Abstract

Alkoxylated glycerol triacrylate, and the use thereof and a preparation method therefor. The alkoxylated glycerol triacrylate is represented by a structure as shown in formula (I). The preparation method for the alkoxylated glycerol triacrylate has a simple process and relatively low production cost; moreover, the prepared alkoxylated glycerol triacrylate has a moderate viscosity, and a formed photocuring composition containing same has relatively high curing sensitivity and good flexibility.

IPC Classes  ?

• C07C 67/08 - Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
• C07C 69/54 - Acrylic acid esters; Methacrylic acid esters

Abstract

The present invention provides an oxime ester photoinitiator, a photocurable resin composition and an application. The oxime ester photoinitiator has a structure represented by formula (I), or a geometric isomer thereof. Compared with existing oxime ester photoinitiators, the parent structure having the structure shown in formula (I) provided by the present application is a thioxanthone structure, which ensures the stability of the main body; the introduction of an aromatic ring substitution structure increases the absorption wavelength of the initiator, and improves the sensitivity of the oxime ester photoinitiator; the introduction of the oxime ester structure ensures the photosensitive group of the initiator; due to the formation of a large conjugated structure, the photosensitivity of the product is improved, resulting in higher photoinitiation activity (particularly suitable for a photoinitiation system in 365 nm illumination conditions) and good solubility. When applied in a photocuring field, such as a paint, a coating, an ink, and a molding material, the product can not only prevent the generation of small molecular fragments, but also improve the curing effect of the photocurable resin composition.

IPC Classes  ?

• C07D 335/16 - Oxygen atoms, e.g. thioxanthones
• C08L 63/00 - Compositions of epoxy resins; Compositions of derivatives of epoxy resins
• C08F 2/46 - Polymerisation initiated by wave energy or particle radiation

Abstract

Provided in the present application are a thioxanthene sulfonium salt photoinitiator as well as a preparation method therefor and the use thereof. The thioxanthene sulfonium salt photoinitiator has a structure as shown in following formula I. The thioxanthene sulfonium salt photoinitiator provided by the present application has relatively low mobility, solving the problem of existing photoinitiators releasing toxic and unpleasant photolysis products.

IPC Classes  ?

• C07D 335/12 - Thioxanthenes
• C07C 381/12 - Sulfonium compounds
• C07C 315/04 - Preparation of sulfones; Preparation of sulfoxides by reactions not involving the formation of sulfone or sulfoxide groups
• C07F 5/02 - Boron compounds
• C08F 4/00 - Polymerisation catalysts
• C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
• C08G 59/00 - Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by reaction of epoxy polycondensates with monofunctional low-molecular-weight compounds; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
• C08G 59/68 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the catalysts used
• C09K 3/00 - Materials not provided for elsewhere

Abstract

Provided are a thioxanthenium salt photoinitiator, and a preparation method therefor and the use thereof. The thioxanthenium salt photoinitiator has a structure as represented by formula I. The preparation method comprises the following steps: under the action of a catalyst, subjecting a reactant 1 and a reactant 2 to a Friedel-Crafts reaction, and after the reaction is finished, adding an organic salt or an inorganic salt thereto to perform an anion exchange reaction so as to obtain a thioxanthenium salt photoinitiator. The provided thioxanthenium salt photoinitiator has relatively low mobility, and solves the problem of an existing photoinitiator releasing toxic and unpleasant photolysis products.

IPC Classes  ?

• C07D 335/12 - Thioxanthenes
• C07D 335/16 - Oxygen atoms, e.g. thioxanthones
• C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
• C08F 4/00 - Polymerisation catalysts
• C08G 59/68 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the catalysts used
• C08K 5/36 - Sulfur-, selenium-, or tellurium-containing compounds
• C09K 3/00 - Materials not provided for elsewhere

Abstract

The present application provides a coumarin sensitizer, a preparation method therefor, a photosensitive resin composition comprising the coumarin sensitizer, and a use. The coumarin sensitizer has the structure shown in formula I. The coumarin sensitizer of the present application has good yellowing resistance when applied in photocurable compositions, and can also significantly improve curing efficiency under the illumination of a UV-LED light source, having excellent application performance and facilitating the promotion and development of UV-LED light curing technology.

IPC Classes  ?

• C07D 311/16 - Benzo [b] pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring substituted in position 7
• C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Abstract

Disclosed in the present invention are an oxetane polymer, a preparation method therefor and an application thereof, and an energy curable composition. The low viscosity oxetane polymer has the structure as represented by formula (I), wherein R1 represents hydrogen or methyl. The weight average molecular weight of the polymer ranges from 250 to 1100. The oxetane polymer is simple to synthesize, the synthesis process does not use halogen-containing raw materials, no halogen residue exists, no other associated product is generated, and the atomic utilization rate is high. The oxetane polymer is low in cost and viscosity, and is convenient to use. Disclosed in the present invention are an oxetane polymer, a preparation method therefor and an application thereof, and an energy curable composition. The low viscosity oxetane polymer has the structure as represented by formula (I), wherein R1 represents hydrogen or methyl. The weight average molecular weight of the polymer ranges from 250 to 1100. The oxetane polymer is simple to synthesize, the synthesis process does not use halogen-containing raw materials, no halogen residue exists, no other associated product is generated, and the atomic utilization rate is high. The oxetane polymer is low in cost and viscosity, and is convenient to use.

IPC Classes  ?

• C08G 65/18 - Oxetanes

Abstract

The present invention provides a photocurable composition, and a photocurable composition for 3D printing and a use thereof. The photocurable composition comprises: 3-20 parts of a cationically polymerizable compound; 10-70 parts of a free-radically polymerizable compound; and 0.2-20 parts of a photoinitiator. The cationically polymerizable compound comprises an oxetane polymer, and the oxetane polymer is formed by polymerizing compounds represented by formula (I) and formula (II). The photocurable composition of the present application has outstanding toughness, and maintains high heat resistance on this basis, and other mechanical properties can reach relatively good levels.

IPC Classes  ?

• C08L 71/02 - Polyalkylene oxides

Abstract

1211011021031021010 ether group, a halogen atom, and a halogenated hydrocarbyl. The modified diallyl phthalate resin compound not only has solvent resistance, water resistance and scratch resistance of diallyl phthalate resins, but also has relatively high reaction activity, can be cured under the action of various energies, and is particularly easy to photo- or thermal-cure and has a high curing rate.

IPC Classes  ?

• C08G 81/02 - Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds

Abstract

The present invention provides a sulfonate-based photoacid generator, a method for preparing same, a method for patterning same, a resist composition thereof, and use thereof. The sulfonate-based photoacid generator is represented by general formula (I), wherein R122522522522- may be optionally substituted with -O-, -S-, -CO-, -O-CO-, or -COO-, C atoms may also be optionally substituted with an N atom, and the terminus of R121010 oxacyclic group; R212061818 aryl, camphoryl, camphorquinonyl, and nitrine naphthalenonyl. The sulfonate-based photoacid generator can reduce the diffusion of photoacid molecules and improve the firmness of photoetching patterns.

IPC Classes  ?

• C07D 405/06 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
• C07D 221/14 - Aza-phenalenes, e.g. 1,8-naphthalimide
• G03F 7/004 - Photosensitive materials
• G03F 7/20 - Exposure; Apparatus therefor
• G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
• C08K 5/42 - Sulfonic acids; Derivatives thereof
• G03F 7/025 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Abstract

1212032062042032020 cycloaliphatic heterocyclic group; m is 1 or 0, n is 1 or 0, x is 1 or 0, y is 1 or 0, and z is 1 or 0. The oxime ester photoinitiator of the present application has a diketone oxime ester structure and asymmetric substituents, and has a delocalization structure. Compared with an existing similar photoinitiator, the oxime ester photoinitiator has significantly improved solubility, can take both high sensitivity and low yellowing into consideration when applied to a photocurable composition, and has good application prospects.

IPC Classes  ?

• C07D 209/86 - Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
• C07D 209/88 - Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
• G02B 5/20 - Filters
• G02F 1/1335 - Structural association of cells with optical devices, e.g. polarisers or reflectors
• G03F 7/028 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
• G03F 7/105 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Abstract

The present application provides a negative photosensitive resin composition, a cured film and a preparation method therefor, an EL element, and a display apparatus. The negative photosensitive resin composition comprises (A) an alkali-soluble resin containing a polyimide structure; (B) a radical polymerizable compound; (C) at least one photopolymerization initiator having the structure as shown in the following formula (I); and optionally (D) a black dye and/or pigment. By applying the technical solution of the present application, a negative photosensitive composition provided by the present application has excellent heat resistance and light shielding performance; when the negative photosensitive composition is applied to a light-emitting device, no gas leakage can be detected in a high-temperature environment, no device pollution is caused, and the negative photosensitive composition has a wide application prospect.

IPC Classes  ?

• G03F 7/004 - Photosensitive materials
• C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
• G03F 7/037 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Abstract

An ethoxy/propoxy modified pyrazoline organic matter, an application thereof, a photocurable composition, and a photoresist. The introduction of —CH2—CH2—O(EO) and/or —CH(CH3)—CH2—O(PO) enables an EO/PO modified pyrazoline organic matter to have excellent compatibility with other components in a photocuring system, and the organic matter is solid, and is easy to add and use. In addition, the ethoxy/propoxy modified pyrazoline organic matter has an absorption band of 360-400 nm, and is thus particularly suitable for use as a sensitizer in the photocuring system (such as a system containing a bisimidazole photoinitiator), thereby greatly improving the sensitivity of the photocuring system. On this basis, the EO/PO modified pyrazoline organic matter has high sensitivity enhancement, features low usage, is solid, and is easy to add and use. An ethoxy/propoxy modified pyrazoline organic matter, an application thereof, a photocurable composition, and a photoresist. The introduction of —CH2—CH2—O(EO) and/or —CH(CH3)—CH2—O(PO) enables an EO/PO modified pyrazoline organic matter to have excellent compatibility with other components in a photocuring system, and the organic matter is solid, and is easy to add and use. In addition, the ethoxy/propoxy modified pyrazoline organic matter has an absorption band of 360-400 nm, and is thus particularly suitable for use as a sensitizer in the photocuring system (such as a system containing a bisimidazole photoinitiator), thereby greatly improving the sensitivity of the photocuring system. On this basis, the EO/PO modified pyrazoline organic matter has high sensitivity enhancement, features low usage, is solid, and is easy to add and use.

IPC Classes  ?

• C07D 231/06 - Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
• G03F 7/031 - Organic compounds not covered by group
• G03F 7/004 - Photosensitive materials

Abstract

A method is for synthesizing an oxetane compound by a microreactor. The synthesis method includes: introducing trimethylolpropane and carbonate into the microreactor in the presence of an alkaline catalyst, and synthesizing the oxetane compound by means of a micro-reaction continuous flow process under an inert solvent or a solvent-free condition. Compared with conventional reactors, the microreactor has the advantages of being high in heat transfer mass transfer coefficient, good in mixing performance, easy to control in temperature, safe and controllable in process. The three oxetane products are produced by utilizing the advantages of the microreactor, thereby greatly improving the mass transfer heat transfer performance of a reaction system, shortening the reaction time, improving the production efficiency, particularly avoiding the long-time high-temperature process in the pyrolysis process, reducing the production of high-boiling-point by-products, improving the yield, realizing continuity and automation of the process, and improving process safety.

IPC Classes  ?

• C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
• B01J 19/00 - Chemical, physical or physico-chemical processes in general; Their relevant apparatus
• B01J 23/04 - Alkali metals

Abstract

The invention provides a synthesis method for synthesizing an oxetane derivative by a microreactor. The synthesis method comprises: delivering 3-ethyl-3-hydroxymethyloxetane, a raw material Ha, a catalyst, and an alkali into a microreactor, and performing an etherification reaction so as to obtain an etherification product system, the raw material Ha having a general formula of R-(X)n, and X being a halogen; and separating the etherification product system so as to obtain the oxetane derivative. The microreactor is used for greatly improving the mass and heat transfer properties of the reaction system, reducing the reaction time, improving the production efficiency, increasing the yield of the product, achieving the continuity and automation of the process, and improving the safety of the process. In addition, the reaction device required by the described synthesis process requires has a small size, requires less manpower and has high safety.

IPC Classes  ?

• C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms

Abstract

An EO/PO modified 9-phenylacridine photosensitizer having the structure as shown in general formula (I). When the photosensitizer is applied to a photosensitive resin composition, the composition has characteristics of high photosensitivity, high resolution, high solubility, excellent dispersion stability, and excellent developing property, and has good hydrophilicity during development, the amount of sludges in a developer during recycling can be significantly reduced, so that the developer can be used repeatedly and effectively. An EO/PO modified 9-phenylacridine photosensitizer having the structure as shown in general formula (I). When the photosensitizer is applied to a photosensitive resin composition, the composition has characteristics of high photosensitivity, high resolution, high solubility, excellent dispersion stability, and excellent developing property, and has good hydrophilicity during development, the amount of sludges in a developer during recycling can be significantly reduced, so that the developer can be used repeatedly and effectively.

IPC Classes  ?

• G03F 7/031 - Organic compounds not covered by group
• G03F 7/004 - Photosensitive materials

Abstract

11 represents fluoroalkyl, and the weight-average molecular weight of the polymer is between 300 and 4000. By means of structural design, the oxetane fluorine-containing polymer combines the advantages of an oxetane group and a fluorine-containing oligomer, and can provide excellent comprehensive performance to a cured film when used as an active diluent. The oxetane fluorine-containing polymer is simple in synthesis process, controllable in molecular weight, low in cost and convenient to use.

IPC Classes  ?

• C08G 65/18 - Oxetanes
• C08G 59/18 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
• C08G 18/50 - Polyethers having hetero atoms other than oxygen
• C07C 41/02 - Preparation of ethers from oxiranes

Abstract

1211203203811012038620156204201562020 heteroaryl. The oxime ester photoinitiator of the chalcone structure has a large conjugated structure and excellent sensitivity, is difficult to migrate after curing, and has excellent yellowing resistance. In addition, the photoinitiator also has the characteristics of simple synthesis, no need of expensive catalyst in the synthesis process, excellent curing speed and the like, and can be widely applied to the field of photocuring.

IPC Classes  ?

• C07C 259/06 - Compounds containing carboxyl groups, an oxygen atom of a carboxyl group being replaced by a nitrogen atom, this nitrogen atom being further bound to an oxygen atom and not being part of nitro or nitroso groups without replacement of the other oxygen atom of the carboxyl group, e.g. hydroxamic acids having carbon atoms of hydroxamic groups bound to hydrogen atoms or to acyclic carbon atoms
• C07C 323/47 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
• C07C 319/20 - Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
• C07D 513/04 - Ortho-condensed systems
• C07D 513/14 - Ortho-condensed systems
• C07D 213/80 - Acids; Esters in position 3
• G03F 7/004 - Photosensitive materials

Abstract

11 represents hydrogen or methyl. The weight average molecular weight of the polymer ranges from 250 to 1100. The oxetane polymer is simple to synthesize, the synthesis process does not use halogen-containing raw materials, no halogen residue exists, no other associated product is generated, and the atomic utilization rate is high. The oxetane polymer is low in cost and viscosity, and is convenient to use.

IPC Classes  ?

• C08G 65/28 - Cyclic ethers and hydroxy compounds
• C08L 71/02 - Polyalkylene oxides

Abstract

123123441235612032020 branched alkylene, with n being 1, 2 or 3. When the compound of structural general formula (I) is applied to the curing composition, the hardness and flexibility of the cured product of the curing composition can be improved, and the advantage of the excellent adhesion of oxetane compounds can be maintained.

IPC Classes  ?

• C07D 405/14 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
• C08K 5/3477 - Six-membered rings
• C08L 101/00 - Compositions of unspecified macromolecular compounds
• C08G 65/02 - Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring

Abstract

Provided are an oxetane-modified isocyanurate, a preparation method therefor, an energy curable composition and the use thereof. The preparation method comprises: carrying out a first polymerization reaction on raw materials a and b to obtain a first polymerization product system; carrying out a second polymerization reaction on the first polymerization product system and a raw material c to obtain oxetane-modified isocyanurate. Since the rings in the above-mentioned oxetane compounds have a similar ring strain and higher alkalinity, and exhibit a longer induction period and a low degree of bulk polymerization, same also have the characteristics of a low shrinkage percentage during curing and excellent mechanical properties, heat resistance, weather resistance and transparency. The modification of isocyanurate by using oxetane compounds with the above-mentioned structure is beneficial for improving the curing properties, hardness, heat resistance and weather resistance of isocyanurate. In addition, the modified isocyanurate has better adhesion to the substrate after curing due to the introduction of heteroatoms.

IPC Classes  ?

• C07D 405/14 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
• C08G 65/22 - Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring

Abstract

1231444120220320420420440440620420512020. Cured products comprising the isocyanurate compound of the present application have excellent curing properties.

IPC Classes  ?

• C07D 405/12 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
• C07D 405/14 - Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
• C08G 65/22 - Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring

Abstract

115214034024040 substituted or unsubstituted alkenyl; and carbon or hydrogen in the linear alkyl, branched alkyl, and alkenyl may be substituted with one or more ether bonds, carbon base, phenyl, substituted phenyl, or (II), and the oligomer contains hydroxyl. The present application avoids the escape of gas due to volatilization of an oxetane monomer in a curing process, thereby solving the problem of short service life of a packaging material.

IPC Classes  ?

• C08G 65/18 - Oxetanes
• C09J 163/00 - Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
• C08L 63/00 - Compositions of epoxy resins; Compositions of derivatives of epoxy resins
• G02B 5/30 - Polarising elements

Abstract

115214034063031010 substituted or unsubstituted heteroaryl groups. The application of the photocurable composition containing an oxetane compound to the manufacturing of an optical film has the advantages of easy demolding and high yield.

IPC Classes  ?

• G03F 7/004 - Photosensitive materials
• G02B 3/08 - Simple or compound lenses with non-spherical faces with discontinuous faces, e.g. Fresnel lens
• G02B 5/18 - Diffracting gratings
• G02B 5/04 - Prisms

Abstract

11521403 40 14040 alkenyl, and the carbon or hydrogen in the linear alkyl, branched alkyl, and alkenyl groups may be substituted with one or more ether bonds, carbon groups, phenyl groups, substituted phenyl groups, or (bb). By using the characteristics of the oxetane monomer that can be photoinitiated for ring opening and has a low activity compared with ternary epoxy, the stability of the system after photo-initiation is effectively ensured, a low viscosity and an excellent wettability can be kept during injection, and the curing time can be shortened during molding.

IPC Classes  ?

• C08L 63/02 - Polyglycidyl ethers of bis-phenols
• C09D 7/00 - Features of coating compositions, not provided for in group ; Processes for incorporating ingredients in coating compositions
• C08J 5/24 - Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs

Abstract

Disclosed are a thiophene structure-containing oxime ester photoinitiator, a preparation method therefor, and a photosensitive resin composition containing the photoinitiator and capable of serving as an alkaline photographic developer. The photoinitiator has the structure as represented by formula A, B, C, D, or E. The photosensitive resin composition is free of gas outflow when exposed to light and has excellent film-forming properties such as line width, edge line neatness, and development process tolerance.

IPC Classes  ?

• C07D 333/76 - Dibenzothiophenes
• C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Abstract

12312011011012020 alkylamino, wherein the methylene group in each group may be optionally substituted with oxygen, sulfur or an imino group; and a represents any integer of 0-4, b represents any integer of 0-3, and C represents any integer of 0-5. The pyrazoline compound has an absorption waveband of 380-410 nm, is suitable for use as a sensitizer, and can improve the sensitivity of a photocuring system. The pyrazoline compound may enable a composition to have characteristics of a high sensitivity, a high resolution, and high adhesion.

IPC Classes  ?

• C07D 231/06 - Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
• C08F 220/00 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
• G03F 7/004 - Photosensitive materials

Abstract

2 represents an amplification group. Said compound shows significantly enhanced solubility and photosensitivity compared with unsubstituted triphenylsulfonium salts, and has significantly advantageous performance compared with prior art improved substitutes.

IPC Classes  ?

• C07C 381/12 - Sulfonium compounds
• C07D 209/88 - Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
• C07D 307/91 - Dibenzofurans; Hydrogenated dibenzofurans
• C07D 333/76 - Dibenzothiophenes
• G03F 7/004 - Photosensitive materials

Abstract

The present invention provides a sulfonium salt photoinitiator, a preparation method therefor, a photocurable composition comprising sulfonium salt photoinitiator, and use thereof. The sulfonium salt photoinitiator has a structure represented by formula (I). By modifying the structure of an existing sulfonium salt photoinitiator, a sulfonium salt photoinitiator having a new structure is obtained, which can exhibits a higher photosensitivity and an excellent as well as characteristics of low odor and low toxicity, when being used in a photocurable composition. This is significantly superior to existing similar photoinitiators.

IPC Classes  ?

• C07C 381/12 - Sulfonium compounds
• C07C 303/40 - Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfonic acids by reactions not involving the formation of sulfonamide groups
• C07C 309/06 - Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
• C07C 315/04 - Preparation of sulfones; Preparation of sulfoxides by reactions not involving the formation of sulfone or sulfoxide groups
• C07C 317/04 - Sulfones; Sulfoxides having sulfone or sulfoxide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
• C07F 5/02 - Boron compounds
• C07F 9/52 - Halophosphines
• C07C 303/32 - Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of salts of sulfonic acids
• C07C 311/48 - Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom

Abstract

22322-O(PO) enables an EO/PO modified pyrazoline organic matter to have excellent compatibility with other components in a photocuring system, and the organic matter is solid, and is easy to add and use. In addition, the ethoxy/propoxy modified pyrazoline organic matter has an absorption band of 360-400 nm, and is thus particularly suitable for use as a sensitizer in the photocuring system (such as a system containing a bisimidazole photoinitiator), thereby greatly improving the sensitivity of the photocuring system. On this basis, the EO/PO modified pyrazoline organic matter has high sensitivity enhancement, features low usage, is solid, and is easy to add and use.

IPC Classes  ?

• C07D 231/04 - Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
• G03F 7/004 - Photosensitive materials

Abstract

nn, and X being a halogen; and separating the etherification product system so as to obtain the oxetane derivative. The microreactor is used for greatly improving the mass transfer and heat transfer properties of the reaction system, reducing the reaction time, improving the production efficiency, increasing the yield of the product, achieving the continuity and automation of the process, and improving the safety of the process. In addition, the reaction device required by the described synthesis process has a small size, requires less manpower, and has high safety.

IPC Classes  ?

• C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms

Abstract

The present invention provides a method for synthesizing an oxetane compound by a microreactor. The synthesis method comprises: introducing trimethylolpropane and carbonate into the microreactor in the presence of an alkaline catalyst, and synthesizing the oxetane compound by means of a micro-reaction continuous flow process under an inert solvent or a solvent-free condition. Compared with conventional reactors, the microreactor has the advantages of being high in heat transfer mass transfer coefficient, good in mixing performance, easy to control in temperature, safe and controllable in process and the like. The three oxetane products are produced by utilizing the advantages of the microreactor, thereby greatly improving the mass transfer heat transfer performance of a reaction system, shortening the reaction time, improving the production efficiency, particularly avoiding the long-time high-temperature process in the pyrolysis process, reducing the production of high-boiling-point by-products, improving the yield, realizing continuity and automation of the process, and improving process safety. The reaction device required in the synthesis process is small in size and high in safety, and occupies a small area in a production site.

IPC Classes  ?

• C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms

Abstract

Disclosed in the present invention are a photoinitiator, a preparation method therefor and an application thereof, and a photocurable composition. The photoinitiator has the structure represented by formula (I). The photoinitiator of the present invention, the compound having structural formula I, has the features of high sensitivity, high molecular weight (MW>800), low odor, low migration, easy preparation, and low costs, and has strong absorption in the long-wavelength UV range of 365-405 nm, so that the photoinitiator can be well matched with a UV-LED light source. When the photoinitiator is applied to a photocurable composition, the advantages of low migration and long-wavelength initiation of the photoinitiator can be exerted. Therefore, the resulting photocurable ink product can be safely used in packaging materials of food, medicine, etc.

IPC Classes  ?

• C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
• C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
• C09D 11/101 - Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• C07C 50/18 - Anthraquinones, i.e. C14H8O2
• C07C 13/567 - Fluorenes; Completely or partially hydrogenated fluorenes

Abstract

1620620234511032062067819271101158110115911010 alkyl. When the above photo-curing resin is used in combination with an alkali-soluble resin, a film layer structure having a high substrate adhesion, a good resistance to alkali dissolution and a good heat resistance can be formed.

IPC Classes  ?

• C08F 220/14 - Methyl esters
• C08F 230/08 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium, or a metal containing a metal containing silicon
• G03F 7/004 - Photosensitive materials
• G03F 7/075 - Silicon-containing compounds

Abstract

A sulfimide photo acid generator capable of efficiently generating an acid at an I-ray, a photosensitive composition and a preparation method therefor, a pattern forming method, and applications of a sulfimide photo acid generator and a photosensitive composition. The sulfimide photo acid generator has a structure shown in the following general formula (A). The photo acid generator has high sensitivity, high solubility, and excellent heat resistance to an active energy ray having the wavelength of 300-450 nm, particularly 365 nm. The photosensitive composition comprises the following raw materials: a resin component and a sulfonate photo acid generator. A positive photosensitive composition can be used for the dissolution and exposure of an alkali developing liquid, and a pattern having an excellent resolution ratio, excellent sensitivity, and a good contrast ratio is formed.

IPC Classes  ?

• G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
• G03F 7/004 - Photosensitive materials
• G03F 7/20 - Exposure; Apparatus therefor

Abstract

Disclosed are a sulfimide photo-acid generator, a photosensitive resin composition, a patterning method, and a use of the photosensitive resin composition. The photosensitive resin composition comprises a resin component and an acid generator, wherein the acid generator is a sulfimide photo-acid generator, which has a structure as represented by general formula (A), which formula is as follows. Molecules of the sulfimide photo-acid generator of general formula (A) contain a sulfonate group, which group is directly linked with an imide structure. The structure has photosensitive cracking characteristics, and can be photolyzed under the irradiation of an active energy ray to produce stronger sulfonic acid. When the the photosensitive resin composition is applied to an alkali developing solution to dissolve an exposed positive-type photosensitive composition, a pattern with an excellent sensitivity and a good contrast ratio can be formed due to the increase in the photosensibility of the sulfimide photo-acid generator; even though a fine pattern is formed, same can also have a sufficiently high sensitivity.

IPC Classes  ?

• C07D 401/04 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring- member bond
• G03F 7/004 - Photosensitive materials
• C09D 11/03 - Printing inks characterised by features other than the chemical nature of the binder
• C09D 11/38 - Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
• C09D 7/63 - Additives non-macromolecular organic

Abstract

A group of polyfunctional oxetane-based compounds having a structure as represented by general formula (I) or a product obtained by a reaction between a compound of general formula (I) and epichlorohydrin, an ester compound, or an isocyanate compound. When these polyfunctional oxetane-based compounds are used as cation polymerizable monomers in combination with an epoxy compound, the curing speed is high, and the cured product has highly excellent hardness, flexibility, adherence, and heat resistance.

IPC Classes  ?

• C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
• C08G 59/18 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
• C08G 65/18 - Oxetanes
• C07D 407/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings linked by a chain containing hetero atoms as chain links
• C07D 407/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group containing three or more hetero rings
• C08G 65/08 - Saturated oxiranes

Abstract

33 can increase the number of free radicals produced by the photoinitiator per unit mass, thereby facilitating the improvement of sensitivity of the photoinitiator. Moreover, because the photoinitiator has a larger molecular weight and a lighter color, the photoinitiator further has the characteristics of less liability to migration and excellent yellow resistance, and therefore, the photoinitiator has the advantages of almost no VOC emission, low odor and excellent yellow resistance.

IPC Classes  ?

• C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
• C07D 295/108 - Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulfur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
• C07D 295/112 - Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulfur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
• C07D 333/10 - Thiophene
• C07D 307/34 - Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
• C07D 213/04 - Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
• C07C 319/14 - Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
• C07C 49/83 - Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
• C07C 205/45 - Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by at least one doubly-bound oxygen atom, not being part of a —CHO group
• C07C 45/64 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of C=O groups by introduction of functional groups containing oxygen only in singly bound form
• C07C 201/12 - Preparation of nitro compounds by reactions not involving the formation of nitro groups

Abstract

Provided are a photocurable adhesive composition, a photocurable adhesive, a polarizer and an optical device. The photocurable adhesive composition comprises a component A: an oxetane compound (aa) containing the following structure, in which R represents phenyl, biphenyl, or naphthyl, and 0 ≤ n ≤ 4; a component B: a compound having an epoxy group; and a component C: a cationic polymerization photoinitiator. By selecting and using the specific oxetane compound, the compound having an epoxy group, and the cationic polymerization photoinitiator, the adhesive force, curability and adhesion of the formed photocurable adhesive to the polarizer and protective film are improved.

IPC Classes  ?

• C09J 133/12 - Homopolymers or copolymers of methyl methacrylate
• C09J 4/02 - Acrylmonomers
• C09J 4/06 - Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
• G02B 5/30 - Polarising elements
• G02F 1/1335 - Structural association of cells with optical devices, e.g. polarisers or reflectors
• B32B 27/08 - Layered products essentially comprising synthetic resin as the main or only constituent of a layer next to another layer of a specific substance of synthetic resin of a different kind
• C09J 11/06 - Non-macromolecular additives organic

Abstract

This invention discloses a fluorene polyfunctional photoinitiator as represented by general formula (I), a photosensitive resin composition containing the same, the preparation of the same, and uses of the two. This compound has the advantages of simple synthesis, low cost, and good solubility, and has good application effects in photocurable compositions. Compared with conventional small molecule photoinitiators, it is not only excellent in photoinitiation activity, but also has the advantages such as low mobility, low odor, and yellowing resistance. The composition has high photosensitivity and good developability, high resolution, and excellent adaptation to a substrate, and is very suitable for producing a black matrix having high light-shielding property, a high-precision and high quality color filter and a liquid crystal display device, and can also be used in optical spacers and ribs, photoresist, wet film, dry film and so on.

IPC Classes  ?

• G03F 7/031 - Organic compounds not covered by group
• C07C 45/46 - Friedel-Crafts reactions
• C07C 49/215 - Unsaturated compounds containing keto groups bound to acyclic carbon atoms containing six-membered aromatic rings polycyclic
• G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
• G03F 7/40 - Treatment after imagewise removal, e.g. baking

Abstract

122 represents an amplification group. Said compound shows significantly enhanced solubility and photosensitivity compared with unsubstituted triphenylphosphonium salts, and has significantly advantageous performance compared with prior art improved substitutes.

IPC Classes  ?

• C07C 381/12 - Sulfonium compounds
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Abstract

Provided are an epoxy modified acrylic resin and a preparation method therefor, and an energy-curable composition containing epoxy modified acrylic resin and application. A branched chain of at least one repeat unit in the acrylic resin is grafted with one or more oxetane groups, and each oxetane group separately has the structure as represented by general formula (I), (II), or (III). After the branched chain of the acrylic resin is covalently grafted with the oxetane group, the epoxy modified acrylic resin is obtained. A coating prepared by using the composition containing the epoxy modified acrylic resin has good flexibility, as well as high adhesion and a great curing film forming speed for a coated substrate. The covalent grafting reaction does not affect the main chain structure of an original acrylic resin, and thus during downstream application, it is not necessary to change original devices and production processes, so that the investment costs are low.

IPC Classes  ?

• C07D 305/00 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms
• C08G 59/02 - Polycondensates containing more than one epoxy group per molecule
• C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
• C08L 33/08 - Homopolymers or copolymers of acrylic acid esters

Abstract

A hybrid photosensitive resin having a structure represented by general formula (I) and contains an oxetanyl functional group and a (meth)acryloxy functional group. The functional groups are coordinated with each other and the functionality is adjustable and controllable. The hybrid photosensitive resin is highly suitable for radical-cation photocuring systems, there is no problem of polymerization inhibition by oxygen, and its cured film has high hardness, good flexibility, excellent adherence, and excellent heat resistance.

IPC Classes  ?

• G03F 7/029 - Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
• C09D 133/14 - Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
• C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
• C08F 20/68 - Esters
• C08F 22/20 - Esters containing oxygen in addition to the carboxy oxygen
• C09D 135/02 - Homopolymers or copolymers of esters

Abstract

This invention discloses a novel cationic photoinitiator and a preparation method and use thereof. The cationic photoinitiator has a structure as represented by general formula (I) below. It can match a longer absorption wavelength in the process of application and has an outstanding photosensitive property, and has characteristics of no proneness to migration and good yellowing resistance.

IPC Classes  ?

• C08K 5/36 - Sulfur-, selenium-, or tellurium-containing compounds
• C07D 335/16 - Oxygen atoms, e.g. thioxanthones
• C07D 333/76 - Dibenzothiophenes
• C07C 381/12 - Sulfonium compounds
• C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
• G03F 7/004 - Photosensitive materials
• C08G 59/68 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the catalysts used
• C09K 3/00 - Materials not provided for elsewhere
• C07D 327/08 - [b, e]-condensed with two six-membered carbocyclic rings

Abstract

The present invention provides a photoinitiator containing fluorine fluorene oxime esters, a photocurable composition comprising the photoinitiator, and application of the photoinitiator. The photoinitiator has a structure represented by general formula (I) or (II). In the photoinitiator containing fluorine fluorene oxime esters represented by general formula (I) or (II) provided by the present application, the photoinitiator has high initiation efficiency due to the introduction of fluorine-containing groups. Moreover, due to the structural particularity, the photoinitiator further has good surface drying performance, good surface curing effect, non-susceptibility to migration, etc. On this basis, the photoinitiator has non-susceptibility to migration, high initiation efficiency, good surface drying performance, and good surface curing effect, and thus has a wide application prospect.

IPC Classes  ?

• C07C 17/25 - Preparation of halogenated hydrocarbons by splitting-off hydrogen halides from halogenated hydrocarbons
• C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light

Abstract

Provided are a sulfonium salt photoinitiator, a preparation method therefor, a photocurable composition containing the sulfonium salt photoinitiator, and the use thereof. The sulfonium salt photoinitiator has a structure as represented by formula (I). By modifying the structure of an existing sulfonium salt photoinitiator, a sulfonium salt photoinitiator with a novel structure is obtained. The sulfonium salt photoinitiator can exhibit a higher sensitivity when applied to a photocurable composition, is excellent in terms of solubility, and has the characteristics of a low odor and a low toxicity, and is obviously superior to existing photoinitiators of the same type.

IPC Classes  ?

• C07C 381/12 - Sulfonium compounds
• C09D 163/10 - Epoxy resins modified by unsaturated compounds

Abstract

Disclosed is an oxetane compound used in a cation photocurable system. The oxetane compound is formed by a nucleophilic substitution reaction of a compound containing at least one hydroxyl and at least one oxetane group with a halohydrocarbon, and same is not sensitive to humidity, and has advantages such as a high reactive activity, low odor and viscosity, and strong adhesion.

IPC Classes  ?

• C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
• C07D 305/00 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms
• C08G 59/02 - Polycondensates containing more than one epoxy group per molecule

Abstract

Disclosed is a new oxetane monomer compound, which has a structure as shown in general formula (I) or is an ester of a compound of general formula (I). The monomer compound has a high reaction activity. After being applied to a cationic photocurable system, the cured product has excellent hardness, flexibility and adhesion performance. Thus, the monomer compound has better overall application performance compared to existing similar products.

IPC Classes  ?

• C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
• C08G 65/18 - Oxetanes

Abstract

Disclosed are a fluorene oxime ester photoinitiator containing a polymerizable group, a preparation method and the use thereof, the fluorene oxime ester photoinitiator has the structure as shown in general formula (I), wherein R2 represents a polymerizable group. Also disclosed are a light curable composition and the use thereof, the light curable composition comprises the photoinitiator containing a fluorene oxime ester and a polymer monomer.

IPC Classes  ?

• C07C 13/567 - Fluorenes; Completely or partially hydrogenated fluorenes
• C07C 251/66 - Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
• G03F 7/004 - Photosensitive materials
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• G02B 5/20 - Filters

Abstract

Disclosed are a fluorenylaminoketone photoinitiator, a preparation method thereof and a UV photocurable composition containing same. The photoinitiator comprises a compound having a structure as shown in general formula (I) or a derivative compound thereof (I). The fluorenylaminoketone photoinitiator provided in the present invention may effectively improve the solubility of traditional photoinitiators and reduce the use of small-molecular activated diluents, and has a high sensitivity, a good deep-curing effect, and a good promotion effect for the extended application of the photocurable compositions, especially for coloured ink systems in the field of photocuring. The UV photocurable composition containing the fluorenylaminoketone photoinitiator of the present invention has a high sensitivity, no residue after development and a good pattern integrity, and the coating after curing has either no odour or little odour, and also has an excellent yellowing resistance.

IPC Classes  ?

• C07D 265/30 - 1,4-Oxazines; Hydrogenated 1,4-oxazines not condensed with other rings
• C07D 211/06 - Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
• C07C 45/46 - Friedel-Crafts reactions
• C07C 45/63 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of C=O groups by substitution of halogen atoms by other halogen atoms
• C07C 45/61 - Preparation of compounds having C=O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of C=O groups
• C07C 45/78 - Separation; Purification; Stabilisation; Use of additives
• C07C 45/81 - Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation
• C07C 49/788 - Ketones containing a keto group bound to a six-membered aromatic ring polycyclic with keto groups bound to a condensed ring system
• C07D 401/10 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a carbon chain containing aromatic rings
• C07D 413/10 - Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing aromatic rings
• C09D 11/101 - Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing

Abstract

The present disclosure provides a sensitizer for UV-LED photocuring, having a chemical structure as represented by formula (I). This sensitizer has a very good adaptability to existing photoinitiators, can significantly improve the curing efficiency under the irradiation of a UV-LED light source when used in a photocurable composition, and has excellent application properties.

IPC Classes  ?

• C07C 51/377 - Preparation of carboxylic acids or their salts, halides, or anhydrides by reactions not involving formation of carboxyl groups by hydrogenolysis of functional groups
• C07C 69/86 - Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a six-membered aromatic ring of monocyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of a six-membered aromatic ring with esterified hydroxyl groups
• C07C 67/08 - Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
• C07C 69/94 - Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a six-membered aromatic ring of polycyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of six-membered aromatic rings
• G03F 7/004 - Photosensitive materials
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• C07C 67/14 - Preparation of carboxylic acid esters from carboxylic acid halides
• G03F 7/031 - Organic compounds not covered by group

Abstract

Provided are a fluorene photoinitiator, a preparation method therefor, a photocurable composition having same, and the use of same in the photocuring field. The fluorene photoinitiator has a structure shown by formula (I), wherein X is -A-(X')n; A is selected from heteroatoms selected from O, N or S; X' is selected from a C1-C20 linear or branched alkyl, a C3-C8 cycloalkyl, and a C1-C10 alkyl substituted with a C3-C8 cycloalkyl, or one or more of the carbon atoms in X is replaced with a heteroatom; n is 1 or 2; and R4 is a hydroxy or N-morpholinyl; or, the fluorene photoinitiator includes a structure shown by formula (II). The introduction of a new group on an existing fluorene structure not only increases the molecular weight of the photoinitiator, but also improves the relevant performances, such as initiation efficiency, of the photoinitiator.

IPC Classes  ?

• C07C 49/788 - Ketones containing a keto group bound to a six-membered aromatic ring polycyclic with keto groups bound to a condensed ring system
• C07C 45/46 - Friedel-Crafts reactions
• G03F 7/031 - Organic compounds not covered by group

Abstract

Disclosed are a 9-phenylacridine macromolecule photosensitizer, and a preparing method and use thereof. The 9-phenylacridine macromolecule photosensitizer comprises at least one of the compounds having a structure as shown in formula (I), in which R1 is a linear or branched C1-C60 alkyl group with a valency of m + n, wherein a -CH2- thereof may be optionally substituted by oxygen, sulphur or 1,4-phenylene; each A independently represents -[(CHR4)x-O]y-, wherein each R4 independently represents hydrogen, a methyl group, or an ethyl group, x is an integer of 1-10, and y is an integer of 1-20; R2 represents a linear or branched C1-C20 alkylene group, wherein a -CH2- thereof may be optionally substituted by oxygen, sulphur or a phenylene; R3 represents hydrogen or a substituent group; m represents an integer of 0-20, and n represents an integer of 1-20. When used in a photocuring system, the photosensitizer has good compatibility and good photosensitivity improving effect, and a film prepared therefrom has excellent resolution, adhesion, and high solubility in water.

IPC Classes  ?

• C07D 219/02 - Heterocyclic compounds containing acridine or hydrogenated acridine ring systems with only hydrogen, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
• C07D 219/00 - Heterocyclic compounds containing acridine or hydrogenated acridine ring systems
• C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
• C08F 2/46 - Polymerisation initiated by wave energy or particle radiation

Abstract

Disclosed are a novel cationic photoinitiator, and a preparation method therefor and applications thereof. The cationic photoinitiator has a structure represented by formula (I), can match a longer absorption wavelength in the application, has an outstanding photosensitive property and has the characteristics of not proneness to migration and yellowing resistance.

IPC Classes  ?

• C07C 381/12 - Sulfonium compounds
• C07D 333/76 - Dibenzothiophenes
• C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
• C08G 59/68 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups characterised by the catalysts used
• C08K 5/36 - Sulfur-, selenium-, or tellurium-containing compounds
• C09K 3/00 - Materials not provided for elsewhere
• G03F 7/004 - Photosensitive materials

Abstract

A group of polyfunctional oxetane compounds and a preparation method therefor. The compound is a compound in a structure as shown in general formula (I) or a product obtained by reacting the compound as shown in general formula (I) with epichlorohydrin, an ester compound or an isocyanate compound. When said polyfunctional oxetane compounds are used as cationic polymeric monomers coordinating with an epoxy compound, solidification is fast and the hardness, flexibility, adhesiveness and heat resistance are excellent.

IPC Classes  ?

• C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
• C08G 65/18 - Oxetanes
• C08G 59/18 - Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups

Abstract

A mixed-type photosensitive resin and a preparation method therefor. The mixed-type photosensitive resin comprises an oxetane functional group and a (methyl)acryloyloxy functional group, the functional groups supporting each other and being adjustable and controllable in terms of functionality, is highly suitable in a radical-cationic light curing system, has a fast curing rate, is free from the problem of oxygen-resistant polymerization, and provides a cured film with high hardness, great flexibility, and excellent adhesiveness and heat resistance.

IPC Classes  ?

• G03F 7/028 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
• C09J 133/08 - Homopolymers or copolymers of acrylic acid esters

Abstract

Provided is a free radical-cation hybrid photocuring composition. The composition comprises: an anthraquinone sensitizer, selected from a compound having a structure represented by formula (I) and/or a macromolecular compound using the compound represented by formula (I) as a main structure; a cation reaction compound and a free radical reaction compound, comprising at least one unsaturated-double-bond-containing compound and at least one epoxy-group-containing compound; a cationic photoinitiator; and optionally, a free radical photoinitiator. By means of component optimization, the composition can combine advantages of a free radical photocuring system and a cation photocuring system, and has excellent response to light sources having a wavelength ranging from 200 nm to 500 nm, a high curing speed, a small shrinkage, a good development property and good pattern integrity, allows a cured film to have a high hardness and has a strong adhesive force on a substrate.

IPC Classes  ?

• G03F 7/031 - Organic compounds not covered by group
• G03F 7/004 - Photosensitive materials

Abstract

A free radical photocuring composition comprises: an anthraquinone sensitizer, selected from a compound having a structure represented by formula (I) and/or a macromolecular compound using the compound represented by formula (I) as a main structure; a free radical reaction compound; and a free radical initiator. The composition has low costs, has excellent response to light sources having a wavelength ranging from 200 nm to 500 nm, a high curing speed, a good development property and good pattern integrity, allows a cured film to have a high hardness and has a strong adhesive force on a substrate, and can be used in paints, coatings, ink, molding materials and other aspects.

IPC Classes  ?

• G03F 7/031 - Organic compounds not covered by group
• C07C 67/08 - Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
• G03F 7/004 - Photosensitive materials

Abstract

A cation photocuring composition comprises: an anthraquinone sensitizer, selected from a compound having a structure represented by formula (I) and/or a macromolecular compound using the compound represented by formula (I) as a main structure; a cation reaction compound; and a cationic photoinitiator. Compared with a conventional cation photocuring system, the composition has low costs, has excellent response to light sources having a wavelength ranging from 200 nm to 500 nm, a high curing speed, a good development property and good pattern integrity, allows a cured film to have a high hardness and has a strong adhesive force on a substrate, and can be used in paints, coatings, ink, molding materials and other aspects.

IPC Classes  ?

• G03F 7/031 - Organic compounds not covered by group
• C08L 63/00 - Compositions of epoxy resins; Compositions of derivatives of epoxy resins
• G03F 7/004 - Photosensitive materials

Abstract

Provided is a photosensitive composition containing an oxime-ester photoinitiator. The oxime-ester photoinitiator is a compound as shown in formula (I). The composition has the advantages of high curing speed, small exposure dose, less pollution, energy saving, almost no residue defect, etc., and the thickness, clarity and pattern integrity of a cured film thereof are all excellent.

IPC Classes  ?

• G03F 7/031 - Organic compounds not covered by group
• G02B 5/20 - Filters
• C08F 265/06 - Polymerisation of acrylate or methacrylate esters on to polymers thereof
• C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• G02B 5/22 - Absorbing filters
• G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
• G03F 7/038 - Macromolecular compounds which are rendered insoluble or differentially wettable
• G03F 7/039 - Macromolecular compounds which are photodegradable, e.g. positive electron resists
• G03F 7/16 - Coating processes; Apparatus therefor
• G03F 7/20 - Exposure; Apparatus therefor
• G03F 7/32 - Liquid compositions therefor, e.g. developers
• G03F 7/38 - Treatment before imagewise removal, e.g. prebaking
• C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
• C09D 4/06 - Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups
• C08F 265/04 - Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group on to polymers of esters
• G03F 7/033 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Abstract

Disclosed are a fluorene multifunctional photoinitiator as represented by general formula (I), a photosensitive resin composition containing same, and the preparation thereof and uses of the two. The compound has the advantages of simple synthesis, low cost, good solubility, and good application effects in a photocurable composition. Compared with conventional small molecular photoinitiators, it is not only excellent in photo-initiation activity, but also has advantages such as low mobility, low odour, and yellowing resistance. The composition has high photosensitivity and good developability, high resolution and excellent adaptation to a substrate, and is very suitable for preparing a black matrix having a high light-shielding property, a high-precision and high-quality colour filter and a liquid crystal display device, and can also be used in optical spacers and ribs, photoresist, wet film, dry film and so on.

IPC Classes  ?

• C07C 49/76 - Ketones containing a keto group bound to a six-membered aromatic ring
• C07C 49/82 - Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
• C07D 273/01 - Heterocyclic compounds containing rings having nitrogen and oxygen atoms as the only ring hetero atoms, not provided for by groups having one nitrogen atom
• G03F 7/004 - Photosensitive materials
• C07C 29/124 - Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by hydrolysis of esters of mineral acids of halides

Abstract

Disclosed are a photoinitiator containing a fluorene oxime ester, as shown by the following formula (I), synthesis therefor, a photosensitive resin composition containing same, and a use thereof. The compound is simple in synthesis and low in cost, and has a good solubility when applied to the photocuring field, has an excellent storage stability and film-forming performance, low exposure demand, and excellent developing property and pattern integrality. The photosensitive resin composition contains an ultraviolet photosensitive prepolymer resin, an active diluent monomer, the photoinitiator containing a fluorene oxime ester of the present application, and optionally, a colorant and an alkali-soluble resin. The composition has a high sensitivity and a good developing property, a high resolution and excellent adhesiveness to a substrate; it is very suitable for preparing a black matrix with a high light-shielding property, and a color filter and a liquid crystal display device with a high fineness and a high quality; and can also be applied in aspects such as in a light spacer and a rib grid, a photoresist, a wet film and a dry film.

IPC Classes  ?

• C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
• C07C 251/66 - Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
• G03F 7/004 - Photosensitive materials

Abstract

This present invention discloses a nitro-containing bisoxime ester photoinitiator having a structure represented by general formula (I). This photoinitiator has excellent application performances in terms of storage stability, photosensitivity, developability, pattern integrity, etc., and it has good adaptability to single-wavelength UV-LED light sources and exhibits a photosensitive property, which is obviously superior to those of existing photoinitiators, under the irradiation of UV-LEDs.

IPC Classes  ?

• C07C 251/66 - Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
• C07C 319/20 - Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
• C07D 335/12 - Thioxanthenes
• C07D 409/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
• C07C 249/04 - Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton of oximes
• C07D 311/82 - Xanthenes
• C07D 307/91 - Dibenzofurans; Hydrogenated dibenzofurans
• C07C 323/63 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton the carbon skeleton being further substituted by nitrogen atoms, not being part of nitro or nitroso groups
• C07D 333/76 - Dibenzothiophenes
• C07C 323/47 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
• C07D 209/88 - Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
• C08F 2/50 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
• G03F 7/004 - Photosensitive materials
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• C08F 265/06 - Polymerisation of acrylate or methacrylate esters on to polymers thereof
• G03F 7/031 - Organic compounds not covered by group

Abstract

A bisoxime ester photoinitiator as represented by general formula (I). By introducing a bisoxime ester group and a cycloalkylalkyl group into the chemical structure, this photoinitiator not only has excellent performance in aspects of storage stability, photosensitivity, developability, pattern integrity, and the like, but also exhibits obviously improved photosensitivity and thermal stability compared to similar photoinitiators.

IPC Classes  ?

• C07C 251/66 - Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
• C07C 319/20 - Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
• C07D 335/12 - Thioxanthenes
• C07D 409/14 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
• C07C 249/04 - Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton of oximes
• C07D 311/82 - Xanthenes
• C07D 307/91 - Dibenzofurans; Hydrogenated dibenzofurans
• C07C 323/63 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton the carbon skeleton being further substituted by nitrogen atoms, not being part of nitro or nitroso groups
• C07D 333/76 - Dibenzothiophenes
• C07D 409/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
• C07D 209/86 - Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
• C07C 323/47 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms

Abstract

A sensitizer for UV-LED photocuring has a chemical structure as represented by formula (I). The sensitizer is good in compatibility with existing photoinitiators and, when applied to photo-cured compositions, can significantly improve curing efficiency under irradiation of an UV-LED light source. Thus the sensitizer has excellent applicability.

IPC Classes  ?

• G03F 7/004 - Photosensitive materials
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• C07C 69/94 - Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a six-membered aromatic ring of polycyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of six-membered aromatic rings
• C07C 67/08 - Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds

Abstract

Disclosed are a pyrazoline sensitizer and a preparation method and use thereof. The pyrazoline sensitizer has the structure as shown in formula (I) or formula (II) and absorption bands of between 350-440 nm, and is suitable for using in a light-cured system, in particular a system containing a biimidazole photoinitiator, and formula (I) and formula (II) are successive.

IPC Classes  ?

• C07D 231/06 - Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
• G03F 7/028 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
• G03F 7/004 - Photosensitive materials
• C08F 4/00 - Polymerisation catalysts
• C08F 226/00 - Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen

Abstract

A photosensitive resin composition, containing ultraviolet photosensitive prepolymer resin, an active diluting monomer, an oxime ester photoinitiator represented by formula (I), and a colorant. The composition has good exposure sensibility and developing property. When a system is low in opacifier content or low in exposure dose, a cured pattern is complete, clear to develop and high in resolution ratio, and the adaptation between the cured pattern and a substrate is excellent. The photosensitive resin composition has a great application prospect in terms of optical color filters, light spacers, rib barriers and the like.

IPC Classes  ?

• C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
• C07D 333/76 - Dibenzothiophenes
• C07D 307/91 - Dibenzofurans; Hydrogenated dibenzofurans
• C07D 209/82 - Carbazoles; Hydrogenated carbazoles
• C07C 13/567 - Fluorenes; Completely or partially hydrogenated fluorenes
• C07C 251/66 - Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• G03F 7/004 - Photosensitive materials
• G02B 5/20 - Filters
• G02F 1/1335 - Structural association of cells with optical devices, e.g. polarisers or reflectors
• G02F 1/1339 - Gaskets; Spacers; Sealing of cells

Abstract

Disclosed is an ester compound containing an oxetane group. The compound has polyfunctionality, high stability and high cationic reaction activity, and is simple and convenient to prepare in a high yield. The ester compound can exhibit very excellent photo-curing performance when used in a cationic photo-curing formulation, has an extremely short curing time, and is obviously superior to the existing similar compounds, and the product has an excellent toughness and hardness.

IPC Classes  ?

• C07D 305/06 - Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring atoms
• C08G 65/22 - Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring

Abstract

Provided is a photosensitive composition containing an oxime-ester photoinitiator. The oxime-ester photoinitiator is a compound as shown in formula (I). The composition has the advantages of high curing speed, small exposure dose, less pollution, energy saving, almost no residue defect, etc., and the thickness, clarity and pattern integrity of a cured film thereof are all excellent.

IPC Classes  ?

• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• G03F 7/004 - Photosensitive materials
• G02F 1/1335 - Structural association of cells with optical devices, e.g. polarisers or reflectors
• C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light

Abstract

A dual oxime esters photoinitiator as represented by general formula (I). By introducing a dual oxime esters group and a cycloalkylalkyl group in the chemical structure, the photoinitiator not only has excellent performance in aspects of storage stability, photosensitivity, developing effect, pattern integrity and the like, but also exhibits obviously improved photosensitivity and thermostability compared to similar photoinitiator products.

IPC Classes  ?

• C07D 333/34 - Sulfur atoms
• C07D 409/12 - Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links

Abstract

Disclosed is a dual oxime esters photoinitiator containing nitro, having a structure as represented by general formula (I). The photoinitiator has excellent application performance in aspects of storage stability, photosensitivity, developing property, pattern integrity and the like, has good adaptability to the UV-LED light source in single wavelength, and exhibits photosensitive property obviously superior to existing photoinitiators under UV-LED irradiation.

IPC Classes  ?

• C08F 2/48 - Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
• G03F 7/004 - Photosensitive materials
• G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• C07D 209/88 - Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
• C07C 323/47 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms

Goods & Services

Industrial chemicals; photographic sensitizers; photographic developers.

Goods & Services

Chemicals used in industry; photographic sensitizers; photographic developers

Abstract

A kind of ketoxime ester compound used as photoinitiator, especially a kind of ketoxime ester photoinitiator used as the photocuring material, wherein said ketoxime ester photoinitiator has following general formula (I): Wherein R1 is formula (II), n is the integer of 1-4, m is the integer of 1-6, R2 is C1-8 alkyl, phenyl, substituted phenyl, benzyl or substituted benzyl, R3 is diphenylthioether group, substituted diphenylthioether group, carbazolyl group, or substituted carbazolyl. The ketoxime ester photoinitiator solves the problems that the existing ketoxime ester photoinitiator such as OXE-1 has bad application performance and bad thermal stability.

IPC Classes  ?

• C07D 209/86 - Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
• C07C 319/20 - Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
• C07C 323/47 - Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
• C07C 251/64 - Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
• C08F 2/46 - Polymerisation initiated by wave energy or particle radiation

Abstract

A carbazole oxime ester photoinitiator and the preparation method thereof. The structure of the carbazole oxime ester photoinitiator is shown as the formula (I), in which the group R is the aliphatic hydrocarbon substituted by the cycloalkyl, the cycloalkyl is the aliphatic cycle from the cyclopropyl to cyclooctyl, the link group between the cycloalkyl and the oxime ester group is the linear aliphatic hydrocarbon group, generally, the chain length has 1-5 carbon atoms. The carbazole oxime ester compound with this structure is a new compound.

IPC Classes  ?

• C07D 209/86 - Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
• C08F 2/46 - Polymerisation initiated by wave energy or particle radiation