SK Enpulse Co., Ltd.

Republic of Korea

 
Total IP 112
Total IP Rank # 11,609
IP Activity Score 2.9/5.0    127
IP Activity Rank # 5,408

Patents

Trademarks

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0 0
4 0
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Last Patent 2025 - Polishing composition for semico...
First Patent 2014 - Polymer and composition containi...

Latest Inventions, Goods, Services

2024 Invention Blank mask and photomask using the same. A blank mask including a transparent substrate, a phase...
Invention Composition for semiconductor process, method for preparing composition for semiconductor process...
Invention Polishing composition for semiconductor process, and method for polishing substrate by using same...
Invention Polishing composition for semiconductor process and substrate polishing method using same. A poli...
Invention Blank mask and method of fabricating the same. A method of fabricating a blank mask, the method ...
Invention Blank mask and method of fabricating the same. A method of fabricating a blank mask. The method ...
Invention Polishing pad with adjusted content of chlorine and process for preparing semiconductor device us...
Invention Polishing pad and preparing method of semiconductor device. The present invention provides a pol...
Invention Polishing pad and preparation method thereof. The embodiment relates to a polishing pad for use ...
Invention Polishing pad, pyrolysis oil obtained therefrom, and process for preparing the same. The embodim...
Invention Apparatus for fabricating blank mask and method of fabricating the same. Disclosed is an apparat...
Invention Polishing composition for semiconductor process and method for polishing a substrate using the sa...
Invention Polishing composition for semiconductor processing and method of polishing a substrate. A compos...
2023 Invention Polishing pad and method of monitoring a polishing process using the same. The embodiment relate...
Invention Blank mask and photomask using the same. A blank mask includes a light transmissive substrate an...
Invention Method for manufacturing a polishing sheet and a polishing pad. The embodiments provide a proces...
Invention Blank mask and photomask using the same. A blank mask includes a light transmissive substrate, a...
Invention Composition for semiconductor processing and method of fabricating semiconductor device using the...
Invention Etching-resistant ceramic part and method for manufacturing same. Embodiments provide an etching-...
Invention Shadow mask and method of manufacturing blank mask using the same. A shadow mask includes a mask...
Invention Conditioning device and method for controlling the conditioning device. A conditioning device in...
Invention Polishing pad with improved wettability and method for preparing same. The present invention dis...
Invention Composition for semiconductor processing and polishing method of semiconductor device using the s...
Invention Composition for semiconductor processing and manufacturing method of semiconductor device using t...
Invention Photomask for extreme ultraviolet. An extreme ultraviolet photomask includes a conductive layer;...
Invention Composition for semiconductor process, method for preparing the same and method for preparing sem...
2022 Invention Blank mask and photomask using the same. A blank mask includes a transparent substrate and a lig...
Invention Method and apparatus for forming a blank mask and a layer for a blank mask. A method and apparat...
Invention Blank mask and photomask using the same. A blank mask includes a light-transmitting substrate; a...
Invention Method of preparing laminate and laminate for optical use. The method of preparing a laminate in...
Invention Laminate for blank mask and manufacturing method for the same. A laminate for a blank mask inclu...
Invention Polishing pad and method for manufacturing semiconductor device using same. Through a combinatio...
Invention Blank mask and photomask using the same. The blank mask according to one embodiment of the prese...
Invention Method and apparatus for manufacturing a photomask from a blank mask. A blank mask includes a tr...
Invention Polishing pad and preparing method of semiconductor device using the same. The present disclosur...
Invention Blank mask and photomask using the same. A blank mask including a transparent substrate and a li...
Invention Method of cleaning substrate for blank mask, substrate for blank mask, and blank mask including t...
Invention Polishing device and method for manufacturing semiconductor device. Provided are a polishing dev...
Invention Polishing pad and method for manufacturing semiconductor device using same. The present disclosu...
Invention Polishing pad and method for manufacturing semiconductor device using same. Provided is a polish...
Invention Blank mask and photomask using the same. Disclosed is a blank mask including a transparent subst...
Invention Polishing pad and method for manufacturing semiconductor device using the same. Provided are a p...
2021 Invention Polishing composition for semiconductor processing,method for preparing polishing composition, an...
Invention Polishing composition for semiconductor processing polishing composition preparation method, and ...
Invention Polishing compostion for semiconductor process, manufacturing method of polishing composition and...