A temperature control assembly for controlling a temperature of a semiconductor process equipment is provided. The temperature control assembly comprises: a first modular device of a series chain of modular devices, the first modular device having a temperature change device for changing the temperature of the semiconductor process equipment, a condition sense device, a power input configured to receive power to power the first modular device and a power output configured to supply power to a second modular device in the series chain of modular devices, wherein the condition sense device is configured to cause the power output to supply power to the second modular device when a predetermined condition has been met.
G05D 23/19 - Commande de la température caractérisée par l'utilisation de moyens électriques
G05D 23/24 - Commande de la température caractérisée par l'utilisation de moyens électriques avec un élément sensible présentant une variation de ses propriétés électriques ou magnétiques avec les changements de température l'élément sensible ayant une résistance variant avec la température, p. ex. une thermistance
Rotary valve assembly for a cryopump, comprising a disc shaped valve element having a supply opening at a radial distance to be connected to a supply line and a return opening separate from the supply opening at the same radial distance to be connected to a return line; a shaft interface to be connected to a motor shaft and rotated by the motor shaft, wherein the shaft interface is connected to the valve element to rotate the valve element; and a seal element axially next to the valve element and in direct contact with the valve element, wherein the seal element comprises a common channel to be connected to a cold head of the cryopump via a common line, wherein the common channel is arranged a the radial distance of the supply opening and the return opening such that upon rotation, when the supply opening is aligned with the common channel, the cold head is connected to the supply line, and when the return opening is aligned with the common channel, the cold head is connected to the return line.
F04B 15/08 - Pompes adaptées pour travailler avec des fluides particuliers, p. ex. grâce à l'emploi de matériaux spécifiés pour la pompe elle-même ou certaines de ses parties avec des liquides près de leur point d'ébullition, p. ex. à une pression anormalement basse les liquides ayant une température d'ébullition peu élevée
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
F04B 39/10 - Adaptation ou aménagement des organes de distribution
F16K 3/06 - Robinets-vannes ou tiroirs, c.-à-d. dispositifs obturateurs dont l'élément de fermeture glisse le long d'un siège pour l'ouverture ou la fermeture à faces d'obturation planesGarnitures d'étanchéité à cet effet avec éléments de fermeture articulés à pivot en forme de plaques disposées entre l'alimentation et l'évacuation
F16K 11/074 - Soupapes ou clapets à voies multiples, p. ex. clapets mélangeursRaccords de tuyauteries comportant de tels clapets ou soupapesAménagement d'obturateurs et de voies d'écoulement spécialement conçu pour mélanger les fluides dont toutes les faces d'obturation se déplacent comme un tout comportant uniquement des tiroirs à éléments de fermeture articulés à pivot à faces d'obturation planes
F25B 9/14 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé caractérisés par le cycle utilisé, p. ex. cycle de Stirling
3.
CONDUIT ASSEMBLY AND SUPPORT BRACKET FOR A VACUUM PUMP AND/OR ABATEMENT SYSTEM
An apparatus (80) for use in a vacuum pumping and/or abatement system, the apparatus (80) comprising: a conduit (52) for permitting the flow therethrough of a fluid, the conduit (52) having a first conduit end (54) and a second conduit end (56) opposite to the first conduit end (54), the conduit (52) being expandable and compressible in an axial direction between the first conduit end (54) and the second conduit end (56); a first flange (62) at or proximate to the first conduit end (52); a second flange (64) at or proximate to the second conduit end (54); and a support bracket (82); wherein the support bracket (82) comprises a rigid body portion (84) having a first end (86) and a second end (88) opposite to the first end (86); the first end (86) of the rigid body portion (84) is couplable to the first flange (62) and the second end (88) of the rigid body portion (84) is couplable to the second flange (64) whereby to limit relative movement of the first and second flanges (62, 64); and the first end (86) of the rigid body portion (84) and the first flange (62) comprise corresponding relief features configured such that movement of the first flange (62) relative to the first end (86) of the rigid body portion (84) is limited in both the axial direction and a lateral direction perpendicular to the axial direction.
F16L 27/111 - Raccords réglablesRaccords permettant un déplacement des parties raccordées comportant uniquement une connexion flexible les extrémités des tuyaux étant assemblées au moyen d'un manchon flexible le manchon ayant la forme d'un soufflet avec des ondulations multiples le soufflet étant renforcé
F16L 51/02 - Compensation de la dilatation dans les canalisations utilisant un soufflet ou un tube dilatable en accordéon ou ondulé
4.
A BRACKET FOR USE IN A VACUUM PUMPING OR ABATEMENT SYSTEM
A bracket (100) for use in a vacuum pumping or abatement system, the bracket (100) for supporting a plurality of components of the vacuum pumping or abatement system, the bracket (100) comprising: an elongate member (102); and a plurality of clamps (104a, 104b) fixedly attached to the elongate member (102); wherein each clamp (104a, 104b) is configured to receive a respective one of the plurality of components; and each clamp (104a, 104b) is located at a different respective peripheral position about an outer boundary of the elongate member (100).
F16M 11/04 - Moyens pour la fixation des appareilsMoyens permettant le réglage des appareils par rapport au banc
F16L 3/227 - Supports pour tuyaux, pour câbles ou pour conduits de protection, p. ex. potences, pattes de fixation, attaches, brides, colliers spécialement adaptés pour supporter un certain nombre de tuyaux parallèles séparés par un espace chaque support ayant une base transversale pour supporter les tuyaux chaque tuyau étant supporté par un élément séparé fixé sur la base
F16M 13/02 - Autres supports ou appuis pour positionner les appareils ou les objetsMoyens pour maintenir en position les appareils ou objets tenus à la main pour être portés par un autre objet ou lui être fixé, p. ex. à un arbre, une grille, un châssis de fenêtre, une bicyclette
F04B 39/14 - Dispositions permettant un montage ou démontage commodes
F04D 19/04 - Pompes multiétagées spécialement adaptées pour réaliser un vide poussé, p. ex. pompes moléculaires
F16B 2/10 - Brides ou colliers, c.-à-d. dispositifs de fixation dont le serrage est effectué par des forces effectives autres que la résistance à la déformation inhérente au matériau dont est fait le dispositif externes c.-à-d. agissant par contraction utilisant des mâchoires sur pivot
Vacuum pump comprising: a sputter ion pump, SIP, module, having a first end and a second end; a non-evaporable getter, NEG, module, connected to the second end of the SIP module; an electrical lead of the NEG module running from the first end to the second end of the SIP module; wherein the SIP module comprises an anode having a first surface and an opposite second surface, wherein at least on cylindric opening extends from the first surface to the second surface, wherein the anode further comprises side surfaces extending from the first surface to the second surface, wherein the electrical lead is arranged at the side surface of the anode.
H01J 41/20 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter avec ionisation au moyen de cathodes froides en utilisant des getters
Magnetic assembly for a sputter ion pump, SIP, comprising a pole piece, at least one magnet connected to the pole piece by a magnetic force of the at least one magnet, at least one cathode element connected to the at least one magnet and at least one bracket element connected to the at least one magnet by the magnetic force of the at least one magnet, wherein the at least one bracket element fixes the position of the at least one cathode element.
A sensor for determining an absorption state of cryopanels within a cryopump. The sensor comprises: an absorbent material; a detector for measuring a property of the absorbent material, the property changing as matter is absorbed by the material; and a heating element for heating the absorbent material to release at least some of the absorbed matter. The absorbent material of the sensor is configured to be mounted thermally coupled to a second stage of the cryopump, such that during operation of the cryopump the absorbent material is within 5K of a temperature of the cryopanels of the cryopump.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
F04B 37/14 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour utilisation particulière pour obtenir un vide élevé
G01N 27/22 - Recherche ou analyse des matériaux par l'emploi de moyens électriques, électrochimiques ou magnétiques en recherchant l'impédance en recherchant la capacité
Method for regeneration of a cryopump system comprising at least two cryopumps connected to a common roughing pump. The method includes evacuating, by the roughing pump, one or more first cryopumps of the cryopump system for a first duration while maintaining the pressure in one or more second cryopumps of the cryopump system. The first duration is determined in dependence on the pressure measured in the one or more first cryopumps at the beginning of the evacuation of the one or more first cryopumps.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
F04B 37/14 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour utilisation particulière pour obtenir un vide élevé
F04B 49/08 - Régulation par la pression de refoulement
F04B 49/22 - Commande des "machines", pompes ou installations de pompage ou mesures de sécurité les concernant non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes par clapets
Displacer assembly for a cryo-cooler comprising: a displacer body to be movably arranged in a housing of a displacer, a rod to transfer a moment of a motor to the displacer body, wherein the rod is connected to the displacer body by a hinged connection.
F25B 9/14 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé caractérisés par le cycle utilisé, p. ex. cycle de Stirling
F02G 1/043 - Ensembles fonctionnels de moteurs à gaz chauds à déplacement positif du type à cycle fermé le moteur étant actionné par dilatation et compression d'une masse de gaz de travail chauffée et refroidie dans une ou plusieurs chambres continuellement communicantes expansibles, p. ex. moteurs du type à cycle de Stirling
Seal assembly (10) for a displacer of a cryo-cooler, comprising a first ring element (12) and at least one separate second ring element (14). Therein, each ring element (12, 14) comprise a first axial surface (20) and an opposite second axial surface (26), a central opening (28) to receive a displacer body (34) of the displacer, and a radial outer surface (24) to provide a seal surface in contact with a housing (32) of the displacer. The second axial surface (26) of the first ring element (12) is in direct contact with the first axial surface (20) of the second ring element (14).
F16J 9/06 - Segments de piston, leurs logementsSegments d'étanchéité de structure similaire en général utilisant des ressorts séparés pour dilater les segmentsRessorts à cet effet
F16J 9/16 - Obturation des fentes de segments par empilement des segments
F16J 15/28 - Joints d'étanchéité entre deux surfaces mobiles l'une par rapport à l'autre par presse-étoupes pour bagues d'étanchéité rigides les bagues d'étanchéité étant en métal
F25B 9/14 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé caractérisés par le cycle utilisé, p. ex. cycle de Stirling
F16J 9/28 - Segments de piston, leurs logementsSegments d'étanchéité de structure similaire en général caractérisés par l'emploi de matériaux particuliers de matériaux non métalliques
F16J 15/26 - Joints d'étanchéité entre deux surfaces mobiles l'une par rapport à l'autre par presse-étoupes pour bagues d'étanchéité rigides
11.
COMPOSITE MATERIAL FOR INSULATING ONE OR MORE COMPONENTS
There is provided a method (400) of manufacturing a composite material for insulating one or more components of a vacuum pump system, comprising: providing (410) a first material having an exterior surface, wherein the first material comprises an aerogel; and arranging (420) a second material on the exterior surface of the first material to enclose the first material, wherein the second material comprises a metal.
B32B 15/20 - Produits stratifiés composés essentiellement de métal comportant de l'aluminium ou du cuivre
B32B 3/04 - Caractérisés par des caractéristiques de forme en des endroits déterminés, p. ex. au voisinage des bords caractérisés par une couche pliée au bord, p. ex. par-dessus une autre couche
B32B 37/16 - Procédés ou dispositifs pour la stratification, p. ex. par polymérisation ou par liaison à l'aide d'ultrasons caractérisés par les propriétés des couches toutes les couches existant et présentant une cohésion avant la stratification
B32B 37/04 - Procédés ou dispositifs pour la stratification, p. ex. par polymérisation ou par liaison à l'aide d'ultrasons caractérisés par la fusion partielle d'au moins une couche
A sputter ion pump cathode (106) comprising: a sheet of material (200) having an aperture (202) therethrough; and a protrusion (204) extending along an axis (206) from an edge (208) of the aperture (202) inwards towards a central portion (210) of the aperture (202); wherein the protrusion (204) is twisted about the axis (206), for example, by approximate 90°.
H01J 41/20 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter avec ionisation au moyen de cathodes froides en utilisant des getters
H01J 41/16 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter avec ionisation au moyen de cathodes thermo-ioniques en utilisant des getters
Cryopump comprising one or more cryopanel structures (20) providing pumping surfaces for the pump. The cryopanel structures are cooled by a refrigerator (30) and there is at least one heating element formed of an electrically conductive track (44) that is mounted on a surface of at least one of the cryopanel structures. An electrically insulating coating is mounted between the cryopanel structures and the electrically conductive track.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
F04B 39/06 - RefroidissementChauffagePrévention du gel
The present invention provides a head unit for capping a combustion chamber of an abatement system The head unit comprises an outer face and inner face, which inner face, in use, provides an internal surface of the combustion chamber. A surface of the head unit defines at least one conduit configured to convey a fluid through the head unit during operation. The head unit is configured such that, during use, the head unit functions as a heat exchanger to transfer heat from the combustion chamber to the fluid within the conduit. The present invention also provides an abatement apparatus, and a method.
F23D 14/78 - Refroidissement des éléments du brûleur
B01D 53/00 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
A heat exchanger for a reagent stream, comprising: an inlet conduit configured to receive said reagent stream; an inlet manifold fluidly coupled with said inlet conduit; and a plurality of heat exchange chambers fluidly coupled with said inlet manifold, wherein said inlet manifold has a static impeller structure configured to separate said reagent stream into a plurality of separated reagent streams and to direct each of said plurality of separated reagent streams to a corresponding one of said plurality of heat exchange chambers.
F28F 7/02 - Blocs traversés par des passages pour sources de potentiel calorifique
B33Y 80/00 - Produits obtenus par fabrication additive
F28F 9/02 - Boîtes de distributionPlaques d'extrémité
F28F 13/12 - Dispositions pour modifier le transfert de chaleur, p. ex. accroissement, diminution en affectant le mode d'écoulement des sources de potentiel calorifique en créant une turbulence, p. ex. par brassage, par augmentation de la force de circulation
F28D 1/053 - Appareils échangeurs de chaleur comportant des ensembles de canalisations fixes pour une seule des sources de potentiel calorifique, les deux sources étant en contact chacune avec un côté de la paroi de la canalisation, dans lesquels l'autre source de potentiel calorifique est une grande masse de fluide, p. ex. radiateurs domestiques ou de moteur de voiture avec des canalisations d'échange de chaleur immergées dans la masse du fluide avec canalisations tubulaires les canalisations étant rectilignes
F28D 21/00 - Appareils échangeurs de chaleur non couverts par l'un des groupes
Embodiments relate to a cryopump system. The cryopump system comprises a cryochiller configured to cool refrigerant to a first cryogenic temperature for supply to a single-stage cryocooler of a cryopump. The cryopump system further comprises the cryopump which comprises the single-stage cryocooler configured to cool the refrigerant from the first cryogenic temperature to a second cryogenic temperature lower than the first cryogenic temperature. The single-stage cryocooler is configured to operate using a different refrigeration cycle to the cryochiller. The cryopump further comprises a cryogenic surface configured to be cooled by the single-stage cryocooler to the second cryogenic temperature for capturing gas.
F25B 9/02 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé utilisant l'effet Joule-ThompsonMachines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé utilisant l'effet vortex
F25B 9/10 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé avec plusieurs étages de refroidissement
F25B 9/14 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé caractérisés par le cycle utilisé, p. ex. cycle de Stirling
F25D 19/00 - Disposition ou montage des groupes frigorifiques dans les dispositifs
A sputter ion pump cathode (106) comprising: a first plate (201) of a first material; and a second plate (202) of a second material; wherein the first plate (201) is arranged facing and substantially parallel with the second plate (202); and the first material is a different material to the second material.
H01J 41/20 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter avec ionisation au moyen de cathodes froides en utilisant des getters
Embodiments relate to a cryopump comprising a vacuum vessel comprising an inlet for receiving gas. The cryopump further comprises a refrigeration unit comprising: a cold head extending into the vacuum vessel for cooling a cryopanel structure for condensing said gas; a displacer configured to move to cool a refrigerant for cooling said cold head; a motor for controlling movement of said displacer; and a component arranged to move with said displacer. The cryopump further comprises a sensor system comprising: a magnetic material forming at least a portion of said component or a ferromagnetic material forming at least a portion of said component and a permanent magnet component configured to magnetise said ferromagnetic material; and a magnetic sensor positioned to detect a strength of a magnetic field of said component indicative of a position of said component.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
F25B 9/14 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé caractérisés par le cycle utilisé, p. ex. cycle de Stirling
A device for converting between motion in one direction and motion in another direction is disclosed. The device comprises: a magnetic protrusion or patch mounted on a first movable element and comprising a surface; and a track with predefined magnetic properties mounted on a further movable element, said track defining a pathway towards which said magnetic protrusion or patch is attracted by magnetic forces, said magnetic forces constraining said movable elements to move such that said magnetic protrusion or patch travels in a direction along said magnetic track in response to relative movement between said first and further elements.
H02K 49/10 - Embrayages dynamo-électriquesFreins dynamo-électriques du type à aimant permanent
H02K 7/06 - Moyens de transformation d'un mouvement alternatif en un mouvement circulaire ou vice versa
H02K 7/12 - Association structurelle avec des embrayages, des freins, des engrenages, des poulies ou des démarreurs mécaniques avec un mouvement auxiliaire limité de parties statoriques, rotoriques ou de noyau, p. ex. des rotors pouvant se déplacer axialement pour assurer un embrayage ou un freinage
A refrigerant testing device and method for testing refrigerant diverted from a refrigeration system. The method comprises: diverting refrigerant from said refrigeration system to a container; changing a temperature of said refrigerant within said container; measuring a pressure and temperature of said refrigerant as said temperature changes; comparing said measured pressure and temperature values with reference values and where said comparing indicates a difference between said measured values and said stored reference values of more than a predetermined amount, generating a warning indication.
A controller, dilution and abatement system. The controller dynamically controlling an amount of a dilution gas to be added to an exhaust stream from a process tool. The controller comprises: an input for receiving a signal indicative of at least one of: a current or future amount of hazardous gas that the process tool exhausts; processing circuitry configured to determine an amount of dilution gas required to dilute the indicated amount of hazardous gas to a required level; output circuitry configured to output a control signal to dynamically control a flow rate of the dilution gas to be added to the exhaust stream to provide the required dilution level.
The present invention provides a head unit for arrangement at an inlet of a combustion chamber of an abatement apparatus The head unit defines an effluent flow conduit configured to direct an effluent gas flow through the head unit. A surface defining the inner face of the effluent flow conduit provides a first section of conduit for directing effluent flow in a first direction and second section of conduit for directing effluent flow in a second direction, and a smooth curved section of conduit between said first section and second section configured to transition the direction of flow of the effluent gas flow from said first direction to said second direction along the length of the smooth curved section.
F23D 14/20 - Brûleurs à gaz sans prémélangeur, c.-à-d. dans lesquels le combustible gazeux est mélangé à l'air de combustion à l'arrivée dans la zone de combustion
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
The present invention provides a head unit for arrangement at an inlet of a combustion chamber of an abatement apparatus, the head unit comprising: a head plate configured to cap a combustion chamber; an effluent flow conduit having an effluent flow contact surface for conveying an effluent flow towards a combustion chamber of an abatement apparatus; and an inject flow conduit having an inject flow contact surface for conveying an inject fluid towards the effluent flow; wherein the effluent flow contact surface and/or the inject flow contact surface is defined, preferably substantially entirely defined, by the head plate.
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
F23G 5/44 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets ou de combustibles pauvres Parties constitutivesAccessoires
The invention provides a head unit for capping a combustion chamber of an abatement system The head unit comprises an outer face and inner face, which inner face, in use, forms an internal surface of the combustion chamber. The head unit further defines a plurality of conduits, each conduit running from the outer face of the head unit t. Each conduit has an outer port at or adjacent said outer face and an inner port at or adjacent said inner face or on surface of an effluent flow conduit. When the head unit is viewed from above, a subset of the outer ports is located in a minor sector of said head unit and at least a portion of said subset of said outer ports have their respective inner port(s) outside of said minor sector of said head unit.
F23G 5/44 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets ou de combustibles pauvres Parties constitutivesAccessoires
F23G 7/06 - Procédés ou appareils, p. ex. incinérateurs, spécialement adaptés à la combustion de déchets particuliers ou de combustibles pauvres, p. ex. des produits chimiques de gaz d'évacuation ou de gaz nocifs, p. ex. de gaz d'échappement
F23R 3/00 - Chambres de combustion à combustion continue utilisant des combustibles liquides ou gazeux
The present invention provides a temperature regulation device for controlling the temperature of pipework. The device comprises a plurality of electrically connected positive temperature coefficient heating elements arranged in thermal contact with a substrate layer. The substrate layer has a thermal conductivity greater than about 150 Wm-1K-1 and being configured to thermally contact at least a portion of the pipework when in use. The device further comprises an electrical connector for connecting the positive temperature coefficient heating elements to a power source when in use.
H05B 1/02 - Dispositions de commutation automatique spécialement adaptées aux appareils de chauffage
H05B 3/34 - Éléments chauffants ayant une surface s'étendant essentiellement dans deux dimensions, p. ex. plaques chauffantes flexibles, p. ex. grillages ou tissus chauffants
Heat shield element for a non-evaporable getter (NEG) pump, comprising: a shielding element made from a sheet metal having a first end and an opposite second end, wherein the first end and the second end are connected by an upper edge and an opposite lower edge, wherein the shielding element comprises a plurality of openings, and connecting pins at the first end and/or the second end.
F04B 37/02 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation, par absorption ou adsorption
F16L 59/02 - Forme ou configuration de matériaux isolants, avec ou sans revêtement formant un tout avec les matériaux isolants
27.
ION TRAP AND METHOD FOR DETECTING IONS IN AN ION TRAP
A method and ion trap for detecting ions in the ion trap. The method comprises: Providing ionized ions to the ion trap; Creating an RF storage field by applying a RF storage signal to a first electrode of the ion trap, wherein the storage voltage VRF and/or the storage frequency ΩRF of the RF storage signal is modified; Applying an excitation signal to the ions in the ion trap; Detecting an image current signal induced to a second electrode, a third electrode or differentially between the second and third electrodes by oscillation of the ions excited by the excitation signal; and Applying an FFT to the detected image current signal to detect the ion oscillation while recovering the modified signal correctly.
A cryopump comprising: a vessel comprising a radiation shield having a frontal opening, said frontal opening forming an inlet to said vessel; a frontal array thermally coupled to said radiation shield and mounted across said frontal opening; a cryopanel structure mounted within said vessel; a two stage refrigerator extending into said vessel, a first stage of said refrigerator being thermally coupled to said radiation shield and a colder second stage of said refrigerator being thermally coupled to said cryopanel structure; wherein said vessel comprises an elongate vessel a distance between a surface of said cryopanel structure closest to said frontal opening and a surface of said frontal array closest to said cryopanel structure comprising between 0.6 and 1.2 times the diameter of said frontal opening.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
Aspects of the present disclosure relate to hydrogen recovery system (1) for extracting hydrogen from process gases. The hydrogen recovery system (1) may include an electrochemical pump (11) for extracting at least some of the hydrogen occurring in the process gases. The electrochemical pump (11) has an anodic compartment (13) having at least one anode (14), a cathodic compartment (15) having at least one cathode (16), and a membrane (17) disposed between the anodic compartment (13) and the cathodic compartment (15). A controller (59) is provided for controlling electric current supplied to the electrochemical pump (11). The anodic compartment (13) has an anodic compartment inlet (23) for introducing the process gases into the anodic compartment (13); and an anodic compartment outlet (25) for discharging a waste gas from the anodic compartment (13). The cathodic compartment (15) has a cathodic compartment outlet (27) for discharging hydrogen extracted from the process gases.
A sensor for detecting contamination of a cryogenic refrigerant in a cryogenic refrigeration system, a method and a refrigeration system are disclosed. The sensor comprises: an inlet for coupling to a cryogenic refrigerant flow path in the cryogenic refrigeration system and a thermal conductivity detector in fluid communication with the inlet. The thermal conductivity detector is configured to generate a signal indicative of a detected thermal conductivity of the cryogenic refrigerant received from the cryogenic refrigeration system when the sensor is coupled thereto. The sensor also comprises circuitry configured to convert the thermal conductivity signal to an indication of contamination of the cryogenic refrigerant; and an output configured to output the indication of contamination of the cryogenic refrigerant.
F25B 49/00 - Disposition ou montage des dispositifs de commande ou de sécurité
F25B 9/00 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé
F25B 41/20 - Disposition des soupapes, p. ex. de soupapes marche-arrêt ou de soupapes de régulation de débit
G01N 27/18 - Recherche ou analyse des matériaux par l'emploi de moyens électriques, électrochimiques ou magnétiques en recherchant l'impédance en recherchant la résistance d'un corps chauffé électriquement dépendant de variations de température produite par des variations de la conductivité thermique d'un matériau de l'espace environnant à tester
31.
IN LINE WATER SCRUBBER SYSTEM FOR SEMICONDUCTOR PROCESSING
A semiconductor processing system includes a vacuum pump having an inlet and an outlet, with the inlet of the vacuum pump configured to be in fluid communication with an outlet of a semiconductor reactor, and with the vacuum pump configured to output an exhaust of waste gases from the reactor at the outlet of the vacuum pump. The semiconductor processing system further includes a water scrubber system at the outlet of the vacuum pump, which has a vertical orientation relative to the pump and has an inlet and at least one mixing chamber. The inlet is in fluid communication with the outlet of the vacuum pump and the mixing chamber. The scrubber system is configured to maintain the temperature of exhaust at the output of the pump, while the exhaust is directed to the mixing chamber, and to inject water into the exhaust to remove water reactive products in the exhaust.
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
B01D 53/18 - Unités d'absorptionDistributeurs de liquides
Sputter ion pump, SIP, module comprising a frame structure, an anode connected to the frame structure, and a shell connected to the frame structure, wherein the shell surrounds at least partially the frame structure and the anode, wherein the shell comprises at least one magnet and at least one cathode element.
Vacuum pump comprising: a sputter ion pump, SIP, module, having a first end and a second end; a non-evaporable getter, NEG, module, connected to the second end of the SIP module; an electrical lead of the NEG module running from the first end to the second end of the SIP module; wherein the SIP module comprises an anode having a first surface and an opposite second surface, wherein at least on cylindric opening extends from the first surface to the second surface, wherein the anode further comprises side surfaces extending from the first surface to the second surface, wherein the electrical lead is arranged at the side surface of the anode.
H01J 41/20 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter avec ionisation au moyen de cathodes froides en utilisant des getters
Magnetic assembly for a sputter ion pump, SIP, comprising a pole piece, at least one magnet connected to the pole piece by a magnetic force of the at least one magnet, at least one cathode element connected to the at least one magnet and at least one bracket element connected to the at least one magnet by the magnetic force of the at least one magnet, wherein the at least one bracket element fixes the position of the at least one cathode element.
H01J 41/20 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter avec ionisation au moyen de cathodes froides en utilisant des getters
Connector, in particular for a vacuum application, comprising at least one connecting element, wherein the connecting element has a first end and an opposite second end, wherein a first end is connectable to a wire and the second end is built as terminal end; a first insulating element having a number of openings corresponding to the number of connecting elements; and a second insulating element having a number of openings corresponding to the number of connecting elements, wherein each connecting element extends through a respective opening of the first insulating element and the second insulating element; wherein the connecting element has a protruding feature having a diameter which is larger than diameter of the first end and the second end of the connecting element; wherein the openings of the first insulating element and the openings of the second insulating element have a diameter smaller than the diameter of the protruding feature; and wherein the protruding feature is located between the first insulating element and the second insulating element.
H01R 13/533 - Socles ou boîtiers conçus pour l'emploi dans des conditions extrêmes, p. ex. haute température, rayonnements, vibrations, environnement corrosif, pression
F04B 37/02 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation, par absorption ou adsorption
H01J 41/12 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter
H01R 13/631 - Moyens additionnels pour faciliter l'engagement ou la séparation des pièces de couplage, p. ex. moyens pour aligner ou guider, leviers, pression de gaz pour l'engagement uniquement
An ion pump and its method of assembly are described. The ion pump comprises: a pump housing enclosing a pumping chamber: one or more anodes a pair of cathode plates; and mounting means for supporting the cathode plates. The mounting means is configured to support the cathode plates in a predefined position within the pumping chamber. The mounting means comprises support means that define a straight path, the path having an open end such that the cathode plate can be slid through the open end along the path and into the predefined position.
Sputter ion pump, SIP, module for a vacuum pump, comprising a outer structure, an anode having an upper side and an opposite lower side, at least one support element at the upper side or the lower side of the anode to support the anode, wherein the anode is connected to the outer structure by the at least one support element, and a high voltage, HV, conductor extending through the outer structure and connected to the anode to support the anode.
A compact mecanum wheel module is disclosed. The mecanum wheel module comprises: a hub that is configured to house a motor. The hub comprises a circular planar portion and a cylindrical portion extending from the circular planar portion. The cylindrical portion forms a base of a rim of the wheel. A plurality of rollers are mounted on and around the base of the rim, the plurality of rollers each comprising a shaft and a rotatable body, the rotatable body being mounted to the shaft via needle bearings.
A multistage electrochemical hydrogen pump, comprising a first electrochemical hydrogen pumping stage fluidly connected to a second electrochemical hydrogen pumping stage. The first electrochemical pumping stage is configured to receive a first gas mixture comprising hydrogen gas, electrochemically separate hydrogen gas from the first gas mixture to produce a second gas mixture, and output the second gas mixture to the second electrochemical pumping stage. The second electrochemical hydrogen pumping stage is configured to receive the second gas mixture from the first electrochemical hydrogen pumping stage, electrochemically separate hydrogen gas from the second gas mixture to produce a third gas mixture, and output the third gas mixture.
B01D 53/32 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par effets électriques autres que ceux prévus au groupe
C25B 9/75 - Assemblages comprenant plusieurs cellules du type filtre-presse avec une électrode bipolaire
40.
Connecting and disconnecting a cooling loop from a refrigeration system
A control system for controlling the flow of refrigerant includes: an inlet valve configured to selectively isolate or couple a supply path for supplying refrigerant from a refrigeration system with an inlet of a cooling loop; an outlet valve configured to selectively isolate or couple a return path for returning refrigerant to the refrigeration system with an outlet of the cooling loop; a refrigerant collection valve configured to selectively isolate or couple a refrigerant collection path for collecting refrigerant for the refrigeration system with the cooling loop; a pressure sensor for determining a pressure of refrigerant in the cooling loop; an input for receiving cooling loop disconnect and connect commands; and control circuitry configured to receive signals from the pressure sensor and the commands from the input and to generate control signals for controlling the opening and closing of the inlet, outlet and refrigerant collection valves in response thereto.
Sputter ion pump comprising: an anode, wherein the anode comprises a radial symmetry and wherein the anode defines a plurality of hollow cylinders and is connected to a voltage supply, a cathode comprising a plurality of cathode elements arranged directly next to the anode and connected to ground.
Sputter ion pump comprising: an anode (14), wherein the anode comprises a radial symmetry and wherein the anode defines a plurality of hollow cylinders and is connected to a voltage supply, a cathode comprising a plurality of cathode elements (22, 22', 22") arranged directly next to the anode and connected to ground.
Sputter ion pump comprising: an anode, wherein the anode defines a plurality of hollow cylinders and is connected to a voltage supply, a cathode comprising a plurality of cathode elements arranged directly next to the anode and connected to ground, and magnets in direct contact with the cathode elements wherein by the magnets a magnetic circuit is generated perpendicular to the direction of extension of the anode.
H01J 41/18 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter avec ionisation au moyen de cathodes froides
A temperature sensing system (100) comprising a choke (150) formed from a material with one or more temperature-dependent electrical properties, and a controller (110) configured to: pass an electrical signal through the choke, measure one or more electrical parameters of the electrical signal, wherein the one or more electrical parameters vary with temperature as a result of the one or more temperature-dependent electrical properties of the material from which the choke is formed, and determine a temperature of the choke based on the measured one or more electrical parameters.
G01K 7/00 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur
G01K 7/38 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments magnétiques, p. ex. des aimants, des bobines les variations de température agissant sur la perméabilité magnétique
The present invention provides an exhaust gas abatement system for use in semiconductor processing. The system comprising a vacuum pump having an exhaust outlet, a water eductor coupled to the exhaust outlet of the vacuum pump, and a separator coupled to the water eductor. The system further comprises an exhaust gas abatement apparatus coupled to a gaseous exhaust outlet of the separator. Wherein the system is configured such that, in use, an exhaust flow from the exhaust outlet of the vacuum pump is conveyed to the separator via the water eductor, and wherein the separator is configured, in use, to separate a gaseous component of the exhaust flow from the non-gaseous component of the exhaust flow.
The present invention provides an exhaust gas abatement system for use in semiconductor processing. The system comprising a vacuum pump having an exhaust outlet, a water eductor coupled to the exhaust outlet of the vacuum pump, and a separator coupled to the water eductor. The system further comprises an exhaust gas abatement apparatus coupled to a gaseous exhaust outlet of the separator. Wherein the system is configured such that, in use, an exhaust flow from the exhaust outlet of the vacuum pump is conveyed to the separator via the water eductor, and wherein the separator is configured, in use, to separate a gaseous component of the exhaust flow from the non-gaseous component of the exhaust flow.
A method of monitoring the performance of a cryopump, the circuitry for monitoring the performance and the cryopump are disclosed. The method comprises: following completion of a regeneration cycle controlling said cryopump to perform a predetermined test routine for testing a performance of said cryopump under predetermined conditions; monitoring said cryopump during said predetermined test routine to collect data indicative of said performance of said cryopump; storing data collected during said monitoring.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
A flow restrictor for restricting a flow rate of gas flowing into a cryopump and the cryopump are disclosed. The flow restrictor is configured to be mounted in an inlet of the cryopump, the flow restrictor comprising: an inlet component for providing a gas flow path into the cryopump; a shielding plate mounted to at least partially obscure the gas flow path though the inlet component; and an intermediate component linking the shielding plate to the inlet component, the intermediate component comprising at least one aperture, the at least one aperture defining at least one gas flow path into the cryopump The shielding plate is configured to shield the gas flow path through the inlet component such that when mounted on the cryopump there is no direct line of sight path through the inlet component to a cryopanel within the cryopump.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
F04B 39/00 - Parties constitutives, détails ou accessoires de pompes ou de systèmes de pompage spécialement adaptés aux fluides compressibles, non prévus dans les groupes ou présentant un intérêt autre que celui visé par ces groupes
A device for converting between motion in one direction and motion in another direction is disclosed. The device comprises: a magnetic protrusion or patch mounted on a first movable element and comprising a surface; and a track with predefined magnetic properties mounted on a further movable element, said track defining a pathway towards which said magnetic protrusion or patch is attracted by magnetic forces, said magnetic forces constraining said movable elements to move such that said magnetic protrusion or patch travels in a direction along said magnetic track in response to relative movement between said first and further elements.
A refrigerant testing device and method for testing refrigerant diverted from a refrigeration system. The method comprises: diverting refrigerant from said refrigeration system to a container; changing a temperature of said refrigerant within said container; measuring a pressure and temperature of said refrigerant as said temperature changes; comparing said measured pressure and temperature values with reference values and where said comparing indicates a difference between said measured values and said stored reference values of more than a predetermined amount, generating a warning indication.
A cryopump comprising: a pump inlet, a two stage refrigerator; a first stage array thermally coupled to a first stage of said two stage refrigerator; and a cryopanel structure coupled to a second stage of said two stage refrigerator is disclosed. The cryopanel structure comprises at least three flat panels. The first stage array is mounted between the pump inlet and the cryopanel structure, and comprises a plurality of slats, the plurality of slats each being mounted such that a side of each of the plurality of slats closest to the cryopanel structure is substantially aligned and offset longitudinally with respect to a corresponding one of said at least three flat panels.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
A cryopump with a pump inlet; a two stage refrigerator; a first stage array arranged thermally coupled to a first stage of the two stage refrigerator; and a cryopanel structure coupled to a second stage of the two stage refrigerator. Surfaces of the cryopanel structure have portions that are coated portion with an adsorbent material and other portions that are not coated with the adsorbent material.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
A vacuum apparatus temperature sensor assembly for measuring the temperature of a vacuum apparatus and a method are disclosed. The vacuum apparatus temperature sensor assembly comprises: a sheet substrate configured to conform to a shape of an item, equipment or apparatus whose temperature is to be determined; and a temperature sensor thermally coupled with the sheet substrate, wherein the sheet substrate is configured to provide a thermal path from the apparatus to the temperature sensor. In this way, the substrate provides a larger area than that of the temperature sensor to couple with the apparatus which enables the average temperature of the apparatus to be more reliably and accurately conveyed to the temperature sensor and make the temperature measurements less reliant on the exact placing of the temperature sensor with respect to the apparatus.
G01K 1/16 - Dispositions particulières pour conduire la chaleur de l'objet à l'élément sensible
G01K 1/143 - SupportsDispositifs de fixationDispositions pour le montage de thermomètres en des endroits particuliers pour la mesure de la température de surfaces
54.
TRANSPORT DEVICE AND METHOD OF MOVING VACUUM SYSTEM COMPONENTS IN A CONFINED SPACE
A transport device includes rollable elements configured to both support and move the transport device on a surface; and a drive mechanism for driving the rollable elements. A load bearing mechanism is movable between a lowered position adjacent to the surface and at least one raised position, and is supported by a support frame having a front wall, two side walls and an open back. The load bearing mechanism is mounted such that the side walls and front wall of the support frame extend around the load bearing mechanism. An actuator is mounted on one of the walls of the support frame for controllably raising and lowering the load bearing mechanism and the rollable elements are mounted adjacent to the side walls of the support frame and support the two side walls at four locations, such that a center of gravity is between the four locations.
B66F 9/12 - Plates-formesFourchesAutres organes soutenant ou saisissant la charge
B66F 9/075 - Caractéristiques de construction ou détails
B66F 9/20 - Moyens pour actionner ou commander des mâts, des plates-formes ou des fourches
B66F 9/06 - Dispositifs pour lever ou descendre des marchandises volumineuses ou lourdes aux fins de chargement ou de déchargement se déplaçant, avec leurs charges, sur des roues ou sur un dispositif analogue, p. ex. chariots élévateurs à fourche
A cryopump comprising: a vessel (10) comprising a radiation shield (12) having a frontal opening (22), said frontal opening (22) forming an inlet to said vessel (10); a frontal array (20) thermally coupled to said radiation shield (12) and mounted across said frontal opening (22); a cryopanel structure (30) mounted within said vessel (10); a two stage refrigerator extending into said vessel (10), a first stage of said refrigerator being thermally coupled to said radiation shield (12) and a colder second stage of said refrigerator being thermally coupled to said cryopanel structure (30); wherein said vessel (10) comprises an elongate vessel a distance (40) between a surface of said cryopanel structure (30) closest to said frontal opening (22) and a surface of said frontal array (20) closest to said cryopanel structure (30) comprising between 0.6 and 1.2 times the diameter of said frontal opening (22).
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
56.
ION TRAP AND METHOD FOR DETECTING IONS IN AN ION TRAP
ΩRFRF RF of the RF storage signal is modified; Applying an excitation signal to the ions in the ion trap; Detecting an image current signal induced to a second electrode, a third electrode or differentially between the second and third electrodes by oscillation of the ions excited by the excitation signal; and Applying an FFT to the detected image current signal to detect the ion oscillation while recovering the modified signal correctly.
HYDROGEN RECOVERY SYSTEM AND METHOD Aspects of the present invention relate to hydrogen recovery system (1) for extracting hydrogen from process gases. The hydrogen recovery system (1) may include an electrochemical pump (11) for extracting at least some of the hydrogen occurring in the process gases. The electrochemical pump (11) has an anodic compartment (13) having at least one anode (14), a cathodic compartment (15) having at least one cathode (16), and a membrane (17) disposed between the anodic compartment (13) and the cathodic compartment (15). A controller (59) is provided for controlling the electric current supplied to the electrochemical pump (11). The anodic compartment (13) has an anodic compartment inlet (23) for introducing the process gases into the anodic compartment (13); and an anodic compartment outlet (25) for discharging a waste gas from the anodic compartment (13). The cathodic compartment (15) has a cathodic compartment outlet (27) for discharging hydrogen extracted from the process gases.
B01D 53/32 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par effets électriques autres que ceux prévus au groupe
C25B 15/02 - Commande ou régulation des opérations
A liquid filter apparatus for gas/solid separation includes a housing with a filter chamber, a semiconductor process gas inlet, and a process gas outlet. The filter chamber forms a liquid reservoir, and the semiconductor process gas inlet and the process gas outlet are in communication with the filter chamber. The housing further includes a filter liquid inlet and a filter liquid outlet, which are in communication with the liquid reservoir for delivering and removing filter fluid, respectively, to and from the liquid reservoir.
B01D 47/02 - Séparation de particules dispersées dans l'air, des gaz ou des vapeurs en utilisant un liquide comme agent de séparation par passage de l'air, du gaz ou de la vapeur sur ou à travers un bain liquide
A liquid filter apparatus for gas/solid separation includes a housing with a filter chamber, a semiconductor process gas inlet, and a process gas outlet. The filter chamber forms a liquid reservoir, and the semiconductor process gas inlet and the process gas outlet are in communication with the filter chamber. The housing further includes a filter liquid inlet and a filter liquid outlet, which are in communication with the liquid reservoir for delivering and removing filter fluid, respectively, to and from the liquid reservoir.
B01D 45/02 - Séparation de particules dispersées dans des gaz ou des vapeurs par gravité, inertie ou force centrifuge par gravité
B01D 47/02 - Séparation de particules dispersées dans l'air, des gaz ou des vapeurs en utilisant un liquide comme agent de séparation par passage de l'air, du gaz ou de la vapeur sur ou à travers un bain liquide
B01D 50/40 - Combinaisons de dispositifs couverts par les groupes et
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
60.
DETECTING CONTAMINATION OF A CRYOGENIC REFRIGERANT IN A CRYOGENIC REFRIGERATION SYSTEM
A sensor for detecting contamination of a cryogenic refrigerant in a cryogenic refrigeration system, a method and a refrigeration system are disclosed. The sensor comprises: an inlet (10) for coupling to a cryogenic refrigerant flow path in the cryogenic refrigeration system and a thermal conductivity detector (5) in fluid communication with the inlet. The thermal conductivity detector (5) is configured to generate a signal indicative of a detected thermal conductivity of the cryogenic refrigerant received from the cryogenic refrigeration system when the sensor is coupled thereto. The sensor also comprises circuitry configured to convert the thermal conductivity signal to an indication of contamination of the cryogenic refrigerant; and an output configured to output the indication of contamination of the cryogenic refrigerant.
F25B 9/00 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé
G01N 27/18 - Recherche ou analyse des matériaux par l'emploi de moyens électriques, électrochimiques ou magnétiques en recherchant l'impédance en recherchant la résistance d'un corps chauffé électriquement dépendant de variations de température produite par des variations de la conductivité thermique d'un matériau de l'espace environnant à tester
Pump module for a vacuum apparatus with a flange which can be connected to a vacuum apparatus in a vacuum-tight manner, at least one ion getter pump and at least one volume getter pump, NEG, where the ion getter pump is directly connected to the flange and the NEG is directly connected to the ion getter pump and where the NEG and the flange are arranged separately from each other.
F04B 37/02 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation, par absorption ou adsorption
F04B 37/14 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour utilisation particulière pour obtenir un vide élevé
F04B 39/12 - Carcasses d'enveloppeCylindresCulassesConnexions des tubulures pour fluide
F04B 39/14 - Dispositions permettant un montage ou démontage commodes
62.
Pressure regulated semiconductor wafer cooling apparatus and method and a pressure regulating apparatus
A semiconductor wafer cooling system and method and a pressure regulating apparatus for mitigating pressure increases in a semiconductor wafer conditioning circuit are disclosed. The pressure regulating apparatus comprises: a buffer vessel, the buffer vessel comprising an inlet and outlet channel; wherein the inlet channel is configured in operation to be in fluid communication with a higher pressure location of the semiconductor wafer conditioning circuit, and the outlet channel is configured in operation to be in fluid communication with a lower pressure location. the inlet channel comprises a pressure controlled valve configured to close the inlet channel during normal operation such that the buffer vessel is isolated from the higher pressure location of the conditioning circuit and to open the inlet channel in response to the pressure within the semiconductor conditioning circuit rising above a predetermined level.
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
H01L 21/687 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le maintien ou la préhension en utilisant des moyens mécaniques, p. ex. mandrins, pièces de serrage, pinces
Flange for a vacuum apparatus comprises a housing to be connected to the vacuum apparatus defining an opening wherein the opening has rectangular narrow shape. The flange further comprises a metal seal arranged around the opening to create a vacuum tight seal.
F04B 39/12 - Carcasses d'enveloppeCylindresCulassesConnexions des tubulures pour fluide
F04B 37/14 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour utilisation particulière pour obtenir un vide élevé
A vacuum pump comprises an inlet flange for connecting to a vacuum chamber, where the inlet flange comprises a plurality of apertures for receiving a plurality of protruding fixing elements extending from the vacuum chamber. The protruding fixing elements comprise an enlarged retaining portion at an end remote from the vacuum chamber and a fastener receiving portion having at least one radial dimension that is smaller than a corresponding dimension of the enlarged retaining portion. A fastening mechanism is provided that comprises a plurality of slots each extending from a same side of a plurality of apertures. The fastening mechanism is configured to be rotatable between a mounting position in which the apertures are aligned with the protruding fixing elements and a sealing position in which the slots are aligned with the protruding fixing elements.
F16L 23/028 - Raccords à brides les brides étant raccordées par des organes tendus axialement caractérisés par la façon dont les brides sont fixées ou forment une extension aux tuyaux les brides étant maintenues derrière un épaulement
F04D 19/04 - Pompes multiétagées spécialement adaptées pour réaliser un vide poussé, p. ex. pompes moléculaires
F04D 29/64 - MontageAssemblageDémontage des pompes axiales
F16L 23/024 - Raccords à brides les brides étant raccordées par des organes tendus axialement caractérisés par la façon dont les brides sont fixées ou forment une extension aux tuyaux
F16L 23/036 - Raccords à brides les brides étant raccordées par des organes tendus axialement caractérisés par les moyens de mise en tension, p. ex. colliers de serrage en forme de C ou boulons spécialement adaptés
F16L 23/16 - Raccords à brides caractérisés par les moyens d'étanchéité
65.
Vacuum module and vacuum apparatus and method for regeneration of a volume getter vacuum pump
Method for the regeneration of a volume getter pump in a vacuum apparatus with a volume getter pump and an ion getter pump where the operating voltage of the ion getter pump is reduced, the current through the ion getter pump is recorded for determination of the pressure in the vacuum apparatus and then a heating element of the NEG is controlled as a function of the current of the ion getter pump for the purpose of heating the NEG material.
H01J 41/20 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter avec ionisation au moyen de cathodes froides en utilisant des getters
H01J 41/06 - Tubes à décharge et moyens structurellement associés pour la mesure de la pression de gaz avec ionisation au moyen de cathodes froides
A flanged vacuum pump, a vacuum system and a method of mounting a vacuum pump to a vacuum chamber are disclosed. The vacuum pump comprises an inlet flange for connecting to a vacuum chamber, the inlet flange comprises a plurality of apertures for receiving a plurality of protruding fixing elements extending from the vacuum chamber. The protruding fixing elements comprise an enlarged retaining portion at an end remote from the vacuum chamber and a fastener receiving portion having at least one radial dimension that is smaller than a corresponding dimension of the enlarged retaining portion. A fastening mechanism is provided that comprises a plurality of slots each extending from a same side of a plurality of apertures. The fastening mechanism is configured to be rotatable between a mounting position in which the apertures are aligned with the protruding fixing elements and a sealing position in which the slots are aligned with the protruding fixing elements, at least one surface of the fastening mechanism comprises a low friction coating such as amorphous carbon.
F04D 19/04 - Pompes multiétagées spécialement adaptées pour réaliser un vide poussé, p. ex. pompes moléculaires
F04B 37/14 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour utilisation particulière pour obtenir un vide élevé
F04B 39/14 - Dispositions permettant un montage ou démontage commodes
F04C 25/02 - Adaptations de pompes pour utilisation spéciale pour les fluides compressibles pour produire un vide élevé
Housing for a vacuum pump, in particular a NEG or IGP-NEG combination, comprising a body defining an interior space to accommodate the vacuum pump, wherein a first flange is connected to the housing comprising an opening to connect the vacuum pump to a vessel and a second flange connected to the housing to connect the housing to an additional vacuum pump at least during regeneration. Further, a movable shield element is used movable from a first position to a second position, wherein in the first position the opening of the first flange is unobstructed and in the second position the opening is blocked.
F04B 37/14 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour utilisation particulière pour obtenir un vide élevé
F04B 37/02 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation, par absorption ou adsorption
F04B 39/12 - Carcasses d'enveloppeCylindresCulassesConnexions des tubulures pour fluide
F04B 53/16 - Carcasses d'enveloppeCylindresChemises de cylindre ou culassesConnexions des tubulures pour fluide
68.
IN LINE WATER SCRUBBER SYSTEM FOR SEMICONDUCTOR PROCESSING
A semiconductor processing system includes a vacuum pump having an inlet and an outlet, with the inlet of the vacuum pump configured to be in fluid communication with an outlet of a semiconductor reactor, and with the vacuum pump configured to output an exhaust of waste gases from the reactor at the outlet of the vacuum pump. The semiconductor processing system further includes a water scrubber system at the outlet of the vacuum pump, which has a vertical orientation relative to the pump and has an inlet and at least one mixing chamber. The inlet is in fluid communication with the outlet of the vacuum pump and the mixing chamber. The scrubber system is configured to maintain the temperature of exhaust at the output of the pump, while the exhaust is directed to the mixing chamber, and to inject water into the exhaust to remove water reactive products in the exhaust.
B01D 53/14 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par absorption
B01D 53/18 - Unités d'absorptionDistributeurs de liquides
There is provided a method of detecting the temperature of a component of a support system for semiconductor processing equipment, the method comprising: applying a radio frequency identity tag to the component, the radio frequency identity tag having a serial number; reading the radio frequency identity tag with a reader, the reader arranged to read the serial number of the radio frequency identity tag, and to identify the resonant frequency of the radio frequency identity tag; and converting the resonant frequency of the radio frequency tag to a temperature of the radio frequency identity tag.
G01K 7/32 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant la variation de la fréquence de résonance d'un cristal
G01K 1/024 - Moyens d’indication ou d’enregistrement spécialement adaptés aux thermomètres pour l’indication à distance
G06K 7/10 - Méthodes ou dispositions pour la lecture de supports d'enregistrement par radiation électromagnétique, p. ex. lecture optiqueMéthodes ou dispositions pour la lecture de supports d'enregistrement par radiation corpusculaire
G06K 19/07 - Supports d'enregistrement avec des marques conductrices, des circuits imprimés ou des éléments de circuit à semi-conducteurs, p. ex. cartes d'identité ou cartes de crédit avec des puces à circuit intégré
G06K 19/077 - Détails de structure, p. ex. montage de circuits dans le support
A temperature control apparatus for supplying fluid to control a temperature of at least one semiconductor wafer within a semiconductor processing chamber, the temperature control apparatus comprising: a mixed refrigerant refrigeration system; the temperature control apparatus being configured to supply the mixed refrigerant to at least one conditioning circuit within the semiconductor processing chamber and to receive the mixed refrigerant from the at least one conditioning circuit. The temperature control apparatus comprises a temperature control circuitry for controlling a temperature of the at least one conditioning circuit to one of a plurality of predetermined temperatures, at least one of the temperatures being below −100° C., the temperature control circuitry being configured to control the temperature of the at least one conditioning circuit by controlling at least one of a mass flow rate, composition or temperature of the mixed refrigerant supplied to the at least one conditioning circuit.
F25B 49/02 - Disposition ou montage des dispositifs de commande ou de sécurité pour machines, installations ou systèmes du type à compression
F25B 9/00 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé
F25B 41/20 - Disposition des soupapes, p. ex. de soupapes marche-arrêt ou de soupapes de régulation de débit
A cryopump comprising: a vessel comprising a frontal open area, the frontal open area comprising an inlet to the vessel; a radiation shield; a two stage refrigerator extending into the vessel, a first stage of the refrigerator being thermally coupled to the radiation shield. A first stage array is arranged within the vessel and is also thermally coupled to the first stage of the refrigerator. A cryopanel structure is coupled to a second stage of the refrigerator. The first stage array comprises a plurality of elements arranged at increasing distances from the inlet, the element closest to the inlet being between the cryopanel structure and the inlet and elements further from the inlet having a passage through a central portion. The element closest to the inlet has a smaller outer perimeter than the elements further from the inlet.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
F04B 25/00 - Pompes multiétagées spécialement adaptées aux fluides compressibles
Method and ion trap for detecting ions, wherein the method comprises the steps of Ionizing ions in the ion trap; Creating an RF storage field by applying a first RF signal to a first electrode of the ion trap; Applying an excitation signal to the ions in the ion trap; Detecting an image current signal induced to a second electrode, a third electrode or differentially between the second and third electrodes by oscillation of the ions excited by the excitation signal. Therein, the excitation signal is a parametric excitation.
A compact mecanum wheel module is disclosed. The mecanum wheel module comprises: a hub that is configured to house a motor. The hub comprises a circular planar portion and a cylindrical portion extending from the circular planar portion. The cylindrical portion forms a base of a rim of the wheel. A plurality of rollers are mounted on and around the base of the rim, the plurality of rollers each comprising a shaft and a rotatable body, the rotatable body being mounted to the shaft via needle bearings.
09 - Appareils et instruments scientifiques et électriques
37 - Services de construction; extraction minière; installation et réparation
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
41 - Éducation, divertissements, activités sportives et culturelles
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Pumps; vacuum pumps; capture vacuum pumps; gas capture pump, gas entrapment pumps; ion pumps; getter pumps; ion getter pumps, sputter ion pumps; non-evaporable getter (NEG) pumps; titanium sublimation pumps; metal discs and stacks thereof for pumps, solid or coated metal discs and stacks thereof for pumps, discs of zirconium, iron and vanadium and stacks thereof for pumps, discs coated with zirconium, iron and vanadium and stacks thereof for pumps; pump controllers, vacuum pump controllers, ion pump controllers, getter pump controllers, NEG pump controllers, titanium sublimation pump controllers; parts and fittings for all the aforesaid goods. Electric control devices for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Power controllers for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Electric and electronic controllers for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; instruments and apparatus for use in testing, control, detection, monitoring and the analysis of materials during operation of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Displays for control devices and controllers for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; gauges; pressure gauges; ionisation gauges; vacuum gauges; magnetron gauges, cold cathode gauges; transducers; Temperature measuring sensors, thermocouples, resistive temperature measuring devices; magnets, rare earth magnets, ceramic magnets, ferrite magnets; cathodes, titanium cathodes, solid titanium cathodes, solid titanium/tantalum cathodes, slotted titanium cathodes; anodes; instruments and apparatus for measurement of temperature, pressure, current, voltage as part of controllers for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; electrical power supplies, cables, high voltage cables, low voltage cables, high current cables, connectors therefor; splitter boxes; pole pieces and magnetic shielding therefor; baffles, shields, line-of-sight shields, particle-rebound shields, sputter shields being parts of ion pumps, titanium sublimation pumps and non-evaporable-getter pumps; glow discharge screens; cryoshrouds being parts of ion pumps, titanium sublimation pumps and nonevaporable-getter pumps; ambient shrouds being parts of ion pumps, titanium sublimation pumps and nonevaporable-getter pumps; filaments; parts and fittings for all the aforesaid goods, replacement parts for all the aforesaid goods; all the aforesaid goods for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; computer software for monitoring status, operation, function, environment, failures and errors of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; computer software for updating firmware for monitoring status, operation, function, environment, failures and errors of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; computer software for recording and display of data relating to status, operation, function, environment, failures and/or errors of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; computer software for the configuration of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, and controllers therefor. Repair, servicing and maintenance of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, controls, controllers, displays and parts and fittings therefor; refurbishment of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, controls, controllers, displays and parts and fittings therefor; consultancy services relating to assembly, installation, operation, application and maintenance of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, controls, controllers, displays and parts and fittings therefor. Custom manufacture and assembly of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, controls, controllers, displays and parts and fittings therefor; Customisation and adaptation of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, controls, controllers, displays and parts and fittings therefor. Training courses, workshops and seminars in the field of vacuum and vacuum pump technology, industrial training courses, workshops and seminars in the field of vacuum and vacuum pump technology, practical training courses, workshops and seminars in the field of vacuum and vacuum pump technology; Sales personnel training services in the field of vacuum and vacuum pump technology; Engineering and repair training services in the field of vacuum and vacuum pump technology; Providing education, consultancy, training, instruction, workshops and seminars in the field of vacuum technology. Design of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Design of controls, controllers and visual displays for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Testing of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Testing of controls, controllers and visual displays for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps.
75.
CONNECTING AND DISCONNECTING A COOLING LOOP FROM A REFRIGERATION SYSTEM
A control system for controlling the flow of refrigerant between a refrigeration system and a cooling loop within a semiconductor processing chamber such that leakage of refrigerant is inhibited when connecting or disconnecting the refrigeration system from the cooling loop, is disclosed. The control system comprises: an inlet valve configured to selectively isolate or couple a supply path for supplying refrigerant from the refrigeration system with an inlet of the cooling loop; an outlet valve configured to selectively isolate or couple a return path for returning refrigerant to the refrigeration system with an outlet of the cooling loop; a refrigerant collection valve configured to selectively isolate or couple a refrigerant collection path for collecting refrigerant for the refrigeration system with the cooling loop; a pressure sensor for determining a pressure of refrigerant in the cooling loop; an input for receiving cooling loop disconnect and connect commands; and control circuitry configured to receive signals from the pressure sensor and the commands from the input and to generate control signals for controlling the opening and closing of the inlet, outlet and refrigerant collection valves in response thereto.
An ion pump controller configured to alternate between increasing and decreasing a potential difference between an anode and a cathode of an ion pump multiple times during the starting of pumping.
H01J 41/12 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter
F04B 37/02 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation, par absorption ou adsorption
H01J 17/22 - Moyens pour produire ou conserver la pression désirée à l'intérieur du tube
H01J 17/24 - Moyens d'absorption ou d'adsorption du gaz, p. ex. à l'aide d'un getter
77.
Vacuum system with diagnostic circuitry and a method and computer program for monitoring the health of such a vacuum system
A vacuum system includes at least one cryopump; sensors associated with the cryopump, each of the sensors being configured to sense an operating condition of the cryopump; and diagnostic circuitry configured to receive signals sampled from the sensors. The diagnostic circuitry includes a diagnostic model of the cryopump, the diagnostic model being derived from historical data of a plurality of cryopumps of a same type operating over a plurality of regeneration and servicing time periods and being configured to relate values of the sampled signals from the at least some sensors to a probability of the pump failing within a predetermined time. The diagnostic circuitry is configured to apply the sampled signals to the diagnostic model and to determine the probability of the at least one cryopump failing within a predetermined time from an output of the model.
A47L 9/28 - Montage de l'équipement électrique, p. ex. adaptation ou fixation à l'aspirateurCommande des aspirateurs par des moyens électriques
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
A multistage electrochemical hydrogen pump, comprising a first electrochemical hydrogen pumping stage fluidly connected to a second electrochemical hydrogen pumping stage. The first electrochemical pumping stage is configured to receive a first gas mixture comprising hydrogen gas, electrochemically separate hydrogen gas from the first gas mixture to produce a second gas mixture, and output the second gas mixture to the second electrochemical pumping stage. The second electrochemical hydrogen pumping stage is configured to receive the second gas mixture from the first electrochemical hydrogen pumping stage, electrochemically separate hydrogen gas from the second gas mixture to produce a third gas mixture, and output the third gas mixture.
B01D 53/32 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par effets électriques autres que ceux prévus au groupe
C25B 9/70 - Assemblages comprenant plusieurs cellules
C25B 9/75 - Assemblages comprenant plusieurs cellules du type filtre-presse avec une électrode bipolaire
C25B 9/77 - Assemblages comprenant plusieurs cellules du type filtre-presse avec diaphragmes
79.
MULTIPLE VACUUM CHAMBER EXHAUST SYSTEM AND METHOD OF EVACUATING MULTIPLE CHAMBERS
A vacuum exhaust system and method of evacuating a plurality of chambers is disclosed. The vacuum exhaust system is within a clean room and comprises: a plurality of branch process gas channels each configured to connect to a corresponding chamber and a shared process channel formed from a confluence of the branch channels and configured to provide a shared fluid communication path for process gas from each of the chambers to flow from the clean room to a process channel outside of the clean room. There is also a plurality of branch pumpdown channels each configured to connect to a corresponding chamber and a shared pumpdown channel formed from a confluence of the branch pumpdown channels and configured to provide a fluid communication path for fluid to flow from the clean room to a pumpdown channel outside of the clean room during pumpdown of at least one of the vacuum chambers.
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
F04D 19/04 - Pompes multiétagées spécialement adaptées pour réaliser un vide poussé, p. ex. pompes moléculaires
80.
VERY LOW TEMPERATURE REFRIGERATION SYSTEM WITH FAST OPERATION CYCLE
Methods for shortening the cycle time in each of the defrost, standby and cool modes of operation of a very low temperature refrigeration system. These methods can be used alone or in combination with one or more of each of the other techniques, including, for example, in a single very low temperature refrigeration system, to provide a fast total cycle of one, two or all three of the defrost, standby and cool modes.
F25B 9/00 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé
A pump mounting frame comprising a latching device for releasably mounting a pump apparatus. The latching device has a body portion having a latch aperture for receiving a latch pin; and a latching member for releasably retaining the latch pin in the latch aperture. The latching member is movable between a closed position and an open position. The latching member has a first arm for retaining the latch pin in the latch aperture when the latching member is in the closed position. The latching member has a second arm for biasing the latch pin out of the latch aperture when the latching member is displaced from the closed position to the open position. The present disclosure also relates to a method of moving one or more pumps using the pump mounting frame.
B66C 1/62 - Éléments ou dispositifs de prise de la charge adjoints aux mécanismes de levage, de descente ou de halage, ou adaptés pour être utilisés avec ces mécanismes et transmettant les efforts à des articles ou à des groupes d'articles par moyens mécaniques comportant des organes de saisie ayant une forme complémentaire de celle des objets à manipuler
F16M 11/04 - Moyens pour la fixation des appareilsMoyens permettant le réglage des appareils par rapport au banc
A method of monitoring the performance of a cryopump (5), the circuitry (14) for monitoring the performance and the cryopump (5) are disclosed. The method comprises: following completion of a regeneration cycle controlling said cryopump (5) to perform a predetermined test routine for testing a performance of said cryopump under predetermined conditions; monitoring said cryopump during said predetermined test routine to collect data indicative of said performance of said cryopump (5); storing data collected during said monitoring.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
F04B 51/00 - Tests des "machines", pompes ou installations de pompage
A flow restrictor for restricting a flow rate of gas flowing into a cryopump and the cryopump are disclosed. The flow restrictor is configured to be mounted in an inlet of the cryopump, the flow restrictor comprising: an inlet component for providing a gas flow path into the cryopump; a shielding plate mounted to at least partially obscure the gas flow path though the inlet component; and an intermediate component linking the shielding plate to the inlet component, the intermediate component comprising at least one aperture, the at least one aperture defining at least one gas flow path into the cryopump The shielding plate is configured to shield the gas flow path through the inlet component such that when mounted on the cryopump there is no direct line of sight path through the inlet component to a cryopanel within the cryopump.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
F04B 37/14 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour utilisation particulière pour obtenir un vide élevé
A semiconductor waste abatement system for a semiconductor processing system includes a vacuum pump, an abatement apparatus having an abatement chamber in fluid communication with a source of semiconductor waste gas from the semiconductor processing chamber, and with the abatement chamber configured to ionize the waste gas and to exhaust ionized gas. The abatement system further includes a filter apparatus with a filter chamber, which forms a liquid reservoir. The inlet of the filter apparatus is in fluid communication with the outlet of the abatement chamber and the liquid reservoir, and the outlet of the filter apparatus is in communication with the inlet of the vacuum pump, wherein the filter chamber is under a vacuum, and wherein semiconductor waste gas is ionized in the abatement chamber and then filtered by the filter apparatus prior to input to the vacuum pump.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
B01D 47/02 - Séparation de particules dispersées dans l'air, des gaz ou des vapeurs en utilisant un liquide comme agent de séparation par passage de l'air, du gaz ou de la vapeur sur ou à travers un bain liquide
B01D 50/00 - Combinaisons de procédés ou de dispositifs pour la séparation de particules de gaz ou de vapeurs
B01D 53/00 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols
B01D 53/32 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols par effets électriques autres que ceux prévus au groupe
B08B 9/032 - Nettoyage des surfaces intérieuresÉlimination des bouchons par l'action mécanique d'un fluide en mouvement, p. ex. par effet de chasse d'eau
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
H05H 1/46 - Production du plasma utilisant des champs électromagnétiques appliqués, p. ex. de l'énergie à haute fréquence ou sous forme de micro-ondes
A Gifford-McMahon cryogenic refrigerator comprises a reciprocating displacer within a refrigeration volume. The displacer is pneumatically driven by a drive piston within a pneumatic drive volume. Pressure in the pneumatic drive volume is controlled by valving that causes the drive piston to follow a programmed displacement profile through stroke of the drive piston. The drive valving may include a proportional valve that provides continuously variable supply and exhaust of drive fluid. In a proportionally controlled feedback system, the valve into the drive volume is controlled to minimize error between a displacement signal and a programmed displacement profile. Valving to the warm end of the refrigeration volume may also be proportional. A passive force generator such as a mechanical spring or magnets may apply force to the piston in opposition to the driving force applied by the drive fluid.
F25B 49/02 - Disposition ou montage des dispositifs de commande ou de sécurité pour machines, installations ou systèmes du type à compression
F25B 9/14 - Machines, installations ou systèmes à compression dans lesquels le fluide frigorigène est l'air ou un autre gaz à point d'ébullition peu élevé caractérisés par le cycle utilisé, p. ex. cycle de Stirling
F25B 41/20 - Disposition des soupapes, p. ex. de soupapes marche-arrêt ou de soupapes de régulation de débit
A refrigerant blend is disclosed for use in refrigeration apparatus, in particular ultra-low temperature refrigeration apparatus. The blend comprises: 10 wt% to 55 wt% of a first composition comprising at least one fluoroolefin having a normal boiling point or bubble point in the range -5 ºC to 40 ºC; 1 wt% to 40 wt% of a second composition comprising at least one refrigerant having a boiling point or bubble point in the range - 60 ºC to -15 ºC; 0.5 wt% to 35 wt% of a third composition comprising at least one refrigerant having a boiling point or bubble point in the range - 110 ºC to -70 ºC; 10 wt% to 50 wt% of a fourth composition comprising at least one refrigerant having a boiling point or bubble point in the range - 170 ºC to -110 ºC; and 0.5 wt% to 20 wt% of a fifth composition comprising at least one refrigerant having a boiling point or bubble point in the range - 250 ºC to -180 ºC. Also disclosed is the use of the blend in refrigeration apparatus and apparatus containing the blend.
C09K 5/04 - Substances qui subissent un changement d'état physique lors de leur utilisation le changement d'état se faisant par passage de l'état liquide à l'état vapeur ou vice versa
F25B 45/00 - Dispositions pour l'introduction ou l'évacuation du frigorigène
A cryopump comprising:a pump inlet, a two stage refrigerator; a first stage array thermally coupled to a first stage of said two stage refrigerator; and a cryopanel structure coupled to a second stage of said two stage refrigerator is disclosed. The cryopanel structure comprises at least three flat panels. The first stage array is mounted between the pump inlet and the cryopanel structure, and comprises a plurality of slats, the plurality of slats each being mounted such that a side of each of the plurality of slats closest to the cryopanel structure is substantially aligned and offset longitudinally with respect to a corresponding one of said at least three flat panels.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
A cryopump with a pump inlet; a two stage refrigerator; a first stage array arranged thermally coupled to a first stage of the two stage refrigerator; and a cryopanel structure coupled to a second stage of the two stage refrigerator. Surfaces of the cryopanel structure have portions that are coated portion with an adsorbent material and other portions that are not coated with the adsorbent material.
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
A vacuum apparatus temperature sensor assembly for measuring the temperature of a vacuum apparatus and a method are disclosed. The vacuum apparatus temperature sensor assembly comprises: a sheet substrate configured to conform to a shape of an item, equipment or apparatus whose temperature is to be determined; and a temperature sensor thermally coupled with the sheet substrate, wherein the sheet substrate is configured to provide a thermal path from the apparatus to the temperature sensor. In this way, the substrate provides a larger area than that of the temperature sensor to couple with the apparatus which enables the average temperature of the apparatus to be more reliably and accurately conveyed to the temperature sensor and make the temperature measurements less reliant on the exact placing of the temperature sensor with respect to the apparatus.
G01K 1/143 - SupportsDispositifs de fixationDispositions pour le montage de thermomètres en des endroits particuliers pour la mesure de la température de surfaces
G01K 1/16 - Dispositions particulières pour conduire la chaleur de l'objet à l'élément sensible
91.
Semiconductor system with steam generator and reactor
A semiconductor processing system includes a semiconductor processing chamber, a pump, an exhaust line in fluid communication with the chamber through the pump, and a steam generator and reactor. The steam generator and reactor has a process conduit with an inlet in line in the exhaust line for generating superheated steam and effecting transformations of chemicals in the exhaust fluid flowing in exhaust line into the inlet.
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
92.
TRANSPORT DEVICE AND METHOD OF MOVING VACUUM SYSTEM COMPONENTS IN A CONFINED SPACE
A transport device (10) for transporting loads (60) in a confined space and a method of moving vacuum system components in a sub fab are disclosed. The transport device comprises: wheels (12) configured to both support and move the transport device on a surface; and a drive mechanism for driving the wheels. A load bearing mechanism (50) is mounted to be movable between a lowered position adjacent to the surface and at least one raised position, a support frame (20) configured to support the load bearing mechanism, comprising a front wall (24), two side walls (22) and an open back (26). The load bearing mechanism is mounted such that the side walls and front wall of the support frame extend around the load bearing mechanism in at least one of the raised and lowered positions. There is at least one actuator (40) mounted on one of the walls of the support frame for raising and lowering the load bearing mechanism and the wheels are mounted adjacent to the side walls of the support frame and support the two side walls at four locations, such that a centre of gravity of the transport device is between the four locations.
B66F 9/06 - Dispositifs pour lever ou descendre des marchandises volumineuses ou lourdes aux fins de chargement ou de déchargement se déplaçant, avec leurs charges, sur des roues ou sur un dispositif analogue, p. ex. chariots élévateurs à fourche
09 - Appareils et instruments scientifiques et électriques
37 - Services de construction; extraction minière; installation et réparation
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
41 - Éducation, divertissements, activités sportives et culturelles
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Pumps; vacuum pumps; capture vacuum pumps; gas capture pump, gas entrapment pumps; ion pumps; getter pumps; ion getter pumps, sputter ion pumps; non-evaporable getter (NEG) pumps; titanium sublimation pumps; metal discs and stacks thereof for pumps, solid or coated metal discs and stacks thereof for pumps, discs of zirconium, iron and vanadium and stacks thereof for pumps, discs coated with zirconium, iron and vanadium and stacks thereof for pumps; pump controllers, vacuum pump controllers, ion pump controllers, getter pump controllers, non-evaporable getter (NEG) pump controllers, titanium sublimation pump controllers; parts and fittings for all the aforesaid goods. Electric control devices for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Power controllers for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Electric and electronic controllers for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; instruments and apparatus for use in testing, control, detection, monitoring and the analysis of materials during operation of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Displays for control devices and controllers for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; gauges; pressure gauges; ionisation gauges; vacuum gauges; magnetron gauges, cold cathode gauges; transducers; Temperature measuring sensors, thermocouples, resistive temperature measuring devices; magnets, rare earth magnets, ceramic magnets, ferrite magnets; cathodes, titanium cathodes, solid titanium cathodes, solid titanium/tantalum cathodes, slotted titanium cathodes; anodes; instruments and apparatus for measurement of temperature, pressure, current, voltage as part of controllers for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; electrical power supplies, cables, high voltage cables, low voltage cables, high current cables, connectors therefor; splitter boxes; pole pieces and magnetic shielding therefor; baffles, shields, line-of-sight shields, particle-rebound shields, sputter shields; glow discharge screens; cryoshrouds; ambient shrouds; filaments; parts and fittings for all the aforesaid goods, replacement parts for all the aforesaid goods; all the aforesaid goods for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; computer software for monitoring status, operation, function, environment, failures and errors of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; computer software for updating firmware for monitoring status, operation, function, environment, failures and errors of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; computer software for recording and display of data relating to status, operation, function, environment, failures and/or errors of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; computer software for the configuration of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, and controllers therefor. Repair, servicing and maintenance of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, controls, controllers, displays and parts and fittings therefor; refurbishment of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, controls, controllers, displays and parts and fittings therefor; assembly of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps and parts, controls, controllers, displays and fittings therefor; consultancy services relating to assembly, installation, operation, application and maintenance of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, controls, controllers, displays and parts and fittings therefor. Custom manufacture and assembly of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, controls, controllers, displays and parts and fittings therefor; Customisation and adaptation of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps, controls, controllers, displays and parts and fittings therefor. Training courses, workshops and seminars in the field of vacuum and vacuum pump technology, industrial training courses, workshops and seminars in the field of vacuum and vacuum pump technology, practical training courses, workshops and seminars in the field of vacuum and vacuum pump technology; Sales personnel training services in the field of vacuum and vacuum pump technology; Engineering and repair training services in the field of vacuum and vacuum pump technology; Providing education, consultancy, training, instruction, workshops and seminars in the field of vacuum technology. Design of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Design of controls, controllers and visual displays for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Testing of pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps; Testing of controls, controllers and visual displays for pumps, vacuum pumps, ion pumps, getter pumps, ion getter pumps, non-evaporable getter pumps, titanium sublimation pumps.
94.
Conversion kit for a support frame, a support frame and an integrated vacuum system mounted in a support frame
A kit may include at least one frame lifting mechanism configured to be mounted within the support frame. The lifting mechanism may include a movable element configured to be movably mounted to the frame and an extendible member configured to extend between the movable element and a static member mounted on the frame. The movable element includes at least one support portion extending from a lower surface of the movable element when the movable element is mounted to the frame. The extendible member is configured to be movable between a compressed state and an extended state. The movable element is configured to be mounted to the frame such that on extension of the extendible member the movable element is pushed downwards and the at least one support portion moves below a base of the frame and provides a lifting force to the frame.
A kit for converting a support frame for an integrated vacuum system from a static to a movable support frame along with the support frame and the integrated vacuum system is disclosed. The kit comprises: at least one frame lifting mechanism configured to be mounted within the support frame. The lifting mechanism comprises: a movable element configured to be movably mounted to the frame and an extendible member configured to extend between the movable element and a static member mounted on the frame. The movable element comprises at least one support portion extending from a lower surface of the movable element when the movable element is mounted to the frame. The extendible member is configured to be movable between a compressed state and an extended state. The movable element is configured to be mounted to the frame such that on extension of the extendible member the movable element is pushed downwards and the at least one support portion moves below a base of the frame and provides a lifting force to the frame.
F16M 7/00 - Détails de fixation ou de réglage des bâtis, châssis ou pièces de supports des moteurs sur leurs fondations ou leur baseFixation des parties fixes des moteurs, p. ex. des blocs cylindres
B66F 9/00 - Dispositifs pour lever ou descendre des marchandises volumineuses ou lourdes aux fins de chargement ou de déchargement
F04B 41/00 - Installations ou systèmes de pompage spécialement adaptés aux fluides compressibles
A flanged vacuum pump, a vacuum system and a method of mounting a vacuum pump to a vacuum chamber are disclosed. The vacuum pump (10) comprises an inlet flange (12) (42) for receiving a plurality of protruding fixing elements (22) extending from the vacuum chamber. The protruding fixing elements comprise an enlarged retaining portion (39) at an end remote from the vacuum chamber and a fastener receiving portion (24) having at least one radial dimension that is smaller than a corresponding dimension of the enlarged retaining portion. A fastening mechanism is provided that comprises a plurality of slots (34) each extending from a same side of a plurality of apertures (32). The fastening mechanism is configured to be rotatable between a mounting position in which the apertures (32) are aligned with the protruding fixing elements (22) and a sealing position in which the slots (34) are aligned with the protruding fixing elements (22).
Method for the regeneration of a volume getter pump in a vacuum apparatus with a volume getter pump and an ion getter pump where the operating voltage of the ion getter pump is reduced, the current through the ion getter pump is recorded for determination of the pressure in the vacuum apparatus and then a heating element of the NEG is controlled as a function of the current of the ion getter pump for the purpose of heating the NEG material.
H01J 41/20 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter avec ionisation au moyen de cathodes froides en utilisant des getters
F04B 37/02 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation, par absorption ou adsorption
H01J 41/12 - Tubes à décharge pour l'évacuation par diffusion d'ions, p. ex. pompes ioniques, pompes ioniques à getter
Pump module for a vacuum apparatus with a flange which can be connected to a vacuum apparatus in a vacuum-tight manner, at least one ion getter pump and at least one volume getter pump, NEG, where the ion getter pump is directly connected to the flange and the NEG is directly connected to the ion getter pump and where the NEG and the flange are arranged separately from each other.
F04B 37/02 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation, par absorption ou adsorption
F04B 37/14 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour utilisation particulière pour obtenir un vide élevé
F04B 39/12 - Carcasses d'enveloppeCylindresCulassesConnexions des tubulures pour fluide
F04B 39/14 - Dispositions permettant un montage ou démontage commodes
Flange for a vacuum apparatus comprises a housing to be connected to the vacuum apparatus defining an opening wherein the opening has rectangular narrow shape. The flange further comprises a metal seal arranged around the opening to create a vacuum tight seal.
F04B 37/02 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation, par absorption ou adsorption
F04B 37/08 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour l'évacuation par moyens thermiques par condensation ou réfrigération, p. ex. pompes cryogéniques
F04B 37/14 - Pompes spécialement adaptées aux fluides compressibles et ayant des caractéristiques pertinentes non prévues dans les groupes ou présentant un intérêt autre que celui visé par ces groupes pour utilisation particulière pour obtenir un vide élevé
F04B 37/16 - Moyens pour éliminer les espaces morts
F04B 39/12 - Carcasses d'enveloppeCylindresCulassesConnexions des tubulures pour fluide
F04B 53/16 - Carcasses d'enveloppeCylindresChemises de cylindre ou culassesConnexions des tubulures pour fluide
100.
A PRESSURE REGULATED SEMICONDUCTOR WAFER COOLING APPARATUS AND METHOD AND A PRESSURE REGULATING APPARATUS
A semiconductor wafer cooling system and method and a pressure regulating apparatus for mitigating pressure increases in a semiconductor wafer conditioning circuit are disclosed. The pressure regulating apparatus comprises: a buffer vessel, the buffer vessel comprising an inlet and outlet channel; wherein the inlet channel is configured in operation to be in fluid communication with a higher pressure location of the semiconductor wafer conditioning circuit, and the outlet channel is configured in operation to be in fluid communication with a lower pressure location. The inlet channel comprises a pressure controlled valve configured to close the inlet channel during normal operation such that the buffer vessel is isolated from the higher pressure location of the conditioning circuit and to open the inlet channel in response to the pressure within the semiconductor conditioning circuit rising above a predetermined level.
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
