Abrégé

Provided is a soft X-ray static electricity removal apparatus that has a simple structure and emits an increased amount of ionized air. This soft X-ray static electricity removal apparatus (1) has: a soft X-ray generation device (90) that generates soft X-rays (92); a container (10) having an outlet (12) from which ionized air (100) ionized by the soft X-rays flows out; a soft X-ray shielding sheet (20) that is used at the outlet of the container, and that has a first outer layer sheet (30), an intermediate layer sheet (34), and a second outer layer sheet (40) which are made of a material which does not allow passage of the soft X-rays, the first outer layer sheet having a supply opening (32) for the ionized air, the intermediate layer sheet having an ionized air passage (38) equipped with an ionized air inlet opening (36) which is connected with the supply opening, the second outer sheet having a discharge opening (42) which is connected with the ionized air passage, the supply opening, the ionized air passage, and the discharge opening being connected together to form an ionized air passage section (44); and an insulating layer (50) that insulates the soft X-ray shielding sheet from the container.

Classes IPC  ?

• H05F 3/06 - Enlèvement des charges électrostatiques au moyen de radiations ionisantes

Abrégé

Provided is a measurement device that accurately measures clogging of a filter by means of a simple mechanism. In air-conditioning equipment (2) comprising a blower (30) that blows a gas (40), (42) through a duct (10) and a filter (20) that is arranged in the duct (10) and that traps matter floating in the gas, this clogging measurement device comprises: an acoustic pressure measurement device (26) arranged inside the duct (10); a data processing device (70) for extracting acoustic pressure data for a specific frequency from data for the acoustic pressure measured by the acoustic pressure measurement device (26); and an estimation device (70) for estimating clogging of the filter on the basis of the acoustic pressure data for the specific frequency as extracted by the data processing device (70).

Classes IPC  ?

• F24F 11/39 - Surveillance de la performance des filtres
• B01D 46/42 - Équipement auxiliaire ou son utilisation
• F24F 3/052 - Systèmes à conduits multiples, p. ex. systèmes dans lesquels de l'air chaud et de l'air froid sont amenés, par des circuits séparés, de la centrale aux chambres mélangeuses dans les lieux à conditionner
• F24F 7/00 - Ventilation
• F24F 140/00 - Entrées de commandes relatives aux états du système

Produits et services

Air filters for mechanical purposes. Air filters for air conditioning units; air filters for industrial installations.

Abrégé

Provided is a semiconductor manufacturing apparatus that can easily prevent moisture adhesion to a wafer surface inside an EFEM. A semiconductor manufacturing apparatus 1 is provided with: a process device 30 for processing wafers 90; a FOUP 40 for supplying the wafers 90, and accommodating those wafers 90 for which process processing has concluded; an EFEM 10 for transferring the wafers 90 between the FOUP 40 and the process device 30; a fan filter unit 20 for sending an airflow 72 from above to the EFEM 10; an ultrasonic wave oscillator 52 for generating high-frequency power; and a vibrator 54 for generating ultrasonic waves 80 from high-frequency power generated by the ultrasonic wave oscillator 52, and directing the ultrasonic waves 80 onto the wafers 90 for which process processing has concluded, conveyed by the EFEM 10.

Classes IPC  ?

• H01L 21/677 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le transport, p. ex. entre différents postes de travail
• H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives

Produits et services

Air filters, air filter units and air filter units with fan for mechanical purposes; air filters for mechanical purposes. Air filters, air filters units, and air filter units with fan for air conditioning units; air filters for air conditioning units; air filters, air filter units and air filters units with fan for industrial installations; air filters for industrial installations.

Abrégé

The purpose of the present invention is to provide: an algae water concentration system for concentrating algae water in a culture pond into algae water containing desired sizes of algae with a single configuration, at low cost and with high efficiency; and a method for operating the system. A cultured algae water concentration system 100 is provided with: an algae water supply section 17 equipped with an algae water supply vessel 18 in which algae water from a culture pond is to be stored and a supply vessel outlet port 19 through which the algae water is to be removed from the algae water supply vessel; and an algae water concentration section equipped with a concentration vessel 1 which receives the algae water from the algae water supply section and in which the algae water is concentrated, a filter 3 which partitions the concentration vessel into upper and lower spaces and through which algae having sizes equal to or more than a predetermined size cannot pass, a vibration device 5 which can cause the filter to vibrate in the out-of-plane direction, a concentration vessel algae water inlet port 7 through which the algae water is to be taken into the concentration vessel and which is arranged below the filter in the concentration vessel, a concentrated algae water outlet port 9 which is arranged below the filter in the concentration vessel and through which algae water concentrated in the concentration vessel is to be removed, and a filtrated water discharge port 8 which is arranged above the filter in the concentration vessel and through which filtered water that passes through the filter is to be discharged.

Classes IPC  ?

• C12M 1/26 - Inoculateur ou échantillonneur
• C12M 1/00 - Appareillage pour l'enzymologie ou la microbiologie
• C12N 1/12 - Algues unicellulairesLeurs milieux de culture

Abrégé

Provided is a nozzle unit capable of sufficiently purging N2 gas by supplying N2 gas into a FOUP and of shortening the purge time in a semiconductor production line. A nozzle unit is provided with: a nozzle (35) of which the top is provided with a nozzle tip (36) for closely adhering to the ventilation opening of a breathing filter unit while the bottom of the nozzle (35) is provided with a hemispherical sealing part (37), and which is configured such that the top and bottom of the nozzle (35) open to a gas path (38); and a nozzle receiver (42) of which the top is provided with a concaved hemispherical sealing part (43) for receiving and holding the hemispherical sealing part (37) of the nozzle (35) and which has a gas path (45) in the center. Moreover, an O ring groove (46) is disposed on the nozzle (35) and a retention O ring (47) is disposed on the nozzle receiver (42) so that the nozzle (35) is held by the nozzle receiver (42) while maintaining the movability of the nozzle (35).

Classes IPC  ?

• H01L 21/673 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants utilisant des supports spécialement adaptés
• B65D 85/86 - Réceptacles, éléments d'emballage ou paquets spécialement adaptés à des objets ou à des matériaux particuliers pour des éléments électriques

Abrégé

Provided is a device which facilitates the removal of water within a breathing filter unit after a semiconductor wafer housing container is cleaned and removes in advance dust adhering to the interior of the breathing filter unit, a nozzle unit of a purge device, valves, and pipes before the start of N2 gas purge. The breathing filter unit is provided with a filter (6) in an upper-end opening (46) made in the upper part of a cylindrical casing (41), and two ventilating openings of an N2 gas supply-side ventilating opening (7) and a residual gas exhaust-side ventilating opening (8) are made in the bottom part (42) of the cylindrical casing (41). A shutter means (10) which opens only when N2 gas (30) is supplied into the breathing filter unit (1) is installed in the N2 gas supply-side ventilating opening (7). A shutter means (11) which opens only when residual gas (31) in the breathing filter unit (1) is discharged from the ventilating opening is installed in the residual gas exhaust-side ventilating opening (8).

Classes IPC  ?

• H01L 21/673 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants utilisant des supports spécialement adaptés

Abrégé

Without the need to open the lid of semiconductor wafer storage container, there can be attained removal of any chemical gas present in the semiconductor wafer storage container and inhibition of acid generation therein. There is provided dry air or nitrogen gas charging device (A) connected and fixed to supply-side respiration orifice (8a) and discharge-side respiration orifice (8b) among multiple respiration orifices (8) disposed in bottom board (5) of semiconductor wafer storage container (1) accommodating semiconductor wafers (9), each of the respiration orifices (8a,8b) equipped with PTFE filter (7), which charging device (A) comprisesdry air/nitrogen gas supply part (11) for supplying dry air or nitrogen gas into the semiconductor wafer storage container (1) and used dry air/nitrogen gas discharge part (12) for discharging the dry air or nitrogen gas after, by means of the dry air or nitrogen gas fed into the semiconductor wafer storage container (1), not only removal of chemical gas within the semiconductor wafer storage container (1) but also inhibition of acid generation on the surface of semiconductor wafers by moisture removal.

Classes IPC  ?

• H01L 21/673 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants utilisant des supports spécialement adaptés

Abrégé

A soft X-ray shielding sheet (1) includes: a first external layer sheet (2) having a supply opening (5) for supplying ionized air (11); an intermediate layer sheet (3) having an ionized air flow-in opening (6) communicating with the supply opening; and a second external layer sheet (4) having a discharge opening (8) communicating with the ionized air passage (6). The sheets (2, 3, 4) are overlaid on one another and boded. One or more ionized air passages 9 are provided to communicate with the supply opening (5), the ionized air passage (6), and the discharge opening (8).

Classes IPC  ?

• H05F 3/06 - Enlèvement des charges électrostatiques au moyen de radiations ionisantes
• H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives

Abrégé

An apparatus is provided for eliminating static electricity on semiconductor substrate and liquid crystal substrate surfaces in semiconductor and liquid crystal manufacturing processes. In the apparatus, a cylindrical filter is not exposed to a soft X-ray and the soft X-ray does not leak to the external of a guide container. A clean air generating part (1) provided with the cylindrical filter (5), a soft X-ray irradiating part (2) and an ionized clean air blowing part (3) are arranged in series in an air blowing direction in the guide container (4). The clean air generating part (1) is prevented from being exposed to the soft X-ray (19) by a shielding member (23). The clean air blowing part (3) has a structure for blowing out only ionized clean air (35) in a longitudinal direction at a uniform air volume to prevent the soft X-ray from leaking to the external of the guide container (4) of the soft X-ray (19).

Classes IPC  ?

• H05F 3/06 - Enlèvement des charges électrostatiques au moyen de radiations ionisantes

Produits et services

Air filters, air filter units and air filter units with fan for mechanical purposes; air filters for mechanical purposes. Air filters, air filters units, and air filter units with fan for air conditioning units; air filters for air conditioning units; air filters, air filter units and air filters units with fan for industrial installations; air filters for industrial installations.

Produits et services

Air filters, air filter units, and air filter units with fan for mechanical purposes. Air filters, air filters units, and air filter units with fan for air conditioning units; air filters, air filter units and air filters units with fan for industrial installations.