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2022
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Invention
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Chemical mechanical planarization slurry processing techniques and systems and methods for polish... |
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Invention
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Silicon carbide (sic) wafer polishing with slurry formulation and process. A method for polishing... |
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2021
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Invention
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Brush for cleaning a substrate. A brush for cleaning a substrate, and a machine with a brush for ... |
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G/S
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Chemical-mechanical polishing (cmp) tools containing a light
source and an acoustic wave source ... |
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G/S
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Semiconductor substrate polishing machine and components parts, namely, a wafer polisher and trib... |
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G/S
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Semiconductor polishing activation equipment for use with a chemical-mechanical polisher (CMP) to... |
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2012
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Invention
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Method and device for the injection of cmp slurry. Disclosed is an apparatus for injecting slurry... |
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2011
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Invention
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Method and apparatus for chemical-mechanical planarization.
A method and apparatus for performin... |
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Invention
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Fluid filled template for use in chemical mechanical planarization. A method of chemical mechanic... |
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2010
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Invention
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Method and device for the injection of cmp slurry. In a certain embodiment, the invention compris... |
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Invention
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Polishing head retaining ring. A retaining ring for the polishing head in chemical mechanical pol... |
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Invention
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Apparatus and method for cleaning cmp polishing pads. The present invention relates to an apparat... |
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Invention
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Method for cmp using pad in a bottle. A method of CMP wherein the polishing pad is partially or w... |
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2009
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Invention
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Method of determining the lubrication mechanism in cmp.
The present invention is a method for ob... |
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Invention
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Method of chemical mechanical polishing.
[Problem] To improve polishing efficiency while lowerin... |
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Invention
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Composition and method for copper chemical mechanical planarization. A family of slurries are dis... |
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Invention
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Confocal microscopy pad sample holder that measures displacement and method of using the same. Th... |
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Invention
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Method for cmp uniformity control.
A method for injecting slurry between the wafer and the pad i... |
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Invention
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Method and apparatus for accelerated wear testing of aggressive diamonds on diamond conditioning ... |
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Invention
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Method for counting and characterizing aggressive diamonds in cmp diamond conditioner discs.
The... |
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2008
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Invention
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Method of observing pattern evolution using variance and fourier transform spectra of friction fo... |
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Invention
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Method and device for the injection of cmp slurry. The present invention comprises an apparatus f... |
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Invention
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Device for determining the coefficient of friction of diamond conditioner discs and a method of u... |
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Invention
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Wafer head template for chemical mechanical polishing and a method for its use.
The present inve... |
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Invention
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Method and apparatus for determining shear force between the wafer head and polishing pad in chem... |
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Invention
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Confocal microscopy pad sample holder and method of hand using the same. The present invention is... |
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Invention
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Polishing method of semiconductor substrate.
The present invention relates to a method of polish... |
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2007
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Invention
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Removable polishing pad for chemical mechanical polishing. The present invention offers a device ... |
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2006
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Invention
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Method of determining the number of active diamonds on a conditioning disk. The invention relates... |
