The present disclosure provides a method to perform a non-orthogonal sweeping motion in a microlithography system. The method comprises measuring a position deviation of the tool head relative the stage in a first direction parallel with the first axis, receiving a sweep command comprising a sweep angle, α, wherein the sweep angle is an angle between the sweep direction and the first direction, determining an X-offset in the scanning direction, based on the position deviation and the sweep angle, performing a first compensation of the sweeping motion of the optical beam scanning arrangement based on the position deviation and the sweep angle, performing a second compensation of the sweeping motion by moving the tool head and/or the stage in the scanning direction based on the X-offset, performing the sweeping motion in the sweep direction wherein the sweep direction is non-orthogonal to the first axis and the second axis, respectively.
There is disclosed herein a method for controlling a laser writer (100) and a laser writer (100) configured to perform such a method. The laser writer (100) comprises a printing head (102), a modulating optic (108), and a sweep deflection optic (110). The printing head (102) scans in a scanning direction (X) relative to a printing substrate (104), with a predetermined non-constant velocity profile. The sweep deflection optic (110) is controlled to carry out a micro-sweep based on a monitored position of the printing head (102) along the scan direction (X).
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
3.
LASER WRITING WITH A NON-CONSTANT EXPOSURE VELOCITY
There is disclosed herein a method for controlling a laser writer (100), comprising moving a printing head (102) in a scan direction (X) relative to a printing substrate (104), wherein the movement of the printing head (102) has a non-constant velocity profile, and directing one or more laser beams (106) through a spatial light modulator, SLM (108), and towards the printing substrate (104). The method comprises controlling the intensity of the one or more laser beams (106) directed through the SLM (108) according to one or more position triggers corresponding to predetermined positions of the printing head (102) relative to the printing substrate (104), such that the SLM (108) adopts an SLM array pattern corresponding to a printing pattern to be printed at a location on the printed substrate (104) when the printing head (102) is at said location on the printed substrate (104).
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
4.
SHUTTER FOR A MICROLITHOGRAPHY DEVICE AND A MICROLITHOGRAPHY DEVICE WITH A SHUTTER
A shutter (40) for a microlithography device, comprises a rotatable body (41), rotatable around a rotation axis (44), and a driving unit. The rotatable body has a length (L) along the rotation axis that is longer than a largest width (W). The rotatable body comprises at least a first plane reflective surface (42) with a surface normal directed in a first direction (N) perpendicular to the rotation axis. The first plane reflective surface is offset (O) from the rotation axis. The rotatable body leaves, for at least a part of the length, a free line-of-sight, passing the rotation axis, in a second direction (S) perpendicular to the rotation axis. The driving unit is configured for turning the rotatable body back and forth between a first rotational position and a second rotational position around the rotation axis. A microlithography device having a shutter is also disclosed.
A method for providing azimuth compensated rasterized pattern data comprises obtaining (S10) of original rasterized pattern data, representing a pattern to be printed Edge pixels are identified (S20) in the original rasterized pattern data. Scan defining data are obtained (S30), comprising an azimuth angle for a micro-sweep intended to be used during a scan for printing the pattern. An azimuth pixel array is defined (S40), angled relative to the original rasterized pattern data by the azimuth angle in negative direction. Azimuth compensated rasterized pattern data is determined (S50) by assigning (S52) an intensity to pixels in the azimuth compensated rasterized pattern data that overlaps with any of the edge pixels in the original rasterized pattern data, in dependence of intensities of respective overlapped pixels in the original rasterized pattern data. A method for printing a pattern, a device for processing print data and a printing device are also disclosed.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
A method for determining a position sensor error in a substrate pattern system, wherein the substrate pattern system comprises a control unit, a movable component, a base, and at least one position sensor having a fundamental period and configured to measure a position of the movable component along at least one axis, the method comprising: moving (110) the movable component relative the base with a predetermined speed along the at least one axis, generating (120) position data indicating a position of the movable component relative the base, by the at least one position sensor, sampling (130) the position data with a sampling rate to generate sampled position data, wherein the sampling rate is based on the fundamental period of the at least one position sensor, calculating (140), by the control unit, the position sensor error along the at least one axis of the at least one position sensor based on the sampled position data, the predetermined speed and the sampling rate.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
7.
SYSTEM FOR WRITING, MEASURING, INSPECTING, OR OTHERWISE TREATING OR EVALUATING A PATTERN ON A SUBSTRATE WITH IMPROVED POSITIONING
A system (100) for writing, measuring, inspecting, or otherwise treating or evaluating a pattern on a substrate is provided. The system comprises a stage (150), a tool head (120), and a positioning system (170). The stage is configured to support a substrate (160). The tool head comprises an objective lens (122) having a focal point at a substrate supported by the stage. The tool head and/or the stage is movable to provide relative motion between the tool head and the stage along a first axis (X) and a second axis (Y). The positioning system comprises a first mirror (174x) arranged along a first edge of the stage. The first mirror has a first mirror surface facing the stage. The positioning system first comprises a second mirror (174y) arranged along a second edge of the stage. The second edge is adjacent to the first edge. The second mirror has a second mirror surface facing the stage. The positioning system further comprises a laser source (171), a first sensor head (173x), a second sensor head (173y), a detector (177), and a processor (176). The first sensor head is attached to the tool head. The first sensor head is configured to receive a first laser beam from the laser source, emit the first laser beam as a first measurement laser beam (Mx) toward the first mirror, and receive a first reflected laser beam from the first mirror. The second sensor head is attached to the tool head. The second sensor head is configured to receive a second laser beam from the laser source, emit the second laser beam as a second measurement laser beam (My) toward the second mirror, and receive a second reflected laser beam from the second mirror. The detector is arranged to detect the first reflected laser beam and the second reflected laser beam. The processor is configured to determine a first position (x) along the first axis and a second position (y) along the second axis of the objective lens relative to the stage based on the first reflected laser beam and the second reflected laser beam.
A method for quality monitoring in microlithography devices comprises interacting (S10) with a two-dimensional pattern on a target by exposing the target for electromagnetic radiation. The exposing is performed using optical components defining an optical path. Acoustic signals are recorded (S11) in vicinity of the optical path during the interaction. The recorded acoustic signals are associated (S20) to positions of the two-dimensional pattern where the interaction with the pattern was performed when respective acoustic signals were recorded. A quality of the interaction with the two-dimensional pattern is monitored (S30) based on the associated acoustic signals and pattern positions. A microlithography device monitorable by the method is also disclosed.
A microlithographic system, comprising: a climate chamber enclosing an atmosphere; a printing device for projection of an optical beam onto a photo-sensitive resist, the printing device being arranged in the climate chamber; a fluid reservoir arranged to accommodate a thermally conductive fluid and arranged to be in thermal connection with the atmosphere to transfer heat between the atmosphere and the thermally conductive fluid; a first heat exchanging means arranged outside the climate chamber; a means for transporting the thermally conductive fluid between the fluid reservoir and the first heat exchanging means; and a means for supplying a gas from outside the climate chamber to the enclosed atmosphere; wherein the first heat exchanging means is configured to transfer heat between the thermally conductive fluid and the gas before the gas is supplied to the enclosed atmosphere.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
10.
METHODS AND SYSTEMS FOR GENERATING LINEWIDTH-OPTIMISED PATTERNS
A method for obtaining line width compensating data for a workpiece patterning device comprises printing of a calibration pattern with an exposure beam that is sweepable in a sweep direction. The calibration pattern has a multitude of exposed and unexposed lines extending in the sweep direction having different line widths and different distances to neighboring lines. Line widths are measured. Deviations of the measured line widths are calculated. Based on the calculated deviations, line width compensating data is computed, intended for adapting line widths of pattern print data prior to printing to compensate for the calculated deviations. The line width compensating data is associated with at least an intended line width and information about whether the line is an exposed or unexposed line. A method for calibrating print data and a method for printing a pattern based thereon are also disclosed as well as systems therefore.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
A beam-travelling carriage is provided. The carriage comprises a top plate, a side plate, and a hinge connecting a first lateral edge of the top plate to an upper edge of the side plate. The top plate has a bottom surface on which at least one first air bearing is arranged for enabling linear motion of the top plate along an upper surface of a horizontal beam. The side plate has a lateral surface on which at least one second air bearing is arranged for enabling linear motion of the side plate along a first lateral surface of the horizontal beam. The at least one second air bearing is preloaded to control a distance between the side plate and the first lateral surface of the horizontal beam.
The present disclosure provides an objective lens arrangement (100) for projection of an optical beam. The objective lens arrangement comprises an objective lens (110) comprising a plurality of optical components (112, 114a-f) supported by a plurality of component support structures (150, 152a-e) arranged inside a housing (116). The plurality of optical components includes a final optical component (112) configured to focus the optical beam onto a substrate (122).The final optical component is supported by a final component support structure (150). The objective lens arrangement further comprises a proximity sensor (130) comprising a sensor head (132), the sensor head being arranged between the objective lens and the substrate, and a processing unit (140). The processing unit is configured to determine a first distance (d1) between the sensor head and a surface of the substrate based on an input from the proximity sensor. The sensor head is mechanically attached to the final component support structure.
A method for preparing rasterized patterns for writing of patterns on a radiation-sensitive blank is provided The radiation-sensitive blank has a bottom anti reflection coating – BARC - covered with a photoresist layer. The said writing method comprises obtaining (S10) of original data representing a pattern to be printed. The original data is rasterized (S30) into the rasterized pattern. Data is obtained (S20) defining a thickness measure of the BARC as a function of lateral position of a radiation-sensitive blank to be patterned. The rasterizing comprises adapting of pattern properties in dependence on the thickness measure of an intended pattern position at the radiation-sensitive blank to be patterned, creating a blank-specific rasterized pattern. A method for writing of patterns on a radiation-sensitive blank is also disclosed, as well as a rasterization module and a pattern generator, utilizing the method for preparing rasterized patterns.
An evaluation system is provided for evaluating a substrate. The evaluation system comprises at least one optical arrangement configured to have a focal point at a target position of the substrate, an image capturing device configured to capture an image of the target position of the substrate via the at least one optical arrangement, an illumination unit configured to illuminate the target position of the substrate via the at least one optical arrangement, and a control unit configured to perform an imaging sequence. The imaging sequence comprises an image trigger signal and an illumination trigger signal, wherein the control unit is configured to send the image trigger signal to the image capturing device and the illumination trigger signal to the illumination unit. The image capturing device is configured to receive an image trigger signal and capture an image based on the image trigger signal. The illumination unit is configured to receive the illumination trigger signal and to illuminate the substrate based on the illumination trigger signal.
A method for preparing pixel data for writing with SLM comprises obtaining (S10) of data representing a pattern. The data is rasterized (S20) to a grid of pixels. The rasterizing comprises assigning (S22) of an edge adjustment value to pixels covering an edge of the pattern. The rasterized pattern is divided (S30) into a number of rasterized pattern planes associated with a respective radiant exposure. The sum of radiant exposures for a completely covered pixel exceeds (S32) a threshold for activating a radiation sensitive layer on a substrate, onto which the pattern is to be printed. The sum of radiant exposures for a pattern edge pixel corresponds (S34) to a quantity sufficient to move a position of where the sum of radiant exposures reaches the activation threshold a distance that corresponds to the edge adjustment value. Data representing the rasterized pattern planes are outputted (S40).
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
16.
PATTERN GENERATOR AND METHOD FOR DRIVING PATTERN GENERATOR
A pattern generator (1) comprises a pulsed laser light source, a spatial light modulator, a control module, an optical end system (50) and a stage positioning device. The optical end system is arranged for positioning a laser illumination pattern (13) from the spatial light modulator on a writing plane (43). The optical end system further comprises a strip switch (70), configured to optically move a position of the laser illumination pattern on the writing plane in a sweep direction (61), perpendicular to a scan direction (62) of the stage positioning device. The control module is further arranged for generating laser illumination patterns at at least two predetermined positions in the sweep direction. A distance between the positions in the sweep direction is less or equal to a width in the sweep direction of the laser illumination pattern on the writing plane.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
A scanning lithographic laser writer, comprises a substrate holder, an irradiation arrangement and a control unit. The irradiation arrangement has a laser source, a multi head modulator arrangement and at least two writing head arrangements. The irradiation arrangement is arranged for providing laser light, via the multi head modulator arrangement to the writing head arrangements to irradiate a substrate plane. The control unit is configured for controlling a relative mechanical displacement between a substrate holder and the writing head arrangements, and for controlling a sweep of laser light exiting therefrom. The multi head modulator arrangement is configured to split and modulate an input beam into at least one modulated beam for each of the writing head arrangements by use of an acoustic-optical crystal. The writing head arrangements are positioned to displace laser light exiting from the writing head arrangements with respect to each other.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
G02F 1/29 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the position or the direction of light beams, i.e. deflection
09 - Scientific and electric apparatus and instruments
37 - Construction and mining; installation and repair services
42 - Scientific, technological and industrial services, research and design
Goods & Services
Machines and machine tools for treatment of materials and
for manufacturing in photomask manufacturing industry or in
semiconductor manufacturing industry or in display
manufacturing industry, all before mentioned goods not for
processing and production of plastics of all kinds, all
before mentioned goods not for processing and production of
plastics of all kinds; machines, apparatus and instruments
for manufacturing semiconductors, semiconductor discs and
circuits, computer chips, screens and monitors, and parts
and fittings for the aforesaid machines and apparatus, all
before mentioned goods not for processing and production of
plastics of all kinds; machines, apparatus and instruments
for manufacturing photomasks, substrates, circuit boards
(printed circuit boards), solar cells and screens
(displays), and parts and fittings for the aforesaid
machines, apparatus and instruments all before mentioned
goods not for processing and production of plastics of all
kinds. Pattern converters and systems performing advanced
processing operations on electronic pattern data (data
path); laser-based equipment for measuring and inspecting
photomasks, substrates, semiconductor discs (wafers),
semiconductor wafers (chips), circuit boards (printed
circuit boards), photo cells (photovoltaics) and glass
panels for screens (displays); camera-based measuring
systems that measures the placement of the structure of the
photomask; measuring apparatus and instruments used in
photomask manufacturing industry or in semiconductor
manufacturing industry or in display manufacturing industry;
measuring devices used in photomask manufacturing industry
or in semiconductor manufacturing industry or in display
manufacturing industry; sensors, detectors and monitoring
apparatus and instruments used in photomask manufacturing
industry or in semiconductor manufacturing industry or in
display manufacturing industry; testing apparatus and
instruments used in photomask manufacturing industry or in
semiconductor manufacturing industry or in display
manufacturing industry; testing and quality control devices
used in photomask manufacturing industry or in semiconductor
manufacturing industry or in display manufacturing industry;
optical apparatus and instruments used in photomask
manufacturing industry or in semiconductor manufacturing
industry or in display manufacturing industry; optical
inspection apparatus for industrial use in photomask
manufacturing industry or in semiconductor manufacturing
industry or in display manufacturing industry; optical
frequency metrology devices; computer software used for
measuring, inspecting, monitoring, detecting, testing and
quality control of photomasks; inspection devices for
monitoring and detecting defects in photomask manufacturing;
chemistry apparatus and instruments; none of the aforesaid
goods being analytical and/or measuring apparatus for use in
the dairy, meat, poultry, fish, food, feed, forage, dairy,
grain, plant, sugar cane oilseed, beer or wine industries. Repair and maintenance services regarding machines, machine
tools, apparatus, systems and instruments for treatment of
material and for manufacturing; installation services
regarding machines, machine tools, apparatus, systems and
instruments for treatment of material and for manufacturing;
repair and maintenance of machines, apparatus, systems and
instruments for manufacturing photomasks, screens,
semiconductors, circuit boards and computer chips. Research, development, design, technical consultancy and
advice with regard to the manufacture of photomasks,
screens, semiconductors, circuit boards and computer chips,
and with regard to machines, apparatus and instruments for
manufacturing photomasks, screens, semiconductors, circuit
boards and computer chips, including data paths for pattern
converters and systems hereto for performing advanced
processing operations on electronic pattern data and design
and development of computer hardware and software for use in
the aforesaid fields; testing and quality control services
in photomask manufacturing industry or in semiconductor
manufacturing industry or in display manufacturing industry;
quality control services of photomasks; none of the
aforesaid services being analytical and/or measuring for use
in the dairy, meat, poultry, fish, food, feed, forage,
dairy, grain, plant, sugar cane oilseed, beer or wine
industries.
09 - Scientific and electric apparatus and instruments
37 - Construction and mining; installation and repair services
42 - Scientific, technological and industrial services, research and design
Goods & Services
Machines and machine tools for treatment of materials and for manufacturing in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry, all before mentioned goods not for processing and production of plastics of all kinds, all before mentioned goods not for processing and production of plastics of all kinds; machines, apparatus and instruments for manufacturing semiconductors, semiconductor discs and circuits, computer chips, screens and monitors, and parts and fittings for the aforesaid machines and apparatus, all before mentioned goods not for processing and production of plastics of all kinds; machines, apparatus and instruments for manufacturing photomasks, substrates, circuit boards (printed circuit boards), solar cells and screens (displays), and parts and fittings for the aforesaid machines, apparatus and instruments all before mentioned goods not for processing and production of plastics of all kinds. Pattern converters and systems performing advanced processing operations on electronic pattern data (data path); laser-based equipment for measuring and inspecting photomasks, substrates, semiconductor discs (wafers), semiconductor wafers (chips), circuit boards (printed circuit boards), photo cells (photovoltaics) and glass panels for screens (displays); camera-based measuring systems that measures the placement of the structure of the photomask; measuring apparatus and instruments used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; measuring devices used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; sensors, detectors and monitoring apparatus and instruments used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; testing apparatus and instruments used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; testing and quality control devices used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; optical apparatus and instruments used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; optical inspection apparatus for industrial use in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; optical frequency metrology devices; computer software used for measuring, inspecting, monitoring, detecting, testing and quality control of photomasks; inspection devices for monitoring and detecting defects in photomask manufacturing; chemistry apparatus and instruments; none of the aforesaid goods being analytical and/or measuring apparatus for use in the dairy, meat, poultry, fish, food, feed, forage, dairy, grain, plant, sugar cane oilseed, beer or wine industries. Repair and maintenance services regarding machines, machine tools, apparatus, systems and instruments for treatment of material and for manufacturing; installation services regarding machines, machine tools, apparatus, systems and instruments for treatment of material and for manufacturing; repair and maintenance of machines, apparatus, systems and instruments for manufacturing photomasks, screens, semiconductors, circuit boards and computer chips. Research, development, design, technical consultancy and advice with regard to the manufacture of photomasks, screens, semiconductors, circuit boards and computer chips, and with regard to machines, apparatus and instruments for manufacturing photomasks, screens, semiconductors, circuit boards and computer chips, including data paths for pattern converters and systems hereto for performing advanced processing operations on electronic pattern data and design and development of computer hardware and software for use in the aforesaid fields; testing and quality control services in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; quality control services of photomasks; none of the aforesaid services being analytical and/or measuring for use in the dairy, meat, poultry, fish, food, feed, forage, dairy, grain, plant, sugar cane oilseed, beer or wine industries.
20.
LASER WRITER AND METHOD FOR OPERATING A LASER WRITER
An irradiation arrangement (2) comprises an acousto-optical modulator (20), a multi-laser-beam source (10), a first lens array (50) of first beam lenses (52) and a writing head (40) The multi-laser-beam source provides parallel laser beams focused into the acousto-optical modulator. Focal points of the first beam lenses coincide with respective modulator channel positions (25) of the acousto-optical modulator or with respective modulator channel positions of an image plane of an imaging of the acousto-optical modulator. The writing head comprises an acousto-optical deflector (60), a collimator lens arrangement (62) and a second lens array (70) of second beam lenses (72). Focal points of the second beam lenses are positioned at the collimator object plane (64). The writing head is movable relative to the acousto-optical modulator along a light propagation path (X). A scanning lithographic laser writer and a method for operating a scanning lithographic laser writer are disclosed.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
21.
METHOD AND DEVICE FOR GENERATING PATTERN DENSITY DATA
A method for determining pattern density data for a pattern to be printed using a mask printing device is disclosed. Vector data describing the pattern to be printed are received and the vector data are rasterized to produce rasterized data describing the pattern to be printed, wherein the rasterized data comprise a grid of pixels, wherein each pixel is associated with a respective exposure value. A plurality of subsets of pixels of the grid of pixels are defined, wherein each subset of pixels corresponding to a subarea of the pattern to be printed, and the pattern density data are determined from the rasterized data, wherein the pattern density data comprises, for each subset of pixels of the grid of pixels, a density value calculated based on the exposure values of the subset of pixels.
The present invention provides a tape guide for guiding a component tape from a tape reel to a picking position of a component mounting machine. The tape guide comprises a support structure arranged for guiding the component tape from an upstream end portion of the tape guide to a downstream end portion of the tape guide. The tape guide further comprised a hook portion arranged at the downstream end portion and configured to grip a flange of said tape reel when the tape guide and tape reel are removed from said component mounting machine. The present invention further provides a unit comprising a tape guide, a tape reel and component tape as well as component mounting machine.
09 - Scientific and electric apparatus and instruments
37 - Construction and mining; installation and repair services
42 - Scientific, technological and industrial services, research and design
Goods & Services
machines and machine tools for use in the manufacturing of semiconductors, semiconductor circuits, semiconductor chips, semiconductor wafers, semiconductor discs, computer chips, screens, and monitors, and structural parts thereof; components for machine and machine tools, namely, slit valves, wafer handlers, motion feedthroughs, orientors, actuators, gas lines, gate valves, connectors, beam lines, flexible couplings, lifters, leak detectors, XYZ manipulators, valve stem seals, torque couplings, ultra-high vacuum systems, and pressure transducers for use in the manufacturing of semiconductors, semiconductor circuits, semiconductor chips, semiconductor wafers, semiconductor discs, computer chips, screens, and monitors, and structural parts thereof; machines and machine tools for use in the manufacturing of photomasks, substrates, photomask substrates, circuit boards, printed circuit boards, solar cells, and display screens, and structural parts thereof; components for machine and machine tools, namely, slit valves, wafer handlers, motion feedthroughs, orientors, actuators, gas lines, gate valves, connectors, beam lines, flexible couplings, lifters, leak detectors, XYZ manipulators, valve stem seals, torque couplings, ultra-high vacuum systems, and pressure transducers for use in the manufacturing of photomasks, substrates, photomask substrates, circuit boards, printed circuit boards, solar cells, and display screens, and parts thereof pattern converters and systems performing advanced processing operations on electronic pattern data paths, namely, data processors, calculating machines, data processing equipment and computers, and apparatus and instruments for recording, transmitting, reproducing or processing sound, images or data in the semiconductor industry; data processing apparatus and equipment; calculating machines, data processing equipment and computers; laser equipment and laser measuring systems for measuring and inspecting photomasks, substrates, semiconductor discs, semiconductor wafers, circuit boards, printed circuit boards, photocells, photovoltaics cells, and glass panels for display screen; camera-based measuring system that measures the placement of the structure of the photomask; optical sensors; measuring apparatus and instruments, namely, measuring lasers and optical inspection apparatus for use during production of photomasks for displays and semiconductors; measuring devices, namely, lasers for measuring; electric sensors; testing apparatus and instruments, namely, measuring lasers and optical inspection apparatus for use during production of photomasks for displays and semiconductors; testing apparatus, namely, optical inspection apparatus for inspection of semiconductor materials, namely, semiconductor wafers, reticles, and photomasks; testing and quality control devices in the nature of scientific apparatus, namely, sensing and signaling devices for measurement and quality control of materials processing by laser; optical inspection apparatus and instruments for inspection of semiconductor materials, namely, semiconductor wafers, reticles, and photomasks; optical apparatus and instruments, namely, optical sensors, optical frequency metrology devices, optical semiconductors, optical disk drives, optical code readers, optical inspection apparatus, and optical profilers; optical inspection apparatus for industrial use; optical frequency metrology devices; downloadable and recorded computer software for use in measuring, inspecting, monitoring, detecting, testing and quality control of photomasks installation services for machines, apparatus, systems and instruments that are used in the manufacturing of photomasks, screens, semiconductors, circuit boards, and computer chips; installation services for of semiconductor manufacturing machines and systems; repair and maintenance of machines, apparatus, systems and instruments that are used in the manufacturing of photomasks, screens, semiconductors, circuit boards, and computer chips; repair or maintenance of semiconductor manufacturing machines and systems; providing information relating to the repair or maintenance of semiconductor manufacturing machines and systems design, engineering, research, and development of photomasks, screens, semiconductors, circuit boards, and computer chips; testing the functionality of photomasks, screens, semiconductors, circuit boards, and computer chips; design, engineering, research, development, and testing services in the field of manufacturing of photomasks, screens, semiconductors, circuit boards, and computer chips; scientific and technological services, namely, design, engineering, research, and development of machines, apparatus, and instruments used in the manufacturing of photomasks, screens, semiconductors, circuit boards, and computer chips; testing the functionality of machines, apparatus, and instruments used in the manufacturing of photomasks, screens, semiconductors, circuit boards, and computer chips; design, engineering, research, and development of data paths for pattern converters and systems for performing advanced processing operations on electronic pattern data and design; testing the functionality of data paths for pattern converters and systems for performing advanced processing operations on electronic pattern data and design; technical advice, information, and consultancy in relation to the design and development of photomasks, screens, semiconductors, circuit boards, and computer chips; technical advice, information, and consultancy in relation to the design and development of machines, apparatus, and instruments used in the production of photomasks, screens, semiconductors, circuit boards, and computer chips; technical advice, information and consultancy in relation to the design and development of data paths for pattern converters and systems for performing advanced processing operations on electronic pattern data and design; design and development of computer software; design and development of computer hardware; product research and development; quality control services being quality control for others; quality management services, namely, quality control in the field of photomasks; quality management services, namely, quality control and testing in the fields of photomasks, screens, semiconductors, circuit boards, and computer chips; testing of semiconductors and photomasks; product testing; product quality testing; quality control for others; quality control of goods and services; providing online non-downloadable computer software used for measuring, inspecting, monitoring, detecting, testing and quality control of photomasks; installation, maintenance and repair of computer software
09 - Scientific and electric apparatus and instruments
37 - Construction and mining; installation and repair services
42 - Scientific, technological and industrial services, research and design
Goods & Services
Machines and machine tools for treatment of materials and for manufacturing in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry, all before mentioned goods not for processing and production of plastics of all kinds, all before mentioned goods not for processing and production of plastics of all kinds; machines, apparatus and instruments for manufacturing semiconductors, semiconductor discs and circuits, computer chips, screens and monitors, and parts and fittings for the aforesaid machines and apparatus, all before mentioned goods not for processing and production of plastics of all kinds; machines, apparatus and instruments for manufacturing photomasks, substrates, circuit boards (printed circuit boards), solar cells and screens (displays), and parts and fittings for the aforesaid machines, apparatus and instruments all before mentioned goods not for processing and production of plastics of all kinds. Pattern converters and systems performing advanced processing operations on electronic pattern data (data path); laser-based equipment for measuring and inspecting photomasks, substrates, semiconductor discs (wafers), semiconductor wafers (chips), circuit boards (printed circuit boards), photo cells (photovoltaics) and glass panels for screens (displays); camera-based measuring systems that measures the placement of the structure of the photomask; measuring apparatus and instruments used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; measuring devices used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; sensors, detectors and monitoring apparatus and instruments used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; testing apparatus and instruments used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; testing and quality control devices used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; optical apparatus and instruments used in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; optical inspection apparatus for industrial use in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; optical frequency metrology devices; computer software used for measuring, inspecting, monitoring, detecting, testing and quality control of photomasks; inspection devices for monitoring and detecting defects in photomask manufacturing; chemistry apparatus and instruments; None of the aforesaid goods being analytical and/or measuring apparatus for use in the dairy, meat, poultry, fish, food, feed, forage, dairy, grain, plant, sugar cane oilseed, beer or wine industries. Repair and maintenance services regarding machines, machine tools, apparatus, systems and instruments for treatment of material and for manufacturing; installation services regarding machines, machine tools, apparatus, systems and instruments for treatment of material and for manufacturing; repair and maintenance of machines, apparatus, systems and instruments for manufacturing photomasks, screens, semiconductors, circuit boards and computer chips. Research, development, design, technical consultancy and advice with regard to the manufacture of photomasks, screens, semiconductors, circuit boards and computer chips, and with regard to machines, apparatus and instruments for manufacturing photomasks, screens, semiconductors, circuit boards and computer chips, including data paths for pattern converters and systems hereto for performing advanced processing operations on electronic pattern data and design and development of computer hardware and software for use in the aforesaid fields; testing and quality control services in photomask manufacturing industry or in semiconductor manufacturing industry or in display manufacturing industry; quality control services of photomasks; none of the aforesaid services being analytical and/or measuring for use in the dairy, meat, poultry, fish, food, feed, forage, dairy, grain, plant, sugar cane oilseed, beer or wine industries.
A method for obtaining a compensation pattern for a workpiece patterning device comprises printing (S11) a calibration pattern with a plurality of simultaneously operating exposure beams being sweepable in a second direction according to calibration pattern print data having a multitude of edges. Positions of the edges are measured (S12). Deviations of the measured positions relative calibration pattern are calculated (S13). Each deviation is associated (S14) with a used exposure beam, with a sweep position and a grid fraction position. Edge compensating data is computed (S15) for adapting edge representations of pattern print data prior to printing to compensate for the calculated deviations. The edge compensating data is dependent on the used exposure beam, the sweep position, and the grid fraction position.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
26.
ELECTRICAL CROSSTALK CANCELLATION IN ACOUSTOOPTICAL MODULATORS
A method for operating a multichannel acousto-optical modulator comprises obtaining (S20) of print data for a multitude of channels of the multichannel acousto-optical modulator. Radio-frequency signals for each of the multitude of channels are modulated (S30) based on the print data. The modulated radio-frequency signals are provided (S40) to the respective transducers of the multichannel acousto-optical modulator via electrical input connectors. The modulation of radio-frequency signals comprises, for at least one channel, crosstalk cancellation (S32). Therein, a modulated radio-frequency signal is compensated by a modulated radio-frequency signal of at least an electrically adjacent channel among the electrical input connectors, scaled by a predetermined factor and phase shifted by a predetermined phase difference. A method for calibrating a multichannel acousto-optical modulator, a control unit for a multichannel acousto-optical modulator and a pattern generator are also presented.
G02F 1/1335 - Structural association of cells with optical devices, e.g. polarisers or reflectors
G02F 1/11 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the intensity, phase, polarisation or colour based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
27.
METHODS AND SYSTEMS FOR GENERATING LINEWIDTH-OPTIMISED PATTERNS
A method for obtaining line width compensating data for a workpiece patterning device comprises printing (S2) of a calibration pattern with an exposure beam that is sweepable in a sweep direction. The calibration pattern has a multitude of exposed and unexposed lines extending in the sweep direction having different line widths and different distances to neighboring lines. Line widths are measured (S4). Deviations of the measured line widths are calculated (S6). Based on the calculated deviations, line width compensating data is computed (S8), intended for adapting line widths of pattern print data prior to printing to compensate for the calculated deviations. The line width compensating data is associated with at least an intended line width and information about whether the line is an exposed or unexposed line. A method for calibrating print data and a method for printing a pattern based thereon are also disclosed as well as systems therefore.
FUNDACIO INSTITUT DE BIOENGINYERIA DE CATALUNYA (IBEC) (Spain)
JOHANN WOLFGANG GOETHE-UNIVERSITÄT FRANKFURT AM MAIN (Germany)
UNIVERSITAT DE BARCELONA (Spain)
MYCRONIC AB (Sweden)
Inventor
Martínez Fraiz, Elena
Torras Andrés, Núria
Pampaloni, Francesco
Stelzer, Ernst H. K.
Mårtensson, Gustaf
Eklund, Robert
Ismail, Nur
Abstract
The present invention refers to a device and method for stereolithograpic three dimensional (3D) printing comprising: a) a container adequate for containing a photopolymerizable polymer, b) at least one laser generator emitting a light beam with a wavelength between 360 nm and 1000 nm, c) modulation means for modulating said light beam into at least two light sheets which are matrices of light, and d) means for irradiating said light sheets in the container containing said photopolymerizable polymer; wherein said at least one laser generator is arranged so that said at least two light sheets are crossed inside said container, leading to polymerization of the photopolymerizable polymer at the crossing of said light sheets.
B29C 64/135 - Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
B29C 64/282 - Arrangements for irradiation using multiple radiation means, e.g. micromirrors or multiple light-emitting diodes [LED] of the same type, e.g. using different energy levels
29.
Offset alignment method and micro-lithographic printing device
An offset alignment method for a micro-lithographic printing device comprises placing (S10) of an alignment target substrate. A target pattern presents areas of at least two different light reflectivities is defined relative an origin point. The alignment target substrate is illuminated (S20). Reflected light is measured (S30). A reflection image of the target pattern is created (S40) by the measured light. The illumination is made according to a test pattern of light, having areas with and without illumination. The test pattern is defined relative an origin point. A measured target pattern origin point is determined (S50) from target pattern associated features in the reflection image and a measured test pattern origin point is determined from test patterns associated features in the reflection image. An offset between a measured position and a written position is calculated (S60) from the measured target pattern origin point and the measured test pattern origin point.
G03F 9/00 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
30.
Device and method for setting relative laser intensities
A method setting respective relative laser intensities to a plurality of pixels representing a lithographic exposure includes: decreasing a relative laser intensity of each pixel from a respective first relative laser intensity to a respective second relative laser intensity, adjusting a laser dose translation of relative laser intensity of pixels from a first laser dose translation of the first relative laser intensity to a second laser dose translation of the second relative laser intensity, such that a respective effective exposed laser dose of each pixel achieved by the second laser dose translation is equal to a respective effective exposed laser dose of each pixel that would have resulted from the first laser dose translation, and increasing, by a constant additive term, the respective relative laser intensity of an edge pixel or of a neighbouring pixel from the respective second relative laser intensity to a respective third relative laser intensity.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
A microlithographic system (100), comprising: a climate chamber (110) enclosing an atmosphere; a printing device (120) for projection of an optical beam onto a photo-sensitive resist, the printing device being arranged in the climate chamber; a fluid reservoir (130) arranged to accommodate a thermally conductive fluid and arranged to be in thermal connection with the atmosphere to transfer heat between the atmosphere and the thermally conductive fluid; a first heat exchanging means (140) arranged outside the climate chamber; a means for transporting (150) the thermally conductive fluid between the fluid reservoir and the first heat exchanging means; and a means for supplying (160) a gas from outside the climate chamber to the enclosed atmosphere; wherein the first heat exchanging means is configured to transfer heat between the thermally conductive fluid and the gas before the gas is supplied to the enclosed atmosphere.
A device, a computer program, a computer readable medium and a method for controlling focus of a laser beam during a micro sweep are disclosed. The laser beam is received to an acousto-optic deflector, and acoustic waves are provided to the acousto-optic deflector. The acoustic waves are varied in frequency over time to vary a deflection angle of the laser beam over time thereby achieving the micro sweep of the laser beam. Furthermore, a rate of variation in frequency of the acoustic waves is adapted over a time of the micro sweep in such a way that differences in frequencies over the time of the micro sweep of the acoustic waves are caused in the acousto-optic deflector over a width of the laser beam in a direction parallel to the micro sweep when passing through the acousto-optic deflector, where the differences in frequencies over the time of the micro sweep are such that they cause a desired focus of the laser beam in a direction parallel with the micro sweep over the micro sweep.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
A method for mounting a component (100) on a workpiece (106), the method comprising obtaining information regarding a surface topography of at least one of a mounting surface (102) of the component and a local surface (108) of the workpiece onto which the component is to be mounted. The method further comprises forming a plurality of deposits (110) of a viscous medium on at least one of the mounting and local surfaces, wherein each of the plurality of deposits has a height (/½, /½, h3) based on the obtained information, and is formed by individually applying at least one droplet (234) of the viscous medium (232) using non-contact dispensing. The method further comprises placing the component on the substrate, such that the plurality of deposits of viscous medium forms a connection between the component and the workpiece.
H05K 3/12 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using printing techniques to apply the conductive material
H05K 13/08 - Monitoring manufacture of assemblages
A scanning lithographic laser writer (1), comprises a substrate holder (60), an irradiation arrangement (2) and a control unit (40). The irradiation arrangement has a laser source (10), a multi head modulator arrangement (4) and at least two writing head arrangements (50). The irradiation arrangement is arranged for providing laser light, via the multi head modulator arrangement to the writing head arrangements to irradiate a substrate plane. The control unit is configured for controlling a relative mechanical displacement between a substrate holder (60) and the writing head arrangements, and for controlling a sweep of laser light exiting therefrom. The multi head modulator arrangement is configured to split and modulate an input beam into at least one modulated beam for each of the writing head arrangements by use of an acoustic-optical crystal. The writing head arrangements are positioned to displace laser light exiting from the writing head arrangements with respect to each other.
G02F 1/29 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the position or the direction of light beams, i.e. deflection
A rasterization method of patterns with periodic components for SLMs is presented, comprising obtaining (S10) of an original pattern, having a periodicity. A first pattern main period is determined (S21). Image area and a first pitch of imaged elements are obtained (S31). The original pattern is scaled (S41) by a first raster scaling factor. The scaled pattern is cropped (S51) to comprise a first integer number of repetitions of the pattern items presenting a periodicity in the first direction that is covered by the image area, giving a rasterized pattern adapted to the intended pattern generator. The rasterized pattern is associated with data representing the first scaling factor. A writing method comprises obtaining of the rasterized pattern. Elements of the SLM in the pattern generator falling outside the rasterized pattern are set to be disabled. The rasterized pattern is written with an optical scaling to a target surface.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
36.
EDGE PLACEMENT WITH SPATIAL LIGHT MODULATOR WRITING
A method for preparing pixel data for writing with SLM comprises obtaining (S10) of data representing a pattern. The data is rasterized (S20) to a grid of pixels. The rasterizing comprises assigning (S22) of an edge adjustment value to pixels covering an edge of the pattern. The rasterized pattern is divided (S30) into a number of rasterized pattern planes associated with a respective radiant exposure. The sum of radiant exposures for a completely covered pixel exceeds (S32) a threshold for activating a radiation sensitive layer on a substrate, onto which the pattern is to be printed. The sum of radiant exposures for a pattern edge pixel corresponds (S34) to a quantity sufficient to move a position of where the sum of radiant exposures reaches the activation threshold a distance that corresponds to the edge adjustment value. Data representing the rasterized pattern planes are outputted (S40).
Methods, a non-transitory computer-readable storage medium, devices, and a system in relation to training a convolutional neural network for deriving corrected digital pattern descriptions from digital pattern descriptions for use in a process for producing photomasks are disclosed. A reinforcement learning agent is trained to derive corrected digital pattern descriptions from respective digital pattern descriptions. The training is based on a first plurality of generated digital pattern descriptions and an obtained physical model using which predicted binary patterns of photomasks can be derived that would result from inputting digital pattern descriptions to the process for producing photomasks. A second plurality of digital pattern descriptions is then generated, and corresponding corrected digital pattern descriptions are generated using the trained reinforcement learning agent, thereby generating training data. The training data can be used to train a convolutional neural network to derive corrected digital pattern descriptions from digital pattern descriptions, the trained neural network can be used to derive a corrected digital pattern description, and the corrected digital pattern description can be used to produce a photomask according to the corrected digital pattern description.
G03F 1/38 - Masks having auxiliary features, e.g. special coatings or marks for alignment or testingPreparation thereof
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
G06N 3/04 - Architecture, e.g. interconnection topology
G06N 3/063 - Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
A device configured to jet one or more droplets of a viscous medium may include a housing having an inner surface at least partially defining a jetting chamber configured to hold the viscous medium, and a flexible jetting nozzle. The flexible jetting nozzle may include a flexible conduit extending between an inlet orifice in an inner surface to an outlet orifice in an outer surface. The device may cause an increase of internal pressure of viscous medium in the jetting chamber to force one or more droplets of viscous medium through the flexible conduit and through the outlet orifice. The flexible jetting nozzle may include a flexible material. The flexible jetting nozzle may deform, to cause a cross-sectional area of the flexible conduit to dilate, in response to the increase of the internal pressure of the viscous medium in the jetting chamber.
B05B 1/08 - Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops of pulsating nature, e.g. delivering liquid in successive separate quantities
B05B 9/04 - Spraying apparatus for discharge of liquid or other fluent material without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible containerSpraying apparatus for discharge of liquid or other fluent material without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pump
B05C 5/02 - Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work from an outlet device in contact, or almost in contact, with the work
A device configured to jet one or more droplets of a viscous medium includes a housing at least partially defining a jetting chamber, a supply conduit that supplies the viscous medium into the jetting chamber, a jetting nozzle, an impacting device configured to force the one or more droplets of the viscous medium through the conduit of the jetting nozzle to be jetted as the one or more droplets, and a supply conduit actuator configured to adjust a hydrodynamic resistance of at least a portion of the supply conduit to viscous medium flow from the jetting chamber via the supply conduit, based on moving through the portion of the supply conduit, independently of the impacting device, to adjust a cross-sectional flow area of the portion of the supply conduit.
B05C 11/10 - Storage, supply or control of liquid or other fluent materialRecovery of excess liquid or other fluent material
B05C 5/02 - Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work from an outlet device in contact, or almost in contact, with the work
The present invention provides a mounting tool tip arranged for being releasably mounted to mounting tool of a component mounting machine, said mounting tool being rotatably arranged in said component mounting machine around a vertical rotational axis. The mounting tool tip comprises a tip portion at a first end and arranged for engagement with a component to be mounted in a component mounting machine; engagement means for mounting said mounting tool tip to said mounting tool. Further, the engagement means is arranged at a second end opposite said first end and further configured such that said tip portion is off-center in a horizontal direction compared to said rotational axis when the mounting tool tip is mounted to said mounting tool. The present invention further provides a mounting tool, a mount head, a component mounting machine as well as method for simultaneously picking at least two components arranged in adjacent component tapes in a component mounting machine.
09 - Scientific and electric apparatus and instruments
37 - Construction and mining; installation and repair services
42 - Scientific, technological and industrial services, research and design
Goods & Services
Machines and machine tools for treatment of material and for
manufacturing; machines, apparatus and instruments for
manufacturing semiconductors, semiconductor discs and
circuits, computer chips, screens and monitors, and parts
and fittings for the aforesaid machines and apparatus;
machines for the surface mounting of electronic components
and circuit boards; machines for applying solder paste,
insulators, glue and other viscous material to electronic
components and circuit boards; machines, apparatus and
instruments for manufacturing photomasks, substrates,
circuit boards (printed circuit boards), solar cells and
screens (displays), and parts and fittings for the aforesaid
machines; industrial process controllers and automatic
machines for assembly of components including surface
mounting machines, magazines for component reels, feeders,
feeding mechanisms and mounting heads; process machines with
storage units for storing and retrieving electronic
components; process machines for storing and retrieving tape
reels with electronic components and for storing and
retrieving feeders, trays and other machine units for
carrying electronic component reels and tape reels with
electronic components. Laser writers and pattern generators for photomasks; laser
writers and pattern generators for writing patterns directly
onto substrates, semiconductor discs (wafers), semiconductor
wafers (chips), circuit boards (printed circuit boards),
photo cells (photovoltaics) and glass panels for screens
(displays); laser writers for surface ablation; laser
writers and pattern generators for use in the semiconductor
and display industries; pattern converters and systems
performing advanced processing operations on electronic
pattern data (data path); laser-based equipment for
measuring and inspecting photomasks, substrates,
semiconductor discs (wafers), semiconductor wafers (chips),
circuit boards (printed circuit boards), photo cells
(photovoltaics) and glass panels for screens (displays);
electric apparatus and instruments for use in the surface
mounting of electronic components and circuit boards; solder
paste printers (jet printers); electric apparatus for
applying solder paste and insulators (jet printers and
dispensers); electric apparatus for applying solder paste,
glue and other viscous material (jet printers and
dispensers); ejectors for use in solder paste printers;
measuring devices; testing apparatus and instruments;
testing and quality control devices; testing apparatus for
electronic equipment; computer component testing and
calibrating machines; optical apparatus and instruments;
computer software; computer hardware. Repair and maintenance services regarding machines, machine
tools, apparatus, systems and instruments for treatment of
material and for manufacturing; installation services
regarding machines, machine tools, apparatus, systems and
instruments for treatment of material and for manufacturing;
repair and maintenance of machines, apparatus, systems and
instruments for manufacturing photomasks, screens,
semiconductors, circuit boards and computer chips, and for
machines, apparatus and instruments for applying solder
paste, insulators, glue and other viscous material;
installation, repair or maintenance of measuring or testing
machines and instruments. Technical research, development and design; technological
consultancy and advice with regard to the manufacture of
photomasks, screens, semiconductors, circuit boards and
computer chips, and with regard to machines, apparatus and
instruments for manufacturing photomasks, screens,
semiconductors, circuit boards and computer chips, and for
applying solder paste, insulators, glue and other viscous
material, including data paths for pattern converters and
systems hereto for performing advanced processing operations
on electronic pattern data; technological consultancy and
advice with regard to design and development of computer
hardware and software for use in the aforesaid fields;
technical measuring and testing; testing of apparatus;
software as a service [SaaS] services within the field of
electronics and surface mount technology.
09 - Scientific and electric apparatus and instruments
37 - Construction and mining; installation and repair services
42 - Scientific, technological and industrial services, research and design
Goods & Services
machines for manufacturing LED displays, computer monitors, LCDs, flat panel display screens, and structural and replacement parts thereof; machines, apparatus and instruments for manufacturing semiconductors, semiconductor discs, semiconductor circuits, computer chips, and structural and replacements parts thereof for use in the semiconductor industry, display panel industry and electronics industry; machines for the surface mounting of electronic components and circuit boards for use in the semiconductor industry, display panel industry, and electronics industry; machines for applying solder paste, insulators, glue and other viscous material to electronic components and circuit boards for use in the semiconductor industry, display panel industry and electronics industry; machines, apparatus and instruments for manufacturing printed circuit boards, namely, jet printers and dispensers and structural and replacement parts therefor for printing printed circuit boards; machines, apparatus and instruments for manufacturing photomasks, substrates, printed circuit boards, solar cells and display screens and structural and replacements parts thereof, for use in the semiconductor industry, display panel industry and electronics industry; industrial automatic machines for assembly of components including surface mounting machines, magazines for component reels, feeders, feeding mechanisms and mounting heads, for use in the semiconductor industry, display panel industry and electronics industry; process machines with storage units for storing and retrieving electronic components for use in the semiconductor industry, display panel industry and electronics industry; process machines for storing and retrieving tape reels with electronic components and for storing and retrieving feeders, trays and other machine units for carrying electronic component reels and tape reels with electronic components, for use in the electronics industry laser writers and pattern generators for producing photomasks; laser writers and pattern generators for writing patterns directly onto substrates, semiconductor discs, semiconductor wafers, semiconductor chips, printed circuit boards, photovoltaic photo cells, and glass panels for display screens; laser writers for surface ablation for use in the semiconductor industry, display panel industry and electronics industry; downloadable and recorded computer software using artificial intelligence (AI) for analysing, optimizing and enhancing precision, accuracy, assembly, testing, quality, flexibility, integration and efficiency in industrial process machines and equipment for use in the semiconductor industry, display panel industry and electronics industry; downloadable and recorded computer software using artificial intelligence (AI) for automation of the operation and management of industrial process machines and equipment for use in the semiconductor industry, display panel industry and electronics industry; pattern converters and systems performing advanced processing operations on electronic pattern data path, namely, data processors, calculating machines, data processing equipment and computers, and apparatus and instruments for recording, transmitting, reproducing or processing sound, images or data; pattern converters and systems performing advanced processing operations on electronic pattern data path for use in the semiconductor industry, display panel industry and electronics industry, namely, data processors, calculating machines, data processing equipment and computers, and apparatus and instruments for recording, transmitting, reproducing or processing sound, images or data; laser-based equipment for measuring, and inspecting photomasks, substrates, semiconductor discs, semiconductor wafers, semiconductor chips, printed circuit boards, photovoltaic photo cells and glass panels for display screens for use in the semiconductor industry, display panel industry and electronics industry; solder paste jet printers; electric apparatus being jet printers and dispensers for applying solder paste and insulators for use in the semiconductor industry, display panel industry and electronics industry; electric apparatus being jet printers and dispensers for applying solder paste, glue and other viscous material for use in the semiconductor industry, display panel industry and electronics industry; electric apparatus for applying insulators, solder paste, glue and other viscous material, namely, jet printers and dispensers for printing printed circuit boards; ejectors for use in solder paste jet printers; measuring devices namely, lasers for measuring and electric sensors; testing apparatus and instruments namely, measuring lasers and optical inspection apparatus for use during production of photomasks for displays and semiconductors; testing apparatus, namely, optical inspection apparatus for inspection of semiconductor materials, namely, semiconductor wafers, reticles, and photomasks; testing and quality control devices being scientific apparatus, namely, sensing and signaling devices for measurement and quality control of materials processing by laser in the fields of semiconductor industry, display panel industry, and electronics industry; testing apparatus for testing electronic equipment, semiconductors, and printed circuit boards; testing apparatus for electronic equipment, namely, continuity test apparatus for electrical circuits; computer component testing and calibrating equipment; computer component testing and calibrating equipment for use in the semiconductor industry, display panel industry and electronics industry; optical apparatus and instruments, namely, optical sensors, optical frequency metrology devices, optical semiconductors, optical disk drives, optical code readers, optical inspection apparatus, and optical profilers; downloadable computer software for controlling, operating, monitoring and managing industrial process machines and equipment for use in the semiconductor industry, display panel industry and electronics industry; recorded computer software for controlling, operating, monitoring and managing industrial process machines and equipment for use in the semiconductor industry, display panel industry and electronics industry; computer hardware; computer hardware, namely, namely microchips, monitors, computer servers for use in the semiconductor industry, display panel industry and electronics industry repair and maintenance services for machines, machine tools, apparatus, systems and instruments for treatment of material and for manufacturing; installation services for machines, machine tools, apparatus, systems and instruments for treatment of material and for manufacturing; repair and maintenance of machines, apparatus, systems and instruments for manufacturing photomasks, screens, semiconductors, circuit boards and computer chips, and for machines, apparatus and instruments for applying solder paste, insulators, glue and other viscous material; installation, repair or maintenance of measuring or testing machines and instruments technical research and product development and design in the field of semiconductor processing technology; technical research and product development and design in the fields of semiconductors, semiconductor processing technology, electronics, display panels, and surface mount technology; technological consultancy and advice in relation to the manufacture of photomasks, screens, semiconductors, circuit boards and computer chips; technological consultancy and advice in relation to machines, apparatus and instruments for manufacturing photomasks, screens, semiconductors, circuit boards and computer chips; technological consultancy and advice in relation to applying solder paste, insulators, glue and other viscous material using jet printers and dispensers; technological consultancy and advice in relation to data paths for pattern converters and systems thereto for performing advanced processing operations on electronic pattern data paths; technological consultancy and advice in relation to design and development of computer hardware and software for use in the fields of semiconductors, semiconductor processing technology, electronics, display panels, and surface mount technology; technical consultation and research in the field of electronics, namely, measurement evaluations and testing of photomasks, semiconductors, circuit boards and display panels; testing the functionality of apparatus, namely testing of laser pattern generators, semiconductor manufacturing apparatus and of apparatus for surface mounting of electronic components; software as a service (SaaS) services featuring software for analysing, controlling, monitoring, operating and managing laser pattern generators, semiconductor manufacturing machines, machines for surface mounting of electronic components, within the field of electronics and surface mount technology
43.
Long sweep length DUV microlithographic beam scanning acousto-optical deflector and optics design
The technology disclosed uses extreme beam shaping to increase the amount of energy projected through an AOD. First and second expanders and are described that are positioned before and after the AOD. In one implementation, the optical path shapes energy from a source, such as a Gaussian laser spot, deflects it, then reshapes it into a writing spot. In another implementation for image capture, rather than projection system, the disclosed optics reshape a reading spot from an imaged surface to a high-aspect ratio beam at an AOD exit, subject to deflection by the AOD. The optics reshape the radiation relayed by the high-aspect ratio beam through the AOD to a detector. Since light can travel in both directions through an optical system, the details described in terms of projecting a writing spot onto a radiation sensitive surface also apply to metrology sweeping a reading spot over an imaged surface.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
44.
Method and device for processing print data and for printing according to such print data
A method for processing print data defining a pattern to be printed comprises obtaining (S10) of vector print data for the pattern to be printed. The vector print data is divided (S12) into vector print data of scan strips, wherein each scan strip is associated with a scan velocity. A skew transformation of the vector print data is performed (S14) in each scan strip. The skew transformation is performed in a direction opposite to respective scan velocity and with a magnitude proportional to a magnitude of the scan velocity. A method for printing a pattern, a device for processing print data and a printing device according to the same principles are also disclosed.
G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
45.
DEVICE AND METHOD FOR SETTING RELATIVE LASER INTENSITIES
A device, a computer program, a computer readable medium and a method setting respective relative laser intensities to a plurality of pixels representing a lithographic exposure. The plurality of pixels comprises at least one edge pixel arranged on an edge of an area of pixels to be exposed, and at least one neighbouring pixel. The at least one neighbouring pixel is arranged one pixel away from the at least one edge pixel in a perpendicular direction away from the edge towards the area of pixels to be exposed. The method comprises decreasing proportionally a relative laser intensity of each pixel of the plurality of pixels from a previously set respective first relative laser intensity to a respective second relative laser intensity. A laser dose translation of relative laser intensity of pixels proportionally adjusted from a previously set first laser dose translation of the first relative laser intensity to a second laser dose translation of the second relative laser intensity. The proportional adjustment is such that a respective effective exposed laser dose of each pixel is achieved by the second laser dose translation of the respective second relative laser intensity which is equal to a respective effective exposed laser dose of each pixel that would have resulted from the first laser dose translation of the respective first relative laser intensity. The respective relative laser intensity of an edge pixel of the at least one edge pixel or of a neighbouring pixel of the at least one neighbouring pixel is increased by a constant additive term from the respective second relative laser intensity to a respective third relative laser intensity.
The present invention provides a component mounting machine -comprising a picking tool for picking electronic components from a source of electronic components and placing them onto a workpiece, a verification unit for measuring an electrical property of an electronic component picked and held by the picking tool. The verification unit comprises a board, a plurality of test electrodes arranged on a surface of said board and a system for measuring an output signal from the test electrodes upon contact between a picked electronic component and at least two of said test electrodes. Further, at least one test electrode arranged on a flexible portion of the board that is configured to flex upon engagement between a picked electronic component and said at least two test electrodes.
A holder arrangement for releasably holding a plurality of component feeders, configured to feed a component tape towards a picking position of a component mounting machine, is disclosed. The arrangement comprises a first mechanical interface configured to releasably attach the plurality of component feeders to the holder arrangement, and a second mechanical interface configured to releasably attach the holder arrangement to a component tape magazine configured to be loaded into the component mounting machine, such that the component feeders are positioned to guide the component tape to the picking position. Furthermore, a method for handling at least one component feeder, is disclosed.
The present invention provides a storage unit for Surface Mount Technology (SMT) supplies, comprising a plurality of stacks having vertically stacked storage locations for SMT supplies, a terminal for inserting and receiving SMT supplies to and from said storage unit, a first collector arm for transporting SMT supplies between storage locations and said terminal, said collector arm being moveably arranged along said stacks so as to enable engagement with the vertically stacked storage locations of a stack. Further, the plurality of stacks are arranged in at least one cluster of two or more stacks in each cluster, wherein each stack of said at least one cluster is moveably arranged in relation to said collector arm so as to allow engagement of said collector arm with different stacks of the cluster upon movement of said two or more stacks in the cluster, thereby allowing said collector arm to engage storage locations of different stacks in said at least one cluster. The present invention further provides a method for operating a storage unit for SMT supplies.
B65G 1/06 - Storage devices mechanical with means for presenting articles for removal at predetermined position or level
B65G 1/133 - Storage devices mechanical with article supports or holders movable in a closed circuit to facilitate insertion or removal of articles the circuit being confined in a horizontal plane
H05K 13/08 - Monitoring manufacture of assemblages
49.
DEVICE AND METHOD FOR STEREOLITHOGRAPHIC THREE DIMENSIONAL PRINTING
FUNDACIO INSTITUT DE BIOENGINYERIA DE CATALUNYA (IBEC) (Spain)
JOHANN WOLFGANG GOETHE-UNIVERSITÄT FRANKFURT AM MAIN (Germany)
UNIVERSITAT DE BARCELONA (Spain)
MYCRONIC AB (Sweden)
Inventor
Martínez Fraiz, Elena
Torras Andrés, Núria
Pampaloni, Francesco
Stelzer, Ernst H. K.
Mårtensson, Gustaf
Eklund, Robert
Ismail, Nur
Abstract
The present invention refers to a device and method for stereolithograpic three dimensional (3D) printing comprising: a) a container adequate for containing a photopolymerizable polymer, b) at least one laser generator emitting a light beam with a wavelength between 360 nm and 1000 nm, c) modulation means for modulating said light beam into at least two light sheets which are matrices of light, and d) means for irradiating said light sheets in the container containing said photopolymerizable polymer; wherein said at least one laser generator is arranged so that said at least two light sheets are crossed inside said container, leading to polymerization of the photopolymerizable polymer at the crossing of said light sheets.
09 - Scientific and electric apparatus and instruments
37 - Construction and mining; installation and repair services
42 - Scientific, technological and industrial services, research and design
Goods & Services
Machines and machine tools for treatment of material and for manufacturing; Machines, apparatus and instruments for manufacturing semiconductors, semiconductor discs and circuits, computer chips, screens and monitors, and parts and fittings for the aforesaid machines and apparatus; Machines for the surface mounting of electronic components and circuit boards; Machines for applying solder paste, insulators, glue and other viscous material to electronic components and circuit boards; Machines, apparatus and instruments for manufacturing photomasks, substrates, circuit boards (printed circuit boards), solar cells and screens (displays), and parts and fittings for the aforesaid machines; Industrial process controllers and automatic machines for assembly of components including surface mounting machines, magazines for component reels, feeders, feeding mechanisms and mounting heads; process machines with storage units for storing and retrieving electronic components; process machines for storing and retrieving tape reels with electronic components and for storing and retrieving feeders, trays and other machine units for carrying electronic component reels and tape reels with electronic components. Laser writers and pattern generators for photomasks; Laser writers and pattern generators for writing patterns directly onto substrates, semiconductor discs (wafers), semiconductor wafers (chips), circuit boards (printed circuit boards), photo cells (photovoltaics) and glass panels for screens (displays); Laser writers for surface ablation; Laser writers and pattern generators for use in the semiconductor and display industries; Pattern converters and systems performing advanced processing operations on electronic pattern data (data path); Laser-based equipment for measuring and inspecting photomasks, substrates, semiconductor discs (wafers), semiconductor wafers (chips), circuit boards (printed circuit boards), photo cells (photovoltaics) and glass panels for screens (displays); Electric apparatus and instruments for use in the surface mounting of electronic components and circuit boards; Solder paste printers (jet printers); Electric apparatus for applying solder paste and insulators (jet printers and dispensers); Electric apparatus for applying solder paste, glue and other viscous material (jet printers and dispensers); Ejectors for use in solder paste printers; measuring devices; testing apparatus and instruments; testing and quality control devices; testing apparatus for electronic equipment; computer component testing and calibrating machines; optical apparatus and instruments; computer software; computer hardware. Repair and maintenance services regarding machines, machine tools, apparatus, systems and instruments for treatment of material and for manufacturing; Installation services regarding machines, machine tools, apparatus, systems and instruments for treatment of material and for manufacturing; Repair and maintenance of machines, apparatus, systems and instruments for manufacturing photomasks, screens, semiconductors, circuit boards and computer chips, and for machines, apparatus and instruments for applying solder paste, insulators, glue and other viscous material; installation, repair or maintenance of measuring or testing machines and instruments. Technical research, development and design; technical consultancy and advice with regard to the manufacture of photomasks, screens, semiconductors, circuit boards and computer chips, and with regard to machines, apparatus and instruments for manufacturing photomasks, screens, semiconductors, circuit boards and computer chips, and for applying solder paste, insulators, glue and other viscous material, including data paths for pattern converters and systems hereto for performing advanced processing operations on electronic pattern data; technical consultancy and advice with regard to design and development of computer hardware and software for use in the aforesaid fields; technical measuring and testing; testing of apparatus; software as a service [SaaS] services within the field of electronics and surface mount technology.
A method of feeding a component tape towards a picking position of a component mounting machine is disclosed. The feeding is performed by means of a feeding mechanism configured to engage the component tape at an engaging position and to disengage the component tape at a disengaging position. The method comprises engaging the component tape at the engaging position, moving, by means of the feeding mechanism, the component tape from the engaging position to the disengaging position, disengaging the component tape at the disengaging position, and returning the feeding mechanism from the disengaging position to the engaging position and wherein the feeding mechanism moves the component tape in a linear motion between the engaging position and the disengaging position.
A method for controlling an ejector is disclosed, wherein the ejector comprises an actuator arrangement configured to eject a droplet of viscous medium onto a substrate, and wherein the droplet forms part of a sequence of a plurality of droplets. The method comprises obtaining a control parameter for controlling the operation of the actuator arrangement, and operating the actuator arrangement, using the control parameter, in order to eject the droplet. The obtained control parameter is based on at least one of: a time period between the droplet and a previous droplet in the sequence, a difference in target size of the droplet and a size of the previous droplet in the sequence, and the droplets position in the sequence.
H05K 3/12 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using printing techniques to apply the conductive material
H05K 3/34 - Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
A method, a system and an archive server for determining an illumination setting for capturing an image of a component, belonging to a specific package type, in a pick-and-place machine are provided. The method comprises capturing a first image of a first component of the specific package type while the first component is illuminated by a first illumination component, and capturing a second image of the first component while the first component is illuminated by a second illumination component, the second illumination component being different from the first illumination component. An illumination setting may then be determined by creating a plurality of generated images based on the first and second image of the first component, and selecting the generated image that fulfils a predetermined quality measure.
A device, a computer program, a computer readable medium and a method for controlling focus of a laser beam during a micro sweep are disclosed. The laser beam is received to an acousto-optic deflector, and acoustic waves are provided to the acousto-optic deflector. The acoustic waves are varied in frequency over time to vary a deflection angle of the laser beam over time thereby achieving the micro sweep of the laser beam. Furthermore, a rate of variation in frequency of the acoustic waves is adapted over a time of the micro sweep in such a way that differences in frequencies over the time of the micro sweep of the acoustic waves are caused in the acousto-optic deflector over a width of the laser beam in a direction parallel to the micro sweep when passing through the acousto-optic deflector, where the differences in frequencies over the time of the micro sweep are such that they cause a desired focus of the laser beam in a direction parallel with the micro sweep over the micro sweep.
A method for obtaining a compensation pattern for a workpiece patterning device comprises printing (S11) a calibration pattern with a plurality of simultaneously operating exposure beams being sweepable in a second direction according to calibration pattern print data having a multitude of edges. Positions of the edges are measured (S12). Deviations of the measured positions relative calibration pattern are calculated (S13). Each deviation is associated (S14) with a used exposure beam, with a sweep position and a grid fraction position. Edge compensating data is computed (S15) for adapting edge representations of pattern print data prior to printing to compensate for the calculated deviations. The edge compensating data is dependent on the used exposure beam, the sweep position, and the grid fraction position.
H01J 37/304 - Controlling tubes by information coming from the objects, e.g. correction signals
H01J 37/317 - Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
A rasterization method of patterns with periodic components for SLMs is presented, comprising obtaining (S10) of an original pattern, having a periodicity. A first pattern main period is determined (S21). Image area and a first pitch of imaged elements are obtained (S31). The original pattern is scaled (S41) by a first raster scaling factor. The scaled pattern is cropped (S51) to comprise a first integer number of repetitions of the pattern items presenting a periodicity in the first direction that is covered by the image area, giving a rasterized pattern adapted to the intended pattern generator. The rasterized pattern is associated with data representing the first scaling factor. A writing method comprises obtaining of the rasterized pattern. Elements of the SLM in the pattern generator falling outside the rasterized pattern are set to be disabled. The rasterized pattern is written with an optical scaling to a target surface.
The disclosed technology teaches a method of reducing the impact of cross-talk between transducers that drive an acousto-optic modulator. The method includes operating the transducers, which are mechanically coupled to an acousto-optic modulator medium, with different frequencies applied to adjoining transducers and producing a time-varying phase relationship between carriers on spatially adjoining modulation channels emanating from the adjoining transducers, with a frequency separation between carriers on the adjoining channels of 400 KHz to 20 MHz. The disclosed technology also includes operating 5 to 32 modulators, which are mechanically coupled to the acousto-optic modulator crystal, and varying the different frequencies applied to the modulators in a sawtooth pattern, varying the different frequencies over a range and then repeating variation over the range. Also included is varying the frequencies applied to the modulators in a rising or falling pattern applied progressively to the spatially adjoining transducers.
G02F 1/11 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the intensity, phase, polarisation or colour based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves
An offset alignment method for a micro-lithographic printing device comprises placing (S10) of an alignment target substrate. A target pattern presents areas of at least two different light reflectivities is defined relative an origin point. The alignment target substrate is illuminated (S20). Reflected light is measured (S30). A reflection image of the target pattern is created (S40) by the measured light. The illumination is made according to a test pattern of light, having areas with and without illumination. The test pattern is defined relative an origin point. A measured target pattern origin point is determined (S50) from target pattern associated features in the reflection image and a measured test pattern origin point is determined from test patterns associated features in the reflection image. An offset between a measured position and a written position is calculated (S60) from the measured target pattern origin point and the measured test pattern origin point.
A method for mounting a component (100) on a workpiece (106), the method comprising obtaining information regarding a surface topography of at least one of a mounting surface (102) of the component and a local surface (108) of the workpiece onto which the component is to be mounted. The method further comprises forming a plurality of deposits (110) of a viscous medium on at least one of the mounting and local surfaces, wherein each of the plurality of deposits has a height (/½,/½, h3) based on the obtained information, and is formed by individually applying at least one droplet (234) of the viscous medium (232) using non-contact dispensing. The method further comprises placing the component on the substrate, such that the plurality of deposits of viscous medium forms a connection between the component and the workpiece.
H05K 1/18 - Printed circuits structurally associated with non-printed electric components
H05K 3/32 - Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
H05K 3/34 - Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
H05K 3/12 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using printing techniques to apply the conductive material
60.
Recurring process for laser induced forward transfer and high throughput and recycling of donor material by the reuse of a plurality of target substrate plates or forward transfer of a pattern of discrete donor dots
The technology disclosed relates to high utilization of donor material in a writing process using Laser-Induced Forward Transfer. Specifically, the technology relates to reusing, or recycling, unused donor material by recoating target substrates with donor material after a writing process is performed with the target substrate. Further, the technology relates to target substrates including a pattern of discrete separated dots to be individually ejected from the target substrate using LIFT.
B29C 64/273 - Arrangements for irradiation using laser beamsArrangements for irradiation using electron beams [EB] pulsedArrangements for irradiation using laser beamsArrangements for irradiation using electron beams [EB] frequency modulated
B23K 26/082 - Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
B23K 26/352 - Working by laser beam, e.g. welding, cutting or boring for surface treatment
B23K 26/066 - Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
H05K 3/00 - Apparatus or processes for manufacturing printed circuits
H05K 3/20 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
A method for training a neural network to generate an image of an element of a printed circuit board "PCB", the method comprising generating a first image of at least part of an element of a PCB, the first image having a first resolution, generating at least one second image of the at least part of the element of the PCB, the second image having a second resolution lower than the first resolution, using the first image as a ground truth for the neural network, and using the at least one second image as input training data for the neural network.
A device configured to jet one or more droplets of a viscous medium may include a housing having an inner surface at least partially defining a jetting chamber configured to hold the viscous medium, and a flexible jetting nozzle. The flexible jetting nozzle may include a flexible conduit extending between an inlet orifice in an inner surface to an outlet orifice in an outer surface. The device may cause an increase of internal pressure of viscous medium in the jetting chamber to force one or more droplets of viscous medium through the flexible conduit and through the outlet orifice. The flexible jetting nozzle may include a flexible material. The flexible jetting nozzle may deform, to cause a cross-sectional area of the flexible conduit to dilate, in response to the increase of the internal pressure of the viscous medium in the jetting chamber.
B05C 5/02 - Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work from an outlet device in contact, or almost in contact, with the work
A device configured to jet one or more droplets of a viscous medium includes a housing at least partially defining a jetting chamber, a supply conduit that supplies the viscous medium into the jetting chamber, a jetting nozzle, an impacting device configured to force the one or more droplets of the viscous medium through the conduit of the jetting nozzle to be jetted as the one or more droplets, and a supply conduit actuator configured to adjust a hydrodynamic resistance of at least a portion of the supply conduit to viscous medium flow from the jetting chamber via the supply conduit, based on moving through the portion of the supply conduit, independently of the impacting device, to adjust a cross-sectional flow area of the portion of the supply conduit.
B05C 5/02 - Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work from an outlet device in contact, or almost in contact, with the work
B05C 11/10 - Storage, supply or control of liquid or other fluent materialRecovery of excess liquid or other fluent material
The present invention provides a mounting tool tip (1) arranged for being releasably mounted to a mounting tool (20) of a component mounting machine (60), said mounting tool (20) being rotatably arranged in said component mounting machine (60) around a vertical rotational axis (V). The mounting tool tip (1) comprises a tip portion (2) at a first end (3a) and arranged for engagement with a component (10) to be mounted in a component mounting machine (60); engagement means (4) for mounting said mounting tool tip (1) to said mounting tool (20). Further, the engagement means (4) is arranged at a second end (3b) opposite said first end (3a) and further configured such that said tip portion (2) is off-center in a horizontal direction compared to said rotational axis (V) when the mounting tool tip (1) is mounted to said mounting tool (20). The present invention further provides a mounting tool (20), a mount head (40), a component mounting machine (60) as well as a method for simultaneously picking at least two components (10) arranged in adjacent component tapes (11) in a component mounting machine.
The present invention provides a tape guide (1) for guiding a component tape (2) from a tape reel (3) to a picking position (4) of a component mounting machine (100). The tape guide (1) comprises a support structure (6) arranged for guiding the 5 component tape (2) from an upstream end portion (7) of the tape guide (1) to a downstream end portion (8) of the tape guide (1). The tape guide (1) further comprises a hook portion (9) arranged at the downstream end portion (8) and configured to grip a flange (3a) of said tape reel (3) when the tape guide (1) and tape reel (3) are removed from said component mounting machine (100). The present invention further provides a unit (20) comprising a tape guide, a tape reel and component tape as well as a component mounting machine (100).
A method and a system for providing operator information in an Surface Mount Technology (SMT) system comprising an SMT information database, a SMT pick and place machine and an identity tag scanner, the method comprising: receiving a bin in said SMT pick and place machine, wherein said bin is adapted to comprise vertically oriented bin load units, wherein said bin load unit has an pallet identity tag attached to the bin load units upwards facing surface; starting SMT production on said SMT pick and place machine; scanning individual identity tags attached to bin load units comprising component tape reels to obtain bin load units IDs.
A method for generating control instructions for operating an apparatus (1) forming a deposit of viscous medium (22) on a workpiece (23) is disclosed, comprising: obtaining (110) an environmental parameter affecting a rheological behaviour of the viscous medium; obtaining (120) a deposit parameter indicating a physical characteristic of the deposit to be formed by the viscous medium; and processing the environmental parameter and the deposit parameter through a neural network to generate (130) control instructions for use when operating the apparatus to form the deposit.
G05B 13/02 - Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
H05K 3/30 - Assembling printed circuits with electric components, e.g. with resistor
68.
LONG SWEEP LENGTH DUV MICROLITHOGRAPHIC BEAM SCANNING ACOUSTO-OPTICAL DEFLECTOR AND OPTICS DESIGN
The technology disclosed uses extreme beam shaping to increase the amount of energy projected through an AOD. First and second expanders and are described that are positioned before and after the AOD. In one implementation, the optical path shapes energy from a source, such as a Gaussian laser spot, deflects it, then reshapes it into a writing spot. In another implementation for image capture, rather than projection system, the disclosed optics reshape a reading spot from an imaged surface to a high-aspect ratio beam at an AOD exit, subject to deflection by the AOD. The optics reshape the radiation relayed by the high-aspect ratio beam through the AOD to a detector. Since light can travel in both directions through an optical system, the details described in terms of projecting a writing spot onto a radiation sensitive surface also apply to metrology sweeping a reading spot over an imaged surface. The most significant difference is using multiple detectors, such as a line camera, an area camera, a spectrometer, scatterometer or an interferometer could be used in a system that read from the workpiece instead of writing to it. All of the references that follow to a laser spot or writing spot are hereby extended to a reading spot.
A method for processing print data defining a pattern to be printed comprises obtaining (S10) of vector print data for the pattern to be printed. The vector print data is divided (S12) into vector print data of scan strips, wherein each scan strip is associated with a scan velocity. A skew transformation of the vector print data is performed (S14) in each scan strip. The skew transformation is performed in a direction opposite to respective scan velocity and with a magnitude proportional to a magnitude of the scan velocity. A method for printing a pattern, a device for processing print data and a printing device according to the same principles are also disclosed.
A method in an automated Surface Mount Device (SMD) warehouse configured to store bins at predetermined positions within said automated Surface Mount Device (SMD) warehouse, the method comprising receiving a bin at a port of said automated Surface Mount Device (SMD) warehouse and scanning an identity tag attached to said bin to obtain a bin ID.
G06F 7/00 - Methods or arrangements for processing data by operating upon the order or content of the data handled
B65G 1/137 - Storage devices mechanical with arrangements or automatic control means for selecting which articles are to be removed
G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
A system and method for surface mount assembly of PCB's, using an automated pick-and-place machine into which component tapes on reels are fed, uses component tape reels each of which has been pre-threaded into its appropriate tape guide and been stored as a reel/tape guide packet in an automated SMD storage tower, from which appropriate packets are retrieved for coupling to the pick-and-place machine.
H05K 13/00 - Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
H05K 13/08 - Monitoring manufacture of assemblages
B65D 19/00 - Pallets or like platforms, with or without side walls, for supporting loads to be lifted or lowered
B65D 85/62 - Containers, packaging elements or packages, specially adapted for particular articles or materials for stacks of articlesContainers, packaging elements or packages, specially adapted for particular articles or materials for special arrangements of groups of articles
B65G 1/06 - Storage devices mechanical with means for presenting articles for removal at predetermined position or level
The present invention provides a component mounting machine (1) comprising a picking tool (2) for picking electronic components (3) from a source (4) of electronic components and placing them onto a workpiece (5), a verification unit (6) for measuring an electrical property of an electronic component (3) picked and held by the picking tool (2). The verification unit (6) comprises a board (7), a plurality of test electrodes (8) arranged on a surface (9) of said board (7) and a system (10) for measuring an output signal from the test electrodes (8) upon contact between a picked electronic component (3) and at least two of said test electrodes (8). Further, at least one test electrode (8) is arranged on a flexible portion (11) of the board (7) that is configured to flex upon engagement between a picked electronic component (3) and said at least two test electrodes (8).
The technology disclosed relates to high utilization of donor material in a writing process using Laser-Induced Forward Transfer. Specifically, the technology relates to using a transparent cylinder with a light beam projected from inside the cylinder through the transparent wall onto donor material carried on the outer surface of the cylinder.
A jetting device configured to jet one or more droplets of a viscous medium through a nozzle may include an acoustic transducer configured to emit an acoustic signal that transfers acoustic waves into at least a portion of the viscous medium located in a viscous medium conduit a viscous medium conduit configured to direct a flow of the viscous medium to an outlet of the nozzle. The acoustic signal may be an ultrasonic signal. The acoustic signal may adjust one or more rheological properties of the viscous medium, based on acoustic actuation. The acoustic transducer may be implemented by an actuator of the device that is configured to move through an eject chamber to cause viscous medium to be jetted through the outlet of the nozzle as one or more droplets.
B41J 2/045 - Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
The present invention provides a storage unit for Surface Mount Technology (SMT) supplies, comprising a plurality of stacks having vertically stacked storage locations for SMT supplies, a terminal for inserting and receiving SMT supplies to and from said storage unit, a first collector arm for transporting SMT supplies between storage locations and said terminal, said collector arm being moveably arranged along said stacks so as to enable engagement with the vertically stacked storage locations of a stack. Further, the plurality of stacks are arranged in at least one cluster of two or more stacks in each cluster, wherein each stack of said at least one cluster is moveably arranged in relation to said collector arm so as to allow engagement of said collector arm with different stacks of the cluster upon movement of said two or more stacks in the cluster, thereby allowing said collector arm to engage storage locations of different stacks in said at least one cluster. The present invention further provides a method for operating a storage unit for SMT supplies.
A method, a system and an archive server for determining an illumination setting for capturing an image of a component, belonging to a specific package type, in a pick-and-place machine are provided. The method comprises capturing a first image of a first component of the specific package type while the first component is illuminated by a first illumination component, and capturing a second image of the first component while the first component is illuminated by a second illumination component, the second illumination component being different from the first illumination component. An illumination setting may then be determined by creating a plurality of generated images based on the first and second image of the first component, and selecting the generated image that fulfils a predetermined quality measure.
A method for controlling an ejector is disclosed, wherein the ejector comprises an actuator arrangement configured to eject a droplet of viscous medium onto a substrate, and wherein the droplet forms part of a sequence of a plurality of droplets. The method comprises obtaining a control parameter for controlling the operation of the actuator arrangement, and operating the actuator arrangement, using the control parameter, in order to eject the droplet. The obtained control parameter is based on at least one of: a time period between the droplet and a previous droplet in the sequence, a difference in target size of the droplet and a size of the previous droplet in the sequence, and the droplet's position in the sequence.
B05C 5/02 - Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work from an outlet device in contact, or almost in contact, with the work
B05C 11/10 - Storage, supply or control of liquid or other fluent materialRecovery of excess liquid or other fluent material
H05K 3/00 - Apparatus or processes for manufacturing printed circuits
The present disclosure provides a method for focusing of an optical beam during projection onto a photo-sensitive resist, including passing a first stream of gas from a domain of a first pressure (210) through a constriction (220) to a domain of a second pressure (230) lower than the first pressure; measuring the second pressure; passing a second stream of gas from the domain of the second pressure, through an opening connected to the domain of the second pressure and arranged at a first distance to projection optics for the optical beam, through a space (240) formed between a) the opening and b) a surface of the photo-sensitive resist, and into a domain of a third pressure (250) lower than the second pressure, and focusing the optical beam with respect to the photo-sensitive resist by adjusting at least one of the first distance and a second distance between the opening and the surface of the photo-sensitive resist based on the measured second pressure. Various devices and a pattern generating system is also provided.
The disclosed technology teaches a method of reducing the impact of cross-talk between transducers that drive an acousto-optic modulator. The method includes operating the transducers, which are mechanically coupled to an acousto-optic modulator medium, with different frequencies applied to adjoining transducers and producing a time-varying phase relationship between carriers on spatially adjoining modulation channels emanating from the adjoining transducers, with a frequency separation between carriers on the adjoining channels of 400 KHz to 20 MHz. The disclosed technology also includes operating 5 to 32 modulators, which are mechanically coupled to the acousto-optic modulator crystal, and varying the different frequencies applied to the modulators in a sawtooth pattern, varying the different frequencies over a range and then repeating variation over the range. Also included is varying the frequencies applied to the modulators in a rising or falling pattern applied progressively to the spatially adjoining transducers.
G02F 1/11 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the intensity, phase, polarisation or colour based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves
A method of feeding a component tape (100) towards a picking position (110) of a component mounting machine is disclosed. The feeding is performed by means of a feeding mechanism (130) configured to engage the component tape (100) at an engaging position (140) and to disengage the component tape (100) at a disengaging position (150). The method comprises engaging (510) the component tape (100) at the engaging position (140), moving (520, 530), by means of the feeding mechanism (130), the component tape (100) from the engaging position (140) to the disengaging position (150), disengaging (550) the component tape (100) at the disengaging position (150), and returning (560) the feeding mechanism (130) from the disengaging position (150) to the engaging position (140) and wherein the feeding mechanism (130) moves the component tape (100) in a linear motion between the engaging position (140) and the disengaging position (150).
The disclosed technology teaches a method of reducing the impact of cross-talk between transducers that drive an acousto-optic modulator. The method includes operating the transducers, which are mechanically coupled to an acousto-optic modulator medium, with different frequencies applied to adjoining transducers and producing a time-varying phase relationship between carriers on spatially adjoining modulation channels emanating from the adjoining transducers, with a frequency separation between carriers on the adjoining channels of 400 KHz to 20 MHz. The disclosed technology also includes operating 5 to 32 modulators, which are mechanically coupled to the acousto-optic modulator crystal, and varying the different frequencies applied to the modulators in a sawtooth pattern, varying the different frequencies over a range and then repeating variation over the range. Also included is varying the frequencies applied to the modulators in a rising or falling pattern applied progressively to the spatially adjoining transducers.
A component feeder (100) for guiding a component tape (101) towards a picking position (110) of a component mounting machine is provided. The component tape (101) comprises a carrier tape (210), a cover (220) and a plurality of sequentially arranged compartments (231, 232) carrying components (230) to be mounted by the component mounting machine. The exposure of components (230) to the picking position (110) is performed by means of an exposure member (120) configured to separate the cover (220) from the carrier tape (210) such that the components (230) are exposed at the picking position (110). Further, a support mechanism (130) is arranged to guide the component tape (101) between the support (130) and the exposure member (120), and a magnet (140) is arranged to cooperate with the support mechanism (130) to push the component tape (101) against the exposure member (120).
A jetting device configured to jet one or more droplets of a viscous medium through the outlet of a nozzle includes an energy output device. The energy output device is configured to direct a quantum of energy into at least a portion of the volume of the viscous medium jetted through the outlet to control a breaking of the droplet from the nozzle. The energy output device may include an acoustic transducer or a piezoelectric material or a laser emitter or a heater.
09 - Scientific and electric apparatus and instruments
Goods & Services
Machines, apparatus and instruments for manufacturing
displays, monitors, LCD displays and flat panel displays,
and parts of such machines; machines, apparatus and
instruments for manufacturing semiconductors, and parts of
such machines and apparatus; manufacturing machines for
photo masks, semiconductor wafers, integrated circuits,
computer chips and displays. Laser writers and pattern generators for producing photo
masks; laser writers and pattern generators for use within
the semiconductor and display industries; semiconductors;
semiconductor chips, semiconductor integrated circuits,
semiconductor memories and semiconductor devices; computer
chips; flat panel displays; electronic display units;
monitors; LCD displays; TV sets; measuring apparatus and
instruments and measuring machines; electric measuring,
control and supervision apparatus for producing photo masks
for displays and semiconductors.
A holder arrangement (10) for releasably holding a plurality of component feeders (20), configured to feed a component tape towards a picking position of a component mounting machine, is disclosed. The arrangement comprises a first mechanical interface (12) configured to releasably attach the plurality of component feeders to the holder arrangement, and a second mechanical interface (15) configured to releasably attach the holder arrangement to a component tape magazine (40) configured to be loaded into the component mounting machine, such that the component feeders are positioned to guide the component tape to the picking position. Furthermore, a method for handling at least one component feeder, is disclosed.
A jetting device may include a vacuum nozzle configured to direct a gaseous flow of a gaseous fluid in flow communication with a jetting outlet; a vacuum pump configured to draw the gaseous flow into the vacuum nozzle and further towards the vacuum pump via the vacuum nozzle outlet; and an inlet conduit between a vacuum nozzle inlet and the ambient environment, where the inlet conduit includes a control valve configured to control a flow rate of the gaseous flow through the vacuum nozzle outlet based on adjusting a smallest diameter of the inlet conduit between an open diameter and a constricted diameter. The open diameter may be greater than a smallest diameter of the suction hole. The gaseous flow may include a first gaseous flow into the vacuum nozzle via a suction hole and an adjustable second gaseous flow into the vacuum nozzle via the vacuum nozzle inlet.
H05K 3/12 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using printing techniques to apply the conductive material
B41J 2/165 - Prevention of nozzle clogging, e.g. cleaning, capping or moistening for nozzles
B41J 3/407 - Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
09 - Scientific and electric apparatus and instruments
Goods & Services
Machines for manufacturing LED displays, computer monitors, LCD displays and flat panel displays, and structural replacement parts of such machines; machines for manufacturing semiconductors, and structural replacements parts of such machines; manufacturing machines for photomasks, semiconductor wafers, integrated circuits, and computer chips Laser writers and pattern generators for producing photomasks; laser writers and pattern generators for use within the semiconductor and display panel industries; semiconductors; semiconductor chips, semiconductor integrated circuits, semiconductor memories and semiconductor devices; computer chips; flat panel display screens; electronic display units, namely, electronic display screens; monitors, namely, computer monitors and touchscreen monitors; LCD displays; TV sets; measuring apparatus and instruments, namely, lasers and electric or electronic sensors for measurement and quality control of photomasks, semiconductors and flat panel display screens; electric measuring, control and supervision apparatus, namely, measuring lasers and optical inspection apparatus for producing photomasks for displays and semiconductors
88.
Method and apparatus for jetting of viscous medium using impacting device
An ejector for jetting a viscous medium onto a substrate is disclosed. The ejector comprises a jetting chamber adapted to accommodate the viscous medium, a nozzle communicatively connected to the chamber, and an impacting device adapted to impact a volume of the viscous medium in the chamber such that viscous medium is jetted through the nozzle towards the substrate. The ejector may further comprise a rotating mechanism adapted to rotate the impacting device around a length axis of the impacting device such that shearing is induced in the viscous medium to be jetted. A corresponding system and method is also disclosed.
B05C 5/02 - Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work from an outlet device in contact, or almost in contact, with the work
B05C 11/10 - Storage, supply or control of liquid or other fluent materialRecovery of excess liquid or other fluent material
B05B 1/30 - Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to control volume of flow, e.g. with adjustable passages
B05B 17/06 - Apparatus for spraying or atomising liquids or other fluent materials, not covered by any other group of this subclass operating with special methods using ultrasonic vibrations
A method in an automated Surface Mount Device (SMD) warehouse configured to store bins at predetermined positions within said automated Surface Mount Device (SMD) warehouse, the method comprising receiving a bin at a port of said automated Surface Mount Device (SMD) warehouse and scanning an identity tag attached to said bin to obtain a bin ID.
G06F 7/00 - Methods or arrangements for processing data by operating upon the order or content of the data handled
B65G 1/137 - Storage devices mechanical with arrangements or automatic control means for selecting which articles are to be removed
G05B 19/418 - Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
The technology disclosed relates to developing an acousto-optic device (AOD) using an alpha-barium borate (αBBO) crystal. An AOD using αBBO enables high-resolution microlithographic patterning. The AOD includes a slab of αBBO coupled to an RF transducer that drives an acoustic wave through the crystal structure. A laser source emits a beam of light that is incident on the crystal surface. The propagated acoustic wave acts as a diffraction grating that diffracts the incident wave. Using an αBBO crystal allows for high resolution of light in the ultraviolet and visible spectra. The low speed of acoustic wave propagation through the crystal allows for more laser spots to be imaged than AODs made using other types of crystals.
G02F 1/29 - Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics for the control of the position or the direction of light beams, i.e. deflection
The technology disclosed relates to developing an acousto-optic device (AOD) using an alpha-barium borate (αBBO) crystal. An AOD using αBBO enables high-resolution microlithographic patterning. The AOD includes a slab of αBBO coupled to an RF transducer that drives an acoustic wave through the crystal structure. A laser source emits a beam of light that is incident on the crystal surface. The propagated acoustic wave acts as a diffraction grating that diffracts the incident wave. Using an αBBO crystal allows for high resolution of light in the ultraviolet and visible spectra. The low speed of acoustic wave propagation through the crystal allows for more laser spots to be imaged than AODs made using other types of crystals.
09 - Scientific and electric apparatus and instruments
Goods & Services
Machines, apparatus and instruments for manufacturing displays, monitors, LCD displays and flat panel displays, and parts of such machines; machines, apparatus and instruments for manufacturing semiconductors, and parts of such machines and apparatus; manufacturing machines for photo masks, semiconductor wafers, integrated circuits, computer chips and displays. Laser writers and pattern generators for producing photo masks; laser writers and pattern generators for use within the semiconductor and display industries; semiconductors; semiconductor chips, semiconductor integrated circuits, semiconductor memories and semiconductor devices; computer chips; flat panel displays; displays; monitors; LCD displays; TV sets; measuring apparatus and instruments and measuring machines; electric apparatus for producing photo masks for displays and semiconductors.
93.
Method and apparatus for controlling jet dispensing by displacement measurement
A method for jetting a viscous medium onto a substrate is disclosed. The method includes providing viscous medium to a jetting chamber of an ejector, operating an impacting device to impact a volume of the viscous medium in the chamber such that viscous medium is jetted through a nozzle, connected to the chamber, towards the substrate, and monitoring a displacement of the impacting device during impact. An ejector and a system comprising such an ejector and a control unit is also disclosed. The monitoring of the displacement allows for the operation of the impacting device to be controlled accordingly, thereby providing for an improved control of the jetting process.
B05B 12/08 - Arrangements for controlling deliveryArrangements for controlling the spray area responsive to condition of liquid or other fluent material discharged, of ambient medium or of target
B05B 1/08 - Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops of pulsating nature, e.g. delivering liquid in successive separate quantities
B05C 11/10 - Storage, supply or control of liquid or other fluent materialRecovery of excess liquid or other fluent material
B05C 5/02 - Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work from an outlet device in contact, or almost in contact, with the work
H05K 3/12 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using printing techniques to apply the conductive material
94.
JETTING DEVICES WITH ENERGY OUTPUT DEVICES AND METHODS OF CONTROLLING SAME
A jetting device configured to jet one or more droplets of a viscous medium (510) through the outlet (27) of a nozzle (26) includes an energy output device (500). The energy output device (500) is configured to direct a quantum of energy (590) into at least a portion (522) of the volume of the viscous medium (510) jetted through the outlet (27) to control a breaking of the droplet (524) from the nozzle (26). The energy output device may include an acoustic transducer or a piezoelectric material or a laser emitter or a heater.
B05C 5/02 - Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work from an outlet device in contact, or almost in contact, with the work
B05C 11/10 - Storage, supply or control of liquid or other fluent materialRecovery of excess liquid or other fluent material
B41J 2/04 - Ink jet characterised by the jet generation process generating single droplets or particles on demand
A method and system for adjusting an exposure member (30) of a tape guide (10) for guiding component tapes (20) in a component mounting machine are disclosed. The exposure member is adapted to expose components (1) at a picking position (17), wherein the components are position in sequentially arranged compartments provided on a component tape having a carrier tape (21) and a cover (22). The method comprises retrieving (710) information indicating the configuration of the compartments, retrieving an exposure member setting associated with the configuration of the compartments, and operating an actuator based on the exposure member setting such that the exposure member is laterally adjusted to bring the cover to one side of the compartment to expose the component at the picking position.
A jetting device configured to jet one or more droplets of a viscous medium through a nozzle may include an acoustic transducer configured to emit an acoustic signal that transfers acoustic waves into at least a portion of the viscous medium located in a viscous medium conduit a viscous medium conduit configured to direct a flow of the viscous medium to an outlet of the nozzle. The acoustic signal may be an ultrasonic signal. The acoustic signal may adjust one or more rheological properties of the viscous medium, based on acoustic actuation. The acoustic transducer may be implemented by an actuator of the device that is configured to move through an eject chamber to cause viscous medium to be jetted through the outlet of the nozzle as one or more droplets.
B41J 2/045 - Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
97.
JETTING DEVICES WITH VARIABLE AIR FLOW AND METHODS OF CONTROLLING AIR FLOW
A jetting device that is configured to jet droplets of a viscous medium through a jetting outlet of the jetting device on to a substrate may include a gaseous flow control element that may be controlled to control a flow rate of a gaseous flow through a flow guide of the jetting device. Where an actuator of a jetting device is controlled according to an actuator control sequence to jet a sequence of droplets the gaseous flow control element may be controlled according to a gaseous flow control sequence that corresponds to the actuator control sequence. The gaseous flow control element may be controlled based on processing sensor data received from a sensor device monitoring one or more portions of the jetting device.
H05K 3/00 - Apparatus or processes for manufacturing printed circuits
B05B 15/50 - Arrangements for cleaningArrangements for preventing deposits, drying-out or blockageArrangements for detecting improper discharge caused by the presence of foreign matter
B05C 5/02 - Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work from an outlet device in contact, or almost in contact, with the work
B05B 15/55 - Arrangements for cleaningArrangements for preventing deposits, drying-out or blockageArrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
B05B 17/06 - Apparatus for spraying or atomising liquids or other fluent materials, not covered by any other group of this subclass operating with special methods using ultrasonic vibrations
B05C 11/10 - Storage, supply or control of liquid or other fluent materialRecovery of excess liquid or other fluent material
H05K 3/12 - Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using printing techniques to apply the conductive material
B05B 7/04 - Spray pistolsApparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
B05B 15/555 - Arrangements for cleaningArrangements for preventing deposits, drying-out or blockageArrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids discharged by cleaning nozzles
B41J 2/045 - Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
98.
METHOD AND SYSTEM FOR DETERMINING COMPONENT ILLUMINATION SETTINGS
A method, a system and an archive server for determining an illumination setting for capturing an image of a component, belonging to a specific package type, in a pick- and-place machine are provided. The method comprises capturing a first image of a first component of the specific package type while the first component is illuminated by a first illumination component, and capturing a second image of the first component while the first component is illuminated by a second illumination component, the second illumination component being different from the first illumination component. An illumination setting may then be determined by creating a plurality of generated images based on the first and second image of the first component, and selecting the generated image that fulfils a predetermined quality measure.
H05K 13/08 - Monitoring manufacture of assemblages
99.
METHOD AND SYSTEM FOR MANUFACTURING A WORKPIECE BY PROVIDING FOR A TACKINESS OF A MIXTURE OF MATERIAL ADAPTED TO MODIFY ITS ELECTRICAL CONDUCTIVITY WHEN EXPOSED WITH ELECTROMAGNETIC RADIATION
A method for manufacturing a workpiece (100) is disclosed, comprising providing (805) a first chemical component adapted to modify its electrical conductivity by 106— 1016 times when exposed with electromagnetic radiation (E), and mixing (807) said first chemical component with a second chemical component. The second chemical component is added as an adhesive, thereby providing said mixture of material with a tackiness prior to curing of 0.05-10 N in order for an electronic component to adhere to the layer of said mixture during mounting of an electronic component. The method further comprises providing (810) a layer (120) of said mixture on at least a portion of a workpiece (110), patterning (830) the layer of said mixture by exposing the layer with electromagnetic radiation so as to form a pattern of first regions (122) having a first electrical conductivity and of second regions (124) having a second electrical conductivity, mounting (840) the electronic component (140) on the layer of said mixture, and curing (850) the mixture. A workpiece and system is also disclosed.
H05K 3/32 - Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
H05K 1/16 - Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
100.
Method, system and device for providing information on a display arranged on a carrier in a surface mount technology system
A method and a system for changing operator display data on a display unit/electronic label located on a carrier in a Surface Mount Technology (SMT) system performing the steps of providing a carrier in the form of a bin or trolley configured to carry a plurality of bin load units, wherein said carrier comprises a display unit/electronic label; receiving or retrieving input data related to said carrier and an ongoing or upcoming SMT job; presenting display data on said display unit/electronic label based on said received input data; and scanning at least one barcode associated with or arranged on said carrier.
