RAHMEN STRUCTURE CAPABLE OF INTRODUCING LOAD EFFECT OPPOSITE TO ACTING LOAD IN GRAVITY DIRECTION THROUGH SECONDARY TENSION OF TENSION MEMBER INSTALLED IN PARABOLIC SHAPE AND CONSTRUCTION METHOD THEREOF
Disclosed are: a Rahmen structure in which an upper structure and an abutment having significantly greater cross-sectional rigidity than a pier are integrated in order to prevent a Rahmen bridge from collapsing due to an earthquake load or the like; and a construction method thereof. To this end, the Rahmen structure comprises: an abutment; a plurality of girders sitting on the abutment; a plurality of longitudinal tension members inserted into the girder in a parabolic shape along the longitudinal direction of the girder to introduce a plurality of compressive forces into the girder, and installed in the girder such that the far ends are exposed at the front of the girder; a first movable anchoring element installed in front of the girder and on the longitudinal tension members exposed at the front of the girder so that the far ends of the longitudinal tension members are anchored to the girder; and a connection slab sitting on the plurality of girders. According to the present invention, a shear connector and the longitudinal tension members installed in the girder can absorb horizontal and vertical displacements, and thus can preventing the Rahmen bridge from collapsing even when an earthquake load due to an earthquake is applied to the Rahmen bridge.
Disclosed are a method for manufacturing a prestressed girder for improving transverse curvature that can minimize the occurrence of transverse curvature when introducing prestress to a girder, and a method for constructing a girder bridge thereby. To this end, provided is a method for manufacturing a prestressed girder for improving transverse curvature and, more particularly, a method for manufacturing a girder with two side steel strands arranged on the left and right sides of the vertical neutral axis of the girder, the method comprising: a beam manufacturing step of manufacturing a beam by installing two or more anchorages to which the side steel strands are to be connected; a step of introducing a first prestressing force for prestressing the first side steel strand with the first prestressing force which is weaker than a design prestressing force; a step of introducing a second prestressing force for prestressing the second side steel strand with the second prestressing force which is equal to or weaker than the design prestressing force and exceeds the first prestressing force; and a step of introducing a third prestressing force for prestressing the first side steel strand again with the third prestressing force that overlaps with the first prestressing force and is equal to or weaker than the design prestressing force and is equal to or greater than the second prestressing force. According to the present invention, instead of increasing the cross-sectional area of the prestressed girder or installing a separate steel material, it is possible to suppress the occurrence of eccentricity that causes transverse curvature of the girder by only prestressing some steel strands twice or more than twice, thereby minimizing a difference between the left and right gaps of the prestressed girder.
An organic material purification composition, a mixed composition, and a method of purifying an organic material, the organic material purification composition including an ionic liquid in which a cation and an anion are combined; and an organic solvent, wherein the organic solvent includes an alcohol or a ketone.
F01N 3/20 - Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust characterised by methods of operationControl specially adapted for catalytic conversion
G05B 1/00 - Comparing elements, i.e. elements for effecting comparison directly or indirectly between a desired value and existing or anticipated values
C07D 403/04 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group containing two hetero rings directly linked by a ring-member-to-ring- member bond
H01L 51/00 - Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
C07D 401/14 - Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing three or more hetero rings
B01F 3/12 - Mixing, e.g. dispersing, emulsifying, according to the phases to be mixed liquids with solids
An apparatus for chemical vapor deposition is disclosed. An aspect of the present invention provides an apparatus for chemical vapor deposition that includes: a process chamber configured to demarcate a reaction space; a back plate placed above the reaction space and having a gas inlet in a middle thereof; a gas diffusion member arranged below and separated from the gas inlet and coupled to the back plate by a first coupling member and configured to diffuse process gas supplied through the gas inlet; a shower head placed below and separated from the back plate and the gas diffusion member and having a middle part thereof coupled to the gas diffusion member by a second coupling member and having a plurality of spray holes perforated therein; and a susceptor arranged below and separated from the shower head and supporting a substrate. The gas diffusion member has a plurality of gas guiding holes that vertically penetrate the gas diffusion member such that the process gas supplied through the gas inlet is diffused toward a lower side of the gas diffusion member.
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
5.
Endpoint detection device for realizing real-time control of plasma reactor, plasma reactor with endpoint detection device, and endpoint detection method
An endpoint detection device, a plasma reactor with the endpoint detection device, and an endpoint detection method are provided. The endpoint detection device includes an OES data operation unit, a data selector, a product generator, an SVM, and an endpoint determiner. The OES data operation unit processes reference OES data by normalization and PCA. The data selector selects part of the linear reference loading vectors and selects part of the selected linear reference loading vectors. The product generator outputs at least one reference product value. The SVM performs regression and outputs a prediction product value. The endpoint determiner detects a process wafer etch or deposition endpoint and outputs a detection signal.
A plasma reactor and an etching method using the same are provided. The method includes a first changing step of changing the number or arrangement structure of inductive coils connecting to an RF source power supply unit, a step of applying RF source power and generating high density plasma, a first etching step of etching a first etch-target layer of a workpiece, a first stopping step of stopping applying the RF source power, a second changing step of changing the number or arrangement structure of the inductive coils, a step of applying RF source power to corresponding inductive coils and generating low density plasma, a second etching step of etching a second etch-target layer of the workpiece, and a second stopping step of stopping applying the RF source power.
A side gas injector for a plasma reaction chamber is provided. The side gas injector includes a circular distribution plate and a cover plate. The circular distribution plate includes an injection hole for injecting a reaction gas and a distribution channel part for distributing the reaction gas such that the reaction gas introduced from the injection hole can be radially simultaneously jetted in a plurality of positions along an inner circumference surface of the distribution plate. The cover plate is coupled to a top of the distribution plate and seals a top of the distribution channel part.
C23F 1/00 - Etching metallic material by chemical means
H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching
8.
Workpiece de-chucking device of plasma reactor for dry-cleaning inside of reaction chamber and electrostatic chuck during workpiece de-chucking, and workpiece de-chucking method using the same
A workpiece de-chucking device of a plasma reactor for dry-cleaning the inside of a reaction chamber and an ElectroStatic chuck (ESC) during workpiece de-chucking and a workpiece de-chucking method using the same are provided. The workpiece de-chucking device includes a lifting unit, an ICP source power unit, and a controller. The lifting unit lifts a workpiece mounted on a top surface of an ESC. The ICP source power unit forms a magnetic field in an inductive coil arranged outside a dielectric window. The controller outputs a source power control signal, a lift control signal, and a de-chucking control signal.
A wind power generator includes a pillar fixed on a base, a nacelle platform disposed on an upper end portion of the pillar, a service crane provided at a side of the nacelle platform, a generator assembly coupled to the nacelle platform, a rotor hub rotatably coupled to the generator assembly, and a plurality of blades coupled to the rotor hub and rotating the rotor hub. The rotor hub is provided at an outer circumference of a front end thereof with a plurality of first pulleys for guiding a case from a winch installed on the ground.
F03D 9/00 - Adaptations of wind motors for special useCombinations of wind motors with apparatus driven therebyWind motors specially adapted for installation in particular locations
H02P 9/04 - Control effected upon non-electric prime mover and dependent upon electric output value of the generator
A plasma chemical reactor includes a chamber for providing a plasma reaction space, and a cathode assembly coupled at one side to a wall surface of the chamber and supporting a substrate at the other side such that the substrate is positioned at a center inside the chamber, and installed to enable height adjustment such that the substrate can maintain a horizontal state.
C23C 16/50 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
C23C 16/00 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
C23F 1/00 - Etching metallic material by chemical means
H01L 21/306 - Chemical or electrical treatment, e.g. electrolytic etching
C23C 16/505 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
11.
Fluid injector for treating surface of flat display panel
A fluid injector for treating a surface of a flat display panel includes a case provided with a cavity for receiving fluid; a pair of nozzle guiders coupled to the case and disposed facing each other; a gap-adjusting plate disposed between the nozzle guiders to adjust a gap between the nozzle guiders; and a coupling device for coupling the nozzle guiders to the gap-adjusting plate.
B05B 1/26 - Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with means for mechanically breaking-up or deflecting the jet after discharge, e.g. with fixed deflectorsBreaking-up the discharged liquid or other fluent material by impinging jets
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