An apparatus for plasma control is disclosed. The apparatus comprises: a plasma generator comprising two electrodes, an anode and a cathode, configured to produce a plasma between the two electrodes; a solenoid coil disposed to surround the plasma and configured to produce a magnetic field parallel to a longitudinal axis between the two electrodes; and circuitry configured for allowing independent timing of the magnetic field with respect to the production of the plasma. A method for plasma control in a spectroscopy system and an optical emission spectrometer using said method are also disclosed.
H05H 1/16 - Dispositions pour confiner le plasma au moyen de champs électriques ou magnétiques; Dispositions pour chauffer le plasma utilisant des champs électriques et magnétiques
G01N 21/73 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité thermiquement en utilisant des brûleurs ou torches à plasma
A method for compositional analysis, in particular laser-induced breakdown spectroscopy (LIBS), includes providing a sample having a surface, moving an ablation point to a plurality of positions on the surface along an arc path defined by a plurality of arcs, wherein the plurality of arcs extend from an edge of the area to another edge of the area, wherein the arc path follows adjacent arcs of the plurality of arcs, pulsing an energy source to provide an electromagnetic energy beam to ablate material at the ablation point, collecting an emission spectrum in response to pulsing the energy source, and analyzing the emission spectrum to determine a composition at the surface.
G01N 21/71 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité thermiquement
3.
SYSTEMS AND METHODS FOR PERFORMING LASER-INDUCED BREAKDOWN SPECTROSCOPY
A method for compositional analysis includes providing a sample having a surface, moving an ablation point to a plurality of positions on the surface along a fractal path, pulsing an energy source to provide an electromagnetic energy beam to ablate material at the ablation point, collecting an emission spectrum in response to pulsing the energy source, and analyzing the emission spectrum to determine a composition at the surface.
G01N 21/71 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité thermiquement
4.
KINEMATICS PATH METHOD FOR LASER-INDUCED BREAKDOWN SPECTROSCOPY
A method for compositional analysis includes providing a sample having a surface and determining with a controller a plurality of equidistant positions along an oscillatory path along the surface. The oscillatory path is sinusoid in at least one orthogonal dimension within a plane approximately parallel to the surface. The method further includes, for each equidistant position of the plurality of equidistant position, moving an ablation point along the oscillatory path to the each equidistant position, pulsing an energy source to provide an electromagnetic energy beam to ablate material at the ablation point, and collecting an emission spectrum with a spectrographic instrument in response to pulsing the energy source. The method also includes analyzing the emission spectrum to determine a composition at the surface.
G01N 21/71 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité thermiquement
A spark stand (201) for an optical emission spectrometer, comprising: a spark chamber (210); and at least one auxiliary gas conduit (209a, 209b) for providing an auxiliary gas flow into the spark chamber (210), wherein the at least one auxiliary gas conduit (209a, 209b) is configured to provide the auxiliary gas flow (214) into the spark chamber (210) for a period after spark operation but not during spark operation in which analysis of a sample takes place. The auxiliary gas flow (214) into the spark chamber (210) improves flushing of dust from the spark chamber (210) after spark operation.
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p.ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
A system and method for spectrometry of a sample in a plasma is described. The system includes a split ring resonator, an electrode, and a delivery system. The split ring resonator has a discharge gap, and the electrode is arranged in proximity to, but spaced apart from, the discharge gap such that. When a sufficient power is supplied to a plasma generated in the discharge gap, the plasma extends towards and couples with the electrode, so that the plasma is established in a region between the discharge gap and the electrode. The delivery system is for introduction of a sample into the plasma established in the region between the discharge gap and the electrode. The system is configured to direct an output from the plasma to a spectrometer for analysis.
G01N 21/73 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité thermiquement en utilisant des brûleurs ou torches à plasma
A double-pulse laser system for generating first and second laser pulses, comprising a multipass cell (300) arranged to delay the second laser pulse with respect to the first laser pulse, wherein the multipass cell comprises first (305A, 305B) and second (307) reflector arrangements defining an optical cavity (315) in which the delayed second laser pulse is reflected back and forth multiple times between the first (305A, 305B) and second (307) reflector arrangements to provide a temporal delay between the first and second pulses of 1 ns or greater.
H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
H01S 3/102 - Commande de l'intensité, de la fréquence, de la phase, de la polarisation ou de la direction du rayonnement, p.ex. commutation, ouverture de porte, modulation ou démodulation par commande du milieu actif, p.ex. par commande des procédés ou des appareils pour l'excitation
A multipass cell (300) comprising: a first reflector arrangement (305A, 305B); and a second reflector arrangement (307), the first (305A, 305B) and second (307) reflector arrangements defining an optical cavity (315) therebetween and the cell; wherein the first reflector arrangement (305A, 305B) is configured such that light incident on the first reflector arrangement (305A, 305B) is at least partially retroreflected towards the second reflector arrangement (307), wherein the second reflector (307) arrangement comprises a concave surface that is reflective, wherein at least one of the first (305A, 305B) and second (307) reflector arrangements comprises an aperture (306) for allowing light to enter and/or exit the optical cavity (315).
An apparatus for plasma control is disclosed. The apparatus comprises: a plasma generator comprising two electrodes, an anode and a cathode, configured to produce a plasma between the two electrodes; a solenoid coil disposed to surround the plasma and configured to produce a magnetic field parallel to a longitudinal axis between the two electrodes; and circuitry configured for allowing independent timing of the magnetic field with respect to the production of the plasma. A method for plasma control in a spectroscopy system and an optical emission spectrometer using said method are also disclosed.
H05H 1/00 - Production du plasma; Mise en œuvre du plasma
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p.ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
H05H 1/52 - Production du plasma utilisant des fils explosifs ou des éclateurs
10.
ARC SCANNING METHODS FOR LASER INDUCED BREAKDOWN SPECTROSCOPY APPLICATIONS
A method for compositional analysis, in particular laser-induced breakdown spectroscopy (LIBS), includes providing a sample having a surface, moving an ablation point to a plurality of positions on the surface along an arc path defined by a plurality of arcs, wherein the plurality of arcs extend from an edge of the area to another edge of the area, wherein the arc path follows adjacent arcs of the plurality of arcs, pulsing an energy source to provide an electromagnetic energy beam to ablate material at the ablation point, collecting an emission spectrum in response to pulsing the energy source, and analyzing the emission spectrum to determine a composition at the surface.
G01N 21/71 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité thermiquement
A method of determining a peak intensity in an optical spectrum is described. The method includes producing a two-dimensional array of spectrum values by imaging the optical spectrum onto a detector array. An offset using an actual location and an expected location of a peak of an interpolated subarray is used to adjust an expected location of another peak that is within another two-dimensional subarray. Interpolated spectrum values are then used to produce a peak intensity value of the second peak.
G01J 3/02 - Spectrométrie; Spectrophotométrie; Monochromateurs; Mesure de la couleur - Parties constitutives
H05H 1/00 - Production du plasma; Mise en œuvre du plasma
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p.ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
12.
KINEMATICS PATH METHOD FOR LASER-INDUCED BREAKDOWN SPECTROSCOPY
A method for compositional analysis includes providing a sample having a surface and determining with a controller a plurality of equidistant positions along an oscillatory path along the surface. The oscillatory path is sinusoid in at least one orthogonal dimension within a plane approximately parallel to the surface. The method further includes, for each equidistant position of the plurality of equidistant position, moving an ablation point along the oscillatory path to the each equidistant position, pulsing an energy source to provide an electromagnetic energy beam to ablate material at the ablation point, and collecting an emission spectrum with a spectrographic instrument in response to pulsing the energy source. The method also includes analyzing the emission spectrum to determine a composition at the surface.
G01N 21/71 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité thermiquement
A method for compositional analysis includes providing a sample having a surface, moving an ablation point to a plurality of positions on the surface along a fractal path, pulsing an energy source to provide an electromagnetic energy beam to ablate material at the ablation point, collecting an emission spectrum in response to pulsing the energy source, and analyzing the emission spectrum to determine a composition at the surface.
G01N 21/71 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité thermiquement
A multipass cell (300) comprising: a first reflector arrangement (305A, 305B); and a second reflector arrangement (307), the first (305A, 305B) and second (307) reflector arrangements defining an optical cavity (315) therebetween and the cell; wherein the first reflector arrangement (305A, 305B) is configured such that light incident on the first reflector arrangement (305A, 305B) is at least partially retroreflected towards the second reflector arrangement (307), wherein the second reflector (307) arrangement comprises a concave surface that is reflective, wherein at least one of the first (305A, 305B) and second (307) reflector arrangements comprises an aperture (306) for allowing light to enter and/or exit the optical cavity (315).
A double-pulse laser system for generating first and second laser pulses, comprising a multipass cell (300) arranged to delay the second laser pulse with respect to the first laser pulse, wherein the multipass cell comprises first (305A, 305B) and second (307) reflector arrangements defining an optical cavity (315) in which the delayed second laser pulse is reflected back and forth multiple times between the first (305A, 305B) and second (307) reflector arrangements to provide a temporal delay between the first and second pulses of 1 ns or greater.
H01S 3/00 - Lasers, c. à d. dispositifs utilisant l'émission stimulée de rayonnement électromagnétique dans la gamme de l’infrarouge, du visible ou de l’ultraviolet
A method for controlling the flow of gas through a spectrometer, comprising: flowing a gas through a volume of the spectrometer, the volume being a volume through which light from a sample passes along a first path to reach a first detector and the gas being transparent to the light in a spectral region analysed by the spectrometer; transmitting light from a light source along a second path through the gas to a second detector; detecting an intensity of the light from the light source at the second detector at one or more wavelengths of the light; comparing the detected intensity of the light to a respective setpoint corresponding to a desired transmittance of the gas in the volume of the spectrometer and generating at least one error signal based on the comparison; and adjusting a flow rate of the gas through the volume of the spectrometer based on the error signal, in particular to minimise the difference between the detected intensity and setpoint.
G01N 21/31 - Couleur; Propriétés spectrales, c. à d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p.ex. spectrométrie d'absorption atomique
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p.ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
G01N 21/3504 - Couleur; Propriétés spectrales, c. à d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes en recherchant l'effet relatif du matériau pour les longueurs d'ondes caractéristiques d'éléments ou de molécules spécifiques, p.ex. spectrométrie d'absorption atomique en utilisant la lumière infrarouge pour l'analyse des gaz, p.ex. analyse de mélanges de gaz
A spark stand for an atomic emission spectrometer, comprising a spark chamber, a gas inlet for flowing gas into the spark chamber, and a gas outlet for carrying gas from the spark chamber. The spark stand is adapted to be decouplable from a stage at the atomic emission spectrometer, to permit removal and exchange with another spark stand. Also described is an atomic emission spectrometer stage for coupling to the spark stand, a maintenance appliance adapted to be releasably couplable to the spark stand, and a method of maintenance of the spark stand.
G01N 21/71 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité thermiquement
G01J 3/02 - Spectrométrie; Spectrophotométrie; Monochromateurs; Mesure de la couleur - Parties constitutives
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p.ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
H05H 1/00 - Production du plasma; Mise en œuvre du plasma
A spark stand for an optical emission spectrometer, comprising: a spark chamber; a gas inlet for flowing gas into the spark chamber; a gas outlet for carrying gas from the spark chamber; wherein one or more internal surfaces of the spark chamber, gas inlet and/or gas outlet comprise an anti-adhesion material. The anti- adhesion material can enable reduced adhesion of ablated material, such as metallic dusts for example, onto the surfaces within the spark stand.
G01N 21/15 - Prévention de la souillure des éléments du système optique ou de l'obstruction du chemin lumineux
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p.ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
19.
Apparatus and method for controlling an atomic emission spectrometer
A controller (316) and method for establishing safe operation of an atomic emission spectrometer (AES) to analyze a sample (100) arranged on a sample holder (102) of the AES. The controller (316) is configured to receive a measurement of at least one test parameter indicative of the arrangement of the sample (100) on the sample holder (102). The at least one test parameter is then compared to a range of target values for that test parameter to determine if the sample (100) is arranged correctly on the sample holder (102). The test parameters may include an electrical parameter dependant on a current between a first and a second terminal at the sample holder (102), gas pressure in a gas chamber housing an electrode of the AES, or displacement of a portion of the sample holder.
G01J 3/30 - Mesure de l'intensité des raies spectrales directement sur le spectre lui-même
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p.ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
G01N 27/04 - Recherche ou analyse des matériaux par l'emploi de moyens électriques, électrochimiques ou magnétiques en recherchant l'impédance en recherchant la résistance
A controller (316) and method for establishing safe operation of an atomic emission spectrometer (AES) to analyse a sample (100) arranged on a sample holder (102) of the AES. The controller (316) is configured to receive a measurement of at least one test parameter indicative of the arrangement of the sample (100) on the sample holder (102). The at least one test parameter is then compared to a range of target values for that test parameter to determine if the sample (100) is arranged correctly on the sample holder (102). The test parameters may include an electrical parameter dependant on a current between a first and a second terminal at the sample holder (102), gas pressure in a gas chamber housing an electrode of the AES, or displacement of a portion of the sample holder.
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p.ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
A spark optical emission spectrometer comprising: a spark source for causing spark induced emission of light from a sample; a single entrance slit; a toroidal mirror for directing the light through the single entrance slit; a plurality of diffraction gratings for diffracting light that has been directed through the entrance slit by the mirror, whereby the plurality of diffraction gratings are simultaneously illuminated; and at least one array detector for detecting the diffracted light from the plurality of diffraction gratings, wherein the minor is for directing the light through the entrance slit such that light from different regions in the spark source is spatially separated in an image of the light at the gratings whereby a first diffraction grating is preferentially illuminated with light from a first region of the spark source and simultaneously a second diffraction grating is preferentially illuminated with light from a second region of the spark source.
G01J 3/02 - Spectrométrie; Spectrophotométrie; Monochromateurs; Mesure de la couleur - Parties constitutives
G01J 3/18 - Production du spectre; Monochromateurs en utilisant des éléments diffractants, p.ex. réseaux
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p.ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
A spark optical emission spectrometer comprising: a spark source for causing spark induced emission of light from a sample; a single entrance slit; a toroidal mirror for directing the light through the single entrance slit; a plurality of diffraction gratings for diffracting light that has been directed through the entrance slit by the mirror, whereby the plurality of diffraction gratings are simultaneously illuminated; and at least one array detector for detecting the diffracted light from the plurality of diffraction gratings, wherein the mirror is for directing the light through the entrance slit such that light from different regions in the spark source is spatially separated in an image of the light at the gratings whereby a first diffraction grating is preferentially illuminated with light from a first region of the spark source and simultaneously a second diffraction grating is preferentially illuminated with light from a second region of the spark source.
A spark chamber for an optical emission analyser, comprising: a gas inlet located on a first side of the spark chamber for supplying a gas into the spark chamber; and a gas outlet located on a second side of the spark chamber arranged to convey the gas from the spark chamber; wherein an elongated electrode having an electrode axis generally along the direction of elongation is located within the spark chamber; and wherein: the first and second sides of the spark chamber lie at either side of the elongated electrode in directions generally perpendicular to the electrode axis; there is a gas flow axis through the spark chamber between the gas inlet and the gas outlet; and on passing along the gas flow axis from the gas inlet to the gas outlet the unobstructed internal cross sectional area of the spark chamber perpendicular to the gas flow axis remains constant to within a factor A, wherein A lies between 1.0 and 2.0
G01J 3/10 - Aménagements de sources lumineuses spécialement adaptées à la spectrométrie ou à la colorimétrie
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p.ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
The invention provides an apparatus and a method of performing X-ray diffraction (XRD) and/or X-ray fluorescence (XRF) analysis of a sample, comprising: irradiating a sample with X-rays from an X-ray source; providing a combined XRD and XRF detection arrangement comprising a scanning wavelength selector and at least one X-ray detector for detecting X-rays selected by the wavelength selector; and performing XRD analysis of the sample by selecting at least one fixed wavelength of X-rays diffracted by the sample using the scanning wavelength selector and detecting X-rays of the selected fixed wavelength(s) at one or more values of the diffraction angle φ at the sample using the X-ray detector(s); and/or performing XRF analysis of the sample by scanning wavelengths of X-rays emitted by the sample using the scanning wavelength selector and detecting X-rays of the scanned wavelengths using the X-ray detector(s).
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
27.
IMPROVED SPARK CHAMBER FOR OPTICAL EMISSION ANALYSIS
A spark chamber (110) for an optical emission analyser, comprising: a gas inlet (125) located on a first side of the spark chamber (110) for supplying a gas into the spark chamber (110); and a gas outlet (135) located on a second side of the spark chamber (110) arranged to convey the gas from the spark chamber (110); wherein an elongated electrode (140) having an electrode axis (142) generally along the direction of elongation is located within the spark chamber (110); and wherein: the first and second sides of the spark chamber (110) lie at either side of the elongated electrode (140) in directions generally perpendicular to the electrode axis (142); there is a gas flow axis (159) through the spark chamber (110) between the gas inlet and the gas outlet; and on passing along the gas flow axis (159) from the gas inlet (125) to the gas outlet (135) the unobstructed internal cross sectional area of the spark chamber (110) perpendicular to the gas flow axis remains constant to within a factor A, wherein A lies between 1.0 and 2.0
G01N 21/67 - Systèmes dans lesquels le matériau analysé est excité de façon à ce qu'il émette de la lumière ou qu'il produise un changement de la longueur d'onde de la lumière incidente excité électriquement, p.ex. par électroluminescence en utilisant des arcs électriques ou des décharges électriques
28.
Apparatus and methods for optical emission spectroscopy
The invention provides a spark generator for generating a spark for optical emission spectroscopy (OES), wherein the spark has a current waveform comprising a first modulated portion which comprises a plurality of relatively high current and high gradient peaks of variable amplitude and/or inter-peak duration and a second modulated portion of relatively low current and low gradient which is substantially without modulated peaks. The spark is preferably generated from two or more programmable current sources. The invention also provides an optical emission spectrometer comprising the spark generator and a method of optical emission spectroscopy using the spark generator.
H03K 3/57 - Générateurs caractérisés par le type de circuit ou par les moyens utilisés pour produire des impulsions par l'utilisation d'un élément accumulant de l'énergie déchargé dans une charge par un dispositif interrupteur commandé par un signal extérieur et ne comportant pas de réaction positive le dispositif de commutation étant un dispositif à semi-conducteurs
29.
METHOD AND APPARATUS FOR PERFORMING X-RAY ANALYSIS OF A SAMPLE
The invention provides a method of performing X-ray diffraction (XRD) and/or X-ray fluorescence (XRF) analysis of a sample, comprising: irradiating a sample with X-rays from an X-ray source; providing a combined XRD and XRF detection arrangement comprising a scanning wavelength selector and at least one X-ray detector for detecting X-rays selected by the wavelength selector; and performing XRD analysis of the sample by selecting at least one fixed wavelength of X-rays diffracted by the sample using the scanning wavelength selector and detecting X-rays of the selected fixed wavelength(s) at one or more values of the diffraction angle φ at the sample using the X-ray detector(s); and/or performing XRF analysis of the sample by scanning wavelengths of X-rays emitted by the sample using the scanning wavelength selector and detecting X-rays of the scanned wavelengths using the X-ray detector(s). Also provided is an apparatus for performing both X-ray diffraction (XRD) and X-ray fluorescence (XRF) analysis of a sample comprising a combined XRD and XRF detection arrangement comprising a scanning wavelength selector and at least one X-ray detector for detecting X-rays selected by the wavelength selector.
G01N 23/207 - Diffractométrie, p.ex. en utilisant une sonde en position centrale et un ou plusieurs détecteurs déplaçables en positions circonférentielles
G01N 23/22 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p.ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
30.
APPARATUS AND METHODS FOR OPTICAL EMISSION SPECTROSCOPY
The invention provides a spark generator for generating a spark for optical emission spectroscopy (OES), wherein the spark has a current waveform comprising a first modulated portion which comprises a plurality of relatively high current and high gradient peaks of variable amplitude and/or inter-peak duration and a second modulated portion of relatively low current and low gradient which is substantially without modulated peaks. The spark is preferably generated from two or more programmable current sources. The invention also provides an optical emission spectrometer comprising the spark generator and a method of optical emission spectroscopy using the spark generator.
H03K 3/53 - Générateurs caractérisés par le type de circuit ou par les moyens utilisés pour produire des impulsions par l'utilisation d'un élément accumulant de l'énergie déchargé dans une charge par un dispositif interrupteur commandé par un signal extérieur et ne comportant pas de réaction positive
brevets
