Abrégé

Example embodiments describe a computer-implemented method for balancing an electrochemical deposition of metal on a PCB substrate; the method including i) obtaining a layout of the metal on the PCB substrate comprising at least one active area having a circuit layout and a balancing area available for the balancing; ii) dividing the substrate area in a plurality of finite elements; iii) determining active metal fractions from the layout for the respective finite elements; iv) determining metal balancing fractions covering respective finite elements in the balancing area based on the active metal fractions in finite elements in the at least one active area surrounding the respective finite element.

Classes IPC  ?

• G06F 30/398 - Vérification ou optimisation de la conception, p.ex. par vérification des règles de conception [DRC], vérification de correspondance entre géométrie et schéma [LVS] ou par les méthodes à éléments finis [MEF]

Abrégé

Example embodiments describe a computer-implemented method for balancing an electrochemical deposition of metal on a PCB substrate; the method comprising i) obtaining a layout (100) of the metal on the PCB substrate comprising at least one active area (103, 101) having a circuit layout (103) and a balancing area (102) available for the balancing; ii) dividing the substrate area in a plurality of finite elements (161); iii) determining (110) active metal fractions (150) from the layout (100) for the respective finite elements; iv) determining (170) metal balancing fractions (182) covering respective finite elements in the balancing area based on the active metal fractions in finite elements in the at least one active area surrounding (183) the respective finite element.

Classes IPC  ?

• G06F 30/398 - Vérification ou optimisation de la conception, p.ex. par vérification des règles de conception [DRC], vérification de correspondance entre géométrie et schéma [LVS] ou par les méthodes à éléments finis [MEF]
• H05K 1/00 - Circuits imprimés
• H05K 3/00 - Appareils ou procédés pour la fabrication de circuits imprimés
• G06F 111/10 - Modélisation numérique
• G06F 119/18 - Analyse de fabricabilité ou optimisation de fabricabilité

Abrégé

According to an embodiment, a computer-implemented method for modelling an electrochemical process is disclosed, the electrochemical process comprising treating a surface of an object in a container containing an electrolyte, the method comprising following steps: enclosing the object by a control surface; generating a mesh on the control surface; generating a mesh on the object; generating a mesh on the container walls, anode surfaces and electrolyte meniscus; generating a mesh of the electrolyte contained within the control surface; generating a mesh of the electrolyte surrounding the control surface and determining approximate and/or analytical solutions of partial differential equations describing said electrochemical process in each element of the mesh of the control surface and/or of the electrolyte.

Classes IPC  ?

• G06F 30/20 - Optimisation, vérification ou simulation de l’objet conçu
• G06F 17/13 - Opérations mathématiques complexes pour la résolution d'équations d'équations différentielles
• C25D 21/12 - Commande ou régulation
• G06F 30/23 - Optimisation, vérification ou simulation de l’objet conçu utilisant les méthodes des éléments finis [MEF] ou les méthodes à différences finies [MDF]
• G06F 111/10 - Modélisation numérique

Produits et services

Software for optimizing and simulating machining processes such as electrochemical, plating, deformable, polishing, surface, anodising and machining operations, acoustic insulation, process control and process improvement; meshing software for tess learning computer models for solving scientific equations. Education and training in the field of computers, software and hardware. Design and development of software for optimizing and simulating machining processes such as electrochemical, plating, deformable, polishing, surface, anodising and machining operations, acoustic insulation, process control and process improvement; design and development of meshing software for tess learning computer models; data storage of data relating to the maintenance services in the field of industrial analysis and research; design and development of computers, software and hardware; installation of software; advice and consultancy in the field of computers, software and hardware.

Produits et services

Software for optimizing the efficiency of and for simulating machining processes, namely, electrochemical plating, polishing and anodising and machining operations, acoustic insulation; meshing software for computer models for solving scientific equations Education and training in the nature of lectures and seminars in the field of computers, software and hardware Design and development of software for optimizing the efficiency of and simulating machining processes, namely, electrochemical plating, polishing and anodising and machining operations, acoustic insulation; design and development of meshing software for computer models for solving scientific equations; electronic data storage of data relating to the maintenance services in the field of industrial analysis and research; design and development of computers, software and hardware; installation of computer software; advice and consultancy in the field of computers, software and hardware for acoustic leakage, surface finishing, electrochemical manufacturing, cathodic protection, alternating current mitigation and design engineering against corrosion

Abrégé

A device suitable for the electrochemical processing of an object is at least provided with a chamber that is to accommodate an electrolyte, a support for the object that is to be processed in the chamber, at least one set of electrodes located in the chamber such that during operation at least one electrode is located opposite each portion of a surface of said object that is to be processed. The device also includes a controller configured to provide an electric current between the object that is to be processed and the electrodes.

Classes IPC  ?

• C25D 17/00 - PROCÉDÉS POUR LA PRODUCTION ÉLECTROLYTIQUE OU ÉLECTROPHORÉTIQUE DE REVÊTEMENTS; GALVANOPLASTIE; JONCTION DE PIÈCES PAR ÉLECTROLYSE; APPAREILLAGES À CET EFFET Éléments structurels, ou leurs assemblages, des cellules pour revêtement électrolytique
• C25D 17/12 - Forme ou configuration
• C25D 21/12 - Commande ou régulation
• C25F 7/00 - PROCÉDÉS POUR LE TRAITEMENT D'OBJETS PAR ENLÈVEMENT ÉLECTROLYTIQUE DE MATIÈRE; APPAREILLAGES À CET EFFET Éléments de construction des cellules, ou leur assemblage, pour l'enlèvement électrolytique de matières d'objets; Entretien ou conduite
• C25D 5/08 - Dépôt avec déplacement de l'électrolyte, p.ex. dépôt par projection de l'électrolyte

Abrégé

A device suitable for the electrochemical processing of an object is at least provided with a chamber that is to accommodate an electrolyte, means for supporting the object that is to be processed in said chamber, at least one set of electrodes extending parallel to each other, which electrodes are located in said chamber such that during operation at least one electrode is located opposite each portion of a surface of said object that is to be processed, as well as control means for providing an electric current between the object that is to be processed and the electrodes. A number of electrodes is arranged with fixed spacings on nodes of a raster pattern, whilst at least one electrode is located at a position shifted with respect to the nearest node of the raster pattern.

Classes IPC  ?

• C25D 5/04 - Dépôt avec électrodes mobiles
• C25F 7/00 - PROCÉDÉS POUR LE TRAITEMENT D'OBJETS PAR ENLÈVEMENT ÉLECTROLYTIQUE DE MATIÈRE; APPAREILLAGES À CET EFFET Éléments de construction des cellules, ou leur assemblage, pour l'enlèvement électrolytique de matières d'objets; Entretien ou conduite

Abrégé

Device and method suitable for the electrochemical processing of an object. The device is provided at least with a chamber for accommodating an electrolyte, means for supporting the object to be processed in this chamber, electrodes arranged in this chamber, and control means for applying an electric current between the object to be processed and the electrodes.

Classes IPC  ?

• B23H 3/00 - Usinage électrochimique, c. à d. enlèvement de métal par passage de courant entre une électrode et une pièce en présence d'un électrolyte
• B23H 3/02 - Circuits électriques spécialement adaptés à cet effet, p.ex. alimentation, commande, prévention des courts-circuits

Abrégé

A device which is suitable for electrochemically processing an object comprises at least an electrolyte-containing chamber, means for supporting the object to be processed in the chamber, a counter electrode disposed in the chamber as well as means for applying an electrical potential difference between the object to be processed and the counter electrode. The device furthermore comprises at least one holder and at least one rod-shaped coelectrode supported by the holder, which rod-shaped coelectrode extends towards the object and which in use has a polarity opposite that of the counter electrode.

Classes IPC  ?

• B41M 5/20 - Procédés de reproduction ou méthodes de reproduction ou de marquage; Matériaux en feuilles utilisés à cet effet utilisant du courant électrique
• C25D 17/14 - Electrodes pour dépôt au tampon
• C25D 7/00 - Dépôt électrochimique caractérisé par l'objet à revêtir

Abrégé

The invention relates, inter alia, to a method for depositing or removing a layer on/from a workpiece, wherein an electrolyte is present between said workpiece and at least one counter electrode and a potential difference is applied between said workpiece and said counter electrode for depositing or removing said layer. The deposition or removal is preceded by an analysis phase, in which an expected layer thickness of the layer to be deposited or removed is calculated on the basis of data from a database. During the analysis phase an expected potential distribution in the electrolyte near the workpiece is calculated, whilst an expected local potential difference between the electrolyte and the workpiece is calculated at least at a specific element on the workpiece. At least the layer thickness at at least one historic specific element stored in the database is retrieved in said database, of which historic specific element at least the local potential difference at least substantially corresponds to the expected local potential difference of the specific element provided on the workpiece, which layer thickness is regarded as the expected layer thickness at the specific element on the workpiece. Subsequently the expected layer thickness is compared to a desired layer thickness at the specific element, whereupon, if the difference between the expected layer thickness and the desired layer thickness exceeds a predetermined value, measures are taken to change the expected local potential difference at the specific element so that the layer thickness to be realised and the desired layer thickness substantially correspond.

Classes IPC  ?

• C25D 21/12 - Commande ou régulation
• H05K 3/24 - Renforcement du parcours conducteur

Abrégé

A device which is suitable for electrochemically processing an object comprises at least an electrolyte-containing chamber, means for supporting the object to be processed in the chamber, a counter electrode disposed in the chamber as well as means for applying an electrical potential difference between the object to be processed and the counter electrode. The device furthermore comprises at least one holder and at least one rod-shaped coelectrode supported by the holder, which rod-shaped coelectrode extends towards the object and which in use has a polarity opposite that of the counter electrode.

Classes IPC  ?

• C25D 17/12 - Forme ou configuration
• B23H 7/22 - Electrodes spécialement adaptées à cet effet ou leur fabrication