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Found results for
 patents
1.
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Garment pattern optimization system and method
| Application Number |
16958526 |
| Grant Number |
11523649 |
| Status |
In Force |
| Filing Date |
2018-12-06 |
| First Publication Date |
2021-02-25 |
| Grant Date |
2022-12-13 |
| Owner |
POLYGONAL BVBA (Belgium)
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| Inventor |
- Vanroose, Wim
- Lafkioui, Samira
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Abstract
According to an embodiment, the invention relates to a computer implemented method for grading a pattern from a first size to a second size, the pattern comprising one or more panels, the method comprising the steps of a representation step comprising representing each panel of the one or more panels by a contour, wherein a contour comprises one or more segments, a constraint step comprising imposing constraints on segments for grading to the second size; generating a mesh of each panel of the one or more panels thereby obtaining a first set of meshes; combining the first set of meshes with the constraints into a system of equations; solving the system of equations into a second set of meshes, wherein the contours of the second meshes correspond to the pattern in the second size and representing the contours of the second set of meshes.
IPC Classes ?
- A41H 3/00 - Patterns for cutting-outMethods of drafting or marking-out such patterns, e.g. on the cloth
- G05B 19/4155 - Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by programme execution, i.e. part programme or machine function execution, e.g. selection of a programme
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2.
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GARMENT PATTERN OPTIMIZATION SYSTEM AND METHOD
| Application Number |
EP2018083855 |
| Publication Number |
2019/129472 |
| Status |
In Force |
| Filing Date |
2018-12-06 |
| Publication Date |
2019-07-04 |
| Owner |
POLYGONAL BVBA (Belgium)
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| Inventor |
- Vanroose, Wim
- Lafkioui, Samira
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Abstract
According to an embodiment, the invention relates to a computer implemented method for grading a pattern (100) from a first size to a second size, the pattern comprising one or more panels, the method comprising the steps of a representation step comprising representing each panel of the one or more panels by a contour (200), wherein a contour comprises one or more segments, a constraint step comprising imposing constraints on segments for grading to the second size; generating a mesh (400) of each panel of the one or more panels thereby obtaining a first set of meshes; combining the first set of meshes with the constraints into a system of equations; solving the system of equations into a second set of meshes, wherein the contours of the second meshes correspond to the pattern in the second size (800) and representing the contours of the second set of meshes.
IPC Classes ?
- A41H 3/00 - Patterns for cutting-outMethods of drafting or marking-out such patterns, e.g. on the cloth
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3.
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GARMENT PATTERN OPTIMIZATION SYSTEM AND METHOD
| Document Number |
03084389 |
| Status |
Pending |
| Filing Date |
2018-12-06 |
| Open to Public Date |
2019-07-04 |
| Owner |
POLYGONAL BVBA (Belgium)
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| Inventor |
- Vanroose, Wim
- Lafkioui, Samira
|
Abstract
According to an embodiment, the invention relates to a computer implemented method for grading a pattern (100) from a first size to a second size, the pattern comprising one or more panels, the method comprising the steps of a representation step comprising representing each panel of the one or more panels by a contour (200), wherein a contour comprises one or more segments, a constraint step comprising imposing constraints on segments for grading to the second size; generating a mesh (400) of each panel of the one or more panels thereby obtaining a first set of meshes; combining the first set of meshes with the constraints into a system of equations; solving the system of equations into a second set of meshes, wherein the contours of the second meshes correspond to the pattern in the second size (800) and representing the contours of the second set of meshes.
IPC Classes ?
- A41H 3/00 - Patterns for cutting-outMethods of drafting or marking-out such patterns, e.g. on the cloth
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