Disclosed herein are devices, systems, and methods for coating a substrate. The method includes determining a data variable representing an actual state of a rate at which a coating material is emitted based on: a first response of a sensor before the sensor is exposed to the coating material and preferably heated thereby. The data variable is also determined based on a second response of the sensor after the sensor has been exposed to the coating material and preferably cools. The method also includes controlling a control element configured to affect the rate based on the data variable.
The invention relates to a coating device and to a method for operating a coating device. According to different embodiments, a coating device (100) can have: a bearing device (130) which provides a rotational axis (131) and is designed to rotate a tubular sputtering target (10) supported by means of the bearing device (130) about the rotational axis (131); a plurality of movably supported coupling electrodes (110) which are arranged one behind the other in a row along the rotational axis (131) for coupling an alternating voltage into the sputtering target (10); and a positioning device (120) which is designed to influence a position of the plurality of coupling electrodes (110) relative to one another and/or relative to the rotational axis (131) on the basis of a parameter that represents a geometry of the sputtering target (10).
According to various embodiments, a method can comprise: actuating a laser source (110) and an electric power source (118) in accordance with an operating sequence; wherein the operating sequence comprises a plurality of phases, in every phase of which: by means of the laser source, an excitation pulse directed to a target (112) is generated to excite an arc discharge at the target, by means of the electric power source (118) a first electric power pulse (120) is generated to electrically supply the arc discharge, and/or by means of the electric power source (118) a second electric power pulse (122) is generated to accelerate a material flow (116) away from the target, said material flow being separated from the target by means of the arc discharge; wherein the plurality of phases have: one or more than one first phase, of which in every first phase, for each excitation pulse, the first electric power pulse (120) and/or the second electric power pulse (122) are/is generated; and a second phase in which, for each second electric power pulse (122), two excitation pulses (114) and/or two first electric power pulses (120) are generated.
The invention relates to a process arrangement (100) comprising: a substrate transport drum (102) for transporting a substrate along a curved, preferably self-contained, transport path; a measuring system (104) designed to detect the substrate by means of an optical transmission measurement based on optical radiation; wherein the measuring system (104) comprises a radiation receiver (104b) for receiving the optical radiation; wherein the measuring system (104) comprises a radiation emitter (104a) for emitting the optical radiation in an emission direction (113), through the substrate transport drum (102) towards the radiation receiver (104b); wherein preferably the substrate transport drum (102) is arranged between the radiation receiver (104b) and the radiation emitter (104a).
According to various embodiments, a method (150) can comprise: determining (101) an actual state of a result of a two-sided coating process, by means of which a first layer stack is formed on a front side of a substrate and a second layer stack is formed on a rear side of the substrate, on the basis of: a model, which implements a link between the result and a spectral response of the result, and an actual state of the spectral response, an indication of the difference between a first sub-process of the coating process, by means of which the first layer stack is formed, and a simultaneous second sub-process of the coating process, by means of which the second layer stack is formed, and controlling (103) the coating process on the basis of the actual state of the result.
H01J 37/34 - Gas-filled discharge tubes operating with cathodic sputtering
C03C 17/245 - Oxides by deposition from the vapour phase
C03C 17/34 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
G01B 11/06 - Measuring arrangements characterised by the use of optical techniques for measuring length, width, or thickness for measuring thickness
6.
STEAM DISTRIBUTION DEVICE AND METHOD RELATING TO SAME
Disclosed herein are devices, systems, and methods for gas distribution in a coating process. The system may determine information representing a spatial distribution of a material vapor flow emitted from a plurality of emission nozzles. The system may control a regulator configured to affect, based on the information, a gas flow superposed on the material vapor flower. In this manner, it may be easier to counteract disturbances in the spatial distribution with which the material vapor flow exits from the plurality of emission nozzles, disturbances due to, for example, variations in the characteristics of the emission nozzles, flow-related variations in the tube, finite tube length, and the like.
C23C 16/52 - Controlling or regulating the coating process
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
Disclosed herein are systems, methods, and devices for transporting substrates. A transport device may include a plurality of rotational bodies, where each rotational body is rotatably attached for transporting a rod-shaped workpiece. The transport device may include a rotational excitation element configured to excite rotation of the workpiece when it is supported on one of the plurality of rotational bodies.
Disclosed herein are devices, systems, and methods for processing a solar cell precursor. The processing may include forming a transparent, electrically conductive first layer over the solar cell precursor. The processing may also include forming a transparent, electrically conductive second layer over the solar cell precursor, preferably in physical contact with the first layer. The first layer may comprise at least indium, zinc, and oxygen and the second layer may comprise oxygen and a greater proportion of indium than the first layer.
Disclosed herein is a circulation conveyor transport wheel that includes a framework at which the circulation conveyor transport wheel can be rotatably mounted and a multiplicity of coupling devices which are arranged at an outer circumference of the framework, wherein each coupling device has at least one form-fit contour for form-fitting coupling to a substrate carrier. The substrate carrier includes multiple members which are connected to one another by a rotary connection, two carriages which are arranged on mutually opposite sides of the substrate carrier to guide the substrate carrier along a transport path, and multiple coupling devices (as counterparts to the coupling device on the transport wheel), each of which comprises at least one form-fit contour arranged between the two carriages, wherein two form-fit contours are offset with respect to one another along the transport path of the substrate carrier.
B65G 23/16 - Endless driving elements extending parallel to belt or chain with dogs engaging abutments on belts or chains
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
10.
Device and method for substrate transport in vacuum processing systems
Disclosed herein are devices, systems, and methods for transporting a substrate for vacuum processing. The transport may be provided by a substrate carrying device that includes a support area by which a substrate carrier may be moveably supported. The substrate carrying device includes a plurality of electrodes that are galvanically separated from one another. The substrate carrying device includes a plurality of substrate carrying regions arranged consecutively in series with respect to one another, each substrate carrying region including an electrode of the plurality of electrodes and also including a substrate receiving device configured to receive a substrate placed in the substrate carrying region, preferably in physical contact with the electrode.
C23C 16/50 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating using electric discharges
In various embodiments, a method (300) for processing a solar cell precursor (402), having a side coated with at least one dielectric, may comprise atomizing (303) a sputter target (404) into a coating region (401), where the sputter target (404) comprises a semiconductor material; where the sputter target (404) further comprises a dopant of the semiconductor material in an amount greater than a solubility limit of the dopant in the semiconductor material and/or than a mass fraction of the dopant of 0.15%; disposing (305) the solar cell precursor (402), inserted in a substrate carrier, in the coating region (401), when the atomizing of the sputter target (404)takes place into the coating region (401) in such a way that the side is facing the sputter target (404); where the substrate carrier is configured such that an edge (510k, 512k), extending along a self-contained path, of the solar cell precursor (402) is shielded by the substrate carrier from the atomizing of the sputter target (404).
H01L 31/0368 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors
H01L 31/0747 - SEMICONDUCTOR DEVICES NOT COVERED BY CLASS - Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells comprising a heterojunction of crystalline and amorphous materials, e.g. heterojunction with intrinsic thin layer or HIT® solar cells
H01L 31/18 - Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
Vacuum coating systems consisting primarily of coating
machines, precision machine tools, nozzles, application
units, coating sprayers, coating guns, drives for vacuum
pumps, vacuum pumps, as well as coating and vacuum robots;
sputter coating systems consisting primarily of coating
machines, precision machine tools, nozzles, application
units, coating sprayers, coating guns, drives for vacuum
pumps, vacuum pumps, as well as coating and vacuum robots.
Disclosed herein are systems, devices, and methods for a magnet system for a sputtering device. The disclosed magnet system may include a housing having a housing interior. The magnet system may also include a magnet holder disposed in the housing interior and supported by the housing in a preferably stationary manner. The magnet system may also include a dehumidifying device adjacent to or disposed in the housing interior for drying the housing interior.
Disclosed herein are systems, methods, devices for a magnet system that includes a housing with a housing interior. The magnet system also includes a magnet holder disposed in the housing interior and supported by the housing, preferably stationary with respect thereto. The magnet system also includes a housing cover forming a fluid-tight chamber when mated with the housing, wherein the housing cover includes a gear stage, a generator, and a rotary coupling that couples the gear stage to the generator.
Disclosed herein are devices, methods, and systems related to a magnetron-target coupling that includes a target coupling flange, a shaft fixedly coupled to the target coupling flange on a face opposite the target coupling flange, and having a first linear bearing component on a face opposite the target coupling flange. The magnetron-target coupling also includes a communication interface having a first communication electrode and a second communication electrode that are electrically coupled to each other wherein the second communication electrode is fixedly attached to the target coupling flange on a side opposite the shaft, the target coupling flange being disposed between the first communication electrode and the second communication electrode. The first communication electrode is supported such that it may be moved toward and/or away from the second communication electrode.
Disclosed herein are systems, methods, and devices related to a magnet system for a sputtering device. The magnet system includes a bearing frame and a magnet holder having a first mounting area and a second mounting area. The magnet system has a first support device mounted to the magnet holder by the first mounting area and a second support device mounted to the magnet holder by the second mounting area. At least one of the first mounting area and the second mounting area are configured such that a position in which the first support device and the second support device are mounted to the magnet holder relative to each other may be adjusted. The first support device and the second support device are configured to engage with the bearing frame to form a bearing device for supporting the magnet holder.
According to various embodiments, a vacuum chamber body (151) can comprise: a plurality of chamber outer walls (151a to 151e) which peripherally surround a cavity (151h), of which a first chamber outer wall (151a) delimits the cavity (151h) in a first direction (101); wherein the first chamber outer wall (151a) has a chamber connection flange (112) for connecting another vacuum chamber body; wherein the first chamber outer wall (151a) also has a valve connection flange (114) for connecting a valve; wherein the chamber connection flange (112) is traversed along the first direction (101) by a first opening (112o) which opens into the cavity (151h), wherein the valve connection flange (114) is traversed along the first direction (101) by a second opening (114o) which opens into the cavity (151h); wherein the first opening (112o) has a spacing from the second opening (114o) along a second direction (105) which is transverse to the first direction (101); wherein an extent of the second opening (114o) along the second direction (105) is less than the spacing and/or than an extent of the first opening (112o) along the second direction (105).
C23C 14/56 - Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
B21C 37/08 - Making tubes with welded or soldered seams
C23C 16/54 - Apparatus specially adapted for continuous coating
According to various embodiments, a conveying device (100) can include: a plurality of rotational elements (102), each of which is rotatably mounted for conveying a bar-type workpiece (202); at least one rotation initiation member (210) which is designed to initiate a rotation of the workpiece (202) when the workpiece lies one or more than one of the plurality of rotational elements (102).
The instant disclosure relates to methods, devices, and code for controlling a coating process and, in particular, for controlling a coating process of a substrate. According to various embodiments, the method may include driving a first actuator that supplies the coating process, which is based on monitored process variables that are detected in parallel with one another. The control variables may be considered when driving the first actuator. The method may also include driving a second actuator that supplies the coating process, which is based on the detected monitored process variables. The detected monitored process variables may also be considered when driving the second actuator.
An ion source can have: a multiplicity of electrodes, which are mounted electrically separated from one another and have: a first electrode, which has a depression; a second electrode, which is arranged in the depression; a third electrode, which partially covers the depression and through which a slit passes which exposes the second electrode; one or more than one magnet, which is designed to provide a magnetic field in the slit.
f) for the form-fitting coupling-on of a substrate carrier (400), wherein the multiplicity of coupling devices (104) has a pair (302) of coupling devices (104), the form-fit contours of which have a smaller spacing to one another along the circumference than to the form-fit contours of the multiplicity of coupling devices (104) which are arranged immediately adjacent to the pair (302).
B65G 23/16 - Endless driving elements extending parallel to belt or chain with dogs engaging abutments on belts or chains
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
22.
Coating processes for vacuum chamber arrangements and apparatus thereof
Coating processes for vacuum chamber arrangements and apparatus thereof are herein disclosed. In some aspects, a coating process may include coating at least one workpiece using a vacuum chamber arrangement. The vacuum chamber arrangement may include a vacuum chamber, a substrate holding arrangement, an additional substrate holding arrangement, one or more bearings, a supply hose and an additional supply hose. The vacuum chamber may include a lock chamber, an additional lock chamber, a heating chamber, an additional heating chamber, and a coating chamber. The one or more bearings may support the substrate holding arrangement in such a way that it can be moved between the lock chamber and the coating chamber. The one or more bearings may also support the additional substrate holding arrangement in such a way that it can be moved between the additional lock chamber and the coating chamber.
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
C23C 16/54 - Apparatus specially adapted for continuous coating
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
C23C 14/56 - Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
According to various aspects of the disclosure, a method may comprise: varying a drive force, by which a chamber valve of a vacuum chamber is held closed, when the vacuum chamber has been evacuated; and aerating the vacuum chamber after the variation of the drive force; transporting a substrate through the chamber valve when the chamber valve has been opened.
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
According to various aspects of the disclosure, a valve assembly for a vacuum chamber housing may have: a valve housing, which has a substrate transfer gap; a valve flap, which is mounted so as to be rotatable about an axis of rotation, thus enabling said flap to be rotated into a first position and into a second position, wherein the axis of rotation is arranged in the substrate transfer gap, and wherein the substrate transfer gap is extended longitudinally along the axis of rotation; wherein the valve flap closes the substrate transfer gap in the first position and is arranged adjacent to the substrate transfer gap in the second position.
F16K 13/02 - Other constructional types of cut-off apparatus; Arrangements for cutting-off with both sealing faces shaped as small segments of a cylinder and the moving member pivotally mounted
In various aspects of the disclosure, a method of operating a process group that performs at least a first reactive coating process and a second reactive coating process may comprise: coating of a substrate by means of the first reactive coating process and by means of the second reactive coating process; closed-loop control of the process group by means of a first manipulated variable of the first coating process and a second manipulated variable of the second coating process and using a correction element; wherein the correction element relates the first manipulated variable and the second manipulated variable to one another in such a way that their control values are different from one another.
According to different embodiments, the coating assembly (200) can have: a particle feed; a collecting container (204) facing the particle feed, a cavity (206) being formed between the particle feed and the collecting container; and a coating material source (208) for evaporating a coating material into the cavity (206); wherein the particle feed (202) has a feed gap (202s) which extends along a closed path, and the cavity (206) extends from the feed gap (202s) to the collecting container (204) and partly surrounds the coating material source (208).
C23C 14/22 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating
C23C 14/02 - Pretreatment of the material to be coated
C23C 16/02 - Pretreatment of the material to be coated
B22F 1/00 - Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
B22F 1/02 - Special treatment of metallic powder, e.g. to facilitate working, to improve properties; Metallic powders per se, e.g. mixtures of particles of different composition comprising coating of the powder
According to different embodiments, a particle separation device (100) can have: an inlet opening, an outlet opening, and a plurality of separation stages (104a, 104b) which are designed to separate particles (106) conducted from the inlet opening to the outlet opening, wherein of the plurality of separation stages (104a, 104b): one separation stage (104b) has an impact surface (104b) and is designed to accelerate the particles (106) in the direction of the impact surface (104p) such that the resulting impact of the particles (106) on the impact surface (104p) separates the particles from one another; and another separation stage (104a) is designed to introduce electrons into the particles (106) such that the resulting charge of the particles (106) separates the particles from one another.
B22F 1/00 - Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
B22F 1/02 - Special treatment of metallic powder, e.g. to facilitate working, to improve properties; Metallic powders per se, e.g. mixtures of particles of different composition comprising coating of the powder
C04B 35/626 - Preparing or treating the powders individually or as batches
H01M 4/36 - Selection of substances as active materials, active masses, active liquids
B01J 2/00 - Processes or devices for granulating materials, in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
C23C 14/02 - Pretreatment of the material to be coated
C23C 14/22 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating
B01J 8/00 - Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
B03C 7/00 - Separating solids from solids by electrostatic effect
B02C 19/00 - Other disintegrating devices or methods
28.
Temperature control roller, transporting arrangement and vacuum arrangement
According to various embodiments, the temperature control roller may comprise: a cylindrical roller shell, which has a multiplicity of gas outlet openings; a temperature control device, which is configured to supply and/or extract thermal energy to or from the cylindrical roller shell; multiple gas lines made to extend along the axis of rotation; a gas distributing structure, which couples the multiple gas lines and the multiplicity of gas outlet openings to one another in a gas-conducting manner, the gas distributing structure having a lower structure density than the multiplicity of gas outlet openings.
a) that can comprise: a container (104) which comprises an area for receiving solid particles; at least one electron source (106) for introducing electrons into the solid particles such that an electrostatic charge of the solid particles produced by the electrons separates them from each other and accelerates them in a direction out from the container (104); a vibration source (110) which is designed to introduce a vibration in the region in order to loosen the solid particles, the electronic source comprising an emission surface for emitting electrons into a vacuum emission region.
B05D 3/04 - Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
C23C 14/02 - Pretreatment of the material to be coated
30.
Electron beam evaporator, coating apparatus and coating method
In accordance with various embodiments, an electron beam evaporator can comprise the following: a tubular target; an electron beam gun for producing at least one vapor source on a removal surface of the tubular target by means of an electron beam; wherein the removal surface is a ring-shaped axial end surface or a surface of the tubular target that extends conically or in a curved fashion from the free end edge.
In accordance with various embodiments, a coating arrangement may comprise: an electron beam gun for providing an electron beam; a beam trap for trapping the electron beam; a control device for driving the electron beam gun and/or the beam trap, wherein the control device is configured to switch over the driving between a plurality of configurations, of which: in a first configuration, the electron beam is directed onto the beam trap; and in a second configuration, the electron beam is directed past the beam trap.
According to various embodiments, a vacuum arrangement may comprise the following: a first dehydration chamber and a second dehydration chamber, which are gas-separated from one another; a substrate transfer chamber for changing clocked substrate transport into continuous substrate transport towards the second dehydration chamber; a first high-vacuum pump of gas-transfer type for evacuating the first dehydration chamber; and a second high-vacuum pump of gas-binding type for evacuating the second dehydration chamber; wherein the first dehydration chamber is, with respect to the substrate transport, arranged between the second dehydration chamber and the substrate transfer chamber.
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
C23C 14/56 - Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
F26B 5/06 - Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum the process involving freezing
F26B 5/04 - Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
33.
Electron beam vaporizer and method for vaporizing a vaporization material by means of an electron beam
According to various embodiments, a method for vaporizing a vaporization material by means of an electron beam may include the following: generating a first deflection pattern having a first power density at least on an end face of a rod-shaped vaporization material; and, subsequently, generating a second deflection pattern having a second power density on a portion of an outer edge of the rod-shaped vaporization material and a portion of an inner edge of a ring crucible, which encloses the rod-shaped vaporization material, wherein the second power density is greater than the first power density.
09 - Scientific and electric apparatus and instruments
40 - Treatment of materials; recycling, air and water treatment,
42 - Scientific, technological and industrial services, research and design
Goods & Services
Installations, machines and machine tools, in particular
installations and machines for treatment of glass, strips of
metal, plastic film, and semiconductor wafers; coating
machines, in particular for coating of aluminum foils,
copper foils, and plastic foils; machines and machine tools
for treatment of materials and for manufacturing, in
particular vapor deposition machines for deposition of metal
layers, carbide layers, nitride layers, and carbon layers. Apparatus and instruments for accumulating and storing
electricity, in particular rechargeable electric batteries,
rechargeable cells, and capacitors; electrodes, in
particular for electrical and electrochemical purpose;
anodes, in particular for rechargeable electric batteries,
rechargeable cells, and capacitors; cathodes, in particular
for rechargeable electric batteries, rechargeable cells, and
capacitors; current collectors, in particular for
rechargeable electric batteries, rechargeable cells, and
capacitors; aluminum foil coated with a metal layer and a
carbon layer, in particular for rechargeable electric
batteries, rechargeable cells, and capacitors; copper foil
coated with a metal layer and a carbon layer, in particular
for rechargeable electric batteries, rechargeable cells, and
capacitors; aluminum or copper coated plastic foil coated
with a metal layer and a carbon layer, in particular for
rechargeable electric batteries, rechargeable cells, and
capacitors; aluminum foil coated with metal carbide, in
particular for rechargeable electric batteries, rechargeable
cells, and capacitors; copper foil coated with metal
carbide, in particular for rechargeable electric batteries,
rechargeable cells, and capacitors; aluminum or copper
coated plastic foil coated with metal carbide, in particular
for rechargeable electric batteries, rechargeable cells, and
capacitors; aluminum foil coated with metal nitride, in
particular for rechargeable electric batteries, rechargeable
cells, and capacitors; copper foil coated with metal
nitride, in particular for rechargeable electric batteries,
rechargeable cells, and capacitors; aluminum or copper
coated plastic foil coated with metal nitride, in particular
for rechargeable electric batteries, rechargeable cells, and
capacitors; thin films, in particular adhesive thin films
for industrial use. Application of coatings using vacuum deposition techniques,
in particular application of metal coatings, carbide
coatings, nitride coatings, or carbon coatings; treatment
and coating of metal surfaces and plastic surfaces;
consultancy services relating to the accumulation and
storage of electrical power; custom manufacture of
batteries, parts of batteries, and battery systems; thin
film coating of battery components. Engineering services in the field of research and
development of apparatus and instruments for accumulating
and storing electricity, in particular of rechargeable
electric batteries, rechargeable cells, and capacitors;
consultation services in the field of research and
development of apparatus and instruments for accumulating
and storing electricity, in particular of rechargeable
electric batteries, rechargeable cells, and capacitors;
planning and development in the field of apparatus and
instruments for accumulating and storing electricity, in
particular of rechargeable electric batteries, rechargeable
cells, and capacitors.
Herein is disclosed a process comprising transporting of a foil structure in a coating region in a vacuum chamber, wherein the foil structure has a thickness of less than 40 μm; and coating the foil structure with a protective layer using a gaseous coating material; wherein the gaseous coating material comprises a metal; applying an active material on the foil structure to form a first electrode which has a first chemical potential; assembling the first electrode with a second electrode, where the second electrode has a second chemical potential; and encapsulating the first electrode and the second electrode.
09 - Scientific and electric apparatus and instruments
11 - Environmental control apparatus
Goods & Services
Machines and machine tools, in particular installations and
machines for treatment of glass, strips of metal, plastic
film and semiconductor wafers; coating machines; machines
for surface deposition; vapor deposition machines. Electric and electronic control apparatus for sputtering
systems; measuring, signalling, checking (supervision)
apparatus and instruments, in particular for machines and
installations for the treatment of glass, strips of metal,
plastic film and semiconductor wafers; measuring, detecting
and monitoring instruments, indicators and controllers;
industrial controls incorporating software; measuring,
counting, alignment and calibrating instruments; data
loggers and recorders; data processing equipment, in
particular for machines and installations for treatment of
glass, strips of metal, plastic films and semiconductor
wafers; computers and computer software, in particular for
machines and installations for treatment of glass, strips of
metal, plastic films and semiconductor wafers; apparatus and
instruments for coating processes, namely, electric control
systems for machinery, electric control panels, industrial
automation controls and sputtering control installations;
magnetron sputtering industrial processing apparatus for
treatment of glass, strips of metal, plastic films and
semiconductor wafers, in particular for magnetrons,
magnetbars, endblocks; electron beam installations for
industrial use, in particular, electron emission monitors
for use in depositing materials, crucibles for electron beam
evaporation; scientific, industrial, and laboratory devices
for treatment using electricity (terms considered too vague
by the International Bureau - rule 13.2.b) of the Common
Regulations); electron beam power supply apparatus; ion beam
power supply apparatus; glow discharge apparatus; recorded
content manufacturing software, process controlling
software. Apparatus for lighting, heating, steam generating, cooking,
refrigerating, drying, ventilating and water supply; all of
the aforesaid goods being in particular for machines and
installations for the treatment of glass, strips of metal,
plastic films and semiconductor wafers; industrial treatment
installations (terms considered too vague by the
International Bureau - rule 13.2.b) of the Common
Regulations); industrial ovens and furnaces (not for food or
beverages); lighting and lighting reflectors; heating
apparatus, in particular flash lamp heating apparatus.
09 - Scientific and electric apparatus and instruments
40 - Treatment of materials; recycling, air and water treatment,
42 - Scientific, technological and industrial services, research and design
Goods & Services
Installations, machines and machine tools, in particular coating machines for treatment of glass, strips of metal, plastic film, and semiconductor wafers; coating machines, in particular for coating of aluminum foils, copper foils, and plastic foils; machines and machine tools for treatment of materials and for manufacturing, in particular vapor deposition machines for deposition of metal layers, carbide layers, nitride layers, and carbon layers Apparatus and instruments for accumulating and storing electricity, in particular rechargeable batteries, rechargeable electrochemical cells, and capacitors; electrodes, in particular for electrical and electrochemical purpose; anodes, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; cathodes, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; current collectors, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; engineering material for electrical conduction comprising aluminum foil coated with a metal layer and a carbon layer, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; engineering material for electrical conduction comprising copper foil coated with a metal layer and a carbon layer, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; engineering material for electrical conduction comprising aluminum or copper coated plastic foil coated with a metal layer and a carbon layer, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; engineering material for electrical conduction comprising aluminum foil coated with metal carbide, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; engineering material for electrical conduction comprising copper foil coated with metal carbide, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; engineering material for electrical conduction comprising aluminum or copper coated plastic foil coated with metal carbide, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; circuit for electrical conduction comprising aluminum foil coated with metal nitride, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; engineering material for electrical conduction comprising copper foil coated with metal nitride, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; engineering material for electrical conduction comprising aluminum or copper coated plastic foil coated with metal nitride, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; engineering material for electrical conduction comprising thin films, in particular adhesive thin films for industrial use Application of coatings using vacuum deposition techniques, in particular application of metal coatings, carbide coatings, nitride coatings, or carbon coatings; application of decorative and protective coatings to metal and plastic surfaces by means of vapor deposition galvanization; consultancy services relating to the supply generation of electrical power; custom manufacture of batteries, parts of batteries, and battery systems; heat treatment for manufacturing of thin film coating of on battery components Engineering services in the field of research and development of apparatus and instruments for accumulating and storing electricity, in particular of rechargeable electric batteries, rechargeable cells, and capacitors; consultation services in the field of research and development of apparatus and instruments for accumulating and storing electricity, in particular of rechargeable electric batteries, rechargeable cells, and capacitors; research and development in the field of apparatus and instruments for accumulating and storing electricity, in particular of rechargeable electric batteries, rechargeable cells, and capacitors
A method comprises: forming a first layer stack on a first substrate by means of a multiplicity of coating processes, each coating process of which forms at least one layer of the first layer stack; detecting an optical spectrum of the first layer stack; determining correction information for at least one coating process of the multiplicity of coating processes using a model, wherein the model provides a right-unique mapping function between a deviation of the spectrum from a desired spectrum and the correction information; and changing at least one control parameter for controlling the at least one coating process of the multiplicity of coating processes using the correction information; and forming a second layer stack on the first or a second substrate by means of the multiplicity of coating processes using the changed control parameter, each coating process of which forms at least one layer of the second layer stack.
According to various embodiments, a transporting device may comprise: a plurality of transporting rollers, of which at least two transporting rollers comprises: a glass tube mounted rotatably about an axis of rotation; the glass tube being joined together from a plurality of tube segments, a first tube segment of which is arranged between two second tube segments; and the first tube segment having a plurality of portions, the circumferential surfaces of which are surfaces of rotation with respect to the axis of rotation and/or are arranged coaxially; the plurality of transporting rollers providing by means of the circumferential surfaces a transporting surface for transporting a substrate in plate form and/or in strip form.
B65G 39/04 - Adaptations of individual rollers and supports therefor the rollers comprising a number of roller- forming elements mounted on a single axle
B65G 39/09 - Arrangements of bearing or sealing means
09 - Scientific and electric apparatus and instruments
11 - Environmental control apparatus
Goods & Services
Machines and machine tools for the application of thin film coatings on materials, namely on, glass, metal strips, plastic films, and semiconductor wafers; vacuum coating machines; machines for surface deposition, namely, physical vapor deposition machines, chemical vapor deposition machines; semiconductor manufacturing machines for surface deposition; semiconductor manufacturing machines, namely, vapor deposition machines Electric and electronic control devices for sputtering systems used in semiconductor manufacturing, in particular used in applying thin film coatings; Electronic measuring apparatus for measuring optical properties of thin films, electric voltage, and electric current for use with machines and installations for the treatment of glass, strips of metal, plastic films and semiconductor wafers; Industrial and Scientific apparatus, namely, sensing and signaling devices for measurement and quality control of materials; Electronic instruments for use in remote inspection and measurement of industrial components of machines and installations for the treatment of glass, strips of metal, plastic films and semiconductor wafers, using remote visual devices; Electric or electronic sensors for sensing pressure, light, electric voltage, electric current, speed, position, and concentration for use with machines and installations for the treatment of glass, strips of metal, plastic films and semiconductor wafers; Electric voltage, electric current, water level, and speed indicators; Programmable logic, power, electrical, and industrial process controllers; Industrial automation controls incorporating recorded software for industrial process control; Electronic data loggers and recorders; Computers and recorded computer software for process control and process analysis, for use with machines and installations for treatment of glass, strips of metal, plastic films and semiconductor wafers; Apparatus and instruments for coating processes, namely, electric control systems for machinery, electric control panels, industrial automation controls and electronic control installations for the remote control of sputtering machines; magnetron sputtering industrial processing apparatus for treatment of glass, strips of metal, plastic films and semiconductor wafers, namely, magnetrons for use in generating direct currents and alternating currents up to radio frequencies, magnet bars, and end blocks for transmitting energy between a target and a power supply, all the aforementioned used in thin film coating; electron beam installations for industrial use, in particular, electronic electron emission monitors for monitoring the deposition of materials and crucibles, being scientific, industrial and laboratory equipment, for electron beam evaporation; power supplies for electron beam machines; power supplies for ion beam machines; glow discharge apparatus being electric discharge devices, other than for lighting; recorded manufacturing software for monitoring and controlling factory manufacturing processes; downloadable industrial process control software Industrial treatment installations being ionization apparatus for the treatment of solids and gases for industrial use; industrial curing ovens and furnaces, not for food or beverages; lighting tubes and light reflectors; flash lamp heating apparatus being discharge lamps
41.
Vacuum chamber arrangement and method for processing a substrate
A vacuum chamber having a vacuum chamber; at least one processing region arranged in the vacuum chamber; and a substrate holding arrangement for transporting and/or positioning a substrate or multiple substrates in the processing region, wherein the substrate holding arrangement has: a first drive train with a first substrate holder, the first substrate holder being configured to rotatably hold one or more substrates, a second drive train with a first support arm, wherein the first substrate holder is held rotatably by the first support arm, a third drive train with a second substrate holder, the second substrate holder being configured for rotatably holding one or more substrates, and a fourth drive train with a second support arm, wherein the second substrate holder is held rotatably by the second support arm, and wherein the first, second, third and fourth drive trains are each configured to be controllable independently of one another.
H01L 21/677 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for conveying, e.g. between different work stations
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
09 - Scientific and electric apparatus and instruments
40 - Treatment of materials; recycling, air and water treatment,
42 - Scientific, technological and industrial services, research and design
Goods & Services
Installations, machines and machine tools, in particular installations and machines for treatment of glass, strips of metal, plastic film, and semiconductor wafers; Coating machines, in particular for coating of aluminum foils, copper foils, and plastic foils; Machines and machine tools for treatment of materials and for manufacturing, in particular vapor deposition machines for deposition of metal layers, carbide layers, nitride layers, and carbon layers. Apparatus and instruments for accumulating and storing electricity, in particular rechargeable electric batteries, rechargeable cells, and capacitors; Electrodes, in particular for electrical and electrochemical purpose; Anodes, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Cathodes, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Current collectors, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Aluminum foil coated with a metal layer and a carbon layer, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Copper foil coated with a metal layer and a carbon layer, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Aluminum or copper coated plastic foil coated with a metal layer and a carbon layer, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Aluminum foil coated with metal carbide, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Copper foil coated with metal carbide, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Aluminum or copper coated plastic foil coated with metal carbide, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Aluminum foil coated with metal nitride, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Copper foil coated with metal nitride, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Aluminum or copper coated plastic foil coated with metal nitride, in particular for rechargeable electric batteries, rechargeable cells, and capacitors; Thin films, in particular adhesive thin films for industrial use. Application of coatings using vacuum deposition techniques, in particular application of metal coatings, carbide coatings, nitride coatings, or carbon coatings; Treatment and coating of metal surfaces and plastic surfaces; Consultancy services relating to the accumulation and storage of electrical power; Custom manufacture of batteries, parts of batteries, and battery systems; Thin film coating of battery components. Engineering services in the field of research and development of apparatus and instruments for accumulating and storing electricity, in particular of rechargeable electric batteries, rechargeable cells, and capacitors; Consultation services in the field of research and development of apparatus and instruments for accumulating and storing electricity, in particular of rechargeable electric batteries, rechargeable cells, and capacitors; Planning and development in the field of apparatus and instruments for accumulating and storing electricity, in particular of rechargeable electric batteries, rechargeable cells, and capacitors.
43.
Processing arrangement and method for conditioning a processing arrangement
A processing arrangement comprising: a process chamber comprising an upper chamber wall, a lower chamber wall and two lateral chamber walls; an insulating structure, arranged between the processing region and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for thermally insulating the processing region, wherein the insulating structure is configured as gas-permeable at least in sections in such a way that a process gas from the processing region can flow out of the processing region in the direction in each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, through the insulating structure; and a gas channel, arranged between the insulating structure and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for pumping away the process gas which flows through the insulating structure.
C23C 14/56 - Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
C23C 14/54 - Controlling or regulating the coating process
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating
09 - Scientific and electric apparatus and instruments
11 - Environmental control apparatus
Goods & Services
Installations, machines and machine tools, in particular installations and machines for treatment of glass, strips of metal, plastic film and semiconductor wafers; coating machines; machines for surface deposition; vapor deposition machines. Electric apparatus, namely sputtering systems; measuring, signalling, checking (supervision) apparatus and instruments, in particular for machines and installations for the treatment of glass, strips of metal, plastic film and semiconductor wafers; Measuring, detecting and monitoring instruments, indicators and controllers; industrial controls incorporating software; measuring, counting, alignment and calibrating instruments; data loggers and recorders; data processing equipment, in particular for machines and installations for treatment of glass, strips of metal, plastic films and semiconductor wafers; computers and computer software, in particular for machines and installations for treatment of glass, strips of metal, plastic films and semiconductor wafers; apparatus and instruments for coating processes, namely, electric control systems for machinery, electric control panels, industrial automation controls, sputtering installations; magnetron sputtering installations for treatment of glass, strips of metal, plastic films and semiconductor wafers, in particular magnetrons, magnetbars, endblocks; electron beam installations, in particular, electron emitters for use in depositing materials, crucibles for electron beam evaporation; scientific, industrial, and laboratory devices for treatment using electricity; electron beam supply apparatus; ion beam supply apparatus; glow discharge apparatus; heating apparatus, in particular flash lamp heating apparatus; recorded content manufacturing software, process controlling software. Apparatus for lighting, heating, steam generating, cooking, refrigerating, drying, ventilating and water supply; all of the aforesaid goods being in particular for machines and installations for the treatment of glass, strips of metal, plastic films and semiconductor wafers; industrial treatment installations; industrial ovens and furnaces (not for food or beverages); lighting and lighting reflectors.
45.
SOLID PARTICLE SOURCE, TREATMENT SYSTEM AND METHOD
The invention relates to various embodiments of a solid particle-source (100a, 100a) that can comprise: a container (104) which comprises an area for receiving solid particles; at least one electron source (106) for introducing electrons into the solid particles such that an electrostatic charge of the solid particles produced by the electrons separates them from each other and accelerates them in a direction out from the container (104); a vibration source (110) which is designed to introduce a vibration in the region in order to loosen the solid particles, the electronic source comprising an emission surface for emitting electrons into a vacuum emission region.
The disclosure relates to a method for coating a substrate with particles, wherein the following method steps are carried out in a vacuum: positioning a substrate surface of the substrate to be coated in a vacuum and in the direction of a region in which there are disposed solid particles with which the substrate surface is to be coated; and; and introducing electrons into the solid particles for electrostatic charging of the solid particles in such a way that a force brought about by the electrostatic charging separates the solid particles from one another and accelerates them in the direction of the substrate surface of the substrate for coating of the substrate surface with at least a portion of the separated solid particles. A device that can be used in accordance with the disclosure has a particle container, a substrate holder and an electron source.
B05D 3/06 - Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
H01M 10/0525 - Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
According to the present disclosure, a process includes transporting of a foil structure in a coating region in a vacuum chamber, wherein the foil structure has a thickness of less than 40 μm; and coating the foil structure by physical vapor deposition, which includes forming a gaseous coating material in the coating region; wherein the gaseous coating material includes carbon, such that a protective layer is formed that includes a carbon microstructure covering more than about 50% of the foil structure and having a fraction of pores or voids less than about 50%.
According to various embodiments, an electron beam evaporator (100) can comprise the following: a tube target (102); an electron beam gun (104) for producing at least one vapour source (102q) on a removal surface (102f) of the tube target (102) by means of an electron beam (104e); wherein the removal surface (102f) is an annular axial end surface, or is a surface of the tube target (102) that tapers or curves away from the free end edge.
In various embodiments, a method of forming a structured layer (202) on a substrate (102) may comprise the following: coating the substrate (102) with a layer (202) to be structured that has a target material (202t) and a sacrificial material (202o), where, in the course of coating, the sacrificial material (202o) is disposed in a plurality of mutually separate regions of the layer (202) and the target material (202t) is disposed between them and/or over them, so that the sacrificial material (202o) is embedded into the target material (202t) and/or between the target material (202t) and the substrate (102); where the disposing of the sacrificial material (202o) and/or of the target material (202t) comprises disposing a plurality of particulate solids (104) over the substrate (102), where the plurality of particulate solids disposed over the substrate come from a particle stream; removing the sacrificial material (202o), so that the plurality of regions of the layer (202) are opened.
C23C 24/00 - Coating starting from inorganic powder
C23C 4/00 - Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
C23C 14/00 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
C23C 16/00 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
B05D 1/04 - Processes for applying liquids or other fluent materials performed by spraying involving the use of an electrostatic field
C23C 14/02 - Pretreatment of the material to be coated
C23C 14/04 - Coating on selected surface areas, e.g. using masks
C23C 14/22 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
C23C 16/02 - Pretreatment of the material to be coated
C23C 16/04 - Coating on selected surface areas, e.g. using masks
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating
C23C 16/54 - Apparatus specially adapted for continuous coating
In accordance with various embodiments, provision is made of a substrate holding device, wherein the latter may comprise a carrier plate with a recess, the recess extending from an upper side of the carrier plate to a lower side of the carrier plate through the carrier plate, a holding frame, which has a frame opening and a support area, surrounding the frame opening, for holding a substrate in the recess, wherein the holding frame inserted into the recess lies on the carrier plate in sections.
H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
H01L 21/673 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components using specially adapted carriers
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
The invention relates to a method, a coating device and a processing arrangement. According to different forms of embodiment, the method (100) can comprise the following steps: producing a vacuum in a coating region (803) and in a collection region (805); emitting solid particles with a first main direction of propagation (102e) through the coating region (803) into the collection region (805); and evaporating a coating material with a second main direction of propagation (104e) into the coating region (803), the first main direction of propagation (102e) and the second main direction of propagation (104e) extending at an angle to each other such that the coating material is evaporated past the collection region (805).
C23C 14/30 - Vacuum evaporation by wave energy or particle radiation by electron bombardment
B22F 1/02 - Special treatment of metallic powder, e.g. to facilitate working, to improve properties; Metallic powders per se, e.g. mixtures of particles of different composition comprising coating of the powder
C23C 14/22 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
C23C 24/00 - Coating starting from inorganic powder
52.
CHAMBER ARRANGEMENT, SERVICE DEVICE, SERVICE ARRANGEMENT AND METHOD
According to different embodiments, a chamber arrangement (100a) can comprise the following: a chamber housing (802) having multiple processing areas (803a, 803b), each of which processing areas defines a transfer position (813a, 813b) and is exposed by a respective opening in the chamber housing (802); multiple positioning chamber structures (833a, 833b), each of which positioning chamber structure is assigned to exactly one processing area of the multiple processing areas (803a, 803b) and is configured for positioning a suitable service device (100b) in the transfer position (813a, 813b) thereof; wherein the chamber housing (802) is configured such that if the service device (100b) is positioned by means of a positioning chamber structure of the multiple positioning chamber structures (833a, 833b), a processing unit can be moved through the respective opening between a processing area assigned to the positioning chamber structure and the service device (100b).
The invention relates to a method for coating a substrate with particles, wherein the following method steps are carried out in a vacuum: positioning a substrate surface to be coated of the substrate (7) in a vacuum and in the direction of a region in which solid particles are arranged, with which the substrate surface is to be coated; and introducing electrons into the solid particles for electrostatically charging the solid particles in such a way that a force caused by the electrostatic charging separates the solid particles from one another and accelerates same in the direction of the substrate surface of the substrate (7), in order to coat the substrate surface with at least one portion of the solid particles that are separated from one another. A device that can be used for this purpose has a particle container, a substrate holder and an electron source.
In various embodiments, an end block assembly for rotatably mounting a tubular electrode in a processing chamber is provided. The end block assembly includes a receptacle region for receiving a bearing assembly which has a coupling region for coupling the tubular electrode thereto, the bearing assembly of which the coupling region is supported by a sleeve of the bearing assembly. The sleeve is plug-fitted into the receptacle region. The sleeve is joined together from a plurality of segments, the external faces thereof forming a lateral surface of the bearing assembly and at least two segments thereof being formed from dissimilar materials. The external faces of the two segments are mutually aligned such that they are flush with one another.
F16C 19/24 - Bearings with rolling contact, for exclusively rotary movement with bearing rollers essentially of the same size in one or more circular rows, e.g. needle bearings for radial load mainly
H01J 25/50 - Magnetrons, i.e. tubes with a magnet system producing an H-field crossing the E-field
According to various embodiments, a socket arrangement for holding an end block on a process chamber may include the following: a first socket element with a first fastening arrangement for fastening the first socket element on a process chamber wall and with a second fastening arrangement; and a second socket element with a third fastening arrangement, for fastening the second socket element on the first socket element and with a fourth fastening arrangement for fastening an end block on the second socket element; wherein the second fastening arrangement of the first socket element and the third fastening arrangement of the second socket element may be formed for engaging in one another with play in such a way that the second socket element may be deflectable in relation to the first socket element.
In various embodiments, a transporting device for transporting a substrate in a process chamber is provided. The transporting device includes a guiding rail arrangement having two guiding rails for mounting a multiplicity of bars between the two guiding rails. The two guiding rails form a closed path of movement along which the multiplicity of bars are guided. The transporting device further includes the multiplicity of bars that are mounted in the guiding rail arrangement, and a drive device for pushing at least one bar of the multiplicity of bars in such a way that, in a transporting region of the guiding rail arrangement, in each case multiple bars of the multiplicity of bars are pushed against one another and the bars that have been pushed against one another move along the path of movement in the transporting region.
B65G 35/08 - Mechanical conveyors not otherwise provided for comprising trains of unconnected load-carriers, e.g. belt sections, movable in a path, e.g. a closed path, adapted to contact each other and to be propelled by means arranged to engage each load-carrier in turn
B65G 17/06 - Conveyors having an endless traction element, e.g. a chain, transmitting movement to a continuous or substantially-continuous load-carrying surface or to a series of individual load-carriers; Endless-chain conveyors in which the chains form the load-carrying surface having a load-carrying surface formed by a series of interconnected, e.g. longitudinal, links, plates, or platforms
C23C 14/35 - Sputtering by application of a magnetic field, e.g. magnetron sputtering
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
B65G 17/38 - Chains or like traction elements; Connections between traction elements and load-carriers
09 - Scientific and electric apparatus and instruments
11 - Environmental control apparatus
42 - Scientific, technological and industrial services, research and design
Goods & Services
(1) Vacuum coating equipment, namely vapor deposition equipment, metal strip vapor deposition equipment, foil (web) coating equipment, wafer coating equipment, namely, coating equipment for the creation of thin-films; apparatuses and instruments for the monitoring, control and regulation of coating processes, namely for measuring plasma intensity, oxygen particle pressure, voltage, substrate temperature, and for analyzing ion current and ion energy and layer thickness and layer composition during evaporation and sputtering, all for use in sputter deposition processes and for use in vapor deposition processes; plasma emission monitors for use in sputtering processes and for use in evaporation processes, both in the industrial coating of glass substrates; equipment for coating with a sputtering process by causing the atoms of a solid to be removed from the surface of a target by bombardment with process gas atoms, ions and molecules in a plasma discharge, and for coating with an evaporation process, both in a vacuum environment, namely for coating glass, polymer web, metal strips, wafers and steel tubes, namely for use in the manufacture of architectural glass, solar cells, solar absorbers, CSP (Concentrated Solar Power) mirrors, CSP (Concentrated Solar Power) receiver tubes, solar thermal collectors, thin film displays and thin film batteries, fuel cells and in the fields of optical refinement; plasma enhanced CVD (Chemical Vapor Deposition) equipment for producing and depositing films on materials for use in the photovoltaic manufacturing industry, in the architecture glass manufacturing industry and in the technical metal strip, pipe and foil (web) manufacturing industry, namely for displays, reflectors and absorbers; components for melting and evaporating coating materials namely, electron beam evaporators, radiation heated evaporators, components for magnetron sputter coaters, evaporation devices, namely, ingot evaporators, inorganic and organic substance evaporators, vapor distributors, vacuum melting equipment, namely electron beam furnaces and plasma arc furnaces. (1) Mechanical, electrical, chemical and process engineering services, in the field of developing and planning of installations and processes for vacuum coating and vacuum metallurgy.
09 - Scientific and electric apparatus and instruments
11 - Environmental control apparatus
42 - Scientific, technological and industrial services, research and design
Goods & Services
(1) Vacuum coating equipment, namely vapor deposition equipment, metal strip vapor deposition equipment, foil (web) coating equipment, wafer coating equipment, namely, coating equipment for the creation of thin-films; apparatuses and instruments for the monitoring, control and regulation of coating processes, namely for measuring plasma intensity, oxygen particle pressure, voltage, substrate temperature, and for analyzing ion current and ion energy and layer thickness and layer composition during evaporation and sputtering, all for use in sputter deposition processes and for use in vapor deposition processes; plasma emission monitors for use in sputtering processes and for use in evaporation processes, both in the industrial coating of glass substrates; equipment for coating with a sputtering process by causing the atoms of a solid to be removed from the surface of a target by bombardment with process gas atoms, ions and molecules in a plasma discharge, and for coating with an evaporation process, both in a vacuum environment, namely for coating glass, polymer web, metal strips, wafers and steel tubes, namely for use in the manufacture of architectural glass, solar cells, solar absorbers, CSP (Concentrated Solar Power) mirrors, CSP (Concentrated Solar Power) receiver tubes, solar thermal collectors, thin film displays and thin film batteries, fuel cells and in the fields of optical refinement; plasma enhanced CVD (Chemical Vapor Deposition) equipment for producing and depositing films on materials for use in the photovoltaic manufacturing industry, in the architecture glass manufacturing industry and in the technical metal strip, pipe and foil (web) manufacturing industry, namely for displays, reflectors and absorbers; components for melting and evaporating coating materials namely, electron beam evaporators, radiation heated evaporators, components for magnetron sputter coaters, evaporation devices, namely, ingot evaporators, inorganic and organic substance evaporators, vapor distributors, vacuum melting equipment, namely electron beam furnaces and plasma arc furnaces. (1) Mechanical, electrical, chemical and process engineering services, in the field of developing and planning of installations and processes for vacuum coating and vacuum metallurgy.
09 - Scientific and electric apparatus and instruments
11 - Environmental control apparatus
42 - Scientific, technological and industrial services, research and design
Goods & Services
Vacuum coating equipment used in the further manufacture of other goods, namely vapor deposition equipment, namely devices for depositing material onto the surface of substrates using a physical vapor deposition (PVD) process; plasma chemical vapor deposition equipment, namely devices for depositing material onto the surface of substrates using a plasma supported chemical vapor deposition (PECVD) process; metal strip vapor deposition equipment, namely devices for depositing material onto the surface of a metal strip using a vapor deposition process; foil coating equipment, namely devices for depositing material onto the surface of foil Apparatus and instruments for monitoring, control and feed-back control during coating manufacturing processes, namely, apparatus and instruments for measuring process parameters, namely, gas flow, voltage and current parameters of input, parameters of the process plasma spectrum, temperature and pressure flow and material substrate output parameters, namely, deposition thickness, reflection of color for computing display signals and control signals from these process parameters and displaying these signals and for controlling or feed-back controlling the coating process basing on the control signals; plasma emission computer monitors; sputter equipment used in further manufacture of goods, namely, devices for depositing material and substrates using a sputtering process Components for coating and melting equipment used in further manufacture, namely, electron beam evaporators, radiation heated evaporators, magnetron sputter devices, arc evaporation devices, vacuum melting equipment, namely, electron beam or plasma melting furnaces Engineering services; industrial design services, namely, designing installations for commercial vacuum coating and vacuum metallurgy
09 - Scientific and electric apparatus and instruments
11 - Environmental control apparatus
42 - Scientific, technological and industrial services, research and design
Goods & Services
Vacuum coating equipment used in the further manufacture of other goods, namely, vapor deposition equipment, namely, devices for depositing material onto the surface of substrates using physical vapor deposition process (PVD); plasma chemical vapor deposition equipment, namely, devices for depositing material onto the surface of substrates using a plasma supported chemical vapor deposition process (PECVD); metal strip vapor deposition equipment, namely, devices for depositing material onto the surface of a metal strip using a vapor deposition process; foil coating equipment, namely, devices for depositing material onto the surface of foil Apparatus and instruments for monitoring, control and feed-back control during coating manufacturing processes, namely, apparatus and instruments for measuring process parameters, eg, parameters of media input (gas flow, voltage, current or the like), parameters of the process flow (plasma spectrum, temperature, pressure) and material substrate output parameters (deposition thickness, reflection of color) for computing display signals and control signals from these process parameters and displaying these signals and for controlling or feed-back controlling the coating process basing on the control signals; plasma emission computer monitors; sputter equipment used in further manufacture of goods, namely, devices for depositing material and substrates using a sputtering process Components for coating and melting equipment used in further manufacture, namely, electron beam evaporators, radiation heated evaporators, magnetron sputter devices, evaporation devices, vacuum melting equipment, namely, electron beam or plasma melting furnaces Engineering services, namely, designing installations for commercial vacuum coating and vacuum metallurgy
