Abstract

A magnetic polishing machine includes a container which accommodates a polishing target and a plurality of polishing pieces, a plurality of rotation plates which are rotatably disposed below the container while a magnet is attached to the rotation plate, and a first rotation mechanism which rotates each rotation plate about a rotation axis of the rotation plate. The adjacent rotation plates are disposed at a position in which rotation areas thereof partially overlap each other.

IPC Classes  ?

• B24B 31/112 - Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work or the abrasive material is looseAccessories therefor involving other means for tumbling of work using magnetically consolidated grinding powder, moved relatively to the workpiece under the influence of pressure
• B24B 1/00 - Processes of grinding or polishingUse of auxiliary equipment in connection with such processes
• B24B 31/10 - Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work or the abrasive material is looseAccessories therefor involving other means for tumbling of work
• B24B 31/033 - Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work or the abrasive material is looseAccessories therefor involving rotary barrels having several rotating or tumbling drums with parallel axes
• B24B 37/04 - Lapping machines or devicesAccessories designed for working plane surfaces

Abstract

The present invention comprises: a container (2) in which a material to be polished and a number of polishing pieces are housed; a plurality of rotating plates (5) which have magnets (7) attached thereto and which are rotatably arranged below the container (2); and a first rotating mechanism (6) that rotates the rotating plates (5) about the rotation axes A1 of the rotating plates (5). Since the plurality of rotating plates (5) are arranged below the container (2) in this manner, the polishing pieces are mixed together in the entire container (2) by the centrifugal force of the polishing pieces from the rotation of the rotating plates (5). For this reason, a reduction in the amount of the material to be polished above the central portions of the rotating plates (5) and in the vicinity of the rotation axes A1 of the rotating plates (5) is suppressed. Thus, it is possible to suppress polishing unevenness.

IPC Classes  ?

• B24B 31/112 - Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work or the abrasive material is looseAccessories therefor involving other means for tumbling of work using magnetically consolidated grinding powder, moved relatively to the workpiece under the influence of pressure