Printed-Circuit-Board structure, in particular for an RF generator, including a heat spreader; a basic printed-circuit-board, PCB, having an upper surface and a lower surface, wherein the basic PCB includes a metallic layer at the lower surface having at least one conductor line and/or at least one contact pad; a contact layer. The contact layer is includes an upper surface directly connected to the metallic layer of the basic PCB and a lower surface; wherein the lower surface of the contact layer is bonded to the heat spreader by a bonding layer.
H01B 3/56 - Isolateurs ou corps isolants caractérisés par le matériau isolantEmploi de matériaux spécifiés pour leurs propriétés isolantes ou diélectriques composés principalement de substances organiques gaz
A method of controlling a radio frequency processing system, the method including determining an end time of a radio frequency pulse; stopping a load applied to the radio frequency processing system based on the end time of the radio frequency pulse; adjusting an additional load having a predetermined impedance applied to the radio frequency processing system in response to the determined end time; determining a start point of a second radio frequency pulse; and stopping the additional load before the second radio frequency pulse occurs.
An electron gun device, in particular for an X-ray tube, includes a metallic first electrode having a first electrode contact surface; a metallic second electrode having a second electrode contact surface; and a ring-shaped ceramic insulator having a first insulator contact surface on a first side with respect to an axial direction of the insulator and a second insulator contact surface on an opposite second side with respect to the axial direction. In an assembled state, the first insulator contact surface faces the first electrode contact surface and is connected to the first electrode contact surface via a first brazing joint, and the second insulator contact surface faces the second electrode contact surface and is connected to the second electrode contact surface via a second brazing joint.
Method for operating an electronic system comprising a radio frequency, RF, matching network, wherein the RF matching network comprises a plurality of electronic components, wherein at least one of the electronic components is a variable reactance component, wherein the method includes: monitoring activity information of the at least one variable reactance component; and determining a predicted lifetime from the activity information.
A vacuum variable capacitor includes a vacuum sealed enclosure to contain a vacuum dielectric medium, wherein the enclosure includes a first plate and a second plate, the first plate and the second plate being separated by an electrically insulating element, a fixed electrode attached inside the enclosure to the first plate and a movable electrode attached to a movable plate, wherein the movable plate is attached inside the enclosure to the second plate by at least one vacuum bellows, wherein the vacuum capacitor includes a mechanical drive system for displacing, in particular translating, the movable plate relative to the first plate so as to vary the capacitance of the vacuum capacitor, wherein the mechanical drive system includes a ball screw arranged to drive the movable plate and wherein the mechanical drive system includes outside of the vacuum sealed enclosure a limiting element limiting the maximum distance between the first plate and the movable plate and wherein the drive system includes a nut attached to the ball screw, wherein the nut includes a first shoulder configured to abut against the limiting element to limit the maximum distance between the first plate and the movable plate.
H01G 5/14 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication à variation de surface efficace d'armature par mouvement d'armatures longitudinal
A method for machine learning a detection of at least one irregularity in a plasma system, particularly an RF powered plasma processing system, including providing at least one input signal each related to an analog signal of a power delivery system for the plasma system and/or to another characteristic of the power delivery system and/or of the plasma system. The at least one input signal having at least one irregularity feature indicative of the irregularity in the plasma system, performing a machine learning procedure wherein the at least one input signal having the at least one irregularity feature is processed by a programmable circuit to train the detection of the irregularity in the plasma system.
An X-ray tube includes a vacuum-sealed tube housing evacuated to a pressure of 10−7 mbar or lower, a cathode assembly inside the housing including an electron emitter adapted to emit electrons when heated at a temperature included in a defined working temperature range and at least one component containing carbon in an amount of at least 20% by weight, especially at least 30% by weight, even more especially at least 50% by weight, the at least one component being preferably designed for holding the emitter, and an anode assembly inside the housing including a target layer for receiving electrons emitted by the electron emitter, wherein the electron emitter preferably includes boride, preferably lanthanum hexaboride (LaB6), and wherein the cathode assembly is designed such that if the emitter temperature is included in the working temperature range.
H01J 35/20 - Emploi de substances spécifiées comme atmosphère gazeuseMoyens pour produire ou conserver la pression désirée à l'intérieur du tube, p. ex. au moyen d'un getter
9.
Method for Generating an RF Signal, Controller, RF Generator and Plasma Apparatus
A method for generating an RF signal preferably for a plasma chamber including the steps of: generating an input RF signal on the basis of a first set of control parameters; detecting at least one distorted RF signal; synchronizing the at least one distorted RF signal with the input RF signal; determining a difference between a target RF signal and the at least one distorted RF signal being synchronized; if the difference is larger than a predetermined threshold, determining a second set of control parameters based on the comparison of the target RF signal and the at least one distorted RF signal being synchronized; and generating an adapted input RF signal on the basis of the second set of control parameters such that the difference between the target RF signal and the distorted RF signal is reduced.
A method for improving digital signal processing in a radio-frequency system, in particular a radio-frequency power delivery system, including providing at least one input signal, preferably related to a radio-frequency signal of the radio-frequency system, performing a processing procedure wherein the at least one input signal is repeatedly processed by a programmable circuit using at least one configurable parameter of the processing, wherein a configuration of the at least one parameter is varied for each processing of the at least one input signal to obtain respective processing results, determining at least one parameter result for an optimization of the configuration based on the processing results, and providing the at least one determined parameter result for the improved digital signal processing.
G06F 30/34 - Conception de circuits pour circuits reconfigurables, p. ex. réseaux de portes programmables [FPGA] ou circuits logiques programmables [PLD]
G06F 30/27 - Optimisation, vérification ou simulation de l’objet conçu utilisant l’apprentissage automatique, p. ex. l’intelligence artificielle, les réseaux neuronaux, les machines à support de vecteur [MSV] ou l’apprentissage d’un modèle
09 - Appareils et instruments scientifiques et électriques
Produits et services
Scientific, surveying, measuring and checking apparatus and
instruments; apparatus and installations for the production
of X-rays, not for medical use; X-ray apparatus not for
medical use; X-ray tubes not for medical use; apparatus and
installations for producing X-rays and radiographic
components, not for medical use, for imaging and analytical
procedures, for measuring, controlling, regulating and
weighing; apparatus and installations for producing X-rays
and radiographic components, not for medical use, for
generating electronic radiation for industrial use; particle
accelerators; electron guns; electron tubes; choking coils
[impedance]; vacuum tubes; electrical condensers
[capacitors]; transformers [electricity]; apparatus and
instruments for generating electronic radiation for
industrial use; apparatus for controlling and regulating
electric current and voltage; apparatus and instruments for
conducting, switching, transforming, accumulating,
regulating or controlling electricity; material testing
instruments and machines; data processing apparatus,
computers and software for controlling machines, apparatus
and installations for production of X-rays, radiographic
components, particle accelerators, electron guns, electron
tubes and electronic radiation for industrial use; hardware
and software components for controlling and monitoring X-ray
sources; radio apparatus and instruments; high-frequency
apparatus; components and spare parts included in this class
for all the aforesaid goods; all the aforesaid goods not
intended for precision tools and machining machine tools.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
A61B 18/12 - Instruments, dispositifs ou procédés chirurgicaux pour transférer des formes non mécaniques d'énergie vers le corps ou à partir de celui-ci par chauffage en faisant passer des courants à travers les tissus à chauffer, p. ex. des courants à haute fréquence
A method for homing a stepping motor having a plurality of full-step positions within each full rotation of a rotor of the stepper motor includes applying a first drive current to windings of the stepper motor to rotate the rotor at least one full rotation in a first direction away from an end-of-travel (EOT) position. Thereafter, the drive current is applied to the windings to rotate the rotor in a second direction toward the EOT position. Upon detection of EOT, the drive current is discontinued. Drive current is then applied to the windings to rotate the rotor of the stepper motor in micro-steps in the first direction to a closest full-step position of the stepper motor. Finally, a drive current is applied to drive the stepper motor a predetermined number of full steps away from the EOT position.
H02P 8/08 - Détermination de la position avant le démarrage
H01G 5/16 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication à variation de la distance entre armatures
A broad-band sensor for a radio frequency plasma processing system that includes a reaction chamber housing an electrode within a vacuum processing environment. The sensor includes an inductive pickup positioned in the vacuum processing environment proximate to the electrode. The inductive pickup includes a wire formed into a loop extending in an azimuthal direction about a symmetry axis of the reaction chamber. A lead carrying an electric signal from the inductive pickup extends through a vacuum wall of the reaction chamber outside the vacuum processing environment. An attenuator circuit including an electrical resistance bridge couples the lead to a signal carrier extending outside the vacuum processing environment. The broad-band sensor has radio frequency detection capability for measuring electromagnetic surface modes within the plasma chamber and coupling the measured electromagnetic surface modes to the signal carrier.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
G01R 27/26 - Mesure de l'inductance ou de la capacitanceMesure du facteur de qualité, p. ex. en utilisant la méthode par résonanceMesure de facteur de pertesMesure des constantes diélectriques
15.
HIGH-VOLTAGE GENERATOR DEVICE, X-RAY GENERATOR AND METHOD FOR MANUFACTURING A HIGH-VOLTAGE GENERATOR DEVICE
A high-voltage generator device is provided comprising an electric field shaper for shaping an electric field, in particular for a high-voltage generator. The electric field shaper comprising at least one field shaping unit which has a field shaping element. The field shaping element comprises a non-conductive body, in particular a plastic body, and an electrically conductive coating that is arranged on the non-conductive body.
09 - Appareils et instruments scientifiques et électriques
Produits et services
Scientific, surveying, measuring and checking apparatus and instruments, namely, radio frequency generators for supplying radio-frequency energy, inspection machines for the physical inspection of semiconductors, microchips, and electrical components; apparatus and installations for the production of X-rays, not for medical use; X-ray apparatus not for medical use; X-ray tubes not for medical use; apparatus and installations for producing X-rays and radiographic components, not for medical use, for imaging and analytical procedures, for measuring, controlling, regulating and weighing; apparatus and installations for producing X-rays and radiographic components, not for medical use, for generating electronic radiation for industrial use; particle accelerators; electron guns; electron tubes; choking coils for use in electrical apparatus; vacuum tubes for non-medical X-ray imaging apparatus; electrical condensers being capacitors; electrical transformers; apparatus and instruments for generating electronic radiation for industrial use; apparatus for controlling and regulating electric current and voltage; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling electricity; material testing instruments and machines, namely surface roughness testing machines and instruments and electronic apparatus for measuring and testing the strength and tensile characteristics of industrial materials; data processing apparatus, computers and downloadable software for controlling machines, apparatus and installations for production of X-rays, radiographic components, particle accelerators, electron guns, electron tubes and electronic radiation for industrial use; computer hardware and downloadable software for controlling and monitoring X-ray sources; radio apparatus and instruments, namely, radio transmitters and radio receivers; high-frequency apparatus, namely, high frequency switches, high frequency switching power supplies, high frequency emitters and receivers, and high frequency generators; replacement parts for all the aforesaid goods; all the aforesaid goods not intended for precision tools and machining machine tools
09 - Appareils et instruments scientifiques et électriques
37 - Services de construction; extraction minière; installation et réparation
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Machines for transforming plastic materials; machines for
processing paints, printer's pastes, coatings, foils,
plastics and other products; plasma engraving machines;
equipment for processing semi-conductor wafers; machines for
processing semiconductor wafers; machines for manufacturing
semi-conductor substrates; electrostatic coating machines;
high-voltage generators; generators for the middle, high and
ultrahigh frequency range for stimulating, producing,
regulating and controlling plasma; machine parts, namely,
vacuum and inert-gas capacitors; frames for vacuum and
inert-gas capacitors (parts of machines); components and
spare parts included in this class for all the aforesaid
goods; all the aforesaid goods not intended for precision
tools and machining machine tools. Scientific, surveying, measuring and checking apparatus and
instruments; apparatus and installations for the production
of X-rays, not for medical use; X-ray apparatus not for
medical use; X-ray tubes not for medical use; apparatus and
installations for producing X-rays and radiographic
components, not for medical use, for imaging and analytical
procedures, for measuring, controlling, regulating and
weighing; apparatus and installations for producing X-rays
and radiographic components, not for medical use, for
generating electronic radiation for industrial use; particle
accelerators; electron guns; electron tubes; choking coils
[impedance]; vacuum tubes; electrical condensers
[capacitors]; transformers [electricity]; apparatus and
instruments for generating electronic radiation for
industrial use; apparatus for controlling and regulating
electric current and voltage; apparatus and instruments for
conducting, switching, transforming, accumulating,
regulating or controlling electricity; material testing
instruments and machines; data processing apparatus,
computers and software for controlling machines, apparatus
and installations for production of X-rays, radiographic
components, particle accelerators, electron guns, electron
tubes and electronic radiation for industrial use; hardware
and software components for controlling and monitoring X-ray
sources; radio apparatus and instruments; high-frequency
apparatus; components and spare parts included in this class
for all the aforesaid goods; all the aforesaid goods not
intended for precision tools and machining machine tools. Installation, maintenance and repair of machines for
transforming plastics, paint processing machines and
apparatus, printers' pastes, coatings, sheets, plastics,
electrostatic coating machines, middle, high and ultrahigh
frequency range generators for stimulating, producing,
regulating and controlling plasma, apparatus and
installations for the production of X-rays, radiographic
components, particle accelerators, electron guns, electron
tubes and apparatus and installations for generating
electronic radiation for industrial purposes; installation,
maintenance and repair of industrial machinery;
installation, maintenance and repair of industrial machinery
and manufacturing plants; installation, maintenance and
repair of machines for transforming plastics; installation,
maintenance and repair of electric and electronic apparatus
and equipment; installation, maintenance and repair of
computer hardware and computer peripherals for managing and
controlling machines, apparatus and installations for
producing X-rays, radiographic components, particle
accelerators, electron guns, electron tubes and electronic
radiation for industrial applications; disinfection; all the
aforesaid services not intended for precision tools and
machining machine tools. Treatment of materials for third parties; custom application
of optical, transparent, solar reflective and wear-resistant
coatings on metallic, organic and mineral substrates;
treatment of bio-pharmaceutical materials; information
relating to the treatment of materials; custom manufacture
of apparatus and installations for producing X-rays and
radiographic components for medical and non-medical use,
particle accelerators, electron guns, electron tubes and
apparatus and installations for generating electronic
radiation for industrial use, on request and according to a
customer's specifications; glass etching services;
application of thin films on object surfaces by means of
chemical, mechanical, thermal, thermo-mechanical processes,
chemical vapor deposition, physical vapor deposition and
vacuum deposition; all the aforesaid services not intended
for precision tools and machining machine tools. Scientific research and development; research, development,
analysis and consultancy services in the field of
engineering; development and testing services in the field
of engineering; industrial testing, development and
research; research and development of products; research and
development of new products for third parties; research and
development services in connection with physics; industrial
analysis and research services; design and development of
testing and analysis methods; testing of materials;
technical consultant services with respect to product
development; providing information in the field of product
development; providing information and data with respect to
scientific and technological research and development;
biochemical research and development; design and development
of computers and computer programs for the management and
control of machines, apparatus and installations for the
production of X-rays, radiographic components, particle
accelerators, electron guns, electron tubes and electronic
radiation for industrial applications; installation,
updating and maintenance of computer software for managing
and controlling machines, apparatus and installations for
producing X-rays, radiographic components, particle
accelerators, electron guns, electronic tubes and electronic
radiation for industrial use; rental of computer software
for the management and control of machines, apparatus and
installations for the production of X-rays, radiographic
components, particle accelerators; all the aforesaid
services not intended for precision tools and machining
machine tools.
A variable capacitor includes an enclosure having first and second conductive collars separated by an intermediate electrically insulating element. A movable capacitor plate assembly is electrically coupled to the first conductive collar, and a fixed capacitor plate assembly is electrically coupled to the second conductive collar. An actuator extends into the enclosure for advancing and retracting the movable capacitor plate assembly relative to the fixed capacitor plate assembly. A hermetically sealed volume within the enclosure contains a dielectric fluid serving as a dielectric between a capacitor plate of the movable capacitor plate assembly and a capacitor plate of the fixed capacitor plate assembly. A flexible structure is provided to contain the dielectric fluid displaced when the movable capacitor plate assembly is advanced toward the fixed capacitor plate assembly.
H01G 13/00 - Appareils spécialement adaptés à la fabrication de condensateursProcédés spécialement adaptés à la fabrication de condensateurs non prévus dans les groupes
A variable capacitor includes first and second movable capacitor plate assemblies disposed in the interior of an enclosure and include a first and second movable capacitor plates. A first fixed capacitor plate and a second fixed capacitor plate are respectively disposed proximal to the first and second movable capacitor plates. The capacitor plates may comprise variably interdigitated concentric cylindrical blades. The first movable capacitor plate and the first fixed capacitor plate may be coaxial with the second movable capacitor plate and the second fixed capacitor plate. Actuators may be provided for independently advancing and retracting the first and second movable capacitor plate assemblies with respect to the first and second fixed capacitor plate assemblies to vary the capacitance of the variable capacitor by independently adjusting an amount of interdigitization of the capacitor plates of respective capacitor plate assembly pairs.
H01G 5/16 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication à variation de la distance entre armatures
A variable capacitor includes first and second movable capacitor plate assemblies disposed in the interior of an enclosure and include a first and second movable capacitor plates. A first fixed capacitor plate and a second fixed capacitor plate are respectively disposed proximal to the first and second movable capacitor plates. The capacitor plates may comprise variably interdigitated concentric cylindrical blades, The first movable capacitor plate and the first fixed capacitor plate may be coaxial with the second movable capacitor plate and the second fixed capacitor plate. Actuators may be provided for independently advancing and retracting the first and second movable capacitor plate assemblies with respect to the first and second fixed capacitor plate assemblies to vary the capacitance of the variable capacitor by independently adjusting an amount of interdigitization of the capacitor plates of respective capacitor plate assembly pairs.
H01G 5/14 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication à variation de surface efficace d'armature par mouvement d'armatures longitudinal
A high frequency, high voltage compound helical inductor coil includes a primary coil configured as a helix, a secondary coil configured as a helix and being surrounded by and parallel with the primary coil. A dielectric insulator, configured as a helix, is disposed between and separates the primary coil and the secondary coil. A center conductor may extend axially through the primary and secondary coils and may be attached at a first end to the primary coil and at a second end to the secondary coil.
Resistor assembly, in particular for a power combiner, comprising a resistor chip and a clamping element to clamp the resistor chip to a cooling element, wherein the clamping element has a clamping arm to apply a pressure to the resistor chip.
A Radio Frequency, RF, generator in particular for a plasma application, comprising: a cooling element; at least a first RF power stage having a first output and a second RF power stage having a second output, both being mounted onto the cooling element; an RF combining network mounted onto the cooling element comprising at least a first input and a second input; an RF distribution element, wherein the RF distribution element comprises a printed circuit board, PCB, having a plurality of conductors, wherein the conductors of the RF distribution element are arranged such that the first output of the first RF power stage is connected to the first input of the RF combining network and the second output of the second RF power stage with the second input of the RF combining network, respectively, wherein the PCB of the RF distribution element is arranged perpendicularly to the cooling element.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
A61B 18/12 - Instruments, dispositifs ou procédés chirurgicaux pour transférer des formes non mécaniques d'énergie vers le corps ou à partir de celui-ci par chauffage en faisant passer des courants à travers les tissus à chauffer, p. ex. des courants à haute fréquence
H05H 1/46 - Production du plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
09 - Appareils et instruments scientifiques et électriques
37 - Services de construction; extraction minière; installation et réparation
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Machines for transforming plastics, namely compressing machines; machines for processing paints, printer's pastes, coatings, plastic sheets, metal sheets, foils, plastics, glass and semi-conductor wafers; plasma engraving machines; equipment for processing semi-conductor wafers; machines for processing semiconductor wafers; machines for manufacturing semi-conductor substrates; electrostatic coating machines; high-voltage generators; generators for the middle, high and ultrahigh frequency range for stimulating, producing, regulating and controlling plasma; machine parts, namely, vacuum and inert-gas capacitors; frames for vacuum and inert-gas capacitors being parts of machines; replacement parts included in this class for all the aforesaid goods; all the aforesaid goods not intended for precision tools and machining machine tools Treatment of materials by means of custom application of optical, transparent, solar reflective and wear-resistant coatings on metallic, organic and mineral substrates for third parties; custom application of optical, transparent, solar reflective and wear-resistant coatings on metallic, organic and mineral substrates; treatment of bio-pharmaceutical materials by means of X-rays and high frequency generators for third parties; providing information relating to the treatment of materials by means of custom application of optical, transparent, solar reflective and wear-resistant coatings on metallic, organic and mineral substrates; custom manufacture of apparatus and installations for producing X-rays and radiographic components for medical and non-medical use, particle accelerators, electron guns, electron tubes and apparatus and installations for generating electronic radiation for industrial use, on request and according to a customer's specifications; glass etching services; application of thin films on object surfaces by means of chemical, mechanical, thermal, thermo-mechanical processes, chemical vapor deposition, physical vapor deposition and vacuum deposition; all the aforesaid services not intended for precision tools and machining machine tools Scientific, surveying, measuring and checking apparatus and instruments, namely, radio frequency generators for supplying radio-frequency energy, inspection machines for the physical inspection of semiconductors, microchips, and electrical components; apparatus and installations for the production of X-rays, not for medical use; X-ray apparatus not for medical use; X-ray tubes not for medical use; apparatus and installations for producing X-rays and radiographic components, not for medical use, for imaging and analytical procedures, for measuring, controlling, regulating and weighing; apparatus and installations for producing X-rays and radiographic components, not for medical use, for generating electronic radiation for industrial use; particle accelerators; electron guns; electron tubes; choking coils for use in electrical apparatus; vacuum tubes for non-medical X-ray imaging apparatus; electrical condensers being capacitors; electrical transformers; apparatus and instruments for generating electronic radiation for industrial use; apparatus for controlling and regulating electric current and voltage; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling electricity; material testing instruments and machines, namely surface roughness testing machines and instruments and electronic apparatus for measuring and testing the strength and tensile characteristics of industrial materials; data processing apparatus, computers and downloadable software for controlling machines, apparatus and installations for production of X-rays, radiographic components, particle accelerators, electron guns, electron tubes and electronic radiation for industrial use; computer hardware and downloadable software for controlling and monitoring X-ray sources; radio apparatus and instruments, namely, radio transmitters and radio receivers; high-frequency apparatus, namely, high frequency switches, high frequency switching power supplies, high frequency emitters and receivers, and high frequency generators; replacement parts for all the aforesaid goods ; all the aforesaid goods not intended for precision tools and machining machine tools Installation, maintenance and repair of machines for transforming plastics, paint processing machines and apparatus, printers' pastes, coatings, sheets, plastics, electrostatic coating machines, middle, high and ultrahigh frequency range generators for stimulating, producing, regulating and controlling plasma, apparatus and installations for the production of X-rays, radiographic components, particle accelerators, electron guns, electron tubes and apparatus and installations for generating electronic radiation for industrial purposes; installation, maintenance and repair of industrial machinery; installation, maintenance and repair of industrial machinery and manufacturing plants; installation, maintenance and repair of machines for transforming plastics; installation, maintenance and repair of electric and electronic apparatus and equipment; installation, maintenance and repair of computer hardware and computer peripherals for managing and controlling machines, apparatus and installations for producing X-rays, radiographic components, particle accelerators, electron guns, electron tubes and electronic radiation for industrial applications; disinfection; all the aforesaid services not intended for precision tools and machining machine tools Scientific research and development; research, development, analysis and consultancy services in the field of engineering; development and testing services in the field of engineering; industrial testing, development and research; research and development of products; research and development of new products for third parties; research and development services in connection with physics; industrial analysis and research services in the field of materials customization for medical, scientific and technological applications; design and development of testing and analysis methods in the field of materials customization for medical, scientific and technological applications; testing of materials; technical consultant services with respect to product development; providing information in the field of product development; providing information and data with respect to scientific and technological research and development; biochemical research and development; design and development of computers and computer programs for the management and control of machines, apparatus and installations for the production of X-rays, radiographic components, particle accelerators, electron guns, electron tubes and electronic radiation for industrial applications; installation, updating and maintenance of computer software for managing and controlling machines, apparatus and installations for producing X-rays, radiographic components, particle accelerators, electron guns, electronic tubes and electronic radiation for industrial use; rental of computer software for the management and control of machines, apparatus and installations for the production of X-rays, radiographic components, particle accelerators; all the aforesaid services not intended for precision tools and machining machine tools
25.
VARIABLE CAPACITOR WITH LINEAR IMPEDANCE AND HIGH VOLTAGE BREAKDOWN
A variable capacitor includes an enclosure having first and second conductive collars separated by an intermediate electrically insulating element. A movable capacitor plate assembly is electrically coupled to the first conductive collar, and a fixed capacitor plate assembly is electrically coupled to the second conductive collar. An actuator extends into the enclosure for advancing and retracting the movable capacitor plate assembly relative to the fixed capacitor plate assembly. A hermetically sealed volume within the enclosure maintains a vacuum or a liquid serving as a dielectric between a capacitor plate of the movable capacitor plate assembly and a capacitor plate of the fixed capacitor plate assembly. At least one capacitor plate comprises a coiled cylindrical plate having a having a greater height at a center portion of the capacitor plate coil and a lower height at an outer portion of the capacitor plate coil.
A variable capacitor includes an enclosure having first and second conductive collars separated by an intermediate electrically insulating element. A movable capacitor plate assembly is electrically coupled to the first conductive collar, and a fixed capacitor plate assembly is electrically coupled to the second conductive collar. An actuator extends into the enclosure for advancing and retracting the movable capacitor plate assembly relative to the fixed capacitor plate assembly. A hermetically sealed volume within the enclosure maintains a vacuum or a liquid serving as a dielectric between a capacitor plate of the movable capacitor plate assembly and a capacitor plate of the fixed capacitor plate assembly. At least one capacitor plate comprises a coiled cylindrical plate having a having a greater height at a center portion of the capacitor plate coil and a lower height at an outer portion of the capacitor plate coil.
H01G 5/14 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication à variation de surface efficace d'armature par mouvement d'armatures longitudinal
H01G 5/00 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication
H01G 5/18 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication à variation de la distance entre armatures par changement de l'inclinaison, p. ex. par flexion, par enroulement spiral ou hélicoïdal
27.
PRINTED-CIRCUIT-BOARD STRUCTURE AND METHOD FOR MANUFACTURING
Printed-Circuit-Board structure (10), in particular for an RF generator, comprising: a heat spreader (14); a basic printed-circuit-board, PCB, (22) having an upper surface (18) and a lower surface (28), wherein the basic PCB (22) comprises a metallic layer (30) at the lower surface having at least one conductor line (24) and/or at least one contact pad (38); a contact layer (26), wherein the contact layer (26) comprises an upper surface directly connected to the metallic layer (30) of the basic PCB (22) and a lower surface (20); wherein the lower surface (20) of the contact layer (26) is bonded to the heat spreader (14) by a bonding layer (16).
The present disclosure relates to a switching circuitry for a variable reactance matching network as may be used by plasma generation systems which utilize plasma for semiconductor processing. The switching circuitry may be used within a hybrid matching network that has a first-stage switched matching network and a second-stage mechanically-tuned matching network. The switching circuitry may also be used for variable reactance matching in telecom applications, plasma laser cutting applications, and/or RADAR/LIDAR implementations. The switching circuitry includes individual isolated power supplies that are fed from a main power supply. The individual isolated power supplies receive inductive power from a main power supply loop powered by the main power supply. The inductive coupling provides isolated power supply loops to drive circuitry for a single switch. Multiple instances of the isolated switch circuitry are used to receive a digital signal from a connected controller.
H03K 17/687 - Commutation ou ouverture de porte électronique, c.-à-d. par d'autres moyens que la fermeture et l'ouverture de contacts caractérisée par l'utilisation de composants spécifiés par l'utilisation, comme éléments actifs, de dispositifs à semi-conducteurs les dispositifs étant des transistors à effet de champ
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
The present disclosure relates to a switching circuitry for a variable reactance matching network as may be used by plasma generation systems which utilize plasma for semiconductor processing. The switching circuitry may be used within a hybrid matching network that has a first-stage switched matching network and a second-stage mechanically-tuned matching network. The switching circuitry may also be used for variable reactance matching in telecom applications, plasma laser cutting applications, and/or RADAR/LIDAR implementations. The switching circuitry includes individual isolated power supplies that are fed from a main power supply. The individual isolated power supplies receive inductive power from a main power supply loop powered by the main power supply. The inductive coupling provides isolated power supply loops to drive circuitry for a single switch. Multiple instances of the isolated switch circuitry are used to receive a digital signal from a connected controller.
Provided is a generator including a power amplifier, at least one sampler, an RF output, a signal generator, a controller including a digital control portion and an analogue control portion, an analogue feedback path between the at least one sampler and the controller enabling an analogue signal representation of a signal to be provided to the controller, and a digital feedback path between the at least one sampler and the controller enabling a digital signal representation of the signal to be provided to the controller. The controller is configured to adjust the RF signal at the RF output from a first state into a second state based on the analogue signal representation and/or the digital signal representation.
H03L 7/08 - Détails de la boucle verrouillée en phase
H03K 5/24 - Circuits présentant plusieurs entrées et une sortie pour comparer des impulsions ou des trains d'impulsions entre eux en ce qui concerne certaines caractéristiques du signal d'entrée, p. ex. la pente, l'intégrale la caractéristique étant l'amplitude
A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A controller of the RF matching network receives the DC magnitude and phase error signals and varies an impedance of the RF matching network in response to the DC magnitude and phase error signals. The matching network operates in a first mode until a tuning dead-zone is determined. Once a tuning dead-zone is determined, the matching network operates in additional modes until the network is tuned. The controller uses a composite value of magnitude and phase error to drive the variable tuning and load capacitors. In some cases, a blended mode (representing multiple tuning algorithms concurrently) may be implemented as a single mode that weights across what would have been multiple modes and thereby tunes the network using a weighted blended mode.
The present disclosure relates to plasma generation systems which utilize plasma for semiconductor processing. The plasma generation system disclosed herein employs a hybrid matching network. The plasma generation system includes a RF generator and a matching network. The matching network includes a first-stage to perform low-Q impedance transformations during high-speed variations in impedance. The matching network includes a second-stage to perform impedance matching for high-Q impedance transformations. The matching network further includes a sensor coupled to the first-stage and the second-stage to calculate the signals that are used to engage the first and second-stages. The matching network includes a first-stage network that is agile enough to tune each state in a modulated RF waveform and a second-stage network to tune a single state in a RF modulated waveform. The plasma generation system also includes a plasma chamber coupled to the matching network.
A61B 5/00 - Mesure servant à établir un diagnostic Identification des individus
A61B 34/32 - Robots chirurgicaux opérant de façon autonome
G16H 20/40 - TIC spécialement adaptées aux thérapies ou aux plans d’amélioration de la santé, p. ex. pour manier les prescriptions, orienter la thérapie ou surveiller l’observance par les patients concernant des thérapies mécaniques, la radiothérapie ou des thérapies invasives, p. ex. la chirurgie, la thérapie laser, la dialyse ou l’acuponcture
A61B 18/22 - Instruments, dispositifs ou procédés chirurgicaux pour transférer des formes non mécaniques d'énergie vers le corps ou à partir de celui-ci par application de radiations électromagnétiques, p. ex. de micro-ondes en utilisant des lasers le faisceau étant dirigé le long, ou à l'intérieur d'un conduit flexible, p. ex. d'une fibre optiquePièces à main à cet effet
A61B 18/20 - Instruments, dispositifs ou procédés chirurgicaux pour transférer des formes non mécaniques d'énergie vers le corps ou à partir de celui-ci par application de radiations électromagnétiques, p. ex. de micro-ondes en utilisant des lasers
A61B 17/00 - Instruments, dispositifs ou procédés chirurgicaux
A61B 18/00 - Instruments, dispositifs ou procédés chirurgicaux pour transférer des formes non mécaniques d'énergie vers le corps ou à partir de celui-ci
The present invention concerns a vacuum variable capacitor (1) comprising a vacuum sealed enclosure (2) to contain a vacuum dielectric medium, wherein the enclosure (2) comprises a first plate (3) and a second plate (4), the said first plate (3) and the said second plate (4) being separated by an electrically insulating element (5), a fixed electrode (6) attached inside the enclosure (2) to the first plate (3) and a movable electrode (8) attached to a movable plate (7), wherein the movable plate (7) is attached inside the enclosure (2) to the second plate (4) by means of at least one vacuum bellows (9), wherein the vacuum capacitor (1) comprises a mechanical drive system (10) for displacing, in particular translating, the movable plate (7) relative to the first plate (3) so as to vary the capacitance of the vacuum capacitor (1), wherein the mechanical drive system (10) comprises a ball screw (11) arranged to drive the movable plate (7) and wherein the mechanical drive system (10) comprises outside of the vacuum sealed enclosure (2) a limiting element (14) limiting the maximum distance between the first plate (3) and the movable plate (7) and wherein the drive system comprises a nut (13) attached to the ball screw (11), wherein the nut (13) comprises a first shoulder (13a) configured to abut against the limiting element (14) to limit the maximum distance between the first plate (3) and the movable plate (7).
H01G 5/14 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication à variation de surface efficace d'armature par mouvement d'armatures longitudinal
H01G 2/08 - Dispositions de réfrigérationDispositions de chauffageDispositions de ventilation
H01G 5/04 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication à variation de surface efficace d'armature
H01G 5/00 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication
The present invention concerns an X-ray tube (100) comprising a vacuum-sealed tube housing (10) evacuated to a pressure of 10-766), and wherein the cathode assembly is designed such that if the emitter temperature is comprised in the working temperature range.
H01J 35/20 - Emploi de substances spécifiées comme atmosphère gazeuseMoyens pour produire ou conserver la pression désirée à l'intérieur du tube, p. ex. au moyen d'un getter
A variable capacitor includes an enclosure having first and second conductive collars separated by an intermediate electrically insulating element. A movable capacitor plate assembly is electrically coupled to the first conductive collar, and a fixed capacitor plate assembly is electrically coupled to the second conductive collar. An actuator extends into the enclosure for advancing and retracting the movable capacitor plate assembly relative to the fixed capacitor plate assembly. A hermetically sealed volume within the enclosure contains a dielectric fluid serving as a dielectric between a capacitor plate of the movable capacitor plate assembly and a capacitor plate of the fixed capacitor plate assembly. A flexible structure is provided to contain the dielectric fluid displaced when the movable capacitor plate assembly is advanced toward the fixed capacitor plate assembly.
H01G 5/16 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication à variation de la distance entre armatures
A method and system for plasma arc suppression includes a RF generator supplying power to a plasma chamber coupled to an impedance matching network reacting to impedance changes to match an impedance of the plasma chamber with an impedance of the radio frequency generator. An arc suppression device coupled to the RF generator and the plasma chamber detects plasma arcing causing a sharp impedance change increasing reflection of the power by the plasma chamber and switches a power dissipator reducing the power delivered to the plasma chamber extinguishing or mitigating the plasma arcing. The power dissipator is switched more quickly than the impedance matching network reacts to the sharp impedance change. For example, the impedance matching network may react to the impedance change on an order of hundredths of milliseconds or more, while the arc suppression device switches the power dissipator on an order of microseconds or less.
A plasma generation system includes an impedance matching network calibrated to map desired matching network impedance values to closest available settings of impedance control components. The tuning controller defines a set of target impedance values spaced-apart throughout the tuning range and drives the matching network to generate a set of closest frame tuning values proximate to each target impedance value. The tuning controller computes interpolated tuning values between adjacent pairs of frame tuning values and stores a tuning database that maps available matching network impedance values to specific sets of settings for the impedance control components. After the calibration stage, the tuning controller automatically utilizes the tuning database to map desired matching network impedance values to available settings of the impedance control components on an ongoing basis. Representative embodiments include variable loading and tuning capacitors in series with a fixed or variable phase-shift inductor.
09 - Appareils et instruments scientifiques et électriques
Produits et services
Scientific, surveying, measuring and checking apparatus and
instruments; X-ray producing apparatus and installations not
for medical use; X-ray apparatus not for medical use; X-ray
tubes not for medical purposes; apparatus and installations
for producing X-rays and radiographic components, not for
medical use, for imaging and analytical procedures, for
measuring, controlling, regulating and weighing; apparatus
and installations for producing X-rays and radiographic
components, not for medical use, for generating electronic
radiation for industrial use; particle accelerators;
electron guns; electron tubes; choking coils [impedance];
vacuum tubes; electrical condensers (capacitors); electrical
transformers; apparatus and instruments for generating
electronic radiation for industrial use; apparatus for
controlling and regulating electric current and voltage;
apparatus and instruments for conducting, switching,
transforming, accumulating, regulating or controlling
electricity; material testing instruments and machines; data
processing apparatus, computers and software for controlling
machines, apparatus and installations for production of
X-rays, radiographic components, particle accelerators,
electron guns, electron tubes and electronic radiation for
industrial use; hardware and software components for
controlling and monitoring X-ray sources; radio apparatus
and instruments; high-frequency apparatus; components and
spare parts included in this class for all the aforesaid
goods.
40.
X-ray target assembly, X-ray anode assembly and X-ray tube apparatus
An X-ray target assembly includes a cylindrical base and a cylindrical multilayered X-ray target that includes at least a heat transfer layer, an X-ray source layer and an adhesion layer provided between the heat transfer layer and the X-ray source layer, wherein the X-ray target is oriented such that the heat transfer layer is closest to the base, wherein the X-ray target is placed on top of a cylindrical carrying element, wherein the in-plane coefficient of thermal expansion of each of the heat transfer layer, the X-ray source layer, the adhesion layer and of the material of the carrying element is different, wherein the in-plane coefficient of thermal expansion of the heat transfer layer is the lowest and that of the material of the carrying element the highest.
Disclosed is a method and apparatus for utilizing a variable gain algorithm for adjusting a capacitor in an automatic radio frequency (RF) impedance matching network. The apparatus may operate in a closed-loop feedback control system, with one or more error signals driving the capacitors within the system. To achieve a critically damped control system response, multiple operating regions for the matching network and its constituent elements may be identified and a set of gains (e.g., different per region) may be applied to the error signals in the control system when operating in those regions. An operating region may be defined by characteristics of the input signals measured by the apparatus, calculated by the apparatus, or the state of the apparatus itself. These features may be arranged in a look up table (or determined by calculation) for the apparatus to use to determine the variable gains in the system.
Disclosed is a method and apparatus for utilizing a variable gain algorithm for adjusting a capacitor in an automatic radio frequency (RF) impedance matching network. The apparatus may operate in a closed-loop feedback control system, with one or more error signals driving the capacitors within the system. To achieve a critically damped control system response, multiple operating regions for the matching network and its constituent elements may be identified and a set of gains (e.g., different per region) may be applied to the error signals in the control system when operating in those regions. An operating region may be defined by characteristics of the input signals measured by the apparatus, calculated by the apparatus, or the state of the apparatus itself. These features may be arranged in a look up table (or determined by calculation) for the apparatus to use to determine the variable gains in the system.
The invention relates to a method for improving digital signal processing in a radio-frequency system (1), in particular a radio-frequency power delivery system (1), comprising: - Providing (101) at least one input signal (210), preferably related to a radio-frequency signal of the radio-frequency system (1), - Performing (102) a processing procedure (310) wherein the at least one input signal (210) is repeatedly processed by a programmable circuit (10) using at least one configurable parameter of the processing, wherein a configuration of the at least one parameter is varied for each processing of the at least one input signal (210) to obtain respective processing results (220), - Determining (103) at least one parameter result (240) for an optimization of the configuration based on the processing results (220), - Providing (104) the at least one determined parameter result for the improved digital signal processing.
G06F 30/34 - Conception de circuits pour circuits reconfigurables, p. ex. réseaux de portes programmables [FPGA] ou circuits logiques programmables [PLD]
G06F 30/36 - Conception de circuits au niveau analogique
44.
A METHOD FOR MACHINE LEARNING A DETECTION OF AT LEAST ONE IRREGULARITY IN A PLASMA SYSTEM
The invention relates to a method for machine learning a detection of at least one irregularity in a plasma system, particularly an RF powered plasma processing system, comprising: - Providing at least one input signal (210) each related to an analog signal of a power delivery system (1) for the plasma system and/or to another characteristic of the power delivery system (1) and/or of the plasma system, the at least one input signal (210) having at least one irregularity feature indicative of the irregularity in the plasma system, - Performing a machine learning procedure (310) wherein the at least one input signal (210) having the at least one irregularity feature is processed by a programmable circuit (10) to train the detection of the irregularity in the plasma system.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
G06F 30/34 - Conception de circuits pour circuits reconfigurables, p. ex. réseaux de portes programmables [FPGA] ou circuits logiques programmables [PLD]
G06F 30/36 - Conception de circuits au niveau analogique
09 - Appareils et instruments scientifiques et électriques
Produits et services
Scientific, surveying, measuring, and checking apparatus and instruments, namely, radio frequency generators for supplying radio-frequency energy, inspection machines for the physical inspection of semiconductors, microchips, and electrical components; X-ray producing apparatus and installations not for medical use; X-ray apparatus not for medical use; X-ray tubes not for medical purposes; X-ray apparatus and installations for producing X-ray frequencies and radiographic components, not for medical use, for imaging and analytical procedures, for measuring, controlling, regulating, and weighing; X-ray apparatus and installations for producing X-ray frequencies and radiographic components, not for medical use, for generating electronic radiation for industrial use; particle accelerators; electron guns; electron tubes; choking coils for use in electrical apparatus; vacuum tubes for non-medical X-ray imaging apparatus; electrical condenser capacitors; electrical transformers; apparatus and instruments for generating electronic radiation for industrial use; apparatus for controlling and regulating electric current and voltage; apparatus and instruments for conducting, switching, transforming, accumulating, regulating, or controlling electricity; material testing instruments and machines, namely, surface roughness testing machines and instruments and electronic apparatus for measuring and testing the strength and tensile characteristics of industrial materials; data processing apparatus, computers and downloadable software for controlling machines, apparatus and installations for production of X-rays, radiographic components, particle accelerators, electron guns, electron tubes, and electronic radiation for industrial use; computer hardware and downloadable software for controlling and monitoring X-ray sources; radio apparatus and instruments, namely, radio transmitters and radio receivers; high-frequency apparatus, namely, high frequency switches, high frequency switching power supplies, high frequency emitters and receivers, and high frequency generators; components and replacement parts for all the aforesaid goods
46.
Systems and methods for calibrating capacitors of matching networks
The present disclosure may include a method for calibrating a capacitor in a matching network in a radio frequency plasma processing device, the method including. The method may include identifying the capacitor in the matching network, measuring the impedance of the matching network as a whole, and driving the capacitor from a zero step value to a predefined step value. The method may further include measuring impedance at each step between the zero step value and the predefined step value, identifying the measured impedance for each step value to a predefined impedance curve, and matching a capacitor position to a specific impedance based on the identifying the measured impedance for each step value to the predefined impedance curve. Calibration of matching networks may also be enhanced by optimizing the steps to percentage reported ratio in the range of capacitor values most frequently used.
The present disclosure may include a method for calibrating a capacitor in a matching network in a radio frequency plasma processing device, the method including. The method may include identifying the capacitor in the matching network, measuring the impedance of the matching network as a whole, and driving the capacitor from a zero step value to a predefined step value. The method may further include measuring impedance at each step between the zero step value and the predefined step value, identifying the measured impedance for each step value to a predefined impedance curve, and matching a capacitor position to a specific impedance based on the identifying the measured impedance for each step value to the predefined impedance curve. Calibration of matching networks may also be enhanced by optimizing the steps to percentage reported ratio in the range of capacitor values most frequently used.
A method for repetitive tuning of a matching network in a radio frequency plasma processing device, the method including detecting a condition within the matching network and determining if the condition is a known condition for the matching network. Also, finding a prior solution and to the condition when the condition is the known condition for the matching network; and replicating the prior solution for the condition in the matching network.
An electromagnetic field sensor may include a housing including an opening extending therethrough; a dielectric element including a first section having a first interior space and a second section having a second interior space, the dielectric element being received within the opening of the housing; and a conductor disposed within and approximating the first interior space and the second interior space of the dielectric element, the conductor including a first portion defining a first frustrum shape and a second portion defining a second frustrum shape, the first interior space receiving the first portion of the conductor and the second interior space receiving the second portion of the conductor. The electromagnetic field sensor for use in a matching network of a plasma generation system or other application.
An electromagnetic field sensor may include a housing including an opening extending therethrough; a dielectric element including a first section having a first interior space and a second section having a second interior space, the dielectric element being received within the opening of the housing; and a conductor disposed within and approximating the first interior space and the second interior space of the dielectric element, the conductor including a first portion defining a first frustrum shape and a second portion defining a second frustrum shape, the first interior space receiving the first portion of the conductor and the second interior space receiving the second portion of the conductor. The electromagnetic field sensor for use in a matching network of a plasma generation system or other application.
A radio-frequency generator, including a power amplifier module including a power amplifier, a pickup module connected to an output of the power amplifier to generate a pickup signal, and an output configured to be connected to the respective output of the amplifier and configured to output a radio-frequency output signal. The radio-frequency generator includes a measurement module configured to receive the pickup signal and to generate a measurement signal based on the one pickup signal; and a radio-frequency signal generation module configured to generate two or more carrier signals of different frequency, and to provide a drive signal as input to the power amplifier module, and a regulation module configured to receive the measurement signal, and to regulate the power of the radio-frequency output signal based on the measurement signal.
H03F 3/24 - Amplificateurs de puissance, p. ex. amplificateurs de classe B, amplificateur de classe C d'étages transmetteurs de sortie
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H03F 1/02 - Modifications des amplificateurs pour augmenter leur rendement, p. ex. étages classe A à pente glissante, utilisation d'une oscillation auxiliaire
H03F 3/195 - Amplificateurs à haute fréquence, p. ex. amplificateurs radiofréquence comportant uniquement des dispositifs à semi-conducteurs dans des circuits intégrés
52.
METHOD FOR GENERATING A RF SIGNAL; RF GENERATOR AND PLASMA APPARATUS
A method for generating an RF signal preferably for a plasma chamber comprising the steps of: Generating an input RF signal on the basis of a first set of control parameters; Detecting at least one distorted RF signal; Synchronizing the at least one distorted RF signal with the input RF signal and; Determining a difference between a target RF signal and the at least one distorted RF signal being synchronized; if the difference is larger than a predetermined threshold, determining a second set of control parameters based on the comparison of the target RF signal and the at least one distorted RF signal being synchronized; and Generating an adapted input RF signal on the basis of the second set of control parameters such that the difference between the target RF signal and the distorted RF signal is reduced.
A radio-frequency (RF) power variable capacitor capable of operating at, at least, 50 watts in the MHz range. The capacitor has a composite HDK-NDK ceramic dielectric. The HDK (high dielectric constant) component comprises an active matrix of barium strontium titanate, for example. Acoustic resonances are reduced or eliminated by the addition of a metal or metalloid oxide such as magnesium borate (NDK—low dielectric constant), which acts as an acoustic resonance reduction agent (ARRA) in the RF power domain. The acoustic resonances which previously occurred under bias voltage 500 V or 1100 V in prior art RF power variable capacitors are eliminated by the addition of the ARRA.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
C04B 35/468 - Produits céramiques mis en forme, caractérisés par leur compositionCompositions céramiquesTraitement de poudres de composés inorganiques préalablement à la fabrication de produits céramiques à base d'oxydes à base d'oxydes de titane ou de titanates à base de titanates à base de titanates de métaux alcalino-terreux à base de titanates de baryum
H01G 7/06 - Condensateurs dont la capacité varie par des moyens non mécaniquesProcédés pour leur fabrication à diélectrique choisi pour sa variation de permittivité en fonction de la tension appliquée, c.-à-d. condensateurs ferro-électriques
54.
Device and method for synchronizing a high frequency power signal and an external reference signal
A device for synchronizing a periodic high frequency power signal (18) and an external reference signal (10). The device comprises a phase control circuit (100) and a digital oscillator circuit (130). The digital oscillator circuit (130) is connected to the phase control circuit (100). The digital oscillator circuit (130) comprises means for generating the periodic high frequency power signal (18) dependent on the control signal from the phase control circuit. The phase control circuit (100) is configured to determine a phase difference of the periodic high frequency power signal (18) and the external reference signal (10).
H03L 7/099 - Détails de la boucle verrouillée en phase concernant principalement l'oscillateur commandé de la boucle
H03L 7/093 - Détails de la boucle verrouillée en phase concernant principalement l'agencement de détection de phase ou de fréquence, y compris le filtrage ou l'amplification de son signal de sortie utilisant des caractéristiques de filtrage ou d'amplification particulières dans la boucle
H03L 7/189 - Synthèse de fréquence indirecte, c.-à-d. production d'une fréquence désirée parmi un certain nombre de fréquences prédéterminées en utilisant une boucle verrouillée en fréquence ou en phase en utilisant un diviseur de fréquence ou un compteur dans la boucle une différence de temps étant utilisée pour verrouiller la boucle, le compteur entre des nombres fixes ou le diviseur de fréquence divisant par un nombre fixe utilisant des moyens pour accorder grossièrement l'oscillateur commandé en tension de la boucle utilisant un convertisseur numérique/analogique pour engendrer un accord grossier de tension
A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A controller of the RF matching network receives the DC magnitude and phase error signals and varies an impedance of the RF matching network in response to the DC magnitude and phase error signals. The matching network operates in a first mode until a tuning dead-zone is determined. Once a tuning dead-zone is determined, the matching network operates in additional modes until the network is tuned. The controller uses a composite value of magnitude and phase error to drive the variable tuning and load capacitors. In some cases, a blended mode (representing multiple tuning algorithms concurrently) may be implemented as a single mode that weights across what would have been multiple modes and thereby tunes the network using a weighted blended mode.
The present disclosure relates to plasma generation systems which utilize plasma for semiconductor processing. The plasma generation system disclosed herein employs a hybrid matching network. The plasma generation system includes a RF generator and a matching network. The matching network includes a first-stage to perform low-Q impedance transformations during high-speed variations in impedance. The matching network includes a second-stage to perform impedance matching for high-Q impedance transformations. The matching network further includes a sensor coupled to the first-stage and the second-stage to calculate the signals that are used to engage the first and second-stages. The matching network includes a first-stage network that is agile enough to tune each state in a modulated RF waveform and a second-stage network to tune a single state in a RF modulated waveform. The plasma generation system also includes a plasma chamber coupled to the matching network.
A61B 5/00 - Mesure servant à établir un diagnostic Identification des individus
A61B 34/32 - Robots chirurgicaux opérant de façon autonome
G16H 20/40 - TIC spécialement adaptées aux thérapies ou aux plans d’amélioration de la santé, p. ex. pour manier les prescriptions, orienter la thérapie ou surveiller l’observance par les patients concernant des thérapies mécaniques, la radiothérapie ou des thérapies invasives, p. ex. la chirurgie, la thérapie laser, la dialyse ou l’acuponcture
A61B 18/22 - Instruments, dispositifs ou procédés chirurgicaux pour transférer des formes non mécaniques d'énergie vers le corps ou à partir de celui-ci par application de radiations électromagnétiques, p. ex. de micro-ondes en utilisant des lasers le faisceau étant dirigé le long, ou à l'intérieur d'un conduit flexible, p. ex. d'une fibre optiquePièces à main à cet effet
A61B 18/20 - Instruments, dispositifs ou procédés chirurgicaux pour transférer des formes non mécaniques d'énergie vers le corps ou à partir de celui-ci par application de radiations électromagnétiques, p. ex. de micro-ondes en utilisant des lasers
A61B 17/00 - Instruments, dispositifs ou procédés chirurgicaux
A61B 18/00 - Instruments, dispositifs ou procédés chirurgicaux pour transférer des formes non mécaniques d'énergie vers le corps ou à partir de celui-ci
57.
SYSTEMS AND METHODS FOR REPETITIVE TUNING OF MATCHING NETWORK
A method for repetitive tuning of a matching network in a radio frequency plasma processing device, the method including detecting a condition within the matching network and determining if the condition is a known condition for the matching network. Also, finding a prior solution and to the condition when the condition is the known condition for the matching network; and replicating the prior solution for the condition in the matching network.
A method for repetitive tuning of a matching network in a radio frequency plasma processing device, the method including detecting a condition within the matching network and determining if the condition is a known condition for the matching network. Also, finding a prior solution and to the condition when the condition is the known condition for the matching network; and replicating the prior solution for the condition in the matching network.
A component part in a vacuum area of an X-ray tube with an opening through which an electron beam is guided. The component part includes a base body made of a first material, wherein the first material is a metal. Arranged on a surface forming the opening is a second material having an atomic number which is smaller than an atomic number of the first material. A target support is attached to an end of the component part. The target support supports a target which is aligned with a lens diaphragm formed at the end of the component part. The target support has a base body made of a first material which is a metal, and a second material formed on a surface of the base body that is selectively exposed to the electron beam and which extends between the target and the lens diaphragm.
A radiofrequency, RF, power amplifier, including at least one field-effect transistor, FET, wherein a source terminal of the at least one FET is connected to ground. At least one diode is included, wherein a cathode of the at least one diode is connected to a drain terminal of the at least one FET and an anode of the at least one diode is connected to ground. An output network is connected to the drain terminal of the at least one FET. An input network is connected to a gate terminal of the at least one FET.
H03F 1/52 - Circuits pour la protection de ces amplificateurs
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H03F 3/195 - Amplificateurs à haute fréquence, p. ex. amplificateurs radiofréquence comportant uniquement des dispositifs à semi-conducteurs dans des circuits intégrés
H03F 3/24 - Amplificateurs de puissance, p. ex. amplificateurs de classe B, amplificateur de classe C d'étages transmetteurs de sortie
H03L 7/099 - Détails de la boucle verrouillée en phase concernant principalement l'oscillateur commandé de la boucle
H03L 7/16 - Synthèse de fréquence indirecte, c.-à-d. production d'une fréquence désirée parmi un certain nombre de fréquences prédéterminées en utilisant une boucle verrouillée en fréquence ou en phase
H03L 7/10 - Détails de la boucle verrouillée en phase pour assurer la synchronisation initiale ou pour élargir le domaine d'accrochage
max=(45°·π/180°). The invention relates also to a vacuum capacitor (30) comprising at least one electrode unit (10, 20) according to the present invention.
H01G 5/14 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication à variation de surface efficace d'armature par mouvement d'armatures longitudinal
64.
Arc suppression device for plasma processing equipment
The present disclosure relates to plasma generation systems particularly applicable to systems which utilize plasma for semiconductor processing. A plasma generation system consistent with the present disclosure includes an arc suppression device coupled to the RF generator. The arc device includes switches that engage upon a triggering signal. In addition, the arc device includes a power dissipater to be engaged by the set of switches to dissipate both stored and delivered energy when the set of switches engage. The arc suppression device also includes an impedance transformer coupled to the power dissipater to perform an impedance transformation that, when the switches are engaged in conjunction with the power dissipater, reduces the reflection coefficient at the input of the device. The plasma generation system further includes a matching network coupled to the radio frequency generator and a plasma chamber coupled to the matching network.
The present invention relates to a vacuum capacitor (1, 30) comprising an enclosure (9) to contain a vacuum dielectric medium, a first electrode (12) and a second electrode (13) separated by said vacuum dielectric medium, the enclosure (9) comprising a first conductive collar (2) in electrical contact with the first electrode (12) and a second conductive collar (3) in electrical contact with the second electrode (13), the first conductive collar (2) and the second conductive collar (3) being separated by an insulating element (4) of the enclosure(9), wherein the enclosure (9) exhibits at least one protruding edge (6), said protruding edge (6) being in electrical contact with the closest of the first conductive collar (2) or the second conductive collar (3), wherein the vacuum capacitor (1, 30) comprises at least one protection means (7, 37) covering on the outside of the vacuum enclosure the protruding edge (6), wherein the protection means (7, 37) is made at least partially of an elastomer, wherein at least the outer surface (7b, 37b) of the protection means (7, 37) is electrically conductive and is at the same electrical potential as the closest conductive collar to the protruding edge (6), and wherein the outer surface (7b, 37b) of the protection means (7, 37) has a radius of curvature greater than the radius of curvature of the protruding edge (6).
H01G 5/00 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication
H01G 5/01 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication Détails
H01G 5/14 - Condensateurs dont la capacité varie par des moyens mécaniques, p. ex. en tournant un axeProcédés pour leur fabrication à variation de surface efficace d'armature par mouvement d'armatures longitudinal
66.
Multi-stack cooling structure for radiofrequency component
An apparatus which includes: a circuit board having a radiofrequency (RF) structure at a first location thereof, the RF structure formed from a conductive trace of the circuit board; a heat carrier; and a multi-stack cooling structure coupling the circuit board and the heat carrier to each other. The multi-stack cooling structure including a first stack adjacent the RF structure at the first location and a second stack at a second location. The first stack including a dielectric layer adjacent the heat carrier, and a thermal interface material (TIM) that couples the dielectric layer and the circuit board to each other, the dielectric layer having higher thermal conductivity and higher rigidity than the TIM. The second stack including a metal layer adjacent the heat carrier, and the TIM that couples the metal layer and the circuit board to each other.
H05K 1/16 - Circuits imprimés comprenant des composants électriques imprimés incorporés, p. ex. une résistance, un condensateur, une inductance imprimés
67.
High-frequency amplifier assembly for a high-frequency generator
The high-frequency amplifier assembly for a high-frequency generator, in particular for a high-frequency generator for operating a plasma generator, is provided with a signal generator for generating a high-frequency signal; a first amplifier transistor for amplifying the signal generated by the signal generator; an output terminal for outputting the amplified signal to an external load; an input network arranged between the signal generator and the first amplifier transistor for providing the high-frequency signal at the input of the amplifier transistor; an output network arranged between the amplifier transistor and the external load for providing a desired load impedance for the amplifier transistor; and an electronic voltage-limiting assembly arranged at the output terminal for limiting the output voltage at the output terminal.
A method of controlling a radio frequency processing system, the method including determining an end time of a radio frequency pulse; stopping a load applied to the radio frequency processing system based on the end time of the radio frequency pulse; adjusting an additional load having a predetermined impedance applied to the radio frequency processing system in response to the determined end time; determining a start point of a second radio frequency pulse; and stopping the additional load before the second radio frequency pulse occurs.
A method of providing data on radio frequency pulses in a radio frequency plasma processing system, the method including measuring an electrical parameter within a matching network of the radio frequency plasma processing system; determining an attribute of the measurement of the electrical parameter; defining a first statistic for the attribute of the measurement of the electrical parameter; defining a second statistic based on the first statistic for at least one of a phase and a process; delivering the first statistic and second statistic to a user; and storing the first statistic and the second statistic within the matching network.
A method of controlling a radio frequency processing system, the method including determining an end time of a radio frequency pulse; stopping a load applied to the radio frequency processing system based on the end time of the radio frequency pulse; adjusting an additional load having a predetermined impedance applied to the radio frequency processing system in response to the determined end time; determining a start point of a second radio frequency pulse; and stopping the additional load before the second radio frequency pulse occurs.
A method of providing data on radio frequency pulses in a radio frequency plasma processing system, the method including measuring an electrical parameter within a matching network of the radio frequency plasma processing system; determining an attribute of the measurement of the electrical parameter; defining a first statistic for the attribute of the measurement of the electrical parameter; defining a second statistic based on the first statistic for at least one of a phase and a process; delivering the first statistic and second statistic to a user; and storing the first statistic and the second statistic within the matching network.
A method of detecting non-uniformity in a plasma in a radio frequency plasma processing system, the method including generating a plasma within a reaction chamber of the radio frequency plasma processing system and detecting electrical signals from the plasma in a frequency range from a frequency of radio frequency power sustaining the plasma to a multiple of about ten times a frequency with a plurality of sensors disposed azimuthally about a chamber symmetry axis of the radio frequency plasma processing system. The method also including comparing the waveforms of the electrical signals picked up from the plasma by the plurality of sensors and determining when a plasma non-uniformity occurs based on the comparing the electrical property of the plasma detected by each of the plurality of sensors.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
C23C 16/505 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques utilisant des décharges à radiofréquence
C23C 16/52 - Commande ou régulation du processus de dépôt
G01N 22/00 - Recherche ou analyse des matériaux par l'utilisation de micro-ondes ou d'ondes radio, c.-à-d. d'ondes électromagnétiques d'une longueur d'onde d'un millimètre ou plus
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
A method of detecting plasma asymmetry in a radio frequency plasma processing system, the method including providing a radio frequency power to a reaction chamber having an approximate chamber symmetry axis and receiving from a plurality of broadband electromagnetic sensors a radio frequency signal. The method also including processing the radio frequency signals using Fourier analysis and determining based on the Fourier analysis of the radio frequency signals that a plasma asymmetry has occurred within the reaction chamber.
The present invention relates to an X-ray target assembly (1, 10, 20) comprising a cylindrical base (2) and a cylindrical multilayered X-ray target (4, 14, 24) that comprises at least a heat transfer layer (4a, 14a, 24a), an X-ray source layer (4b, 14b, 24b) and an adhesion layer provided between the heat transfer layer (4a, 14a, 24a) and the X-ray source layer (4b, 14b, 24b), wherein the X-ray target (4, 14, 24) is oriented such that the heat transfer layer (4a, 14a, 24a) is closest to the base (2), wherein the X-ray target (4, 14, 24) is placed on top of a cylindrical carrying element (3), wherein the in-plane coefficient of thermal expansion of each of the heat transfer layer (4b, 14b, 24b), the X-ray source layer (4b, 14b, 24b), the adhesion layer and of the material of the carrying element (3) is different, wherein the in-plane coefficient of thermal expansion of the heat transfer layer (4a, 14a, 24a) is the lowest and that of the material of the carrying element (3) the highest, wherein the carrying element (3) featuring a height DH and a diameter DD is attached to the base (2) and positioned between the base (2) and the heat transfer layer (4a, 14a, 24a), wherein the diameter DD of the carrying element (3) is smaller than the diameter BD of the base (2), wherein the ratio R of the height DH over the diameter DD of the carrying element (3) is larger than or equal to 0.1 and smaller than or equal to 0.2, and wherein the diameter TD of the X-ray target (4, 14, 24) is substantially equal to the diameter DD of the carrying element (3).
A broad-band sensor for a radio frequency plasma processing system including a capacitive pickup for electrical potentials disposed on an electrically conducting component of a reaction chamber. Also, a lead that comprises a circuit, the lead connecting the pickup to a connector mounted into an electrically grounded plate proximate the pickup with an electrical resistance of the circuit and a capacitance to an electrical ground of the connector being such that the pickup voltage differs by less than 5% from a surface voltage of the electrically conducting component and an attenuator circuit connected to the connector, comprising at least one current limiting resistor in series from an attenuator input to an attenuator output, wherein the broad-band sensor has detection within a radio frequency range from about 10 kHz to at least about 1 GHz for radio frequency electrical potential measurements in the radio frequency plasma processing system.
A radio frequency plasma processing system including a reaction chamber, an electrode having an electrode symmetry axis, the electrode disposed in the reaction chamber, and a plurality of plates, each having an electrically conducting layer, disposed in the reaction chamber azimuthally with respect to the electrode symmetry axis around a perimeter of the electrode at a gap from the electrode surface, each of the plurality of plates connected to an electrical ground through a variable reactance circuit.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
77.
Inductive broad-band sensors for electromagnetic waves
A broad-band sensor for a radio frequency plasma processing system that includes a reaction chamber housing an electrode within a vacuum processing environment. The sensor includes an inductive pickup positioned in the vacuum processing environment proximate to the electrode. The inductive pickup includes a wire formed into a loop extending in an azimuthal direction about a symmetry axis of the reaction chamber. A lead carrying an electric signal from the inductive pickup extends through a vacuum wall of the reaction chamber outside the vacuum processing environment. An attenuator circuit including an electrical resistance bridge couples the lead to a signal carrier extending outside the vacuum processing environment. The broad-band sensor has radio frequency detection capability for measuring electromagnetic surface modes within the plasma chamber and coupling the measured electromagnetic surface modes to the signal carrier.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
G01R 27/26 - Mesure de l'inductance ou de la capacitanceMesure du facteur de qualité, p. ex. en utilisant la méthode par résonanceMesure de facteur de pertesMesure des constantes diélectriques
78.
Uniformity control for radio frequency plasma processing systems
A radio frequency plasma processing system including a reaction chamber, a pedestal disposed in the reaction chamber, and a plurality of sector plates disposed azimuthally around the pedestal in an annulus between the pedestal and the reaction chamber.
A radio frequency plasma processing system including a reaction chamber, an electrode having an electrode symmetry axis, the electrode disposed in the reaction chamber, and a plurality of plates, each having an electrically conducting layer, disposed in the reaction chamber azimuthally with respect to the electrode symmetry axis around a perimeter of the electrode at a gap from the electrode surface, each of the plurality of plates connected to an electrical ground through a variable reactance circuit.
A radio frequency plasma processing system including a reaction chamber having an approximate chamber symmetry axis, a first plasma powering device, and a plurality of azimuthally disposed broadband electromagnetic sensors located approximately equidistant from the chamber symmetry axis to measure electromagnetic behavior about the reaction chamber during a radio frequency plasma process.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
G01R 29/08 - Mesure des caractéristiques du champ électromagnétique
81.
AZIMUTHAL SENSOR ARRAY FOR RADIO FREQUENCY PLASMA-BASED WAFER PROCESSING SYSTEMS
A radio frequency plasma processing system including a reaction chamber having an approximate chamber symmetry axis, a first plasma powering device, and a plurality of azimuthally disposed broadband electromagnetic sensors located approximately equidistant from the chamber symmetry axis to measure electromagnetic behavior about the reaction chamber during a radio frequency plasma process.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
82.
UNIFORMITY CONTROL FOR RADIO FREQUENCY PLASMA PROCESSING SYSTEMS
A radio frequency plasma processing system including a reaction chamber, a pedestal disposed in the reaction chamber, and a plurality of sector plates disposed azimuthally around the pedestal in an annulus between the pedestal and the reaction chamber.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
A method of detecting plasma asymmetry in a radio frequency plasma processing system, the method including providing a radio frequency power to a reaction chamber having an approximate chamber symmetry axis and receiving from a plurality of broadband electromagnetic sensors a radio frequency signal. The method also including processing the radio frequency signals using Fourier analysis and determining based on the Fourier analysis of the radio frequency signals that a plasma asymmetry has occurred within the reaction chamber.
A method of detecting non-uniformity in a plasma in a radio frequency plasma processing system, the method including generating a plasma within a reaction chamber of the radio frequency plasma processing system and detecting electrical signals from the plasma in a frequency range from a frequency of radio frequency power sustaining the plasma to a multiple of about ten times a frequency with a plurality of sensors disposed azimuthally about a chamber symmetry axis of the radio frequency plasma processing system. The method also including comparing the waveforms of the electrical signals picked up from the plasma by the plurality of sensors and determining when a plasma non-uniformity occurs based on the comparing the electrical property of the plasma detected by each of the plurality of sensors.
The present invention relates to an X-ray target assembly (1, 10, 20) comprising a cylindrical base (2) and an X-ray target (4, 14, 24) that comprises a heat transfer layer (4a, 14a, 24a) and an X-ray source layer (4b, 14b, 24b), wherein the heat transfer layer (4a, 14a, 24a) is facing the base (2), wherein the X-ray target (4, 14, 24) is provided on top of a cylindrical dome (3) of height DH and diameter DD, wherein the dome (3) is positioned between the base (2) and the heat transfer layer (4a, 14a, 24a), wherein the diameter DD of the dome (3) is smaller than the diameter BD of the base (2) and wherein the ratio R of the height DH over the diameter DD of the dome (3) is larger than or equal to 0.1.
Disclosed is an amplifier circuit for providing an output of at least 100 W, preferably of at least 200 W and most preferably of at least 250 W comprising a field effect transistor. A drain of the field effect transistor is connected with a protective feedback circuit. The protective feedback circuit is arranged to reduce an over-voltage energy at the drain of the field effect transistor if the voltage between the gate and a drain of the field effect transistor exceeds a feedback threshold voltage. Further disclosed is a radio frequency amplifier comprising an amplifier circuit, an electrical radio frequency generator comprising the radio frequency amplifier and a plasma processing system comprising an electrical radio frequency generator. Still further disclosed is a method of protecting a field effect transistor in an amplifier circuit.
H03F 1/34 - Circuits à contre-réaction avec ou sans réaction
H03F 3/195 - Amplificateurs à haute fréquence, p. ex. amplificateurs radiofréquence comportant uniquement des dispositifs à semi-conducteurs dans des circuits intégrés
H03F 1/52 - Circuits pour la protection de ces amplificateurs
H03F 3/24 - Amplificateurs de puissance, p. ex. amplificateurs de classe B, amplificateur de classe C d'étages transmetteurs de sortie
87.
RF power generator with analogue and digital detectors
Provided is a generator including a power amplifier, at least one sampler, an RF output, a signal generator, a controller including a digital control portion and an analogue control portion, an analogue feedback path between the at least one sampler and the controller enabling an analogue signal representation of a signal to be provided to the controller, and a digital feedback path between the at least one sampler and the controller enabling a digital signal representation of the signal to be provided to the controller. The controller is configured to adjust the RF signal at the RF output from a first state into a second state based on the analogue signal representation and/or the digital signal representation.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
A coil having a coil body and a plurality of concentric cross-section windings of wire disposed around the coil body, the wire having a spacing between adjacent turns of about 0.25 to 1.0 of the radius of the wire. Also, a coil for a plasma processing device, the coil having a coil body and a plurality of concentric cylindrical cross-section windings of wire disposed around the coil body, the wire having a spacing between adjacent turns of about 0.25 to 1.0 of the radius of the wire and a diameter to length ratio of between about 2:1 and about 3:1.
09 - Appareils et instruments scientifiques et électriques
37 - Services de construction; extraction minière; installation et réparation
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Machines for transforming plastics; apparatus and machines
for processing paint, printers' pastes, coatings, sheets,
plastic materials and other products; plasma engraving
machines; equipment for processing semi-conductor wafers;
machines for processing semiconductor wafers; machines for
manufacturing semiconductor substrates; electrostatic
coating machines; high-voltage generators; generators for
the middle, high and ultrahigh frequency range for
stimulating, producing, regulating and controlling plasma;
machine parts, namely, vacuum and inert-gas capacitors;
frames for vacuum and inert-gas capacitors (parts of
machines); components and spare parts included in this
class for all the aforesaid goods. Scientific, surveying, measuring and checking apparatus and
instruments; X-ray producing apparatus and installations
not for medical use; X-ray apparatus not for medical use;
X-ray tubes not for medical purposes; apparatus and
installations for producing X-rays and radiographic
components, not for medical use, for imaging and analytical
procedures, for measuring, controlling, regulating and
weighing; apparatus and installations for producing X-rays
and radiographic components, not for medical use, for
generating electronic radiation for industrial use; particle
accelerators; electron guns; electron tubes; choking coils
[impedance]; vacuum tubes; electrical condensers
(capacitors); electrical transformers; apparatus and
instruments for generating electronic radiation for
industrial use; apparatus for controlling and regulating
electric current and voltage; apparatus and instruments for
conducting, switching, transforming, accumulating,
regulating or controlling electricity; material testing
instruments and machines; data processing apparatus,
computers and software for controlling machines, apparatus
and installations for production of X-rays, radiographic
components, particle accelerators, electron guns, electron
tubes and electronic radiation for industrial use; hardware
and software components for controlling and monitoring X-ray
sources; radio apparatus and instruments; high-frequency
apparatus; components and spare parts included in this class
for all the aforesaid goods. Installation, maintenance and repair of machines for
transforming plastics, paint processing machines and
apparatus, printers' pastes, coatings, sheets, plastics,
electrostatic coating machines, middle, high and ultrahigh
frequency range generators for stimulating, producing,
regulating and controlling plasma, apparatus and
installations for the production of X-rays, radiographic
components, particle accelerators, electron guns, electron
tubes and apparatus and installations for generating
electronic radiation for industrial purposes; installation,
maintenance and repair of industrial machinery;
installation, maintenance and repair of industrial machinery
and manufacturing plants; installation, maintenance and
repair of machines for transforming plastics; installation,
maintenance and repair of electric and electronic apparatus
and equipment; installation, maintenance and repair of
computer hardware and computer peripherals for managing and
controlling machines, apparatus and installations for
producing X-rays, radiographic components, particle
accelerators, electron guns, electron tubes and electronic
radiation for industrial applications; disinfection. Treatment of materials for third parties; custom
application of optical, transparent, solar reflective and
wear-resistant coatings on metallic, organic and mineral
substrates; treatment of bio-pharmaceutical materials;
information relating to the treatment of materials; custom
manufacture of apparatus and installations for the
production of X-rays, radiographic components, particle
accelerators, electron guns, electron tubes and apparatus
and installations for generating electronic radiation for
industrial use, on request and according to a customer's
specifications; glass etching services; application of thin
films on object surfaces by means of chemical, mechanical,
thermal, thermo-mechanical processes, chemical vapor
deposition, physical vapor deposition and vacuum deposition. Scientific research and development; research, development,
analysis and consultancy services in the field of
engineering; development and testing services in the field
of engineering; industrial testing, development and
research; research and development of products; research
and development of new products for third parties; research
and development services in connection with physics;
industrial analysis and research services; design and
development of testing and analysis methods; testing of
materials; services provided by technical consultants
relating to product development; provision of information
in the field of product development; provision of
information and data relating to scientific and
technological research and development; biochemical research
and development; design and development of computers and
computer programs for the management and control of
machines, apparatus and installations for the production of
X-rays, radiographic components, particle accelerators,
electron guns, electron tubes and electronic radiation for
industrial applications; installation, updating and
maintenance of computer software for managing and
controlling machines, apparatus and installations for
producing X-rays, radiographic components, particle
accelerators, electron guns, electronic tubes and electronic
radiation for industrial use; rental of computer software
for the management and control of machines, apparatus and
installations for the production of X-rays, radiographic
components, particle accelerators.
A coil having a coil body and a plurality of concentric cross-section windings of wire disposed around the coil body, the wire having a spacing between adjacent turns of about.25 to 1.0 of the radius of the wire. Also, a coil for a plasma processing device, the coil having a coil body and a plurality of concentric cylindrical cross-section windings of wire disposed around the coil body, the wire having a spacing between adjacent turns of about.25 to 1.0 of the radius of the wire and a diameter to length ratio of between about 2:1 and about 3:1.
H01F 27/30 - Fixation ou serrage de bobines, d'enroulements ou de parties de ceux-ci entre euxFixation ou montage des bobines ou enroulements sur le noyau, dans l'enveloppe ou sur un autre support
The present disclosure relates to plasma generation systems which utilize plasma for semiconductor processing. The plasma generation system disclosed herein employs a hybrid matching network. The plasma generation system includes a RF generator and a matching network. The matching network includes a first-stage to perform low-Q impedance transformations during high-speed variations in impedance. The matching network includes a second-stage to perform impedance matching for high-Q impedance transformations. The matching network further includes a sensor coupled to the first-stage and the second-stage to calculate the signals that are used to engage the first and second-stages. The matching network includes a first-stage network that is agile enough to tune each state in a modulated RF waveform and a second-stage network to tune a single state in a RF modulated waveform. The plasma generation system also includes a plasma chamber coupled to the matching network.
The present disclosure relates to plasma generation systems which utilize plasma for semiconductor processing. The plasma generation system disclosed herein employs a hybrid matching network. The plasma generation system includes a RF generator and a matching network. The matching network includes a first-stage to perform low-Q impedance transformations during high-speed variations in impedance. The matching network includes a second-stage to perform impedance matching for high-Q impedance transformations. The matching network further includes a sensor coupled to the first-stage and the second-stage to calculate the signals that are used to engage the first and second-stages. The matching network includes a first-stage network that is agile enough to tune each state in a modulated RF waveform and a second-stage network to tune a single state in a RF modulated waveform. The plasma generation system also includes a plasma chamber coupled to the matching network.
A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A controller of the RF matching network is configured to receive the DC magnitude and phase error signals and to vary an impedance of the RF matching network in response to the DC magnitude and phase error signals. The matching network operates in a first mode until a tuning dead-zone is determined. Once a tuning dead-zone is determined, the matching network operates in additional modes until the network is tuned. The controller uses a composite value of magnitude and phase error to drive of the variable tuning and load capacitors.
The present disclosure relates to plasma generation systems particularly applicable to systems which utilize plasma for semiconductor processing. A plasma generation system consistent with the present disclosure includes an arc suppression device coupled to the RF generator. The arc device includes switches that engage upon a triggering signal. In addition, the arc device includes a power dissipater to be engaged by the set of switches to dissipate both stored and delivered energy when the set of switches engage. The arc suppression device also includes an impedance transformer coupled to the power dissipater to perform an impedance transformation that, when the switches are engaged in conjunction with the power dissipater, reduces the reflection coefficient at the input of the device. The plasma generation system further includes a matching network coupled to the radio frequency generator and a plasma chamber coupled to the matching network.
The invention relates to a device for synchronizing a periodic high frequency power signal (18) and an external reference signal (10). The device comprises a phase control circuit (100) and a digital oscillator circuit (130). The digital oscillator circuit (130) is connected to the phase control circuit (100). The digital oscillator circuit (130) comprises means for generating the periodic high frequency power signal (18) dependent on the control signal from the phase control circuit. The phase control circuit (100) is configured to determine a phase difference of the periodic high frequency power signal (18) and the external reference signal (10).
H03L 7/099 - Détails de la boucle verrouillée en phase concernant principalement l'oscillateur commandé de la boucle
H03L 7/093 - Détails de la boucle verrouillée en phase concernant principalement l'agencement de détection de phase ou de fréquence, y compris le filtrage ou l'amplification de son signal de sortie utilisant des caractéristiques de filtrage ou d'amplification particulières dans la boucle
H03L 7/189 - Synthèse de fréquence indirecte, c.-à-d. production d'une fréquence désirée parmi un certain nombre de fréquences prédéterminées en utilisant une boucle verrouillée en fréquence ou en phase en utilisant un diviseur de fréquence ou un compteur dans la boucle une différence de temps étant utilisée pour verrouiller la boucle, le compteur entre des nombres fixes ou le diviseur de fréquence divisant par un nombre fixe utilisant des moyens pour accorder grossièrement l'oscillateur commandé en tension de la boucle utilisant un convertisseur numérique/analogique pour engendrer un accord grossier de tension
96.
AN ARC SUPPRESSION DEVICE FOR PLASMA PROCESSING EQUIPMENT
The present disclosure relates to plasma generation systems particularly applicable to systems which utilize plasma for semiconductor processing. A plasma generation system consistent with the present disclosure includes an arc suppression device coupled to the RF generator. The arc device includes switches that engage upon a triggering signal. In addition, the arc device includes a power dissipater to be engaged by the set of switches to dissipate both stored and delivered energy when the set of switches engage. The arc suppression device also includes an impedance transformer coupled to the power dissipater to perform an impedance transformation that, when the switches are engaged in conjunction with the power dissipater, reduces the reflection coefficient at the input of the device. The plasma generation system further includes a matching network coupled to the radio frequency generator and a plasma chamber coupled to the matching network.
Provided is a generator that includes a housing, a high-power circuit including a power amplifier, and a low-power circuit. An air flow guidance plate divides the housing into at least two compartments including a high-power compartment and a low-power compartment. The high-power circuit is disposed within the high-power compartment and the low-power circuit is disposed within the low-power compartment.
H05K 7/20 - Modifications en vue de faciliter la réfrigération, l'aération ou le chauffage
H03F 1/30 - Modifications des amplificateurs pour réduire l'influence des variations de la température ou de la tension d'alimentation
H03F 3/213 - Amplificateurs de puissance, p. ex. amplificateurs de classe B, amplificateur de classe C comportant uniquement des dispositifs à semi-conducteurs dans des circuits intégrés
OUT1OUT1) configured to be connected to the respective output of the at least one amplifier and configured to output at least one radio-frequency output signal. The radio-frequency generator comprises a measurement module (50) configured to receive the at least one pickup signal and to generate at least one measurement signal (52) based on the at least one pickup signal; and a radio-frequency signal generation module (48) configured to generate two or more carrier signals of different frequency, and to provide at least one drive signal as input to the power amplifier module, and a regulation module (54) configured to receive the at least one measurement signal, and to regulate the power of the at least one radio-frequency output signal based on the at least one measurement signal.
09 - Appareils et instruments scientifiques et électriques
37 - Services de construction; extraction minière; installation et réparation
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Machines for processing plastics from flux capacitors; apparatus and machines for processing paint, printers' pastes, coatings, metal sheets, and plastic sheets; plasma engraving machines; equipment for processing semi-conductor wafers; machines for processing semiconductor wafers; machines for manufacturing semiconductor substrates; electrostatic coating machines; high-voltage generators; machine parts, namely, vacuum and inert gas capacitors; machine parts, namely, frames for vacuum and inert gas capacitors; components and replacement parts for all the aforesaid goods Scientific apparatus and instruments, namely, radio frequency generators for supplying radio-frequency energy and inspection machines for the physical inspection of semiconductors, microchips, and electrical components; X-ray producing apparatus and installations not for medical use; X-ray apparatus not for medical use; X-ray tubes not for medical purposes; X-ray apparatus and installations for producing X-ray frequencies and radiographic signals, not for medical use, for imaging and analytical procedures, for measuring, controlling, regulating and weighing; X-ray apparatus and installations for producing electron radiation X-ray frequencies and radiographic signals, not for medical use, for industrial use; particle accelerators; electron guns; electron tubes; choking coils for use in electrical apparatus; vacuum tubes for non-medical X-ray imaging apparatus; electrical condenser capacitors; electrical transformers; apparatus and instruments for generating electronic radiation frequencies for industrial use; apparatus for controlling electricity; voltage regulators; apparatus and instruments for conducting, switching, transforming, accumulating, and controlling electricity; material testing instruments and machines, namely, surface roughness testing machines and instruments and electronic apparatus for measuring and testing the strength and tensile characteristics of industrial materials; data processing apparatus, computers and downloadable software for controlling machines, apparatus and installations for production of X-rays, radiographic components, particle accelerators, electron guns, electron tubes and electronic radiation for industrial use; computer hardware and downloadable software for controlling and monitoring X-ray sources; radio apparatus and instruments, namely, radio transmitters and radio receivers; high-frequency apparatus, namely, high frequency switches, high-frequency switching power supplies, high-frequency emitters and receivers, and high frequency generators; components and replacement parts for all the aforesaid goods Installation, maintenance and repair of machines for transforming plastics, paint processing machines and apparatus, printers' pastes, coatings, sheets, plastics, electrostatic coating machines, middle, high and ultrahigh frequency range generators for stimulating, producing, regulating and controlling plasma, apparatus and installations for the production of X-rays, radiographic components, particle accelerators, electron guns, electron tubes and apparatus and installations for generating electronic radiation for industrial purposes; installation, maintenance and repair of industrial machinery; installation, maintenance and repair of industrial machinery and manufacturing plants; installation, maintenance and repair of machines for transforming plastics; installation, maintenance and repair of electric and electronic equipment and apparatus; installation, maintenance and repair of computer hardware and computer peripherals for managing and controlling machines, apparatus and installations for producing X-rays, radiographic components, particle accelerators, electron guns, electron tubes and electronic radiation for industrial applications; disinfection Treatment of materials by means of X-rays and generated high frequency signals for third parties; custom application of optical, transparent, solar reflective and wear-resistant coatings on metallic, organic and mineral substrates; information relating to the treatment of materials; custom manufacture of apparatus and installations for the production of X-rays, radiographic components, particle accelerators, electron guns, electron tubes and apparatus and installations for generating electronic radiation for industrial use, on request and according to a customer's specifications; glass etching services; application of thin films in the form of coatings on object surfaces by means of chemical, mechanical, thermal, thermo-mechanical processes, chemical vapor deposition, physical vapor deposition and vacuum deposition Scientific research and development; research, development, analysis and consultancy services in the field of engineering; development and testing services in the field of engineering; industrial testing, development and research in the field of materials customization for medical, scientific and technological applications; research and development of products; research and development of new products for third parties; research and development services in connection with physics; industrial analysis and research services in the field of materials customization for medical, scientific and technological applications; design and development of testing and analysis methods; testing of materials; services provided by technical consultants relating to product development; provision of information in the field of product development; provision of information relating to scientific and technological research and development; biochemical research and development; design and development of computers and computer programs for the management and control of machines, apparatus and installations for the production of X-rays, radiographic components, particle accelerators, electron guns, electron tubes and electronic radiation for industrial applications; installation, updating and maintenance of computer software for managing and controlling machines, apparatus and installations for producing X-rays, radiographic components, particle accelerators, electron guns, electronic tubes and electronic radiation for industrial use; rental of computer software for the management and control of machines, apparatus and installations for the production of X-rays, radiographic components, particle accelerators
An RF power variable capacitor capable of operating at at least 50 watts in the MHz range. The capacitor has a composite HDK-NDK ceramic dielectric. The HDK (high dielectric constant) component comprises an active matrix of barium strontium titanate, for example. Acoustic resonances are reduced or eliminated by the addition of a metal or metalloid oxide such as magnesium borate (NDK – low dielectric constant), which acts as an acoustic resonance reduction agent (ARRA) in the RF power domain. The acoustic resonances which previously occurred under bias voltage 500 V (curve 25) or 1100 V (curve 26) in prior art RF power variable capacitors are eliminated by the addition of the ARRA (curves 22 and 21).
H01G 7/06 - Condensateurs dont la capacité varie par des moyens non mécaniquesProcédés pour leur fabrication à diélectrique choisi pour sa variation de permittivité en fonction de la tension appliquée, c.-à-d. condensateurs ferro-électriques
C04B 35/468 - Produits céramiques mis en forme, caractérisés par leur compositionCompositions céramiquesTraitement de poudres de composés inorganiques préalablement à la fabrication de produits céramiques à base d'oxydes à base d'oxydes de titane ou de titanates à base de titanates à base de titanates de métaux alcalino-terreux à base de titanates de baryum
