when x and y are both 2.
C08L 33/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
B82Y 10/00 - Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
C08F 299/06 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
B82Y 40/00 - Manufacture or treatment of nanostructures
C09D 133/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
49.
TRANSVERSE-ELECTRIC-FIELD LIQUID CRYSTAL DEVICE AND METHOD FOR MANUFACTURING SAME
Provided are a transverse-electric-field liquid crystal device by which it is possible to suppress any increase in the pretilt angle of a liquid crystal material due to the forming of a polymer layer. Also provided is a method for manufacturing said device. The present invention provides a method for manufacturing a transverse-electric-field liquid crystal device including: a step for forming a liquid crystal composition layer above a substrate using a liquid crystal composition containing a liquid crystal material and a radical-polymerizable monomer; and a step for forming a polymer layer by irradiating the liquid crystal composition layer with light and polymerizing the radical-polymerizable monomer. The radical polymerizable monomer contains a compound (A) represented in chemical formula (1), and a compound (B) represented in chemical formula (2).
An onium salt represented by formula (a). Z-A-W-Y+(R)nX- (a) (In formula (a), Z, A, W, Y, (R)n, and X have the following meanings: Z represents a monovalent organic group having a ring structure provided with a conjugated π electron system which may have one or more substituent groups; W represents a divalent organic group having a ring structure provided with a conjugated π electron system which may have one or more substituent groups; A represents a divalent linking group containing a direct coupling or one or more bonds selected from a group consisting of a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-carbon triple bond (any Z and/or W substituent group may form a ring structure in which one or more atoms included in Z and/or W are saturated or partially saturated together with A); Y is an iodine or sulfur atom, n=1 when Y is an iodine atom, and n=2 when Y is a sulfur atom; (R)n may be identical to or different from one another, and each (R)n is a monovalent organic group having a carbon number of 1 or more which may have a substituent group; and X is a monovalent anion.)
C07C 309/06 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
A composition suitable for manufacturing components and devices (e.g., optical or electronic components, films, and devices) is disclosed. Such compositions may comprise a first compound having a first polymerizable group, a second polymerizable group, and a third polymerizable group. The first compound preferably has no aromatic group, and the second compound is preferably able to generate a radical by cleavage of a bond of the second compound. The first polymerizable group, the second polymerizable group and the third polymerizable group may be identical substituents. Further, the first polymerizable group may be connected to a first chain connected to a first atom; the second polymerizable group may be connected to a second chain connected to the first atom; and the third polymerizable group may be connected to a third chain connected to the first atom.
H01L 51/52 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED) - Details of devices
C08L 43/04 - Homopolymers or copolymers of monomers containing silicon
C08F 220/28 - Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
C09D 4/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
55.
Reagent for Enhancing Generation of Chemical Species
The present invention provides a liquid crystal composition for forming a polymer layer capable of keeping high voltage holding ratio. The liquid crystal composition in an aspect of the present invention contains a liquid crystal material and one or more kind monomers and, at least one of the monomers is a compound produced by further bonding a hydrocarbon group with 12 carbon atoms or more to a compound produced by bonding two polymerizable groups to a cyclic aliphatic compound or aromatic compound with 6 carbon atoms or more.
C09K 19/12 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings at least two benzene rings directly linked, e.g. biphenyls
C09K 19/20 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters
C09K 19/52 - Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives
C07J 9/00 - Normal steroids containing carbon, hydrogen, halogen, or oxygen, substituted in position 17 beta by a chain of more than two carbon atoms, e.g. cholane, cholestane, coprostane
C07J 17/00 - Normal steroids containing carbon, hydrogen, halogen, or oxygen, having an oxygen-containing hetero ring not condensed with the cyclopenta[a]hydrophenanthrene skeleton
C09K 19/04 - Liquid crystal materials characterised by the chemical structure of the liquid crystal components
C09K 3/10 - Materials not provided for elsewhere for sealing or packing joints or covers
57.
Reagent for Enhancing Generation of Chemical Species
H01M 10/054 - Accumulators with insertion or intercalation of metals other than lithium, e.g. with magnesium or aluminium
H01M 10/0585 - Construction or manufacture of accumulators having only flat construction elements, i.e. flat positive electrodes, flat negative electrodes and flat separators
62.
REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES AND MANUFACTURING APPARATUS
That eletrolyte solutions containing polypropylene carbonate and gamma-butyrolactone as solvents and electrolyte such as tetraethylmethylammonium teterfluoroborate have relatively higher electric conductivity and tolerance for charge/discharge cycles is disclosed.
H01M 10/0568 - Liquid materials characterised by the solutes
H01M 10/0569 - Liquid materials characterised by the solvents
66.
STRUCTURAL BODY PRODUCTION METHOD, ARTICLE PRODUCTION METHOD, STRUCTURAL BODY, FOLDER, FORMED PRODUCT, LIVING SAMPLE PURIFICATION METHOD, TESTING DEVICE, AND COMPOUND
A structural body production method including a first step in which a first base containing a first surface and a second surface is prepared, a second step in which a composition is arranged on at least one part of the first surface, and a third step in which energy is applied to at least one part of the composition to cure a first section of the composition and form a cured product, said method being characterized in that a second section of the composition, which is at least one part of a section other than the first section, is removable subsequent to the completion of the third step.
C07D 233/60 - Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with hydrocarbon radicals, substituted by oxygen or sulfur atoms, attached to ring nitrogen atoms
C07D 263/38 - One oxygen atom attached in position 2
C07C 247/16 - Compounds containing azido groups with azido groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
G03F 7/012 - Macromolecular azidesMacromolecular additives, e.g. binders
C07D 233/61 - Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with hydrocarbon radicals, substituted by nitrogen atoms not forming part of a nitro radical, attached to ring nitrogen atoms
C07C 233/83 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by carboxyl groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom of an acyclic saturated carbon skeleton
C07D 263/42 - One oxygen atom attached in position 5
C07C 247/18 - Compounds containing azido groups with azido groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton being further substituted by carboxyl groups
C07D 295/14 - Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
A reagent that generates a chemical species initiating a polymerization of at least one kind of monomer by non-resonant multi-photon excitation of the reagent is disclosed.
G03F 7/028 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
H01L 51/52 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED) - Details of devices
Described is a resinous article of manufacture that is wrinkle-resistant and is warpage-resistant when subjected to very high temperatures. Such an article is useful as an optical lens.
C08F 136/20 - Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds unconjugated
C08F 236/20 - Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds unconjugated
G02B 1/04 - Optical elements characterised by the material of which they are madeOptical coatings for optical elements made of organic materials, e.g. plastics
B29D 11/00 - Producing optical elements, e.g. lenses or prisms
B29C 43/02 - Compression moulding, i.e. applying external pressure to flow the moulding materialApparatus therefor of articles of definite length, i.e. discrete articles
B29C 43/36 - Moulds for making articles of definite length, i.e. discrete articles
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
B29C 35/08 - Heating or curing, e.g. crosslinking or vulcanising by wave energy or particle radiation
79.
COMPOSITION, RESIN MOLD, OPTICAL IMPRINTING METHOD, METHOD FOR MANUFACTURING OPTICAL ELEMENT, AND METHOD FOR MANUFACTURING ELECTRONIC ELEMENT
A composition characterized by containing the following: a compound (A) that is provided with a substituent or substituents (a), namely an acryloyl group and/or a methacryloyl group, and a perfluoroalkylene group; and a compound (B) that is provided with a substituent or substituents (b), namely an acryloyl group and/or a methacryloyl group, and another substituent or substituents (c), namely another acryloyl group and/or methacryloyl group.
B29C 59/02 - Surface shaping, e.g. embossingApparatus therefor by mechanical means, e.g. pressing
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
C07C 271/16 - Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
80.
SUBSTRATE FOR CELL CULTURE, AND METHOD OF MANUFACTURING SUBSTRATE FOR CELL CULTURE
Several embodiments of the present invention address the problem of providing a method of manufacturing a substrate for cell culture whereby the degree of freedom with which a pattern can be formed is improved, and the deviation of the cytoadhesive material from the pattern during cell culture is inhibited. A typical method of manufacturing a substrate for cell culture according to the present invention is characterized by including a first step for forming a first substance region and a second substance region, during which bonds form between a first substance included in the first substance region and a second substance included in the second substance region.
C12M 3/00 - Tissue, human, animal or plant cell, or virus culture apparatus
81.
CURABLE RESIN COMPOSITION, RESIN MOLD FOR IMPRINTING, LIGHT IMPRINTING METHOD, PRODUCTION METHOD FOR SEMICONDUCTOR INTEGRATED CIRCUIT, AND PRODUCTION METHOD FOR MICRO-OPTICAL ELEMENT
A curable resin composition characterized by containing a fluorinated urethane (meth) acrylate indicated by formula (1). (1) (In the formula: R1, R2, R3, and R4 each independently indicate a hydrogen atom or a methyl group; x and y each independently indicate 1 or 2; and n indicates an integer between 1 and 10. However, when x and y are both 1, R3 and R4 each indicate a hydrogen atom; when x is 1 and y is 2, R3 indicates a hydrogen atom and R4 indicates a methyl group; when x is 2 and y is 1, R3 indicates a methyl group and R4 indicates a hydrogen atom; and when x and y are both 2, R3 and R4 each indicate a methyl group.)
C08F 299/06 - Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
B29C 59/02 - Surface shaping, e.g. embossingApparatus therefor by mechanical means, e.g. pressing
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
Several aspects of the present invention provide a liquid crystal composition capable of shortening the takt time and achieving excellent display qualities, and a liquid crystal display device and a method for producing a liquid crystal display device which use the liquid crystal composition. The liquid crystal composition of several aspects of the present invention includes a liquid crystal material and one or more kinds of radical polymerizable monomers, at least one kind of the radical polymerizable monomers being a compound generating radicals through a self-cleavage reaction by exposure to light and having at least two radical polymerizable groups.
The present invention provides a monomer capable of forming a polymer layer capable of maintaining high display quality, even in high-temperature, high-humidity environments. This monomer is a compound indicated by P-Sp1-Z2-A1-(Z1-A2)n1-Z3-Sp2-P. (In the formula, P indicates the same or different radical polymerizable groups. At least one out of Z1, Z2, and Z3 indicates a -NRCO- group or a -CONR- group.)
The present invention provides a liquid crystal composition that forms a polymer layer capable of maintaining a high voltage holding ratio. This liquid crystal composition contains a liquid crystal material and at least one type of monomer. At least one of the monomers is a compound formed by bonding a C12 or higher hydrocarbon group to a compound formed by having two polymerizable groups bonded to a C6 or higher annular aliphatic compound or aromatic compound.
The present invention provides a liquid crystal display device that can establish both improvements in throughput and the obtaining of excellent display quality. This liquid crystal display device is provided with: a pair of substrates; a liquid crystal layer that is sandwiched between the pair of substrates and contains a liquid crystal material; and a polymer layer that is formed on either or both of the pair of substrates and controls the orientation of liquid crystal molecules. The polymer layer is formed by polymerizing two or more types of radical polymerizable monomers added to the liquid crystal layer. At least one of the radical polymerizable monomers has a structure that generates radicals by a self-cleaving reaction induced by light irradiation and is a chemical compound having two radical polymerizable groups. At least one other of these radical polymerizable monomers has a ring structure and is a chemical compound that has monofunctional or polyfunctional polymerizable groups.
A photosensitive compound represented by formula (1) or formula (2). (Chemical formula 1) (In formula (1) and formula (2), n is an integer of 1-3; R1 is a linear or branched alkyl group having 1-6 carbon atoms or an alkylene group having 2-6 carbon atoms formed from two R1 together; R2 is -NR3R4; R3 and R4 are each independently a linear or branched alkyl group or alkenyl group having 1-6 carbon atoms, a linear or branched alkylene group having 2-6 carbon atoms formed by R3 and R4 together, or a linear or branched alkylene group or alkenylene group having 3-8 carbon atoms optionally containing an oxygen atom or nitrogen atom.)
C07C 247/18 - Compounds containing azido groups with azido groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton being further substituted by carboxyl groups
C07C 233/83 - Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by carboxyl groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by an acyclic carbon atom of an acyclic saturated carbon skeleton
C07D 233/61 - Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with hydrocarbon radicals, substituted by nitrogen atoms not forming part of a nitro radical, attached to ring nitrogen atoms
C07D 263/42 - One oxygen atom attached in position 5
C07D 295/14 - Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
C08F 16/38 - Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical by an acetal or ketal radical
G03F 7/012 - Macromolecular azidesMacromolecular additives, e.g. binders
H01L 21/027 - Making masks on semiconductor bodies for further photolithographic processing, not provided for in group or
87.
Composition for forming liquid crystal layer, liquid crystal display device, and method for producing liquid crystal display device
The present invention provides a composition for forming a liquid crystal layer which enables to achieve takt time reduction and high display quality. The liquid crystal display device according to the present invention includes a liquid crystal material, and a monomer, the monomer being a compound having a structure that generates ketyl radicals when undergoing a hydrogen abstraction reaction caused by exposure to light.
C09K 19/14 - Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a carbon chain
C09K 19/32 - Non-steroidal liquid crystal compounds containing condensed ring systems, i.e. fused, bridged or spiro ring systems
C08F 220/30 - Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
C09K 19/04 - Liquid crystal materials characterised by the chemical structure of the liquid crystal components
G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
6-30 aryl group, and M+ represents a counter cation. Photoacid generators and photoresists containing such sulfonic acid derivatives are also provided.
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
The present invention provides a liquid crystal composition making it possible to shorten cycle times and obtain excellent display quality, while also providing a liquid crystal device in which the liquid crystal composition is used, and a method for producing the liquid crystal display device. This liquid crystal composition contains a liquid crystal material and at least one radically polymerizable monomer, at least one of the radically polymerizable monomers being a compound having a structure for generating a radical by a self-cleavage reaction caused by light irradiation, and having at least two radically polymerizable groups.
C09K 19/54 - Additives having no specific mesophase
G02F 1/13 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
G02F 1/1337 - Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
This method has a molding step of molding by sandwiching a photocurable composition layer formed by a photocurable composition for imprinting between a substrate and a mold in which a concave-convex pattern is formed, a photocuring step of exposing the photocurable composition layer to make a photocured product, and a releasing step of releasing the mold from the photocured product, wherein the adhesive force per unit area, with respect to a member having the same outer surface as the mold, of a specimen obtained by exposing and curing the photocurable composition for imprinting is no more than 15 mN/mm2.
2,2-Dimethoxy-1,2-di-[4-(meth)acryloyloxy]phenylethane-1-one, as represented by formula (A). (In the formula, R1 and R2 individually represent a hydrogen atom or a methyl group, and may be mutually identical or different.)
C07C 67/08 - Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
The present invention provides a composition for forming a liquid crystal layer, which enables both the reduction of takt time and the achievement of good display quality at the same time. This composition for forming a liquid crystal layer comprises a liquid-crystalline material and a monomer, wherein the monomer is a compound having such a structure that a ketyl radical can be generated by a hydrogen abstraction reaction caused by irradiation with light.
Disclosed is a liquid crystal display device not prone to burn-in. The disclosed liquid crystal display device is provided with a pair of substrates and a liquid crystal layer sandwiched between said pair of substrates. The liquid crystal layer contains a liquid crystal material having negative dielectric anisotropy, and at least one of the pair of substrates has both alignment film which homeotropically aligns adjacent liquid crystal molecules and a polymer layer which, formed on the alignment film, controls the alignment of the adjacent liquid crystal molecules. The polymer layer is formed by polymerization of at least one kind of monomer that generates radicals by optical absorption.
The present invention provides a liquid-crystal display device which retains a high voltage holding ratio and is less apt to suffer image sticking. This liquid-crystal display device is equipped with a pair of substrates and a liquid-crystal layer sandwiched between the pair of substrates, wherein the liquid-crystal layer contains a liquid-crystal material having negative permittivity anisotropy and at least one of the pair of substrates has an alignment film that perpendicularly orients nearby liquid-crystal molecules and further has a polymer layer that has been formed on the alignment film and controls the orientation of nearby liquid-crystal molecules. The polymer layer is a layer formed by causing at least one monomer to generate radicals through light absorption and polymerize. The alignment film is constituted of a polymer having a main chain containing imide structures, the main chain having a degree of imidization of 50% or higher.
The present invention provides a liquid crystal display device in which high wettability to substrates can be achieved and in which burn-in is less likely to occur. The liquid crystal display device of the invention comprises a pair of substrates, and a liquid crystal layer sandwiched between the pair of substrates, wherein: the liquid crystal layer contains a liquid crystal material having negative dielectric anisotropy; at least one of the substrates includes an alignment film that vertically aligns nearby liquid crystal molecules, and a polymer layer that is formed on the alignment film and that controls the alignment of the nearby liquid crystal molecules; the polymer layer is formed as a result of at least one type of monomer producing radicals by light absorption and undergoing polymerization; the alignment film is made of a polymeric compound having a main chain containing an imide structure; and the imidization rate of the main chain is less than 50%.
The present invention provides a composition that is for forming a liquid crystal layer and that results in a liquid crystal display device wherein it is difficult for burn-in to arise. This composition for forming a liquid crystal layer contains a liquid crystal material and one or more monomers, and at least one of the monomers is a phenanthrene derivative represented by chemical formula (1), chemical formula (2), or chemical formula (3) (in the formulae: R1 and R2 are the same or different, and represent an -Sp-P group, a hydrogen atom, a halogen atom, a -CN group, an -NO2 group, an -NCO group, an -NCS group, an -OCN group, an -SCN group, an -SF5 group, or a straight-chain or branched alkyl group having 1-12 carbon atoms; at least one of R1 and R2 represents an -Sp-P group; P represents a polymerizable group; and Sp represents a straight-chain, branched, or cyclic alkyl group having 1-6 carbon atoms, an alkyleneoxy group, or a direct bond between the groups on both sides of Sp).
Disclosed are: a photocurable composition for forming a resin pattern by light imprint lithography, which can be removed readily from a substrate or the like after the composition is photocured and which enables the production of a photocured article having good strength and sensitivity; and a pattern formation method using the photocurable composition. The photocurable composition for forming a resin pattern contains a photopolymerizable compound (A) which comprises one or more photopolymerizable compounds each having only one photopolymerizable group per molecule and a photopolymerization initiator (B), wherein the content ratio of the photopolymerizable compound (A) relative to the total amount of the photopolymerizable compounds contained in the photocurable composition is 99 mass% or more, and the glass transition temperature (Tg) of the photopolymerizable compound (A) as determined in accordance with formula (1) is 313 K or more. (1) In the formula, Tgi represents the glass transition temperature (K) of a homopolymer of a photopolymerizable compound (i) that is used as the photopolymerizable compound (A) and has only one photopolymerizable group per molecule; Wi represents the fraction (%) of the mass of the photopolymerizable compound (i) relative to the mass of the photopolymerizable compound (A); and n represents the number of types of the photopolymerizable compounds which are used as the photopolymerizable compound (A) and each of which has only one photopolymerizable group per molecule, and is an integer of 1 or more.
Disclosed is a sulfonic acid derivative that is characterized by being represented by general formula (1). (1) RCOOCH2CH2CFHCF2SO3-M+ (In formula (1), R represents a substituted or unsubstituted C1-30 linear, branched, or cyclic hydrocarbon group, or a substituted or unsubstituted C6-30 aryl group. M+ represents a counter cation.)
C07C 309/12 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
Disclosed is a photocurable composition which can be a transfer-receiving material layer that is used in a pattern formation wherein the transfer-receiving material layer is sandwiched between a substrate and a mold, which is provided with a recessed and projected pattern, so that the recessed and projected pattern is filled with the transfer-receiving material layer, and the mold is released therefrom after molding the transfer-receiving material layer by exposure and curing. The photocurable composition contains, per 100 parts by mass of a photocurable component, 0.0001-10 parts by mass of a fluorescent substance that has an absorption wavelength range, at which the fluorescent substance emits fluorescent light, within the range from the ultraviolet range to the visible light range, and there is substantially no absorption by the materials other than the fluorescent substance in the photocured product obtained by light exposure in at least a part of the absorption wavelength range of the fluorescent substance nor in at least a part of the wavelength range of the fluorescent light emitted by the fluorescent substance.
Facing no ethical obstacle and easily to be isolated, multipotent concretely mesenchymal stem cells (MSCs) are one of the most powerful tools in reconstructive medicine. Here the inventors introduced 3D multicelluar spheroids culture construction based on photolithography and micropatterning techniques to improve multipotent differentiation efficiency of MSCs to adult cells. This invention, the 3D spheroid cultured construction for MSCs, leads to great improve of the differentiation efficiency. This invention relates to a cultured cell construct comprising a support; at least one island on the support; a hydrophilic and cytophobic substance applied on the surface of said support so as to encircle the island; and a spheroid which is derived from MSCs, said spheroid being in contact with the island.
