There is described a novel fluid treatment device that can induce Dean Vortices in the flowing fluid, and then induce a new set of Dean Vortices at an angle to those in the first set. Each subsequent curved section can induce vortices at an angle to those in the last curved section. This reactor has the effect of repeatedly twisting and splitting the fluid flow, resulting in targeted mixing similar to that of static mixers without the necessity of utilizing physical mixers. This is also an improvement over helical tubing configurations that generate only a single set of vortices and do not split and mix the flow.
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
There is described an on-line device for controlling a fluid treatment process configured to inactivate a microorganism in a flow of fluid using ultraviolet radiation and a chemical disinfectant. The device comprises: a memory for receiving a calculated database of dose response for the ultraviolet radiation and for the chemical disinfectant for a fluid treatment parameter; means to obtain input data about the fluid treatment parameter from the process; means to compare the input data with calculated database; and means to adjust one or more of the amount ultraviolet radiation and the chemical disinfectant added to the flow fluid in response to a difference between the input data and calculated database. There is also described a process for controlling a fluid treatment process configured to inactivate a microorganism in a flow of fluid using ultraviolet radiation and a chemical disinfectant.
A61L 2/16 - Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lensesAccessories therefor using chemical substances
C02F 1/32 - Treatment of water, waste water, or sewage by irradiation with ultraviolet light
C02F 1/50 - Treatment of water, waste water, or sewage by addition or application of a germicide or by oligodynamic treatment
There is described, a fluid treatment system comprising: a fluid treatment chamber comprising a fluid inlet, a fluid outlet and a fluid treatment zone; an elongate radiation source assembly comprising an elongate radiation source configured to be disposed in the fluid treatment zone; and a lamp socket element secured to a proximal portion of the fluid treatment chamber, the lamp socket element configured to be disengaged from the elongate radiation source assembly only when the fluid treatment chamber is fluid non-pressurized.
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
In one of its aspects, the invention relates to a process to optimize the dose of a treatment agent for the treatment of a fluid comprising a contaminant. In this first aspect the process comprises the steps of: (a) calculating the dose of the treatment agent based on the relationship between concentration of the treatment agent at one or more points and residence time distribution of the treatment system, and (b) contacting the fluid with the treatment agent in the concentration required to meet the dose calculated in step (a). In another one of its aspects, the invention relates to a process to optimize the dose of a treatment agent for reduction of a contaminant in a fluid. In this second aspect the process comprises the steps of: (a) calculating the residence time distribution model (RTD) for the treatment system; (b) calculating one or more demand/decay models for the treatment system; calculating the dose model using the calculated RTD model from step (a) and the demand/decay model from step (b); calculating the dose of the treatment agent within the system using the dose model from step (c); and (d) contacting the fluid with the treatment agent in the concentration required to meet the dose calculated in step d). A fluid treatment system for predicting the dose of the treatment agent is also disclosed. A device for calculating the dose of a chemical agent for the treatment of a fluid comprising a contaminant is also disclosed.
A method for assaying for loss of viability of a photosynthetic microorganism in aqueous liquid is described. The method comprises the step of correlating the photorepair index (PRI) for said microorganism in the aqueous liquid to survivorship of said microorganism after exposure to ultraviolet (UV) radiation.
Described is a process for treatment of a fluid comprising an oxidizable contaminant selected from one or both of a sulfide and a thiol, the process comprising the step of contacting the fluid with a first complex of ferric iron and a polyphosphate to oxidize the oxidizable contaminant and generate a second complex of ferrous ion and the polyphosphate.
A62D 3/38 - Processes for making harmful chemical substances harmless, or less harmful, by effecting a chemical change in the substances by reacting with chemical agents by oxidationProcesses for making harmful chemical substances harmless, or less harmful, by effecting a chemical change in the substances by reacting with chemical agents by combustion
8.
FLOW MODIFIER BAFFLES AND FLUID TREATMENT SYSTEM COMPRISING SAME
Described is a baffle comprising a continuous outer edge and an interior portion enclosed by the outer edge and connected to the outer edge. The interior portion comprises one or more teeth each having a tip directed towards the centre of the baffle, a base adjacent to the outer edge, and a tooth edge joining the tip to the base, wherein at least a portion of the tooth edge defines at least a portion of an aperture extending from a first face to a second face of the baffle.
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
C02F 1/30 - Treatment of water, waste water, or sewage by irradiation
C02F 1/32 - Treatment of water, waste water, or sewage by irradiation with ultraviolet light
F15D 1/02 - Influencing the flow of fluids in pipes or conduits
9.
LOW ENERGY CONSUMPTION BELT FILTER CLEANING SYSTEM
There is described is a belt cleaning blow-off device having a streamlined inner surface. In one embodiment a fluid outlet nozzle is connectable to a conduit of a blow-off device for cleaning a belt filter. The nozzle comprises a housing having an inner surface and outer surface, wherein the inner surface defines a fluid entry zone to receive fluid into the nozzle and an elongated gap for directing fluid towards the belt. The inner surface is streamlined to facilitate flow of the fluid into the gap. In a second embodiment, the blow-off device comprises a housing connectable to a fluid source and having an inner and outer surface. The housing defines a conduit for transporting the fluid within a channel, wherein the inner surface defines a surface of the channel and an elongated gap for directing the fluid towards the belt. The inner surface is streamlined and typically teardrop-shaped to facilitate flow of the fluid into the gap.
There is disclosed a coupling for a radiation source assembly that comprises an elongate radiation source and an elongate radiation transparent protective sleeve for receiving the elongate radiation source. The coupling disengages in two stages when it is desired to remove the elongate radiation source for servicing (or any other purpose). The coupling is disengaged from a first position in which a seal is made between the sleeve bolt element and the lamp plug element. When this action takes place, the lamp plug element is still secure with respect to the sleeve bolt element but since there is no seal between the two, any fluid which has flooded the elongate radiation source (e.g., due to breakage or other damage to the protective sleeve) will emerge from the coupling warning the operator not to fully disengage the lamp plug element from the sleeve bolt element. If no such fluid is seen by operator, the operator may continue to disengage the lamp plug element from the sleeve bolt element to withdraw the elongate radiation source from the elongate radiation transparent protective sleeve.
There is described a method for assaying for loss of viability of a photosynthetic organism (preferably a microorganism) in an aqueous liquid. In a preferred embodiment, the method comprises the step of using fluorescence to correlate the photorepair index for the organism in the aqueous liquid to survivorship of the organism (preferably a microorganism) after it is exposed to ultraviolet radiation, thereby assessing viability.
B63B 43/06 - Improving safety of vessels, e.g. damage control, not otherwise provided for reducing risk of capsizing or sinking by improving stability using ballast tanks
B63B 57/00 - Tank cleaning specially adapted for vessels
B63J 4/00 - Arrangements of installations for treating waste-water or sewage
C02F 1/32 - Treatment of water, waste water, or sewage by irradiation with ultraviolet light
There is described a method of determining the UV fluence received by a fluid. The method comprises the steps of: (a) irradiating the fluid at an unknown UV fluence; (b) measuring the fluorescence of a test sample of the fluid after irradiation in Step (a) to produce a test signal proportional to the concentration of a prescribed fluorescent composition of matter comprised in the test sample; and (c) determining the value of the unknown UV fluence by comparing the test signal to a calibration curve of a control signal proportional to concentration of the prescribed fluorescent composition of matter in the fluid as a function of applied UV fluence. There is also described a system for determining the UV fluence received by a fluid being treated in UV fluid treatment system comprising at least one UV source. The system comprises: (a) a radiation-transparent vessel for receiving a test sample of the fluid after irradiation of the fluid at an unknown UV fluence; (b) a fluorometer for measuring the fluorescence of the test sample received in the radiation-transparent vessel to produce a test signal proportional to the concentration of a prescribed fluorescent composition of matter comprised in the test sample; and (c) a controller configured to determine the value of the unknown UV fluence by comparing the test signal to a calibration curve of a control signal proportional to concentration of the prescribed fluorescent composition of matter in the fluid as a function of applied UV fluence.
There is described a process for treatment of a fluid comprising an oxidizable contaminant. The process comprises the step of contacting the wastewater with a combination of: (i) a sulfide, (ii) a complex of Fe(III) and a chelating agent, and (iii) an oxidant. It has been discovered that of treatment of a fluid containing an oxidizable contaminant employing iron(III)-chelates as the Fenton catalyst may be significantly improved by including a sulfide in the reaction scheme. As described herein, by employing sulfide ion, the present inventors have been able to: (i) increase the rate of iron recycling from minutes or hours to a few seconds, and (ii) destroy benzene in an oil and gas refinery (OGR) wastewater in less than one minute. It is believed that these findings in OGR wastewater can be extended to other fluids containing other oxidizable contaminants.
A62D 3/38 - Processes for making harmful chemical substances harmless, or less harmful, by effecting a chemical change in the substances by reacting with chemical agents by oxidationProcesses for making harmful chemical substances harmless, or less harmful, by effecting a chemical change in the substances by reacting with chemical agents by combustion
C02F 1/72 - Treatment of water, waste water, or sewage by oxidation
C09K 3/32 - Materials not provided for elsewhere for treating liquid pollutants, e.g. oil, gasoline or fat
14.
SYSTEM FOR DETERMINING UV DOSE IN A REACTOR SYSTEM
The is described a process for determining a validated Reduction Equivalent Dose for reducing the concentration of a target contaminant contained in a fluid in a radiation fluid treatment system. In one embodiment, the process comprises the steps of: (a) determining a short wavelength Reduction Equivalent Dose for the target contaminant or a challenge contaminant in a first region of the electromagnetic spectrum having a wavelength of less than or equal to about 240 nm; (b) determining a long wavelength Reduction Equivalent Dose for the target contaminant or a challenge contaminant in a second region of the electromagnetic spectrum having a wavelength of greater than about 240 nm; and (c) summing the short wavelength Reduction Equivalent Dose and the long wavelength Reduction Equivalent Dose to produce the validated Reduction Equivalent Dose for the target contaminant. In a preferred embodiment, the present invention provides a useful approach for determining the relevant Reduction Equivalent Dose (RED) for Cryptosporidium disinfection and accomplishes this by using the discovered relation between the short wavelength sensor signal and the short wavelength RED, and subtracting the short wavelength RED from the RED determined using a challenge microbe with synthetic lamp sleeves, to obtain the long wavelength RED applicable to Cryptosporidium disinfection. In a bioassay, one would only need the short wavelength sensor reading and the challenge microbe RED using synthetic lamp sleeves to determine the applicable RED, once the relationship between the short wavelength sensor reading and the short wavelength RED was established.
A62D 3/176 - Ultraviolet radiation, i.e. radiation having a wavelength of about 3 to 400 nm
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
C02F 1/32 - Treatment of water, waste water, or sewage by irradiation with ultraviolet light
15.
CLEANING APPARATUS, RADIATION SOURCE MODULE AND FLUID TREATMENT SYSTEM
There is described a cleaning apparatus for a surface (e.g., a radiation source assembly) in a fluid treatment system. A preferred embodiment of the cleaning apparatus comprises: at least one jet element configured to generate a differential fluid current in a plane that is non-normal to a longitudinal axis of the elongate surface to cause the debris to be removed from the elongate surface. This preferred embodiment of the present cleaning apparatus is particularly advantageous for removing elongate debris from one or more radiation source assemblies disposed in the fluid treatment system. It is preferred to include in the cleaning apparatus a wiping element that is translated between a first position and a second position. As the wiping element is moved from the first position to the second position, it will tend to push the elongate debris toward a distal portion of the radiation source assembly and into the path of the differential fluid current generated by the cleaning apparatus. The differential fluid current will tend to cause the elongate debris to be lifted and/or carried away from the radiation source assembly such that the flow of fluid will carry the elongate debris past the radiation source assembly.
B08B 5/02 - Cleaning by the force of jets, e.g. blowing-out cavities
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
C02F 1/30 - Treatment of water, waste water, or sewage by irradiation
There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The cleaning system comprises: a cleaning carriage comprising at least one cleaning element for contact with at least a portion of the exterior of the radiation source assembly; a rodless cylinder comprising an elongate housing having a longitudinal axis; a slidable element disposed on an exterior surface of the elongate housing, the slidable element being: (i) coupled to the cleaning carriage, and (ii) magnetically coupled to a driving element disposed within the elongate housing, the driving element comprising a friction modifying element in contact with an interior surface of the elongate housing to define a first frictional resistance in a rotational direction about the longitudinal axis and a second frictional resistance in an axial direction along the longitudinal axis, the friction modifying element configured such that the first frictional resistance is greater than the second friction resistance; and an elongate motive element coupled to the driving element.
B08B 9/04 - Cleaning the internal surfacesRemoval of blockages using cleaning devices introduced into and moved along the pipes
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
There is described a cleaning system for a radiation source. The cleaning system comprises: (i) a cleaning chamber housing; (ii) a cleaning cartridge removably disposed in the cleaning chamber housing; and (iii) an endcap element removably coupled to the cleaning chamber housing. The cleaning cartridge comprises a first sealing element and a second sealing element, the first sealing element and the second sealing element configured to provide a substantially fluid tight seal with respect to an exterior surface of the radiation source. A radiation source module and a fluid treatment system comprising the radiation source module are also described.
A fluid flow modifier device comprising: an inlet portion for receiving a flow of fluid; an outlet portion for outputting the flow of fluid; and a flow modifier portion disposed between the inlet portion and the outlet portion, the flow modifier portion comprising an outer portion comprising a closed cross-section to the flow of fluid and an inner porous portion configured such that at least a portion of the flow flow received in the inlet portion must pass through the inner porous portion to reach the fluid outlet. The fluid flow modifier device is ideally used to transition fluid flow between an fluid supply line and a fluid treatment zone - for example, a pressure water supply line and an ultraviolet radiation treatment device (e.g., drinking water treatment device).
There is described an element having an immersible portion for contact with an aqueous liquid, the immersible portion comprising a contact surface which is for contact with the aqueous liquid, the contact surface configured to have strong acidity. The invention also relates to a radiation (e.g., ultraviolet radiation) source assembly, a radiation (e.g., ultraviolet radiation) source module and a fluid (e.g., water) treatment system incorporating this element. The present invention is applicable to any surface in contact with fluid that is susceptible to build-up of fouling materials. Thus, the present inventor has discovered an approach which obviates or mitigates the rate of accumulation of fouling on surfaces in contact with aqueous solution, such as the protective (e.g., quartz) sleeves in an ultraviolet radiation fluid treatement system. This approach involves modifying at least a portion of the surface of those sleeves in contact with fluid (e.g., water) to have an inherent strong surface acidity. In some cases, this can obviate the need for complex mechanical cleaning equipment or at least result in a reduced frequency of mechanical cleaning.
C02F 5/08 - Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
There is described a radiation source module for use in a fluid treatment system. The radiation source module comprises: a housing having an inlet, an outlet and a fluid treatment zone disposed between. The fluid treatment zone comprises a first wall surface and a second wall surface interconnected by a floor surface. The first wall surface, the second wall surface and the floor surface are configured to receive a flow of fluid through the fluid treatment zone. The radiation source module further comprises at least one radiation source assembly secured with respect to the first wall surface and the second wall surface and a module motive coupling element connected to the housing and configured to be coupled to a module motive element to permit the radiation source module to be installed in and extracted from the fluid treatment system. A fluid treatment system comprising the radiation source module is also described.
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
C02F 1/30 - Treatment of water, waste water, or sewage by irradiation
There is described a fluid treatment system that is particularly well suited for treating ballast water on a shipping vessel. The present fluid treatment system is characterized by having two general modes of operation. A so-called ballasting mode and a so-called deballasting mode. In the ballasting mode, water is pumped from the sea or other body of water in which the shipping vessel is located to a ballast fluid inlet in the present fluid treatment system. Thereafter, it passes through the filter separation and radiation treatment sections in the fluid treatment zone of the fluid treatment system. Next, the fluid exits the fluid outlet of the fluid treatment system and it is pumped to one or more ballast tanks that are located on the shipping vessel. In the deballasting mode, water contained in the ballast tank(s) is pumped to a deballasting fluid inlet of the fluid treatment system after which it is treated in the radiation section only - i.e., in the deballasting mode, water substantially bypasses the fluid separation section of the fluid treatment system. Next, the treated fluid exits the fluid outlet of the fluid treatment system and is discharged overboard the shipping vessel. A valve system is used to switch between ballasting mode and deballasting mode.
B01D 36/00 - Filter circuits or combinations of filters with other separating devices
B01D 29/00 - Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups Filtering elements therefor
B01D 35/02 - Filters adapted for location in special places, e.g. pipe-lines, pumps, stop-cocks
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
B63B 13/00 - Conduits for emptying or ballastingSelf-bailing equipmentScuppers
B63B 57/00 - Tank cleaning specially adapted for vessels
B63B 9/00 - Methods of designing, building, maintaining, converting, refitting, repairing, or determining properties of, vessels, not otherwise provided for
B63J 4/00 - Arrangements of installations for treating waste-water or sewage
C02F 1/00 - Treatment of water, waste water, or sewage
C02F 1/30 - Treatment of water, waste water, or sewage by irradiation
A sleeve holder assembly for a radiation source is disclosed. The sleeve holder assembly comprises: an elongate radiation transparent sleeve element; a sleeve holder receptacle portion coupled to the elongate radiation transparent sleeve element; a sleeve bolt assembly portion coupled to the sleeve holder receptacle portion; a first sealing element disposed between the sleeve holder receptacle portion and the sleeve bolt assembly portion; and a locking element configured to prevent decoupling of the sleeve bolt assembly portion and the sleeve holder receptacle portion. The first sealing element is configured to provide a substantially fluid impermeable seal between the elongate radiation transparent sleeve element and the sleeve holder receptacle portion.
F21V 31/00 - Gas-tight or water-tight arrangements
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
C02F 1/30 - Treatment of water, waste water, or sewage by irradiation
F21K 99/00 - Subject matter not provided for in other groups of this subclass
There is described a radiation source assembly comprising an elongate radiation source; a reactor port for receiving and reversibly securing the elongate radiation source; a top plug element for reversible connection to a proximal end of the radiation source and reversible engagement with the reactor port; the top plug element configured to be disengaged from reactor port without disengagement of the elongate radiation source from the reactor port.
F21V 17/10 - Fastening of component parts of lighting devices, e.g. shades, globes, refractors, reflectors, filters, screens, grids or protective cages characterised by specific fastening means or way of fastening
F21K 99/00 - Subject matter not provided for in other groups of this subclass
F21V 31/00 - Gas-tight or water-tight arrangements
H01R 33/76 - Holders with sockets, clips or analogous contacts, adapted for axially-sliding engagement with parallely-arranged pins, blades, or analogous contacts on counterpart, e.g. electronic tube socket
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
C02F 1/30 - Treatment of water, waste water, or sewage by irradiation
C02F 1/32 - Treatment of water, waste water, or sewage by irradiation with ultraviolet light
There is disclosed a fluid filter device. The fluid filter device comprises: a primary filter section having a first porous section; and a secondary filter section having second porous section; wherein: (i) the primary filter section and the secondary filter section are in fluid communication with one another, and (ii) the first porous section has a greater porosity than the second porous section. There is also disclosed a fluid isolation device for isolation an exterior fluid from a surface of an enclosure containing interior fluid. The device comprises a sleeve element movable between: (i) a retracted portion in which exterior fluid contacts the surface of the enclosure, and (ii) an extended position in which exterior fluid is isolated from contacting the surface of the enclosure. A distal portion of the sleeve element is configured to actuate a backwash element configured to backwash the interior fluid from the enclosure when the sleeve element is in the extended position.
B01D 29/50 - Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
B01D 29/64 - Regenerating the filter material in the filter by scrapers, brushes or the like, acting on the cake side of the filtering element
There is described a photocatalyst composition of matter comprising a support material. A surface of the support material configured to comprise: (i) a first catalytic material for catalyzing the conversion of H2O to H2 and O2, and (ii) a second catalytic material catalyzing reaction of hydrogen with a target compound. The photocatalyst composition of matter can be used to treat an aqueous fluid containing a target chemical compound, for example, by a process comprising the steps of: (i) contacting the aqueous fluid with the above-mentioned photocatalyst composition of matter; (ii) contacting the aqueous fluid with radiation during Step (i); (iii) catalyzing the conversion of water in the aqueous fluid to H2 and O2 with the first catalytic material; and (iv) catalyzing reaction of the target chemical compound in the aqueous fluid with hydrogen from Step (iii) in the presence of the second catalytic material to produce a modified chemical compound.
C07B 35/00 - Reactions without formation or introduction of functional groups containing hetero atoms, involving a change in the type of bonding between two carbon atoms already directly linked
B01J 37/34 - Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves
26.
CLEANING APPARATUS. RADIATION SOURCE MODULE AND FLUID TREATMENT SYSTEM
There is described a cleaning apparatus for a surface (e.g., a radiation source assembly) in a fluid treatment system. A preferred embodiment of the cleaning apparatus comprises: a wiping element for contact with at least a portion of the surface; at least one cutting element connected to the wiping element for cutting elongate debris in contact with the surface; and a motive element for moving the carriage between a first position and a second position. This preferred embodiment of the present cleaning apparatus is particularly advantageous for removing elongate debris from one or more radiation source assemblies disposed in the fluid treatment system. The approach utilized in this preferred embodiment of the present cleaning apparatus is to include at least one cutting element which is moved along the exterior of the radiation source assembly. The cutting element is connected to a wiping element that is translated between a first position and a second position. As the wiping element is moved from the first position to the second position, it will tend to push the elongate debris toward a distal portion of the radiation source assembly. During this translation step, it is possible that some of the debris may be cut by the cutting element. As the wiping element approaches the distal portion of the radiation source assembly, it will tend to clamp down on the elongate debris and, as the force of movement is continually applied, the cutting element will cut the elongate debris. Once the elongate debris is cut, it will more readily fall away from the radiation source assembly and this action is facilitated by a flow of fluid past the radiation source assembly.
There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The clean apparatus comprises a cleaning sleeve moveable to remove fouling materials from an exterior portion of the radiation source assembly, the cleaning sleeve comprising at least one chamber for receiving a cleaning fluid and a cleaning sleeve inlet in fluid communication with the at least one chamber and a first conduit element for conveying the cleaning fluid to the cleaning sleeve inlet, the first conduit element being configured such that a distal portion of the first conduit element is in fluid communication with the cleaning sleeve inlet and a proximal portion of the first conduit element is disposed outside of fluid being treated in the fluid treatment system.
A62D 3/17 - Processes for making harmful chemical substances harmless, or less harmful, by effecting a chemical change in the substances by subjecting to electric or wave energy or particle or ionizing radiation to electromagnetic radiation, e.g. emitted by a laser
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
B08B 13/00 - Accessories or details of general applicability for machines or apparatus for cleaning
C02F 1/32 - Treatment of water, waste water, or sewage by irradiation with ultraviolet light
There is described In another of its aspects, the present invention provides a radiation source assembly comprising: (i) an elongate radiation source; (ii) a positioning element connected to a proximal portion of the elongate radiation source; and (iii) a connecting portion secured to a proximal portion of the positioning element and configured to engage a support element to maintain a distal portion of the elongate radiation source in a cantilevered position. The present radiation source assembly is configured such that the distal portion of the radiation source is cantilevered with the respect to the distal portion of the protective sleeve in which it is disposed. This feature obviates the need to use spacers, stops, springs and the like in a distal portion of the protective sleeve to maintain correct position of the radiation source within the protective sleeve. Further, the present radiation source assembly is advantageous in that allows for withdrawal of the radiation source from the radiation source assembly without the need to disengage all of the components. Thus, it is possible to replace a single radiation source by removing it from the protective sleeve during operation of the fluid treatment system. This operation can be accomplished quickly without the need to shut down the fluid treatment system or otherwise compensate for the fact that one of the radiation source is being serviced.
There is described a fluid treatment system comprising: (i) a fluid inlet; (ii) a fluid outlet; and (iii) a fluid treatment zone in fluid communication with the fluid inlet and the fluid outlet. The fluid treatment zone comprises a housing within which is disposed a fluid separation section (the separation section may include a single separation device or a combination of two or more similar or disimilar separation devices) and a fluid radiation section in fluid communication with one another. The fluid separation section removes solids in the fluid and the fluid radiation section irradiates the fluid to deactive microorganisms in the fluid. The fluid separation section and the fluid radiation section are configured to have a substantially common fluid flow path which significantly reduces the space or footprint requirement of and/or significantly reduces hydraulic head loss (pressure drops) in the overall fluid treatment system while allowing the two sections to perform their respective functions.
B01D 36/02 - Combinations of filters of different kinds
B01D 29/50 - Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
B01D 45/12 - Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by centrifugal forces
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
30.
RADIATION SOURCE MODULE AND FLUID TREATMENT SYSTEM
There is described a fluid treatment system particularly suited for radiation treatment of a flow of fluid (preferably water). The system comprises a fluid treatment zone for receiving a flow of fluid in contact with a surface of the fluid treatment zone. At least one elongate radiation source assembly is disposed in the fluid treatment zone. The elongate radiation source assembly has a longitudinal axis disposed transverse to a direction of fluid flow through the fluid treatment zone. The system further comprises a cleaning apparatus having at least one cleaning element in contact with an exterior surface of the at least one elongate radiation source assembly. A first motive element is provided and is operable to cause relative movement between a distal end of the at least one elongate radiation source assembly and the surface of the fluid treatment zone to define a gap therebetween. A second motive element is provided and is coupled to the cleaning system. The second motive element operable to move the cleaning system between a cleaning apparatus retracted position and a cleaning apparatus extended position. Movement of the cleaning system from the cleaning apparatus retracted position to the extended position causes debris contacting the at least one elongate radiation source assembly to be pushed into the gap. A radiation source module more use in such a fluid treatment system is also described.
There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The cleaning system comprises: a cleaning carriage comprising at least one cleaning element for contact with at least a portion of the exterior of the radiation source assembly; a rodless cylinder comprising an elongate housing having a first longitudinal axis; a slidable element disposed on an exterior surface of the elongate housing; and an elongate motive element coupled to the driving element. The slidable element is: (i) coupled to the cleaning carriage, and (ii) magnetically coupled to a driving element disposed within the elongate housing. The elongate motive element has a second longitudinal axis that is oriented in a substantially parallel, non-coaxial relationship with respect to the first longitudinal axis. There is also disclosed a fluid treatment system comprising: a fluid treatment zone for receiving a flow of fluid; at least one elongate radiation source assembly disposed in the fluid treatment zone; a cleaning apparatus having at least one cleaning element in contact with an exterior surface of the at least one elongate radiation source assembly; and a motive element coupled to the cleaning system. The elongate radiation source assembly has a longitudinal axis disposed transverse to a direction of fluid flow through the fluid treatment zone and a distal end of the at least one elongate radiation source assembly is spaced from a surface of the fluid treatment zone to define a gap. The motive element is operable to move the cleaning system between a retracted position and an extended position. Movement of the cleaning system from the retracted position to the extended position cause debris contacting the at least one elongate radiation source assembly to be pushed into the gap.
B08B 1/00 - Cleaning by methods involving the use of tools
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
B08B 13/00 - Accessories or details of general applicability for machines or apparatus for cleaning
There is described a fluid treatment system in which fluid to be treated is impinged under pressure on a radiation emitting surface. The fluid treatment system includes at least one radiation source having a radiation emitting surface and at least one nozzle element having a fluid discharge opening spaced from the radiation emitting surface. The fluid discharge opening is configured to impinge fluid to be treated on to at least a portion of the radiation emitting surface. The fluid treatment system is well suited to treating low transmittance fluid.
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
A23C 3/07 - Preservation of milk or milk preparations by irradiation, e.g. by microwaves
A23L 2/50 - Preservation of non-alcoholic beverages by irradiation or electric treatment without heating
A23L 3/26 - Preservation of foods or foodstuffs, in general, e.g. pasteurising, sterilising, specially adapted for foods or foodstuffs by irradiation without heating
C02F 1/30 - Treatment of water, waste water, or sewage by irradiation
There is disclosed a radiation source assembly comprising an elongate radiation emitting outer portion having non-circular cross-sectional shape and an elongate radiation source. A radiation source module and a fluid system incorporating the radiation source assembly are also disclosed. It has been discovered that the use of a non-circular shaped sleeve or outer lamp surface reduces the stress placed on these elements in a fluid treatment system in which the radiation source assemblies are disposed transverse (e.g., orthogonal) to the direction of fluid flow through the fluid treatment zone of the system.
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
There is described a chemical injection system. Preferably, the system comprises a number of tubular members. The distal end of each tubular member is configured to be immersed in a flow of fluid and the proximal end of each tubular member is connected to a chemical supply. The system further includes a guide member for receiving at least one tubular member. The guide member is configured to orient the at least one tubular in a predetermined region of the flow of fluid. The chemical injection system may be regarded as a trailing array of flexible injection lines. By balancing the flexibility, length, weight, diameter, buoyancy, hydrodynamic characteristics and/or the angle at which each flexible injection line is positioned relative the flow of fluid, it is possible to dispose the distal end of each flexible injection line in a pre-determined region in the flow of fluid.
There is disclosed an ultraviolet radiation device. The device comprises a base portion, a plurality of semiconductor structures connected to the base portion and an ultraviolet radiation transparent element connected to the plurality of semiconductor structures. Preferably: (i) the at least one light emitting diode is in direct contact with the ultraviolet radiation transparent element, or (ii) there is a spacing between the at least one light emitting diode and the ultraviolet radiation transparent element, the spacing being substantially completely free of air. There is also disclosed a fluid treatment system incorporating the ultraviolet radiation device.
A61M 1/36 - Other treatment of blood in a by-pass of the natural circulatory system, e.g. temperature adaptation, irradiation
C02F 1/32 - Treatment of water, waste water, or sewage by irradiation with ultraviolet light
H01L 23/29 - Encapsulation, e.g. encapsulating layers, coatings characterised by the material
H01L 29/20 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
H01L 29/201 - Semiconductor bodies characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds
In one of its aspects, the present invention relates to a fluid treatment system comprising: an inlet; an outlet; a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone: (i) comprises a first wall surface and a second wall surface opposed to the first wall surface, and (ii) having disposed therein at least one array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis transverse to a direction of fluid flow through the fluid treatment zone and each of the first wall surface and the second wall surface comprises a first fluid deflector element and a second fluid deflector element. The first fliud deflector element projecting into the fluid treatment zone to a greater extent than the second fluid deflector element.
There is disclosed an optical radiation sensor system for detecting radiation from a radiation source. The system comprises: a housing having a distal portion for receiving radiation from the radiation source and a proximal portion; a sensor element in communication with the proximal portion, the sensor element configured to detect and respond to incident radiation received from the radiation source; and motive means configured to move the housing with respect to the sensor element between at least a first position and a second position. A radiation pathway is defined between the radiation source and the sensor element when the housing is in at least one of the first position and the second position. Movement of the housing with respect to the sensor element causes a modification of intensity of radiation impinging on the sensor element. In its highly preferred embodiment, the radiation sensor system is of a modular design rendering the sensor system appropriate for use with one or more of various radiation sources, fluid thickness layers and/or in UVT conditions. In this highly preferred form, the sensor system may have built-in diagnostics for parameters such as sensor operation, radiation source output, fluid (e.g., water) UVT, radiation source fouling (e.g., fouling of the protective sleeves surrounding the radiation source) and the like. Other advantages of the present radiation sensor system include: incorporation of an integrated reference sensor, safe and ready reference sensor testing, UVT measurement capability and/or relatively low cost and ease of manufacture.
There is described a fluid treatment system. The fluid treatment system comprises: an open channel for receiving a flow of fluid and a fluid treatment zone. The fluid treatment zone comprising a plurality of elongate radiation source assemblies orientated such that: (i) a longitudinal axis of each radiation source assembly is transverse to a direction of fluid flow through the fluid treatment zone, and (ii) an end of each radiation source assembly is disposed above a predetermined maximum height of fluid flow in the open channel. A first baffle plate is disposed upstream of the fluid treatment zone. The first baffle plate is positioned such that a distal end thereof is below the predetermined maximum height of fluid flow in the open channel. In a preferred embodiment, the present fluid treatment system provides for an area in which a cleaning system for the radiation source assemblies can be 'parked' when not in use. In the so- called 'parked' position, the cleaning system may be readily accessed for servicing and the like without affecting the flow of fluid through the fluid treatment zone and a fluid treatment system. This is as significant advantage of the fluid treatment system.
B01J 19/12 - Processes employing the direct application of electric or wave energy, or particle radiationApparatus therefor employing electromagnetic waves
