Cozai Ltd

Israel

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2023 2
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IPC Class
G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM] 3
G01N 21/64 - FluorescencePhosphorescence 2
G01N 23/2273 - Measuring photoelectron spectra, e.g. electron spectroscopy for chemical analysis [ESCA] or X-ray photoelectron spectroscopy [XPS] 2
G01R 31/307 - Contactless testing using electron beams of integrated circuits 2
G01N 23/22 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material 1
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Found results for  patents

1.

Electron spectroscopy based techniques for determining various chemical and electrical characteristics of samples

      
Application Number 18002848
Grant Number 12326410
Status In Force
Filing Date 2021-06-28
First Publication Date 2023-09-14
Grant Date 2025-06-10
Owner COZAI LTD (Israel)
Inventor Cohen, Hagai

Abstract

A measurement system and method are presented for measuring one or more parameters of a sample. The measurement system comprises an excitation system and a detection system. The excitation system is configured to generate combined exciting radiation comprising one- or multi-parameter modulation of multiple exciting signals of different types to be applied to at least a portion of a sample under measurements to thereby induce electron emission response of said at least portion of the sample to said combined exciting radiation. The detection system is configured for detecting the electron emission response of the at least portion of the sample and generating measured data indicative of a modulated change of an electrical state of the at least portion of the sample, thereby enabling determination of one or more parameters of the sample from the measured data.

IPC Classes  ?

  • G01N 23/22 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material
  • G01N 21/64 - FluorescencePhosphorescence
  • G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
  • G01N 23/2273 - Measuring photoelectron spectra, e.g. electron spectroscopy for chemical analysis [ESCA] or X-ray photoelectron spectroscopy [XPS]
  • G01R 31/30 - Marginal testing, e.g. by varying supply voltage
  • G01R 31/307 - Contactless testing using electron beams of integrated circuits

2.

Work function measurements for surface analysis

      
Application Number 18002937
Grant Number 12480897
Status In Force
Filing Date 2021-06-28
First Publication Date 2023-08-03
Grant Date 2025-11-25
Owner COZAI LTD (Israel)
Inventor Cohen, Hagai

Abstract

A measurement system includes: an excitation system; a detector; and a control unit. The excitation system includes excitation sources generating excitations of different types comprising: a high energy electromagnetic radiation source; at least one electric power supply providing a bias voltage to a sample; and at least one electron beam source generating relatively low energy e-radiation in the form of an electron beam. The excitation system includes first and second sequentially performed measurement modes, for respectively, exciting the sample by the high energy radiation to induce a first-mode secondary electron emission spectral response, and supplying initial bias voltage to the sample and exciting the sample with the e-radiation followed by a gradual variation of the bias voltage from said initial bias voltage to induce a second-mode electric current variations in the sample. The detector detects said first-mode secondary electron emission spectral response and generates first-mode measured data, and monitors the electric current through the sample and generates second-mode measured data indicative of sample current readout.

IPC Classes  ?

  • G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
  • G01N 21/64 - FluorescencePhosphorescence
  • G01N 23/2273 - Measuring photoelectron spectra, e.g. electron spectroscopy for chemical analysis [ESCA] or X-ray photoelectron spectroscopy [XPS]
  • G01R 31/307 - Contactless testing using electron beams of integrated circuits

3.

ELECTRON SPECTROSCOPY BASED TECHNIQUES FOR DETERMINING VARIOUS CHEMICAL AND ELECTRICAL CHARACTERISTICS OF SAMPLES

      
Application Number IL2021050790
Publication Number 2022/003677
Status In Force
Filing Date 2021-06-28
Publication Date 2022-01-06
Owner COZAI LTD (Israel)
Inventor Cohen, Hagai

Abstract

A measurement system and method are presented for measuring one or more parameters of a sample. The measurement system comprises an excitation system and a detection system. The excitation system is configured to generate combined exciting radiation comprising one- or multi-parameter modulation of multiple exciting signals of different types to be applied to at least a portion of a sample under measurements to thereby induce electron emission response of said at least portion of the sample to said combined exciting radiation. The detection system is configured for detecting the electron emission response of the at least portion of the sample and generating measured data indicative of a modulated change of an electrical state of the at least portion of the sample, thereby enabling determination of one or more parameters of the sample from the measured data.

IPC Classes  ?

  • H01J 37/073 - Electron guns using field emission, photo emission, or secondary emission electron sources
  • H01J 37/244 - DetectorsAssociated components or circuits therefor
  • G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]

4.

WORK FUNCTION MEASUREMENTS FOR SURFACE ANALYSIS

      
Application Number IL2021050791
Publication Number 2022/003678
Status In Force
Filing Date 2021-06-28
Publication Date 2022-01-06
Owner COZAI LTD (Israel)
Inventor Cohen, Hagai

Abstract

A measurement system includes: an excitation system; a detector; and a control unit. The excitation system includes excitation sources generating excitations of different types comprising: a high energy electromagnetic radiation source; at least one electric power supply providing a bias voltage to a sample; and at least one electron beam source generating relatively low energy e-radiation in the form of an electron beam. The excitation system includes first and second sequentially performed measurement modes, for respectively, exciting the sample by the high energy radiation to induce a first-mode secondary electron emission spectral response, and supplying initial bias voltage to the sample and exciting the sample with the e -radiation followed by a gradual variation of the bias voltage from said initial bias voltage to induce a second-mode electric current variations in the sample. The detector detects said first-mode secondary electron emission spectral response and generates first-mode measured data, and monitors the electric current through the sample and generates second-mode measured data indicative of sample current readout.

IPC Classes  ?

  • G01N 27/60 - Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrostatic variables