Advanced ION Beam Technology, Inc.

Taiwan, Province of China


 
Total IP 70
Total IP Rank # 19,446
IP Activity Score 2/5.0    15
IP Activity Rank # 57,572
Dominant Nice Class Machines and machine tools

Patents

Trademarks

66 3
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Last Patent 2025 - Ribbon beam angle adjustment in ...
First Patent 1999 - Magnet system for an ion beam im...
Last Trademark 2025 - IQUASAR
First Trademark 2022 - IPULSAR PLUS

Industry (Nice Classification)

Latest Inventions, Goods, Services

2025 G/S Semiconductor manufacturing equipment, namely, ion implanters
2024 Invention Ribbon beam angle adjustment in an ion implantation system. The present disclosure relates gener...
2022 G/S Ion implanters, namely, machines for accelerating ions into a solid target, for use in semiconduc...
G/S Ion implanter, namely, machine for accelerating ions into a solid target, for use in semiconducto...
2021 Invention Ribbon beam angle adjustment in an ion implantation system. The present disclosure relates genera...
Invention Hybrid magnet structure. The disclosure provides a hybrid magnet structure which includes two dip...
Invention Wafer temperature measurement in an ion implantation system. The present disclosure relates gene...
Invention Wafer temperature measurement in an ion implantation system. The present disclosure relates gener...
2020 Invention Apparatus and method for reduction of particle contamination by bias voltage. The invention provi...
Invention Apparatus and method for monitoring the relative relationship between the wafer and the chuck. An...
2019 Invention Wafer charges monitoring. Apparatus and method for monitoring wafer charges are proposed. A condu...
Invention Vacuum jacketed tube. The proposed vacuum jacketed tube may deliver the high/low temperature flu...
2018 Invention Calibration system with at least one camera and method thereof. A method for calibrating element ...
Invention Method for ion implantation. A method for ion beam implantation is provided. The method provides...
2016 Invention Method of cleaning electrostatic chuck. A method of cleaning an electrostatic chuck (ESC) is disc...
Invention Plasma-based processing system and operation method thereof. A plasma-based processing system an...
Invention Plasma-based material modification with neutral beam. Systems and processes for plasma-based mat...
Invention Magnetic field fluctuation for beam smoothing. The time-averaged ion beam profile of an ion beam ...
2015 Invention Deposition apparatus and deposition method using the same. The present invention provides a depo...
Invention Ion implantation system and process. Ion implantation systems and processes are disclosed. An exe...
Invention Method for ion implantation. A method for an ion implantation is provided. First, a non-parallel ...
Invention Forming punch-through stopper regions in finfet devices. In forming a punch-through stopper regio...
Invention Ion implanter and method for ion implantation. An ion implanter comprising a process chamber, a ...
Invention Deceleration apparatus for ribbon and spot beams. A deceleration apparatus capable of deceleratin...
Invention Method and ion implanter for low temperature implantation. A method for a recipe of a low temper...
2014 Invention Electrode assembly having pierce electrodes for controlling space charge effects. An electrode a...
Invention Single bend energy filter for controlling deflection of charged particle beam. A single bend ener...
Invention Lower dose rate ion implantation using a wider ion beam. In an exemplary process for lower dose r...
Invention Plasma-based material modification using a plasma source with magnetic confinement. A plasma-base...
Invention Replacement source/drain finfet fabrication. A finFET is formed having a fin with a source region...
Invention Replacement source/drain finfet fabrication. A finFET is formed having a fin with a source regio...
Invention Beam control assembly for ribbon beam of ions for ion implantation. A beam control assembly to sh...
Invention Implant method and implanter by using a variable aperture. A variable aperture within an aperture...
Invention Multi-energy ion implantation. In a multi-energy ion implantation process, an ion implanting syst...
2013 Invention Gas mixture method for generating ion beam. A gas mixture method for generating an ion beam is pr...
Invention Ion source of an ion implanter. An ion source uses at least one induction coil to generate ac mag...
Invention Ion implantation method and ion implanter. An ion implantation method and an ion implanter with ...
Invention Scan head and scan arm using the same. A scan head assembled to a scan arm for an ion implanter a...
Invention Ion implanter and ion implant method thereof. An ion implanter and an ion implant method are disc...
2012 Invention Gas mixture method and apparatus for generating ion beam. A gas mixture method and apparatus of p...
Invention Plasma doping a non-planar semiconductor device. In plasma doping a non-planar semiconductor devi...
Invention Doping a non-planar semiconductor device. In doping a non-planar semiconductor device, a substrat...
2011 Invention Apparatus and method for measuring ion beam current. Techniques for measuring ion beam current, e...
Invention Extremely low temperature rotary union. A chuck assembly has a wafer chuck attached to a shaft th...