A thermocouple structure which includes: a thermocouple; a multi-hole quartz glass pipe including at least a first through-hole and a second through-hole in a longitudinal direction of a columnar shape; a quartz glass lid; a wiring structure in which a positive electrode wire passes through the first through-hole, a negative electrode wire passes through the second through-hole, a junctional part is disposed on one end side of the multi-hole quartz glass pipe, and the positive electrode wire and the negative electrode wire are drawn out of the other end 1e side of the multi-hole quartz glass pipe to an outside of the multi-hole quartz glass pipe; and a sealing part that seals one end side of the first through-hole and one end side of the second through-hole with the one end 1a of the multi-hole quartz glass pipe and one end of the quartz glass lid stuck together, and covers the junctional part.
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
2.
SILICA HEAT REFLECTION PLATE AND METHOD FOR MANUFACTURING SAME
The purpose of the present disclosure is to provide: a silica heat reflection plate which withstands use at temperatures up to 1,000°C, and which, in comparison to conventional silica heat reflection plates, maintains better adhesion between a silica plate and a reflector, is better at suppressing deterioration of a metal component of the reflector, has better heat reflection characteristics, has better bondability between silica plates, and has a longer service life; and a method for manufacturing the same. With respect to a silica heat reflection plate according to the present disclosure, a reflector 3 reflects infrared rays L1 that are incident thereon from a first silica plate side, or reflects infrared rays L2 that are incident thereon from a second silica plate side. The first silica plate 1 and the second silica plate 2 have an OH group content of 1,000 ppm or less. The reflector 3 is a thin film. A surface layer including at least a reflection surface of the reflector is formed of one element that is selected from the group consisting of Ir, Pt, Rh, Ru, Re, and Mo, or is formed of an alloy that contains at least one element that is selected from the group consisting of Ir, Pt, Rh, Ru, Re, and Mo, and that has a melting point of 1,200°C or more.
H01L 21/22 - Diffusion des impuretés, p. ex. des matériaux de dopage, des matériaux pour électrodes, à l'intérieur ou hors du corps semi-conducteur, ou entre les régions semi-conductricesRedistribution des impuretés, p. ex. sans introduction ou sans élimination de matériau dopant supplémentaire
C23C 14/14 - Matériau métallique, bore ou silicium
H01L 21/31 - Traitement des corps semi-conducteurs en utilisant des procédés ou des appareils non couverts par les groupes pour former des couches isolantes en surface, p. ex. pour masquer ou en utilisant des techniques photolithographiquesPost-traitement de ces couchesEmploi de matériaux spécifiés pour ces couches
H01L 21/324 - Traitement thermique pour modifier les propriétés des corps semi-conducteurs, p. ex. recuit, frittage
The sputtering target of the present disclosure includes: an aluminum matrix; and (1) a material or phase containing aluminum and further containing either a rare earth element or a titanium group element or both a rare earth element and a titanium group element or (2) a material or phase containing either a rare earth element or a titanium group element or both a rare earth element and a titanium group element, at a content of 10 to 70 mol % in the aluminum matrix.
C22C 32/00 - Alliages non ferreux contenant entre 5 et 50% en poids d'oxydes, de carbures, de borures, de nitrures, de siliciures ou d'autres composés métalliques, p. ex. oxynitrures, sulfures, qu'ils soient soient ajoutés comme tels ou formés in situ
C22C 1/04 - Fabrication des alliages non ferreux par métallurgie des poudres
C22C 1/05 - Mélanges de poudre métallique et de poudre non métallique
B22F 3/105 - Frittage seul en utilisant un courant électrique, un rayonnement laser ou un plasma
B22F 3/24 - Traitement ultérieur des pièces ou objets
C22C 29/16 - Alliages à base de carbures, oxydes, borures, nitrures ou siliciures, p. ex. cermets, ou d'autres composés métalliques, p. ex. oxynitrures, sulfures à base de nitrures
C22C 29/00 - Alliages à base de carbures, oxydes, borures, nitrures ou siliciures, p. ex. cermets, ou d'autres composés métalliques, p. ex. oxynitrures, sulfures
C22C 1/047 - Fabrication des alliages non ferreux par métallurgie des poudres comprenant des composés intermétalliques
B22F 9/08 - Fabrication des poudres métalliques ou de leurs suspensionsAppareils ou dispositifs spécialement adaptés à cet effet par des procédés physiques à partir d'un matériau liquide par coulée, p. ex. à travers de petits orifices ou dans l'eau, par atomisation ou pulvérisation
4.
POWDER SURFACE FILM-FORMING DEVICE, AND METHOD FOR PRODUCING COATED POWDER
The present disclosure provides a powder surface film-forming device, which makes it possible to reduce the aggregation of a powder by disintegrating aggregates of the powder at a proper timing during the delivery of the powder when the formation of a film on the surfaces of the powder is performed by a dry-mode process and, as a result, enables the formation of a film having a uniform thickness on the surface of each particle of a raw material powder, and can achieve satisfactory adhesion efficiency of a thin film. The powder surface film-forming device 100 is provided with a powder delivery mechanism 3 which has delivery passages 8-2 to 8-5 for a powder 15, film formation units 6-1 to 6-4 which are respectively arranged at positions respectively facing passage surfaces of the delivery passages and in which a portion of each of the passage surfaces serves as a film formation area, disintegration mechanisms 2-1 to 2-3 which are used for disintegrating aggregates of the powder, and a relay mechanism 2 which delivers the powder from the delivery passages to the disintegration mechanisms and transfers the disintegrated powder to another delivery passage, in which the delivery passages and the relay mechanism together constitute a single circulation passage 16 and repeatedly perform the formation of a film on the surface of each particle of the powder and the disintegration of the aggregates of the powder during circulating delivery of the powder through the circulation passages.
An iridium-containing oxide having a total pore volume of 0.20 cm3/g or more, calculated by a BJH method from nitrogen adsorption/desorption isotherm measurement, and a pore distribution having an average pore diameter of 7.0 nm or more.
A sputtering target-backing plate assembly comprising, a target has a thickness of 2.0 to 15.0 mm is joined to a backing plate, the backing plate has a recessed section having a depth of 0.5 to 5.0 mm on a plate surface, the target is fitted into the recessed section, and the assembly has a swaging structure in which an outer-peripheral-side surface of the target is clamped by a recessed section inner-peripheral-side surface of the backing plate.
NATIONAL UNIVERSITY CORPORATION TOYOHASHI UNIVERSITY OF TECHNOLOGY (Japon)
TOHOKU UNIVERSITY (Japon)
FURUYA METAL CO., LTD. (Japon)
Inventeur(s)
Fujii, Satoshi
Fukushima, Jun
Takizawa, Hirotsugu
Okawa, Yuya
Miyazawa, Tomoaki
Abrégé
The present disclosure addresses the problem of providing a reaction device that can increase the refinement amount of a reduction product, that makes it easy to control the sample temperature, and that facilitates mass production. The present disclosure also addresses the problem of providing a method by which a reduction product of an oxide sample can be efficiently obtained using said reaction device. A reaction device 100 according to the present disclosure comprises at least: a reaction chamber 15 for accommodating a plasma source 13, such as a metal, and an oxide sample 14 that is to be reduced and is distinct from the plasma source; an exhaust pump 12 that discharges gas from inside the reaction chamber; one or more cavity resonators; and a heating mechanism for heating the oxide sample. At least one of the cavity resonators has a shape that forms a magnetic field intensity distribution at the center of the cavity resonator. The reaction device includes, as a cavity resonator, a first cavity resonator 8 for irradiating all or part of the plasma source with microwaves and generating plasma from the plasma source.
The purpose of the present disclosure is to provide a heat reflection plate which has good thermal responsiveness and high reflectance, while being suppressed in the possibility of contaminating a furnace, and which has a low heat capacity and is capable of saving energy. A heat reflection plate 100 according to the present disclosure comprises: a plate-like outer covering 1; and a reflector 5 which is arranged inside the plate-like outer covering 1 such that the outer periphery thereof is completely covered by the plate-like outer covering 1, and which reflects infrared light that is incident on one surface of the plate-like outer covering 1. The reflector 5 is composed of a thin film, plate or foil. With respect to this heat reflection plate 100, the sum of the heat capacities of the plate-like outer covering and the reflector per 1 mm2 in the thickness direction is 0.0004 to 0.0080 (J/K).
H01L 21/324 - Traitement thermique pour modifier les propriétés des corps semi-conducteurs, p. ex. recuit, frittage
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
11.
OXYGEN EVOLUTION REACTION CATALYST AND METHOD FOR PRODUCING SAME
[Problem] To provide a catalyst for electrolysis, the catalyst being suppressed in the amount of iridium used therefor, while enabling a high oxygen evolution reaction. [Solution] An oxygen evolution reaction catalyst which contains an oxide that contains yttrium and iridium, while having a BET specific surface area of 50 m2/g or more.
C25B 11/093 - Électrodes comportant des électro-catalyseurs sur un substrat ou un support caractérisées par le matériau électro-catalytique formé d’au moins un élément catalytique et d’au moins un composé catalytiqueÉlectrodes comportant des électro-catalyseurs sur un substrat ou un support caractérisées par le matériau électro-catalytique formé de plusieurs éléments catalytiques ou composés catalytiques au moins un métal noble ou oxyde de métal noble et au moins un oxyde d’un métal non noble
B01J 23/63 - Métaux du groupe du platine avec des terres rares ou des actinides
B01J 37/10 - Traitement thermique en présence d'eau, p. ex. de vapeur d'eau
C25B 1/04 - Hydrogène ou oxygène par électrolyse de l'eau
C25B 9/23 - Cellules comprenant des électrodes fixes de dimensions stablesAssemblages de leurs éléments de structure avec des diaphragmes comprenant des membranes échangeuses d'ions dans ou sur lesquelles est incrusté du matériau pour électrode
The present disclosure addresses the problem of providing: a catalyst carrier having periodically formed mesopores and also having heat resistance; a catalyst; and methods respectively for producing the catalyst carrier and the catalyst. The catalyst carrier 1 according to the present disclosure comprises: porous silica particles 2 each having a plurality of mesopores 4 having a peak pore diameter of 2 to 50 nm when analyzed by a BJH method, in which the plurality of mesopores 4 form a periodic structure; and metal oxide particles 3 containing at least one component selected from the group consisting of Al, Ti, Mg, Zr, Fe, Ce and Si. In the catalyst carrier 1, the metal oxide particles 3 are present in at least gap spaces 5 between the porous silica particles 2.
The purpose of the present disclosure is to provide a semiconductor device having an antioxidation metal film that is less expensive than prior-art Au films, that functions as a protective film for a metal film for soldering of a similar degree, that prevents organic substances from contaminating the metal film for soldering, and that ensures sufficient solder wettability. In a semiconductor device 100 according to the present disclosure a substrate 2 has at a minimum provided thereon: a metal film for soldering 5; an antioxidation metal film 6 provided on the metal film for soldering 5, said antioxidation metal film 6 suppressing oxidation of the metal film for soldering 5; and a solder part 7 joined to the antioxidation metal film 6 together with the metal film for soldering 5. The metal film for soldering 5 is an Ni film or an Ni alloy film, and the antioxidation metal film 6 is an Au-Ag based alloy film.
H01L 23/532 - Dispositions pour conduire le courant électrique à l'intérieur du dispositif pendant son fonctionnement, d'un composant à un autre comprenant des interconnexions externes formées d'une structure multicouche de couches conductrices et isolantes inséparables du corps semi-conducteur sur lequel elles ont été déposées caractérisées par les matériaux
H01L 21/28 - Fabrication des électrodes sur les corps semi-conducteurs par emploi de procédés ou d'appareils non couverts par les groupes
H01L 21/285 - Dépôt de matériaux conducteurs ou isolants pour les électrodes à partir d'un gaz ou d'une vapeur, p. ex. condensation
H01L 21/52 - Montage des corps semi-conducteurs dans les conteneurs
H01L 23/482 - Dispositions pour conduire le courant électrique vers le ou hors du corps à l'état solide pendant son fonctionnement, p. ex. fils de connexion ou bornes formées de couches conductrices inséparables du corps semi-conducteur sur lequel elles ont été déposées
The purpose of the present disclosure is to provide a thermocouple structure whereby shifting in a temperature measurement position due to vibration during use and thermal expansion of a thermocouple wire under high temperature conditions does not easily occur, contact temperature measurements of a subject being measured can be implemented, and a reduction in diameter is facilitated. The thermocouple structure according to the present embodiment comprises: a thermocouple 9; a column-shaped multi-hole quartz glass tube 1 having at least a first through-hole 6a and a second through-hole 6b in the longitudinal direction; a quartz glass lid 2; a wiring structure in which a positive electrode wire 3a is passed through the first through-hole 6a, a negative electrode wire 3b is passed through the second through-hole 6b, a joining part 4 is arranged at a one end 1a side of the multi-hole quartz glass tube 1, and the positive electrode wire 3a and the negative electrode wire 3b are pulled out from another end 1e of the multi-hole quartz glass tube 1 to the outside of the multi-hole quartz glass tube 1; and a seal part 8 at which the one end 1a of the multi-hole quartz glass tube 1 and a one end 2a of the quartz glass lid are abutted and which seals one end side of the first and second through-holes 6a, 6b and covers the joining part 4.
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
[Problem] To provide an exhaust gas purification catalyst which requires less Pt or Pd and exhibits similar or superior performance to conventional catalysts. [Solution] A catalyst including a support and metal particles that contain Pd and Fe or Pt and Fe and have an average particle diameter of less than 8 nm, wherein if the total mass of the support and the metal particles is 100 mass%, the mass of the metal particles is at least 1 mass%.
B01J 23/89 - Catalyseurs contenant des métaux, oxydes ou hydroxydes métalliques non prévus dans le groupe du cuivre ou des métaux du groupe du fer combinés à des métaux nobles
B01J 35/02 - Catalyseurs caractérisés par leur forme ou leurs propriétés physiques, en général solides
[Problem] To provide a production method for a catalyst in which Fe and Pd or Fe and Pt have been alloyed in nanoparticles and supported on a support, said production method being capable of controlling the diameter of the nanoparticles and the amount of nanoparticles supported on the support. [Solution] A production method for a catalyst including a support and metal particles that contain Pd and Fe or Pt and Fe, said method comprising: (1) a step in which a Pd compound and an Fe compound or a Pt compound and an Fe compound in a solution containing the Pd compound and the Fe compound or the Pt compound and the Fe compound are subjected to at least one reaction among a decomposition reaction and a reduction reaction to obtain a precursor that contains Pd and Fe or Pt and Fe; (2) a step in which the support is mixed into the solution containing the precursor obtained in step (1) to obtain a supporting body; and (3) a step in which the supporting body obtained in step (2) is subjected to a heat treatment.
B01J 23/89 - Catalyseurs contenant des métaux, oxydes ou hydroxydes métalliques non prévus dans le groupe du cuivre ou des métaux du groupe du fer combinés à des métaux nobles
B01J 35/02 - Catalyseurs caractérisés par leur forme ou leurs propriétés physiques, en général solides
[Problem] To provide an electrolysis catalyst that limits the amount of iridium used, exhibits high oxygen generation reaction, and has high durability. [Solution] A catalyst containing an oxide that includes strontium and iridium, and when the total of the elements of strontium and iridium is taken as 100 at%, the strontium is 60-80 at%, and the iridium is 20-40 at%, and 2θ has peaks in X-ray powder diffraction at 25.2, 25.7, 29.6, 31.5, 35.2, 36.3, 41.4, 44.1, 45.6, 46.7, 47.7, 50.0, 63.9, 72.1, and 73.9.
C25B 9/00 - Cellules ou assemblages de cellulesÉléments de structure des cellulesAssemblages d'éléments de structure, p. ex. assemblages d'électrode-diaphragmeCaractéristiques des cellules relatives aux procédés
C25B 9/50 - Cellules ou assemblages de cellules comprenant des photo-électrodesAssemblages de leurs éléments de structure
C25B 11/052 - Électrodes comportant un substrat et un ou plusieurs revêtements électro-catalytiques
C25B 11/054 - Électrodes comportant des électro-catalyseurs sur un support
C25B 11/093 - Électrodes comportant des électro-catalyseurs sur un substrat ou un support caractérisées par le matériau électro-catalytique formé d’au moins un élément catalytique et d’au moins un composé catalytiqueÉlectrodes comportant des électro-catalyseurs sur un substrat ou un support caractérisées par le matériau électro-catalytique formé de plusieurs éléments catalytiques ou composés catalytiques au moins un métal noble ou oxyde de métal noble et au moins un oxyde d’un métal non noble
H01M 4/86 - Électrodes inertes ayant une activité catalytique, p. ex. pour piles à combustible
[Problem] To provide an electrolysis catalyst in which the amount of iridium to be used is reduced and which exerts a high oxygen generation reaction and has high durability. [Solution] Provided is a catalyst which comprises an oxide, in which the oxide comprises strontium and iridium, has a strontium content of 65 to 75 at% and an iridium content of 25 to 35 at% wherein the total element amount of strontium and iridium is 100 at%, and has peaks at 2θ of 18.8, 30.2, 30.8 and 31.0 in powder X-ray diffraction.
C25B 9/00 - Cellules ou assemblages de cellulesÉléments de structure des cellulesAssemblages d'éléments de structure, p. ex. assemblages d'électrode-diaphragmeCaractéristiques des cellules relatives aux procédés
C25B 9/50 - Cellules ou assemblages de cellules comprenant des photo-électrodesAssemblages de leurs éléments de structure
C25B 11/052 - Électrodes comportant un substrat et un ou plusieurs revêtements électro-catalytiques
C25B 11/054 - Électrodes comportant des électro-catalyseurs sur un support
C25B 11/093 - Électrodes comportant des électro-catalyseurs sur un substrat ou un support caractérisées par le matériau électro-catalytique formé d’au moins un élément catalytique et d’au moins un composé catalytiqueÉlectrodes comportant des électro-catalyseurs sur un substrat ou un support caractérisées par le matériau électro-catalytique formé de plusieurs éléments catalytiques ou composés catalytiques au moins un métal noble ou oxyde de métal noble et au moins un oxyde d’un métal non noble
H01M 4/86 - Électrodes inertes ayant une activité catalytique, p. ex. pour piles à combustible
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
06 - Métaux communs et minerais; objets en métal
07 - Machines et machines-outils
09 - Appareils et instruments scientifiques et électriques
11 - Appareils de contrôle de l'environnement
14 - Métaux précieux et leurs alliages; bijouterie; horlogerie
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
Produits et services
Chemicals; salts for industrial purposes; salts of precious
metals for industrial purposes; industrial chemicals;
organometallic compounds; Ir organic compounds; Ru organic
compounds; inorganic salts; oxides; inorganic metal
compounds; Ir inorganic compounds; Ru inorganic compounds;
nanopowders for industrial purposes; nanoalloy powders for
industrial purposes; catalytic agents; catalysts;
biochemical catalysts. Wire gauze; mesh made of metals or metal alloys; screws of
metals or metal alloys; sputtering targets of metals or
metal alloys; castings, foils, powder, and rolled, drawn or
extruded semi-finished articles of aluminium or its alloys. Cemented carbide tools; anti-abrasive cemented carbide
tools; anticorrosive cemented carbide tools; friction stir
welding tools for metal processing made of precious metals
(precious metal content is 50% or more); friction stir
welding tools for metal processing made of precious metals
(precious metal content is less than 50%); surface
modification tools for metal processing made of precious
metals (precious metal content is 50% or more); surface
modification tools for metal processing made of precious
metals (precious metal content is less than 50%). Measuring or testing machines and instruments; standard-unit
measuring machines and apparatus; temperature indicators;
thermocouples; laboratory apparatus and instruments;
laboratory apparatus and instruments for analysis;
instruments made of precious metals (precious metal content
is 50% or more) for analysis; instruments made of precious
metals (precious metal content is less than 50%) for
analysis; laboratory apparatus and instruments for
experiments; instruments made of precious metal-containing
materials for experiments; resistance wires; laboratory
experimental machines and apparatus; laboratory experimental
machines and apparatus made of precious metal-containing
materials; crucibles for laboratory use; crucibles for
laboratory use made of precious metal-containing materials. Industrial furnaces; industrial furnaces made of precious
metal-containing materials; melting furnaces [for industrial
purposes]; melting furnaces [for industrial purposes] made
of precious metal-containing materials; crucibles [for
industrial purposes]; crucibles made of precious metals
(precious metal content is 50% or more); crucibles made of
precious metals (precious metal content is less than 50%);
shaped fittings for furnaces; shaped fittings for furnaces
made of precious metals (precious metal content is 50% or
more); shaped fittings for furnaces made of precious metals
(precious metal content is less than 50%); heating element
made of precious metals (precious metal content is 50% or
more); heating element made of precious metals (precious
metal content is less than 50%). Precious metals; precious metal alloys; precious metals
(precious metal content is 50% or more); precious metals
(precious metal content is less than 50%); platinum [metal];
platinum alloys; gold; gold alloys; ruthenium; ruthenium
alloys; silver; silver alloys; palladium; palladium alloys;
rhodium; rhodium alloys; iridium; iridium alloys; castings,
foils, powder, and rolled, drawn or extruded semi-finished
articles of precious metals; castings, foils, powder, and
rolled, drawn or extruded semi-finished articles of precious
metals (precious metal content is 50% or more); castings,
foils, powder, and rolled, drawn or extruded semi-finished
articles of precious metals (precious metal content is less
than 50%); castings, foils, powder, and rolled, drawn or
extruded semi-finished products of platinum or its alloys;
castings, foils, powder, and rolled, drawn or extruded
semi-finished products of gold or its alloys; castings,
foils, powder, and rolled, drawn or extruded semi-finished
products of silver or its alloys; sputtering target
materials made of precious metals; sputtering target
materials made of precious metals (precious metal content is
less than 50%); sputtering target materials made of platinum
or platinum alloys; sputtering target materials made of gold
or gold alloys; sputtering target materials made of
ruthenium or ruthenium alloys; sputtering target materials
made of silver or silver alloys; sputtering target materials
made of palladium or palladium alloys; sputtering target
materials made of rhodium or rhodium alloys; sputtering
target materials made of iridium or iridium alloys;
evaporation materials made of precious metals (precious
metal content is 50% or more); evaporation materials made of
precious metals (precious metal content is less than 50%);
evaporation materials made of platinum or platinum alloys;
evaporation materials made of gold or gold alloys; plates
made of precious metals (precious metal content is 50% or
more); plates made of precious metals (precious metal
content is less than 50%); pipes made of precious metals
(precious metal content is 50% or more); pipes made of
precious metals (precious metal content is less than 50%);
thin tubes made of precious metals (precious metal content
is 50% or more); thin tubes made of precious metals
(precious metal content is less than 50%); wire rods made of
precious metals (precious metal content is 50% or more);
wire rods made of precious metals (precious metal content is
less than 50%); fine wire rods made of precious metals
(precious metal content is 50% or more); fine wire rods made
of precious metals (precious metal content is less than
50%); mesh made of precious metals (precious metal content
is 50% or more); mesh made of precious metals (precious
metal content is less than 50%); screws made of precious
metals (precious metal content is 50% or more); screws made
of precious metals (precious metal content is less than
50%); sputtering targets made of precious metals (precious
metal content is less than 50%); castings, foils, powder,
and rolled, drawn or extruded semi-finished articles of
precious metals (precious metal content less than 50%). Purification, refining and processing of precious metals;
recycling and reuse of precious metals; purification,
refining and processing of metals; recycling and reuse of
metals; application of a thin film to the surface of an
article by each process of chemical, mechanical, thermal,
thermomechanical, chemical vapor deposition, physical vapor
deposition or vacuum deposition.
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
06 - Métaux communs et minerais; objets en métal
07 - Machines et machines-outils
09 - Appareils et instruments scientifiques et électriques
11 - Appareils de contrôle de l'environnement
14 - Métaux précieux et leurs alliages; bijouterie; horlogerie
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
Produits et services
Chemicals; salts for industrial purposes; salts of precious
metals for industrial purposes; industrial chemicals;
organometallic compounds; Ir organic compounds; Ru organic
compounds; inorganic salts; oxides; inorganic metal
compounds; Ir inorganic compounds; Ru inorganic compounds;
nanopowders for industrial purposes; nanoalloy powders for
industrial purposes; catalytic agents; catalysts;
biochemical catalysts. Wire gauze; mesh made of metals or metal alloys; screws of
metals or metal alloys; sputtering targets of metals or
metal alloys; castings, foils, powder, and rolled, drawn or
extruded semi-finished articles of aluminium or its alloys. Cemented carbide tools; anti-abrasive cemented carbide
tools; anticorrosive cemented carbide tools; friction stir
welding tools for metal processing made of precious metals
(precious metal content is 50% or more); friction stir
welding tools for metal processing made of precious metals
(precious metal content is less than 50%); surface
modification tools for metal processing made of precious
metals (precious metal content is 50% or more); surface
modification tools for metal processing made of precious
metals (precious metal content is less than 50%). Measuring or testing machines and instruments; standard-unit
measuring machines and apparatus; temperature indicators;
thermocouples; laboratory apparatus and instruments;
laboratory apparatus and instruments for analysis;
instruments made of precious metals (precious metal content
is 50% or more) for analysis; instruments made of precious
metals (precious metal content is less than 50%) for
experiments; laboratory apparatus and instruments for
analysis; instruments made of precious metals (precious
metal content is 50% or more) for experiments; instruments
made of precious metals (precious metal content is less than
50%) for experiments; resistance wires; laboratory
experimental machines and apparatus; laboratory experimental
machines and apparatus made of precious metal-containing
materials; crucibles for laboratory use; crucibles for
laboratory use made of precious metal-containing materials. Industrial furnaces; industrial furnaces made of precious
metal-containing materials; melting furnaces [for industrial
purposes]; melting furnaces [for industrial purposes] made
of precious metal-containing materials; crucibles [for
industrial purposes]; crucibles made of precious metal
(precious metal content is 50% or more); crucibles made of
precious metal (precious metal content is less than 50%);
shaped fittings for furnaces; shaped fittings for furnaces,
made of precious metals (precious metal content is 50% or
more); shaped fittings for furnaces, made of precious metals
(precious metal content is less than 50%); heating element
made of precious metal (precious metal content is 50% or
more); heating element made of precious metals (precious
metal content is less than 50%). Precious metals; precious metal alloys; precious metals
(precious metal content is 50% or more); precious metals
(precious metal content is less than 50%); platinum [metal];
platinum alloys; gold; gold alloys; ruthenium; ruthenium
alloys; silver; silver alloys; palladium; palladium alloys;
rhodium; rhodium alloys; iridium; iridium alloys; castings,
foils, powder, and rolled, drawn or extruded semi-finished
articles of precious metals; castings, foils, powder, and
rolled, drawn or extruded semi-finished articles of precious
metals (precious metal content is 50% or more); castings,
foils, powder, and rolled, drawn or extruded semi-finished
articles of precious metals (precious metal content is less
than 50%); castings, foils, powder, and rolled, drawn or
extruded semi-finished products of platinum or its alloys;
castings, foils, powder, and rolled, drawn or extruded
semi-finished products of gold or its alloys; castings,
foils, powder, and rolled, drawn or extruded semi-finished
products of silver or its alloys; sputtering target
materials made of precious metals; sputtering target made of
precious metals (precious metal content is 50% or more);
sputtering target materials made of platinum or platinum
alloys; sputtering target materials made of gold or gold
alloys; sputtering target materials made of ruthenium or
ruthenium alloys; sputtering target materials made of silver
or silver alloys; sputtering target materials made of
palladium or palladium alloys; sputtering target materials
made of rhodium or rhodium alloys; sputtering target
materials made of iridium or iridium alloys; evaporation
materials made of precious metals (precious metal content is
50% or more); evaporation materials made of precious metals
(precious metal content is less than 50%); evaporation
materials made of platinum or platinum alloys; evaporation
materials made of gold or gold alloys; plates made of
precious metals (precious metal content is 50% or more);
plates made of precious metals (precious metal content is
less than 50%); pipes made of precious metals (precious
metal content is 50% or more); pipes made of precious metals
(precious metal content is less than 50%); thin tubes made
of precious metals (precious metal content is 50% or more);
thin tubes made of precious metals (precious metal content
is less than 50%); wire rods made of precious metals
(precious metal content is 50% or more); wire rods made of
precious metals (precious metal content is less than 50%);
fine wire rods made of precious metal (precious metal
content is 50% or more); fine wire rods made of precious
metal (precious metal content is less than 50%); mesh made
of precious metals (precious metal content is 50% or more);
mesh made of precious metals (precious metal content is less
than 50%); screws made of precious metals (precious metal
content is 50% or more); screws made of precious metals
(precious metal content is less than 50%); sputtering
targets made of precious metals (precious metal content is
less than 50%); castings, foils, powder, and rolled, drawn
or extruded semi-finished articles of precious metals
(precious metal content is less than 50%). Purification, refining and processing of precious metals;
recycling and reuse of precious metals; purification,
refining and processing of metals; recycling and reuse of
metals; application of a thin film to the surface of an
article by each process of chemical, mechanical, thermal,
thermomechanical, chemical vapor deposition, physical vapor
deposition or vacuum deposition.
A sputtering target including aluminum and either a rare earth element or a titanium group element or both a rare earth element and a titanium group element, and the sputtering target has a fluorine content of 100 ppm or less.
The supported catalyst synthesis device according to the present disclosure includes a first source for a liquid containing a reducing agent; a second source for a liquid containing elements to constitute single-metal fine particles or solid solution fine particles to be supported; a third source for a liquid containing support particles; a reaction unit that joins flows of these liquids; a liquid feed route connecting between the first source and the reaction unit; a liquid feed route connecting between the second source and the reaction unit; a liquid feed route connecting between the third source and the reaction unit; and a collection unit, connected to the reaction unit via a pipe, to collect a produced reaction product, and further includes a pressure adjustment mechanism connected to the collection unit.
[Problem] To provide a decomposer for odorous substances which decomposes odorous substances even at low temperatures with a small amount of external energy and which retains the decomposition effect over a relatively long period. [Solution] A decomposer for odorous substances which comprises porous silica having an average pore diameter of 1-50 nm and a BET specific surface area of 300-2,000 m2/g and, supported thereon, ruthenium-containing particles having a particle diameter of 1-4 nm.
B01J 29/03 - Catalyseurs contenant des tamis moléculaires n'ayant pas de propriétés d'échangeurs de base
B01J 35/10 - Catalyseurs caractérisés par leur forme ou leurs propriétés physiques, en général solides caractérisés par leurs propriétés de surface ou leur porosité
24.
RUTHENIUM-BASED SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME
A ruthenium-based sputtering target having a cast structure, in which a sputter surface of the sputtering target includes at least two or more types of regions, and crystal surfaces in the regions are different from each other, each of the crystal surfaces being specified by a main peak of X-ray diffraction.
A ruthenium-based sputtering target having a cast structure, in which a sputter surface of the sputtering target includes at least two or more types of regions, and crystal surfaces in the regions are different from each other, each of the crystal surfaces being specified by a main peak of X-ray diffraction.
An object of the present disclosure is to provide a Ru-based sputtering target having no void, having high purity and a low degree of structural anisotropy, and capable of forming a Ru-based film having low particle properties, high film thickness uniformity, and high surface uniformity, and a method for manufacturing the same. According to the present disclosure, there is provided a ruthenium-based sputtering target having a cast structure, in which a sputter surface of the sputtering target includes at least two or more types of regions, and crystal surfaces in the regions are different from each other, each of the crystal surfaces being specified by a main peak of X-ray diffraction.
A sputtering target is a sputtering target including aluminum and either a rare earth element or a titanium group element or both a rare earth element and a titanium group element, and the sputtering target has a chlorine content of 100 ppm or less.
The purpose of the present invention is to provide a horizontal-type powder surface film forming device which improves dry stirring efficiency of powder and continuously produces a powder covered on the surface with a fine film and which further achieves high productivity by suitably controlling the film forming speed so as to have an even amount of film formed on the raw powder. This horizontal-type powder surface film forming device 100 comprises: a horizontally inclined barrel 1; a rotation mechanism 7 which rotates the barrel 1 with the primary axis thereof as the rotation axis 2; a pressure regulating mechanism 23 which maintains the pressure of the barrel 1 at a prescribed pressure less than or equal to atmospheric pressure; and a film forming mechanism 43 which is installed inside of the barrel 1; while the barrel 1 is rotated, the horizontal-type powder surface film forming device 100 forms a thin film on the surface of a raw powder 42 which has been inserted into the barrel 1. The barrel 1 has a passage 45 that extends spirally around the rotation axis 2; the bottom surface 44 of the passage 45 is the inside surface on the side wall of the barrel 1, and the top surface of the passage 45 is open.
The purpose of the present disclosure is to provide a device and a film-forming method with which it is possible to perform film-forming on the surface of a powder at a high film-forming speed using a dry method without carrying out stirring work by bringing a stirring jig into contact with a raw material powder, i.e., to achieve a high productivity for film-forming on the surface of a powder by a dry method and to form a thin film having a uniform thickness and an excellent adhesion efficiency on the surface of the raw material powder. The powder surface film-forming device according to the present disclosure has: a powder loading port 1 through which a raw material powder is loaded; and a vacuum chamber 2 for forming a thin film on the surface of the raw material powder to produce a coated powder, and a powder recovery port 3 for recovering the coated powder. The vacuum chamber 2 has a powder loading adjustment unit 4, a reaction space 5 into which the raw material powder exiting the powder loading adjustment unit 4 falls, a film-forming material source 6, a film-forming unit 7, and a powder recovery unit 8.
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
29.
METHOD FOR PRODUCING METAL CYLINDER MATERIAL, AND BACKING JIG USED THEREIN
A method for producing the metal cylinder material according to the present disclosure includes: a process A of forming a slitted cylinder-shaped body including at least one slit extending from one end face to the other end face of a cylinder barrel portion consisting of at least one metal plate material; a process B of forming a filler-equipped cylinder-shaped body including a filling portion obtained by filling the slit with a filler for the filler to be filled throughout the slit in a length direction of the slit; and a process C of, by inserting at least a probe of a friction stir rotation tool including the probe at least into the filling portion and executing FSP, reforming at least the filling portion of the filler-equipped cylinder-shaped body to obtain the metal cylinder material including an FSP portion.
B23K 20/12 - Soudage non électrique par percussion ou par une autre forme de pression, avec ou sans chauffage, p. ex. revêtement ou placage la chaleur étant produite par frictionSoudage par friction
The purpose of the present disclosure is to provide a silica heat reflection plate which has a high reflectance and a long service life, while being suppressed in the possibility of contaminating a furnace. A silica heat reflection plate 100 according to the present disclosure comprises: a silica plate 1; and a reflector 5 which is arranged within the silica plate 1 such that the outer periphery thereof is completely surrounded by the silica plate 1, and which reflects the infrared light incident on one surface of the silica plate 1. The reflector 5 is a thin film, a plate or a foil; and at least a surface layer of the reflector 5, said surface layer comprising a reflection surface, is formed of Ir, Pt, Rh, Ru, Re or Hf, or is alternatively formed of an alloy that contains at least one element that is selected from among Ir, Pt, Rh, Ru, Re, Hf and Mo.
H01L 21/22 - Diffusion des impuretés, p. ex. des matériaux de dopage, des matériaux pour électrodes, à l'intérieur ou hors du corps semi-conducteur, ou entre les régions semi-conductricesRedistribution des impuretés, p. ex. sans introduction ou sans élimination de matériau dopant supplémentaire
H01L 21/324 - Traitement thermique pour modifier les propriétés des corps semi-conducteurs, p. ex. recuit, frittage
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
C23C 14/14 - Matériau métallique, bore ou silicium
The purpose of the present disclosure is to provide a long-service-life silica heat-reflecting plate with which it is possible to ensure a greater reflection area ratio than with conventional methods and by which contamination inside a furnace is suppressed, the silica heat-reflecting plate having a small heat capacity, being capable of saving energy, and having high reflectance. The silica heat-reflecting plate according to the present disclosure has a silica plate 1, and a reflector 5 that reflects infrared rays and that is arranged inside the silica plate. The silica plate has a mated plate structure in which a first silica plate 1a and a second silica plate 1b are arranged facing each other, and in which the peripheral edge parts are joined to each other continuously in an annular form along the peripheral edge. The mated plate structure has a hermetically sealed cavity 12 and a third silica plate 9 that is accommodated inside the cavity. The reflector is a thin film, a plate, or a foil. A surface layer including at least the reflective surface of the reflector is formed from Ir, Pt, Rh, Ru, Re, Hf, or Mo, or is formed from an alloy including at least one selected from Ir, Pt, Rh, Ru, Re, Hf, and Mo.
H01L 21/205 - Dépôt de matériaux semi-conducteurs sur un substrat, p. ex. croissance épitaxiale en utilisant la réduction ou la décomposition d'un composé gazeux donnant un condensat solide, c.-à-d. un dépôt chimique
H01L 21/22 - Diffusion des impuretés, p. ex. des matériaux de dopage, des matériaux pour électrodes, à l'intérieur ou hors du corps semi-conducteur, ou entre les régions semi-conductricesRedistribution des impuretés, p. ex. sans introduction ou sans élimination de matériau dopant supplémentaire
H01L 21/31 - Traitement des corps semi-conducteurs en utilisant des procédés ou des appareils non couverts par les groupes pour former des couches isolantes en surface, p. ex. pour masquer ou en utilisant des techniques photolithographiquesPost-traitement de ces couchesEmploi de matériaux spécifiés pour ces couches
H01L 21/324 - Traitement thermique pour modifier les propriétés des corps semi-conducteurs, p. ex. recuit, frittage
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
C23C 14/14 - Matériau métallique, bore ou silicium
32.
IRIDIUM-CONTAINING OXIDE, METHOD FOR PRODUCING SAME AND CATALYST CONTAINING IRIDIUM-CONTAINING OXIDE
The purpose of the present disclosure is to obtain an iridium-containing oxide that achieves both high activity and high durability and that makes it possible to reduce the amount of catalyst used, when serving as a water splitting electrode catalyst in cation exchange membrane water electrolysis or a cation exchange membrane fuel cell, as a result of controlling the pore structure. An iridium-containing oxide according to the present disclosure is characterized by having a total pore volume of 0.20 cm3/g or greater, as calculated by the BJH method from a nitrogen adsorption/desorption isotherm measurement, and by having a pore distribution in which the average pore diameter is 7.0 nm or greater.
A water electrolysis catalyst containing a solid solution complex oxide of Ir and Ru, in which the solid solution complex oxide is represented by a chemical formula IrxRuyO2 (where x and y satisfy x+y=1.0); and the solid solution complex oxide has one diffraction maximum peak in a range of 2θ=66.10° or more and 67.00° or less in powder X-ray diffraction (Cu Kα).
C25B 11/042 - Électrodes à base d’un seul matériau
H01M 8/0656 - Combinaison d’éléments à combustible avec des moyens de production de réactifs ou pour le traitement de résidus avec des moyens de production des réactifs gazeux par des moyens électrochimiques
C25B 1/04 - Hydrogène ou oxygène par électrolyse de l'eau
[Problem] Provided is a mold proofing method with which a mold proofing effect is maintained for a long time without direct contact or addition of a mold proofing agent to an object for mold proofing. [Solution] This mold proofing method involves using: at least one among ethylene and ethanol; at least one selected from the group consisting of C1-C30 alkane, C2-C10 alkene, C2-C5 alkyne, C3-C11 cycloalkane, aromatic hydrocarbon, a C1 or C3-C8 compound having a hydroxyl group, C5 or C6 cycloalkene, aromatic hydrocarbon, a C1-C10 compound having an aldehyde group, a C3 or C4 compound having a ketone group, a C2-C18 compound having a carboxy group, a C1-C6 compound having a nitro group, a C2-C4 compound having an ether bond, a C2-C5 compound having an ester bond, a C1-C7 compound having an amino group, and ammonia; and a catalyst containing elements belonging to groups 4-12.
The purpose of the present disclosure is to obtain an iridium-containing oxide that achieves both high activity and high durability and that makes it possible to reduce the amount of catalyst used, when serving as a water splitting electrode catalyst in cation exchange membrane water electrolysis or a cation exchange membrane fuel cell, as a result of controlling the pore structure. An iridium-containing oxide according to the present disclosure is characterized by having a total pore volume of 0.20 cm3/g or greater, as calculated by the BJH method from a nitrogen adsorption/desorption isotherm measurement, and by having a pore distribution in which the average pore diameter is 7.0 nm or greater.
The method of producing a solid spherical powder according to the present disclosure includes: a step A of preparing a first powder raw material containing agglomerated particles and/or solidified particles having a particle diameter of 1 μm to 1,000 μm and introducing the first powder raw material into a plasma flame to produce a hollow spherical powder having a surface layer shell having a thickness of 1 μm to 50 μm; a step B of subjecting the hollow spherical powder to pulverization treatment to pulverize a hollow shape of the hollow spherical powder, thus obtaining a second powder raw material which is solid; and a step C of introducing the second powder raw material into a plasma flame, melting and solidifying the second powder raw material to obtain the solid spherical powder.
The purpose of the present disclosure is to achieve an iridium-containing oxide which is suppressed in the diffraction peak intensity at a specific position, while having a small crystallite size, and which enables energy saving by reducing overvoltage if used in a catalyst or electrode material, while enabling cost reduction by reducing the amount of iridium used therein. An iridium-containing oxide according to the present disclosure has the (1, 1, 0) diffraction peak at 28° ± 1°, the (1, 0, 1) diffraction peak at 35° ± 1° and the (2, 1, 1) diffraction peak at 54° ± 1° in main powder X-ray diffraction patterns (2θ, CuKα); and with respect to this iridium-containing oxide, the peak intensity ratio expressed by mathematical formula 1 is 0.65 or less.
The present disclosure provides: a sputtering target-backing plate assembly with which, even when a target having low bending strength is used or when linear expansion coefficients of a target and a backing plate are significantly different, damage to and peeling of the target can be suppressed, contaminations due to evaporation of impurities can be suppressed, and a target material can be easily peeled and recovered while suppressing loss of an expensive material being used as the target material; a manufacturing method therefor; and a recovery method for the target. In the sputtering target-backing plate assembly according to the present invention, a target 2 having a thickness of 2.0 to 15.0 mm is joined to a backing plate 1, wherein the backing plate has, on a plate surface 3, a recessed section 4 having a depth of 0.5 to 5.0 mm, and the target is fitted in the recessed section. In addition, the assembly has a swaging structure in which an outer-peripheral-side surface 5 of the target is clamped by an inner-peripheral-side surface 6 of the recessed section of the backing plate.
The present disclosure provides a sputtering target-backing plate assembly in which, even in the case where a target having a low flexural strength is used or even in the case where the difference in linear expansion coefficient between a target and a backing plate is significantly large, the target can be inhibited from being damaged or detached, and from being tainted due to volatilization of impurities, and detachment and recovery of a target material can be facilitated while suppressing loss of a high-cost material used as the target material. In the assembly according to the present disclosure, one of a backing plate 1 and a sputtering target 2 has a hook-shaped portion 6, and the other has a hook-receiving portion 10. The hook-shaped portion and the hook-receiving portion abut each other. The hook-shaped portion or hook-receiving portion of the sputtering target 2 is provided on an outer circumferential lateral surface 9, and the sputtering target 2 is fixed to the backing plate 1 when the hook-shaped portion 6 abuts the hook-receiving portion 10.
The present disclosure provides a sputtering target-backing plate assembly that is configured: to suppress damage or peeling of a target even in a case where a target with low bending strength is used, or a case where the difference between the coefficients of linear expansion of the target and the backing plate differ significantly; to suppress contamination caused by volatilization of impurities; and to facilitate peeling/recovery of the target material while suppressing the loss of expensive materials used as the target material. The sputtering target-backing plate assembly according to the present disclosure comprises: a backing plate 1 that has a plate surface 3, a plate rear surface 4, a plate side surface 5, and a pressing surface 6; and a sputtering target 2 that has a target surface 7, a target rear surface 8 facing the plate surface 3, and a target side surface 9. The sputtering target 2 is fixed to the backing plate 1 by the target side surface 9 being pressed by the pressing surface 6.
The purpose of the present disclosure is to provide: a sputtering target that enables obtaining of a uniform compositional distribution in the in-plane direction and in the film thickness direction regarding the compositional makeup of a deposited film; and a method for manufacturing the sputtering target. The sputtering target according to the present invention is an alloy formed from a first element which is ruthenium and a second element which is one selected from among boron, aluminum, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, and tungsten. The sputtering target includes dispersed particles each formed from two phases including an inter metal compound phase comprising the two types of elements which are the first element and the second element. The maximum major axis of the dispersed particles is not more than 500 μm.
B22F 9/08 - Fabrication des poudres métalliques ou de leurs suspensionsAppareils ou dispositifs spécialement adaptés à cet effet par des procédés physiques à partir d'un matériau liquide par coulée, p. ex. à travers de petits orifices ou dans l'eau, par atomisation ou pulvérisation
C22C 1/04 - Fabrication des alliages non ferreux par métallurgie des poudres
C22C 5/04 - Alliages à base d'un métal du groupe du platine
The purpose of the present invention is to provide: a sputtering target that makes it possible to perform film formation in which contamination by particles is suppressed on the occasion of sputtering; and a method for producing the sputtering target. A sputtering target according to the present invention is an alloy sputtering target formed from ruthenium serving as a first element and at least one substance serving as a second element and selected from among boron, aluminum, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chrome, molybdenum, and tungsten. The sputtering target is produced by a method including a preparation step for preparing raw materials, an atomization step in which an alloy powder is obtained by atomization, a mixing step in which a ruthenium raw material is additionally added to the alloy powder and a mixture is obtained, and a sintering step (a fourth step) in which the mixture is sintered and a sintered body is obtained. The maximum major diameter of the alloy powder obtained by atomization is 500 μm or less.
B22F 9/08 - Fabrication des poudres métalliques ou de leurs suspensionsAppareils ou dispositifs spécialement adaptés à cet effet par des procédés physiques à partir d'un matériau liquide par coulée, p. ex. à travers de petits orifices ou dans l'eau, par atomisation ou pulvérisation
C22C 1/04 - Fabrication des alliages non ferreux par métallurgie des poudres
C22C 5/04 - Alliages à base d'un métal du groupe du platine
The present disclosure provides a method for simply manufacturing a metal-based modified plate member having superior quality at a lower cost, without being affected by the machining precision of end surfaces of metal-based plate members to be abutted. A method for manufacturing a metal-based modified plate member according to the present invention comprises: a step A for setting a first end surface and a second end surface of metal-based plate members so as to be opposing each other with an interval therebetween, and thereby providing a gap between the first end surface and the second end surface; a step B for inserting a filler, heated to at least the melting point thereof, into the gap to fill the gap, or filling the gap with the filler and heating the filler to at least the recrystallization temperature, and then causing the filler to conform to the shapes of the first end surface and the second end surface to thereby from a filled section in which the gap is filled with the filler; and a step C for inserting, into at least the filled section, at least the probe of a friction stirring/rotating tool having the probe, and modifying at least the filled section from among the metal-based plate members and the filled section by implementing friction stir processing (FSP), and thereby obtaining a metal-based modified plate member provided with an FSP section.
B23K 20/12 - Soudage non électrique par percussion ou par une autre forme de pression, avec ou sans chauffage, p. ex. revêtement ou placage la chaleur étant produite par frictionSoudage par friction
The present disclosure provides a method for manufacturing a modified metal sheet of superior quality simply and at lower cost without being affected by the machining precision of the end surfaces of abutting metal sheets. The method for manufacturing a modified metal sheet according to the present disclosure comprises: a step A in which a first end surface and a second end surface of metal sheets are set facing each other and spaced apart to create a gap therebetween; a step B in which a filler is introduced into the gap and plastically deformed in the thickness and end surface directions of the metal sheets so as to conform to the shapes of the first end surface and the second end surface, thereby forming a filled section; and a step C in which at least the probe of a probe-comprising rotary friction-stirring tool is inserted into at least the filled section, and FSP is performed to modify at least the filled section, thereby obtaining a modified metal sheet comprising an FSP section.
B23K 20/12 - Soudage non électrique par percussion ou par une autre forme de pression, avec ou sans chauffage, p. ex. revêtement ou placage la chaleur étant produite par frictionSoudage par friction
The volatilization suppressing component according to the present disclosure has a metallic base material; and a laminated film having at least a first layer formed on a portion or the entirety of a surface of the metallic base material, and a second layer formed on the first layer, wherein the first layer is an adhesive layer between the metallic base material and the second layer, and the second layer is a protective layer for the first layer.
B32B 3/30 - Produits stratifiés comprenant une couche ayant des discontinuités ou des rugosités externes ou internes, ou une couche de forme non planeProduits stratifiés comprenant une couche ayant des particularités au niveau de sa forme caractérisés par une couche continue dont le périmètre de la section droite a une allure particulièreProduits stratifiés comprenant une couche ayant des discontinuités ou des rugosités externes ou internes, ou une couche de forme non planeProduits stratifiés comprenant une couche ayant des particularités au niveau de sa forme caractérisés par une couche comportant des cavités ou des vides internes caractérisés par une couche comportant des retraits ou des saillies, p. ex. des gorges, des nervures
B05D 1/28 - Procédés pour appliquer des liquides ou d'autres matériaux fluides aux surfaces par transfert de liquides ou d'autres matériaux fluides, à partir de la surface d'éléments porteurs, p. ex. de pinceaux, tampons, rouleaux
B05D 3/02 - Traitement préalable des surfaces sur lesquelles des liquides ou d'autres matériaux fluides doivent être appliquésTraitement ultérieur des revêtements appliqués, p. ex. traitement intermédiaire d'un revêtement déjà appliqué, pour préparer les applications ultérieures de liquides ou d'autres matériaux fluides par cuisson
B05D 7/14 - Procédés, autres que le flocage, spécialement adaptés pour appliquer des liquides ou d'autres matériaux fluides, à des surfaces particulières, ou pour appliquer des liquides ou d'autres matériaux fluides particuliers à du métal, p. ex. à des carrosseries de voiture
C03B 5/43 - Utilisation de matériaux pour les parois du four, p. ex. de briques réfractaires
A thermocouple structure according to one aspect of the present disclosure includes a first element wire, second element wires formed of a material different from the first element wire, an insulating covering member covering at least one of the first element wire and the second element wires, and a protective tube accommodating the first element wire and the second element wire. Each of the second element wires is bonded to a different position on the first element wire.
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
G01K 1/08 - Dispositifs de protection, p. ex. étuis
H10N 19/00 - Dispositifs intégrés ou ensembles de plusieurs dispositifs comprenant au moins un élément thermoélectrique ou thermomagnétique couvert par les groupes
48.
METHOD FOR PRODUCING METAL CYLINDER MATERIAL, AND BACKING JIG USED THEREIN
A purpose of the present disclosure is to provide an integrated, high-quality metal cylinder material unaffected by the compression and tension that arise when forming a cylinder shape using a metal plate material, by the ease or difficulty of processing into a cylinder shape, and by the processing accuracy of the end faces of the metal plate material. The method for producing a metal cylinder material according to the present disclosure has: a step A for forming a cylindrical body with slits having at least one slit extending from one end face to the other end face of a cylinder body made of at least one metal plate material; a step B for forming a cylindrical body with filler having a filled portion in which the filler fills the slit so that the entire length direction of the slit is full of filler; and a step C for inserting at least the probe of a friction stirring/rotating tool having a probe into at least the filled portion and modifying at least the filled portion of the cylindrical body with filler by performing FSP to obtain a metal cylinder material equipped with an FSP portion.
B23K 20/12 - Soudage non électrique par percussion ou par une autre forme de pression, avec ou sans chauffage, p. ex. revêtement ou placage la chaleur étant produite par frictionSoudage par friction
The purpose of the present disclosure is to provide a sputtering target with enhanced conductivity, for example, a sputtering target that enhances the productivity when a film is formed by using a DC sputtering apparatus. A sputtering target according to the present disclosure is characterized in that, in an aluminum matrix, (1) a material or phase containing aluminum, and further containing one of or both a rare earth element and a titanium group element, or (2) a material or phase containing one of or both a rare earth element and a titanium group element is present at a content of 10-70 mol%.
The purpose of the present disclosure is to provide a sputtering target which suppresses a chlorine element, which is foreign matter, from being mixed into the sputtering target, wherein when a thin film is formed using the sputtering target, the occurrence of abnormal discharge due to chlorine can be suppressed, and a thin film having good orientation can be formed. The sputtering target of the present disclosure contains aluminum and further contains either or both of a rare earth element and a titanium group element, and the content of chlorine is 100 ppm or less.
The purpose of the present disclosure is to provide a sputtering target which is reduced in the contamination with fluorine element that is an impurity, and whereby it becomes possible to prevent the occurrence of fluorine-induced abnormal discharging and to form a thin film having good orientation properties when a thin film is formed using the sputtering target. The sputtering target of the present disclosure contains aluminum and further contains one or both of a rare earth element and a titanium-group element, and is characterized in that the content of fluorine is 100 ppm or less.
The purpose of the present disclosure is to provide: a Ru-based sputtering target which has no void, high purity and a low level of structural anisotropy and which makes it possible to form a Ru-based film having low particle count, high film thickness uniformity and high two-dimensional uniformity; and a method for manufacturing the Ru-based sputtering target. The ruthenium-based sputtering target of the present disclosure has a cast structure, wherein a sputter surface of the sputtering target has at least two regions, and crystal surfaces in the regions each of which is specified by a main peak of X-ray diffraction are different from each other.
The purpose of the present invention is to provide a supported catalyst synthesis device capable of stably mass-producing supported catalysts and reducing the diameter of single-metal fine particles or solid solution fine particles to about 0.5-2 nm in a supported catalyst in which the single-metal fine particles or the solid solution fine particles are supported on carrier particles. A supported catalyst synthesis device according to the present invention has: a first supply source of a liquid which contains a reducing agent; a second supply source of a liquid which contains an element constituting single-metal fine particles or solid solution fine particles to be supported; a third supply source of a liquid which contains carrier particles; a reaction part (D) which synthesizes the liquids; a liquid feeding route (A) for connecting the first supply source to the reaction part (D); a liquid feeding route (B) for connecting the second supply source to the reaction part (D); a liquid feeding route (C) for connecting the third supply source to the reaction part (D); and a recovery part (E) that is connected to the reaction part (D) through a pipe and that recovers a generated reactant. The supported catalyst synthesis device further has a pressure adjustment mechanism (F) connected to the recovery part (E).
B22F 9/24 - Fabrication des poudres métalliques ou de leurs suspensionsAppareils ou dispositifs spécialement adaptés à cet effet par un procédé chimique avec réduction de mélanges métalliques à partir de mélanges métalliques liquides, p. ex. de solutions
B82Y 40/00 - Fabrication ou traitement des nanostructures
54.
WATER ELECTROLYSIS CATALYST FOR FUEL CELL ANODE, ANODE CATALYST COMPOSITION, AND MEMBRANE ELECTRODE ASSEMBLY
xy22 (x and y satisfy x+y=1.0), and the powder X-ray diffraction (CuKα) of the solid solution composite oxide has one diffraction maximum peak in the range of 2θ=66.10°-67.00°.
The purpose of the present disclosure is to provide a method of producing a high-fluidity solid spherical powder that has high yield and makes it easy to mold to a desired grain size by using a high-melting-point and difficult-to-process material as the raw material, as well as to provide a method of producing a shaped product of a high relative density using the solid spherical powder as an additional production material. The method of producing a solid spherical powder as in the present disclosure comprises: an A-step for preparing a first raw powder material containing agglomerated particles and/or consolidated particles having a particle diameter of 1 to 1000 μm, introducing the first raw powder material into a plasma flame, and preparing a hollow spherical powder the particles of which have a surface shell 1 to 50 μm thick; a B-step for running the hollow spherical powder through a crushing process to crush the hollow shape of the hollow spherical powder and obtain a second raw powder material that is solid; and a C-step for introducing the second raw powder material into a plasma flame, and melting and solidifying same to obtain a solid spherical powder.
B22F 3/105 - Frittage seul en utilisant un courant électrique, un rayonnement laser ou un plasma
B22F 3/16 - Compactage et frittage par des opérations successives ou répétées
B22F 9/14 - Fabrication des poudres métalliques ou de leurs suspensionsAppareils ou dispositifs spécialement adaptés à cet effet par des procédés physiques en utilisant des décharges électriques
The present disclosure addresses the problem of providing: a volatilization suppressing component which rarely undergoes the delamination of a coating layer or the propagation of cracks that may provide oxygen invasion pathways; and a method for manufacturing the volatilization suppressing component with improved productivity. The volatilization suppressing component according to the present disclosure comprises a metallic base material and a laminate film that comprises at least a first layer formed on a part or the whole area of the surface of the metallic base material and a second layer formed on the first layer, wherein the first layer is an adhesive layer to both of the metallic base material and the second layer and the second layer is a protective layer for the first layer.
C23C 28/04 - Revêtements uniquement de matériaux inorganiques non métalliques
B32B 15/04 - Produits stratifiés composés essentiellement de métal comprenant un métal comme seul composant ou comme composant principal d'une couche adjacente à une autre couche d'une substance spécifique
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
G01K 1/00 - Détails des thermomètres non spécialement adaptés à des types particuliers de thermomètres
G01K 1/08 - Dispositifs de protection, p. ex. étuis
G01K 13/02 - Thermomètres spécialement adaptés à des fins spécifiques pour mesurer la température de fluides en mouvement ou de matériaux granulaires capables de s'écouler
58.
ANTIBACTERIAL POROUS MATERIAL, ANTIBACTERIAL PRODUCT CONTAINING THIS, AND ANTIBACTERIAL METHOD USING THIS
A01N 25/08 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, caractérisés par leurs formes, ingrédients inactifs ou modes d'applicationSubstances réduisant les effets nocifs des ingrédients actifs vis-à-vis d'organismes autres que les animaux nuisibles contenant des solides comme supports ou diluants
A01P 1/00 - DésinfectantsComposés antimicrobiens ou leurs mélanges
C09D 1/00 - Compositions de revêtement, p. ex. peintures, vernis ou vernis-laques, à base de substances inorganiques
C09D 7/62 - Adjuvants non macromoléculaires inorganiques modifiés par traitement avec d’autres composés
C09D 201/00 - Compositions de revêtement à base de composés macromoléculaires non spécifiés
59.
ANTI-MOLD POROUS MATERIAL, ANTI-MOLD PRODUCT CONTAINING THIS, AND ANTI-MOLD METHOD USING THIS
The purpose of the present invention is to provide an anti-mold porous material that is harmless to humans and the environment and that has anti-mold capability. This anti-mold porous material, in which particles containing a platinum group metal are supported on porous silica, is characterized in that the pore diameter of the anti-mold porous material is 1-50 nm, and the BET specific surface area is 300-2000 m2/g.
A01N 25/08 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, caractérisés par leurs formes, ingrédients inactifs ou modes d'applicationSubstances réduisant les effets nocifs des ingrédients actifs vis-à-vis d'organismes autres que les animaux nuisibles contenant des solides comme supports ou diluants
The purpose of the present disclosure is to provide a thermocouple structure and a method for manufacturing the same, said thermocouple structure being less susceptible to measurement temperature deviation resulting from thermocouple drift, being less susceptible to protective tube or protective film fracturing/breaking resulting from deposits adhered to the surface of the protective tube or protective film, and preventing temperature measurement junction movement resulting from thermocouple vibration or the like. A thermocouple structure 100 according to the present disclosure comprises a thermocouple 1 in which one end of a positive electrode wire 1a and one end of a negative electrode wire 1b are joined, and one columnar glass body 2. The positive electrode wire 1a and negative electrode wire 1b, which include a thermocouple junction 1c, are embedded in parallel along the length direction of the columnar glass body 2 so as to only come into contact with each another at the thermocouple junction 1c. The other end side of the positive electrode wire 1a and the other end side of the negative electrode wire 1b are drawn out to the outside of the columnar glass body 2.
G01K 1/08 - Dispositifs de protection, p. ex. étuis
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
61.
REPAIR/MODIFICATION METHOD FOR METALLIC SUBSTRATES
The purpose of the present invention is to provide a repair/modification method for metallic substrates that is capable of reducing both defects and regions of interface in the interior of a structural body by means of modifying the arrangement deep into the interior of a structural body while preventing impurities that, for example, originate with a probe on a friction stir welding tool from being mixed into the interior of the structural body. The repair/modification method for metallic substrates pertaining to the present invention involves: a step for preparing a metallic substrate having a first region that is divided in the in-plane direction of the substrate and contains a defect and/or a structurally discontinuous part; and a step for repairing the defect and/or modifying the structurally discontinuous part by causing a probeless friction tool to be rotatingly pressed against the surface of the first region, thereby generating frictional heat while pressing on the surface.
C22F 1/14 - Modification de la structure physique des métaux ou alliages non ferreux par traitement thermique ou par travail à chaud ou à froid des métaux nobles ou de leurs alliages
B23K 20/12 - Soudage non électrique par percussion ou par une autre forme de pression, avec ou sans chauffage, p. ex. revêtement ou placage la chaleur étant produite par frictionSoudage par friction
C22F 1/08 - Modification de la structure physique des métaux ou alliages non ferreux par traitement thermique ou par travail à chaud ou à froid du cuivre ou de ses alliages
62.
DECOMPOSING MATERIAL AND DECOMPOSITION METHOD USING SAME
The purpose of the present disclosure is to provide a decomposing material that is superior in catalytic activity and durability to conventional powdery catalysts. The decomposing material according to the present disclosure comprises a substrate and a coating film formed on a surface of the substrate and is characterized in that the coating film comprises mesoporous silica which carries platinum group element-containing particles as a catalyst. This decomposing material is capable of decomposing an odor substance, which contains at least one kind of volatile compound selected from among aldehydes, fatty acids, sulfide compounds and nitrogen compounds, and/or ethylene even at a low temperature.
A powder coating apparatus which can form a thin film in which freely selected elements are combined without an impurity being mixed and satisfies that a composition of the obtained thin film is uniform. The powder coating apparatus according to the present invention is a powder coating apparatus including a barrel, exhaust device for evacuating an inside of the barrel, and a sputtering device installed inside the barrel, the barrel having a main axis C directed in a horizontal direction and rotating around the main axis, the sputtering device forming a coating film on a surface of powder put in the barrel, in which the sputtering device has one fixing portion for one target to mount two or more targets, and respective targets are disposed in parallel to each other at the same level position with respect to a direction of the main axis when the target is mounted on the fixing portion.
C23C 14/22 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le procédé de revêtement
H01J 37/34 - Tubes à décharge en atmosphère gazeuse fonctionnant par pulvérisation cathodique
C23C 14/35 - Pulvérisation cathodique par application d'un champ magnétique, p. ex. pulvérisation au moyen d'un magnétron
C23C 14/18 - Matériau métallique, bore ou silicium sur d'autres substrats inorganiques
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
A tool for friction stir welding includes a tool part, a shank part and a cap part. The tool part and the shank part have a hexagonal frustum-shaped concave section and a hexagonal frustum-shaped convex section to enable movement of the tool part with respect to the shank part in a direction parallel to an axis of rotation while movement of the tool part with respect to the shank part in a direction around the axis of rotation is restricted, by the hexagonal frustum-shaped concave section and the hexagonal frustum-shaped convex section of the tool part and the shank part are fitted to each other. After the hexagonal frustum-shaped concave section and the hexagonal frustum-shaped convex section are fitted to each other, by the tool part and the shank part being covered by the cap part, the tool part is fixed to the shank part.
B23K 20/12 - Soudage non électrique par percussion ou par une autre forme de pression, avec ou sans chauffage, p. ex. revêtement ou placage la chaleur étant produite par frictionSoudage par friction
a has: a thermocouple having thermocouple wires 16, 18, a thermocouple temperature measuring junction 14, and an insulating tube 12; a first protection tube 20 surrounding the thermocouple, while at least partially spaced apart from the thermocouple wires 16, 18 and others of the thermocouple; and a second protection tube 22 surrounding the first protection tube 20, while at least partially spaced apart from the first protection tube 20. For this reason, it becomes feasible to protect the thermocouple from the external environment, while preventing the thermocouple from reacting with the first protection tube 20. Furthermore, it becomes feasible to protect the thermocouple and the first protection tube 20 from the external environment, while preventing the first protection tube 20 from reacting with the second protection tube 22.
G01K 7/00 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur
G01K 1/00 - Détails des thermomètres non spécialement adaptés à des types particuliers de thermomètres
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
G01K 1/10 - Dispositifs de protection, p. ex. étuis pour prévenir les dommages d'origine chimique
G01K 1/08 - Dispositifs de protection, p. ex. étuis
The objective of the present invention is to provide a thermocouple with which it is possible to prevent a reduction in the strength of a temperature measuring contact point portion while maintaining temperature response characteristics and productivity in comparison with a conventional thermocouple. A thermocouple (1) according to the present invention includes two wires (2, 3) and a clamping member (4), and is provided with a temperature measuring contact point portion (5) by bringing distal end portions of each of the two wires (2, 3) into parallel contact with one another and clamping the same using the clamping member (4). The following formulae are satisfied, where: d1, d2 (where d1 ≥ d2) are the respective diameters of the two wires (2, 3); L is the length of the temperature measuring contact point portion (5) in the length direction of the two wires (2, 3); D is the maximum width of the temperature measuring contact point portion (5) in the parallel arrangement direction of the two wires (2, 3); and E is the maximum width of the temperature measuring contact point portion (5) in a direction orthogonal to the parallel arrangement direction, in a cross section through the temperature measuring contact point portion (5). Formula (1) 0.5 × (d1 + d2) ≤ L ≤ 5 × (d1 + d2) Formula (2) 1 × (d1 + d2) < D ≤ 5 × (d1 + d2) Formula (3) 1.4 × d1 < E ≤ 8 × d1
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
67.
Friction stir welding tool including a dovetail connection
A tool for friction stir welding includes a tool part, a shank part and a cap part. The tool part and the shank part have a hexagonal frustum-shaped concave section and a hexagonal frustum-shaped convex section to enable movement of the tool part with respect to the shank part in a direction parallel to an axis of rotation while movement of the tool part with respect to the shank part in a direction around the axis of rotation is restricted, by the hexagonal frustum-shaped concave section and the hexagonal frustum-shaped convex section of the tool part and the shank part are fitted to each other. After the hexagonal frustum-shaped concave section and the hexagonal frustum-shaped convex section are fitted to each other, by the tool part and the shank part being covered by the cap part, the tool part is fixed to the shank part.
B23K 20/12 - Soudage non électrique par percussion ou par une autre forme de pression, avec ou sans chauffage, p. ex. revêtement ou placage la chaleur étant produite par frictionSoudage par friction
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
Produits et services
Chemicals, namely, chemicals for decomposing ethylene into carbon dioxide and water; chemicals for decomposing odor compounds into odorless compounds; and chemicals for the manufacturing of antibacterial and antimold products; Compositions for catalysts in the nature of catalyst support supporting noble metal fine particles; Chemical preparations for the purification of gas; Catalysts for chemical decomposition processes; catalysts for use in maintaining freshness of fresh produce, fresh vegetables, fresh fruit and fresh flowers; Catalyst for deodorization; Catalyst for the purification of exhaust gas; Inorganic oxidation catalyst; Catalyst for chemical process
69.
FLUORINE-SUBSTITUTED IRIDIUM COMPLEX, AND LIGHT-EMITTING MATERIAL AND ORGANIC LIGHT-EMITTING ELEMENT EACH USING SAID COMPOUND
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japon)
FURUYA METAL CO., LTD. (Japon)
Inventeur(s)
Konno, Hideo
Sugita, Yoshiro
Ito, Takashi
Abrégé
The purpose of the present invention is to provide a novel blue light-emitting iridium complex which can be used in an organic electroluminescent element, an organic electrochemical light-emitting element and others and particularly has superior sublimability compared with the conventional iridium complexes. The iridium complex according to the present invention is characterized by being represented by general formula (1). (In general formula (1), N represents a nitrogen atom; F represents a fluorine atom; Ir represents an iridium atom; R1 represents an alkyl group; m represents 2 or 3, and n represents 0 or 1, provided that m + n = 3; and L represents a monoanionic bidentate ligand.)
C07F 15/00 - Composés contenant des éléments des groupes 8, 9, 10 ou 18 du tableau périodique
C09K 11/06 - Substances luminescentes, p. ex. électroluminescentes, chimiluminescentes contenant des substances organiques luminescentes
H01L 51/50 - Dispositifs à l'état solide qui utilisent des matériaux organiques comme partie active, ou qui utilisent comme partie active une combinaison de matériaux organiques et d'autres matériaux; Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de tels dispositifs ou de leurs parties constitutives spécialement adaptés pour l'émission de lumière, p.ex. diodes émettrices de lumière organiques (OLED) ou dispositifs émetteurs de lumière à base de polymères (PLED)
70.
RED-EMITTING IRIDIUM COMPLEX, AND LIGHT-EMITTING MATERIAL AND ORGANIC LIGHT-EMITTING ELEMENT EACH UTILIZING SAID COMPOUND
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japon)
FURUYA METAL CO., LTD. (Japon)
Inventeur(s)
Konno, Hideo
Sugita, Yoshiro
Ito, Takashi
Abrégé
The purpose of the present invention is to provide a novel iridium complex which can be used in an organic electroluminescent element, an organic electrochemical light-emitting element and the like, exhibits properties of emitting red light having better color purity compared with the conventional compounds, and has excellent sublimation properties. The iridium complex according to the present invention is characterized by being represented by general formula (1). (In general formula (1), N represents a nitrogen atom; Ir represents an iridium atom; R1 to R9 independently represent a hydrogen atom, an alkyl group or a halogen atom; and R10 to R17 independently represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, a heterocyclic group, an aryloxy group, a cyano group or a halogen atom.)
C07F 15/00 - Composés contenant des éléments des groupes 8, 9, 10 ou 18 du tableau périodique
C09K 11/06 - Substances luminescentes, p. ex. électroluminescentes, chimiluminescentes contenant des substances organiques luminescentes
H01L 51/50 - Dispositifs à l'état solide qui utilisent des matériaux organiques comme partie active, ou qui utilisent comme partie active une combinaison de matériaux organiques et d'autres matériaux; Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de tels dispositifs ou de leurs parties constitutives spécialement adaptés pour l'émission de lumière, p.ex. diodes émettrices de lumière organiques (OLED) ou dispositifs émetteurs de lumière à base de polymères (PLED)
71.
IRIDIUM COMPLEX, LIGHT-EMITTING MATERIAL USING COMPOUND, AND ORGANIC LIGHT-EMITTING ELEMENT
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japon)
FURUYA METAL CO., LTD. (Japon)
Inventeur(s)
Konno, Hideo
Sugita, Yoshiro
Ito, Takashi
Abrégé
The purpose of the present invention is to provide a novel iridium complex which can be applied to an organic electroluminescent element, an organic electrochemical luminescent element, or the like, and which exhibits light emission particularly in the blue region. The iridium complex pertaining to the present invention is characterized by being represented by general formula (1). (In general formula (1): N represents a nitrogen atom; Ir represents iridium; X represents C(R6) or a nitrogen atom; R1 through R3 each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an amino group, an aryloxy group, or a halogen atom; and R4 through R6 each independently represent a hydrogen atom, an alkyl group, an alkoxy group, or an aryloxy group. However, at least one of R4 and R5 is an alkyl group or an alkoxy group. R1 and R2, and R2 and R3 may be bonded to form a ring structure. In general formula (1), m = 1 to 3, n = 0 to 2, and m + m = 3, and L represents a monoanionic bidentate ligand.)
C07F 15/00 - Composés contenant des éléments des groupes 8, 9, 10 ou 18 du tableau périodique
C09K 11/06 - Substances luminescentes, p. ex. électroluminescentes, chimiluminescentes contenant des substances organiques luminescentes
H01L 51/50 - Dispositifs à l'état solide qui utilisent des matériaux organiques comme partie active, ou qui utilisent comme partie active une combinaison de matériaux organiques et d'autres matériaux; Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de tels dispositifs ou de leurs parties constitutives spécialement adaptés pour l'émission de lumière, p.ex. diodes émettrices de lumière organiques (OLED) ou dispositifs émetteurs de lumière à base de polymères (PLED)
72.
Stirrer for glass melting, and glass melting furnace
A stirrer for glass melting which can be used over a prolonged life expectancy, while maintaining a high strength, even in an environment exposed to a high temperature and an oxygen-containing gas atmosphere for a long period of time, and can prevent the air bubbles from being mixed into the glass melt. A stirrer for glass melting is made of iridium or an iridium-based alloy, and has a rotary shaft and a stirring part, a surface region S1 of the surface of the rotary shaft above the stirring part is covered with a cylindrical cover, the cover has a two-layer structure in which an outer layer made of platinum or a platinum rhodium alloy and an inner layer made of platinum or a platinum rhodium alloy containing metal species are joined together, and oxide particles of metal species are precipitated in a dispersed state on a surface of the inner layer on an opposite side to a surface adjacent to the outer layer, wherein the stirrer for glass melting has a pipe made of iridium or an iridium-based alloy which surrounds at least the surface region S2 of the cover from the lower end of the cover to a predetermined height at an interval.
A platinum wire in which crystal grain growth is slowed in order to prevent damage caused by creep without dispersing a metal oxide, and occurrence of slip at crystal grain boundaries is slowed. A platinum thermocouple wire that is used in a negative electrode of a platinum-based thermocouple and has a nitrogen mass concentration of 10 to 100 ppm, and when structure observation of the cross section of the wire in a longitudinal direction is performed, a structure is observed in which there is a plurality of crystal grains, which have an aspect ratio {(length of major axis)/(length of minor axis perpendicular to major axis)} of 5 or more and elongate in the longitudinal direction of the wire, in a wire thickness direction.
C22C 5/04 - Alliages à base d'un métal du groupe du platine
C22F 1/14 - Modification de la structure physique des métaux ou alliages non ferreux par traitement thermique ou par travail à chaud ou à froid des métaux nobles ou de leurs alliages
H01L 35/20 - Emploi d'un matériau spécifié pour les bras de la jonction utilisant des compositions inorganiques comprenant des métaux uniquement
74.
THERMOCOUPLE MOUNTING STRUCTURE AND THERMOCOUPLE MOUNTING METHOD
The purpose of the present invention is to achieve a long-life thermocouple junction without causing strength degradation due to fusion in a thermocouple mounting structure using a strengthened platinum-based thermocouple. The present invention provides a thermocouple mounting structure comprising an implement 1 that is formed using platinum, a platinum alloy, or an oxide dispersion-strengthened alloy, a strengthened platinum-based thermocouple 11, and a mounting part 4 at which a temperature measuring connection point 10 of the strengthened platinum-based thermocouple 11 is fixed to the portion to be measured of the implement, wherein the strengthened platinum-based thermocouple 11 has high-temperature strength such that the breakage time when a stress of 10 MPa is applied in an atmosphere of 1,100°C is at least 100 hours, the wire diameter of the strengthened platinum-based thermocouple 11 is between 0.1 mm and 2.0 mm, and the temperature measuring connection point 10 is diffusion bonded.
G01K 1/14 - SupportsDispositifs de fixationDispositions pour le montage de thermomètres en des endroits particuliers
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
75.
POWDER COATING APPARATUS AND METHOD FOR USING SAME
The purpose of the present invention is to provide a powder coating apparatus having a mechanism for leveling the surface of a powder when forming a film. The powder coating apparatus 100 according to the present invention comprises: a barrel 3; an air discharge means 4 for evacuating the barrel; and a sputtering device 2 provided in the barrel and having at least one target 6. The barrel has a main axis C oriented in the horizontal direction and rotates around the main axis C. The sputtering device forms a coating film on the surface of a powder 7 in the barrel. The powder coating apparatus 100 further comprises a component 13 for preventing upward movement of the powder and a powder leveling component 9. The component 13 for preventing upward movement of the powder is fixed to a part of the sputtering device which does not correspond to the target itself and a part electrically connected to the target or attached to a component modularized with the sputtering device so as to be secured.
The purpose of the present invention is to provide a powder coating apparatus in which there is no intermixing of impurities, which is able to form thin films in which freely selected elements have been combined and which meet the requirement that the composition of the thin film obtained is uniform. The present invention is a powder coating apparatus 100, which comprises a barrel 3, a discharge means 4 for evacuating the interior of the barrel, and a sputtering device 2 that is set inside the barrel and in which the barrel has a main shaft C oriented horizontally and rotates centered on the main shaft and the sputtering device forms a coating film on the surface of a powder 7 that has been placed in the barrel, wherein in order to install at least two targets 2 in the sputtering device, the sputtering device has one fixing part 10 per one target and when the targets are installed on the fixing parts, the respective targets are disposed parallel to each other at the same position with respect to the direction of the main shaft.
Method of producing a target having a small average crystal grain size of gold or platinum and having a uniform crystal grain size in an in-plane direction of a target surface and a thickness direction of the target in order to further stabilize film deposition characteristics during sputtering. The method for producing a gold or platinum target includes an ingot production step for casting molten gold or platinum to obtain an ingot; a primary forging step for forging the ingot in a first temperature range; a step for cooling the primary forged ingot to a second temperature range lower than the first temperature range; a secondary forging step for determining six directions for the cooled primary forged ingot and further forging the cooled primary forged ingot from the six directions in the second temperature range; a cross-rolling processing step for adjusting the temperature of the secondary forged ingot to a third temperature range and subjecting the secondary forged ingot to cross-rolling processing to form the secondary forged ingot into a target shape; and a heat treatment step for heat-treating the target-shaped ingot in a fourth temperature range.
C22F 1/14 - Modification de la structure physique des métaux ou alliages non ferreux par traitement thermique ou par travail à chaud ou à froid des métaux nobles ou de leurs alliages
H01J 37/34 - Tubes à décharge en atmosphère gazeuse fonctionnant par pulvérisation cathodique
B21J 1/02 - Traitement préliminaire des matériaux métalliques sans mise en forme particulière, p. ex. conservation des propriétés physiques de certaines zones, forgeage ou pressage des pièces à l'état brut
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japon)
FURUYA METAL CO., LTD. (Japon)
Inventeur(s)
Konno, Hideo
Sugita, Yoshiro
Ito, Takashi
Abrégé
The purpose of the present invention is to provide a novel iridium complex which can be applied in an organic electroluminescent element, an organic electrochemical light-emitting element, or the like, and which is thermally stable and has excellent sublimation properties. An iridium complex characterized by being represented by general formula (1). (In general formula (1), R1 through R11 and R13, R14, and R18 represent hydrogen atoms, C1-30 alkyl groups, C6-30 aryl groups, halogen atoms, or cyano groups. R12, R15 through R17, and R19 represent hydrogen atoms, C1-30 alkyl groups, halogen atoms, or cyano groups. The abovementioned alkyl groups may be substituted with aryl groups, halogen atoms, or cyano groups. The abovementioned aryl groups may be substituted with alkyl groups, halogen atoms, or cyano groups. The adjacent R12 through R19 may be bonded to form a condensed ring. In general formula (1), m is an integer of 1 or 2, n is an integer of 1 or 2, and m + n is 3.)
C07F 15/00 - Composés contenant des éléments des groupes 8, 9, 10 ou 18 du tableau périodique
C09K 11/06 - Substances luminescentes, p. ex. électroluminescentes, chimiluminescentes contenant des substances organiques luminescentes
H01L 51/50 - Dispositifs à l'état solide qui utilisent des matériaux organiques comme partie active, ou qui utilisent comme partie active une combinaison de matériaux organiques et d'autres matériaux; Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de tels dispositifs ou de leurs parties constitutives spécialement adaptés pour l'émission de lumière, p.ex. diodes émettrices de lumière organiques (OLED) ou dispositifs émetteurs de lumière à base de polymères (PLED)
The purpose of the present invention is to provide a method for nanoparticle purification with which it is possible to safely obtain a large amount of nanoparticles in a short time as compared with conventional nanoparticle purification methods. The method for nanoparticle purification according to the present invention is a method for obtaining purified nanoparticles from a dispersion thereof in a solvent A used for synthesizing the nanoparticles. The method comprises: a mixing step in which the dispersion, a solvent B that is miscible with the solvent A, and a solvent C that forms two phases when coexistent with the solvent B are mixed; a concentration step in which the nanoparticles are concentrated in the phase of the solvent C; a cleaning step in which a third phase comprising the phase of the solvent C and the nanoparticles contained therein is formed; and a purification step in which the third phase is taken out and the solvent C is removed from the third phase.
B01D 12/00 - Déplacement d'un liquide au moyen d'un autre liquide, p. ex. en retirant le liquide de solides humides, ou de dispersions de liquides, ou de solides se trouvant dans des liquides
B22F 1/00 - Poudres métalliquesTraitement des poudres métalliques, p. ex. en vue de faciliter leur mise en œuvre ou d'améliorer leurs propriétés
80.
PRODUCTION METHOD OF PRODUCING SUPPORTED CATALYST FREE OF PROTECTIVE POLYMER MATERIALS
The purpose of the present invention is to provide a production method which makes it possible to obtain, more efficiently than by conventional methods, a protective polymer material-free supported catalyst which sufficiently exhibits a catalyst effect without the use of protective polymer materials, which lower the catalyst performance. This production method of a protective polymer material-free supported catalyst, which comprises nanoparticles supported on a carrier and which does not contain a protective polymer material, involves a step 1 in which a mixture which contains a compound serving as the starting material for synthesis of nanoparticles, a carrier, and a reductive organic solvent having two or more carbon atoms and which does not contain a protective polymer material is heated to synthesize the nanoparticles and said nanoparticles are caused to be supported on the carrier.
This method for high-yield production of fine particles comprising a carrier supporting a noble metal solid solution involves a step in which a solution containing a carrier and compounds of two types of noble metals that phase-separate from each other is added to a reductive liquid, wherein the carrier supports a solid solution of PdRu, AgRh or AuRh, where the two types of noble metals are Pd and Ru, Ag and Rh, or Au and Rh.
The purpose of the present invention is to provide a production method which makes it possible to obtain, more efficiently than by conventional methods, a protective polymer material-free supported catalyst which sufficiently exhibits a catalyst effect without the use of protective polymer materials, which lower the catalyst performance. This production method of a protective polymer material-free supported catalyst, which comprises nanoparticles supported on a carrier and which does not contain a protective polymer material, involves a step 1 in which nanoparticles are synthesized and are caused to be supported on the carrier, step 1 comprising: a step 1a for heating a mixture which contains a carrier and a reductive organic solvent having 2 or more carbon atoms and which does not contain a protective polymer material; a step 1b for creating a mixture which contains pure water and a compound serving as a starting material for nanoparticle synthesis and which does not contain a protective polymer material; and a step 1c for mixing the mixture of step 1a and the mixture of step 1b.
A thermocouple that can stably perform direct temperature measurement under a high temperature environment (1500° C. or higher but 2300° C. or lower) and a manufacturing method for the same. A thermocouple according to a first embodiment is a thermocouple including at least a protective tube and element wires, the protective tube and the element wires are insulated from one another by an insulator, and the insulator is either one or both of a powder and a compact, and is composed of at least one of a zirconium oxide, a hafnium oxide, or a composite oxide of zirconium and hafnium.
G01K 7/00 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur
G01K 1/08 - Dispositifs de protection, p. ex. étuis
H01L 35/02 - DISPOSITIFS À SEMI-CONDUCTEURS; DISPOSITIFS ÉLECTRIQUES À L'ÉTAT SOLIDE NON PRÉVUS AILLEURS - Détails - Détails
G01K 1/12 - Dispositifs de protection, p. ex. étuis pour prévenir les dommages dus aux surcharges thermiques
G01K 7/04 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples l'objet à mesurer ne formant pas l'un des matériaux thermo-électriques
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
a has: a thermocouple having thermocouple wires 16, 18, a thermocouple temperature measuring junction 14, and an insulating tube 12; a first protection tube 20 surrounding the thermocouple, while at least partially spaced apart from the thermocouple wires 16, 18 and others of the thermocouple; and a second protection tube 22 surrounding the first protection tube 20, while at least partially spaced apart from the first protection tube 20. For this reason, it becomes feasible to protect the thermocouple from the external environment, while preventing the thermocouple from reacting with the first protection tube 20. Furthermore, it becomes feasible to protect the thermocouple and the first protection tube 20 from the external environment, while preventing the first protection tube 20 from reacting with the second protection tube 22.
G01K 7/00 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur
G01K 1/00 - Détails des thermomètres non spécialement adaptés à des types particuliers de thermomètres
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
G01K 1/10 - Dispositifs de protection, p. ex. étuis pour prévenir les dommages d'origine chimique
G01K 1/08 - Dispositifs de protection, p. ex. étuis
The purpose of the present invention is to provide a multipoint thermocouple having excellent ease of assembly and low positional deviation of temperature measurement junctions. A multipoint thermocouple (1) according to the present invention is provided with: a core rod (10); a stepped part (20) formed by expanding the diameter of at least a portion of the outer peripheral surface of the core rod (10); n (where n is an integer greater than or equal to two) thermocouples (30) having temperature measurement junctions (34) that are formed by passing each of a pair of metal wires (31) through a pair of through holes (33) in an insulation tube (32), causing the same to extend from one end part of the insulation tube (32), and joining the extended parts to each other and disposed in the periphery of the core rod (10) so as to have positions of the temperature measurement junctions (34) that are mutually displaced in the axial direction of the core rod (10); a multi-hole insulation tube part (40) disposed on the end of the insulation tubes (32) opposite from the temperature measurement junction (34) side and having a plurality of peripheral holes (41) through which the metal wires (31) or insulation tubes (32) are passed; and a protective tube (50) for accommodating at least the core rod (10), stepped part (20), and thermocouples (30).
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
86.
STIRRER FOR GLASS MELTING, AND GLASS MELTING FURNACE
The purpose of the present invention is to provide glass-melting stirrer capable of suppressing mixing of bubbles into molten glass and having a long service life while maintaining high strength despite prolonged exposure to high temperature and a gas atmosphere containing oxygen. The glass-melting stirrer (10) pertaining to the present invention comprises iridium or an iridium-based alloy and has a rotary shaft (11) and a stirring part (12), a surface region (S1) of the surface of the rotary shaft above the stirring part being covered by a cylindrical cover (20), the cover having a two-layer structure in which an outside layer (22) comprising platinum or a platinum-rhodium alloy and an inside layer (21) including a metal species and comprising platinum or a platinum-rhodium alloy are joined, oxide particles (23a) of a metal species being deposited in a dispersed state on a surface of the inside layer on a reverse side thereof from the face thereof adjacent to the outside layer, and the glass-melting stirrer (10) having a pipe (30) comprising iridium or an iridium-based alloy for encircling, across a gap, a surface region (S2) of the cover extending from a bottom end of the cover at least to a predetermined height.
The purpose of the present invention is to provide a platinum wire in which crystal growth is slowed to prevent damage resulting from creep without dispersing a metal oxide, and slip at crystal grain boundaries is slowed. A platinum thermocouple wire according to the present invention is used at the negative electrode of a platinum thermocouple and has a nitrogen mass concentration of 10 to 100 ppm. When the structure of the platinum thermocouple wire is observed in the longitudinal direction of the wire, a structure is observed in which there are a plurality of crystal grains in the wire thickness direction having an aspect ratio (major axis length/length of minor axis orthogonal to major axis) extending in the longitudinal direction of the wire of 5 or more.
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
C22C 5/04 - Alliages à base d'un métal du groupe du platine
88.
GOLD OR PLATINUM TARGET, AND PRODUCTION METHOD FOR SAME
The purpose of the present invention is to reduce the average crystal grain size of gold or platinum in a target in order to enhance the consistency of film deposition characteristics during sputtering, and to fabricate a target having uniform average crystal grain size in in-plane directions of the target surfaces and in the thickness direction of the target. This production method for a gold or platinum target has: an ingot fabrication step for casting molten gold or platinum to obtain an ingot; a primary forging step for forging the ingot in a first temperature range; a step for cooling the primary-forged ingot to a second temperature lower than the first temperature range; a secondary forging step for determining six directions, and further forging the cooled primary-forged ingot from the six directions in the second temperature range; a cross-rolling working step for adjusting the secondary-forged ingot to a third temperature range and carrying out cross-rolling working, producing a target shape; and a heat treatment step for heat-treating the target-shaped ingot in a fourth temperature range.
B21B 1/22 - Méthodes de laminage ou laminoirs pour la fabrication des produits semi-finis de section pleine ou de profilésSéquence des opérations dans les trains de laminoirsInstallation d'une usine de laminage, p. ex. groupement de cagesSuccession des passes ou des alternances de passes pour laminer des bandes ou des feuilles en longueurs indéfinies
B21B 3/00 - Laminage des matériaux faits d'alliages particuliers dans la mesure où la nature de l'alliage exige ou permet l'emploi de méthodes ou de séquences particulières
B21J 1/02 - Traitement préliminaire des matériaux métalliques sans mise en forme particulière, p. ex. conservation des propriétés physiques de certaines zones, forgeage ou pressage des pièces à l'état brut
B21J 1/06 - Méthodes ou dispositifs de chauffage ou de refroidissement spécialement adaptés aux opérations de forgeage ou de pressage
B21J 5/00 - Méthodes pour forger, marteler ou presserÉquipement ou accessoires particuliers
C22F 1/14 - Modification de la structure physique des métaux ou alliages non ferreux par traitement thermique ou par travail à chaud ou à froid des métaux nobles ou de leurs alliages
H01L 21/28 - Fabrication des électrodes sur les corps semi-conducteurs par emploi de procédés ou d'appareils non couverts par les groupes
H01L 21/285 - Dépôt de matériaux conducteurs ou isolants pour les électrodes à partir d'un gaz ou d'une vapeur, p. ex. condensation
C22F 1/00 - Modification de la structure physique des métaux ou alliages non ferreux par traitement thermique ou par travail à chaud ou à froid
Provided are: a thermocouple which can perform direct temperature measurements in a stable manner in high-temperature environments (1500 to 2300°C); and a method for producing same. The thermocouple (10) according to a first embodiment has at least a protective tube (16) and element wires (12, 13), and the protective tube (16) and the element wires (12, 13) are insulated from one another by an insulator (15). The insulator (15) is a powder and/or a molding, and is made from at least one of zirconium oxide, hafnium oxide or a composite oxide of zirconium and hafnium.
G01K 1/08 - Dispositifs de protection, p. ex. étuis
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
H01L 35/02 - DISPOSITIFS À SEMI-CONDUCTEURS; DISPOSITIFS ÉLECTRIQUES À L'ÉTAT SOLIDE NON PRÉVUS AILLEURS - Détails - Détails
The purpose of the present invention is to enable a seal part to be reliably secured by a shank part, and to enable the seal part to be easily removed from the shank part. This seal for friction stir welding is provided with a seal part (200a), a shank part (100a), and a cap part (300). The seal part (200a) and the shank part (100a) have a hexagonal frustum-shaped protrusion (211) and a hexagonal frustum-shaped recess (121), respectively, and are able to move parallel to an axis of rotation (11) while the seal part (200a) is restricted to moving around the axis of rotation (11) relative to the shank part (100a) due to the seal part (200a) and the shank part (100a) engaging with each other. After the hexagonal frustum-shaped recess (121) and the hexagonal frustum-shaped protrusion (211) have engaged with each other, the seal part (200a) and the shank part (100a) are covered by the cap part (300), thereby securing the seal part (200a) to the shank part (100a).
B23K 20/12 - Soudage non électrique par percussion ou par une autre forme de pression, avec ou sans chauffage, p. ex. revêtement ou placage la chaleur étant produite par frictionSoudage par friction
Provided is a thermometer that is capable of protecting a thermocouple from the external environment, while preventing layers in a protective tube from reacting with one another. A carbon atmosphere thermometer (10a) is provided with: a thermocouple having thermocouple wires (16, 18), a thermocouple temperature-measuring contact (14), and an insulating tube (12); a first protective tube (20) that encloses the thermocouple, and has at least a portion that is separated from the thermocouple wires (16, 18) etc. of the thermocouple; and a second protective tube (22) that encloses the first protective tube (20), and has at least a portion that is separated from the first protective tube (20). As a result, the thermocouple can be protected from the external environment, while preventing the thermocouple from reacting with the first protective tube (20). Furthermore, the thermocouple and the first protective tube (20) can be protected from the external environment, while preventing the first protective tube (20) from reacting with the second protective tube (22).
G01K 1/08 - Dispositifs de protection, p. ex. étuis
G01K 7/02 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant des éléments thermo-électriques, p. ex. des thermocouples
92.
STRUCTURE FOR PROTECTING HIGH THERMAL DEVICE AND METHOD FOR RECOVERING METALLIC ELEMENT
The objective of the present invention is to provide: a structure that is for protecting a high thermal device and that can easily recover a metal such as a platinum-group metal, causes the high thermal device to have a long use life, and can suppress oxidative vaporization and oxidative degradation even when used in an atmosphere in which oxygen is present and in a high-temperature region; and a method for recovering metallic elements. The structure for protecting a high thermal device is used in a high-temperature region of at least 1200°C, a portion or the entirety of the outer surface of the high thermal device (1) is covered by a ribbon-shaped molded body (2) containing a metal oxide as the primary component, the molded body (2) is affixed in the state of not being adhered to the outer surface of the high thermal device (1), and the molded body (2) suppresses contact between outside air and the outer surface of the high thermal device (1).
C23C 28/00 - Revêtement pour obtenir au moins deux couches superposées, soit par des procédés non prévus dans un seul des groupes principaux , soit par des combinaisons de procédés prévus dans les sous-classes et
C03B 5/43 - Utilisation de matériaux pour les parois du four, p. ex. de briques réfractaires
C22B 7/00 - Mise en œuvre de matériaux autres que des minerais, p. ex. des rognures, pour produire des métaux non ferreux ou leurs composés
C23C 4/10 - Oxydes, borures, carbures, nitrures ou siliciuresLeurs mélanges
C23C 18/02 - Revêtement chimique par décomposition soit de composés liquides, soit de solutions des composés constituant le revêtement, ne laissant pas de produits de réaction du matériau de la surface dans le revêtementDépôt par contact par décomposition thermique
C23C 26/00 - Revêtements non prévus par les groupes
F16L 58/16 - Protection des tuyaux ou des accessoires pour tuyaux contre la corrosion ou l'entartrage au moyen de revêtements internes ou externes le revêtement ayant la forme d'un bandage
The objective of the present invention is to provide a container capable of preventing the ingress of impurities into an intended product without compromising strength even when used in a high-temperature area in an environment where oxygen is present. This container has a multilayer structure having an outer-side layer (3), an inner-side layer (1), and a diffusion-preventing layer (2a) between the outer-side layer and the inner-side layer, the inner-side layer being thinner than the outer-side layer, and the diffusion-preventing layer containing an oxide as a main component and describing the shape of a sheet or other molded article. The outer-side layer and the inner-side layer are set apart from one another, the outer-side layer being formed using at least one element selected from Ru, Mo, Re, Nb, Ta, and W. The inner-side layer is formed using one or two alloys of an element selected from Pt, Ir, and Rh, or using an alloy of Au and at least one element selected from Pt, Ir, or Rh. Neither the boundary between the outer-side layer and the diffusion-preventing layer nor the boundary between the inner-side layer and the diffusion-preventing layer is fixed.
C03B 5/06 - Fusion dans des foursFours, pour autant qu'ils soient spécialement adaptés à la fabrication du verre dans des fours à pots de verrerie
C03B 5/43 - Utilisation de matériaux pour les parois du four, p. ex. de briques réfractaires
C23C 28/00 - Revêtement pour obtenir au moins deux couches superposées, soit par des procédés non prévus dans un seul des groupes principaux , soit par des combinaisons de procédés prévus dans les sous-classes et
94.
COMPOSITE CONTAINING CATALYTIC METAL NANOPARTICLES, AND USE FOR SAME
Provided is a material that, when compared with SAPd, exhibits the same activity in cross-coupling (CC) reactions, can decrease the amount of catalytic metal that is mixed into the reaction product, and increases the number of times use can be repeated. Provided are a catalyst and a catalyst precursor that use a catalytic metal other than Pd and that exhibit the same CC reaction activity as when Pd is used. Provided are a catalyst and a catalyst precursor that exhibit the same CC reaction activity when using Pd or a catalytic metal other than Pd, without using a carrier such as metal and without using piranha solution. A composite wherein catalytic metal nanoparticles are dispersed in a continuous phase comprising a polymer having C2-6 alkylene group units and phenylene group units (an alkylene group unit being bonded to at least the first and fourth position of the phenylene group unit). The particle diameter of the catalytic metal nanoparticles is at most 20nm. A composite structure including a substrate, and the aforementioned composite provided to the surface of the substrate. A method for manufacturing the composite structure by dehydrocondensating, in the presence of a catalytic metal compound, a benzene compound having at least two alkyl groups (two of the alkyl groups being at the first and fourth position) in order to form the composite on the substrate surface.
B01J 31/28 - Catalyseurs contenant des hydrures, des complexes de coordination ou des composés organiques contenant en outre des composés métalliques inorganiques non prévus dans les groupes du groupe du platine, du cuivre ou du groupe du fer
C07C 17/269 - Préparation d'hydrocarbures halogénés par des réactions comportant un accroissement du nombre des atomes de carbone dans le squelette par des réactions de condensation d'hydrocarbures halogénés uniquement
C07C 45/61 - Préparation de composés comportant des groupes C=O liés uniquement à des atomes de carbone ou d'hydrogènePréparation des chélates de ces composés par des réactions ne créant pas de groupe C=O
C07C 49/784 - Cétones comportant un groupe cétone lié à un cycle aromatique à six chaînons polycycliques tous les groupes cétone étant liés à un cycle non condensé
C07D 295/02 - Composés hétérocycliques contenant des cycles polyméthylène imine d'au moins cinq chaînons, des cycles aza-3 bicyclo [3.2.2] nonane, piperazine, morpholine ou thiomorpholine, ne comportant que des atomes d'hydrogène liés directement aux atomes de carbone du cycle contenant uniquement des atomes d'hydrogène et de carbone en plus des hétéro-éléments du cycle
Provided is a temperature-measurement system (10) capable of stably measuring the temperature at one or more locations without producing a standing wave even in a spacious area. The system is equipped with one or more sensor units (20), an antenna system (30) for electromagnetically coupling with the sensor units (20) and forming a resonance circuit, and a measurement means (40) connected to the antenna system (30). The sensor unit (20) is configured so as to connect a piezoelectric vibrator (21) and a coil (22). The antenna system (30) is configured so as to connect one or more antenna units (60) to a transmission line (32) in parallel. The antenna units (60) configure resonance circuits from coils (61) and capacitors (62). The transmission line (32) has one end thereof connected to the output terminal of the measurement means (40), and has the other end thereof terminating at a resistance (33) satisfying a characteristic impedance of the transmission line. The measurement means (40) supplies high-frequency power to the antenna system (30), and receives and observes power reflected from the antenna system (30).
G01K 1/02 - Moyens d’indication ou d’enregistrement spécialement adaptés aux thermomètres
G01K 7/32 - Mesure de la température basée sur l'utilisation d'éléments électriques ou magnétiques directement sensibles à la chaleur utilisant la variation de la fréquence de résonance d'un cristal
96.
FRICTION-STIRRING PROCESSING METHOD FOR OXIDE-DISPERSION-STRENGTHENED PLATINUM
The purpose of the present invention is to provide, in friction-stirring joining of oxide-dispersion-strengthened platinum, a friction-stirring processing method that, through control of the organization of the welding site, can further improve high-temperature strength in a welding area as compared to a case where joining is performed by melt welding or band forge welding, or a friction-stirring processing method that can effectively reform the surface of oxide-dispersion-strengthened platinum. This friction-stirring processing method for oxide-dispersion-strengthened platinum comprises the following: a preparation step in which work pieces (1A, 1A′) formed of oxide-dispersion-strengthened platinum are readied and a contact joining surface (2A) that causes the work pieces to be mutually in contact or substantially in contact is designated as a processing region; a friction-stirring step in which the processing region is friction-stirred with a rotating tool (3) to produce a malleable region in the processing region; a solidification step in which the malleable region is allowed to solidify to form a processed section; and a heat treatment step in which the processed section is heated to at least 600°C and to at least the temperature of the tool used in the friction-stirring step.
B23K 20/12 - Soudage non électrique par percussion ou par une autre forme de pression, avec ou sans chauffage, p. ex. revêtement ou placage la chaleur étant produite par frictionSoudage par friction
B23K 31/00 - Procédés relevant de la présente sous-classe, spécialement adaptés à des objets ou des buts particuliers, mais non couverts par un seul des groupes principaux
C21D 9/50 - Traitement thermique, p. ex. recuit, durcissement, trempe ou revenu, adapté à des objets particuliersFours à cet effet pour joints de soudure
C22C 5/04 - Alliages à base d'un métal du groupe du platine
C22C 32/00 - Alliages non ferreux contenant entre 5 et 50% en poids d'oxydes, de carbures, de borures, de nitrures, de siliciures ou d'autres composés métalliques, p. ex. oxynitrures, sulfures, qu'ils soient soient ajoutés comme tels ou formés in situ
97.
METHOD FOR PRODUCING COMPLEX OF TRISORTHO-METALATED IRIDIUM, LIGHT-EMITTING MATERIAL USING SAID COMPLEX, AND LIGHT-EMITTING ELEMENT
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japon)
FURUYA METAL CO., LTD. (Japon)
Inventeur(s)
Konno, Hideo
Ito, Takashi
Sugita, Yoshiro
Abrégé
The purpose of the present invention is to provide a novel production method for obtaining, at a high selectivity compared to the conventional production method in which a reaction substrate is heated and is subjected to a reaction after being mixed, a complex of trisortho-metalated iridium, in particular, a complex of a facial trisortho-metalated iridium suitably used for a material for an organic electroluminescence element. The method for producing a complex of trisortho-metalated iridium of the present invention involves the following steps in said order: a step (1) for preliminarily heating a complex of ortho-metalated iridium and/or a bidentate organic ligand; a step (2) for combining the complex of ortho-metalated iridium and the bidentate organic ligand; and a step (3) for reacting the complex of ortho-metalated iridium with the bidentate organic ligand.
C07F 15/00 - Composés contenant des éléments des groupes 8, 9, 10 ou 18 du tableau périodique
C09K 11/06 - Substances luminescentes, p. ex. électroluminescentes, chimiluminescentes contenant des substances organiques luminescentes
H01L 51/50 - Dispositifs à l'état solide qui utilisent des matériaux organiques comme partie active, ou qui utilisent comme partie active une combinaison de matériaux organiques et d'autres matériaux; Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de tels dispositifs ou de leurs parties constitutives spécialement adaptés pour l'émission de lumière, p.ex. diodes émettrices de lumière organiques (OLED) ou dispositifs émetteurs de lumière à base de polymères (PLED)
98.
METHOD FOR PRODUCING COMPLEX OF TRISORTHO-METALATED IRIDIUM, LIGHT-EMITTING MATERIAL USING SAID COMPLEX, AND LIGHT-EMITTING ELEMENT
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japon)
FURUYA METAL CO., LTD. (Japon)
Inventeur(s)
Konno, Hideo
Ito, Takashi
Sugita, Yoshiro
Abrégé
The purpose of the present invention is to provide a novel production method for obtaining, at a high selectivity compared to the conventional production method in which a reaction substrate is heated and is subjected to a reaction after being mixed, a complex of trisortho-metalated iridium, in particular, a complex of a facial trisortho-metalated iridium suitably used as a material for an organic electroluminescence element. The method for producing a complex of trisortho-metalated iridium of the present invention is a method for producing a complex of trisortho-metalated iridium represented by chemical formula (6) by reacting, as the reaction substrate, a complex of ortho-metalated iridium represented by chemical formula (4) with a bidentate organic ligand represented by chemical formula (5), the method involving the following steps in said order: a step (1) for preliminarily heating a reaction solvent; a step (2) for adding the complex of ortho-metalated iridium and the bidentate organic ligand to the preliminarily-heated reaction solvent; and a step (3) for reacting the complex of ortho-metalated iridium with the bidentate organic ligand.
C07F 15/00 - Composés contenant des éléments des groupes 8, 9, 10 ou 18 du tableau périodique
C09K 11/06 - Substances luminescentes, p. ex. électroluminescentes, chimiluminescentes contenant des substances organiques luminescentes
H01L 51/50 - Dispositifs à l'état solide qui utilisent des matériaux organiques comme partie active, ou qui utilisent comme partie active une combinaison de matériaux organiques et d'autres matériaux; Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de tels dispositifs ou de leurs parties constitutives spécialement adaptés pour l'émission de lumière, p.ex. diodes émettrices de lumière organiques (OLED) ou dispositifs émetteurs de lumière à base de polymères (PLED)
99.
INNER CYLINDER FOR PRESSURE CONTAINER AND PROCESS FOR PRODUCTION THEREOF
The purpose of the present invention is to provide: an inner cylinder for a pressure container in which durability can be imparted to a flange and which can be used under supercritical conditions even when a material for coating the inner surface of the pressure container and a material for forming the flange are different from each other; and a process for producing the inner cylinder for a pressure container. This inner cylinder for a pressure container has such a structure that a main body (81) and a lid (91) of a pressure container (901) together form a seal part and tightly seal the inside of the pressure container (901). The cylinder comprises cover parts (86, 96) which cover the inner surface of the pressure container, flange-attaching parts which extend from the entire circumferences of the edge parts of the cover parts toward the centrifugal direction, and ring-shaped flanges (84, 94) which are respectively bonded to the flange-attaching parts (85, 95), wherein the cover parts and the corresponding flange-attaching parts are respectively processed in an integrated manner and comprise platinum or a platinum alloy, the flanges comprise iridium, ruthenium or an alloy containing at least one element selected from iridium and ruthenium, and the bonding is diffusion bonding.
C30B 7/10 - Croissance des monocristaux à partir de solutions en utilisant des solvants liquides à la température ordinaire, p. ex. à partir de solutions aqueuses par application d'une pression, p. ex. procédés hydrothermiques
Provided is a platinum molded article having a hardened surface, which has excellent self-weight deformation resistance even if the platinum molded article is thin, hardly deforms and is easy handle, has corrosion resistance and durability under high temperatures and pressure, and can prevent platinum particle growth and particle boundary corrosion in a reducing atmosphere, and also provided is a method for hardening the surface of a platinum molded article. The method for hardening the surface of a platinum molded article comprises: an application step for forming an application layer by applying an application solution containing an iridium salt and/or ruthenium salt to the surface of a platinum molded article (20); and a pyrolysis step for pyrolysis of the application layer in a nitrogen gas atmosphere or in a flame in order to convert the application layer to a coating layer (30) comprising iridium, ruthenium, or an alloy containing iridium and/or ruthenium.
C23C 18/08 - Revêtement chimique par décomposition soit de composés liquides, soit de solutions des composés constituant le revêtement, ne laissant pas de produits de réaction du matériau de la surface dans le revêtementDépôt par contact par décomposition thermique caractérisée par le dépôt d'un matériau métallique
B01J 3/04 - Récipients sous pression, p. ex. autoclaves
B01J 19/02 - Appareils caractérisés par le fait qu'ils sont construits avec des matériaux choisis pour leurs propriétés de résistance aux agents chimiques
C23C 28/00 - Revêtement pour obtenir au moins deux couches superposées, soit par des procédés non prévus dans un seul des groupes principaux , soit par des combinaisons de procédés prévus dans les sous-classes et
