A method of determining at least one layout for imaging at least one relief precursor, comprising: receiving image job data for at least one image job comprising at least two raster image files having at least two different resolutions and/or at least two different quality settings requiring different imaging modes; and determining, using processing means, at least one layout including the image job data for imaging at least one mask layer of the at least one relief precursor, taking into account a total amount of imaging time required to image the at least one mask layer.
A method for imaging a mask layer includes reading imaging data for a sequence of at least (C1+C2) pixels, at a first moment, using a group of C1 first imaging beams for imaging substantially simultaneously a first group of C1 pixels of said sequence in accordance with the imaging data, at a second moment, using a group of C2 second imaging beams for imaging substantially simultaneously a second group of C2 pixels of said sequence in accordance with the imaging data, repeating the reading of imaging data, the using of a group of C1 first imaging beams for imaging at a first moment, and the using of a group of C2 second imaging beams for imaging at a second moment for a next sequence of at least (C1+C2) pixels.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
A method for imaging a mask layer includes providing a mask layer, receiving an image file and detecting at least one solid area and at least one halftone area in the image file, imaging an area of the mask layer corresponding to the at least one solid area, using a first imaging setting, wherein prior to or during the imaging a sampling pattern is superimposed on pixels of the at least one solid area, so that only a portion of the pixels of the at least one solid area is imaged, and imaging an area of the mask layer corresponding to said at least one halftone area, using a second imaging setting which is different from the first imaging setting.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
H04N 1/405 - Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels
4.
APPARATUS AND METHOD FOR EXPOSURE OF RELIEF PRECURSORS
An apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.
A method for imaging a mask layer includes reading imaging data for a sequence of at least (C1+C2) pixels, at a first moment, using a group of C1 first imaging beams for imaging substantially simultaneously a first group of C1 pixels of said sequence in accordance with the imaging data, at a second moment, using a group of C2 second imaging beams for imaging substantially simultaneously a second group of C2 pixels of said sequence in accordance with the imaging data, repeating the reading of imaging data, the using of a group of C1 first imaging beams for imaging at a first moment, and the using of a group of C2 second imaging beams for imaging at a second moment for a next sequence of at least (C1+C2) pixels.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
Method for preparing a relief plate and printing with said relief plate on a substrate, such as a corrugated board, comprising the steps: providing a mask layer; obtaining a halftone raster image file comprising imaging pixels and non-imaging pixels at a first resolution R1; wherein a first pitch P1 corresponds to the first resolution R1; imaging the mask layer in accordance with the halftone raster image file and such that imaged spots have a largest dimension smaller than (√2 * P1); preparing a relief plate using the imaged mask layer; transferring ink to the relief plate using an anilox roller; and transferring said ink from the relief plate onto a substrate; wherein the first resolution R1 is smaller than 2000 dpi; wherein the anilox roller has a volume density which is larger than or equal to 5 cm3/m2.
B41M 1/00 - Inking and printing with a printer's forme
B41F 1/00 - Platen presses, i.e. presses in which printing is effected by at least one essentially-flat pressure-applying member co-operating with a flat type-bed
An apparatus for treating a relief precursor with a liquid includes a housing, a conveying mechanism for transporting the relief precursor along a support plane in a transport direction through the housing, and a treatment section for treating the relief precursor with a liquid. The treatment section includes a plurality of brushes arranged in the housing for treating the relief precursor, the plurality of brushes including at least a first brush and a second brush downstream of the first brush and having a rotating axis with bristles. A squeeze element squeezes the bristles of the second brush and extends over a radial distance into the bristles of the second brush. The radial distance is at least 15% of the length of the bristles.
A method of analysing data from a relief plate production system (10) comprising at least one, preferably at least two production units (20) for treating a relief plate precursor to obtain a relief plate, and a computing means (30), the method comprising at said computing means (30) the steps of receiving from the at least one production unit (20) data comprising a plate identifier of the relief plate and information relative to the treatment performed on the relief plate precursor by the respective production unit (20); analysing the received data and creating a relief plate report (40) based on the analysed data.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
9.
Exposure unit with improved light intensity uniformness for exposing a relief plate precursor
An exposure unit for exposing a relief plate precursor includes a support structure with a support surface configured for supporting a relief plate precursor, and a plurality of UV light sources arranged next to each other and configured to emit UV light to a side of the relief plate precursor. The plurality of UV light sources cover a light source area parallel to the support surface. A light adjustment structure is configured to block and/or reflect a portion of the light emitted by the plurality of UV light sources so as to render a light intensity measured in the support surface more uniform as compared to a situation without the light adjustment structure. The light adjustment structure is arranged at least partially between the light source area and the support surface.
A method of preparing image job data for imaging a mask layer includes receiving at least one raster image file, preparing image job data for imaging the mask layer, the preparing comprising: including data relative to the at least one raster image file in the image job data so as to image at least one corresponding image area of the mask layer; determining a non-functional area of the mask layer outside of the at least one corresponding image area; and including filling imaging data in said image job data for imaging said non-functional area.
A system for moving a flexible plate, in particular a printing plate or a printing plate precursor, over a support surface in the direction of a treatment station includes a support for supporting the plate on a support surface thereof. An articulated operating arm extends substantially parallel to the support surface and comprising a first segment and a second segment. The first segment has a first end which is rotatably connected to said second segment around a first rotation axis substantially perpendicular to the support surface, and a second end provided with a plate engagement means to contact the plate. The second segment is rotatable around a second rotation axis substantially perpendicular to the support surface. A control means controls the rotation of the first and second segments such that the plate is slid over the support in the direction of the treatment station.
B65H 9/10 - Pusher or like movable registersPusher or gripper devices which move articles into registered position
B65H 7/10 - Controlling article feeding, separating, pile-advancing, or associated apparatus, to take account of incorrect feeding, absence of articles, or presence of faulty articles by feelers or detectors responsive to presence of faulty articles or incorrect separation or feed responsive to incorrect side register
An apparatus for aligning an edge, such as a leading edge of a plate, in particular a printing plate or a printing plate precursor. The apparatus includes a support configured for supporting the plate on a support surface, and to be located upstream of a treatment station. At least two movable elements are arranged to be moved by an edge, such as a leading edge, of the plate. The at least two movable elements include a first and a second movable element; a detection means configured to detect a first and second measure representative for a first and second position of the first and second movable element, respectively, at least one controllable component configured to perform an action on the plate, and a control means configured to control the at least one controllable component based on the first and second measure.
B25J 9/04 - Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian co-ordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical co-ordinate type or polar co-ordinate type
B25J 13/08 - Controls for manipulators by means of sensing devices, e.g. viewing or touching devices
B25J 15/06 - Gripping heads with vacuum or magnetic holding means
B41F 27/12 - Devices for attaching printing elements or formes to supports for attaching flexible printing formes
B41N 3/00 - Preparing for use or conserving printing surfaces
B65G 49/06 - Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
13.
A METHOD OF CONTROLLING A RELIEF PLATE PRODUCTION SYSTEM COMPRISING A PLURALITY OF PRODUCTION UNITS, AND ASSOCIATED RELIEF PLATE PRODUCTION SYSTEM
A method of controlling a relief plate production system (10) comprising a plurality of production units, the method comprising the steps of: each of the plurality of production units (100, 100', 200) receiving a job instruction from a central control means (50) and storing said job instruction in a list of job instructions, said job instruction including at least an identifier of a relief plate (14) to be produced from a relief precursor (12); after the plurality of production units have received the job instruction, one production unit of the plurality of production units receiving a relief precursor (12) and an indication of the identifier of this relief precursor (12) and treating the relief precursor (12) in accordance with the received job instruction.
G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
B41N 1/06 - Printing plates or foilsMaterials therefor metallic for relief printing or intaglio printing
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
14.
APPARATUS AND METHOD FOR TREATING AND TRANSPORTING A RELIEF PRINTING PLATE PRECURSOR
An apparatus for preparing a relief plate precursor, such as a printing plate precursor, that has to be treated. The apparatus includes a transport bar provided with at least one penetration element, preferably a plurality of penetration elements; and a plate coupling station configured for coupling a relief plate precursor to the transport bar by causing a penetration by the at least one penetration element through an unperforated area near an edge of a relief plate precursor.
A system for moving a flexible plate, in particular a printing plate or a printing plate precursor, over a support surface in the direction of a treatment station, such as a washer station. The system includes a support configured for supporting the plate on a support surface thereof, and intended to be located upstream of the treatment station. A movement means includes a plate engagement means configured to contact the plate in such a way that the plate is engaged by adhesion or by friction or a combination thereof, in a movement mode, and that the plate can be slid over the support surface by controlling the movement means in the movement mode. A control means is configured to control the movement means such that the plate is slid over the support in the direction of the treatment station.
B41F 27/12 - Devices for attaching printing elements or formes to supports for attaching flexible printing formes
B41N 3/00 - Preparing for use or conserving printing surfaces
B25J 15/06 - Gripping heads with vacuum or magnetic holding means
B65G 49/06 - Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
16.
METHOD AND SYSTEM TO DETERMINE AN EXPOSURE TIME AND/OR INTENSITY TO BE USED FOR OBTAINING A DESIRED FEATURE OF A RELIEF STRUCTURE
A method to determine an exposure time and/or intensity to be used for obtaining a desired feature of a relief structure, in particular a desired floor thickness, includes exposing a first side of a relief precursor with electromagnetic radiation, where the exposure is done in an area having a first position A and a second position B and is performed such that for a plurality of points between said first and second positions A, B the values for the exposure time and the exposure intensity are known, wherein the exposure time and/or the exposure intensity are automatically controlled to be varied at said plurality of points; determining one or more points of said plurality of points representative for the desired feature; and determining the required exposure time and/or exposure intensity for the desired feature based on the determined one or more points and the known values.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
17.
METHOD, CONTROL MODULE AND SYSTEM FOR IMAGING A MASK LAYER
A method for imaging a mask layer, comprising the steps: provision of a mask layer; receiving an image file comprising imaging pixels and non-imaging pixels at a first resolution R1; based on the image file, generating a modified image file comprising reduced-resolution imaging pixels and 5 reduced-resolution non-imaging pixels at a second resolution R2 lower than the first resolution R1, wherein a second pitch P2 corresponds to the second resolution R2; based on the modified image file, imaging the mask layer such that imaged spots have a largest dimension smaller than (√2 * P2), preferably smaller than P2.
A method for processing a raster image file includes: receiving a raster image file comprising image data for a plurality of pixels, analyzing the image data of the raster image file, determining control data, and optionally at least one new raster image file, based on the analyzed image data, said control data being data for controlling settings of an imaging device so as to change the physical properties of generated imaged features corresponding with one or more of the plurality of pixels, and outputting the raster image file and/or the new raster image file, with the control data to an imaging device for imaging a relief precursor.
A method for imaging a mask layer, comprising the steps: reading imaging data for a sequence of at least (C1+C2) pixels, at a first moment, using a group of C1 first imaging beams for imaging substantially simultaneously a first group of C1 pixels of said sequence in accordance with the imaging data, at a second moment, using a group of C2 second imaging beams for imaging substantially simultaneously a second group of C2 pixels of said sequence in accordance with the imaging data, repeating the reading of imaging data, the using of a group of C1 first imaging beams for imaging at a first moment, and the using of a group of C2 second imaging beams for imaging at a second moment for a next sequence of at least (C1+C2) pixels.
A method for imaging a mask layer (12), comprising the steps: provision of a mask layer (12), receiving an image file (18) and detecting at least one solid area (20) and at least one halftone area (22) in the image file (18); imaging an area (32) of the mask layer (12) corresponding to said at least one solid area (20), using a first imaging setting, wherein prior to or during the imaging a sampling pattern (44) is superimposed on pixels (24) of the at least one solid area, so that only a portion of the pixels (24) of the at least one solid area is imaged; and imaging an area (34) of the mask layer (12) corresponding to said at least one halftone area (22), using a second imaging setting which is different from the first imaging setting.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
H04N 1/405 - Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels
21.
Apparatus and method for exposure or relief precursors
An apparatus for exposure of a relief precursor having a first side and an opposite second side includes a light source to expose the relief precursor during relative movement between the light source and the relief plate precursor; a moving means to cause a first relative movement between the light source and the relief precursor to expose the first side of the relief precursor, to cause a second relative movement between the light source and the relief precursor to expose the second side of the relief precursor, and to move the light source between a first position and a second position. The first and second positions are on opposite sides of a plane of the relief precursor. At least one of the first and the second relative movement is a reciprocating movement.
An apparatus for treating a relief precursor such as a printing plate precursor, with a liquid includes a treatment compartment with treatment means configured to treat a relief plate precursor with a liquid and to remove pieces from the relief precursor, and a liquid collection system configured to receive liquid and removed pieces from the treatment means. The liquid collection system is configured to separate pieces having dimensions larger than predefined minimum dimensions from the liquid and to allow at least some of said pieces to be dissolved at least partially in the liquid at least when the liquid is in a static state after or before a treatment of the relief precursor with the treatment means.
A method to control the solid content of a development liquid (L) in a washer configured to develop an exposed relief precursor using the development liquid (L), said method comprising the steps: determining of a value representative for an amount of material to be removed from a relief precursor during development in the washer; and based on the determined value, controlling an amount of fresh development liquid to be added to the development liquid (L) in the washer and/or an amount of used development liquid to be removed from the washer.
An apparatus for treating a relief plate precursor, such as a printing plate precursor, with a liquid, includes a treatment compartment for treating the relief plate precursor with a liquid, and a transport system for use with one or more transport bars. A transport bar thereof is configured to be coupled to a relief plate precursor. The transport system is configured to move the transport bar with the coupled relief plate precursor through the treatment compartment. The transport bar is provided with a coupling portion configured to couple the transport bar to the transport system. A protection system is configured to guide and evacuate liquid such that the transport system is protected against wetting with the liquid of the treatment compartment.
B65G 49/04 - Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction
Apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.
An apparatus for treating a relief precursor (P) with a liquid, comprising: a housing (10); a conveying mechanism (50) configured for transporting the relief precursor along a support plane in a transport direction (T) through the housing (10); a treatment section (30) for treating the relief precursor with a liquid, said treatment section (30) comprising a plurality of brushes arranged in the housing for treating the relief precursor, wherein said plurality of brushes comprises at least a first brush (31) and a second brush (32) arranged downstream of the first brush and having a rotating axis with bristles; a squeeze element (35) arranged to squeeze the bristles of the second brush; wherein the squeeze element extends over a radial distance (d) into the bristles of the second brush, said radial distance being at least 15% of the length (L) of the bristles.
A punching station for arranging one or more penetration elements in or through an edge portion of a relief plate precursor or for arranging one or more perforations in the edge portion. The punching station includes a punching means comprising one or more penetration elements or perforating elements, the punching means configured for arranging the one or more penetration elements or perforating elements through or in an edge portion of the relief plate precursor. An abutment means is aligned with the punching means and configured for forming an abutment for the edge of the relief plate precursor. A detection means is configured to detect at two or more locations along the abutment means whether the edge portion of the relief plate precursor is correctly positioned against the abutment means. A signalling means is configured to communicate a signal in function of the detection by the detection means.
B26D 5/32 - Arrangements for operating and controlling machines or devices for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting with interrelated action between the cutting member and work feed having the cutting member controlled by scanning a record carrier with the record carrier formed by the work itself
B26D 5/34 - Arrangements for operating and controlling machines or devices for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting with interrelated action between the cutting member and work feed having the cutting member controlled by scanning a record carrier scanning being effected by a photosensitive device
2. The LED array includes a plurality of subsets of one or more LEDs, each subset being individually controllable. The apparatus also includes a control unit to control the plurality of subsets individually, and such that an irradiation intensity difference in the predetermined surface area is within a predetermined range.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
29.
Method and apparatus for writing imageable material using multiple beams
A method for writing an imageable material using multiple beams includes preparing subsequent patterns each having Y rows of N pixel locations, said subsequent patterns including first and second patterns; where the first and the second pattern overlap with each other in an overlap area consisting of O columns and Y rows of pixel locations; selecting for each row i of said first pattern Mi1 pixel locations; selecting for each row i of said second pattern Mi2 pixel locations; writing simultaneously, for each row i, said Mi1 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; and moving said N beams relative to said imageable material in a slow scan direction over (N-O) pixel locations; writing simultaneously, for each row i, said Mi2 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material.
B41J 2/455 - Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources using laser arrays
B41C 1/10 - Forme preparation for lithographic printingMaster sheets for transferring a lithographic image to the forme
G03G 15/043 - Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material with means for controlling illumination or exposure
30.
Method and system for applying a pattern on a mask layer
A method for applying a pattern on a mask layer includes obtaining an image file representing pixels with a first pixel size in a first direction parallel to an edge of the pixel, and a second pixel size in a second direction perpendicular to the first direction, where the first and second pixel size are the same or different, treating the mask layer such that a plurality of areas with altered physical properties are created in the mask layer, the plurality of areas corresponding to a plurality of pixels of the image file, where the treatment is done such that a first and/or a second area size of an area of said plurality of areas, seen in said first and/or said second direction, is smaller than the first and/or second pixel size, respectively.
An apparatus for treating a relief precursor having a back side and a relief side. The apparatus includes a housing, a treating means for treating the relief precursor with at least one liquid, a removal means for removing debris and/or liquid from the relief precursor, the removal means arranged downstream of the treating means, and a conveying mechanism configured for transporting the relief precursor in a transport direction through the housing. The removal means includes a liquid removal and guidance body mounted for removing liquid from the back side of the relief precursor. The conveying mechanism is configured for pulling the relief precursor over and against said liquid removal and guidance body whilst the relief precursor is moved in the transport direction, such that in operation liquid is removed from the back side.
An apparatus for generating a relief carrier using a solidifiable material includes a support structure configured for providing a substantially cylindrical support surface. The support surface may be formed by a substrate intended to be part of the relief carrier to be generated or by a cylindrical support not intended to be part of the relief carrier to be generated. A container is provided for the solidifiable material, the container having a wall arranged substantially parallel to an axis of the support structure; a moving means to move the support structure relative to the wall such that subsequent areas of the support surface face the wall during the moving. Moving includes at least a rotation around the axis. An irradiating means sends irradiation, through the wall in a predetermined area between the support surface and the wall.
B29C 64/124 - Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
B29C 64/236 - Driving means for motion in a direction within the plane of a layer
An apparatus for preparing a relief plate precursor, such as a printing plate precursor, that has to be treated. The apparatus includes a transport bar provided with at least one penetration element, preferably a plurality of penetration elements; and a plate coupling station configured for coupling a relief plate precursor to the transport bar by causing a penetration by the at least one penetration element through an unperforated area near an edge of a relief plate precursor.
An apparatus for treating a relief plate precursor, such as a printing plate precursor, preferably with a liquid. The apparatus includes a transport system with at least one, preferably at least two transport bars; a plate coupling station configured for coupling a relief plate precursor to the transport bar; a treatment compartment configured for treating the relief plate precursor; and a plate decoupling station configured for decoupling the treated relief plate precursor from the transport bar. The transport system is configured to automatically move each transport bar, after being coupled to a relief plate precursor in the plate coupling station, from the plate coupling station through the treatment station to the plate decoupling station, and, after being decoupled from a treated relief plate precursor, from the plate decoupling station back to the plate coupling station, such that the transport bar moves in a closed loop through the apparatus.
A flexographic printing plate includes at least one halftone printing area with a plurality of halftone dots. A halftone dot of said plurality of halftone dots is shaped as a relief area. Said relief area includes a central portion and a surrounding portion. Said central portion has a central dot floor with a first pattern of a plurality of pins protruding upwardly from the central dot floor. Said surrounding portion protrudes upwardly from the central dot floor and has a top side including a second pattern of a plurality of recesses. The first pattern and second pattern are such that the surrounding portion can be distinguished from the central portion.
An apparatus for generating a three-dimensional structure using a solidifiable material (M) includes a support structure configured for providing a support surface, wherein the support surface may be formed by a substrate intended to be part of the three-dimensional structure to be generated or by a support not intended to be part of the three-dimensional structure to be generated. A container is provided for receiving the solidifiable material. A first irradiating means is located behind the support surface and configured to emit irradiation, through said support surface, in an irradiation area in the solidifiable material, between the support surface and the container to solidify the solidifiable material at the support surface. The support structure is configured to allow said irradiation to pass through the support surface.
B29C 64/124 - Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
A method for fixing and treating a flexible plate on a drum includes: providing a flexible plate comprising a support layer made of a first material and at least one additional layer made of a second material which is different from the first material, wherein one or more thin film side wings are connected to one or more sides of the flexible plate. The one or more thin film side wings have a thickness which is at least 5 times smaller than the thickness of the flexible plate. The method further includes positioning the flexible plate on the drum such that the lower face of each thin film side wing of the flexible plate covers at least one vacuum suction opening, and performing a treatment on at least one layer of the flexible plate while rotating the drum.
A method for writing an imageable material using multiple beams includes preparing subsequent patterns each having Y rows of N pixel locations, said subsequent patterns including first and second patterns; where the first and the second pattern overlap with each other in an overlap area consisting of O columns and Y rows of pixel locations; selecting for each row i of said first pattern Mi1 pixel locations; selecting for each row i of said second pattern Mi2 pixel locations; writing simultaneously, for each row i, said Mi1 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; and moving said N beams relative to said imageable material in a slow scan direction over (N−O) pixel locations; writing simultaneously, for each row i, said Mi2 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material.
B41J 2/455 - Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources using laser arrays
B41C 1/10 - Forme preparation for lithographic printingMaster sheets for transferring a lithographic image to the forme
A flexographic printing plate includes at least one halftone printing area with a plurality of halftone dots. A halftone dot of said plurality of halftone dots is shaped as a relief area. Said relief area includes a central portion and a surrounding portion. Said central portion has a central dot floor with a first pattern of a plurality of pins protruding upwardly from the central dot floor. Said surrounding portion protrudes upwardly from the central dot floor and has a top side including a second pattern of a plurality of recesses. The first pattern and second pattern are such that the surrounding portion can be distinguished from the central portion.
A method for stereolithography printing, including the steps of positioning a holder containing a printing material in a first position in a stereolithography apparatus; stereolithography printing a plurality of successive layers in said holder using radiation for solidifying the printing material, such that one or more objects are formed; moving said holder from said first position to a second position away from said first position; opening said holder and removing said one or more objects from said opened holder, in said second position of the holder.
B29C 64/135 - Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
B29C 64/124 - Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
patents
