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2024
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Invention
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Compositions and methods using same for deposition of silicon-containing film.
Described herein ... |
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Invention
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Functionalized cyclosilazanes as precursors for high growth rate silicon-containing films.
Descr... |
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Invention
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Area selective deposition of metal film on silicon containing surfaces utilizing alcohols. A meth... |
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Invention
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Area selective deposition of dielectric film on silicon containing surfaces utilizing alcohols. A... |
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Invention
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Device, system and method for optimizing characteristics of a transistor channel. A device and re... |
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Invention
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Composition and methods using same for carbon doped silicon containing films.
A composition and ... |
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Invention
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Composition for tin hard mask removal while compatible with tungsten. Composition, method and sys... |
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Invention
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Chlorosilyl-substituted silacycloalkanes and their use for formation of films comprising silicon ... |
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Invention
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Area selective deposition of metal film on silicon containing surfaces utilizing halides. A metho... |
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Invention
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Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing ... |
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Invention
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Soft polysiloxane core-shell abrasives for chemical mechanical planarization. Soft polysiloxane c... |
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Invention
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Vapor-phase etch of metal-containing materials. The disclosed and claimed subject matter relates ... |
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Invention
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Multi-chambered chemical solid precursor ampoule. A multi-chamber ampoule having a multi-chamber ... |
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Invention
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Ultra-high purity tungsten chlorides.
Condensable metal halide materials, such as but not limite... |
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Invention
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Halidosilane compounds and compositions and processes for depositing silicon-containing films usi... |
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Invention
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Chemical mechanical planarization for shallow trench isolation. Present invention provides Chemic... |
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Invention
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Alkoxysilacyclic or acyloxysilacyclic compounds and methods for depositing films using same.
A m... |
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2023
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Invention
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Antirotation device for compressed gas cylinders. An antirotation assembly (100) including a skid... |
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Invention
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Composition and method for cmp of metal films. A chemical mechanical planarization composition fo... |
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Invention
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Amphiphilic abrasive particles and their use for chemical mechanical planarization. Colloidally s... |
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Invention
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Dicationic polymer and copolymer and their use for chemical mechanical planarization. Synthesis o... |
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Invention
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Fefet device, system, and method of manufacturing. A FeFET transistor (600) is disclosed that has... |
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Invention
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Intramolecular stabilized group 13 metal complexes with improved thermal stability for vapor phas... |
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Invention
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Intramolecular stabilized metal complexes with improved thermal stability for vapor phase thin-fi... |
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Invention
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High purity alkynyl amines for selective deposition. The disclosed and claimed subject matter rel... |
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Invention
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Compositions for selective removal of tin layer over tungsten. The disclosed and claimed subject ... |
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2022
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Invention
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Homoleptic bismuth precursors for depositing bismuth oxide containing thin films.
The disclosed ... |
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Invention
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Tungsten chemical mechanical polishing slurries.
This invention pertains to slurries, methods an... |
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Invention
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Chemical mechanical planarization polishing composition for silicon oxide and silicon nitride.
T... |
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Invention
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Multilayered silicon nitride film.
A method for depositing a multi-layered silicon nitride film ... |
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Invention
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Pad-in-a-bottle chemical mechanical planarization polishing with cost-effective non-porous solid ... |
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Invention
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Pad-in-a-bottle and single platen chemical mechanical-planarization for back-end applications.
A... |
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Invention
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Alkoxysilanes and dense organosilica films made therefrom.
A method for making a dense organosil... |
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Invention
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Triazole- and/or triazolium-based polymers and copolymers as additives for chemical mechanical pl... |
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Invention
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Chemical mechanical planarization polishing for shallow trench isolation.
The present invention ... |
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Invention
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Post-dry etching photoresist and metal containing residue removal formulation.
The disclosed and... |
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Invention
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Pad-in-a-bottle (pib) technology for copper barrier slurries.
A novel pad-in-a-bottle (PIB) tech... |
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Invention
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Phosphonium based polymers and copolymers as additives for chemical mechanical planarization slur... |
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Invention
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Ultra-pure molybdenum dichloride dioxide, packaged forms thereof and methods of preparing the sam... |
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Invention
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Imidazolium-based poly(ionic liquid)s and use therefore.
Synthesis of imidazolium-based poly(ion... |
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Invention
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New precursors for depositing films with high elastic modulus.
A method for making a dense organ... |
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Invention
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Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ silic... |
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Invention
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Non-spherical primary silica nanoparticles and the use therefor.
Processes of synthesizing non-s... |
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Invention
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Deposition of vanadium-containing films.
The disclosed and claimed subject matter relates to a m... |
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Invention
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Shared data induced quality control system for materials.
A method for developing or improving a... |
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Invention
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Shared data induced production process improvement.
A method for developing or improving a proce... |
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Invention
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Selective deposition of silicon dielectric film.
A method for selective deposition of a silicon ... |
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Invention
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Composition for atomic layer deposition of high quality silicon oxide thin films.
Atomic layer d... |
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Invention
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Group 6 amidinate paddlewheel compounds for deposition of metal containing thin films.
The discl... |
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2020
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Invention
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High oxide removal rates shallow trench isolation chemical mechanical planarization compositions.... |
