This semiconductor element manufacturing method comprises a conversion process for converting amorphous silicon into monocrystalline silicon. The conversion process includes: a first step for, through a treatment accompanying heat, forming a first film containing a first material so as to cover the amorphous silicon to form a silicide film in contact with the amorphous silicon; a second step for, after the first step and through a treatment accompanying heating, forming a second film containing a second material so as to cover the silicide film to form a compound comprising Si, the first material, and the second material so as to be in contact with the silicide film; and a third step for changing, into the compound through heating, the silicide film remaining after the second step. The first material is a material selected from the group consisting of Ni, Pd, Ti, Cu, Pt, Co, Mo, Mg, W, Cr, and Mn, and the second material is a material selected from the group consisting of Al, Au, Sb, In, Ag, and Ga.
H10B 43/27 - Dispositifs EEPROM avec des isolants de grille à piégeage de charge caractérisés par les agencements tridimensionnels, p. ex. avec des cellules à des niveaux différents de hauteur la région de source et la région de drain étant à différents niveaux, p. ex. avec des canaux inclinés les canaux comprenant des parties verticales, p. ex. des canaux en forme de U
H01L 21/20 - Dépôt de matériaux semi-conducteurs sur un substrat, p. ex. croissance épitaxiale
H01L 21/28 - Fabrication des électrodes sur les corps semi-conducteurs par emploi de procédés ou d'appareils non couverts par les groupes
H01L 21/336 - Transistors à effet de champ à grille isolée
H01L 29/788 - Transistors à effet de champ l'effet de champ étant produit par une porte isolée à grille flottante
H01L 29/792 - Transistors à effet de champ l'effet de champ étant produit par une porte isolée à isolant de grille à emmagasinage de charges, p.ex. transistor de mémoire MNOS
H10B 41/27 - Dispositifs de mémoire morte reprogrammable électriquement [EEPROM] comprenant des grilles flottantes caractérisés par les agencements tridimensionnels, p. ex. avec des cellules à des niveaux différents de hauteur la région de source et la région de drain étant à différents niveaux, p. ex. avec des canaux inclinés les canaux comprenant des parties verticales, p. ex. des canaux en forme de U
2.
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY
Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.
H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p. ex. implantation d'ions
3.
X-ray generating apparatus and X-ray imaging apparatus
X-ray generating apparatus includes X-ray generating unit having first and second bottom surfaces and side surface; driving circuit; accommodation housing accommodating the X-ray generating unit and the driving circuit; and insulating component arranged in the accommodation housing and having first insulating member arranged between the driving circuit and the accommodation housing and second insulating member arranged between the X-ray generating unit and the accommodation housing. First space is defined between the first insulating member and the accommodation housing, second space is defined between the second insulating member and the accommodation housing, third space is defined between the side surface and the second insulating member, fourth space is defined by the second bottom surface and internal surface of the first insulating member. The second space communicates with the third space, the first space communicates with the fourth space.
An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane, and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface. The X-ray detector includes a long X-ray receiver.
G01N 23/18 - Recherche de la présence de défauts ou de matériaux étrangers
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/083 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et mesurant l'absorption le rayonnement consistant en rayons X
G01N 23/20008 - Détails de construction des appareils d’analyse, p. ex. caractérisés par la source de rayons X, le détecteur ou le système optique à rayons XLeurs accessoiresPréparation d’échantillons à cet effet
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p. ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G21K 7/00 - Microscopes à rayons gamma ou à rayons X
Semiconductor manufacturing machines and their parts and fittings; semiconductor devices manufacturing equipment; platform for semiconductor devices manufacturing equipment; semiconductor wafer processing equipment; platform for semiconductor wafer processing equipment; semiconductor wafer conveying machines; thin-film deposition equipment for semiconductor, metal and insulator; platform for thin-film deposition equipment for semiconductor, metal and insulator; heat treatment equipment being annealing equipment for semiconductor manufacturing; platform for heat treatment equipment being annealing equipment for semiconductor manufacturing; sputtering equipment for semiconductor manufacturing; vacuum thin-film deposition equipment; vacuum vapor deposition equipment for semiconductor manufacturing; Chemical Vapor Deposition (CVD) equipment for semiconductor manufacturing; thin-film deposition equipment by Chemical Vapor Deposition method for semiconductor manufacturing; Atomic Layer Deposition (ALD) equipment for semiconductor manufacturing; etching equipment for semiconductor manufacturing
An X-ray generation device according to the present invention comprises: a housing container; an insulating container which comprises a main container body and a lid body and which is housed in the housing container; an X-ray tube which is housed in the insulating container and which generates X-rays through the impingement of electrons; and a plurality of electrical components housed in the insulating container, wherein the lid body covers at least a portion of the main container body, a first space in which at least the X-ray tube is disposed, a second space between the main container body and the lid body, and a third space between the insulating container and the housing container are formed, the second space is connected to each of the first space and the third space, and at least one of the plurality of electrical components is disposed in the second space.
This X-ray generation device comprises: a storage container; an insulation container disposed in the storage container; an X-ray generation tube at least a part of which is disposed in the insulation container; and a plurality of electrical components disposed in the insulation container. In the X-ray generation device, the plurality of electric components include a molded transformer. The molded transformer includes a core, an insulator covering the core, and a heat radiation path for transferring heat from the core to an external space of the insulator. The heat radiation path includes a hole provided in the insulator so as to extend from the external space toward the core.
An X-ray generating apparatus comprises a storage housing, an insulating housing arranged in the storage housing, an X-ray generating tube arranged at least partly in the insulating housing, and a plurality of electrical components arranged in the insulating housing. In the X-ray generating apparatus, the plurality of electrical components include a mold transformer, the mold transformer includes a core, an insulator covering the core, and a heat-dissipating path configured to move heat from the core to an external space of the insulator, and the heat-dissipating path includes a hole provided in the insulator to extend from the external space toward the core.
An X-ray generation device according to the present invention comprises: an insulation tube having a first opening end and a second opening end; an X-ray generation tube having a cathode that is disposed so as to block the first opening end of the insulation tube and includes an electron-emitting part, and an anode that is disposed so as to block the second opening end and includes a target that generates X-rays in response to collision therewith of the electrons emitted from the electron-emitting part; and a storage container storing the X-ray generation tube. The storage container has a third opening end. The X-ray generation tube is disposed so as to block the third opening end, and the storage container is filled with an insulating liquid. Outer surfaces of the cathode include a cylindrical surface-shaped side surface and a circular bottom surface, and of the outer surfaces, at least the entirety of the side surface is surrounded by a member.
This X-ray generation device includes an X-ray generator tube including an insulation tube having a first open end and a second open end, a cathode that is disposed so as to close the first open end of the insulation tube and that includes an electron emission part, and an anode that is disposed so as to close the second open end and that includes a target which generates X-rays when collided with the electrons from the electron emission part; a drive circuit that drives the X-ray generator tube; and a storage container that accommodates the X-ray generator tube and the drive circuit. The storage container includes a third open end, and the X-ray generator tube is disposed so as to close the third open end. The storage container is filled with an insulating liquid. In the storage container, defined are a first space in which the drive circuit is stored, and a second space which protrudes from the first space and in which the X-ray generator tube is stored. The storage container includes a protrusion that surrounds the second space. One end of the second space forms the third open end. An outer surface of the cathode includes a side surface with a cylindrical surface shape. The side surface of the cathode is surrounded by a first member. The first member is surrounded by a second member disposed between the first member and the storage container.
This x-ray generation device comprises: an x-ray generation tube that has an insulation tube, a cathode including an electron emission part, and an anode including a target; a drive circuit that drives the x-ray generation tube; and an accommodation container that accommodates therein the x-ray generation tube and the drive circuit. The accommodation container defines: a first space for storing therein the drive circuit; and a second space that projects from the first space and stores therein at least a portion of the x-ray generation tube. The accommodation container includes a projection part that surrounds the second space. The second space has: a third space into which x-rays from the target enter without being blocked by any of the cathode and the anode; and a fourth space for which entry of the x-rays from the target is blocked by either of the cathode or the anode. In the fourth space, a first insulating member is disposed separately from the insulation tube and the accommodation container so as to surround the insulation tube. In the third space, a second insulating member is disposed in contact with the insulation tube.
This X-ray generating device may include an X-ray generating tube. The X-ray generating tube may comprise: an insulated tube having a first open end and a second open end; a cathode which is disposed so as to close the first open end of the insulated tube and which includes an electron emitting portion; and an anode which is disposed so as to close the second open end and which includes a target that generates X-rays as a result of being impacted by electrons from the electron emitting portion. The X-ray generating device may include an accommodating container for accommodating the X-ray generating tube. The accommodating container may have a third open end, and the anode may be disposed so as to close the third open end. An insulating liquid may fill the accommodating container in such a way as to come into contact with a portion of the anode. A portion of an outer surface of at least the insulated tube may be enclosed by a member so as to reduce abnormal discharge between the cathode and the anode via the insulated tube.
An X-ray generating device (100) comprises an X-ray generating tube (1) including an insulated tube (10) having a first open end (OP1) and a second open end (OP2), a cathode (30) disposed so as to close the first open end (OP1) of the insulated tube (10) and including an electron emitting portion (32), and an anode (20) disposed so as to close the second open end (OP2) and including a target (23) that generates X-rays as a result of being impacted by electrons from the electron emitting portion (32), an electronic component (70) disposed in close proximity to the cathode (30), a drive circuit (40) for driving the X-ray generating tube (1) by means of the electronic component (70), and an accommodating container (50) for accommodating the X-ray generating tube (1), the electronic component (70) and the drive circuit (40), wherein: the accommodating container (50) has a third open end (OP3); the accommodating container (50) defines a first space (SP1) housing at least a portion of the drive circuit (40), and a second space (SP2) which protrudes from the first space (SP1) and which houses the X-ray generating tube (1) and the electronic component (70); the accommodating container (50) includes a protruding portion that surrounds the second space (SP2); and the electronic component (70) and an outside surface of the cathode (30) are covered by a member (72) disposed spaced apart from the accommodating container (50).
An X-ray generation device (100) comprises: an X-ray generation tube (1) that has an insulating tube (10), a cathode (30) that includes an electron emission portion (32), and an anode (20) that includes a target (23) that generates X-rays by being hit by electrons from the electron emission portion (32); a driving circuit (40) that drives the X-ray generation tube (1); and an accommodating container (50) that accommodates the X-ray generation tube (1) and the driving circuit (40), wherein the accommodating container (50) has an open end (OP3), the X-ray generation tube (1) being positioned so as to block the open end (OP3), an insulating solution (60) being filled in the interior of the accommodating container (50) so as to contact the insulating tube (10), the accommodating container (50) having a first space (SP1) that houses the driving circuit (40) and a second space that protrudes from the first space (SP1) and houses the X-ray generation tube (1), the accommodating container (50) including a protruding portion (520) that surrounds the second space (SP2), one end of the second space (SP2) constituting the open end (OP3), the entirety of the insulating tube (10) being housed in the second space (SP2), and the protruding portion (520) being composed of an insulating material.
This X-ray generation device comprises: an X-ray generating tube including an insulating tube having a first opening end and a second opening end, a cathode which is disposed so as to close the first opening end of the insulating tube and includes an electron-emitting portion, and an anode which is disposed so as to close the second opening end and includes a target that generates X-ray due to collision with electrons from the electron-emitting portion; and a housing container in which the X-ray generating tube is housed. The housing container has a third opening end, and the X-ray generating tube is disposed so as to close the third opening end. An insulating liquid is filled into the housing container so as to be in contact with part of the insulating tube. A first member disposed spaced apart from the second opening end is in contact with at least part of an outer surface of the insulating tube. The first member is sandwiched between a second member disposed spaced apart from the housing container and the insulating tube.
This X-ray generation device comprises an X-ray generation tube, a drive circuit, and a housing container. The X-ray generation tube includes: an insulation pipe having first and second open ends; a cathode closing the first open end of the insulation pipe and including an electron-emitting portion; and an anode closing the second open end and including a target with which electrons from the electron-emitting portion collide. The housing container has a third open end, which is closed by the X-ray generation tube. The housing container is filled with an insulating liquid. The housing container defines a first space in which the drive circuit is housed, and a second space that protrudes from the first space and in which at least a part of the X-ray generation tube is housed. The housing container includes a protruding portion surrounding the second space, one end of the second space constituting the third open end. A part of the outer surface of the insulation pipe is surrounded by an X-ray blocking member extending from the anode toward the cathode so as to block X-ray. The X-ray blocking member is covered by an insulation member.
An X-ray generating apparatus includes an X-ray generating tube including an electron gun and a target configured to generate X-rays upon receiving an electron beam emitted from the electron gun, a deflector configured to deflect the electron beam, a driving circuit configured to apply an accelerating voltage between a cathode of the electron gun and the target, and an adjuster configured to adjust deflection of the electron beam by the deflector in accordance with the accelerating voltage or an amount of change in the accelerating voltage so as to reduce a change in incident position of the electron beam onto the target due to a change in the accelerating voltage.
H01J 35/30 - Tubes, dans lesquels le point d'impact du rayon cathodique sur l'anode ou l'anticathode est déplaçable par rapport à la surface de celles-ci par déviation du rayon cathodique
H01J 35/14 - Dispositifs de concentration, de focalisation ou d'orientation du rayon cathodique
H05G 1/32 - Commande de la tension d'alimentation de l'appareil ou du tube à rayons X
18.
VAPOR DEPOSITION MASK AND METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
This method for manufacturing a vapor deposition mask includes a patterning step for patterning a mask substrate so that a plurality of pattern regions are formed on the mask substrate, a joining step for joining the mask substrate and the support substrate and forming a laminate, and a processing step for processing the mask substrate so that the plurality of pattern regions in the laminate are separated from each other.
This X-ray generation device comprises: an X-ray generation tube including an electron gun and a target that generates X-rays upon receiving an electron beam emitted from the electron gun; a deflector that deflects the electron beam; a drive circuit that imparts an acceleration voltage between a cathode of the electron gun and the target; and an adjustment unit for adjusting the deflection of the electron beam by the deflector, in accordance with the acceleration voltage or an amount of change in the acceleration voltage, so as to reduce a change in the position at which the electron beam is incident on the target due to change in the acceleration voltage.
H01J 35/30 - Tubes, dans lesquels le point d'impact du rayon cathodique sur l'anode ou l'anticathode est déplaçable par rapport à la surface de celles-ci par déviation du rayon cathodique
20.
X-ray generation apparatus, x-ray imaging apparatus, and adjustment method of x-ray generation apparatus
An X-ray imaging apparatus includes an X-ray generation apparatus including an X-ray generation tube having an electron gun and a target configured to receive an electron beam from the electron gun to generate X-rays, a support structure supporting the tube, and a deflector configured to deflect the electron beam, an X-ray detector configured to detect the X-rays from the X-ray generation apparatus, and a control apparatus configured to control the X-ray generation apparatus. The support structure supports the tube to permit at least the target to be pivoted in a state in which the deflector is fixed, and the control apparatus determines, based on use amount of the X-ray generation apparatus and/or change of the X-rays generated by the X-ray generation apparatus, whether it is necessary to pivot the target.
H01J 35/24 - Tubes, dans lesquels le point d'impact du rayon cathodique sur l'anode ou l'anticathode est déplaçable par rapport à la surface de celles-ci
G01N 23/046 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux en utilisant la tomographie, p. ex. la tomographie informatisée
21.
Electric component, X-ray generation apparatus, and X-ray imaging apparatus
An electric component includes an electric circuit and a metal container covering the electric circuit. The metal container includes a side wall portion surrounding the electric circuit, and a closing portion forming an end surface of the metal container while covering an end portion of the side wall portion. An exposed surface of an outer peripheral portion of the closing portion exposed to an outside of the metal container has a roundness in a section perpendicular to the end surface.
G01N 23/083 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et mesurant l'absorption le rayonnement consistant en rayons X
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
A sputtering apparatus includes a first target holder configured to hold a first target such that a first surface of the first target faces the processing space, and a second target holder configured to hold a second target such that a second surface of the second target faces the processing space, wherein the first target holder holds the first target such that an orthogonal projection vector of a first normal vector, which is a normal vector of the first surface, with respect to a virtual plane including the substrate holding surface is directed to a direction away from the substrate, and the second target holder holds the second target such that an orthogonal projection vector of a second normal vector, which is a normal vector of the second surface, with respect to the virtual plane is directed to a direction away from the substrate.
A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.
An inspection apparatus for inspecting an inspection target object, includes an X-ray generation tube having a target including an X ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to an inspection target surface of the inspection target object, an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X ray generation portion and totally reflected by the inspection target surface, and an adjustment mechanism configured to adjust a relative position between the inspection target surface and the X-ray detector.
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/083 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et mesurant l'absorption le rayonnement consistant en rayons X
G01N 23/18 - Recherche de la présence de défauts ou de matériaux étrangers
G01N 23/20008 - Détails de construction des appareils d’analyse, p. ex. caractérisés par la source de rayons X, le détecteur ou le système optique à rayons XLeurs accessoiresPréparation d’échantillons à cet effet
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p. ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G21K 7/00 - Microscopes à rayons gamma ou à rayons X
An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane, and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface. The X-ray detector includes a long X-ray receiver.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
26.
X-ray generating apparatus, method of adjusting target, and method of using X-ray generating apparatus
An X-ray generating apparatus includes an electron gun, a target configured to generate X-rays by being irradiated with an electron beam emitted from the electron gun, and a controller configured to control a first mode for thinning the target by irradiating the target with an electron beam with a current adjusted within a first current range and a second mode for generating X-rays by irradiating the target with an electron beam with a current adjusted within a second current range. The first current range has a lower limit larger than an upper limit of the second current range.
An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane; and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface.
G01N 23/20 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffraction de la radiation par les matériaux, p. ex. pour rechercher la structure cristallineRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la diffusion de la radiation par les matériaux, p. ex. pour rechercher les matériaux non cristallinsRecherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en utilisant la réflexion de la radiation par les matériaux
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/083 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et mesurant l'absorption le rayonnement consistant en rayons X
G01N 23/18 - Recherche de la présence de défauts ou de matériaux étrangers
G01N 23/20008 - Détails de construction des appareils d’analyse, p. ex. caractérisés par la source de rayons X, le détecteur ou le système optique à rayons XLeurs accessoiresPréparation d’échantillons à cet effet
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p. ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G21K 7/00 - Microscopes à rayons gamma ou à rayons X
An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane; and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface. The X-ray detector has an energy resolution not less than 1 keV or the X-ray detector has no energy analysis function.
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/083 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et mesurant l'absorption le rayonnement consistant en rayons X
G01N 23/18 - Recherche de la présence de défauts ou de matériaux étrangers
G01N 23/20008 - Détails de construction des appareils d’analyse, p. ex. caractérisés par la source de rayons X, le détecteur ou le système optique à rayons XLeurs accessoiresPréparation d’échantillons à cet effet
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p. ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G21K 7/00 - Microscopes à rayons gamma ou à rayons X
An inspection apparatus for inspecting an inspection target object, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection target object, and a plurality of X-ray detectors, wherein each of the plurality of X-ray detectors detects X-rays emitted from a foreign substance existing on an inspection target surface of the inspection target object irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface.
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p. ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/083 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et mesurant l'absorption le rayonnement consistant en rayons X
G01N 23/18 - Recherche de la présence de défauts ou de matériaux étrangers
G01N 23/20008 - Détails de construction des appareils d’analyse, p. ex. caractérisés par la source de rayons X, le détecteur ou le système optique à rayons XLeurs accessoiresPréparation d’échantillons à cet effet
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G21K 7/00 - Microscopes à rayons gamma ou à rayons X
This electric component comprises an electric circuit and a metal container that covers the electric circuit. The metal container includes side wall portions that surround the electric circuit, and a closing portion that constitutes an end surface of the metal container while covering ends of the side wall portions. An exposed surface exposed on the outside of the metal container out of an outer peripheral portion of the closing portion is rounded in a cross section perpendicular to the end surface.
This X-ray generation device comprises: an electron gun; and a target that generates X-rays when being irradiated with electrons emitted from the electron gun. The X-ray generation device comprises a control unit that controls execution of a first mode for thinning the target by irradiating the target with the electrons by means of current adjusted within a first current range and a second mode for generating X-rays by irradiating the target with the electrons by means of current adjusted within a second current range. The lower limit of the first current range is higher than the upper limit of the second current range.
H01J 35/30 - Tubes, dans lesquels le point d'impact du rayon cathodique sur l'anode ou l'anticathode est déplaçable par rapport à la surface de celles-ci par déviation du rayon cathodique
This X-ray generation device is provided with: an X-ray generation unit having a first bottom face, a second bottom face, and a lateral face; a drive circuit; an accommodation container; and an insulating component. The insulating component includes a first insulating member disposed between the drive circuit and the accommodation container, and a second insulating member disposed between the X-ray generation unit and the accommodation container. A first space is defined by an outer lateral face of the first insulating member and an inner lateral face of the accommodation container. A second space is defined by an outer lateral face of the second insulating member and the inner lateral face of the accommodation container. A third space is defined by the lateral face of the X-ray generation unit and an inner lateral face of the second insulating member. A fourth space is defined by the second bottom face of the X-ray generation unit and an inner lateral face of the first insulating member. The second space and the third space are connected by a first connection part, and the first space and the fourth space are connected by a second connection part.
This X-ray generation device comprises: an X-ray generation tube including an electron gun and a target that generates X rays upon receiving an electron beam emitted from the electron gun; a support structure that supports the X-ray generation tube; and a deflector that deflects the electron beam. The support structure supports the X-ray generation tube so as to allow at least the target to rotate in a state where the deflector is fixed.
This X-ray generator is provided with: an X-ray generation device; an X-ray detector that detects X-ray emitted from the X-ray generation device; and a control device that controls the X-ray generation device. The X-ray generation device comprises an X-ray generation tube including an electron gun and a target that is caused to generate X-ray by receiving an electron beam emitted from the electron gun; a support structure that supports the X-ray generation tube; and a deflector that deflects the electron beam. The support structure supports the X-ray generation tube in such a way as to allow for rotation of at least the target, with the deflector fixed in place. The control device determines whether the target needs to be rotated, in accordance with the usage of the X-ray generation device and/or a change in the X-ray generated by the X-ray generation device.
H01J 35/10 - Anodes tournantesDispositions pour anodes tournantesRéfrigération des anodes tournantes
H05G 1/52 - Commande de la dimension de la cible ou de sa formeCommande de la direction du faisceau d'électrons, p. ex. dans des tubes avec une anode et plus d'une cathode
A vacuum processing device according to the present invention comprises: a chamber having an upper wall in which a first opening and a second opening are formed; an upper lid which opens/closes the first opening; a hinge mechanism which is provided to cover the second opening and pivotally supports the upper lid with respect to the first opening; a first sealing member which is provided between the upper lid and the upper wall so as to surround the first opening and elastically deforms; and a second sealing member which is provided between the hinge mechanism and the upper wall so as to surround the second opening and elastically deforms.
F16J 13/04 - Organes de fermeture amoviblesMoyens de serrage des fermetures fixés par organe formant pont
B01J 3/03 - Récipients sous pression, ou récipients sous vide, comportant des organes de fermeture ou des joints d'étanchéité spécialement adaptés à cet effet
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
This inspection device for inspecting a surface to be inspected that is disposed on an inspection surface comprises: an X-ray emission tube for radiating X-rays toward the inspection surface, the X-ray emission tube having a target including an X-ray generating part that generates X-rays in response to irradiation with an electron beam; and an X-ray detector for detecting X-rays that are radiated from foreign matter present on the surface to be inspected irradiated with X-rays from the X-ray generating part, and that are totally reflected by the surface to be inspected.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p. ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
This inspection device for inspecting an object to be inspected comprises: an X-ray generation tube that has a target having an X-ray generation unit for generating an X-ray upon being irradiated with an electron beam and that radiates an X-ray towards the object to be inspected; and a plurality of X-ray detectors. Each of the plurality of X-ray detectors detects an X-ray that has been: radiated from foreign matter present on an inspected surface of the object to be to inspected irradiated with the X-ray from the X-ray generation unit; and totally reflected by the inspected surface.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p. ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
38.
IDENTIFICATION DEVICE THAT DETECTS FOREIGN MATTER AND OPERATES USING FLUORESCENCE X-RAYS
This inspection dvice for inspecting a surface to be inspected that is disposed on an inspection surface comprises an X-ray generation tube having a target including an X-ray generation unit for generating X-rays due to being irradiated with an electron beam, the X-ray generation tube emitting X-rays toward the inspection surface; and an X-ray detector for detecting X-rays that are emitted from foreign matter present on the surface to be inspected, which is irradiated with the X-rays from the X-ray generation unit, and that are totally reflected by the surface to be inspected, the X-ray detector having a long X-ray capture unit.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p. ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
According to the present invention, an inspection device for inspecting an object under inspection comprises an x-ray generation tube, an x-ray detector, and an adjustment mechanism. The x-ray generation tube: has a target that includes an x-ray generator that generates x-rays as a result of being irradiated with an electron beam; and emits x-rays toward an inspected surface of the object under inspection. The x-ray detector detects x-rays that have undergone total reflection at the inspected surface after being emitted from contaminants at the inspected surface as irradiated with x-rays from the x-ray generator. The adjustment mechanism adjusts the relative positions of the inspected surface and the x-ray detector.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p. ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
According to the present invention, an inspection device that inspects a surface under inspection that has been provided at an inspection surface comprises an x-ray generation tube and an x-ray detector. The x-ray generation tube: has a target that includes an x-ray generator that generates x-rays as a result of being irradiated with an electron beam; and emits x-rays toward the inspection surface. The x-ray detector detects x-rays that have undergone total reflection at the surface under inspection after being emitted from contaminants at the surface under inspection as irradiated with x-rays from the x-ray generator. The x-ray detector has an energy resolution of at least 1 keV or does not have an energy analysis function.
G01N 23/223 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en mesurant l'émission secondaire de matériaux en irradiant l'échantillon avec des rayons X ou des rayons gamma et en mesurant la fluorescence X
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/2206 - Combinaison de plusieurs mesures, l'une au moins étant celle d’une émission secondaire, p. ex. combinaison d’une mesure d’électrons secondaires [ES] et d’électrons rétrodiffusés [ER]
41.
LAMINATED BODY AND LAMINATED BODY MANUFACTURING METHOD
Provided are a laminated body and a laminated body manufacturing method that can improve adhesiveness between a resin layer and a seed layer. The laminated body has a substrate, a first wiring layer, a resin layer, and a second wiring layer in this order, and the second wiring layer includes at least an adhesive layer and a seed layer in this order.
H01L 23/498 - Connexions électriques sur des substrats isolants
H01L 21/48 - Fabrication ou traitement de parties, p. ex. de conteneurs, avant l'assemblage des dispositifs, en utilisant des procédés non couverts par l'un uniquement des groupes ou
H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p. ex. implantation d'ions
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01J 37/305 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour couler, fondre, évaporer ou décaper
C23C 28/00 - Revêtement pour obtenir au moins deux couches superposées, soit par des procédés non prévus dans un seul des groupes principaux , soit par des combinaisons de procédés prévus dans les sous-classes et
An ion gun according to one embodiment of the present invention has an anode, a cathode having a first portion and a second portion that face the anode, and a magnet that creates a spatial magnetic field between the first portion and the second portion. An annular gap including a curved portion is provided between the first portion and the second portion of the cathode. The magnet creates lines of magnetic field having the bottom inside with respect to the sectional center line of the gap between the first portion and the second portion of the curved portion.
Atomic diffusion bonding is carried out using a bonding film comprising a nitride formed at a bonding surface. Operating in a vacuum chamber, a bonding film comprising a nitride is formed on each of flat surfaces of two substrates that each have the flat surface, and, by overlapping the two substrates so the bonding films formed on the two substrates are in contact with each other, the two substrates are joined by the generation of atomic diffusion at a bonding interface between the bonding films.
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
B32B 37/12 - Procédés ou dispositifs pour la stratification, p. ex. par polymérisation ou par liaison à l'aide d'ultrasons caractérisés par l'usage d'adhésifs
B32B 7/12 - Liaison entre couches utilisant des adhésifs interposés ou des matériaux interposés ayant des propriétés adhésives
B32B 9/04 - Produits stratifiés composés essentiellement d'une substance particulière non couverte par les groupes comprenant une telle substance comme seul composant ou composant principal d'une couche adjacente à une autre couche d'une substance spécifique
A sputtering apparatus provided with a treatment chamber, a substrate holder for holding a substrate on a substrate-holding surface in a treatment space in the treatment chamber, a first target holder for holding a first target so that a first surface of the first target faces the treatment space, and a second target holder for holding a second target so that a second surface of the second target faces the treatment space, wherein the first target holder holds the first target so that the orthogonal projection vector of a first normal vector of the first surface on an imaginary plane containing the substrate-holding surface directs away from the substrate, and the second target holder holds the second target so that the orthogonal projection vector of a second normal vector of the second surface on the imaginary plane directs away from the substrate.
Substrates that are bonding targets are bonded in ambient atmosphere via bonding films, including oxides, formed on bonding faces of the substrates. The bonding films, which are metal or semiconductor thin films formed by vacuum film deposition and at least the surfaces of which are oxidized, are formed into the respective smooth faces of two substrates having the smooth faces that serve as the bonding faces. The bonding films are exposed to a space that contains moisture, and the two substrates are overlapped in the ambient atmosphere such that the surfaces of the bonding films are made to be hydrophilic and the surfaces of the bonding films contact one another. Through this, a chemical bond is generated at the bonded interface, and thereby the two substrates are bonded together in the ambient atmosphere. The bonding strength γ can be improved by heating the bonded substrates at a temperature.
H01L 21/50 - Assemblage de dispositifs à semi-conducteurs en utilisant des procédés ou des appareils non couverts par l'un uniquement des groupes ou
H01L 23/10 - ConteneursScellements caractérisés par le matériau ou par la disposition des scellements entre les parties, p. ex. entre le couvercle et la base ou entre les connexions et les parois du conteneur
H01L 23/20 - Matériaux de remplissage caractérisés par le matériau ou par ses propriétes physiques ou chimiques, ou par sa disposition à l'intérieur du dispositif complet gazeux à la température normale de fonctionnement du dispositif
A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.
A film forming apparatus has a process chamber and a processing unit provided in the process chamber and forming adhesive film. The surface of the inner walls of the process chamber is formed of a material having a large getter effect on gas or water (H2O) remaining in the process chamber.
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
C23C 14/18 - Matériau métallique, bore ou silicium sur d'autres substrats inorganiques
A stacked structure includes a ferroelectric layer, and a tunnel barrier layer joined to the ferroelectric layer. The main component of the ferroelectric layer is aluminum nitride, and the main component of the tunnel barrier layer is magnesium oxide.
H01L 27/11514 - Mémoires mortes programmables électriquement; Procédés de fabrication à étapes multiples de ces dispositifs avec condensateurs ferro-électriques de mémoire caractérisées par les agencements tridimensionnels, p ex. avec des cellules à des niveaux différents de hauteur
H01L 27/11507 - Mémoires mortes programmables électriquement; Procédés de fabrication à étapes multiples de ces dispositifs avec condensateurs ferro-électriques de mémoire caractérisées par la région noyau de mémoire
Provided are: a laminate that can improve the adhesiveness between a resin layer and a seed layer; and a method for manufacturing the laminate. The laminate has, in order, a substrate, a first wiring layer, a resin layer, and a second wiring layer. The second wiring layer has, in order, at least an adhesive layer and a seed layer.
H05K 3/18 - Appareils ou procédés pour la fabrication de circuits imprimés dans lesquels le matériau conducteur est appliqué au support isolant de manière à former le parcours conducteur recherché utilisant la technique de la précipitation pour appliquer le matériau conducteur
H01L 23/12 - Supports, p. ex. substrats isolants non amovibles
An ion gun including an anode, a cathode opposed to the anode and having a first portion and a second portion, and a magnet configured to form a magnetic field space between the first portion and the second portion. An annular gap including a linear portion and a curved portion is provided between the first portion and the second portion of the cathode. The magnet is configured to form, between the first portion and the second portion of the curved portion, a magnetic field line having a bottom inside a cross-sectional centerline of the gap.
Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.
H01J 37/305 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour couler, fondre, évaporer ou décaper
H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p. ex. implantation d'ions
52.
CHEMICAL BONDING METHOD AND PACKAGED ELECTRONIC COMPONENT
In the present invention, substrates that are articles being joined are joined in air via joining films that are composed of an oxide and that are formed on joining surfaces of the substrates. The joining films, which are thin metal or semiconductor films that are formed from vacuum-formed films and that are oxidized at least on the surfaces thereof, are formed on smooth surfaces serving as the joining surfaces, the smooth surfaces being respectively provided to two substrates. The joining films are exposed to a moisture-including space to hydrophilize the surfaces of the joining films, and the two substrates are superposed in air such that the surfaces of the joining films come into contact with each other. Chemical bonding is thereby induced at a joining interface and the two substrates are joined in air. The joining strength γ of the joined substrates can be improved by, as one example, heating the substrates at a temperature of 400°C or lower as necessary.
According to the present invention, substrates that are bonding targets are bonded in the ambient atmosphere via bonding films, comprising oxides, formed on bonding faces of the substrates. The bonding films, which are metal or semiconductor thin films formed by vacuum film deposition and at least the surfaces of which are oxidized, are formed into the respective smooth faces of two substrates having the smooth faces that serve as the bonding faces. The bonding films are exposed to a space that contains moisture, and the two substrates are overlapped in the ambient atmosphere such that the surfaces of the bonding films are made to be hydrophilic and the surfaces of the bonding films contact one another. Through this, a chemical bond is generated at the bonded interface, and thereby the two substrates are bonded together in the ambient atmosphere. The bonding strength γ can be improved by heating the bonded substrates at a temperature, 400°C or lower for one example, as needed. This bonding method can also be applied to hybrid bonding for the three-dimensional integration of devices.
A bonded structure includes a first substrate; a second substrate placed opposite to the first substrate; an intermediate layer provided between the first substrate and the second substrate and including a first oxide thin film layered on the first substrate and a second oxide thin film layered on the second substrate; either or both of the first oxide thin film and the second oxide thin film of the intermediate layer being formed of oxide thin films having increased defects; and an interface between the first oxide thin film and the second oxide thin film=being bonded by chemical bonding, and the interface comprising a low-density portion whose density is lower than that of the two oxide thin films.
The present invention achieves chemical bonding by means of a joined film made of oxides formed on a joined surface. In a vacuum container, amorphous oxide thin films are respectively formed on smooth surfaces of two substrates, and the two substrates overlap such that the amorphous oxide thin films formed on the two substrates come into contact with each other, thereby causing chemical bonding involving an atomic diffusion at a joined interface between the amorphous oxide thin films to join the two substrates.
A load lock device includes a load lock chamber including a first conveyance port connected to a transfer chamber connected to a reduced-pressure processing device, and a second conveyance port connected to a loader chamber; a substrate holder configured to hold a substrate in the load lock chamber; a driving mechanism arranged below the load lock chamber to move the substrate holder up and down and connected to the substrate holder via a connecting member; an extension chamber extended from a lower portion of the load lock chamber to a side; and a pump arranged below the extension chamber and configured to discharge a gas in the load lock chamber via the extension chamber. The extension chamber includes a bottom surface with an opening at a position deviated from a vertically lower position of the substrate holder, and the pump is connected to the opening.
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
H01L 21/677 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le transport, p. ex. entre différents postes de travail
H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p. ex. mandrins, pièces de serrage, pinces
57.
Substrate processing apparatus and substrate processing method
A substrate processing apparatus that processes a substrate using particles, includes a conveyance mechanism configured to convey the substrate along a conveyance surface, a particle source configured to emit particles, a rotation mechanism configured to make the particle source pivot about a rotation axis, and a movement mechanism configured to move the particle source such that a distance between the particle source and the conveyance surface is changed.
A load lock device includes a load lock chamber, and a substrate holding structure configured to hold a substrate in the load lock chamber, wherein the substrate holding structure includes a facing surface facing the substrate, and is configured to allow a gas to flow through a space between the substrate and the facing surface, and in a state in which the substrate is held by the substrate holding structure, a distance between the substrate and a portion located inside an outer edge of the facing surface is larger than a distance between the substrate and the outer edge of the facing surface.
H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p. ex. mandrins, pièces de serrage, pinces
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
H01L 21/677 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le transport, p. ex. entre différents postes de travail
A plasma processing apparatus includes a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal, a vacuum container, a first electrode electrically connected to the first output terminal, a second electrode electrically connected to the second output terminal, and a connection unit configured to electrically connect the vacuum container and ground, the connection unit including an inductor.
An ion gun has: an anode; a cathode having a first portion and a second portion facing the anode; and a magnet that forms a spatial magnetic field between the first portion and the second portion. A circular gap that includes a straight-line section and a curved section is provided between the first portion and the second portion of the cathode. Between a first portion and a second portion of the curved section, the magnet forms a magnetic beam having a bottom closer to the inner side than the cross-sectional center line of the gap.
An ion gun has an anode, a cathode having first and second portions facing the anode, and a magnet forming a spatial magnetic field between the first and second portions. An annular gap including a curved portion is provided between the first portion and the second portion of the cathode. The magnet forms magnetic field lines having a bottom on the inside of the cross-sectional center line of the gap between the first portion and the second portion of the curved portion.
Atomic diffusion bonding is carried out using a bonding film comprising a nitride formed at a bonding surface. Operating in a vacuum chamber, a bonding film comprising a nitride is formed on each of flat surfaces of two substrates that each have the flat surface, and, by overlapping the two substrates so the bonding films formed on the two substrates are in contact with each other, the two substrates are joined by the generation of atomic diffusion at a bonding interface between the bonding films.
A structure in which a plurality of particles each containing a hydrogen absorption metal element are arranged in a fixed member such that the plurality of particles are apart from each other. An entire surface of each of the plurality of particles is surrounded by the fixed member. The fixed member contains at least one of an oxide and a nitride.
B01J 20/28 - Compositions absorbantes ou adsorbantes solides ou compositions facilitant la filtrationAbsorbants ou adsorbants pour la chromatographieProcédés pour leur préparation, régénération ou réactivation caractérisées par leur forme ou leurs propriétés physiques
B01J 20/02 - Compositions absorbantes ou adsorbantes solides ou compositions facilitant la filtrationAbsorbants ou adsorbants pour la chromatographieProcédés pour leur préparation, régénération ou réactivation contenant une substance inorganique
C01B 3/56 - Séparation de l'hydrogène ou des gaz contenant de l'hydrogène à partir de mélanges gazeux, p. ex. purification par contact avec des solidesRégénération des solides usés
An X-ray generation device includes a cathode including an electron source generating an electron beam, an anode including a target to transmit an X-ray generated by collision of the electron beam, and a convergence electrode converging the electron beam toward the target. The target has a first region having a locally small thickness and a second region having a larger thickness than the first region. The X-ray generation device further includes a deflection unit to switch an incident position of the electron beam between the first region and the second region. The deflection unit has an adjustment mode to adjust an X-ray focal spot diameter and an X-ray generation mode to generate an X-ray, the electron beam is caused to enter the first region in the adjustment mode, and the electron beam is caused to enter the second region in the X-ray generation mode.
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
66.
X-ray generation apparatus and X-ray imaging apparatus
An X-ray generation apparatus includes an X-ray generation unit, a storage container configured to store the X-ray generation unit, and an insulating component arranged between an inner surface of the storage container and at least a part of the X-ray generation unit. The insulating component includes a first insulating member and a second insulating member, the first insulating member includes a first portion having a first surface, and a second portion having a second surface, a step difference is formed by the first surface and the second surface, and the second portion has a thickness smaller than that of the first portion, an adhesive surface of the second insulating member and the second surface of the first insulating member are connected by an adhesive material, and a flatness of the second surface is better than a flatness of the first surface.
H05G 1/06 - Tube à rayons X et au moins une partie de l'appareil d'alimentation de puissance montés à l'intérieur de la même gaine
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/083 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et mesurant l'absorption le rayonnement consistant en rayons X
An ionization gauge includes an anode having a rod shape, and a cathode including a cathode plate having a through hole through which the anode extends. The cathode includes a first cathode plate including a through hole through which the anode extends, and a storage portion configured to store the electromagnetic wave source, a second cathode plate arranged separately from the first cathode plate, a third cathode plate arranged between the first cathode plate and the second cathode plate to be in contact with the first cathode plate, and a member configured to surround the first cathode plate, the second cathode plate, and the third cathode plate.
Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.
B08B 3/08 - Nettoyage impliquant le contact avec un liquide le liquide ayant un effet chimique ou dissolvant
H01J 37/063 - Disposition géométrique des électrodes pour la formation du faisceau
H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p. ex. implantation d'ions
69.
Electron generating apparatus and ionization gauge
An electron generating apparatus includes a filament, a power supply configured to supply power to the filament so as to make the filament emit an electron, and a controller configured to repeatedly detect a value having a correlation with power supplied from the power supply to the filament, determine whether a state of the filament satisfies a notification condition, by using a plurality of detected values, and perform notification when the state satisfies the notification condition.
An ionization gauge includes an anode, a cathode, and an electromagnetic wave source. The cathode includes a first cathode plate having a through hole through which the anode passes, a storage portion configured to store the electromagnetic wave source, and a passage arranged between the storage portion and the through hole and configured to pass an electromagnetic wave generated by the electromagnetic wave source.
This ionization gauge comprises an anode, a cathode, and an electromagnetic wave source. The cathode contains a first cathode plate that includes: a through-hole through which the anode passes; and an accommodation section that accommodates the electromagnetic wave source. The first cathode plate includes, between the accommodation section and the through-hole, a channel that allows the electromagnetic waves generated by the electromagnetic wave source to pass.
This ionization vacuum gauge comprises a rod-shaped positive electrode, and a negative electrode that includes a negative electrode plate having a through-hole through which the positive electrode passes. The shape of the through-hole in a cross-section along the axial direction of the positive electrode includes a recess sandwiched between two protrusions.
This X-ray generator is provided with an X-ray generation unit, a housing case housing the X-ray generation unit, and an insulating component disposed between the inner surface of the housing case and at least a part of the X-ray generation unit. The insulating component includes a first insulating member and a second insulating member. The first insulating member includes a first portion having a first surface and a second portion having a second surface. A level difference is formed by the first surface and the second surface. The second portion is thinner than the first portion. The second surface forms the level difference with the first surface, and the second portion is thinner than the first portion. An adhesion surface of the second insulating member and the second surface of the first insulating member are bonded together by means of an adhesive material. The second surface has better flatness than the flatness of the first surface.
This load lock device is provided with a load lock chamber and a substrate holding structure for holding a substrate in the load lock chamber. The substrate holding structure has an opposing surface opposing the substrate, and is configured to allow a gas to flow in a space between the substrate and the opposing surface. In a state in which the substrate is being held by the substrate holding structure, the distance between a portion positioned on the inner side of an outer edge of the opposing surface and the substrate is greater than the distance between the outer edge of the opposing surface and the substrate.
H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives
H01L 21/3065 - Gravure par plasmaGravure au moyen d'ions réactifs
H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension
This X-ray generation device is provided with: an X-ray generation tube having a cathode that includes an electron-emitting section for emitting electrons in a first direction, and an anode including a target that generates X-rays as a result of the electrons emitted from the electron-emitting section colliding therewith; a voltage supply unit that supplies voltage to the X-ray generation tube via a conductive wire; a housing container having a first part forming a first space for housing the voltage supply unit, a second part forming a second space for housing the X-ray generation tube and having a width narrower than that of the first space in a second direction orthogonal to the first direction, and a connecting part for connecting the first part and the second part to one another such that an internal space in which the first space and the second space communicate is formed, said connecting part having a protruding section pointing toward the internal space; and an insulating member arranged in the internal space so as to surround at least part of at least one of the conductive wire and the cathode. The insulating member is arranged so as to block at least the shortest path between the conductive wire and the protruding section, has a structure in which at least two members are bonded by an adhesive material, and is arranged so as to block a linear path between the adhesive material and the conductive wire and a linear path between the adhesive material and the cathode.
A load lock device that comprises a load lock chamber that has a first transfer port that connects to a transfer chamber that is connected to a depressurization processing device and a second transfer port that connects to a loader chamber, a substrate holder that holds a substrate inside the load lock chamber, a drive mechanism that is arranged below the load lock chamber and linked to the substrate holder via a linking member so as to be capable of raising the substrate holder, a long chamber that extends laterally from a lower part of the load lock chamber, and a pump that is arranged below the long chamber and discharges gas from the load lock chamber via the long chamber. The long chamber has a bottom surface that has an opening at a location that is offset from vertically below the substrate holder, and the pump is connected to the opening.
H01L 21/677 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le transport, p. ex. entre différents postes de travail
H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives
H01L 21/3065 - Gravure par plasmaGravure au moyen d'ions réactifs
This load lock device is provided with a load lock chamber and a board holding structure for holding a board in the load lock chamber. The board holding structure is configured to have a facing surface that faces the board, and a space between the board and the facing surface through which a gas can flow. In a state in which the board is held by the board holding structure, the distance between the board and a portion located inside an outer edge of the facing surface is greater than the distance between the outer edge of the facing surface and the board.
H01L 21/683 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension
H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives
H01L 21/3065 - Gravure par plasmaGravure au moyen d'ions réactifs
This load lock device comprises: a load lock chamber that has a first transport port connected to a transfer chamber connected to a decompression processing device and a second transport port connected to a loader chamber; a substrate holder that holds a substrate in the load lock chamber; a drive mechanism that is disposed below the load lock chamber to raise and lower the substrate holder and is connected to the substrate holder via a connection member; an extension chamber that extends laterally from a lower portion of the load lock chamber; and a pump that is located below the extension chamber and discharges gas from the load lock chamber through the extension chamber. The extension chamber has a bottom surface having an opening at a position deviated from vertically below the substrate holder, and the pump is connected to the opening.
H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives
H01L 21/3065 - Gravure par plasmaGravure au moyen d'ions réactifs
H01L 21/677 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le transport, p. ex. entre différents postes de travail
The present invention achieves chemical bonding by means of a joined film made of oxides formed on a joined surface. In a vacuum container, amorphous oxide thin films are respectively formed on smooth surfaces of two substrates, and the two substrates overlap such that the amorphous oxide thin films formed on the two substrates come into contact with each other, thereby causing chemical bonding involving an atomic diffusion at a joined interface between the amorphous oxide thin films to join the two substrates.
X-ray generation apparatus includes X-ray generation tube having cathode and anode, voltage supply for supplying voltage to the X-ray generation tube via conductive line, storage container including first portion forming first space storing the voltage supply, second portion forming second space having width smaller than that of the first space and storing the X-ray generation tube, and connecting portion connecting the first and second portions to form internal space in which the first space and the second space communicate, and insulating member arranged in the internal space to block shortest path between the conductive line and convex portion of the connecting portion. The insulating member is formed by connecting members by adhesive material, and is configured to block linear path between the adhesive material and the conductive line and linear path between the adhesive material and the cathode.
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
G01N 23/083 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et mesurant l'absorption le rayonnement consistant en rayons X
An ionization gauge includes an anode having a rod shape, and a cathode including a cathode plate having a through hole through which the anode extends. A shape of the through hole on a section along an axial direction of the anode includes a concave portion sandwiched between two convex portions.
A plasma processing apparatus includes an impedance matching circuit, a balun having a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode, a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit, and a controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance.
The X-ray generation device is provided with: an electron gun; and an anode having a target from which X-rays are generated when electrons from the electron gun collide therewith. The electron gun includes a cathode having an electron emission part, an extraction electrode for extracting electrons emitted from the electron emission part, and a focusing electrode for converging the electrons extracted by the extraction electrode. The focusing electrode includes a first section having a tubular shape and a second section disposed on the inside of the first section. The first section has a tip part facing the anode, the second section has a facing surface facing the anode, and the facing surface has an electron-passing hole for allowing the electrons from the electron emission part to pass through. The distance between the tip part and the anode is smaller than the distance between the facing surface and the anode. The tip part has a lower thermal conductivity than the thermal conductivity of the second section.
X-ray generation tube includes electron gun, and anode having target to generate X-rays upon collision with electrons from the electron gun. The electron gun includes cathode having electron emitting portion, extraction electrode to extract the electrons from the electron emitting portion, and focusing electrode to focus the extracted electrons. The focusing electrode includes first portion having tubular shape, and second portion arranged inside the first portion. The first portion includes distal end facing the anode, the second portion includes opposing surface facing the anode, and the opposing surface includes electron passage hole through which the electrons from the electron emitting portion pass. Distance between the distal end and the anode is shorter than that between the opposing surface and the anode. Thermal conductivity of the distal end is lower than that of the second portion.
A substrate processing apparatus that processes a substrate using particles, includes a conveyance mechanism configured to convey the substrate along a conveyance surface, a particle source configured to emit particles, a rotation mechanism configured to make the particle source pivot about a rotation axis, and a movement mechanism configured to move the particle source such that a distance between the particle source and the conveyance surface is changed.
An X-ray generation device comprising: an X-ray generation tube having a cathode that includes an electron emitting part which emits electrons in a first direction, and an anode that includes a target which generates X-rays due to the electrons emitted from the electron emitting part colliding therewith; a voltage supply part supplying voltage to the X-ray generation tube via a conductive wire; a housing container having a first section that forms a first space for housing the voltage supply part, a second section that forms a second space for housing the X-ray generation tube with said second space having a width that is narrower than that of the first space in a second direction perpendicular to the first direction, and a linking part that links the first section and the second section to one another such that the first space and the second space are in communication; and an insulating liquid filling an internal space in which the first space and the second space are in communication, wherein the linking part has a projection that projects toward the internal space, the cathode is disposed between the projection and the anode in the first direction, and an insulating member is disposed so as to enclose at least part of the conductive wire and block at least a linear path between the conductive wire and the projection.
A deposition method of arranging a discharge portion of a striker near a target to induce arc discharge and forming a film on a substrate using a plasma generated by the arc discharge is disclosed. The method includes a changing step of changing a position for inducing the arc discharge by the striker in a region set in the target, a deposition step of forming the film on the substrate using the plasma generated by inducing the arc discharge at the position, and a reduction step of reducing the region in accordance with use of the target.
A plasma processing apparatus includes a processing chamber configured to process a substrate, a plasma generator configured to generate a plasma, a transport unit configured to transport, to the processing chamber, the plasma generated by the plasma generator, and a scanning magnetic field generator configured to generate a magnetic field which deflects the plasma so as to scan the substrate by the plasma. The scanning magnetic field generator is configured to be capable of adjusting a center of a locus of the plasma.
A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.
An electron gun includes a cathode including an electron emitting portion, an extraction electrode for extracting electrons emitted from the electron emitting portion, and a focusing electrode for focusing the electrons extracted by the extraction electrode. The focusing electrode includes an outside electrode having a tubular shape, and an inside electrode arranged inside the outside electrode. The inside electrode defines a first space having a columnar shape, and includes a first surface on a side of the cathode, and a second surface on an opposite side of the first surface. An inside surface of the outside electrode and the second surface of the inside electrode define a second space. The inside electrode includes an electron passage hole, and a communicating portion which makes the first space and the second space communicate with each other.
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
91.
X-ray generation apparatus and X-ray imaging apparatus
An X-ray generation apparatus includes an X-ray generation tube including a cathode having an electron emitting portion, and an anode having a target, a voltage supply supplying voltage to the X-ray generation tube via a conductive line, a storage container having a first portion forming a first space storing the voltage supply, a second portion forming a second space storing the X-ray generation tube, and a connecting portion connecting the first portion and the second portion, and an insulating liquid filling internal space of the storage container. The connecting portion includes a convex portion pointed toward the internal space. The cathode is arranged between the convex portion and the anode, and an insulating member is arranged to surround portion of the conductive line and block shortest path between the conductive line and the convex portion.
This electron gun is provided with a cathode having an electron emission portion, an extraction electrode which extracts electrons emitted from the electron emission portion, and a convergence electrode which converges the electrons extracted by the extraction electrode. The convergence electrode includes an outer electrode having a tubular shape, and an inner electrode disposed inside the outer electrode, the inner electrode defines a columnar first space, and has a first surface on the cathode side and a second surface opposite to the first surface, and the inner surface of the outer electrode and the second surface of the inner electrode define a second space. The inner electrode has an electron passage hole through which electrons pass, and a communication portion that communicates the first space and the second space.
An X-ray generating tube includes an insulating tube having a first open end and a second open end, a cathode including an electron emission source and arranged to close the first open end of the insulating tube, an anode including a target that generates an X-ray upon collision with electron from the electron emission source and arranged to close the second open end of the insulating tube, and a tubular electrical conductive member extending from the anode in an inner space of the insulating tube. The insulating tube includes a tubular rib at a position spaced apart from the first open end and spaced apart from the second open end, and the tubular rib is arranged in a radial direction when viewed from an end of the tubular electrical conductive member on a side of the cathode.
G01N 23/04 - Recherche ou analyse des matériaux par l'utilisation de rayonnement [ondes ou particules], p. ex. rayons X ou neutrons, non couvertes par les groupes , ou en transmettant la radiation à travers le matériau et formant des images des matériaux
H01J 35/32 - Tubes dont les rayons X sont produits à l'extrémité, ou dans le voisinage de l'extrémité, du tube ou d'une partie du tube, le tube ou ladite partie présentant une section transversale faible afin de faciliter leur introduction dans une petite ouverture ou cavité
This X-ray generation tube comprises: an insulation tube having a first open end and a second open end; a cathode having an electron emission source and disposed so as to close the first open end of the insulation tube; an anode having a target that generates X-rays by a collision of electrons from the electron emission source therewith, and disposed so as to close the second open end of the insulation tube; and a tubular conductive member extending from the anode in an interior space of the insulation tube. The insulation tube includes a tubular rib at a position distant from the first open end and distant from the second open end. The tubular rib is disposed in a radiation direction as viewed from an end on the cathode side of the tubular conductive member.
This X-ray generating device has: a negative electrode including an electron source for generating an electron beam; a positive electrode including a transmissive target with which X rays generated by collision of the electron beam can be transmitted in the propagation direction of the electron beam; and a focusing electrode for focusing the electron beam on a transmissive target. The transmissive target comprises: a first region having a locally small thickness; and a switching means configured to enable the position where the electron beam is incident on the transmissive target to be switched between the first region and a second region having a thickness greater than that of the first region.
A plasma processing apparatus includes a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal, a vacuum container, a first electrode electrically connected to the first output terminal, a second electrode electrically connected to the second output terminal, and a connection unit configured to electrically connect the vacuum container and ground, the connection unit including an inductor.
A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, and a second electrode electrically connected to the second balanced terminal. When Rp represents a resistance component between the first balanced terminal and the second balanced terminal when viewing a side of the first electrode and the second electrode from a side of the first balanced terminal and the second balanced terminal, and X represents an inductance between the first unbalanced terminal and the first balanced terminal, 1.5≤X/Rp≤5000 is satisfied.
A plasma processing apparatus includes a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal, a vacuum container, a first electrode insulated from the vacuum container and electrically connected to the first output terminal, and a second electrode insulated from the vacuum container and electrically connected to the second output terminal. The second electrode is arranged to surround an entire circumference of the first electrode.
A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.
A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an impedance matching circuit, a first power supply connected to the balun via the impedance matching circuit, and configured to supply a high frequency to the first electrode via the impedance matching circuit and the balun, a low-pass filter, and a second power supply configured to supply a voltage to the first electrode via the low-pass filter.
H01L 21/00 - Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de dispositifs à semi-conducteurs ou de dispositifs à l'état solide, ou bien de leurs parties constitutives
