C04B 35/48 - Produits céramiques mis en forme, caractérisés par leur compositionCompositions céramiquesTraitement de poudres de composés inorganiques préalablement à la fabrication de produits céramiques à base d'oxydes à base d'oxydes de zirconium ou d'hafnium ou de zirconates ou d'hafnates
C04B 35/622 - Procédés de mise en formeTraitement de poudres de composés inorganiques préalablement à la fabrication de produits céramiques
A test glass changer for optically measuring layer properties in a vacuum coating system including a movable substrate holder for guiding a substrate through a stream of coating material; a mount connected to a rotary spindle and rotatable relative to the substrate holder about the rotary spindle; and a control device directing a test glass element into a ray path of an optical measuring device and into a stream of the coating material. The mount has at least two recesses offset eccentrically with respect to the spindle for one test glass element in each case. The control device can induce a rotational movement of the mount about the spindle. The centering device can exert a torque and holding moment on the mount to bring a test glass element arranged in one of the recesses into a measuring position of the measuring device. Related methods are also provided.
G01N 21/88 - Recherche de la présence de criques, de défauts ou de souillures
G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
G01N 21/25 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes
G01N 21/84 - Systèmes spécialement adaptés à des applications particulières
3.
Method and apparatus for producing a reflection-reducing layer on a substrate
The invention relates to an apparatus (1) for producing a reflection-reducing layer on a surface (21) of a plastics substrate (20). The apparatus comprises a first sputtering device (3) for applying a base layer (22) to the surface (21) of the plastics substrate (20), a plasma source (4) for plasma-etching the coated substrate surface (21), and a second sputtering device (5) for applying a protective layer (24) to the substrate surface (21). These processing devices (3, 4, 5) are arranged jointly in a vacuum chamber (2), which has inlets (8) for processing gases. In order to move the substrate (20) between the processing devices (3, 4, 5) in the interior of the vacuum chamber (2), a conveying apparatus (10) is provided which is preferably in the form of a rotary table (11). Furthermore, the invention relates to a method for producing such a reflection-reducing layer on the surface (21) of the plastics substrate (20).
The invention relates to a method for removing selenium precipitate from cold traps during the production of solar cells. Said method uses a cleaning solution containing a reducing agent.
a) and of the first (21, 121, 221) and the at least second substrate carrier units (22, 122, 222) is provided such that substrates of the first (21, 121, 221) and the at least second substrate carrier units (22, 122, 222) can be coated with the same quality by means of the evaporator array (10). The invention further relates to a method for vacuum coating by means of the device.
C23C 16/448 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour produire des courants de gaz réactifs, p. ex. par évaporation ou par sublimation de matériaux précurseurs
C23C 16/50 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques
The invention relates to an apparatus (1) for producing a reflection‑reducing layer on a surface (21) of a plastics substrate (20). The apparatus comprises a first sputtering device (3) for applying a base layer (22) to the surface (21) of the plastics substrate (20), a plasma source (4) for plasma‑etching the coated substrate surface (21), and a second sputtering device (5) for applying a protective layer (24) to the substrate surface (21). These processing devices (3, 4, 5) are arranged jointly in a vacuum chamber (2), which has inlets (8) for processing gases. In order to move the substrate (20) between the processing devices (3, 4, 5) in the interior of the vacuum chamber (2), a conveying apparatus (10) is provided which is preferably in the form of a rotary table (11). - Furthermore, the invention relates to a method for producing such a reflection‑reducing layer on the surface (21) of the plastics substrate (20).
The test glass changer for optical measurement of layer characteristics in vacuum coating systems which have a movable substrate holder (2) for guiding at least one substrate on a path through at least one stream of a coating material, having a holder (6), which is rigidly connected to a rotary axle (4) and which is rotatable relative to the substrate holder (2) about the rotary axle (4), for at least one test glass element and having a control device for the introduction of in each case one test glass element into an optical path of an optical measurement device and into the at least one stream of the coating material, wherein the holder (6) has at least two recesses (7), which are offset eccentrically with respect to the axle (4), for in each case one test glass element, and a rotational movement of the holder (6) about the axle (4) can be effected by means of the control device, is characterized in that a centering device (10) is provided by means of which a torque and a holding moment can be exerted on the holder (6) in order to move a test glass element arranged in one of the recesses (7) into a measurement position of the measurement device. In the method for test glass changing by means of the device, it is provided that, before a test glass element arranged in one of the recesses (7) is moved into a measurement position of the measurement device, a rotational movement of the holder (6) is effected by means of the control device, which rotational movement causes said test glass element to be moved into a first position whose angular distance from the measurement position is smaller than the angular distance between the recesses (7), and said test glass element is subsequently moved into the measurement position by means of the centering device (10).
G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
G01N 21/25 - CouleurPropriétés spectrales, c.-à-d. comparaison de l'effet du matériau sur la lumière pour plusieurs longueurs d'ondes ou plusieurs bandes de longueurs d'ondes différentes
8.
APPARATUS FOR SURFACE TREATMENT WITH PROCESS STEAM
The invention relates to a steam separator (7) having a separating container (9, 9') for removing the steam particles (23) from a reaction chamber (2), the separating container (9, 9') having at least one flow path and a plurality of separating stages (11, 11'), which are separated from one another by guide plates (12, 12'). The steam separator (7) is characterized in that the guide plates (12, 12') are arranged in the form of a spiral staircase in discrete stages. The invention further relates to an apparatus (1) for treating a coating (22) applied to a surface (21) of a substrate (20) with the steam-like particle stream (23), having a reaction chamber (2) for holding the substrate (20) during the treatment process, having at least one steam source (4) for generating the particle stream (23), wherein a steam separator (7) connected to the reaction chamber (2) is provided to remove the steam particles (23) from the reaction chamber (2). The invention further relates to an apparatus (1) for treating a coating (22) applied to a surface (21) of a substrate (20) with the steam-like particle stream (23), having a reaction chamber (2) for holding the substrate (20) during the treatment process and having at least one steam source (4) for generating the particle stream (23) with a steam separator (7) connected to the reaction chamber (2) as described above.
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
B01D 53/00 - Séparation de gaz ou de vapeursRécupération de vapeurs de solvants volatils dans les gazÉpuration chimique ou biologique des gaz résiduaires, p. ex. gaz d'échappement des moteurs à combustion, fumées, vapeurs, gaz de combustion ou aérosols
B01D 45/08 - Séparation de particules dispersées dans des gaz ou des vapeurs par gravité, inertie ou force centrifuge par inertie par projection contre les diaphragmes séparateurs
9.
METHOD FOR PLASMA-TREATING A SUBSTRATE IN A PLASMA DEVICE
The invention relates to a method for coating a substrate in a plasma device. The substrate is arranged between at least one electrode and at least one counter electrode, and a plasma discharge is excited between said electrode and counter electrode by means of an RF voltage that has at least two frequency components, the frequency of the lower frequency component being at least 1 MHz and the frequency of the at least one higher frequency component being at least double the frequency of the lower frequency component. The method is characterised in that the surface area to be treated is at least 1 m2, the average power of the lower frequency component amounts to no more than 70% of the average power of the higher frequency component, and a coating homogeneity of a layer applied to said substrate is set according to a power ratio LV = (average power of the higher frequency/average power of the lower frequency + average power of the higher frequency). The invention also relates to a device for carrying out this method.
C23C 16/509 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques utilisant des décharges à radiofréquence utilisant des électrodes internes
C23C 16/52 - Commande ou régulation du processus de dépôt
C23C 16/54 - Appareillage spécialement adapté pour le revêtement en continu
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
07 - Machines et machines-outils
37 - Services de construction; extraction minière; installation et réparation
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Chemicals used in industry and science, Namely for coatings for silicon or CIGS thin-film modules on glass substrates. Machines and machine tools, Namely coating machines for producing coatings for silicon or CIGS thin-film modules on glass substrates. Repair, namely of coating machines for producing coatings for silicon or CIGS thin-film modules on glass substrates. Treatment of materials, namely surface treatment for producing coatings for silicon or CIGS thin-film modules on glass substrates. Scientific and technological services and research, Namely for producing coatings for silicon or CIGS thin-film modules on glass substrates.
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
07 - Machines et machines-outils
37 - Services de construction; extraction minière; installation et réparation
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Chemicals used in industry and science,Namely for coatings for silicon or CIGS thin-film modules on glass substrates. Machines and machine tools,Namely coating machines for producing coatings for silicon or CIGS thin-film modules on glass substrates. Repair, namely of coating machines for producing coatings for silicon or CIGS thin-film modules on glass substrates. Treatment of materials, namely surface treatment for producing coatings for silicon or CIGS thin-film modules on glass substrates. Scientific and technological services and research,Namely for producing coatings for silicon or CIGS thin-film modules on glass substrates.
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
07 - Machines et machines-outils
37 - Services de construction; extraction minière; installation et réparation
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Chemicals used in industry and science,Namely for coatings for silicon or CIGS thin-film modules on glass substrates. Machines and machine tools,Namely coating machines for producing coatings for silicon or CIGS thin-film modules on glass substrates. Repair, namely of coating machines for producing coatings for silicon or CIGS thin-film modules on glass substrates. Treatment of materials, namely surface treatment for producing coatings for silicon or CIGS thin-film modules on glass substrates. Scientific and technological services and research,Namely for producing coatings for silicon or CIGS thin-film modules on glass substrates.
The invention relates to an apparatus (1) for coating a surface (21) of a substrate (20) which during the coating process is accommodated in a processing chamber (2) and is exposed to a stream of coating particles (23) produced by a particle source (4). A transport device (10) is provided for transport of the substrate (20) through the processing chamber (2). To avoid deposits of the coating material on sensitive components of the transport device (10), the transport device (10) is arranged in the processing chamber (2) in such a way that it is screened from the particle stream emanating from the particle source (4) by the substrate (20) to be transported. In this way, the intervals between maintenance can be extended and the operating costs of the apparatus (1) can be reduced. The invention further relates to a process for coating a surface (21) of a substrate (20) in an apparatus (1) having a processing chamber (2) for accommodating the substrate (20) during the coating process, having a particle source (4) for producing coating particles (23) and having a transport device (10) for transport of the substrate (20) in the processing chamber (2) which has a plurality of transport rollers (11a) which are fastened to a set of shafts (11b) which are mounted in bearings (11c) so as to be rotatable, are arranged behind one another in the transport direction (13) and are aligned parallel to one another, where the transport device (10) or at least one of the transport rollers (11a), one of the shafts (11b) or one of the bearings (11c) of the transport device (10) is screened from a stream of coating particles (23) emanating from the particle source (4) by the substrate (20) to be transported or by two substrates (20) to be transported in succession.
C23C 14/56 - Appareillage spécialement adapté au revêtement en continuDispositifs pour maintenir le vide, p. ex. fermeture étanche
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
B05B 13/00 - Machines ou installations pour appliquer des liquides ou d'autres matériaux fluides sur des surfaces d'objets ou de matériaux par pulvérisation, non couverts par les groupes
The invention relates to a device (1) for coating a surface (21) of a substrate (20). The device comprises a processing chamber (2) with a particle source (3) for producing coating particles (19), which are also deposited on the inner wall (5) of the processing chamber (2) and on shielding devices (41) arranged therein during operation, in addition to the desired coating of the substrate surface. As the operating time increases, the layer thickness of said deposits (6) grows until the latter undergo spalling, which can lead to contamination of the substrate surfaces to be coated. In order to prevent this, shielding screens (10, 10') are arranged on the inner wall (5) of the processing chamber (2) and/or on the shielding devices (41) and prevent deposits (6, 7) which undergo spalling from passing into the interior (17) of the processing chamber (2). The shielding screens (10, 10') preferably consist of an expanded metal.
C23C 14/56 - Appareillage spécialement adapté au revêtement en continuDispositifs pour maintenir le vide, p. ex. fermeture étanche
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
01 - Produits chimiques destinés à l'industrie, aux sciences ainsi qu'à l'agriculture
07 - Machines et machines-outils
09 - Appareils et instruments scientifiques et électriques
37 - Services de construction; extraction minière; installation et réparation
40 - Traitement de matériaux; recyclage, purification de l'air et traitement de l'eau
42 - Services scientifiques, technologiques et industriels, recherche et conception
Produits et services
Chemicals used in industry and science,In particular for coatings, thin layers, metal-ceramic coatings and titanium nitride coatings; Chemical preparations for layers applied to object surfaces relating to the altering of mechanical, chemical, electric, magnetic or optical properties, altering of reflection, transparency, conductivity, of surface structure and/or chemical composition; Chemical preparations for surface layers on instruments of all kinds, in particular spectacle lenses, lenses, mirrors, optical and/or electric filters; Chemical preparations for surface layers on architectural glass, solar cell substrates or modules, display substrates or modules, in particular computer screens, luminous layers, organic light-emitting diodes, in particular solid and liquid evaporation or atomisation materials. Machines and machine tools,In particular vacuum treatment installations, in particular vacuum coating or vacuum etching installations; Mechanical tools (mechanical engineering) for all kinds of surface treatment, in particular tools (mechanical engineering) for chemical and physical cleaning, structuring or layer removal and mechanical treatment (in particular of substrates to be coated by a vacuum installation); Coating machines of all kinds, in particular coating machines for producing thin layers, coating sources of all kinds, in particular evaporation sources, electron beam vaporisers, ionic beam sources, ionic beam sputter sources, PVD,CVD, PECVD sources, cathode atomisation sources and plasma sources; Devices for modifying object surfaces; Installations for producing solar installations for generating power, in particular solar modules, solar generators and inverters; Installations for producing photovoltaic equipment for generating power and installations composed thereof and parts therefor; Installations for producing electronic control devices for thermal and photovoltaic solar installations; Installations for producing accumulators (electric), installations for producing batteries (electric), installations for producing semi-conductors, integrated circuits, electric collectors; Installations for producing solar cell modules or solar cells for generating power; Devices for producing surface layers on instruments of all kinds, in particular spectacle lenses, lenses, mirrors optical and/or electric filters, architectural glass, solar cell substrates or modules, display substrates or modules, in particular computer screens, luminous layers, organic light-emitting diodes. Apparatus and instruments for conducting, Switching, Converting, Storing, Regulating or controlling electricity,Solar collectors for electricity supply; Solar collectors for generating power, being parts of photovoltaic installations; Electronic apparatus and Regulating, controlling, monitoring instruments and inverters and installations composed of the aforesaid goods and parts therefor for generating power and parts of the aforesaid goods, All included in class 09; Electronic apparatus and instruments for monitoring surfaces and treatment of surfaces; Optical apparatus and instruments, Electric, Magnetic,Spectroscopic sensors; Computer programs, in particular for regulating, controlling and monitoring surfaces and treatment of surfaces; Vacuum measuring apparatus; Sputter cathodes. Installations and repair for vacuum devices of all kinds, installation and repair for energy conversion technology, in particular assembly of solar installations for generating power, solar collectors and photovoltaic modules. Treatment of materials; Surface treatments; Surface coatings for tools, for optical and electronic components and for parts for precision construction. Scientific and technological services and research; Architecture, Building, Namely technical preparation of building projects, Physics research, Technical measuring and testing, Engineering, Technical tests and checks, Technical measuring, Scientific experiments,Technical development of solar and photovoltaic installations, Surveying, Scientific reports, Technical research, Construction drafting, Research physics, Quality control, Styling services, Technical consultancy, Technical consultancy, Technical project studies, Consultation in environment protection, Environmental assessment services.
The invention relates to a device for vacuum coating substrates in a vacuum chamber, comprising an elongated evaporator array having a plurality of evaporator elements arranged along a longitudinal axis and a first substrate carrier unit which is associated with the evaporator array and has a first pylon that can be rotated about a first axis and contains retaining means for substrates, wherein an angular offset of less than 10° is present between the longitudinal axis and the first rotational axis. The device is characterised in that at least one second substrate carrier unit is provided, which is associated with the evaporator array and has a second pylon that can be rotated about a second axis and contains retaining means for substrates, wherein an angular offset of less than 10° is present between the longitudinal axis and the second rotational axis. At least one second substrate carrier unit (22, 122, 222) which is associated with the evaporator array (10, 110, 110a) and has a second pylon that can be rotated about a second rotational axis (42, 242) and contains retaining means for substrates is provided, wherein the axes of the pylons are designed to be fixed relative to the longitudinal axis (40) of the evaporator array, an angular offset of less than 10° is present between the longitudinal axis (40) and second rotational axis (42, 242), and a geometric configuration of the evaporator array (10, 110, 110a) and of the first (21, 121, 221) and the at least second substrate carrier units (22, 122, 222) is provided such that substrates of the first (21, 121, 221) and the at least second substrate carrier units (22, 122, 222) can be coated with the same quality by means of the evaporator array (10). The invention further relates to a method for vacuum coating by means of the device.
The method for the plasma treatment of a flat substrate, wherein the substrate is arranged between an electrode and a planar supporting surface which is assigned to a counterelectrode, and thereby has its front side facing the electrode and its rear side facing the supporting surface, is distinguished by - securing the substrate on the supporting surface - thermally producing a mechanical prestress in the substrate that corresponds to a concave curving of the substrate, seen from the direction of the electrode, with peripheral sides of the substrate at a distance from the supporting surface, by means of controlling the temperature of the front side and/or the rear side of the substrate - applying local forces to the peripheral sides to achieve flat contact of the rear side face of the substrate against the supporting surface by means of at least one hold-down device and - exciting the plasma discharge by means of an RF voltage. The invention also relates to a device for the plasma treatment of a flat substrate, wherein the substrate can be arranged between an electrode and a planar supporting surface which is assigned to a counterelectrode, and thereby has its front side facing the electrode and its rear side facing the supporting surface, which is distinguished by - means for securing the substrate on the supporting surface - a device for thermally producing in the substrate a mechanical prestress that corresponds to a concave curving of the substrate, seen from the direction of the electrode, with peripheral sides of the substrate at a distance from the supporting surface, by means of controlling the temperature of the front side and/or the rear side of the substrate - means for applying local forces to the peripheral sides to achieve flat contact of the rear side face of the substrate against the supporting surface by means of at least one hold-down device and - means for exciting the plasma discharge by means of an RF voltage.
C23C 16/46 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour le chauffage du substrat
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives
The invention relates to an inner heat treatment chamber (3) for thermally processing a substrate (20), comprising walls (10) that surround an inner space (24) of the inner heat treatment chamber (3), a storage unit (8) for storing the substrate (20) during the thermal processing and an energy source (11) for introducing energy into the inner space (24) of the inner heat treatment chamber (3), wherein at least a part of the inner sides of the walls (10) is designed to reflect power introduced by the energy source (11). The at least one part of the inner sides of the walls (10) is made of a material that reflects at least infrared radiation to a high degree. The invention further relates to an inner heat treatment chamber (3) for thermally processing a substrate (20), comprising walls (10) that surround an inner space (24) of the inner heat treatment chamber (3), a storage unit (8) for storing the substrates (20) during the thermal processing and an energy source (11) for introducing energy into the inner space (24) of the inner heat treatment chamber, wherein a cooling device (14) is provided for cooling the walls (10).
H01L 21/00 - Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de dispositifs à semi-conducteurs ou de dispositifs à l'état solide, ou bien de leurs parties constitutives
19.
DEVICE AND TREATMENT CHAMBER FOR THERMALLY TREATING SUBSTRATES
The invention relates to a treatment chamber (20, 21, 21') for thermally processing a planar substrate (10). The treatment chamber (20, 21, 21') comprises a transport unit (25, 25') for conveying and supporting the substrate (10) during thermal processing, and a gas flow unit (30, 30') for convection-heating or convection-cooling the substrate (10). The gas flow unit (30, 30') comprises outlet openings (32, 32'), through which gas of the correct temperature is conducted onto the substrate (10). Furthermore, in the treatment chamber (20, 21, 21') a discharge unit (33, 33') is provided, through which the gases introduced into the treatment chamber (20, 21, 21') via the gas flow unit (30, 30') can be discharged in a controlled manner. The treatment chamber can be designed in the form of a heat-treatment chamber (21) or a cooling chamber (21').
The method for cleaning at least one component arranged in the inner region of a plasma process chamber by using a cleaning gas which comprises fluorine gas, the process chamber having at least one electrode and counter-electrode for producing a plasma for the plasma treatment, in particular the CVD or PECVD treatment, of flat substrates with a surface of over 1 m2, is distinguished by the fact that the inner region is subjected to gaseous fluorine compounds with a partial pressure of greater than 5 mbar. In a further method V for cleaning at least one component arranged in the inner region of a process chamber by means of a cleaning gas which comprises fluorine gas, the process chamber having at least one electrode and counter-electrode for producing a plasma, in particular for the CVD or PECVD treatment, of flat substrates with a surface of over 1 m2, it is provided that the fluorine gas is thermally activated by means of a temperature control medium, the component to be cleaned being at a temperature of < 350°C.
C23C 16/44 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement
B08B 7/00 - Nettoyage par des procédés non prévus dans une seule autre sous-classe ou un seul groupe de la présente sous-classe
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
21.
METHOD FOR PRODUCING A PLASMA JET AND PLASMA SOURCE
In the method for producing a plasma jet, which is extracted from a plasma produced by electric and magnetic fields by a high frequency voltage being applied to an extraction electrode and an HF electrode apparatus having an excitation electrode with an excitation surface, a plasma chamber being arranged between an extraction electrode and an excitation surface and, as compared with the extraction electrode, the time average of the plasma lying at a higher potential accelerating positive plasma ions, and the plasma and extracted plasma jet being influenced by a magnetic field, the invention provides that, in order to produce a magnetic field, use is made of a planar magnetron which is arranged after the excitation electrode on the side facing away from the plasma, and the magnetic north poles and magnetic south poles of which are directed into the interior of the plasma chamber, so that a curved magnetic field projecting into the interior of the plasma chamber is formed. In the plasma source for carrying out the method, having a plasma vessel with an extraction electrode and having an HF electrode apparatus, having an excitation electrode with an excitation surface, which is or can be connected via a matching network to an HF generator, a plasma chamber, in which a plasma can be excited, being located between excitation surface and extraction electrode, and the size of the area of the extraction electrode and of the excitation surface being chosen such that virtually all of the high frequency voltage is dropped across the extraction electrode; having a magnetic device for reducing the magnetic field, provision is made for the magnetic device to have at least one magnetic north pole and one magnetic south pole, which are in each case arranged after the excitation electrode on the side facing away from the plasma chamber and are directed into the interior of the plasma chamber, so that a curved magnetic field projecting into the interior of the plasma chamber can be formed, wherein at least one of the north or south poles is designed to be elongated, so that a tunnel-like region can be formed in which charged particles can be retained and along which they are able to propagate.
FRAUNHOFER GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (Allemagne)
LEYBOLD OPTICS GMBH (Allemagne)
RUHR-UNIVERSITÄT BOCHUM (Allemagne)
Inventeur(s)
Beckmann, Rudolf
Geisler, Michael
Zeuner, Arndt
Fiedler, Marks
Grabosch, Günter
Pflug, Andreas
Czarnetzki, Uwe
Brinkmann, Ralf-Peter
Siemers, Michael
Abrégé
Method and device for the plasma treatment of a substrate in a plasma device, wherein - the substrate (110) is arranged between an electrode (112) and a counter-electrode (108) having a distance d between a surface area of the substrate to be treated and the electrode, - a capacitively coupled plasma discharge is excited, forming a DC self-bias between the electrode (112) and the counter-electrode (108), - in an area of the plasma discharge between the surface area to be treated and the electrode having a quasineutral plasma bulk (114), a quantity of at least one activatable gas species, to which a surface area of the substrate to be treated is subjected, is present - it is provided that a plasma discharge is excited, - wherein the distance d has a value comparable to s = se+sg, where se denotes a thickness of a plasma boundary layer (119) in front of the electrode, and sg denotes a thickness of a plasma boundary layer (118) in front of the substrate surface to be treated or – wherein the quasineutral plasma bulk (114) between the surface area to be treated and the electrode has a linear extension dp, where dp < 1/3d, dp < max(se+sg) or dp < 0.5s.
The invention relates to a test glass changing system (10) for selectively coating and optically measuring a test glass (24, 24") in a coating chamber (1) of a vacuum coating installation (3). In the coating chamber, a movable turntable (2) is used to guide substrates (7) on a path through a stream of a coating material. The test glass changing system (10) comprises a test glass holder (8, 8") with a test glass plate (26) for holding the test glass (24, 24"), and a cover (28, 28") for selectively covering the test glass plate (26). The test glass changing system (10) also comprises a rotary apparatus (34) for rotating the test glass plate (26) about an axis (51) which is oriented approximately parallel to the axis of rotation (5) of the turntable (2). The test glass holder (8, 8") can be positioned on the turntable (2) and removed from the coating chamber (1) in the form of a unit.
The invention relates to an optical coating (3, 3') having a high refractive index and good optical properties (i.e. low absorption and scattering) and low inner tensions, in a spectral range extending from the visible UV range to the near UV range (i.e. up to a wavelength of 220 nm). The coating (3, 3') according to the invention consists of a hafnium-containing oxide HfxSiyOz comprising a silicon part (y) of between 1 at. % and 10 at. %, especially between 1.5 at. % and 3 at. %.
The invention relates to an optical coating (3, 3') having a high refractive index and good optical properties (i.e. low absorption and scattering) and low inner tensions, in a spectral range extending from the visible UV range to the near UV range (i.e. up to a wavelength of 220 nm). The coating (3, 3') according to the invention consists of a hafnium-containing or zirconium-containing oxide HfxSiy0z or ZrxSiyOz comprising a silicon part (y) of between 1 at. % and 10 at. %, especially between 1.5 at. % and 3 at. %.
The invention relates to a VHF plasma electrode comprising a preferably prismatic, elongated electrode body (1) having an electrode surface that is or can be electrically connected to at least two connecting elements (3) for supplying electric power, at least one first connecting element (3A) being coupled to or in the vicinity of a first front face (50A) and at least one second connecting element being coupled to or in the vicinity of a second front face of the electrode body, and the electrode is preferably located in a potting compound (7) consisting of a dielectric material that does not cover the electrode surface. Preferably a shielding element (2) that does not cover the electrode surface and that surrounds the electrode together with the potting compound is provided. The electrode is characterised in that at least one of the connecting elements is designed as a VHF vacuum feedthrough element.
The invention relates to a method for producing a layer system on a dielectric substrate (12), wherein a metal layer (14) is applied to the substrate (12) in a coating step (110) and, in a subsequent coating step (140), a further layer (24) of given layer thickness is applied, wherein the metal layer (14) has a sheet resistance > 10 MOhm, and a mean reflection degree > 50%, wherein the further layer (24), when applied with the same layer thickness in the further coating step (140) to the substrate (12) has a sheet resistance < 1 MOhm and the layer system (10) of metal layer (14) and further layer (24) has a sheet resistance > 10 MOhm. The invention further relates to a layer system on a dielectric substrate (12), wherein a metal layer (14) is applied to the substrate (12) in a coating step (110) and in a subsequent further coating step (140) a further layer (24) of given layer thickness is applied, wherein the metal layer (14) has a sheet resistance > 10 MOhm, and a mean reflection degree > 50%, wherein the further layer (24), when applied with the same layer thickness in the further coating step (140) to the substrate (12) has a sheet resistance < 1 MOhm and the layer system (10) of metal layer (14) and further layer (24) has a sheet resistance > 10 MOhm. A housing can further be provided with said layer system.
C23C 14/06 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement caractérisé par le matériau de revêtement
B05D 5/06 - Procédés pour appliquer des liquides ou d'autres matériaux fluides aux surfaces pour obtenir des effets, finis ou des structures de surface particuliers pour obtenir des effets multicolores ou d'autres effets optiques
C23C 14/04 - Revêtement de parties déterminées de la surface, p. ex. au moyen de masques
The invention concerns an optical monitoring system for the measurement of layer thicknesses of thin coatings applied in a vacuum, particularly on moving substrates, during the coating process, in which the light intensity of the light of a light source injected into a reference light guide and released by a first piezoelectric or electrostrictive or magnetostrictive light chopper is registered by a light detector unit in a reference phase, the light of the light source in a measuring phase is injected into a first measuring light guide and the light released by a second piezoelectric or electrostrictive or magnetostrictive light chopper is directed to the substrate, and the light intensity of the light reflected or transmitted from the substrate is registered by the light detector unit through a second measuring light guide, and a remaining light intensity is registered by the light detector unit in at least one dark phase, wherein the reference phase, the measuring phase, and the dark phase are shifted in time by the light chopper and are digitally adjusted depending on the position of the substrate.
G01B 11/28 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer des superficies
H01L 21/67 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants
B05C 11/10 - Stockage, débit ou réglage du liquide ou d'un autre matériau fluideRécupération de l'excès de liquide ou d'un autre matériau fluide
C23C 14/54 - Commande ou régulation du processus de revêtement
G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
B05B 12/08 - Aménagements de commande de la distributionAménagements de réglage de l’aire de pulvérisation sensibles à l'état du liquide ou d'un autre matériau fluide expulsé, du milieu ambiant ou de la cible
G01B 5/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques mécaniques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
Disclosed is a reactor for treating flat substrates, comprising a vacuum chamber (11) and a process chamber (9). A first electrode (5) and a counter electrode (7) which form two opposite walls of the process chamber are provided for generating a plasma. The counter electrode can accommodate the substrate (3). The reactor further comprises means for introducing (19, 23, 25) and evacuating gaseous material into and/or from process chamber, an inlet and outlet for the vacuum chamber, and a mechanism (41, 43) for varying the relative distance between the electrodes, a first relatively great distance being used when the process chamber is loaded and discharged and a second relatively short distance being used when the treatment is performed, and/or a device which is associated with the counter electrode, is used for accommodating substrates, and is designed such that the substrate is disposed at an angle alpha ranging from 0° to 90°, preferably at an angle of 1°, 3°, 5°, 7°, 9°, 11°, 13°, 15°, 17°, 20°, 25°, 30°, 40°, 45°, relative to the vertical direction at least while the treatment is performed, the substrate surface that is to be treated facing downward.
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
H01L 21/677 - Appareils spécialement adaptés pour la manipulation des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide pendant leur fabrication ou leur traitementAppareils spécialement adaptés pour la manipulation des plaquettes pendant la fabrication ou le traitement des dispositifs à semi-conducteurs ou des dispositifs électriques à l'état solide ou de leurs composants pour le transport, p. ex. entre différents postes de travail
H01L 21/00 - Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de dispositifs à semi-conducteurs ou de dispositifs à l'état solide, ou bien de leurs parties constitutives
C23C 14/56 - Appareillage spécialement adapté au revêtement en continuDispositifs pour maintenir le vide, p. ex. fermeture étanche
30.
METHOD AND APPARATUS FOR APPLYING A LAYER OF A SEPARATING AGENT TO A SUBSTRATE
Disclosed is a method for applying a layer of a separating agent to a substrate that is or can be moved inside a vacuum chamber, said separating agent being evaporated in the interior of an evaporator chamber which comprises at least one nozzle that is directed onto the substrate. In said method, the liquid separating agent is injected into the interior of the evaporator chamber in order to be evaporated. Also disclosed is a corresponding apparatus for applying a layer of a separating agent to a substrate that is or can be moved inside a vacuum chamber comprising at least one metal evaporator device. Said apparatus comprises an evaporator chamber which is provided with at least one nozzle that is directed onto the substrate. The separating agent can be fed to the interior of the evaporator chamber by means of a supply pipe that is connected to an injection device, by means of which the liquid separating agent can be or is injected into the interior of the evaporator chamber in order to be evaporated.
The invention concerns a measuring system for optical monitoring of coating processes in a vacuum chamber, in which the light source is arranged inside the vacuum chamber between the substrate carrier and a shutter is arranged beneath the substrate carrier and the light-receiving unit is arranged outside the vacuum chamber in the optical path of the light source. The substrate carrier is designed to accept at least one substrate, and it can move across the coasting source in the vacuum chamber, preferably revolving about an axis, whereby the substrate or substrates cross(es) the optical path between the light source and the light-receiving unit for transmission measurement, and the shutter shades a measurement area across the coating source.
FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (Allemagne)
Inventeur(s)
Pflug, Andreas
Siemers, Michael
Szyszka, Bernd
Geisler, Michael
Abrégé
The invention relates to a gas distribution system comprising at least three plates, the first having a common gas supply line, the third an array of gas outlet nozzles and the second plate between situated between said first and third plates. The third plate contains at least one conduit system that interconnects the gas supply line and the outlet nozzles, a sub-region of said system, accounting for at least 60% of the total surface of the system, being located in the central plate in a non-overlapping manner and/or or one plane. At least 60% of the branching points of the conduit system are binary branching points.
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
C23C 14/00 - Revêtement par évaporation sous vide, pulvérisation cathodique ou implantation d'ions du matériau composant le revêtement
H01J 37/32 - Tubes à décharge en atmosphère gazeuse
In the treatment system for the vacuum treatment, particularly vacuum deposition, of a front of strip-shaped substrates in a first process chamber comprising a first process roller and at least one process source, and a second process chamber comprising a second process roller and at least one process source, it is provided that a transfer chamber, which is disposed between the first and second process chambers and is coupled to the two process chambers, can be separated from at least one of the process chambers in terms of pressure and comprises an unwinding station with a removable unwinder and a winding station with a removable winder for the substrate to be treated, and further comprises an outside lock for loading and unloading the unwinder and/or winder. The substrate to be treated with the back thereof faces the first and second process roller and can be fed from the unwinding station to the first process roller, from the first process roller to the second process roller, and from the second process roller to the winding station through the transfer chamber. The invention further relates to a method for operating the treatment system.
In the layer system for wipe-resistant optical reflectors on a substrate, comprising an optically reflective material layer and a transparent upper layer structure disposed on the side of the metal layer opposite the substrate, wherein the layer structure comprises a cover layer made of a hard layer deposited based on a plasma method, the hard layer being based on at least one silicone-organic compound and optionally having at least one intermediate layer, it is provided that the layer thickness of the upper layer structure is selected such that a spectral mean reflection level Rs dependent on the layer thickness of the upper layer structure has a maximum Rmax, that a spectral mean value Rs of a reflection level dependent on the layer thickness of the upper layer structure has a value of > Rmetal - 1/3 ΔR, wherein Rmetal is a spectral mean value Rmetal, determined in an analog fashion to Rs, of a reflection level of the unprotected metal layer determined in an analog fashion to Rs and wherein ΔR = Rmetal - Rmin is true, and Rmin refers to the minimum of the reflection level dependent on the layer thickness of the upper layer structure, or is a color difference ΔE* = root[(L*s - L*m)**2 + (a*s - a*m) **2 + (b*s - b*m)**2] < 2.0 between a color impression Fs = (L*s, a*s, b*s) dependent on the layer thickness of the upper layer structure and the color impression of the unprotected metal layer Fm = (L*m, a*m, b*m). The invention further relates to a method for producing such a layer system.
Disclosed is an apparatus for coating a strip-shaped substrate that can be moved in a direction of travel X during the coating process. Said apparatus comprises a number of evaporation boats forming an evaporation bench, a device for electrically heating the evaporation boats, and a device for feeding wire that is to be evaporated to the evaporation boats. The number of evaporation boats is formed by a set A and a set B of evaporation boats. The evaporation boats of set A have a length LA ranging from LO - δ A to LO + δ A while the evaporation boats of set B have a length LB ranging from LO - δ B to LO + δ B. The number of evaporation boats are arranged in the direction X within an area that extends parallel to the direction Y and has a maximum width of 2 LO + δ A + δ B. The evaporation boats of set A and set B are alternately disposed next to one another. Furthermore, the evaporation boats of set A are arranged at an angle α ranging from -1° to -89° relative to the direction X while the evaporation boats of set B are arranged at an angle ß ranging from 1° to 89° relative to the direction of travel X. The invention also relates to a method for designing an apparatus used for coating a strip-shaped substrate.
The invention relates to methods for depositing layers having a uniform layer thickness distribution on at least one curved surface of a substrate (6) by means of a plasma CVD process in which a plasma or ion beam (1) extending in the direction of the substrate surface is generated by a plasma or ion beam source (7) located opposite the substrate (6), and a process gas is fed behind the plasma or ion beam source (7) via a gas supply system (12). The process gas is distributed on the surface (14) of the substrate (6) in a defined manner by means of the gas supply system (12). A gas flow of the excitation gas as well as a plasma power of the plasma or ion beam source are adjusted to levels at which the amount of process gas is almost entirely reacted on the surface of the substrate by the excited excitation gas of the plasma or ion beam.
C23C 16/513 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement au moyen de décharges électriques utilisant des jets de plasma
C23C 16/455 - Revêtement chimique par décomposition de composés gazeux, ne laissant pas de produits de réaction du matériau de la surface dans le revêtement, c.-à-d. procédés de dépôt chimique en phase vapeur [CVD] caractérisé par le procédé de revêtement caractérisé par le procédé utilisé pour introduire des gaz dans la chambre de réaction ou pour modifier les écoulements de gaz dans la chambre de réaction
37.
EVAPORATOR BOAT FOR A DEVICE FOR COATING SUBSTRATES
The invention relates to an evaporator boat for a device for coating substrates in a vacuum coating chamber, which can be heated by direct current passage and has a convexly curved evaporation surface.
The invention relates to a method for production of a coated substrate, whereby at least one functional layer is deposited on the substrate from the vapour phase by means of chemical or physical deposition of a coating material and a temporary protective layer is applied to the functional layer by means of evaporation of a salt, in particular, an alkali metal halide. The invention further relates to a coated substrate with at least one functional layer and a temporary protective layer applied to the functional layer, which comprises a salt, in particular, an alkali metal halide, preferably a salt-like alkali metal halide and more particularly sodium chloride.
C03C 17/34 - Traitement de surface du verre, p. ex. du verre dévitrifié, autre que sous forme de fibres ou de filaments, par revêtement avec au moins deux revêtements ayant des compositions différentes
39.
MEASURING ARRANGEMENT FOR THE OPTICAL MONITORING OF COATING PROCESSES
The invention relates to a measuring arrangement for the optical monitoring of coating processes in a vacuum chamber. According to said method, the light source is arranged inside the vacuum chamber, between the substrate holder and a diaphragm arranged beneath the substrate holder, and the light receiving unit is arranged outside the vacuum chamber, in the beam path of the light source. Said substrate holder is embodied in such a way as to receive at least one substrate and can be displaced in the vacuum chamber over a coating source, preferably rotated about an axis. The substrate or substrates cross the beam path between the light source and the light receiving unit for transmission measurement purposes, and the diaphragm covers a measuring region over the coating source.
G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
C23C 14/54 - Commande ou régulation du processus de revêtement
The invention relates to an optical monitoring system for measuring the thickness of thin layers that are applied in a vacuum, especially on moved substrates during the coating process. In said optical monitoring system, the intensity of the light of a light source which is injected into a reference light circuit and is transmitted by a first piezoelectric or electrostrictive or magnetostrictive light chopper is detected by a light detector unit in a reference phase, the light of said light source is injected into a first measuring light circuit in a measuring phase, the light transmitted by a second piezoelectric or electrostrictive or magnetostrictive light chopper is directed onto the substrate, the intensity of the light reflected or transmitted by the substrate is detected by the light detector unit via a second measuring light circuit, and the intensity of the remaining light is detected by the light detector unit in at least one dark phase. The reference phase, the measuring phase, and the dark phase are digitally adjusted in an offset manner and in accordance with the position of the substrate via the light choppers.
G01B 11/06 - Dispositions pour la mesure caractérisées par l'utilisation de techniques optiques pour mesurer la longueur, la largeur ou l'épaisseur pour mesurer l'épaisseur
C23C 14/54 - Commande ou régulation du processus de revêtement
41.
Method for producing a multilayer coating and device for carrying out said method
A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.
Mechanical coating instrument for coating of substrates of
organic or mineral materials with transparent,
wear-resistant optic layers as well as parts of the
aforementioned instruments.
Coating apparatus such as machines for coating substrates
consisting of organic or mineral materials by means of
transparent, wear-resistant or optical coats.
09 - Appareils et instruments scientifiques et électriques
Produits et services
electrical vacuum coating apparatus for coating substrates made of metal (excluding aluminum), glass and ceramic by means of evaporating or sputtering from metal or metal alloys and for the pre- and post-treatment of substrates
