A device for generating one or more images of a source distribution of a gamma radiation field in the near and far field can include a detector system that includes several synchronized detectors for detecting radiation, system electronics that registers coincidence events, a data acquisition system that stores the measurement data of the coincidence events, and an analysis unit that performs an image reconstruction, which reconstructs one or more images of the source distribution of the radiation field.
Y for the acquisition of the measurement values. In some embodiments, the method can include setting up a detector system, acquiring measurement values, associating coincidence events with an Identification number, calculating a functional value, acquiring coincidence events in frequency distributions, and calculating one or more direction distributions from the frequency distributions.
A method is directed to increasing the hardness of zinc sulfide. The hardness of zinc sulfide is increased by adding selective elements within a specified range to the crystal lattice of the zinc sulfide. The increased hardness over conventional zinc sulfide does not substantially compromise the optical properties of the zinc sulfide. The zinc sulfide may be used as a protective coating for windows and domes.
C23C 16/30 - Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
C03C 17/22 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with other inorganic material
C23C 16/01 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. on substrates subsequently removed by etching
C09D 1/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
G02B 1/10 - Optical coatings produced by application to, or surface treatment of, optical elements
C23C 16/46 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
Low scatter water clear zinc sulfide with reduced metal contamination is prepared by coating a chuck which holds zinc sulfide and machining the zinc sulfide with uncoated particles. An inert foil is cleaned with an acid cleaning method and also cleaning the zinc sulfide. The zinc sulfide is wrapped in the inert foil and then treated by a HIP process to provide a low scatter water-clear zinc sulfide. The low scatter water-clear zinc sulfide may be used in articles such as windows and domes.
The hardness of zinc sulfide is increased by adding selective elements within a specified range to the crystal lattice of the zinc sulfide. The increased hardness over conventional zinc sulfide does not substantially compromise the optical properties of the zinc sulfide. The zinc sulfide may be used as a protective coating for windows and domes.
C23C 16/30 - Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
C09D 1/00 - Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
G02B 1/10 - Optical coatings produced by application to, or surface treatment of, optical elements
C03C 17/22 - Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating with other inorganic material
C23C 16/01 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. on substrates subsequently removed by etching
Optical articles of zinc sulfide and zinc selenide with thick coatings of alumina are disclosed. The alumina coatings are deposited on the zinc sulfide and zinc selenide by a microwave assisted magnetron sputtering. In addition to alumina coatings, the optical articles may also include various polymer coatings.
Low scatter water clear zinc sulfide with reduced metal contamination is prepared by coating a chuck which holds zinc sulfide and machining the zinc sulfide with uncoated particles. An inert foil is cleaned with an acid cleaning method and also cleaning the zinc sulfide. The zinc sulfide is wrapped in the inert foil and then treated by a HIP process to provide a low scatter water-clear zinc sulfide. The low scatter water-clear zinc sulfide may be used in articles such as windows and domes.
C04B 35/547 - Shaped ceramic products characterised by their compositionCeramic compositionsProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxides based on sulfides or selenides
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 14/35 - Sputtering by application of a magnetic field, e.g. magnetron sputtering
G02B 1/10 - Optical coatings produced by application to, or surface treatment of, optical elements
G02B 1/02 - Optical elements characterised by the material of which they are madeOptical coatings for optical elements made of crystals, e.g. rock-salt, semiconductors
Low scatter water clear zinc sulfide with reduced metal contamination is prepared by cleaning an inert foil with an acid cleaning method and also cleaning zinc sulfide to reduce metal contamination. The zinc sulfide is wrapped in the inert foil and then treated by a HIP process to provide a water-clear zinc sulfide. The low scatter water-clear zinc sulfide may be used in articles such as windows and domes.
An optical article and method of making the same are provided. The optical article has optical multi-aperture operation. The optical article has one or more electrically conductive and selectively passivated patterns.
Method for quantitative determination of the suitability of crystals for optical components exposed to high energy densities, crystals graded in this way and uses thereof
A method is described for quantitative determination of suitability of an optical material, especially alkali halide and alkaline earth halide single crystals, for optical components exposed to high energy densities, especially of pulsed laser light at wavelengths under 250 nm. In this procedure radiation-dependent transmission of the optical material is determined at ultraviolet wavelengths by fluorescence measurements for fluorescence induced by ultraviolet radiation at these ultraviolet wavelengths. This is accomplished by a method including determining an induced fluorescence maximum of a non-linear absorption process, measuring a slope (|dT/dH|) of a functional relationship representing the dependence of the radiation-dependent transmission on fluence (H) for the induced fluorescence and determining radiation-dependent transmissions from this slope for particular fluence values.
An optical article and method of making the same are provided. The optical article has optical multi-aperture operation. The optical article has one or more electrically conductive and selectively passivated patterns.
An optical material for lithographic applications is selected from crystal materials by a testing method. The crystal materials are preferably quartz and/or alkali or alkaline earth halides, especially fluorides, or mixed crystals. The testing method includes three tests to measure irreversible radiation damage: 1) the optical material is irradiated with ultraviolet radiation at 193 nm and the non-intrinsic fluorescence intensity at 740 nm is measured; 2) the optical material is irradiated with high energy density laser light and a change in respective absorptions before and after irradiation at 385 nm is measured; and 3) the optical material is irradiated with an X-ray or radioactive source to form all possible color centers and a difference of respective surface integrals of corresponding absorption spectra in ultraviolet spectral and/or visible spectral regions is measured before and after irradiation.
The apparatus for extending or lengthening a laser pulse has a beam splitter. An incident laser pulse is split by the beam splitter into at least one first partial pulse and a second partial pulse. The first partial pulse is conducted through a delaying travel path section with a number of reflectors. The apparatus is characterized by a plurality of the variable delaying travel path sections which produce different length laser beam pulses from a single incident laser pulse.
2 blanks. In conclusion we achieved a strong improvement of the critical parameters of both refractive index homogeneity and striae for large size lens blanks up to 270 mm diameter.
The method determines the extent of irreversible radiation damage of an optical material. The method includes the following three tests to determine the extent of irreversible radiation damage: 1) the optical material is irradiated with ultraviolet radiation at a wavelength of 193 nm and the non-intrinsic fluorescence intensity at a wavelength of 740 nm is measured; 2) the optical material is irradiated with high energy laser light and a change in respective absorptions at a wavelength of 385 nm is determined before and after irradiation; and 3) the optical material is irradiated with an energetic radiation source to form all possible color centers and a difference of respective surface integrals of corresponding absorption spectra in ultraviolet spectral and/or visible spectral regions is measured before and after irradiation.
The method produces low-stress, large-volume crystals with low birefringence and uniform index of refraction. The method includes growing the crystal with larger than desired dimensions including diameter and height from a melt; cooling and tempering the crystal with the larger than desired dimensions and after the cooling and tempering removing edge regions of the crystal with the larger than desired dimensions so that a diameter reduction and a height reduction of at least five percent occurs respectively and so that the crystal has the desired dimensions of diameter and height. No further tempering takes place after removing of the edge regions.
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