The present invention relates to a method for coating of substrates, especially substrates of the type cutting or forming tools, wherein the substrate is coated with at least one titanium nitride based layer deposited by using HiPIMS techniques adapted in such a manner that an exceptional high deposition rate and coating quality is attained. The coating process involving the deposition of a TiN coating layer comprising alloying chemical elements onto the substrate surface by using a magnetron sputtering process of the type HiPIMS, with power densities greater than 100 W/cm2abcxyzdee, where: o Me1 is one or more chemical elements, wherein Me1 is selected fulfilling the condition that if a target consisting of Me1 is used instead of a target consisting of Ti under application of the same coating process parameters, in particular same power density at the target and same nitrogen partial pressure, the discharge current produced by using the target consisting of Me1 is at least 30% lower than the discharge current produced by using the target consisting of Ti, o Me2 is one or both chemical elements selected from Si and B, o a+b+c = 1, 0.50 < a ≤ 0.95, 0.05 ≤ b+c < 0.50, 0 < b ≤ 0.30, 0 ≤ c ≤ 0.30, o x+y+z = 1, 0.50 < x ≤ 0.99, 0.01 ≤ y+z < 0.50, 0 ≤ y ≤ 0.30, preferably 0 < y ≤ 0.30, 0 ≤ z ≤ 0.30, o d+e = 1, 0.5 ≤ d ≤ 1, 0 ≤ e ≤ 0.5 o the sum of the contents of Ti, Me1 and Me2 is normalized to a total concentration 1, and the sum of the contents of N and C is normalized to total concentration of 1.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 30/00 - Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
This invention relates to a coating system to be used as thin film sensor, comprising a piezoresistive sensor element, wherein the piezoresistive sensor element is a layer embedded in the coating system, wherein the coating system is deposited on a surface of a substrate, preferably the substrate being a component or a tool or a part of a component or a part of a tool, wherein the piezoresistive sensor element comprises at least one hydrogen free tetrahedral amorphous carbon coating doped with X, i.e. a ta-C:X coating layer, where X is one or more chemical elements selected from the elements groups 13 and 15 of the periodic table of elements, preferably X is one or more from B, Al, Ga, In, Tl, N and P, wherein the ta-C:X coating layer exhibits an anisotropic gage factor.
G01L 1/18 - Measuring force or stress, in general using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material
01 - Chemical and biological materials for industrial, scientific and agricultural use
40 - Treatment of materials; recycling, air and water treatment,
Goods & Services
Chemical coatings consisting of inorganic chemical
substances, including layers with antibacterial action. Coating service for materials limiting wear by vacuum
process for industry, as well as application of layers with
antibacterial action.
4.
HYBRID CHEMICAL-PHYSICAL VAPOR DEPOSITION PROCESS FOR THE SYNTHESIS OF ENVIRONMENTAL BARRIER COATINGS
A manufacturing process for the synthesis of environmental barrier coating system (EBC) which protect Si-based Ceramic Matrix Composite (CMC) material against oxidation and volatilization at high temperatures is disclosed. The manufacturing process is carried out in vacuum and includes steps of depositing a silicon bond coat and an oxygen containing barrier coating. The process is supported by plasma, preferably through and arc discharge, which lead to full dissociation of the gas precursors such as silane. Plasma is as well used for pre-treatment of substrates in an uninterrupted process chain. A deposition system with essential vacuum and plasma components is disclosed as well as EBC coatings manufactured by the process.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C04B 35/80 - Fibres, filaments, whiskers, platelets, or the like
The present invention relates to a coated substrate, preferably a coated tool having excellent performances in a broad range of applications, in particular in cutting and/or forming applications. The coated substrate being coated with a coating system comprising an AlCrN bottom layer and an AlCrSiN upper layer.
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 14/32 - Vacuum evaporation by explosionVacuum evaporation by evaporation and subsequent ionisation of the vapours
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
6.
METHOD AND DEVICE FOR SYNTHESIS OF HIGHLY INSULATING COATINGS
The invention relates to a coating chamber with a hollow discharge anode (HDA) forming body connected electrically insulating and vacuum tight to an opening of the coating chamber, wherein the inner surface of the body comprises a hollow space with an opening to the hollow space, wherein the interior surfaces of the body are at least partially constructed to be electrically conducting and the opening to the hollow space is attached to the opening of the coating chamber so that a gas exchange between the hollow space and the coating chamber is enabled, whereby distanced from the opening of the hollow space at least one gas supply is foreseen through the body into the hollow space, the opening between the coating chamber and the body is limited in size by an orifice. The invention also covers a coating process using the mentioned coating chamber.
C23C 16/503 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges
The present invention relates to a TiAlBSiN coating deposited on a surface of a substrate (1), the coating (100) comprising three different coating sections along its coating thickness, a first section (5), a second section (10) and a third section (50), said first section (5) deposited closer to said surface of the substrate (1) than the second and third sections, said second section (10) deposited directly on the outermost surface of said first section (5), and a third section (50) deposited directly on the outermost surface of said second section (10), wherein said first section (5) formed of one or more layers, in any case formed by at least one adhesion layer, wherein the first section (5) exhibiting fully crystalline cubic phase, or exhibiting a mixture of crystalline phases comprising crystalline cubic phase, and crystalline hexagonal wurtzite phase, wherein if a mixture of crystalline phases, exhibiting mainly cubic phase, and the at least one adhesion layer comprising titanium and nitrogen; and wherein said second section (10) formed of one or more layers, in any case formed by at least one support layer, wherein the second section (10) exhibiting fully crystalline hexagonal wurtzite phase, or exhibiting a mixture of crystalline phases comprising crystalline cubic phase and crystalline hexagonal wurtzite phase, wherein if a mixture of crystalline phases, exhibiting mainly wurtzite phase, and the at least one support layer being comprising titanium, aluminum, nitrogen, and at least one chemical element selected from boron and silicon; and wherein said third section (50) formed of one or more layers, in any case formed by at least one functional layer, wherein the third section (50) exhibiting fully crystalline cubic phase, or exhibiting a mixture of crystalline phases comprising crystalline cubic phase and crystalline hexagonal wurtzite phase, wherein if a mixture of crystalline phases, exhibiting mainly cubic phase, and wherein the at least one functional layer comprising titanium, silicon and nitrogen.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 14/32 - Vacuum evaporation by explosionVacuum evaporation by evaporation and subsequent ionisation of the vapours
C23C 30/00 - Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
8.
AL-RICH ALCRN-BASED COATINGS FOR BROAD RANGE OF APPLICATIONS
AlCrN-based coating, comprising: - an Al-rich AlCrN layer (40) having a chemical element composition corresponding to the formula AlxCr1-xN, with x being a coefficient corresponding to the concentration of aluminum in atomic concentration in the Al-rich AlCrN layer, when only aluminum and chromium are considered for the calculation, - a non-Al-rich AlCrN layer (20) having a chemical element composition corresponding to the formula AlyCr1-yN, with y being a coefficient corresponding to the concentration of aluminum in atomic concentration in the non-Al-rich AlCrN layer, when only aluminum and chromium are considered for the calculation, and - an Al-variable AlCrN layer (30) having a chemical element composition corresponding to the formula AlzCr1-zN, with z being a coefficient corresponding to the concentration of aluminum in atomic concentration in the Al-variable AlCrN layer, when only aluminum and chromium are considered for the calculation, wherein: - the Al-variable AlCrN layer (30) is deposited as transition layer between the non- Al-rich AlCrN layer (20) and the Al-rich AlCrN layer (40), and - x is in a range of 0.76 < x ≤ 0.82, and - y is in a range of 0.60 ≤ y ≤ 0.76, and - z is in a range of 0.60 ≤ y ≤ 0.82.
The present invention relates to a coated article comprising a coated surface, the coated surface consisting of a substrate and a coating system, the coating system comprising at least one protective layer consisting of one or more transition metal borides and one dopant element, wherein:
the protective layer having chemical element composition defined by the formula TMxBySiq, where TM is one or more transition metal elements selected from the group formed by Chromium, Cr, and Hafnium, Hf, Si is Silicon and is present in the protective layer as the dopant element, B is Boron, x is the concentration in atomic percent of TM in the protective layer, y is the concentration in atomic percent of B in the protective layer, and q is the concentration in atomic percent of Si in the protective layer, where x+y+q=1, 0.15≤×≤0.33, 0.40≤y≤0.67, and 0.1≤q≤0.40, and
the atomic concentration ratio of boron to the transition metals in the protective layer is higher or equal to 2, i.e. y/x≥2, and
the protective layer exhibits an AlB2 crystal structure.
The present invention relates to a coated substrate having a coated surface being formed by a surface of a substrate (1) and a coating provided on said substrate surface, the coating comprising at least one Si-containing coating film (200) and a base coating film (100) deposited between the substrate (1) and the Si-containing coating film (200), characterized in that, the base coating film (100) is applied between the substrate (1) and the Si-containing coating film (200), wherein the Si-containing coating film (200) comprises at least two Si-containing layers, a first Si-containing layer (210) and a second Si-containing layer (220), wherein the first Si-containing layer (210) is deposited closer to the base coating film (100) than the second Si-containing layer (220). Furthermore, the present invention relates to a method for producing a coated substrate.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
C23C 14/02 - Pretreatment of the material to be coated
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
09 - Scientific and electric apparatus and instruments
17 - Rubber and plastic; packing and insulating materials
Goods & Services
Fire protection screens, namely, thermal screens for
batteries and batteries with thermal screens for protection
against fire. Insulation for heat protection, sealing and insulating
materials, synthetic insulating materials for thermal
protection of batteries, foam for thermal screens.
A surface-coated cutting tool having a substrate and a hard coating film formed on the surface of the substrate, wherein the hard coating film has a lower layer made of AlCrXZ film, an intermediate layer consisting of alternating laminated films of layer A made of AlCrX'Z film and layer B made of AlCrBWX''Z film, and an upper layer made of TiSiX'''Z film, the lower layer and the intermediate layer have crystalline structures preferentially oriented in the (111) plane of the face-centered cubic structure, and the upper layer has a crystalline structure preferentially oriented in the (200) plane of the face-centered cubic structure.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
C23C 30/00 - Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
13.
OVERLAY COATING RESISTANT TO MOLTEN CALCIUM-MAGNESIUM-ALUMINO-SILICATE
A CMAS resistant overlay coating including at least one CMAS resistant layer, wherein the overlay coating is i. disposed over a surface of a substrate including a material susceptible to CMAS corrosion, ii. includes a metal oxide matrix and iii. has at least partially a vertical columnar structure. Moreover, at least one non-oxidized metallic constituent selected from the group of aluminum, chromium and metallic constituents including aluminum and chromium is embedded in the metal oxide matrix. Furthermore, a substrate has a CMAS resistant overlay coating at issue on a surface of a material susceptible to CMAS corrosion. A CAE process is provided for forming such a CMAS resistant overlay coating on a surface of a material susceptible to CMAS corrosion.
A method for suppressing anode overgrowth in an arc-beam PICVD coating system, wherein during at least part of a coating process of the arc-beam PICVD coating system, the arc-beam is scanned over at least part of a surface of the anode. Further, the invention relates to an arc-beam PICVD coating system for coating parts.
C23C 16/50 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
C23C 16/52 - Controlling or regulating the coating process
15.
TM-DIBORIDE BASED COATINGS EXHIBITING ENHANCED OXIDATION STABILITY AT HIGH TEMPERATURES
22-structure type of TM122 and having a chemical composition in atomic percentage corresponding to TM1aaTM2bcdd, wherein: • TM1 = Ti or Cr, • TM2 = Ta or Mo, • 15 ≤ a ≤ 35, preferably 20 ≤ a ≤ 30, • 5 ≤ b ≤ 15, preferably 5 ≤ b ≤ 10, • 10 ≤ c ≤ 30, preferably 10 ≤ c ≤ 20, • 35 ≤ d ≤ 65, preferably 40 ≤ d ≤ 60.
H01J 37/34 - Gas-filled discharge tubes operating with cathodic sputtering
C04B 35/00 - Shaped ceramic products characterised by their compositionCeramic compositionsProcessing powders of inorganic compounds preparatory to the manufacturing of ceramic products
A superalloy target wherein the superalloy target has a polycrystalline structure of random grain orientation, the average grain size in the structure is smaller than 20 μm, and the porosity in the structure is smaller than 10%. Furthermore, the invention includes a method of producing a superalloy target by powder metallurgical production, wherein the powder-metallurgical production starts from alloyed powder (s) of a superalloy and includes the step of spark plasma sintering (SPS) of the alloyed powder (s).
C22C 1/04 - Making non-ferrous alloys by powder metallurgy
B22F 3/087 - Compacting only using high energy impulses, e.g. magnetic field impulses
B22F 3/105 - Sintering only by using electric current, laser radiation or plasma
B22F 5/04 - Manufacture of workpieces or articles from metallic powder characterised by the special shape of the product of turbine blades
B22F 9/04 - Making metallic powder or suspensions thereofApparatus or devices specially adapted therefor using physical processes starting from solid material, e.g. by crushing, grinding or milling
B32B 15/00 - Layered products essentially comprising metal
B32B 15/01 - Layered products essentially comprising metal all layers being exclusively metallic
C22C 1/047 - Making non-ferrous alloys by powder metallurgy comprising intermetallic compounds
C22C 19/03 - Alloys based on nickel or cobalt based on nickel
C22C 19/07 - Alloys based on nickel or cobalt based on cobalt
C23C 14/00 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
C23C 14/02 - Pretreatment of the material to be coated
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
C23C 28/02 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of metallic material
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 30/00 - Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
F01D 5/28 - Selecting particular materialsMeasures against erosion or corrosion
F01D 25/00 - Component parts, details, or accessories, not provided for in, or of interest apart from, other groups
A coated tool of the present invention includes a base material; and a hard coating film on the base material. The hard coating film is a nitride or carbonitride which contains aluminum (Al) of 65 atomic % or more and 90 atomic % or less and titanium (Ti) of 10 atomic % or more and 35 atomic % or less with respect to a total amount of metal (including metalloid) elements, and have a face-centered cubic structure. In the X-ray intensity distribution of the α axis of the positive pole figure with respect to the (111) plane of the face-centered cubic structure, the hard coating film have a maximum intensity Ia in the α angle range of 80° to 90° and an intensity in the α angle range of 0° to 70° is 30% or less of the Ia.
The present invention relates to a coating that includes at least an optically absorbing metal oxide and/or oxynitride deep black layer deposited directly onto the surface of the part to be coated. In another embodiment, the deep black layer is deposited on a metallic adhesion-promoting layer, followed by a hard and optically transparent oxynitride layer. The foregoing coatings may be deposited by a reactive magnetron sputtering method and exhibit enhanced thermal stability at temperatures above 400°C.
C23C 14/54 - Controlling or regulating the coating process
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
A44C 27/00 - Making jewellery or other personal adornments
A battery half-cell comprising a copper foil, a lithium anode layer deposited on a surface of the copper foil and a capping layer, preferably a conformal capping layer, deposited on the lithium anode layer. The lithium anode layer comprises vertical structures such as columnar structures and/or grid structures.
wherein the housing (5) has an opening (7) on a wall substantially parallel to the scanning direction, such that the shaft of the tool provided with a DMC and/or barcode can be inserted perpendicular to the scanning direction into the scanning area for scanning.
G06K 7/10 - Methods or arrangements for sensing record carriers by electromagnetic radiation, e.g. optical sensingMethods or arrangements for sensing record carriers by corpuscular radiation
G06K 7/14 - Methods or arrangements for sensing record carriers by electromagnetic radiation, e.g. optical sensingMethods or arrangements for sensing record carriers by corpuscular radiation using light without selection of wavelength, e.g. sensing reflected white light
21.
ARC-BEAM POSITION MONITORING AND POSITION CONTROL IN PICVD COATING SYSTEMS
A method to stabilize position and shape of a plasma beam established between a cathode and an anode, where an electrical field is established between the cathode and the anode and where the shortest electrical field line between the cathode and the anode defines a reference line, wherein at least one oriented electromagnetic coil is provided and the at least one oriented electromagnetic coil has its coil axis oriented in a non-colinear manner to the reference line in such a way that at least one of the straight lines which are intersecting both of the coil openings and which are parallel to the coil axis intersects with the reference line and where a current is sent through the at least one oriented electromagnetic coil in order to establish a magnetic field which is used to deflect or attract the plasma beam.
C23C 16/513 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
C23C 16/52 - Controlling or regulating the coating process
22.
WEAR RESISTANT COATING PRODUCED FROM AT LEAST TWO DIFFERENT ALCR-BASED TARGETS
Coating system deposited on a surface of a substrate including an under coating film, an interjacent coating film deposited as a multi-layered film, including a plurality of A-layers and a plurality of B-layers deposited alternating one on each other forming a A/B/A/B/A . . . architecture, the A-layers including aluminium chromium and optionally one or more dopant elements and the B-layers including aluminium chromium nitride and one or more dopant elements.
A hard carbon coating and a method to improve its adhesion on components and tools subjected to high loads or subjected to extreme friction, wear and contact with other parts. The metal carbide transition layer is situated between the adhesivepromoting layer deposited directly onto the substrate surface and a top hard carbon coating. The metal carbide transition layer has a denser microstructure and improved mechanical properties in order to resist failure by spalling.
A device and method for a stable plasma treatment of components, in particular of large components of individual weights between 500 kg and 40 t, the device comprising a treatment chamber in the form of a lying cylinder with at least one lateral cylinder cover, and a special sealing system, the device and method allowing a stable plasma treatment of such components, in particular of large tools such as for example large forming tools.
F27B 5/04 - Muffle furnacesRetort furnacesOther furnaces in which the charge is held completely isolated adapted for treating the charge in vacuum or special atmosphere
C21D 1/09 - Surface hardening by direct application of electrical or wave energySurface hardening by particle radiation
C21D 1/773 - Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material under reduced pressure or vacuum
C23C 8/02 - Pretreatment of the material to be coated
C23C 8/36 - Solid state diffusion of only non-metal elements into metallic material surfacesChemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
01 - Chemical and biological materials for industrial, scientific and agricultural use
40 - Treatment of materials; recycling, air and water treatment,
Goods & Services
Hard chemical coatings made from inorganic chemical
combinations. Services for applying coatings of hard materials deposited
by a vacuum process for use in industry.
26.
Method to produce high corrosion and wear resistant cast iron components by water jet surface activation, nitrocarburization and thermal spray coating
The invention relates to a method of producing a corrosion resistant coating system on a cast iron substrate preferably in the shape of a brake disc, the coating system being completed by a thermally sprayed top layer, characterised in that the cast iron substrate is first subjected to activation by means of a pulsed water jet after completion of machining which increases the surface roughness of the surface thus treated, whereupon the surface is nitrocarburized so that a corresponding diffusion layer is formed on it, whereupon the surface is subjected to an oxidation process in a next step and only then the top layer is applied by thermal spraying.
The present invention relates to a coating for forming tools to be used in a forming operation of a workpiece material, wherein the coating is deposited on a substrate surface and the coating comprises a lower layer (10) and an upper layer (20), wherein the lower layer (10) is deposited closer to the substrate surface than the upper layer (20), wherein the lower layer (10) mainly comprises chromium nitride, and the upper layer (20) is deposited as multilayer formed by a plurality of A-layers (22) and B-layers (21) deposited alternate one on each other forming a sequence of . . . /A/B/A/B/A/B/ . . . -layers (22,21), wherein the A-layers (22) mainly comprise aluminum titanium nitride, and the B-layers (21) mainly comprise chromium nitride.
The invention relates to a coating method for depositing a coating system (S) on a substrate (1), wherein at least one HiPIMS layer (HS) and one DCMS layer (DS) are deposited on the substrate (1) by means of magnetron sputtering. In the method, a process chamber (3) which can be evacuated, contains a sputtering gas (2, 21, 22), has an anode and a magnetron (4) formed as a cathode, comprising a magnetic field source (41) and a primary target (42) with a coating material (43), is provided. According to the invention, one and the same primary target (42) is used to deposit, in any order and alternately one after the other, the HiPIMS layer (HS) by means of an HiPIMS sputtering method in a HiPIMS mode using a sequence consisting of a plurality of HiPIMS discharge pulses (5) of high power density with a pulse duration (τ1) having at least one atomic layer of the coating material (43), and the DCMS layer (DS) by means of a pulsed and/or non-pulsed DCMS sputtering method in a DCMS mode using a DCMS discharge pulse (6) of low power density with a pulse duration (τ2) in order to form the DCMS layer (DS) from the coating material (43).
A multilayer coating exhibits good corrosion resistance and good abrasion resistance. The multilayer coating includes layers A and layers B deposited forming a sequence of the type . . . A/B/A/B/A . . . , with the layers A being CrN-based layers or CrN layers and the layers B being CrON-based layers or CrON layers. The multilayer coating exhibits a modulated ratio of the thicknesses of the A layers and B layers, in a manner that the multilayer coating comprises at least two different coating portions along the whole multilayer coating thickness, with differently adjusted ratio of the thicknesses of the A layers and B layers.
This invention relates to a coating comprising at least one AlTiN-based film deposited by means of a PVD process, wherein the at least one AlTiN-based film deposited is comprising an Al-content—in relation to the Ti-content—in atomic percentage higher than 75%, and wherein the AlTiN-based film exhibits solely a crystallographic cubic phase and internal compressive stresses and this invention relates to a method involving deposition of an AlTiN-based film.
A method for producing a selective diamond-coated substrate, wherein the diamond-coated substrate includes: a substrate having surfaces including cemented carbide material, areas selected to be coated, and areas not selected to be coated; and one or more diamond coatings on the areas selected to be coated, the method including following steps in order: a first masking step, wherein the areas not selected to be coated but could be chemically attacked during a chemical pre-treatment step, are masked by applying a latex-mask covering these areas; one or more chemical pre-treatment steps; a mask-removing step, wherein the latex-mask is removed; a second masking step, wherein the areas of the substrate surfaces from which the latex-mask was removed and not selected to be coated but could be coated with one or more diamond coatings during one or more coating steps, are covered with one or more masking-covers; and one or more coating steps.
C23C 16/04 - Coating on selected surface areas, e.g. using masks
C23C 16/02 - Pretreatment of the material to be coated
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
32.
COATING FOR THERMALLY AND ABRASIVELY LOADED TURBINE BLADES
A method for coating a substrate surrounding a gas turbine blade, including the following steps: in a first step, a MCrAlY matrix is applied by means of a PVD method; in a further step, an oxide layer is applied by means of a PVD method.
F01D 5/28 - Selecting particular materialsMeasures against erosion or corrosion
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
33.
HARD CUBIC AL-RICH ALTIN COATING LAYERS PRODUCED BY PVD FROM CERAMIC TARGETS
A PVD coating process, preferably an arc evaporation PVD coating process for producing an aluminum-rich AlxTi1-xN-based thin film having an aluminium content of >70 at-% based on the total amount of aluminium and titanium in the thin film, a cubic crystal structure and an at least partially non-columnar microstructure with a non-columnar content of >1 vol-% based on the volume of the total microstructure, wherein ceramic targets are used as material source for the aluminium-rich AlxTi1-xN-based thin film.
A spring holder having an elastically deformable latching arrangement and an elastically deformable clamping arrangement; wherein the spring holder is able to be latchingly coupled to a workpiece carrier via the latching arrangement; and the clamping arrangement has an elastically deformable clamping tab, via which, in a clamping position, a retaining force is able to be exerted on a workpiece via a clamping region when the spring holder is coupled to the workpiece carrier, such that the workpiece is able to be frictionally coupled to the spring holder via a clamping face bearing on the clamping region and thus is able to be removably fixed to the workpiece carrier.
Method for the production of a Mo—N-based coating structure, including: providing a substrate to be coated and applying a hard material layer on the substrate, wherein the hard material layer includes at least one layer of Mo—N having a hexagonal crystal structure and at least one layer of Mo—N having a cubic crystal structure or a mixed hexagonal/cubic crystal structure, wherein the hard material layer is applied by a low temperature closed field unbalanced reactive magnetron sputtering coating process.
The invention relates to a coated substrate, preferably coated tool for use in manufacturing processes, such as machining processes or forming processes, comprising a coated surface, said coated surface formed by a substrate surface made of a first material (1) and a coating system, preferably an arc-PVD-deposited coating system, applied on said substrate surface, said coating system comprising an amorphous carbon film (100), wherein the amorphous carbon film (100) is a tetrahedral hydrogen-free amorphous carbon film in which the share of the sp3bond percentages of the C-C bonds exceeds that of the sp2 bond percentages. The invention further relates to a method.
The invention relates to a layer system coated on a substrate, the layer system comprising a functional layer and an intermediate layer, the intermediate layer being disposed between the substrate and the functional layer, the functional layer comprising both the elements aluminum and silicon but not necessarily in elemental form, and the functional layer comprising oxygen or nitrogen or both, characterized in that the intermediate layer comprises, measured in at %, percent more silicon and/or percent more aluminum than the functional layer.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 16/50 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
A device to be used within a plasma etching chamber for the manufacturing of semiconductor components, including providing a body forming the substrate of the device, applying a first coating on the surface of the body, wherein the first coating includes a metal and/or a metal alloy thin film coating layer in order to form a metal coated body, applying a second coating on the metal coated body, wherein the second coating includes a ceramic coating layer, wherein the second coating at least partially overlaps with the first coating.
H01L 21/683 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping
A substrate with a surface wherein the surface at least comprises an area which is coated with a coating having antibacterial and/or antiviral and/or antifungal properties. The coating includes an optional first layer, a second layer, and preferably a third layer, wherein the second layer is a hard layer comprising Ag and/or Cu, the optional first layer is located between the substrate body and the second layer, and the third layer is a top layer forming the outer surface of the area and which is tailored to allow Ag and/or Cu ions to leave the surface in a predetermined manner.
C23C 16/06 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
The present invention relates to a forming tool and a method for producing the forming tool, wherein the forming tool comprises a substrate surface to be used as a functional surface, the functional surface being coated with a coating, wherein the coating comprises a kappa-alumina layer as a functional layer.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 16/02 - Pretreatment of the material to be coated
B23B 27/14 - Cutting tools of which the bits or tips are of special material
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
C23C 30/00 - Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
41.
AL-RICH ALTIN COATING LAYERS PRODUCED BY PVD FROM METALLIC TARGETS
A coating layer and a method for producing thereof, wherein the coating layer includes Al, Ti and N as main components according to formula (AlaTib)xNy, where a and b are respectively the concentration of aluminium and titanium in atomic ratio considering only Al and Ti for the calculation of the element composition in the layer, whereby a+b=1 and 0≠a≥0.7 and 0≠b≥0.2, and where x is the sum of the concentration of Al and the concentration of Ti, and y is the concentration of nitrogen in atomic ratio considering only Al, Ti and N for the calculation of the element composition in the layer, whereby x+y=1 and 0.45≤x≤0.55, and wherein the coating layer exhibits 90% or more of fcc cubic phase, and compressive stress of 2.5 GPa or more, preferably between 2.5 GPa and 6 GPa.
An article including: a substrate; and a protective film overlaying at least part of the substrate, the film including a fluorinated metal oxide, containing one or more elements of the Group III and/or Group IV elements of the periodical system of elements, characterized in that the protective film includes the fluorinated metal oxide with a carbon doping with a carbon concentration not lower than 0.1 at % and not higher than 10 at %, preferably not lower than 0.5 at % and more preferably not higher than 2.5 at %, wherein the article is a plasma etch chamber component and/or part and preferably an article of the group formed by electrostatic chuck, a ring, a process kit ring, a single ring, a chamber wall, a shower head, a nozzle, a lid, a liner, a window, a baffle or a fastener.
C23C 16/455 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 16/02 - Pretreatment of the material to be coated
43.
AL-RICH ALCRN COATING LAYERS PRODUCED BY PVD FROM METALLIC TARGETS
A coating layer and a method for producing thereof, wherein the coating layer includes Al, Cr and N as main components according to formula (AlaCrb)xOyCzNq, where a and b are respectively the concentration of aluminium and chromium in atomic ratio considering only Al and Cr for the calculation of the element composition in the layer, whereby a+b=1 and 0≠a≥0.7 and 0≠b≥0.2, and where x is the sum of the concentration of Al and the concentration of Cr, and y, z and q are the concentration of oxygen, carbon and nitrogen respectively in atomic ratio considering only Al, Cr, O, C and N for the calculation of the element composition in the layer, whereby x+y+z+q=1 and 0.45≤x≤0.55, 0≤y≤0.25, 0≤z≤0.25, and wherein the coating layer exhibits 90% or more of fcc cubic phase, and compressive stress of 2.5 GPa or more, preferably between 2.5 GPa and 6 GPa.
According to the present invention a non-hydrogenated amorphous carbon coating such as an a-C and/or ta-C coating on a surface of a sliding part is disclosed, wherein the sliding part is foreseen for use under lubricated conditions and occasionally under dry running conditions. The coating is applied on a ceramic surface, such as for example surfaces comprising silicon carbide (SiC), carbon containing silicon carbide (SiC-C); silicon embedded silicon carbide (Si-SiC), tungsten carbides (WC), and combinations of previously mentioned materials.
The present invention relates to the use of dry electrolytes to strip vapor or thermal spray deposition coated metal surfaces through ion transport, characterized in that the conductive liquid of the dry electrolyte comprises at least a sulfonic acid.
An apparatus for coating a component. The apparatus includes a chamber. A first magnetron and a second magnetron are disposed within the chamber for supplying a coating material to a surface of the component. A component holder is disposed within the chamber and is configured to hold the component. The first magnetron and the second magnetron are configured to be positioned and oriented adjacent the surface of the component held by the component holder and the first and second magnetrons are configured to move with respect to the component holder or the component holder is configured to move with respect to the first and second magnetrons during coating of the component.
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
H01J 37/34 - Gas-filled discharge tubes operating with cathodic sputtering
C23C 14/56 - Apparatus specially adapted for continuous coatingArrangements for maintaining the vacuum, e.g. vacuum locks
The invention relates to a rotor blade (30) in a gas turbine engine (50) characterized by a coating (10) on a blade tip (20) of the rotor blade (30) comprising an oxidation resistant abrasive layer (11) and the rotor blade tip (20) having at least partially an oriented surface (21) with a normal vector (22) with a component (23) in the rotational direction of the rotor blade (R). The invention further relates to a method of manufacturing the rotor blade (30) and a gas turbine engine (50) with the rotor blade (30).
The invention relates to a method for manufacturing a solid-state battery (2) comprising the steps of preparing (100) a cathode (4), preparing (400) an anode (6), and preparing (200) a solid-state electrolyte (8) to be disposed between the cathode (4) and the anode (6), wherein the solid-state electrolyte (8) is prepared by means of a coating process, wherein the coating process comprises PVD coating.
A surface coating for protecting substrates with Ti—Al material, preferably comprising one or more of the materials from table 1, wherein the coating comprises a layer sequence with at least one layer which forms a diffusion barrier for Ti, preferably according to one or more of the layer sequences specified in table 1 in rows, and wherein the coating comprises an oxidation barrier which is in particular adjusted to the diffusion barrier and preferably adjusted according to table 2, and in particular wherein the surface coating comprises a thermal barrier which is preferably adjusted to the oxidation barrier according to table 3.
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
50.
METHOD TO PRODUCE HIGH CORROSION AND WEAR RESISTANT CAST IRON COMPONENTS BY USING LASER CLADDING
A method to produce a wear and corrosion resistant coating system onto a surface of a substrate, preferably a brake disc, comprising the following steps:
(1) providing the substrate having the surface made of an iron-based material or a steel material,
(2) selecting a dedicated material for producing one or more coating layers of the coating system,
(3) producing onto the substrate surface one or more coating layers of the coating system by using a laser cladding process, wherein the dedicated material selected in step (2) is used as source material for the production of the coating layers, and positioning a laser beam with respect to the substrate surface in such a manner that a coating angle is formed between the laser beam and the substrate surface, and maintaining this coating angle during the production of the one or more coating layers at a value between 10° and 30°.
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 14/32 - Vacuum evaporation by explosionVacuum evaporation by evaporation and subsequent ionisation of the vapours
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
52.
DEVICE FOR SEALING PARTS OF A WORKPIECE FOR SURFACE TREATMENT OF SELECTED SURFACES OF THE WORKPIECE
Device and method for holding a workpiece (1) during surface treatment of the workpiece (1) by using a fluid and/or a gaseous medium, the workpiece (1) comprising a treatable surface (2), a non-treatable surface (3) and an intermediate surface (10) in between of the treatable surface (2) and the non-treatable surface (3), the device comprising a covering component (7) for covering the non-treatable surface area (3) of the workpiece (1), said covering component (7) comprising a hollow chamber (8) and an opening (51) for receiving the non-treatable surface (3), wherein the covering component (7) comprising a sealing-acting surface (6) that is in contact with the intermediate surface (10) of the workpiece (1) when the non-treatable surface (3) is placed in the interior of the ho|low chamber (8), wherein the sealing-acting surface (6) of the covering component (7) is designed to fit the intermediate surface (10) of the workpiece (1) in such a manner that the interaction between the sealing-acting surface (6) and the intermediate surface (10) has a self-sealing effect, which results in sealing of the hollow chamber (8), so that penetration of the fluid and/or gaseous medium into the hollow chamber (8) is prevented, in this manner preventing contact of the fluid and/or gaseous medium with the non-treatable surface (3) of the workpiece (1) and allowing contact of the fluid and/or gaseous medium with the treatable surface (2) of the workpiece (1).
A separation device for supplying and separating workpieces has a workpiece store, a first separation disc having first separation chambers, and a supply disc having workpiece guides, wherein the first separation disc is arranged such that it can be adjusted between a receiving position and a supply position relative to the supply disc, wherein in the supply position the first separation chambers are arranged flush with the workpiece guides, and wherein the first separation chambers are designed to supply workpieces arranged in the first separation chambers to the respective workpiece guides.
B65G 47/14 - Devices for feeding articles or materials to conveyors for feeding articles from disorderly-arranged article piles or from loose assemblages of articles arranging or orientating the articles by mechanical or pneumatic means during feeding
B65G 29/00 - Rotary conveyors, e.g. rotating discs, arms, star-wheels or cones
B65G 47/24 - Devices influencing the relative position or the attitude of articles during transit by conveyors orientating the articles
54.
Al—Cr—O-based coatings with higher thermal stability and producing method thereof
A method for producing an Al—Cr—O-based coating on a workpiece surface, including: a) placing a workpiece in an interior of a vacuum chamber, and b) depositing a film comprising aluminum and chromium on the workpiece surface to be coated, wherein a ratio of aluminum to chromium in the film in atomic percentage has a first value corresponding to Al/Cr≤2.3, and c) forming volatile compounds of Cr—O, thereby causing at least part of the chromium contained in the film to leave the film in a form of Cr—O volatile compounds, and d) executing step c) during a period of time, within which the chromium content in the film is reduced until attaining a second value of the ratio of aluminum to chromium in the film in atomic percentage corresponding to Al/Cr≥3.5, thereby the film is transformed into a film containing a reduced content of chromium.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
55.
OPTICALLY AND OPTIONALLY ELECTROMAGNETICALLY SEMI-TRANSPARENT OPTIMIZED COATED COMPONENT
F21K 9/64 - Optical arrangements integrated in the light source, e.g. for improving the colour rendering index or the light extraction using wavelength conversion means distinct or spaced from the light-generating element, e.g. a remote phosphor layer
F21K 9/69 - Details of refractors forming part of the light source
G01S 17/04 - Systems determining the presence of a target
A manufacturing process for the synthesis of environmental barrier coating system (EBC) which protect Si-based Ceramic Matrix Composite (CMC) material against oxidation and volatilization at high temperatures is disclosed. The manufacturing process is carried out in vacuum and comprises steps of depositing a silicon bond coat and an oxygen containing barrier coating. The process is supported by plasma, preferably through and arc discharge, which lead to full dissociation of the gas precursors such as silane. Plasma is as well used for pre-treatment of substrates in an uninterrupted process chain. A deposition system with essential vacuum and plasma components is disclosed as well as EBC coatings manufactured by the process.
A manufacturing process for the synthesis of environmental barrier coating system (EBC) which protect Si-based Ceramic Matrix Composite (CMC) material against oxidation and volatilization at high temperatures is disclosed. The manufacturing process is carried out in vacuum and comprises steps of depositing a silicon bond coat and an oxygen containing barrier coating. The process is supported by plasma, preferably through and arc discharge, which lead to full dissociation of the gas precursors such as silane. Plasma is as well used for pre-treatment of substrates in an uninterrupted process chain. A deposition system with essential vacuum and plasma components is disclosed as well as EBC coatings manufactured by the process.
The invention discloses an in-line coating apparatus (2) for manufacturing parts (1') of a solid state cell (1) for use in a solid state battery, comprising a first coating unit (4) for applying an anode layer (40) to a carrier unit (10), a second coating unit (6) for applying a plurality of lithiophilic layers (42) on the anode layer (40), a third coating unit (8) for applying an electrolyte layer (44) to the plurality of lithiophilic layers (42) and a carrier unit (10) for receiving the parts (1') of the solid-state cell (1), wherein the carrier unit (10) being transferable from the first coating unit (4) via the second coating unit (6) into the third coating unit (8).
at least one graphite target is used as the source of carbon for producing the TiCN layer, said target being used for sputtering in the coating chamber using a HIPIMS process with the reactive atmosphere having only nitrogen gas as the reactive gas, wherein the Ti targets are preferably operated by means of a first power supply device or a first power supply unit and the graphite targets are operated with pulsed power by means of a second power supply device or a second power supply unit.
The invention relates to a method for forming a coating on a substrate with the help of a coating device and a device for providing non-reactive ions characterized in that a negative bias is applied to the substrate for effecting an ion bombardment on the material deposited on the substrate thereby increasing the density of the material deposited.
The present invention relates to a coated article comprising a coated surface, the coated surface consisting of a substrate and a coating system, the coating system comprising at least one protective layer consisting of one or more transition metal borides and one dopant element, wherein: - the protective layer having chemical element composition defined by the formula TMxBySiq, where TM is one or more transition metal elements selected from the group formed by Chromium, Cr, and Hafnium, Hf, Si is Silicon and is present in the protective layer as the dopant element, B is Boron, x is the concentration in atomic percent of TM in the protective layer, y is the concentration in atomic percent of B in the protective layer, and q is the concentration in atomic percent of Si in the protective layer, where x+y+q=1, 0.15?x?0.33, 0.40?y?0.67, and 0.1?q?0.40, and - the atomic concentration ratio of boron to the transition metals in the protective layer is higher or equal to 2, i.e. y/x ? 2, and - the protective layer exhibits an AlB2 crystal structure.
A coated tool of the present invention includes a base material and a hard coating film on the base material. The hard coating film is a nitride or carbonitride containing aluminum (Al) of 65 atomic % or more 90 atomic % or less, titanium (Ti) of 10 atomic % or more 35 atomic % or less, a total of aluminum (Al) and titanium (Ti) of 85 atomic % or more, and argon (Ar) of 0.20 atomic % or less. The hard coating film satisfies a relationship of Ih×100/Is≤12 when a peak intensity of a (010) plane of AlN of a hexagonal close-packed structure is Ih and a sum of peak intensities due to predetermined nine crystal planes of TiN and AlN is Is in an intensity profile obtained from a selected area diffraction pattern of a transmission electron microscope.
A method for introducing a soft metal into a hard coating during a physical vapor deposition process. The method including steps of providing a substrate; depositing a bonding layer on the substrate; and depositing the hard coating on the bonding layer using vapor deposition wherein the soft metal forms islands in the hard coating.
The invention relates to a holding device (2) for holding a magnetizable substrate (8) during machining of at least one substrate surface, in particular of a magnetizable tool to be machined, comprising a magnetic holding unit (4) arranged at the end for fixing the substrate (8) at the end by forming a magnetic field, a receiving unit (6) arranged on the holding unit (4) for receiving the substrate (8), a replaceable adapter unit (10) arranged within the receiving unit (6) for guiding and shielding the substrate (8), the adapter unit (10) having at least one recess (12) for the feedthrough of the substrate (8), the substrate (8) being fixable within the holding device (2) in a laterally supported manner by means of the recess (12).
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
This invention relates to a coating system to be used as thin film sensor, comprising a piezoresistive sensor element, wherein the piezoresistive sensor element is a layer embedded in the coating system, wherein the coating system is deposited on a surface of a substrate, preferably the substrate being a component or a tool or a part of a component or a part of a tool, wherein the piezoresistive sensor element comprises at least one hydrogen free tetrahedral amorphous carbon coating doped with X, i.e. a ta-C:X coating layer, where X is one or more chemical elements selected from the elements groups 13 and 15 of the periodic table of elements, preferably X is one or more from B, Al, Ga, In, Tl, N and P, wherein the ta-C:X coating layer exhibits an anisotropic gage factor.
G01L 1/18 - Measuring force or stress, in general using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material
67.
Holding system for holding substrates during a processing of the surfaces of the substrates
The invention relates to a holding system (1) for holding substrates (12) for use in a surface processing system having a covering area (20), comprising a plurality of fixing elements (2), a body (24) arranged within the covering area (20) for receiving the fixing elements (2), and a positioning element (26) for adjusting the covering and a machining area (20, 22), wherein a plurality of substrates (12) can be fixed by the fixing elements (2) and processed within the machining area (22).
C23C 14/56 - Apparatus specially adapted for continuous coatingArrangements for maintaining the vacuum, e.g. vacuum locks
C23C 16/458 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
C23C 16/54 - Apparatus specially adapted for continuous coating
68.
OVERLAY COATING RESISTANT TO MOLTEN CALCIUM-MAGNESIUM-ALUMINO-SILICATE
The present invention relates to a CMAS resistant overlay coating (240) comprising at least one CMAS resistant layer, wherein the overlay coating (240) is i. disposed over a surface (11a) of a substrate (10a) comprising or consisting of a material susceptible to CMAS corrosion, ii. comprises a metal oxide matrix and iii. has at least partially a vertical columnar structure. Moreover, at least one non-oxidized metallic constituent selected from the group consisting of aluminum, chromium and metallic constituents comprising or consisting of aluminum and chromium is embedded in the metal oxide matrix. Furthermore, the invention concerns a substrate (10a) having a CMAS resistant overlay coating (240) at issue on a surface (231) of a material susceptible to CMAS corrosion. The invention also relates to a CAE process for forming such a CMAS resistant overlay coating (240) on a surface (231) of a material susceptible to CMAS corrosion.
C23C 14/32 - Vacuum evaporation by explosionVacuum evaporation by evaporation and subsequent ionisation of the vapours
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
69.
OVERLAY COATING RESISTANT TO MOLTEN CALCIUM-MAGNESIUM-ALUMINO-SILICATE
The present invention relates to a CMAS resistant overlay coating (240) comprising at least one CMAS resistant layer, wherein the overlay coating (240) is i. disposed over a surface (11a) of a substrate (10a) comprising or consisting of a material susceptible to CMAS corrosion, ii. comprises a metal oxide matrix and iii. has at least partially a vertical columnar structure. Moreover, at least one non-oxidized metallic constituent selected from the group consisting of aluminum, chromium and metallic constituents comprising or consisting of aluminum and chromium is embedded in the metal oxide matrix. Furthermore, the invention concerns a substrate (10a) having a CMAS resistant overlay coating (240) at issue on a surface (231) of a material susceptible to CMAS corrosion. The invention also relates to a CAE process for forming such a CMAS resistant overlay coating (240) on a surface (231) of a material susceptible to CMAS corrosion.
C23C 14/32 - Vacuum evaporation by explosionVacuum evaporation by evaporation and subsequent ionisation of the vapours
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
70.
METHOD TO PRODUCE CAST IRON BRAKE DISCS WITH HIGH CORROSION AND WEAR RESISTANCE
Method for producing a mechanically and preferably machined cast iron or grey cast iron surface, in particular on a brake disc, with increased wear and corrosion resistance, characterized in that said surface is subjected to a water jet treatment—usually according to the so-called fluid jet process, which is adjusted so that it completely or at least partially clears the cavities opened by the machining, which contain a graphite inclusion surrounded by the basic structure, so that in the latter case the level of the graphite inclusion lies below the outer surface of the basic structure surrounding the cavity, whereupon a diffusion layer is applied by nitrocarburizing and an oxide layer is applied on the diffusion layer.
The invention relates to a method of forming a coating for deposition to non-metallic surfaces, comprising the steps of applying (120) a semiconductor material to a substrate to form a semiconductor material layer and simultaneously or subsequently applying (140) metallic material or additional semiconductor material, wherein the metallic material or additional semiconductor material is introduced into the semiconductor material layer in a targeted manner to tailor the optical properties of the coating.
C23C 16/00 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
C23C 16/30 - Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
72.
SUBSTRATE WITH A MOLYBDENUM NITRIDE LAYER SYSTEM, AND COATING METHOD FOR PRODUCING A LAYER SYSTEM
A substrate having a multilayer coating system in the form of a surface coating, which has an outer cover layer comprising amorphous carbon, and a coating process for producing a substrate. At least a first MoaNx support layer is provided between the substrate and the cover layer, which support layer has a nitrogen content x, referred to an Mo content a, which is in the range of 25 at %≤x≤55 at %, with x+a=100 at %.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
73.
CYLINDRICAL STACK OF FIXTURE RING FOR SURFACE TREATMENT OF TURBINE VANES
The present invention relates to a segment of a fixture, the fixture being comprised of a number of such segments arranged to form a fixture ring, the segment comprising a carrier segment and a cap segment.
B23Q 3/10 - Auxiliary devices, e.g. bolsters, extension members
B24B 31/06 - Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work or the abrasive material is looseAccessories therefor involving oscillating or vibrating containers
A cathodic arc evaporation apparatus including
a target which has a target surface including an active surface from where material can be evaporated in a cathodic arc process;
a confinement surrounding an outer boarder of the target surface;
an anode having an electron receiving surface, the anode encompassing at least one of the target and the confinement in at least one of a target plane and an axial distance in front of the active surface; and
a magnetic guidance system adapted to provide a magnetic field at the target surface being essentially in parallel to at least an outer region of the target surface so that magnetic field lines are in parallel to the target surface or inclined to it in an acute angle α, whereat an active surface is defined in a surface area where magnetic field lines enter the target surface in an acute angle α≤45°.
The present invention relates to a battery half-cell comprising a copper foil, a lithium anode layer deposited on a surface of the copper foil and a capping layer, preferably a conformal capping layer, deposited on the lithium anode layer. The lithium anode layer comprises vertical structures such as columnar structures and/or grid structures.
C23C 14/16 - Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
C23C 14/22 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
C23C 14/32 - Vacuum evaporation by explosionVacuum evaporation by evaporation and subsequent ionisation of the vapours
C23C 16/06 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
H01M 4/38 - Selection of substances as active materials, active masses, active liquids of elements or alloys
C23C 14/02 - Pretreatment of the material to be coated
H01M 4/02 - Electrodes composed of, or comprising, active material
The present invention relates to a device (1) for scanning a DMC and/or a barcode on the shaft of a tool, comprising: - a scanning camera (3), - a housing (5), on which the scanning camera is disposed and oriented such that the scanning camera can scan a region in the interior of the housing; wherein a scanning direction from the scanning camera (3) to the tool shaft to be scanned is defined by the orientation of the scanning camera (3), and a scanning region is defined by the region; wherein the housing (5) has, in a wall running substantially parallel to the scanning direction, an opening (7) such that the tool shaft provided with a DMC code and/or barcode can be inserted, perpendicularly to the scanning direction, into the scanning region for scanning.
G06K 7/10 - Methods or arrangements for sensing record carriers by electromagnetic radiation, e.g. optical sensingMethods or arrangements for sensing record carriers by corpuscular radiation
The present invention relates to a device (1) for scanning a DMC and/or a barcode on the shaft of a tool, comprising: - a scanning camera (3), - a housing (5), on which the scanning camera is disposed and oriented such that the scanning camera can scan a region in the interior of the housing; wherein a scanning direction from the scanning camera (3) to the tool shaft to be scanned is defined by the orientation of the scanning camera (3), and a scanning region is defined by the region; wherein the housing (5) has, in a wall running substantially parallel to the scanning direction, an opening (7) such that the tool shaft provided with a DMC code and/or barcode can be inserted, perpendicularly to the scanning direction, into the scanning region for scanning.
G06K 7/10 - Methods or arrangements for sensing record carriers by electromagnetic radiation, e.g. optical sensingMethods or arrangements for sensing record carriers by corpuscular radiation
78.
STRAIN-TOLERANT THERMAL BARRIER COATINGS BY ARC EVAPORATION WITH IMPROVED CMAS RESISTANCE
The present invention relates to a method for applying a strain tolerant oxide coating on a substrate, the strain-tolerant oxide comprising zirconia or zirconate as main component, characterized in that the strain tolerant oxide is applied by cathodic arc deposition using at least one zirconium target as material source the zirconium target in addition comprising at least one chemical element that stabilizes cubic zirconia.
A fixture system to be used in a vacuum chamber (16) of a vacuum treatment system, comprising, a spindle (1), a gear wheel, in this text referred to as sun wheel (2), a cylindrical object exhibiting properties that allow the gear wheel to mesh into it, in order to rotate said cylindrical object, in this text referred to as reel (3), a holding plate (4), wherein the sun wheel (2) and the reel (3) are manufactured in order to allow the sun wheel (2) to mesh into the reel (3), thereby rotating it.
A multilayer coating exhibiting good corrosion resistance and good abrasion resistance, the multilayer coating comprising layers A and layers B deposited forming a sequence of the type...A/B/A/B/A..., the layers A being CrN-based layers or CrN layers and the layers B being CrON-based layers or CrON layers, wherein the multilayer coating exhibits a modulated ratio of the thicknesses of the A layers and B layers, in a manner that the multilayer coating comprises at least two different coating portions along the whole multilayer coating thickness, with differently adjusted ratio of the thicknesses of the A layers and B layers.
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 14/54 - Controlling or regulating the coating process
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
81.
COATING SYSTEM FOR PLASTIC PROCESSING APPLICATIONS
A multilayer coating exhibiting good corrosion resistance and good abrasion resistance, the multilayer coating comprising layers A and layers B deposited forming a sequence of the type...A/B/A/B/A..., the layers A being CrN-based layers or CrN layers and the layers B being CrON-based layers or CrON layers, wherein the multilayer coating exhibits a modulated ratio of the thicknesses of the A layers and B layers, in a manner that the multilayer coating comprises at least two different coating portions along the whole multilayer coating thickness, with differently adjusted ratio of the thicknesses of the A layers and B layers.
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 14/54 - Controlling or regulating the coating process
A method to produce a hard coating onto a substrate, wherein the hard coating comprises a hydrogen-free amorphous carbon coating, wherein the amorphous carbon coating is deposited onto the substrate using a cathodic arc discharge deposition technique, wherein a bias voltage is applied to the substrate with an absolute value that is greater than 0 V, preferably greater than 10 V and less than 1000 V, and wherein the absolute value of the bias voltage is increased during the coating process to obtain a first structure and a second structure and a gradient between the first and the second structure along the coating thickness, wherein the first and the second structure comprise sp2 and sp3 carbon bonds but differ in their relative concentration, wherein at least one coating pause is applied during the coating process in order to reduce the substrate temperature during the coating pause.
This invention relates to a gas or steam turbine engine component formed by a substrate with a coating system deposited on at least part of the substrate for enhanced corrosion and erosion resistance of the turbine engine component, whereas the component is preferably made of stainless steel or titanium alloy or superalloys and the coating system comprises at least one layer of aluminum nitride and at least one layer of titanium aluminum nitride and wherein the at least one titanium aluminum nitride layer most distant to the substrate is closer to the substrate as the aluminum nitride layer most distant to the substrate.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
F01D 5/28 - Selecting particular materialsMeasures against erosion or corrosion
F01D 25/00 - Component parts, details, or accessories, not provided for in, or of interest apart from, other groups
84.
ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM
The invention relates to a method for suppressing anode overgrowth in an arc-beam PICVD coating system, wherein during at least part of a coating process of the arc-beam PICVD coating system, the arc-beam is scanned over at least part of a surface of the anode. Further, the invention relates to an arc-beam PICVD coating system for coating parts.
C23C 16/517 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups
A coated tool according to the present invention comprises a base material and a hard coating film on the base material. The hard coating film is a nitride or carbonitride containing 65-90 at.% Al and 10-35 at.% Ti with respect to the total amount of elemental metal (including semimetals) and has a face-centered cubic lattice structure. In the X-ray intensity distribution of the α-axis in a positive electrode dot diagram in relation to the (111) surface of the face-centered cubic lattice structure, the hard coating film exhibits a maximum intensity Ia in the α angle range of 80-90°, and the intensity in the α angle range of 0-70° is 30% or less of the maximum intensity Ia.
The invention relates to a method to stabilize position and shape of a plasma beam established between a cathode and an anode, where an electrical field is established between the cathode and the anode and where the shortest electrical field line between the cathode and the anode defines a reference line, wherein at least one oriented electromagnetic coil is provided and the at least one oriented electromagnetic coil is with its coil axis oriented in a non-colinear manner to the reference line in such a way that at least one of the straight lines which are intersecting both of the coil openings and which are parallel to the coil axis intersects with the reference line and where a current is send through the at least one oriented electromagnetic coil in order to establish a magnetic field which is used to deflect or attract the plasma beam.
Coated forming tool for processing of plastics materials or aluminum or aluminum alloy materials, comprising a substrate having a substrate surface, wherein the substrate surface is coated with a coating formed of one or more layers, wherein the coating comprises a Si—C—N-based layer having element composition in atomic percentage corresponding to SiaCbNcXd with 50
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 14/32 - Vacuum evaporation by explosionVacuum evaporation by evaporation and subsequent ionisation of the vapours
C23C 14/35 - Sputtering by application of a magnetic field, e.g. magnetron sputtering
H01L 21/687 - Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereofApparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
89.
PVD COATINGS COMPRISING MULTI-ANION HIGH ENTROPY ALLOY OXY-NITRIDES
Method for producing a coating comprising at least one PVD coating layer, wherein for the production of the at least one PVD coating layer materials from one or more targets are evaporated by using a PVD technique in a coating chamber comprising oxygen and nitrogen as reactive gases, wherein during deposition of the at least one PVD coating layer a multi-anion HEA-oxynitride structure is formed, which comprises a cation lattice formed of five or more elements and an anion lattice formed of two or more elements, wherein if only two elements are present in the anion lattice, they are oxygen and nitrogen.
A method for applying a coating 1 to a surface 2 of a mullite material 3 is specified, which comprises pretreating the surface 2 of the mullite material 3 by means of a plasma-chemical process in which molecular hydrogen is excited in such a way that plasma-activated hydrogen is produced S1, and applying an aluminum oxide-containing layer 4 by means of a PVD process to the pretreated surface 2 of the mullite material 3 S2. Furthermore, a mullite material 3 with a coating and a gas turbine component with such a mullite material 3 are specified.
C04B 41/00 - After-treatment of mortars, concrete, artificial stone or ceramicsTreatment of natural stone
C04B 41/50 - Coating or impregnating with inorganic materials
C04B 41/53 - After-treatment of mortars, concrete, artificial stone or ceramicsTreatment of natural stone involving the removal of part of the materials of the treated article
C04B 41/91 - After-treatment of mortars, concrete, artificial stone or ceramicsTreatment of natural stone of only ceramics involving the removal of part of the materials of the treated articles, e.g. etching
C23C 14/00 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
C23C 14/02 - Pretreatment of the material to be coated
F02C 7/00 - Features, component parts, details or accessories, not provided for in, or of interest apart from, groups Air intakes for jet-propulsion plants
91.
COATING FOR THERMICALLY AND ABRASIVELY LOADED TURBINE BLADES
The invention relates to a method for coating a substrate surrounding a gas turbine blade, comprising the following steps: In a first step, a MCrAIY matrix is applied by means of a PVD method; in a further step, an oxide layer is applied by means of a PVD method.
Coating system (210) deposited on a surface of a substrate (201) comprising an under coating film (212), an interjacent coating film (216) deposited as a multi-layered film (216), consisting of a plurality of A-layers and a plurality of B-layers deposited alternating one on each other forming a A/B/A/B/A… architecture, the A-layers comprising aluminium chromium and optionally one or more dopant elements and the B-layers comprising aluminium chromium nitride and one or more dopant elements.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 14/00 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
C23C 14/02 - Pretreatment of the material to be coated
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 14/32 - Vacuum evaporation by explosionVacuum evaporation by evaporation and subsequent ionisation of the vapours
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
C23C 30/00 - Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
93.
METHOD FOR SELECTIVE DEPOSITION OF DIAMOND COATINGS
The present invention relates to a method for producing a selective diamond-coated substrate, wherein the selective diamond-coated substrate comprises: a substrate (1) having surfaces comprising cemented carbide material and having areas of the substrate surfaces selected to be coated (10) and areas of the substrate surfaces that are not selected to be coated (20); and one or more diamond coatings (30) deposited on the areas of the substrate surfaces selected to be coated (10), wherein, the method includes following steps: a first masking step, conducted before conducting one or more chemical pre-treatment steps, wherein in the first masking step the areas of the substrate surfaces that are not selected to be coated (20) but could be chemically attacked during conduction of the one or more chemical pre-treatments steps, are masked by applying a latex-mask (50) covering these areas (20) for avoiding any chemical attacks of the substrate material in these areas (20); mask-removing step, conducted after conducting the one or more chemical pre-treatments steps and before conducting one or more coating steps, in which the latex-mask (50) is completely removed; a second masking step conducted before conducting the one or more coating steps, wherein in the second masking step the areas of the substrate surfaces, from which the latex-mask (50) was removed and are not selected to be coated (20) but could be coated with one or more diamond coatings (30) during conduction of the one or more coating steps, are covered with one or more masking-covers (60) for avoiding deposition of any diamond coatings (30) on these areas.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
The present invention relates to a coating for forming tools to be used in a forming operation of a workpiece material, wherein the coating is deposited on a substrate surface and the coating comprises a lower layer (10) and an upper layer (20), wherein the lower layer (10) is deposited closer to the substrate surface than the upper layer (20), wherein the lower layer (10) mainly comprises chromium nitride, and the upper layer (20) is deposited as multilayer formed by a plurality of A-layers (22) and B-layers (21) deposited alternate one on each other forming a sequence of …/A/B/A/B/A/B/… -layers (22,21), wherein the A-layers (22) mainly comprise aluminum titanium nitride, and the B-layers (21) mainly comprise chromium nitride.
C23C 14/02 - Pretreatment of the material to be coated
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
C23C 30/00 - Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
C23C 8/36 - Solid state diffusion of only non-metal elements into metallic material surfacesChemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
The present invention relates to a coating for forming tools to be used in a forming operation of a workpiece material, wherein the coating is deposited on a substrate surface and the coating comprises a lower layer (10) and an upper layer (20), wherein the lower layer (10) is deposited closer to the substrate surface than the upper layer (20), wherein the lower layer (10) mainly comprises chromium nitride, and the upper layer (20) is deposited as multilayer formed by a plurality of A-layers (22) and B-layers (21) deposited alternate one on each other forming a sequence of ?/A/B/A/B/A/B/? -layers (22,21), wherein the A-layers (22) mainly comprise aluminum titanium nitride, and the B-layers (21) mainly comprise chromium nitride.
C23C 8/36 - Solid state diffusion of only non-metal elements into metallic material surfacesChemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
C23C 14/02 - Pretreatment of the material to be coated
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 28/00 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 30/00 - Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
96.
COATING FOR THERMALLY AND ABRASIVELY LOADED TURBINE BLADES
The invention relates to a method for coating a substrate surrounding a gas turbine blade, comprising the following steps: In a first step, a MCrAIY matrix is applied by means of a PVD method; in a further step, an oxide layer is applied by means of a PVD method.
The invention relates to a workpiece carrier device (1) for holding and moving workpieces (15), having: a workpiece carrier (2) for receiving workpieces (15), which is mounted on a main frame (4) so as to rotate about an axis (3); a drive part, which can likewise rotate about the axis (3) relative to the workpiece carrier (2); and multiple workpiece holders (5), which are arranged on the workpiece carrier (2) in a ring around the drive axis and are mounted on the workpiece carrier (2) so as to rotate about holder axes (6) which are spaced from the drive axis. The holder axes (6) run in such a way in relation to the axis (3) that the workpiece holders (5) form a conical crown arrangement (7). The invention further relates to a coating method using the workpiece carrier device (1) according to the invention and to workpieces or substrates (15) coated by means of the coating method (e.g, pins, pen injectors, balls, ball pins, pistons, nozzle needles etc.).
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
98.
HARD CUBIC AL-RICH ALTIN COATING LAYERS PRODUCED BY PVD FROM CERAMIC TARGETS
C23C 14/32 - Vacuum evaporation by explosionVacuum evaporation by evaporation and subsequent ionisation of the vapours
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 14/00 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
99.
HARD ALCR-BASED MULTILAYER COATING SYSTEM, COATED ARTICLE AND METHOD FOR MANUFACTURING THE SAME
Coating system (200), comprising a substrate (100), an under coating film (220), and an upper coating film (240), and an interjacent coating film (230), as a transition film between the under coating (220) film and the upper coating film (240), wherein the under coating film (220) being closer to the substrate than the interjacent coating film (230) and the upper coating film (240), the interjacent coating film (230) is deposited between the under coating film (220) and the upper coating film (240), the upper coating film (240) is deposited more distant from the substrate (100) than the interjacent coating film (230), wherein the undercoating film (220), interjacent coating film (230) and upper coating film (240) comprise aluminum (Al), chromium (Cr) and nitrogen (N), and one or more elements selected from element of periods 2, 3, 4, 5, 6 of the periodic system except Al, Cr and N, in particular one or more elements selected from boron (B), yttrium (Y), tantalum (Ta), silicon (Si), tungsten (W), titanium (Ti), calcium (Ca), magnesium (Mg), iron (Fe), cobalt (Co), zinc (Zn), niobium (Nb), vanadium (V) and neodymium (Nd), wherein the under coating film (220), being formed as a multi-layered film, comprising a plurality of individual layers(220.i) and optionally transitional layers (221.i), where the number of individual layers (220.i) is at least two, wherein the at least two individual layers (220.i) differ in at least one physical and/or chemical property.
C23C 28/04 - Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups , or by combinations of methods provided for in subclasses and only coatings of inorganic non-metallic material
C23C 30/00 - Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
C23C 14/00 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
C23C 14/06 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
C23C 14/02 - Pretreatment of the material to be coated
C23C 14/32 - Vacuum evaporation by explosionVacuum evaporation by evaporation and subsequent ionisation of the vapours
B23B 27/14 - Cutting tools of which the bits or tips are of special material
The invention relates to a layer system coated on a substrate, the layer system comprising a functional layer and an intermediate layer and the intermediate layer being arranged between the substrate and the functional layer, the functional layer comprising both the elements aluminium and silicon though not necessarily in elementary form, and the functional layer comprising oxygen or nitrogen or both, characterised in that the intermediate layer comprises, measured in at%, a greater percentage of silicon and/or a greater percentage of aluminium than the functional layer.
C23C 14/22 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
C23C 14/32 - Vacuum evaporation by explosionVacuum evaporation by evaporation and subsequent ionisation of the vapours
C23C 16/44 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
