A zoom optical system includes, in order from an object, a first lens group having positive refractive power, a second lens group having negative refractive power, and a third lens group having positive refractive power. The first lens group moves toward an object and air distances between the first to the third lens groups are varied upon zooming from a wide-angle end state to a tele-photo end state. The first lens group comprises a cemented lens consisting of a negative lens and a positive lens in order from the object. The following conditional expressions are satisfied:
A zoom optical system includes, in order from an object, a first lens group having positive refractive power, a second lens group having negative refractive power, and a third lens group having positive refractive power. The first lens group moves toward an object and air distances between the first to the third lens groups are varied upon zooming from a wide-angle end state to a tele-photo end state. The first lens group comprises a cemented lens consisting of a negative lens and a positive lens in order from the object. The following conditional expressions are satisfied:
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A zoom optical system includes, in order from an object, a first lens group having positive refractive power, a second lens group having negative refractive power, and a third lens group having positive refractive power. The first lens group moves toward an object and air distances between the first to the third lens groups are varied upon zooming from a wide-angle end state to a tele-photo end state. The first lens group comprises a cemented lens consisting of a negative lens and a positive lens in order from the object. The following conditional expressions are satisfied:
4.4
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f
1
/
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-
f
2
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8.
0.6
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f
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w
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where f1 denotes a focal length of the first lens group, f2 denotes a focal length of the second lens group, f3 denotes a focal length of the third lens group, fw denotes a focal length of the zoom optical system in the wide-angle end state, and ωw denotes a half angle of view in the wide-angle end state
G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
A focus adjustment method includes: obtaining at least two first microscopic images by performing image capturing of a first subject using a microscope including an objective lens and using a stop brought, the image capturing being performed a plurality of times while changing a position of the objective lens; by inputting the at least two first microscopic images to a learned model, estimating the direction of movement; processing to move the focus relative to the first subject based on the direction of movement; wherein the estimating includes generating a plurality of first partial images; inputting the plurality of first partial images to the learned model to have the learned model estimate a position of the focus of the objective lens; and calculating an estimation position, based on an estimation results on the position of the focus of the objective lens.
This drive mechanism comprises: a first member fixed to an output shaft of a motor; a rotary shaft which has a screw groove and of which the center axis is substantially parallel to the output shaft; and a second member which engages at one end with the first member and engages at the other end with one end of the rotary shaft. The second member is allowed to move in a first direction orthogonal to the output shaft and restricted from moving in a second direction substantially orthogonal to the first direction with respect to the first member. The second member is allowed to move in the second direction and restricted from moving in the first direction with respect to the rotary shaft.
G02B 7/04 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
The purpose of the present invention is to provide a base support device capable of suppressing deformation of a base. A base support device (810) comprises: a plurality of actuators (81b) that are disposed on an installation surface, each support a base (81a) at each of a plurality of support points on the lower surface side of the base (81a), and generate thrust in a support direction with respect to the support points; a plurality of detection units (82) that each detect a first position in the support direction of each of the plurality of support points with respect to the installation surface; and a control unit (CNT) that calculates an approximate plane of the lower surface of the base (81a) on the basis of the first position detected by each of the plurality of detection units (82), calculates a second position in the support direction with respect to the installation surface of each point where an axis passing through the support point and extending in the support direction and the approximate plane cross each other, and controls the plurality of actuators (81b) on the basis of the difference between the second position and the first position of each of the support points.
H01L 21/68 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for positioning, orientation or alignment
Provided is a robot device comprising: a robot hand; a robot arm that moves the robot hand with respect to at least three-degree-of-freedom directions including a rotation direction on a first coordinate system; a sensor that detects position information of the robot hand with respect to the at least three-degree-of-freedom directions; a detection unit that detects rotation axis information of the robot hand with respect to the rotation direction; and a control unit that controls the robot arm on the basis of the detected information of the sensor and the rotation axis information detected by the detection unit in order to control the position of the robot hand with respect to the at least three-degree-of-freedom directions so that a position error of the robot hand due to the rotation is compensated. The position error of the robot hand due to the rotation of the robot hand can be reduced.
An ophthalmic device including an interference optical system that detects interference light between signal light obtained by scanning an examined eye with light from a light source and reference light configured from light divided from the light source, an adjustment section that is disposed on an optical path of at least one out of the signal light or the reference light, and that adjusts a polarization state of light propagating along the at least one optical path such that a polarization state of the signal light is the same as the polarization state of the reference light, and a control section that controls the adjustment section according to a scan angle scanned on the examined eye.
A61B 3/10 - Objective types, i.e. instruments for examining the eyes independent of the patients perceptions or reactions
G16H 50/20 - ICT specially adapted for medical diagnosis, medical simulation or medical data miningICT specially adapted for detecting, monitoring or modelling epidemics or pandemics for computer-aided diagnosis, e.g. based on medical expert systems
7.
ZOOM LENS, OPTICAL APPARATUS, AND METHOD FOR MANUFACTURING ZOOM LENS
A zoom lens includes, in order from an object along an optical axis: a first lens group having a negative refractive power; a second lens group having a positive refractive power; a third lens group having a negative refractive power; a fourth lens group; and a fifth lens group. When the zoom lens performs varying magnification, the distance between the first and second lens groups changes, the distance between the second and third lens groups changes, the distance between the third and fourth lens groups changes, the distance between the fourth and fifth lens groups changes, the second and fourth lens groups move along the same trajectory along the optical axis, and at least the third lens group moves along the optical axis.
G02B 9/60 - Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or – having five components only
G02B 13/02 - Telephoto objectives, i.e. systems of the type + – in which the distance from the front vertex to the image plane is less than the equivalent focal length
G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
G02B 15/177 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a negative front lens or group of lenses
G02B 27/00 - Optical systems or apparatus not provided for by any of the groups ,
G02B 27/64 - Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
8.
IMAGE SENSOR AND IMAGE-CAPTURING DEVICE INCLUDING ADJUSTMENT UNIT FOR REDUCING CAPACITANCE
An image sensor includes: a first pixel having a first photoelectric conversion unit that photoelectrically converts light to generate a charge, a first accumulation unit that accumulates the charge generated by the first photoelectric conversion unit, and a first output unit that is connected to the first accumulation unit; a second pixel having a second photoelectric conversion unit that photoelectrically converts light to generate a charge, a second accumulation unit that accumulates the charge generated by the second photoelectric conversion unit, and a second output unit that is connected to and disconnected from the second accumulation unit via a second connection unit; and an adjustment unit that adjusts capacitances of the first accumulation unit and the second accumulation unit if a signal based on the charges generated by the first photoelectric conversion unit and the second photoelectric conversion unit is output from the first output unit.
H04N 25/46 - Extracting pixel data from image sensors by controlling scanning circuits, e.g. by modifying the number of pixels sampled or to be sampled by combining or binning pixels
H04N 25/75 - Circuitry for providing, modifying or processing image signals from the pixel array
This lens barrel comprises: a lens holding frame that holds a lens; a rotation shaft that is rotated by a motor; a fitting portion that moves in a first direction in accordance with the rotation of the rotation shaft around the first direction; a plurality of bearing members that sandwich a portion of the fitting part; and a straight-moving member that is connected to the lens holding frame, rotatably holds the fitting portion through the plurality of bearing members, and moves in the first direction along with the movement of the fitting portion in the first direction.
G02B 7/04 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
To take security into account and increase user friendliness, an information processing device includes: an input unit to which information is input; an extracting unit extracting predetermined words from the information input to the input unit; a classifying unit classifying the words extracted by the extracting unit into first words and second words; and a converting unit converting the first words by a first conversion method and converting the second words by a second conversion method, the second conversion method being different from the first conversion method.
Provided is a substrate bonding device that bonds a first substrate and a second substrate to each other. The substrate bonding device comprises a first stage that holds the first substrate, a second stage that holds the second substrate, a control device that controls the movement of at least the first stage, a first measurement device that measures the position of the first stage, and a second measurement device that measures the position of the first stage. The control device uses a position measurement value from the first measurement device to control the movement during a first time period that is before a time point at which a contact region between the first substrate and the second substrate is formed and uses a position measurement value from the second measurement device to control the movement during a second time period that is after the first time period and includes at least the time point.
H01L 21/02 - Manufacture or treatment of semiconductor devices or of parts thereof
H01L 21/68 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for positioning, orientation or alignment
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
12.
VARIABLE MAGNIFICATION OPTICAL SYSTEM, OPTICAL DEVICE, AND METHOD FOR MANUFACTURING VARIABLE MAGNIFICATION OPTICAL SYSTEM
A variable magnification optical system comprising a first lens group, a second lens group, a third lens group, and a rear group in order from object side is configured so that at varying magnification the distances between adjacent lens groups are varied; at a predetermined object distance the variable magnification optical system has focused states with different amounts of aberration; the rear group includes a first focusing lens group and a second focusing lens group disposed closer to an image side than the first focusing lens group, the first and second focusing lens groups moving along different trajectories at focusing; at the object distance the first and second focusing lens groups move at transition from a first focused state to a second focused state; and the following conditional expression is satisfied:
A variable magnification optical system comprising a first lens group, a second lens group, a third lens group, and a rear group in order from object side is configured so that at varying magnification the distances between adjacent lens groups are varied; at a predetermined object distance the variable magnification optical system has focused states with different amounts of aberration; the rear group includes a first focusing lens group and a second focusing lens group disposed closer to an image side than the first focusing lens group, the first and second focusing lens groups moving along different trajectories at focusing; at the object distance the first and second focusing lens groups move at transition from a first focused state to a second focused state; and the following conditional expression is satisfied:
−6.80
G02B 13/00 - Optical objectives specially designed for the purposes specified below
G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
13.
PROCESSING SYSTEM, MEASUREMENT DEVICE, AND PROCESSING METHOD
A processing system according to the present invention is provided with: an object placement device which is capable of supporting a first surface and a second surface of a plate-shaped workpiece respectively on a plurality of support sections; a processing device which uses processing light to process the workpiece placed on the object placement device; a measurement device which measures the workpiece placed on the object placement device; and a control device. The control device performs control so as to measure the first surface of the workpiece while the second surface thereof is supported, and, after measurement of the first surface, performs control so as to measure the second surface of the workpiece while the first surface thereof is supported. Furthermore, after the measurement of the second surface, the control device performs control so as to process the second surface on the basis of the measurement result of the first surface and the measurement result of the second surface.
An imaging device wherein: an optical unit (20) of an imaging optical system has a diaphragm (25) having a first opening (21) formed at a position separated from the optical axis of the imaging optical system and a second opening (22) formed at a position on the opposite side of the optical axis of the imaging optical system from the first opening (21), a first polarized light element (23) provided in the first opening (21) and transmitting only light having a first polarization direction; and a second polarized light element (24) provided in the second opening (22) and transmitting only light having a second polarization direction perpendicular to the first polarization direction; and an imaging element has a first polarized light unit that transmits only light having the first polarization direction within incident light to a first pixel among a plurality of pixels, and a second polarized light unit that transmits only light having the second polarization direction within the incident light.
A zoom lens includes, in order from an object, a first lens group having a negative refractive power, a second lens group having a positive refractive power, a third lens group having a negative refractive power, and a fourth lens group. Zooming is performed by changing respective distances between the first and second lens groups, the second and third lens groups, and the third and fourth lens groups. The first lens group includes a negative lens disposed closest to the object, and a negative lens. Specified conditional expressions are satisfied.
G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
G02B 15/177 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a negative front lens or group of lenses
G02B 27/64 - Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
18.
OBSERVATION DEVICE, OBSERVATION METHOD, AND PROGRAM
Provided is an observation device for analyzing a cell image, the observation device comprising: an image acquisition unit that, at a pixel resolution lower than the pixel resolution of a first image used for analysis, acquires a second image in a region wider than a region used for the analysis; an index calculation unit that calculates a value of an index pertaining to a cell for each partial region included in the second image and corresponding to the region used for analysis; and a region selection unit that selects a region to be used for analysis from a plurality of the partial regions on the basis of the values of the indexes calculated by the index calculation unit.
An image display device includes: an input unit into which image signals are inputted, the image signals being outputted from image capturing pixels disposed in correspondence to image capturing micro-lenses, each of the image capturing pixels receiving light that has passed through a corresponding one of the image capturing micro-lenses; display micro-lenses; display pixels that emit light for forming a three-dimensional image to each of the display micro-lenses, the display pixels being disposed in correspondence to the display micro-lenses; and a generator that generates display image data that includes three-dimensional information, based upon the image signals inputted into the input unit. The generator allocates the image signals outputted from the image capturing pixels to the display pixels arranged at symmetrical positions in a predetermined direction, using a pseudo-optical axis of each of the display micro-lenses as a reference.
G02B 30/27 - Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer’s left and right eyes of the autostereoscopic type involving lenticular arrays
G03B 35/24 - Stereoscopic photography by simultaneous viewing using apertured or refractive resolving means on screen or between screen and eye
H04N 13/232 - Image signal generators using stereoscopic image cameras using a single 2D image sensor using fly-eye lenses, e.g. arrangements of circular lenses
H04N 13/307 - Image reproducers for viewing without the aid of special glasses, i.e. using autostereoscopic displays using fly-eye lenses, e.g. arrangements of circular lenses
20.
MAGNIFICATION-VARIABLE OPTICAL SYSTEM, OPTICAL APPARATUS, AND METHOD FOR MANUFACTURING MAGNIFICATION-VARIABLE OPTICAL SYSTEM
A magnification-variable optical system having a small size, a wide angle of view, and high optical performance, an optical apparatus including the magnification-variable optical system, and a method for manufacturing the magnification-variable optical system are provided, the magnification-variable optical system ZL being used for an optical apparatus and includes a first lens group G1 having a negative refractive power, and a rear group GR including at least one lens group disposed on an image side of the first lens group G1, and is configured so that a distance between lens groups adjacent to each other changes at magnification change and a condition expressed by predetermined condition expressions is satisfied.
G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
G02B 3/04 - Simple or compound lenses with non-spherical faces with continuous faces that are rotationally symmetrical but deviate from a true sphere
A detection device includes: a detection unit that detects a predetermined non-contact operation by a detection reference; and a control unit that changes the detection reference when the predetermined non-contact operation is not detected by the detection reference.
G06F 3/041 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
G06F 3/0354 - Pointing devices displaced or positioned by the userAccessories therefor with detection of 2D relative movements between the device, or an operating part thereof, and a plane or surface, e.g. 2D mice, trackballs, pens or pucks
G06F 3/038 - Control and interface arrangements therefor, e.g. drivers or device-embedded control circuitry
G06F 3/042 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by opto-electronic means
G06F 3/044 - Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
G06F 3/04817 - Interaction techniques based on graphical user interfaces [GUI] based on specific properties of the displayed interaction object or a metaphor-based environment, e.g. interaction with desktop elements like windows or icons, or assisted by a cursor's changing behaviour or appearance using icons
G06F 3/04883 - Interaction techniques based on graphical user interfaces [GUI] using specific features provided by the input device, e.g. functions controlled by the rotation of a mouse with dual sensing arrangements, or of the nature of the input device, e.g. tap gestures based on pressure sensed by a digitiser using a touch-screen or digitiser, e.g. input of commands through traced gestures for inputting data by handwriting, e.g. gesture or text
H04N 23/62 - Control of parameters via user interfaces
22.
ELECTRONIC APPARATUS, METHOD FOR CONTROLLING ELECTRONIC APPARATUS, AND CONTROL PROGRAM
To generate multiple types of images of the same subject, an electronic apparatus includes a drive control unit that controls the drive of an image sensor, a division unit that divides an image capture region of the image sensor into at least first and second regions, and an image generation unit that generates a first image by capturing an image of the same subject in the first region and generates a second image by capturing an image of the same subject in the second region.
H04N 5/262 - Studio circuits, e.g. for mixing, switching-over, change of character of image, other special effects
H04N 23/62 - Control of parameters via user interfaces
H04N 25/42 - Extracting pixel data from image sensors by controlling scanning circuits, e.g. by modifying the number of pixels sampled or to be sampled by switching between different modes of operation using different resolutions or aspect ratios, e.g. switching between interlaced and non-interlaced mode
H04N 25/44 - Extracting pixel data from image sensors by controlling scanning circuits, e.g. by modifying the number of pixels sampled or to be sampled by partially reading an SSIS array
H04N 25/583 - Control of the dynamic range involving two or more exposures acquired simultaneously with different integration times
H04N 25/75 - Circuitry for providing, modifying or processing image signals from the pixel array
H04N 25/79 - Arrangements of circuitry being divided between different or multiple substrates, chips or circuit boards, e.g. stacked image sensors
23.
INFORMATION PROCESSING METHOD, COMPUTER PROGRAM, RECORDING MEDIUM, INFORMATION PROCESSING DEVICE, AND PROCESSING DEVICE
This information processing method includes: acquiring a difference model indicating a difference between an object model obtained by measuring a three-dimensional shape of an object and a target model indicating a target shape after processing of the object generated on the basis of the object model; measuring a processed object having been subjected to the processing on the basis of the difference model to acquire a post-processing model indicating a three-dimensional shape of at least a part of the processed object; and generating difference information on a difference between the difference model and the post-processing model.
An optical system that achieves size reduction in a zoom lens with high magnification and has favorable optical performance, an optical apparatus, and a method for manufacturing the optical system are provided. An optical system OL included in an optical apparatus such as a camera 1 includes, sequentially from an object side, a first lens group G1 having positive refractive power, a second lens group G2 having negative refractive power, a middle group GM constituted by one or two lens groups and having positive refractive power, a focusing group GF that is a lens group having negative refractive power and moves in an optical axis direction at focusing, and a rear group GR constituted by at least one lens group, distance between lens groups adjacent to each other changes at magnification change from a wide-angle end state to a telephoto end state, and the optical system OL satisfies a predetermined condition.
G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
G02B 13/00 - Optical objectives specially designed for the purposes specified below
G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
G02B 27/64 - Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
25.
PROCESSING SYSTEM, PROCESSING METHOD, COMPUTER PROGRAM, RECORDING MEDIUM, AND CONTROL APPARATUS
A processing system is provided with: a support apparatus that is configured to support a processing target; a processing apparatus that performs an additive processing by irradiating a processed area on the processing target with an energy beam and by supplying materials to an area that is irradiated with the energy beam; and a position change apparatus that changes a positional relationship between the support apparatus and an irradiation area of the energy beam from the processing apparatus, wherein the processing system forms a fiducial build object by performing the additive processing on at least one of a first area that is a part of the support apparatus and a second area that is a part of the processing target, and the processing system controls at least one of the processing apparatus and the position change apparatus by using an information relating to the fiducial build object.
B22F 12/90 - Means for process control, e.g. cameras or sensors
B29C 64/153 - Processes of additive manufacturing using only solid materials using layers of powder being selectively joined, e.g. by selective laser sintering or melting
B29C 64/393 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
B33Y 30/00 - Apparatus for additive manufacturingDetails thereof or accessories therefor
B33Y 50/02 - Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
26.
PROCESSING APPARATUS, PROCESSING METHOD, BUILD APPARATUS, BUILD METHOD, COMPUTER PROGRAM AND RECORDING MEDIUM
A processing apparatus is a processing apparatus that performs a process for irradiating an object with an energy beam, the processing apparatus is provided with: an energy beam irradiation apparatus that irradiates at least a part of a surface of the object with the energy beam; and a position change apparatus that changes an irradiation position of the energy beam at the surface of the object, the processing apparatus controls the irradiation position of the energy beam by using a shape information relating to a shape of the object.
The problem of the presence of excess flare in maskless photolithography systems is addressed by systems and methods that utilize an aerial imaging system to monitor flare associated with the maskless photolithography systems.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
28.
MICROSCOPE OBJECTIVE LENS, MICROSCOPE OPTICAL SYSTEM, AND MICROSCOPE APPARATUS
A microscope objective lens (OL) comprises a first lens group (G1) having positive refractive power, a second lens group (G2) having negative refractive power, and a third lens group (G3) having positive refractive power, the third lens group (G3) having a cemented lens (CL31) including a positive lens and a negative lens. The microscope objective lens satisfies the following conditional expression. 0.1
G02B 9/60 - Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or – having five components only
G02B 27/00 - Optical systems or apparatus not provided for by any of the groups ,
A scanning optical system (SL) of this scanning microscope comprises a plurality of lens components and has positive refractive power as a whole, each lens component comprising one cemented lens composed of a plurality of lenses cemented to each other, or one lens. The scanning optical system satisfies the following conditional expression. 0.007<Σ(nd×tc/νd)/LA<0.021 where Σ(nd×tc/νd) is the sum total of nd×tc/νd of lenses of the plurality of lens components when a refractive index for the d line of a lens constituting the plurality of lens components is denoted by nd, the center thickness of the lens is denoted by tc, and the Abbe's number of the lens is denoted by νd, and LA is the distance on an optical axis from a lens surface on the scanning mechanism side of a lens component closest to a scanning mechanism to a lens surface on the objective optical system side of a lens component closest to an objective optical system.
A variable magnification optical system comprising a plurality of lens groups which includes a first negative lens group having negative refractive power, a second negative lens group disposed at a more image side than the first negative lens group and having negative refractive power, a third negative lens group disposed at a more image side than the second negative lens group and having negative refractive power; upon varying a magnification, distances between adjacent lens groups being varied; the first negative lens group being movable to include a component in a direction perpendicular to the optical axis as a vibration reduction lens group; the second negative lens group being moved along the optical axis upon carrying out focusing; and the predetermined conditional expression(s) being satisfied. The variable magnification optical system can attain a high optical performance and be made in small in size.
G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
This measurement system comprises a first measurement device that measures at least a portion of a workpiece in a first measurement region, and a second measurement device that measures a portion of the workpiece in a second measurement region that is narrower than the first measurement region. In the measurement system, a first image including an image of the workpiece obtained from a first measurement result by the first measurement device is displayed by a display device, a measurement object pertaining to the second measurement device is displayed superimposed on the first image by the display device on the basis of the first measurement result, and the second measurement device measures a portion of the workpiece corresponding to the measurement object.
A microscope objective lens (OL) comprises a first lens group (G1) having positive refractive power, a second lens group (G2) having negative refractive power, and a third lens group (G3) having positive refractive power, the first lens group (G1) having a cemented lens (CL11) including a negative lens. The microscope objective lens satisfies the following conditional expressions. 0.625<θgF1N<0.725 22.5<νd1N<30 where νd1N is the Abbe's number of the negative lens in the cemented lens (CL11) of the first lens group (G1), and θgF1N is the partial dispersion ratio of the negative lens in the cemented lens (CL11) of the first lens group (G1).
G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
An accessory mount can be inserted through the camera body mount without any of the first through third tabs being hindered by any of three camera body-side tabs at the camera body mount, as long as the accessory mount is inserted into the camera body mount at a correct interlock phase. The first, second, and third tabs extend over varying lengths along the circumferential direction. The first tab extends over a greatest length and the third tab extends over a smallest length, along the circumferential direction. The accessory mount includes a restricting member, a fitting portion, and a lock pin hole. The restricting member is disposed at a position assumed on a side substantially opposite from the lock pin hole across the fitting portion.
A shaping system (SYS1) comprises a shaping device (20) that can shape an object to be shaped on a workpiece (W) and that includes: a first irradiation unit (21) that has a first irradiation optical system (22) having an optical axis along the vertical direction and that is capable of irradiating the workpiece (W) with processing light (EL) from above the workpiece W; and material nozzles (24) for supplying a shaping material (M) to the position at which the processing light (EL) is projected. The shaping system (SYS1) also comprises a second irradiation unit (150L, 150R) that can heat the object to be shaped and that can irradiate the object to be shaped with heating light. The second irradiation unit (150L, 150R) can project the heating light below the position at which the processing light (EL) is projected.
This eye imaging device images an eye and comprises: a retroreflection unit for retroreflecting light from the eye; a beam splitter disposed on the optical path on which light from the eye reaches the retroreflection unit; and an acquisition unit for acquiring, from the light from the eye, light that was reflected by the retroreflection unit and that passed through the beam splitter.
A variable magnification optical system (ZL) comprises a plurality of lens groups including: a first lens group (G1) having a positive refractive power and disposed closest to the object side; and a terminal lens group (GL) having a negative refractive power and disposed closest to the image surface side. The plurality of lens groups include at least six lens groups. When varying magnification, the intervals between adjacent lens groups change, and the following conditional expression is satisfied. 2.00 < f1/(- fL) < 20.00. f1 is the focal length of the first lens group (G1), and fL is the focal length of the terminal lens group (GL).
G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
37.
ELECTRONIC DEVICE, IMAGING DEVICE, IMAGE REPRODUCTION METHOD, IMAGE REPRODUCTION PROGRAM, RECORDING MEDIUM WITH IMAGE REPRODUCTION PROGRAM RECORDED THEREUPON, AND IMAGE REPRODUCTION DEVICE
An electronic device includes: a communication unit that performs communication with an external device; and a control unit that issues a command to the external device via the communication unit, on the basis of at least one of capacity of the external device, and capacity of the electronic device.
H04N 1/00 - Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmissionDetails thereof
G06F 16/583 - Retrieval characterised by using metadata, e.g. metadata not derived from the content or metadata generated manually using metadata automatically derived from the content
H04N 5/77 - Interface circuits between an apparatus for recording and another apparatus between a recording apparatus and a television camera
H04N 5/907 - Television signal recording using static stores, e.g. storage tubes or semiconductor memories
H04N 9/804 - Transformation of the television signal for recording, e.g. modulation, frequency changingInverse transformation for playback involving pulse code modulation of the colour picture signal components
H04N 9/82 - Transformation of the television signal for recording, e.g. modulation, frequency changingInverse transformation for playback the individual colour picture signal components being recorded simultaneously only
H04N 23/61 - Control of cameras or camera modules based on recognised objects
H04N 23/611 - Control of cameras or camera modules based on recognised objects where the recognised objects include parts of the human body
H04N 23/62 - Control of parameters via user interfaces
H04N 23/63 - Control of cameras or camera modules by using electronic viewfinders
H04N 23/661 - Transmitting camera control signals through networks, e.g. control via the Internet
H04N 23/667 - Camera operation mode switching, e.g. between still and video, sport and normal or high and low resolution modes
H04N 23/67 - Focus control based on electronic image sensor signals
H04N 23/90 - Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums
38.
MOVING BODY, SHEET MEMBER, AND MANUFACTURING DEVICE
Provided is a moving body capable of moving in a fluid, wherein a surface of the moving body includes a first surface to which a first sheet member having a first riblet structure formed thereon is attached, and a second surface to which a second sheet member having a second riblet structure formed thereon is attached, a characteristic of the first riblet structure being different from a characteristic of the second riblet structure.
An image processing method, performed by a processor, includes: a step of acquiring OCT volume data including a choroid; a step of generating plural en-face images corresponding to plural planes having different depths, based on the OCT volume data; a step of deriving an image feature amount in each of the plural en-face images; and a step of identifying, as a boundary, an interval between en-face images in which the image feature amounts indicate a switch between presence and absence of choroidal blood vessels, based on the respective image feature amounts.
G06V 10/44 - Local feature extraction by analysis of parts of the pattern, e.g. by detecting edges, contours, loops, corners, strokes or intersectionsConnectivity analysis, e.g. of connected components
G06V 10/60 - Extraction of image or video features relating to illumination properties, e.g. using a reflectance or lighting model
40.
CAMERA BODY FOR RECEIVING FIRST AND SECOND IMAGE PLANE TRANSFER COEFFICIENTS
A lens barrel of the invention includes: an imaging optical system including a focus adjustment lens; a driver that drives the focus adjustment lens in a direction of an optical axis; a transceiver that transmits and receives a signal to and from a camera body; and a controller that controls the transceiver to repeatedly transmit a first image plane transfer coefficient which is determined in correspondence with a position of the focus adjustment lens included in the imaging optical system and a second image plane transfer coefficient which does not depend on the position of the focus adjustment lens to the camera body at a predetermined interval, and, when the controller repeatedly transmits the second image plane transfer coefficient to the camera body, the controller varies the second image plane transfer coefficient over time.
H04N 23/663 - Remote control of cameras or camera parts, e.g. by remote control devices for controlling interchangeable camera parts based on electronic image sensor signals
G02B 7/08 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification adapted to co-operate with a remote control mechanism
G02B 7/36 - Systems for automatic generation of focusing signals using image sharpness techniques
G02B 7/38 - Systems for automatic generation of focusing signals using image sharpness techniques measured at different points on the optical axis
An image processing method performed by a processor includes: a step of acquiring an image captured of a choroid; a step of performing enhancement processing that enhances contrast in the acquired image; a step of performing binarization processing on the image that has been subjected to the enhancement processing; and a step of extracting a region corresponding to choroidal blood vessels in the choroid from the image that has been subjected to the binarization processing.
A pulsed light generation device includes a nonlinear optical crystal configured to cause first pulsed light emitted from a pulsed light source to enter, and to emit second pulsed light obtained by wavelength-converting the first pulsed light, and a diffraction grating that is disposed on an advancing path of the second pulsed light emitted from the nonlinear optical crystal and that is configured to emit third pulsed light obtained by reducing a ratio of an amount of change in pointing with respect to an amount of change in frequency of the entered pulsed light.
An illumination unit comprising: a light source; a first optical system that forms an intermediate image of the light source; and a control mechanism that can switch between a first state in which a dimming member is disposed at or near the position of the intermediate image, and a second state in which the dimming member is not disposed there.
This image blur correction device is provided with: an imaging element having an imaging plane in which a plurality of pixels are arranged; a first support member that supports the imaging element; a second support member that movably supports the first support member; and a drive unit that drives the first support member relative to the second support member. The drive unit includes a first drive unit that drives the first support member in a first direction in the imaging plane, and two second drive units that drive the first support member in a second direction orthogonal to the first direction in the imaging plane. The first drive unit is provided with a coil wound in a substantially rectangular shape, and a magnet. When the imaging element is viewed from a third direction orthogonal to the imaging plane, one of the two long sides of the coil overlaps the imaging element.
H04N 23/68 - Control of cameras or camera modules for stable pick-up of the scene, e.g. compensating for camera body vibrations
G03B 5/00 - Adjustment of optical system relative to image or object surface other than for focusing of general interest for cameras, projectors or printers
G03B 17/55 - Details of cameras or camera bodiesAccessories therefor with provision for heating or cooling, e.g. in aircraft
G03B 30/00 - Camera modules comprising integrated lens units and imaging units, specially adapted for being embedded in other devices, e.g. mobile phones or vehicles
H04N 23/52 - Elements optimising image sensor operation, e.g. for electromagnetic interference [EMI] protection or temperature control by heat transfer or cooling elements
H04N 23/54 - Mounting of pick-up tubes, electronic image sensors, deviation or focusing coils
A processing system includes: a first processing apparatus that performs an additive manufacturing in a first processing area by emitting a first energy beam; a second processing apparatus that performs a removal processing in a second processing area by emitting a second energy beam; first and second placing apparatuses on which the additive manufacturing and the removal processing are performed; a positional change apparatus that relatively moves the first and second placing apparatuses between the first and second processing areas; and first and second light receiving apparatuses respectively disposed on the first and second placing apparatuses, wherein each of the first and second light receiving apparatuses may optically receive at least one of the first and second energy beams, and information related to a position of the first placing apparatus is acquired by an optical received result by the first light receiving apparatus, and information related to a position of the second placing apparatus is acquired by an optical received result by the second light receiving apparatus.
A zoom optical system consists of a first lens group having negative refractive power, a second lens group having positive refractive power, and a rear lens group which are disposed in order from an object. The rear lens group comprises a last lens group and an F lens group in order from a side closest to an image. Lens groups forming the first lens group, the second lens group, and the rear lens group are configured in such a manner that, upon zooming, the respective lens groups move and a distance between the lens groups adjacent to each other changes. At least a part of the F lens group is configured to move upon focusing. Further, the following conditional expression is satisfied.
A zoom optical system consists of a first lens group having negative refractive power, a second lens group having positive refractive power, and a rear lens group which are disposed in order from an object. The rear lens group comprises a last lens group and an F lens group in order from a side closest to an image. Lens groups forming the first lens group, the second lens group, and the rear lens group are configured in such a manner that, upon zooming, the respective lens groups move and a distance between the lens groups adjacent to each other changes. At least a part of the F lens group is configured to move upon focusing. Further, the following conditional expression is satisfied.
−0.220
G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
G03B 5/00 - Adjustment of optical system relative to image or object surface other than for focusing of general interest for cameras, projectors or printers
48.
IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUCING METHOD
There is provided a reflective image-forming optical system which is applicable to an exposure apparatus using, for example, EUV light and which is capable of increasing numerical aperture while enabling optical path separation of light fluxes. In a reflective imaging optical system (6) forming an image of a first plane (4) onto a second plane (7), the numerical aperture on a side of the second plane with respect to a first direction (X direction) on the second plane is greater than 1.1 times a numerical aperture on the side of the second plane with respect to a second direction (Y direction) crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop (AS) defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction (X direction) is greater than 1.1 times that in a minor axis direction (Y direction).
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
G02B 17/06 - Catoptric systems, e.g. image erecting and reversing system using mirrors only
49.
CORRECTION APPARATUS, EXPOSURE APPARATUS, COATER AND DEVELOPER APPARATUS, EXPOSURE SYSTEM, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
A correction apparatus includes a mounting device configured to allow a wafer to be mounted thereon, a heating part configured to heat the wafer mounted on the mounting device, a force application part configured to apply a force to the wafer mounted on the mounting device, a first transport device configured to transport the wafer removed from the mounting device, and a controller configured to control the heating part and the force application part, wherein the controller performs shape correction on the wafer by the force application part applying a force to the wafer while the heating part heats the wafer, and the first transport device transports the wafer to which the shape correction has been performed.
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
50.
IMAGE PROCESSING METHOD AND IMAGE PROCESSING DEVICE
An image processing method includes a labeled image acquisition step of acquiring a labeled image of biological samples including a plurality of structures that are labeled, a binarized image generation step of binarizing the labeled image to generate binarized images, and a ground-truth image acquisition step of inputting an unknown labeled image into a pre-trained model trained using the labeled image and the binarized images corresponding to the labeled image, thereby acquiring, as a ground-truth image, a binarized image in which the structures in the unknown labeled image appear plausible.
An optical system comprising, in order from an object side, a first lens group, an aperture stop, and a rear group that includes a first cemented lens comprising a positive lens and a negative lens is configured so as to satisfy the following conditional expressions:
An optical system comprising, in order from an object side, a first lens group, an aperture stop, and a rear group that includes a first cemented lens comprising a positive lens and a negative lens is configured so as to satisfy the following conditional expressions:
0.350
G02B 9/64 - Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or – having more than six components
52.
VENTILATION WATERPROOF MEMBER, BOX GIRDER, AND BOX GIRDER BRIDGE
A ventilation waterproof member (30) to which a hollow structure (10) is to be attached is composed of a solid material, has a prescribed three-dimensional shape that can be attached to the hollow structure (10) in a state of being inserted into a through-hole (17) formed in the hollow structure, and has a plurality of ventilation holes capable of preventing water (liquid) from entering. This makes it possible to ventilate the interior of the hollow structure while preventing water from entering the interior of the hollow structure.
A processing apparatus is a processing apparatus that performs a riblet processing on a surface of an object by using light from a light source, and includes: a first optical system that forms an interference fringe on the surface of the object by irradiating the object with a plurality of processing lights, which are generated by dividing the light from the light source, from different incident directions, respectively; and a second optical system that adjusts a shape of a riblet, which is formed on the surface of the object, by providing at least one difference of a difference in intensity, a difference in phase and a difference in polarization between at least two processing lights, with which the object is irradiated, among the plurality of processing lights.
B23K 26/359 - Working by laser beam, e.g. welding, cutting or boring for surface treatment by providing a line or line pattern, e.g. a dotted break initiation line
B23K 26/067 - Dividing the beam into multiple beams, e.g. multi-focusing
Various factors can degrade the quality of camera images. For example, images can be distorted by rotation, shear, horizontal lens shift, and/or vertical lens shift. Such factors may result in perspective distortion of a subject being captured in a camera image by transforming horizontal and/or vertical lines of the subject and/or subject plane into lines that are at an angle to the horizon and/or the normal to the horizon in the image. Prior techniques that rely on search processes to find a homography for perspective correction in images can be time-consuming and computationally expensive. Moreover, these prior techniques may fail to find a solution that results in a corrected image of sufficient quality. The disclosed techniques overcome these drawbacks by applying fast homography transformations based on deterministic methods to align images that exhibit perspective distortion.
An imaging device includes an imaging portion that images a subject; a positional information acquisition portion that acquires positional information of an imaging position; a control portion which acquires information on the subject based on the positional information, and displays image data of the subject and the information on the subject on a display portion; and a hold control portion that outputs a hold control signal, which holds the image data of the subject and the information on the subject, to the control portion.
G06V 20/20 - ScenesScene-specific elements in augmented reality scenes
G06F 3/0481 - Interaction techniques based on graphical user interfaces [GUI] based on specific properties of the displayed interaction object or a metaphor-based environment, e.g. interaction with desktop elements like windows or icons, or assisted by a cursor's changing behaviour or appearance
G06F 3/04817 - Interaction techniques based on graphical user interfaces [GUI] based on specific properties of the displayed interaction object or a metaphor-based environment, e.g. interaction with desktop elements like windows or icons, or assisted by a cursor's changing behaviour or appearance using icons
G06Q 30/0207 - Discounts or incentives, e.g. coupons or rebates
G06T 7/33 - Determination of transform parameters for the alignment of images, i.e. image registration using feature-based methods
G06T 19/00 - Manipulating 3D models or images for computer graphics
H04N 1/00 - Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmissionDetails thereof
H04N 1/32 - Circuits or arrangements for control or supervision between transmitter and receiver
H04N 5/77 - Interface circuits between an apparatus for recording and another apparatus between a recording apparatus and a television camera
H04N 9/82 - Transformation of the television signal for recording, e.g. modulation, frequency changingInverse transformation for playback the individual colour picture signal components being recorded simultaneously only
H04N 21/422 - Input-only peripherals, e.g. global positioning system [GPS]
An optical glass contains, by mol %, 40 to 85% of a content rate of TeO2, 10 to 40% of a content rate of ZnO, at least one of B2O3 and Bi2O3, and at least one of La2O3 and WO3.
A feature value related to a positional relationship between a vortex vein position and a characteristic point on a fundus image is computed.
A feature value related to a positional relationship between a vortex vein position and a characteristic point on a fundus image is computed.
The image processing method provided includes a step of analyzing a choroidal vascular image and estimating a vortex vein position, and a step of computing a feature value indicating a positional relationship between the vortex vein position and a position of a particular site on a fundus.
Provided is a robot hand device that can connect to a robot arm, said robot hand device comprising: a plurality of finger parts that can grip an object; a drive part that drives a driven part of at least one finger part from among the plurality of finger parts in order to cause the plurality of finger parts to grip the object; and a force increasing part that applies force to at least one finger part from among the plurality of finger parts in order to increase the gripping force on the object. Thus, the gripping force on the object can be increased without increasing the size of the robot hand or particularly increasing the complexity thereof.
The purpose of the invention is to provide a phase shift mask that can be formed in a shorter takt time than when a mask provided with a phase-shift film having a transmittance of about 5% is used. A mask (300) comprises: a phase shift film (20) that has an exposure light (wavelength λ) transmittance of 35% and a square contact hole pattern (20a), and that is formed on a mask substrate; and a light-shielding film (30) that is formed on the phase shift film (20) and that has a polygonal aperture pattern (30a) for exposing the phase shift film (20). When the target diameter of a pattern formed using a projection optical system having a numerical aperture NA is 0.45 to 0.52 λ/NA, the length of one side of the contact hole pattern (20a) is 0.71 to 0.82 λ/NA, and the distance between one side of the contact hole pattern (20a) and one side of the polygonal aperture pattern (30a) is 0.48 to 0.64 λ/NA.
This microscope system comprises: a stage having a first surface provided with a holder for accommodating an object; an electron microscope for irradiating the object accommodated in the holder with an electron beam to acquire information on the object; a first vacuum formation part disposed so as to face the first surface of the stage and locally forming a first vacuum region on a part of the first surface; and a second vacuum formation part disposed so as to face a second surface of the stage and locally forming a second vacuum region on a part of the second surface on the opposite side of the first vacuum formation part across the stage. The electron microscope irradiates the object in the holder with the electron beam through the first vacuum region in a state where the first vacuum region and the second vacuum region are formed.
A spatial light modulation element (100) is provided with: an optical member (110) which is formed using a ferroelectric material having light transmissivity, and on which processing light traveling along a Z direction is incident as incident light; positive and negative electrodes (120, 125) that are disposed on a disposition surface (113) of the optical member (110) along an X direction; and wiring (positive lines (130) and ground lines (135)) that applies voltage to the positive electrodes (120) such that a potential difference is generated between the positive and negative electrodes (120, 125). When the potential difference has been generated between the positive and negative electrodes (120, 125), the refractive index in the optical member (110) changes along the X direction.
G02F 1/05 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the intensity, phase, polarisation or colour based on ceramics or electro-optical crystals, e.g. exhibiting Pockels or Kerr effect with ferro-electric properties
This optical device inspects a surface to be inspected, the surface having a riblet structure in which a plurality of convex sections lying in a first direction are provided in a second direction intersecting the first direction. The optical device comprises: a condensing optical system for projecting light from a light source onto an irradiation region on the surface to be inspected and condensing light reflected by the irradiation region; a light-receiving element for detecting the light condensed by the condensing optical system; and a light amount-modifying member capable of modifying a ratio between a light amount of first reflected light which is reflected by a section of the irradiation region where the convex sections are not provided and which is oriented toward the light-receiving element, and a light amount of second reflected light which is reflected by the convex sections in the irradiation region and oriented toward the light-receiving element.
This imaging control device comprises: an acquisition unit that acquires a positional relationship between a first object and a second object; and a control unit that controls imaging of at least one of the first object and the second object by an imaging device. The control unit controls the imaging by the imaging device when the positional relationship acquired by the acquisition unit satisfies a predetermined imaging condition.
Provided are an optical system, an optical device, and a method for manufacturing an optical system which achieve miniaturization, widen the angle of view, reduce distortion aberration, and ensure an amount of peripheral light. An optical system OL to be used in an optical device such as a camera 1 is configured from, in order from an object side, a front group GA, an aperture stop S, and a rear group GB. The rear group GB includes a focusing group Gf that moves along the optical axis during focusing, and an image-side group Gr that is fixed during focusing and arranged closer to the image surface side than the focusing group Gf. The optical system is configured to satisfy a condition according to a prescribed conditional expression.
G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
66.
ZOOM OPTICAL SYSTEM, OPTICAL APPARATUS AND IMAGING APPARATUS USING THE ZOOM OPTICAL SYSTEM, AND METHOD FOR MANUFACTURING THE ZOOM OPTICAL SYSTEM
A zoom optical system (ZL) comprises, in order from an object: a first lens group (G1) having a positive refractive power; a second lens group (G2) having a negative refractive power; a third lens group (G3) having a positive refractive power; and a subsequent lens group (GR), wherein upon zooming, a distance between the first lens group (G1) and the second lens group (G2) changes, a distance between the second lens group (G2) and the third lens group (G3) changes, and a distance between the third lens group (G3) and the subsequent lens group (GR) changes, the subsequent lens group (GR) comprises a focusing lens group that moves upon focusing, and the second lens group (G2) comprises a partial group that satisfies following conditional expressions, 1.40
G02B 15/173 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a first movable lens or lens group and a second movable lens or lens group, both in front of a fixed lens or lens group having an additional fixed front lens or group of lenses arranged + – +
G02B 9/14 - Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or – having three components only arranged + – +
G02B 15/14 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
G02B 27/64 - Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
The purpose of the present invention is to suppress the occurrence of stray light in an exposure device. A spatial light modulation unit (CHP) of an exposure device comprises: a modulation unit (10) that has a plurality of mirrors arranged two-dimensionally; a spatial light modulator that includes a frame (CFL) surrounding the modulation unit, and a substrate (SB) on which the modulation unit (10) and the frame (FRM) are mounted; and a cover (CVR) that is positioned on a side of the spatial light modulator where light impinges on the modulation unit, the cover (CVR) being attached to the spatial light modulator and restricting incidence of light on the frame. The cover (CVR) has an opening (OPN1). Light impinges on the modulation unit (10) via the opening (OPN1).
A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; and a measurement apparatus that measures a position of an irradiation area, which is formed on the surface of the object by the light irradiation apparatus, relative to the object.
A measurement condition that enables accurate shape measurement can be set easily. An image analysis device includes an image analyzer 83 configured to detect, in a case of capturing an image of light projected onto an object to be measured, an improper image for shape measurement of the object to be measured, on the basis of design information on the object to be measured, and a measurement condition, and an output unit 88 configured to output detection result information that is information based on a detection result of the image analyzer 83.
G01B 11/24 - Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
G01B 11/14 - Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
G01B 11/25 - Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. moiré fringes, on the object
70.
MICROSCOPE, IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD, AND IMAGE PROCESSING PROGRAM
A first three-dimensional point spread function based on optical system in first state is different from second three-dimensional point spread function based on optical system in second state. A generator that generates image group including first image of first focal plane acquired through optical system in first state and second image of second focal plane acquired through optical system in second state, and estimator that estimates respective structures of plurality of planes including first estimated sample plane, on basis of image group, and first three-dimensional point spread function and second three-dimensional point spread function, and outputs estimated image. The estimator i) outputs image obtained by weighting and integrating respective estimated structures of planes. The estimator ii) outputs, image obtained by weighting first three-dimensional point spread function and second three-dimensional point spread function differently in optical axis direction, then estimating structures, and integrating estimated structures in state of weighting of 1.
An image sensor includes a plurality of pixels each including: a first and a second photoelectric conversion unit that perform photoelectric conversion upon light that has passed through a micro lens and generates a charge; a first accumulation unit that accumulates the charge generated by the first conversion unit; a second accumulation unit that accumulates the charge generated by the second conversion unit; a third accumulation unit that accumulates the charges generated by the first and second conversion units; a first transfer unit that transfers the charge generated by the first conversion unit to the first accumulation unit; a second transfer unit that transfers the charge generated by the second onversion unit to the second accumulation unit; and a third transfer unit that transfers the charges generated by the first and second conversion units to the third accumulation unit.
H04N 23/67 - Focus control based on electronic image sensor signals
H04N 25/771 - Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising storage means other than floating diffusion
72.
PROCESSING APPARATUS, PROCESSING METHOD, MARKING METHOD, BUILD METHOD, COMPUTER PROGRAM AND RECORDING MEDIUM
A processing apparatus and a build apparatus including an energy beam irradiation part that irradiates a surface of an object with an energy beam to form a melt pool on the surface and a material supply part that supplies build materials to the melt pool; and a change apparatus that changes a positional relationship between the object and the melt pool, wherein the processing apparatus changes a size of a build object, which is built along a first direction by supplying the build materials to the melt pool while changing a positional relationship in the first direction between the object and the melt pool, in a second direction, which intersects with the first direction, on the basis of a position of the build object in the first direction.
Provided is a robot device comprising: a robot hand to which a plurality of finger parts are provided; an arm part that drives the robot hand; a plurality of gripping parts that follow the plurality of finger parts and can grip an object; at least one identification part on at least one of the plurality of gripping parts; and a control unit that uses position information regarding the identification part and drives the robot hand via the arm part to position the plurality of gripping parts with respect to the object. Thus, positional alignment of the object and the robot hand can be efficiently performed.
This defect inspection device includes: an illumination unit that irradiates a sample with illumination light emitted from a light source; a detection unit that is disposed in an oblique direction with respect to the sample and detects scattered light generated from the sample; a pupil division mechanism that divides the pupil of the detection unit into a first detection angle and a second detection angle; a first photoelectric conversion unit that converts scattered light at the first detection angle detected by the detection unit into an electric signal; a second photoelectric conversion unit that converts scattered light at the second detection angle detected by the detection unit into an electric signal; and a signal processing unit that processes the electric signals converted by the first photoelectric conversion unit and the second photoelectric conversion unit to detect a defect in the sample. The pupil division mechanism divides the pupil such that the pupil allocation corresponds to the object being inspected or the inspection conditions.
A data generation method performs subtractive manufacturing by irradiating object with pulse energy beam and measures shape after; calculates information related to light penetration depth into object based on shape information before subtractive manufacturing and measured result of shape after subtractive manufacturing; calculates for each irradiation target position based on information related to an inclination at each irradiation target position of object that is irradiated with pulse energy beam with respect to an irradiation direction of the pulse energy beam and the information related to light penetration depth, a unit processing amount of object in a case where object is irradiated with pulse energy beam a unit number of times; and calculates, based on a target processing amount for each irradiation target position and the unit processing amount for each irradiation target position, a target number of times which each irradiation target position is irradiated with the pulse energy beam.
The present invention provides a defect inspecting device and defect inspecting method capable of reducing influence due to height variation of a sample surface and achieving high sensitivity. In order to achieve the above-mentioned purpose, this defect inspecting device includes: an illumination unit that irradiates a sample with light emitted from a light source; a detection unit that detects scattered light generated from the sample; a sample height detection unit that measures a variation amount of the sample in a direction perpendicular to a surface of the sample; a photoelectric conversion unit that converts the scattered light detected by the detection unit into an electric signal; and a signal processing unit that processes the electric signal converted by the photoelectric conversion unit to detect a defect of the sample. The detection unit has a mechanism for adjusting its position after divergence from an opening in accordance with the variation amount of the surface of the sample acquired by the sample height detection unit, and a mechanism for separately detecting scattered light, which has been generated from the sample after divergence from the opening, at a plurality of elevation angles for detection. The signal processing unit has a mechanism for correcting the positions of a plurality of images formed by divergence from the opening in accordance with the variation amount of the surface of the sample acquired by the sample height detection unit.
Disclosed is an organic semiconductor composition containing an organic semiconductor material and a thiophene solvent, wherein: the organic semiconductor material contains a compound having a thiophene ring; and the thiophene solvent contains thiophene as a main component. It is preferable that the organic semiconductor material has liquid crystallinity, and it is also preferable that the thiophene solvent is a non-halogen solvent.
A learning apparatus includes a processor that executes a program; and a storage device that stores the program, wherein the processor is configured to execute an acquisition process of acquiring an image data group, and correct data pertaining to sale of each piece of image data in the image data group; and a generation process of generating a learning model that predicts an ease of selling the image data on the basis of the image data group and the correct data acquired during the acquisition process.
A data generation method includes: generating, based on an input of an input apparatus, model data representing a three-dimensional shape of an object that is additively built on a placement apparatus by using a build head; generating, based on the model data, display data for displaying a three-dimensional model related to the object on a display apparatus; and generating, based on the model data, build data for additively building the object, the three-dimensional model related to the object includes a three-dimensional model of a build object before the additive building is completed, the display data includes interference information indicating an interference between the build head and at least one of the build object and the placement apparatus, when the re-input of the input apparatus is performed, the model data and the display data are re-generated based on the re-input, the interference information is updated based on the re-input.
This training device includes: a storage unit that stores a trained model that is trained to receive input of a training image and a training feature amount obtained by digitizing a predetermined interpretable feature related to a subject of the training image, and output a result of determination for the training image and the training feature amount; a determination unit that uses the trained model stored in the storage unit to output a result of determination for an explanation target image and a first feature amount obtained by digitizing a predetermined interpretable feature related to a subject of the explanation target image; and an explanation output unit that outputs the degree of contribution of the explanation target image and the degree of contribution of the first feature amount in relation to the result of determination for the explanation target image and the first feature amount by the trained model.
A bright-field reflection microscope according to the present embodiment includes an illumination optical system that includes an aperture pattern turret that can form a plurality of annular illumination lights having annulus radiuses different from each other and an objective lens and illuminates the sample S with the illumination light; a detection optical system that gathers a first reflected light from the sample S and a second reflected light from an interface of surroundings of the sample S at the capturing device via the objective lens; and a control unit, and the capturing device detects the first reflected light and the second reflected light at each of the plurality of positions with different relative positions to the objective lens and the sample S by using each of the plurality of annular illumination lights formed by the control unit controlling the aperture pattern turret.
A substrate stacking apparatus that stacks first and second substrates on each other, by forming a contact region where the first substrate held by a first holding section and the second substrate held by a second holding section contact each other, at one portion of the first and second substrates, and expanding the contact region from the one portion by releasing holding of the first substrate by the first holding section, wherein an amount of deformation occurring in a plurality of directions at least in the first substrate differs when the contact region expands, and the substrate stacking apparatus incudes a restricting section that restricts misalignment between the first and second substrates caused by a difference in the amount of deformation. In the substrate stacking apparatus above, the restricting section may restrict the misalignment such that an amount of the misalignment is less than or equal to a prescribed value.
H01L 23/544 - Marks applied to semiconductor devices, e.g. registration marks, test patterns
B23K 20/00 - Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
B23K 20/02 - Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating by means of a press
B23K 37/04 - Auxiliary devices or processes, not specially adapted for a procedure covered by only one of the other main groups of this subclass for holding or positioning work
B65H 31/34 - Apparatus for squaring-up piled articles
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01L 21/68 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for positioning, orientation or alignment
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
H01L 23/00 - Details of semiconductor or other solid state devices
An imaging element includes a first substrate provided with a photoelectric conversion portion that photoelectrically converts light and generates charge, and a readout circuit that outputs a signal based on the charge generated by the photoelectric conversion portion, a second substrate laminated on the first substrate and provided with a processing portion that processes the signal output from the readout circuit, and a connection portion provided with a bent portion bending in a portion other than the vicinity of the first substrate and the second substrate, and electrically connecting the readout circuit to the processing portion.
Provided is a control unit for controlling a mobile robot device comprising a mobile body and an arm unit provided on the mobile body. The control unit carries out control such that the mobile body moves in accordance with a reaction force generated by a driving force of the arm unit.
A camera accessory that is attachable to and detachable from a camera body, includes: a correction optical system that is movable in a direction intersecting an optical axis thereof, and a first communication unit that transmits to the camera body a first information regarding a position of the correction optical system and a second information regarding a vibration of the camera accessory.
H04N 23/68 - Control of cameras or camera modules for stable pick-up of the scene, e.g. compensating for camera body vibrations
H04N 23/661 - Transmitting camera control signals through networks, e.g. control via the Internet
H04N 23/663 - Remote control of cameras or camera parts, e.g. by remote control devices for controlling interchangeable camera parts based on electronic image sensor signals
Surface changes are estimated using multiple speckle interferograms acquired using beams incident at different angles. Beam irradiation conditions can be changed to increase signal to noise ratio with averaging, such as weighted averaging. Irradiation conditions can be varied with a tilt plate, a wedge, or by changing beam wavelengths.
An optical system (ZL(1)) comprises a plurality of lens groups including a first focusing lens group (G2) and a second focusing lens group (G4) that are disposed side by side on an optical axis, and the second focusing lens group (G4) is disposed at a position closer to an image surface than the first focusing lens group (G2). The first focusing lens group (G2) has positive refractive power, and moves toward an object along the optical axis from focusing on an infinite-distance object to focusing on a short-distance object. The second focusing lens group (G4) moves toward the image surface along the optical axis from focusing on the infinite-distance object to focusing on the short-distance object. The optical system (ZL(1)) satisfies the following conditional expression. −020<βF1/βF2<0.50 where βF1 is the lateral magnification of the first focusing lens group at the time of focusing on the infinite-distance object, and βF2 is the lateral magnification of the second focusing lens group at the time of focusing on the infinite-distance object.
G02B 15/22 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with movable lens means specially adapted for focusing at close distances
88.
METHOD AND DEVICE FOR MANUFACTURING STACKED SUBSTRATE
A manufacturing method is provided, which includes processing at least one of a plurality of substrates; stacking the plurality of substrates to manufacture a stacked substrate; and correcting, in the processing, a part of an amount of positional misalignment that is generated among a plurality of substrates in the stacking and correcting, in the stacking, at least a part of the remainder of the amount of positional misalignment.
H01L 23/00 - Details of semiconductor or other solid state devices
H01L 21/68 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for positioning, orientation or alignment
A sheet member 1 comprises: a top surface 111 including a first region 130 and a second region 140; a reverse surface 122; and a through hole 15 formed between the top surface and the reverse surface. The first region 130 is formed as at least a portion of a riblet structure RB and is the top surface of a protruding structure 13 protruding from the second region, and an opening 151 of the through hole 15 formed in the second region 140.
An attachment optical system (AL) for a microscope is detachably mounted between an objective lens (OL) that receives light from an object and converts the light into parallel light, and an imaging lens that forms an image with the light from the objective lens (OL). The attachment optical system has a first optical element (EL1) having negative refractive power and a second optical element (EL2) having positive refractive power.
NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSITY (Japan)
Inventor
Miyasaka Shou
Miki Yuichiro
Izumi Keita
Okuda Satoru
Abstract
A cell quality evaluation device comprising: a reception unit that receives a cell image; a contour extraction unit that extracts the contour of a cell included in the cell image received by the reception unit; a force information derivation unit that derives force information for the cell on the basis of the contour of the cell extracted by the contour extraction unit; a shape information derivation unit that derives shape information for the cell on the basis of the contour of the cell extracted by the contour extraction unit; and a quality evaluation unit that evaluates the quality of the cell on the basis of the shape information for the cell derived by the shape information derivation unit and the force information for the cell derived by the force information derivation unit.
A lens barrel includes a lens holding frame that holds a lens, a drive source, a lead screw that has a first thread groove formed thereon and is rotationally driven by the drive source, a ring-shaped member that has a groove on an inner periphery thereof, the groove being in contact with the first thread groove, a movement member that is connected to the lens holding frame, rotatably holds the ring-shaped member, and moves in an axial direction of the lead screw as the lead screw rotates, and a biasing portion that biases the ring-shaped member toward the lead screw in a direction orthogonal to the axial direction of the lead screw.
G02B 7/08 - Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification adapted to co-operate with a remote control mechanism
In a first aspect of the present invention, there is provided a substrate correction device which includes: an acquisition unit which acquires first information based on positional information of a plurality of alignment marks on a substrate, the alignment marks being measured externally; a stage which holds the substrate; a correction unit which corrects a misalignment between the substrate held by the stage, and another substrate to be bonded to the substrate; and a control unit which controls the correction unit based on the first information.
H01L 21/68 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for positioning, orientation or alignment
H01L 21/18 - Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
H01L 21/67 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
H01L 21/78 - Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
H01L 23/544 - Marks applied to semiconductor devices, e.g. registration marks, test patterns
94.
ZOOM OPTICAL SYSTEM, OPTICAL APPARATUS AND METHOD FOR MANUFACTURING THE ZOOM OPTICAL SYSTEM
A zoom optical system (ZL) comprises a first negative lens group (G2) having a negative refractive power; and a second negative lens group (G4) disposed closer to an image than the first negative lens group (G2), wherein a distance between the first negative lens group (G2) and the second negative lens group (G4) changes during zooming, at least part of the first negative lens group (G2) is movable so as to have a displacement component in a direction perpendicular to an optical axis, at least part of the second negative lens group (G4) is movable along the optical axis during focusing, and the following conditional expression,
A zoom optical system (ZL) comprises a first negative lens group (G2) having a negative refractive power; and a second negative lens group (G4) disposed closer to an image than the first negative lens group (G2), wherein a distance between the first negative lens group (G2) and the second negative lens group (G4) changes during zooming, at least part of the first negative lens group (G2) is movable so as to have a displacement component in a direction perpendicular to an optical axis, at least part of the second negative lens group (G4) is movable along the optical axis during focusing, and the following conditional expression,
0.50
G02B 15/20 - Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having an additional movable lens or lens group for varying the objective focal length
G02B 13/18 - Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
G02B 27/64 - Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
95.
FILM FORMING APPARATUS INCLUDING A SPRAYER PORT AND EXHAUST PORT ON A SUPPLY PIPE
A film forming apparatus, a substrate processing apparatus, and a device manufacturing method are provided, which improve the film thickness uniformity of a thin film that is formed on a substrate by spraying a thin film material. The film forming apparatus which forms a thin film on a substrate is provided with a nozzle that sprays a thin film material and an exhaust unit that discharges a gas. An exhaust port of the exhaust unit is arranged on a side that is opposite to the direction in which the gravity acts with respect to the substrate. The substrate processing apparatus performs a predetermined process on the substrate using the film forming apparatus. The device manufacturing method manufactures a device using the film forming apparatus.
H10K 71/00 - Manufacture or treatment specially adapted for the organic devices covered by this subclass
B05B 7/08 - Spray pistolsApparatus for discharge with separate outlet orifices, e.g. to form parallel jets, to form intersecting jets
B05B 13/02 - Means for supporting workArrangement or mounting of spray headsAdaptation or arrangement of means for feeding work
B05B 13/04 - Means for supporting workArrangement or mounting of spray headsAdaptation or arrangement of means for feeding work the spray heads being moved during operation
B05B 17/06 - Apparatus for spraying or atomising liquids or other fluent materials, not covered by any other group of this subclass operating with special methods using ultrasonic vibrations
B05D 1/02 - Processes for applying liquids or other fluent materials performed by spraying
B05D 3/06 - Pretreatment of surfaces to which liquids or other fluent materials are to be appliedAfter-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
B05D 3/10 - Pretreatment of surfaces to which liquids or other fluent materials are to be appliedAfter-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
C23C 24/08 - Coating starting from inorganic powder by application of heat or pressure and heat
A film-like sheet member 1 having a riblet structure RB formed on a surface 130 thereof, said sheet member being provided with a first surface 131, a second surface 132, and a third surface 133 positioned between the first surface and the second surface, and being configured in a manner such that: a plurality of first convex structures 191 which extend in a first direction in which the first to third surfaces are arranged and protrude in a second direction which intersects the first direction are formed on the first and second surfaces as a part of the riblet structure so as to be aligned in a third direction, which intersects the first and second directions; and the third surface is concave with respect to the first and second surfaces.
This mold for molding a sheet member comprises a molding surface with which a material of the sheet member comes into contact. A plurality of recessed structural bodies extending in a first direction are formed on the molding surface so as to be aligned along a second direction intersecting the first direction. At least one of a corner section of a first recessed structural body from among the plurality of recessed structural bodies and a boundary section of the first structural body and a second recessed structural body from among the plurality of recessed structural bodies that is adjacent thereto in the second direction includes a curved surface. If the curvature radius of the curved surface is denoted as R, the pitch of the plurality of recessed structural bodies is denoted as P, and the depth of the plurality of recessed structural bodies from the molding surface is denoted as H, the mold satisfies a first condition of "1 µm < R < 7 µm", and satisfies at least one of a second condition of "5 µm < P < 200 µm" and a third condition of "2.5µm < H < 100 µm".
A sample observation device (1) according to the present invention comprises: an illumination optical system (11) that irradiates a sample with illumination light through an objective lens (OBL); a reflection member (14) that is disposed opposite the objective lens (OBL) and reflects light; an image-formation optical system (IL) that forms an image of light received by the objective lens (OBL); an image capturing element (15) that captures the image formed by the image-formation optical system (IL); and an image processing unit (P) that performs image processing for enhancing the contrast of the image captured by the image capturing element (15).
An image-formation lens (IL) is for a microscope and forms an image of light from an objective lens. The image-formation lens comprises, in order from the object side, a first lens group (G1) that has a positive refractive power, and a second lens group (G2) that is disposed on the image side of the first lens group and that has a negative refractive power. The second lens group includes a meniscus-shaped lens component that has a concave surface on the object side, and satisfies the following conditional formula. 0.20≤BF/D≤ 0.25, where BF represents the back focus of the image-formation lens (IL), and D represents the distance along the optical axis between the image surface and the lens surface located farthest on the object side in the image-formation lens (IL).
The present invention provides a method for manufacturing a GaN light emitting element having adjustable directional characteristics. The method comprises: a step in which an n-type GaN layer (12), an MQW layer (14), and a p-type GaN layer (16) are epitaxially grown in sequence on a sapphire substrate (10) so as to form an epitaxial structure; a step in which a p-type electrode, a metal reflective film, a metal substrate, and a support substrate are formed on the p-type GaN layer (16); a step in which the epitaxial structure is inverted vertically; a step in which the sapphire substrate (10) is separated so as to expose the n-type GaN layer (12) in the surface; a step in which the n-type GaN layer (12) exposed in the surface is etched so as to adjust a resonator length between the surface of the metal reflective film and the surface of the n-type GaN layer (12); and a step in which an n-electrode (24) is formed.