A carbon nanotube collection apparatus includes: a collection room having an opening part communicating with a carbon nanotube production apparatus; a winding member arranged inside the collection room and configured to wind a carbon nanotube passed through the opening part from the carbon nanotube production apparatus to form a carbon nanotube wound body; and a separation mechanism configured to move the carbon nanotube wound body from a base end side toward a tip end side of the winding member to separate the carbon nanotube wound body from the winding member.
B65H 67/04 - Dispositions pour retirer les paquets d'enlèvement une fois garnis et les remplacer par des noyaux, gabarits ou récipients vides aux postes d'enroulage ou d'emmagasinageTransfert du matériau entre les éléments de prise adjacents pleins et vides
This carbon nanotube recovering device is for recovering carbon nanotubes, and comprises: a winding chamber; a recovery chamber; a first gas discharge line for discharging a gas supplied to the recovery chamber; and a second gas discharge line for discharging a gas supplied to the winding chamber. The recovery chamber has: a first opening connected to the winding chamber; and an open/close mechanism that opens and closes the first opening. It is possible to change among discharging of gas from the first gas discharge line, discharging of gas from the second gas discharge line, and discharging of gas from both of the first and second gas discharge lines.
An apparatus for recovering carbon nanotubes which is equipped with a recovery chamber for recovering carbon nanotubes, wherein: the recovery chamber has a housing and a storage container provided below the housing; the housing has a first opening which is connected to an apparatus for producing carbon nanotubes, an opening/closing mechanism for opening and closing the first opening, and a second opening which is connected to the storage container; and the storage container is removably attached to the housing.
This vacuum carburizing furnace comprises: a heating chamber in which vacuum carburizing of a workpiece charged into the furnace is performed; and a workpiece charging port that is provided on the bottom of the heating chamber.
The present invention provides an apparatus for recovering carbon nanotubes, the apparatus comprising: a recovery chamber which has an opening that leads to a carbon nanotube generation device; a winding member which is arranged within the recovery chamber so as to wind carbon nanotubes that have passed through the opening from the carbon nanotube generation device, thereby forming a carbon nanotube wound body; and a separation mechanism which separates the carbon nanotube wound body from the winding member by moving the carbon nanotube wound body from the base end side to the tip end side of the winding member.
A vanadium silicon carbide film contains vanadium, silicon, and carbon, in which the total of a vanadium element concentration, a silicon element concentration, and a carbon element concentration in the film is 90 at % or more.
C23C 16/515 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques utilisant des décharges pulsées
7.
VANADIUM SILICON CARBIDE FILM COATED MEMBER AND METHOD FOR MANUFACTURING SAME, AND VANADIUM SILICON CARBIDE FILM-FORMING SUBSTRATE AND METHOD FOR MANUFACTURING SAME
A vanadium silicon carbide film coated member comprising a substrate, a nitride layer formed on a surface of the substrate, and a vanadium silicon carbide film formed on the nitride layer and having a surface roughness Rzjis of 0.2-1.0 μm, wherein the vanadium silicon carbide film contains vanadium, silicon, and carbon, and, in the film, the total of the vanadium element concentration, the silicon element concentration, and the carbon element concentration is 90 at% or more.
This metal carbide film-coated member has a steel material having a carbide layer at the surface and has, on the carbide layer, a metal carbide film that contains carbon and at least one metal selected from the group consisting of V, Ti, Al, Cr, Nb, and Si, wherein, defining the ratio between the maximum x-ray diffraction peak intensity [carbide intensity] originating with the metal carbide of the steel material and the maximum x-ray diffraction peak intensity [Fe intensity] originating with α-Fe, the peak intensity ratio for the carbide layer [carbide intensity/Fe intensity] is 0.5-4.0.
A heat treatment apparatus includes: a treatment chamber unit that is, inside a furnace shell, detachably fixed to the furnace shell; and a power supply portion, in which the treatment chamber unit includes: a treatment container in which a heat treatment is performed on a workpiece; a heat insulating material provided inside the treatment container; a heater that has a heating element located inside the treatment container and has a terminal located outside the treatment container; and a busbar that is provided on the outside of the treatment container and is electrically connected to the terminal of the heater, the power supply portion is provided outside the treatment container, and the busbar and the power supply portion are detachably connected to each other.
In a vanadium nitride film formed on a surface of a base material, a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration in the film is 1.08 or more and a chlorine element concentration in the film is 1 at % or more and 5 at % or less.
C23C 16/50 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques
C23C 16/52 - Commande ou régulation du processus de dépôt
C22C 38/24 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du vanadium
C22C 38/46 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du nickel et du vanadium
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
C23C 16/505 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques utilisant des décharges à radiofréquence
11.
VANADIUM SILICARBIDE FILM, VANADIUM SILICARBIDE FILM-COATED MEMBER, AND METHOD FOR PRODUCING VANADIUM SILICARBIDE FILM-COATED MEMBER
Provided is a vanadium silicarbide film comprising vanadium, silicon, and carbon, and the total of the vanadium element concentration, the silicon element concentration, and the carbon element concentration in the film is at least 90 at%.
C23C 16/50 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques
12.
Vanadium silicon carbonitride film, vanadium silicon carbonitride film coated member, and method for manufacturing the same
A vanadium silicon carbonitride film includes vanadium, silicon, carbon, and nitrogen, wherein when vanadium element concentration/(vanadium element concentration+silicon element concentration+carbon element concentration+nitrogen element concentration) in the film is defined as a, and silicon element concentration/(vanadium element concentration+silicon element concentration+carbon element concentration+nitrogen element concentration) in the film is defined as b, 0.30≤a/b≤1.3 and 0.30≤a+b≤0.70 are satisfied, and a total of the vanadium element concentration, the silicon element concentration, the carbon element concentration, and the nitrogen element concentration in the film is 90 [at %] or more.
C23C 16/50 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques
13.
Vanadium nitride film, and member coated with vanadium nitride film and method for manufacturing the same
In a vanadium nitride film formed on a surface of a base material, a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration in the film is 1.08 or more and a chlorine element concentration in the film is 1 at % or more and 5 at % or less.
C23C 16/50 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques
C23C 16/52 - Commande ou régulation du processus de dépôt
C22C 38/24 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du vanadium
C22C 38/46 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du nickel et du vanadium
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
Provided is a heat treatment equipment including: a treatment chamber unit that is fixed inside a hearth so as to be detachable with respect to the hearth; and a power supply part. The treatment chamber unit has: a treatment container in which a workpiece is subjected to heat treatment; a heat insulating material that is provided inside the treatment container; a heater, a heating element of which is located inside the treatment container and a terminal of which is located outside the treatment container; and a busbar that is provided outside the treatment container and that is electrically connected to the terminal of the heater. The power supply part is provided outside the treatment container. The busbar and the power supply part are detachably connected.
A vanadium silicon nitride film formed as a hard film to a base material satisfies 0.30≤a/b≤1.7 and 0.24≤b≤0.36 when a=vanadium element concentration [at %]/(vanadium element concentration [at %]+silicon element concentration [at %]+nitrogen element concentration [at %]) and b=silicon element concentration [at %]/(vanadium element concentration [at %]+silicon element concentration [at %]+nitrogen element concentration [at %]), and has a hardness of 2300 HV or more.
C23C 16/513 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques utilisant des jets de plasma
C04B 35/58 - Produits céramiques mis en forme, caractérisés par leur compositionCompositions céramiquesTraitement de poudres de composés inorganiques préalablement à la fabrication de produits céramiques à base de non oxydes à base de borures, nitrures ou siliciures
C03C 17/22 - Traitement de surface du verre, p. ex. du verre dévitrifié, autre que sous forme de fibres ou de filaments, par revêtement par d'autres matières inorganiques
B21D 37/20 - Fabrication d'outils par des opérations non couvertes par une seule autre sous-classe
A continuous nitriding treatment furnace includes a nitriding chamber, a heater, a first nitriding zone, and a second nitriding zone lower in atmosphere gas temperature than the first nitriding zone by 25° C. to 150° C., the continuous nitriding treatment furnace being configured such that an atmosphere gas in the first nitriding zone flows into the second nitriding zone and being configured to execute a nitriding treatment that forms an iron nitride compound layer composed of an ε phase or of the ε phase and a γ′ phase on a surface of the steel member in the first nitriding zone and precipitates the γ′ phase in the iron nitride compound layer in the second nitriding zone.
F27B 9/04 - Fours dans lesquels la charge est déplacée mécaniquement, p. ex. du type tunnel Fours similaires dans lesquels la charge se déplace par gravité adaptés pour le traitement de la charge sous vide ou sous atmosphère contrôlée
C21D 9/32 - Traitement thermique, p. ex. recuit, durcissement, trempe ou revenu, adapté à des objets particuliersFours à cet effet pour roues d'engrenage, roues hélicoïdales, ou équivalent
C21D 11/00 - Commande ou régulation du processus lors de traitements thermiques
F27B 9/02 - Fours dans lesquels la charge est déplacée mécaniquement, p. ex. du type tunnel Fours similaires dans lesquels la charge se déplace par gravité à trajets multiplesFours dans lesquels la charge est déplacée mécaniquement, p. ex. du type tunnel Fours similaires dans lesquels la charge se déplace par gravité à plusieurs chambresCombinaisons de fours
A heat treatment facility performing a heat treatment on a workpiece, the heat treatment facility includes: a treatment container in which the workpiece is housed; a heater which is provided in the treatment container and heats the workpiece by radiation heat at least from below the workpiece; and a plurality of support posts which are provided in the treatment container and support the workpiece.
F27B 5/14 - Aménagement des dispositifs de chauffage
C21D 1/773 - Procédés de traitement en gaz neutre, en atmosphère contrôlée, sous vide ou dans des matières pulvérulentes sous pression réduite ou sous vide
18.
VANADIUM SILICON CARBONITRIDE FILM, VANADIUM SILICON CARBONITRIDE-COVERED MEMBER AND METHOD FOR MANUFACTURING SAME
This vanadium silicon carbonitride film comprises vanadium, silicon, carbon, and nitrogen. When vanadium element concentration (vanadium element concentration + silicon element concentration + carbon element concentration + nitrogen element concentration) in the film is defined as "a," and silicon element concentration (vanadium element concentration + silicon element concentration + carbon element concentration + nitrogen element concentration) in the film is defined as "b," 0.30 ≤ a/b ≤ 1.3 and 0.30 ≤ a + b ≤ 0.70 are satisfied, and the sum of the vanadium element concentration, silicon element concentration, carbon element concentration, and nitrogen element concentration in the film is 90 [at%] or greater.
C23C 16/50 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques
In a door structure of a heat treatment furnace performing a heat treatment of a workpiece, there are provided: a first opening member and a second opening member in which workpiece passing ports where the transferred workpiece passes are formed; and a sheet shutter, the sheet shutter is provided with a winding portion and a shutter portion, the shutter portion is disposed between the first opening member and the second opening member, the shutter portion is provided with a first sheet portion which covers the workpiece passing port of the first opening member and a second sheet portion which covers the workpiece passing port of the second opening member at a time that the shutter portion is closed, and it is configured that a gas storage portion is formed between the first opening member and the second opening member at the time that the shutter portion is closed.
F27B 9/30 - Parties constitutives, accessoires ou équipement spécialement adaptés à ces types de fours
F27B 9/20 - Fours dans lesquels la charge est déplacée mécaniquement, p. ex. du type tunnel Fours similaires dans lesquels la charge se déplace par gravité caractérisés par le trajet de la charge pendant le traitementFours dans lesquels la charge est déplacée mécaniquement, p. ex. du type tunnel Fours similaires dans lesquels la charge se déplace par gravité caractérisés par le procédé de déplacement de la charge pendant le traitement la charge se déplaçant sur un trajet sensiblement rectiligne
20.
Intermediate layer formed between base material and DLC layer and film-forming method thereof
In an intermediate layer formed between a base material and a DLC layer, a Ti layer and a TiC layer formed on a surface of the Ti layer are provided, and a carbon content of the entire layer containing the Ti layer and the TiC layer is 53 at % or more and 77 at % or less.
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
B32B 9/00 - Produits stratifiés composés essentiellement d'une substance particulière non couverte par les groupes
C23C 28/00 - Revêtement pour obtenir au moins deux couches superposées, soit par des procédés non prévus dans un seul des groupes principaux , soit par des combinaisons de procédés prévus dans les sous-classes et
C23C 14/00 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement
C23C 14/16 - Matériau métallique, bore ou silicium sur des substrats métalliques, en bore ou en silicium
C23C 16/50 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques
21.
VANADIUM SILICON NITRIDE FILM, VANADIUM SILICON NITRIDE FILM COATED MEMBER, AND METHOD FOR MANUFACTURING SAME
The vanadium silicon nitride film according to the present invention formed as a hard coating film for a substrate satisfies the conditions 0.30 ≤ a/b ≤ 1.7 and 0.24 ≤ b ≤ 0.36, where a = vanadium element concentration [at%]/(vanadium element concentration [at%] + silicon element concentration [at%] + nitrogen element concentration [at%]), and b = silicon element concentration [at%]/(vanadium element concentration [at%] + silicon element concentration [at%] + nitrogen element concentration [at%]), and has a hardness of 2300 HV or greater.
A nitriding treatment method of a steel member, in which a nitriding treatment step is performed in which the steel member is subjected to a nitriding treatment in a nitriding gas atmosphere having a nitriding potential with which a γ′ phase or ε phase iron nitride compound layer is generated on a surface of the steel member, and then, a passing step is performed in which the steel member is made to pass through an atmosphere at 425° C. to 600° C. where the iron nitride compound layer does not grow over five minutes or more, the iron nitride compound layer has the γ′ phase uppermost surface layer, and the γ′ phase is made to precipitate in the iron nitride compound layer by the proportion of 40% or more.
C22C 38/04 - Alliages ferreux, p. ex. aciers alliés contenant du manganèse
C22C 38/24 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du vanadium
C22C 38/02 - Alliages ferreux, p. ex. aciers alliés contenant du silicium
C22C 38/22 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du molybdène ou du tungstène
C22C 38/18 - Alliages ferreux, p. ex. aciers alliés contenant du chrome
C22C 38/06 - Alliages ferreux, p. ex. aciers alliés contenant de l'aluminium
C21D 9/32 - Traitement thermique, p. ex. recuit, durcissement, trempe ou revenu, adapté à des objets particuliersFours à cet effet pour roues d'engrenage, roues hélicoïdales, ou équivalent
23.
CONTINUOUS NITRIDING TREATMENT FURNACE AND CONTINUOUS NITRIDING TREATMENT METHOD
Provided is a continuous nitriding treatment furnace, wherein: the continuous nitriding treatment furnace is provided with a nitriding chamber, a heater, a first nitriding zone, and a second nitriding zone that is at a temperature 25-150°C lower than the temperature of atmospheric gas in the first nitriding zone; a configuration is adopted such that the atmospheric gas in the first nitriding zone flows into the second nitriding zone; and a configuration is adopted such that an iron nitride compound layer comprising an ε phase or comprising an ε phase and a γ' phase is formed on the surface of a steel member in the first nitriding zone, and a nitriding treatment for causing a γ' phase to precipitate on the iron nitride compound layer is performed in the second nitriding zone.
C23C 8/26 - Nitruration de la couche superficielle de matériaux ferreux
C21D 9/32 - Traitement thermique, p. ex. recuit, durcissement, trempe ou revenu, adapté à des objets particuliersFours à cet effet pour roues d'engrenage, roues hélicoïdales, ou équivalent
C22C 38/00 - Alliages ferreux, p. ex. aciers alliés
C22C 38/18 - Alliages ferreux, p. ex. aciers alliés contenant du chrome
F27B 9/04 - Fours dans lesquels la charge est déplacée mécaniquement, p. ex. du type tunnel Fours similaires dans lesquels la charge se déplace par gravité adaptés pour le traitement de la charge sous vide ou sous atmosphère contrôlée
24.
VANADIUM NITRIDE FILM, VANADIUM NITRIDE FILM COATED MEMBER, AND METHOD FOR MANUFACTURING SAME
A vanadium nitride film formed on the surface of a substrate, wherein the ratio V [at%]/N [at%] of the concentration of elemental vanadium and the concentration of elemental nitrogen in the film is 1.08 or higher, and the concentration of elemental chlorine in a coating is 1 at% to 5 at%.
In a heater unit for a carburizing furnace that carburizes a workpiece, a heater that heats a furnace atmosphere; and a heater supporting member that reflects radiant heat of the heater are provided, in which a heat generation part of the heater is attached to the heater supporting member, and a heat generation body composing the heat generation part is formed in a bellows shape.
H05B 3/66 - Supports ou fixations pour éléments chauffants sur ou dans la paroi ou le toit
C23C 8/22 - Carburation de la couche superficielle de matériaux ferreux
F27D 7/06 - Production ou maintien d'une atmosphère particulière ou du vide dans les chambres de chauffage
F27D 11/12 - Aménagement des éléments pour le chauffage électrique dans ou sur les fours avec champs électromagnétiques agissant directement sur le matériau à chauffer
F27D 99/00 - Matière non prévue dans les autres groupes de la présente sous-classe
This door structure of a heat-treating furnace for performing heat treatment of workpieces is configured to comprise: a first hole-formed member and a second hole-formed member that each have formed therein a workpiece through-hole through which a workpiece being conveyed passes; and a sheet shutter, wherein the sheet shutter is provided with a winding part and a shutter part, the shutter part is disposed between the first hole-formed member and the second hole-formed member, the shutter part is provided with a first sheet part that covers the workpiece through-hole in the first hole-formed member when the shutter part is closed, and with a second sheet part that covers the workpiece through-hole in the second hole-formed member when the shutter part is closed, and a gas-storing part is formed between the first hole-formed member and the second hole-formed member when the door of the shutter part is closed.
In an intermediate layer formed between a substrate and a DLC layer, a Ti layer and a TiC layer formed on the surface of said Ti layer are provided, and the carbon content of the entire layer comprising the Ti layer and the TiC layer is 53 at% to 77 at%.
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
B32B 9/00 - Produits stratifiés composés essentiellement d'une substance particulière non couverte par les groupes
B23B 27/14 - Outils de coupe sur lesquels les taillants ou éléments tranchants sont en matériaux particulier
B23B 27/20 - Outils de coupe sur lesquels les taillants ou éléments tranchants sont en matériaux particulier à éléments tranchants constitués par des diamants
2 gas is set to 0.09 to 0.18, at a flow speed of the nitriding treatment gas set to 1 m/s or more, at 500 to 620° C.; and thereby, forming an iron nitride compound layer having a thickness of 2 to 17 μm on a surface of the steel member.
C21D 1/74 - Procédés de traitement en gaz neutre, en atmosphère contrôlée, sous vide ou dans des matières pulvérulentes
C21D 1/76 - Réglage de la composition de l'atmosphère
C21D 9/32 - Traitement thermique, p. ex. recuit, durcissement, trempe ou revenu, adapté à des objets particuliersFours à cet effet pour roues d'engrenage, roues hélicoïdales, ou équivalent
C22C 38/22 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du molybdène ou du tungstène
C22C 38/44 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du nickel et du molybdène ou du tungstène
C22C 38/00 - Alliages ferreux, p. ex. aciers alliés
C22C 38/02 - Alliages ferreux, p. ex. aciers alliés contenant du silicium
C22C 38/04 - Alliages ferreux, p. ex. aciers alliés contenant du manganèse
C22C 38/06 - Alliages ferreux, p. ex. aciers alliés contenant de l'aluminium
This method for nitriding a steel member comprises the step of nitriding a steel member in a nitriding gas atmosphere having a nitriding potential at which a ɣ'-phase or ɛ-phase iron nitride compound layer can be formed on the surface of the steel member, and the passing step of subsequently passing the steel member through an atmosphere of 425ºC to 600ºC in which the iron nitride compound layer does not grow over five minutes or more. The iron nitride compound layer has a ɣ'-phase outermost layer and the proportion of the ɣ' phase precipitated in the iron nitride compound layer is 40% or more.
C23C 8/26 - Nitruration de la couche superficielle de matériaux ferreux
C21D 9/32 - Traitement thermique, p. ex. recuit, durcissement, trempe ou revenu, adapté à des objets particuliersFours à cet effet pour roues d'engrenage, roues hélicoïdales, ou équivalent
C22C 38/00 - Alliages ferreux, p. ex. aciers alliés
[Problem] To produce a DLC film excellent in hardness and adhesiveness while preventing a film-forming rate from slowing even when the gas pressure in a chamber is a low pressure without requiring a large-scale facility such as a thermostatic device.
[solution] There is provided a DLC film film-forming method being a film-forming method to film-form a DLC film on a substrate by a plasma CVD method, the method including: setting a voltage to be applied to a substrate using a DC pulse power supply to a bias voltage; using an acetylene gas or a methane gas as a film-forming gas to be supplied into a chamber; setting the total pressure of the gas in the chamber to not less than 0.5 Pa and not more than 3 Pa when the methane gas is used; setting the total pressure of the gas in the chamber to not less than 0.3 Pa and not more than 3 Pa when the acetylene gas is used; and setting the bias voltage to not less than 0.9 kV and not more than 2.2 kV.
C23C 14/00 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
C23C 16/515 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques utilisant des décharges pulsées
C23C 14/14 - Matériau métallique, bore ou silicium
Forming method of intermediate layer formed between base material and DLC film, DLC film forming method, and intermediate layer formed between base material and DLC film
4 gas are supplied into the chamber, a film-forming pressure is set to a pressure in a range of 0.2 Pa or more to less than 0.4 Pa, and a second bias voltage higher in bias voltage than a first bias voltage applied to the base material in the Ti layer film-forming step and higher in bias voltage than −100 V is applied to the base material to film-form the TiC layer.
C23C 14/22 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le procédé de revêtement
C23C 16/50 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques
C23C 14/00 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
C23C 14/16 - Matériau métallique, bore ou silicium sur des substrats métalliques, en bore ou en silicium
C23C 28/00 - Revêtement pour obtenir au moins deux couches superposées, soit par des procédés non prévus dans un seul des groupes principaux , soit par des combinaisons de procédés prévus dans les sous-classes et
A first nitriding process step is performed in which a steel member is subjected to a nitriding process in a nitriding gas atmosphere having a nitriding potential with which a nitride compound layer having a γ′ phase or an ε phase is generated, and thereafter a second nitriding process step is performed in which the steel member is subjected to a nitriding process in a nitriding gas atmosphere having a nitriding potential lower than the nitriding potential in the first nitriding process step, to thereby precipitate the γ′ phase in the nitride compound layer. It is possible to generate the nitride compound layer having a desired phase mode uniformly all over a component to be treated and to manufacture a nitrided steel member high in pitting resistance and bending fatigue strength.
C23C 8/26 - Nitruration de la couche superficielle de matériaux ferreux
C21D 9/32 - Traitement thermique, p. ex. recuit, durcissement, trempe ou revenu, adapté à des objets particuliersFours à cet effet pour roues d'engrenage, roues hélicoïdales, ou équivalent
Provided is a heater unit for a carburizing furnace that carburizes a workpiece, wherein: the heater unit is provided with a heater that heats the atmosphere inside the furnace and a heater support member that reflects the radiated heat of the heater; a heat generation part of the heater is attached to the heater support member; and a heat generation body constituting the heat generation part is formed in a bellows shape.
[Problem] To manufacture a DLC film having excellent hardness and adhesive properties, without the need for large equipment such as a thermostatic device, and without a drop in the film formation speed even when the gas pressure inside a chamber is low. [Solution] Provided is a DLC film formation method for forming a DLC film atop a base material by means of a plasma CVD technique, wherein: a voltage applied to the base material using a D/C pulse power supply is set as the bias voltage; acetylene gas or methane gas is used as the film formation gas supplied within the chamber; and the overall pressure of the gas within the chamber is set to be 0.5Pa-3Pa if methane gas is used and is set to be 0.3Pa-3Pa when acetylene gas is used, and the bias voltage is set to be 0.9kV-2.2kV.
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
35.
METHOD FOR FORMING INTERMEDIATE LAYER FORMED BETWEEN SUBSTRATE AND DLC FILM, METHOD FOR FORMING DLC FILM, AND INTERMEDIATE LAYER FORMED BETWEEN SUBSTRATE AND DLC FILM
This method for forming an intermediate layer, which uses a PVD method to form an intermediate layer formed between a substrate and a DLC film, has a Ti layer forming step for forming a Ti layer on the substrate, and a TiC layer forming step for forming a TiC layer on the Ti layer. In the Ti layer forming step, Ar gas is supplied into the chamber into which the substrate is conveyed, and the Ti layer is formed with the film formation pressure in the rane of 0.4-1 Pa inclusive; and in the TiC layer forming step, Ar gas and CH4 gas are supplied into the chamber, and, with the film formation pressure in the range of at least 0.2 Pa and less than 0.4 Pa, the TiC layer is formed by imposing to the substrate a second bias voltage that is higher than -100 V and that is higher than a first bias voltage imposed on the substrate in the Ti layer forming step.
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
C23C 14/14 - Matériau métallique, bore ou silicium
C23C 16/50 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques
A first nitriding step of nitriding a steel member in a nitriding gas atmosphere having a nitriding potential at which a γ'-phase or ε-phase nitride compound layer can be generated is carried out, and then a second nitriding step of nitriding the steel member in a nitriding gas atmosphere having a nitriding potential which is lower than that employed in the first nitriding step is carried out, thereby depositing a γ' phase on a nitrided compound layer. It becomes possible to uniformly form a nitride compound layer having a desired phase morphology on the whole surface of a member of interest, and therefore it becomes possible to produce a nitride steel member having high pitching resistance and high fatigue strength under bending.
C21D 9/32 - Traitement thermique, p. ex. recuit, durcissement, trempe ou revenu, adapté à des objets particuliersFours à cet effet pour roues d'engrenage, roues hélicoïdales, ou équivalent
37.
Nitrided steel member and manufacturing method thereof
C21D 1/74 - Procédés de traitement en gaz neutre, en atmosphère contrôlée, sous vide ou dans des matières pulvérulentes
C21D 1/76 - Réglage de la composition de l'atmosphère
C21D 9/32 - Traitement thermique, p. ex. recuit, durcissement, trempe ou revenu, adapté à des objets particuliersFours à cet effet pour roues d'engrenage, roues hélicoïdales, ou équivalent
C22C 38/22 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du molybdène ou du tungstène
C22C 38/44 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du nickel et du molybdène ou du tungstène
38.
NITRIDED STEEL MEMBER AND PROCESS FOR PRODUCING SAME
A nitrided steel member produced by forming an iron nitride compound layer on the surface of a steel member having a prescribed composition, wherein: when the surface of the nitrided steel member is measured by X-ray diffraction, the intensity ratio IFe4N(111)/{IFe4N(111) + IFe3N(111)} is 0.5 or more, IFe4N(111) referring to the X-ray diffraction peak intensity assignable to the (111) plane of Fe4N, and IFe3N(111) referring to the X-ray diffraction peak intensity assignable to the (111) plane of Fe3N; the Vickers hardness of the iron nitride compound layer is 900 or less; the Vickers hardness of the base metal at a point located immediately under the iron nitride compound layer is 700 or more; the difference between the Vickers hardness of the iron nitride compound layer and that of the base metal at the point is 150 or less; and the thickness of the iron nitride compound layer is 2 to 17μm.
C21D 1/76 - Réglage de la composition de l'atmosphère
C21D 9/32 - Traitement thermique, p. ex. recuit, durcissement, trempe ou revenu, adapté à des objets particuliersFours à cet effet pour roues d'engrenage, roues hélicoïdales, ou équivalent
C22C 38/00 - Alliages ferreux, p. ex. aciers alliés
C22C 38/24 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du vanadium
F16H 55/06 - Emploi de matériauxEmploi de traitements d'organes dentés ou de vis sans fin pour modifier les propriétés intrinsèques des matériaux
39.
NITRIDED STEEL MEMBER AND METHOD FOR PRODUCING SAME
In this nitrided steel member, an iron nitride compound layer is formed on the surface of a steel member comprising a carbon steel member for a machine structure or an alloy steel member for a machine structure. The nitride steel member is characterized by the thickness of the iron nitride compound layer being 2-17 μm, and of the X-ray diffraction peak strength (IFe4N(111)) of the (111) crystal plane of Fe4N and the X-ray diffraction peak strength (IFe3N(111)) of the (111) crystal plane of Fe3N measured at the surface of the nitride steel member by means of X-ray diffraction, the strength ratio represented by IFe4N(111)/{IFe4N(111) + IFe3N(111)} is at least 0.5.
C21D 1/76 - Réglage de la composition de l'atmosphère
C21D 9/32 - Traitement thermique, p. ex. recuit, durcissement, trempe ou revenu, adapté à des objets particuliersFours à cet effet pour roues d'engrenage, roues hélicoïdales, ou équivalent
C22C 38/00 - Alliages ferreux, p. ex. aciers alliés
C22C 38/22 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du molybdène ou du tungstène
C22C 38/44 - Alliages ferreux, p. ex. aciers alliés contenant du chrome et du nickel et du molybdène ou du tungstène
40.
Atmosphere heat treatment apparatus and method of operating the same
An object of the present invention is to provide an atmosphere heat treatment apparatus that is operable without relying on experiences and/or intuitions of an operator, and a method of operating the same. The atmosphere heat treatment apparatus includes an entrance side exhaust path (26) for exhausting an inside atmosphere from an entrance side of a carburizing chamber (10) to which a transforming gas is supplied, an exit side exhaust path (35) for exhausting the inside atmosphere from an exit side of the heat treatment chamber, and an opening degree adjusting lid (28) attached for adjusting an opening degree of the entrance side exhaust path (26), in which a part or whole of the exit side exhaust path (35) is constituted of a pipe (46) having a predetermined inside diameter. It is checked in advance a relationship of a supplying amount A of the transforming gas with a ratio B:C of an exhaust amount B from the exit side exhaust path (35) and an exhaust amount C from the entrance side exhaust path (26) when a pressure in the carburizing chamber (10) is adjusted to a predetermined furnace pressure by adjusting an opening degree of the entrance side exhaust path (26) with the opening degree adjusting lid (28), and when treating a work (W), the supplying amount A of the transforming gas and a furnace pressure are adjusted so as to control the ratio B:C of the exhaust amount B from the exit side exhaust path (35) and the exhaust amount C from the entrance side exhaust path (26) to be within a predetermined range.
F28C 3/12 - Autres appareils échangeurs de chaleur à contact direct une des sources de potentiel calorifique au moins étant un solide fluent, p. ex. un matériau sous forme de particules les sources de potentiel calorifique étant un matériau sous forme de particules d'une part, un gaz, une vapeur ou un liquide d'autre part
41.
Heat treatment method and heat treatment apparatus
In a heat treatment method for supplying transforming gas and enriched gas inside a furnace and heat treating a workpiece inside the furnace, feedback control of carbon potential is performed by operating a supply flow rate of the enriched gas based on carbon potential inside the furnace, the feedback control is stopped before an opening of the furnace is opened and supply flow rates of the transforming gas and the enriched gas are increased from supply flow rates thereof immediately before the feedback control is stopped; and the supply flow rate of the transforming gas is returned to the supply flow rate thereof immediately before the feedback control is stopped and the feedback control is resumed after the opening of the furnace is closed.
brevets
