The improved cathode sub-assembly includes a solid cylindrical cathode of tungsten, a cylindrical holder concentric to the cathode with an internal radially directed rib receiving one end of the cathode, and a cylindrical reflector threadably mounted within the holder in circumferentially spaced relation to the cathode. The holder is threadably mounted in a support plate to be able to be readily removed for servicing and/or replacement.
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
The indirectly heated cathode ion source assembly employs a cathode having a cup shaped body with a base and a cylindrical periphery, a thermal barrier having a plurality of cylindrical foils concentric to the cathode to reduce thermal loss; and a holder receiving the cathode and the thermal barrier in concentric relation.
The indirectly heated cathode ion source assembly employs a cathode cup unit and filament arrangement wherein the filament has a flat face spaced from a tungsten disc-shaped body and is disposed in a space that is surrounded by a thermal barrier to reduce thermal losses. The thermal barrier is formed by a plurality of concentric foils that are closely spaced.
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
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The plasma arc chamber is made in part of a one piece base fabricated from 95.95% pure tungsten having four rigid walls defining a rectangular central opening. A bottom plate closes the bottom of the base and a cover with a slit for the passage of an ion beam closes the top of the base. Liners are fitted into the bottom plate, the top of base and against the four walls of the base.
H01J 17/26 - Means for producing, introducing, or replenishing gas or vapour during operation of the tube
H01J 37/04 - Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
The extraction electrode has a pair of sub-assemblies that define a gap. Each sub-assembly has a suppression plate and ground plate secured together in spaced relation by pairs of insulating assemblies. A plate assembly extends perpendicularly from the ground plate. The gap between the subassemblies is set by tabs on a centering fixture extension.
H01J 3/14 - Arrangements for focusing or reflecting ray or beam
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
The source bushing assembly has a source bushing having an internal vacuum side and an external atmosphere side, a first shield of annular shape disposed at one end of the source bushing in spaced concentric relation to reduce formation of an electrically conductive coating on the source bushing, a second shield of annular shape disposed at an opposite end of the source bushing in spaced concentric relation to prevent arcing on the source bushing and an internally disposed concentric X-ray shield.
G21K 1/00 - Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
H01J 37/248 - Components associated with high voltage supply
H05G 1/04 - Mounting the X-ray tube within a closed housing
The support and electrode assemblies of the ion implanter are cooled by circulating a coolant through these parts during operation. The support for the arc chamber includes a one piece block of aluminum through which coolant passes and a hollow rectangular post on which the arc chamber sits with a space therebetween.
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
H01L 21/265 - Bombardment with wave or particle radiation with high-energy radiation producing ion implantation
H01J 27/08 - Ion sourcesIon guns using arc discharge
H01J 1/88 - Mounting, supporting, spacing, or insulating of electrodes or of electrode assemblies
H01J 7/26 - Cooling arrangementsHeating arrangementsMeans for circulating gas or vapour within the discharge space by flow of fluid through passages associated with tube or lamp
The second repeller assembly includes a flat plate and two sleeves through which the legs of a filament pass in electrically insulated manner. The clamp assembly for the filament includes a pair of strap assemblies with three straps each for electrically connecting the clamps and filament to an electrical feed. The straps are in contact with opposite flat sides of a terminal pin.
An arc chamber assembly for an ion source comprising a housing having a base and at least one pair of side walls extending upwardly from opposite sides of the base to define an arc chamber, the base having a plurality of channels extending to each sidewall; an inlet port connected to the base for delivering a flow of gas into the channels; a bottom liner having at least one pair of notches in each of two opposite side edges thereof and disposed in the housing in spaced parallel relation to the base and opposite the channels for conducting a flow of gas from the inlet port towards the sidewalls, each notch being in communication with a respective channel of the plurality of channels to pass gas upwardly into the arc chamber; and a pair of side liners, each side liner being disposed in the housing in spaced parallel relation to a respective one of the side walls for conducting a flow of gas between the base and the bottom liner, each side liner having at least one pair of slots to horizontally pass gas into the arc chamber.
A cathode sub-assembly is comprised of a retainer, a cathode and a collar, each of which has smooth unthreaded surfaces that slidably engage each other. A shield serves to hold the sub-assembly in a support plate. The cathode projects from the sub-assembly into an arc chamber with a tortuous path created therebetween for passage of a plasma flow.
The filament clamp assembly has a pair of bifurcated clamps to hold the connecting leads of a filament within a cavity of a cathode of a separate cathode assembly. The filament clamp assembly is mounted on the insulator block in self-aligning relation. The cathode assembly has a tungsten cathode with an internal cavity to receive the filament that is secured within a retainer shield made of one of tungsten, molybdenum and graphite by a threaded graphite cylindrical collar.
