Abrégé

The invention relates to a source of electron beams which is suitable for selective additive manufacturing, comprising a cathode, the cathode comprising an emission region suitable for emitting electrons, a main Wehnelt electrode, an anode and a set of power supply units suitable for applying an electric voltage to these three parts, the main Wehnelt electrode being positioned between the cathode and the anode, said source comprising an additional Wehnelt electrode and a power supply unit suitable for applying an electric voltage to said additional Wehnelt electrode, said additional Wehnelt electrode being disposed upstream of the main Wehnelt electrode in the direction of propagation of the electron beam in such a way that a first control surface of the additional Wehnelt electrode surrounds an upstream portion of the emission region in the direction of propagation of the electron beam, and a second control surface of the main Wehnelt electrode surrounds a downstream portion of the emission region in the direction of propagation of the electron beam.

Classes IPC  ?

• H01J 37/305 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour couler, fondre, évaporer ou décaper
• B33Y 30/00 - Appareils pour la fabrication additiveLeurs parties constitutives ou accessoires à cet effet
• B33Y 10/00 - Procédés de fabrication additive
• H01J 37/063 - Disposition géométrique des électrodes pour la formation du faisceau
• H01J 37/075 - Canons à électrons utilisant l'émission thermo-ionique de cathodes chauffées par bombardement de particules ou par irradiation, p. ex. par laser
• H01J 37/06 - Sources d'électronsCanons à électrons

Abrégé

The invention relates to an apparatus for manufacturing a three-dimensional object by selective additive manufacturing, comprising, in a chamber, a support for depositing successive layers of additive manufacturing powder, a distribution arrangement suitable for applying a layer of powder on the support or on a previously consolidated layer, at least one electron beam source suitable for selectively consolidating a powder layer applied by the distribution arrangement and electronics for controlling and feeding the source, characterised in that the source is an indirectly heated cathode electron beam source, the source comprising a heating filament (22) located behind the cathode (21) of the source with respect to the direction in which the electrons are ejected and accelerated by the cathode (21).

Classes IPC  ?

• B22F 3/105 - Frittage seul en utilisant un courant électrique, un rayonnement laser ou un plasma
• B23K 15/00 - Soudage ou découpage par faisceau d'électrons
• H01J 37/317 - Tubes à faisceau électronique ou ionique destinés aux traitements localisés d'objets pour modifier les propriétés des objets ou pour leur appliquer des revêtements en couche mince, p. ex. implantation d'ions
• B28B 1/00 - Fabrication d'objets façonnés à partir du matériau
• H01J 1/14 - Cathodes thermo-ioniques solides caractérisées par le matériau constitutif
• H01J 1/22 - Dispositifs de chauffage
• H01J 19/06 - Cathodes thermo-ioniques caractérisées par le matériau
• H01J 19/16 - Dispositifs de chauffage