The present invention relates to a pest-proof and antimicrobial composition and a pest-proof lighting comprising same. Particularly, the present invention provides a pest-proof and antimicrobial composition, wherein a pest-proof and antimicrobial composition comprising metal powder, sea marine stone, nanocellulose, and ultrapure water is manufactured, and the pest-proof and antimicrobial composition is coated on an LED lamp having the color temperature of 2000K to 3000K and the wavelength band of 510 to 700 ㎚.
A01M 29/10 - Épouvantails ou dispositifs répulsifs, p. ex. pour oiseaux utilisant des moyens visuels, p. ex. épouvantails, éléments en mouvement, formes spécifiques, motifs ou éléments similaires spécifiques utilisant des sources lumineuses, p. ex. des lasers ou des lumières clignotantes
A01N 43/40 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des composés hétérocycliques comportant des cycles avec un atome d'azote comme unique hétéro-atome du cycle des cycles à six chaînons
A01N 59/00 - Biocides, produits repoussant ou attirant les animaux nuisibles, ou régulateurs de croissance des végétaux, contenant des éléments ou des composés inorganiques
C09D 5/14 - Peintures contenant des biocides, p. ex. fongicides, insecticides ou pesticides
C09D 7/61 - Adjuvants non macromoléculaires inorganiques
C09D 7/63 - Adjuvants non macromoléculaires organiques
A01M 29/12 - Épouvantails ou dispositifs répulsifs, p. ex. pour oiseaux utilisant des substances odorantes, p. ex. des arômes, phéromones ou agents chimiques
2.
APPARATUS FOR MANUFACTURING DISPLAY APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS
A method of manufacturing a display apparatus, the method includes removing an oxide layer formed on a surface of a substrate by utilizing a hydrofluoric acid gas and an ammonia gas, and thermally treating the substrate from which the oxide layer has been removed. A flow ratio between the hydrofluoric acid gas and the ammonia gas is about 0.8:1 to about 1:1.
H01L 21/02 - Fabrication ou traitement des dispositifs à semi-conducteurs ou de leurs parties constitutives
H10K 59/12 - Affichages à OLED à matrice active [AMOLED]
H01L 27/12 - Dispositifs consistant en une pluralité de composants semi-conducteurs ou d'autres composants à l'état solide formés dans ou sur un substrat commun comprenant des éléments de circuit passif intégrés avec au moins une barrière de potentiel ou une barrière de surface le substrat étant autre qu'un corps semi-conducteur, p.ex. un corps isolant
B08B 7/00 - Nettoyage par des procédés non prévus dans une seule autre sous-classe ou un seul groupe de la présente sous-classe
B08B 7/04 - Nettoyage par des procédés non prévus dans une seule autre sous-classe ou un seul groupe de la présente sous-classe par une combinaison d'opérations
B08B 13/00 - Accessoires ou parties constitutives, d'utilisation générale, des machines ou appareils de nettoyage
B08B 5/00 - Nettoyage par des procédés impliquant l'utilisation d'un courant d'air ou de gaz
A method of manufacturing a display apparatus includes forming a semiconductor layer on a substrate, forming an insulating layer on the semiconductor layer, forming a photoresist pattern on the insulating layer, forming, by etching the insulating layer, a contact hole exposing at least a portion of the semiconductor layer, and performing a primary cleaning of the insulating layer in which the contact hole is formed using a cleaning gas including a fluorine-containing gas and a hydrogencontaining gas.
A photosensitive resin composition including a silsesquioxane-based copolymer obtained by copolymerizing a first monomer represented by Chemical Formula 1 (R1—R2—Si (R3)3), a second monomer represented by Chemical Formula 2 ((R4)n—Si(R5)4-n), a third monomer represented by Chemical Formula 3 (Si(R6)4), and a fourth monomer represented by Chemical Formula 4 ((R7)3—Si—R8—Si—(R7)3) are provided.
The present invention relates to a photoresist stripper composition for manufacturing a display, and more particularly, to an integrated photoresist stripper composition which can be used in every process for manufacturing a display. More specifically, the photoresist stripper composition for manufacturing a display according to the present invention can be applied to all of transition metals and oxide semiconductor wirings, and has an excellent ability to remove modified photoresist after a hard bake process, and implant process, and a dry etch process have been performed. In particular, the photoresist stripper composition for manufacturing a display according to the present invention exhibits a corrosion inhibitory effect that has been further specialized for copper (Cu) wiring pattern edge portions which are susceptible to corrosion following dry-etching.
The present invention relates to a photoresist stripper composition for manufacturing a display, and more particularly, to an integrated photoresist stripper composition which can be used in every process for manufacturing a display. More specifically, the photoresist stripper composition for manufacturing a display according to the present invention can be applied to all of transition metals, potential metals, and oxide semiconductor wirings, and has an excellent ability to remove modified photoresist after a hard bake process, an implant process, and a dry etch process have been performed. In particular, the photoresist stripper composition for manufacturing a display according to the present invention exhibits a corrosion inhibitory effect that has been further specialized for copper (Cu) wiring pattern edge portions which are susceptible to corrosion following dry-etching.
The present invention relates to a peeling solution composition for dry film resist, which is usable for manufacturing a PCB for forming a microcircuit, and particularly is applicable for a process of manufacturing a flexible multi-layer PCB.
The present invention relates to a dry film resist stripping solution composition applicable to a method for manufacturing a printed circuit board (PCB) having a fine circuit and, particularly, for manufacturing a flexible multi-layer PCB.
The present invention relates to a coating composition for a solid oxide fuel cell metal separator, and a preparation method therefor, and to a powder for plasma thermal spray coating and a preparation method therefor, the powder: being a main component of a solid oxide fuel cell metal separator coating composition for manufacturing a metal separator having excellent corrosion resistance and contact resistance; and generating no dust and being capable of forming a uniform coating film during thermal spray coating.
H01M 8/124 - Éléments à combustible avec électrolytes solides fonctionnant à haute température, p. ex. avec un électrolyte en ZrO2 stabilisé caractérisés par le procédé de fabrication ou par le matériau de l’électrolyte
10.
Polysilsesquioxane resin composition for flexible substrate
The present invention relates to a polysilsesquioxane resin composition for a flexible substrate. More specifically, the present invention relates to a polysilsesquioxane resin composition for a flexible substrate, having excellent heat resistance and transparency, the resin composition being usable for a flexible display substrate. More specifically, a transparent thin film can be formed, excellent transmittance is exhibited in the visible range even after curing, heat resistance is excellent, and flexibility and crack resistance can be controlled. Compared to a conventional polyimide-based substrate material, the present invention has excellent insulation characteristics and passivation characteristics, which can be satisfied simultaneously, and is advantageous for productivity since release characteristics are ensured during a delamination process from a glass substrate.
H01L 27/12 - Dispositifs consistant en une pluralité de composants semi-conducteurs ou d'autres composants à l'état solide formés dans ou sur un substrat commun comprenant des éléments de circuit passif intégrés avec au moins une barrière de potentiel ou une barrière de surface le substrat étant autre qu'un corps semi-conducteur, p.ex. un corps isolant
C08G 77/24 - Polysiloxanes contenant du silicium lié à des groupes organiques contenant des atomes autres que le carbone, l'hydrogène et l'oxygène groupes contenant des halogènes
C08G 77/00 - Composés macromoléculaires obtenus par des réactions créant dans la chaîne principale de la macromolécule une liaison contenant du silicium, avec ou sans soufre, azote, oxygène ou carbone
11.
Photoresist stripper composition for manufacturing liquid crystal display
The present disclosure relates to a photoresist stripper composition for manufacturing an LCD, and relates to an integrated photoresist stripper composition capable of being used in all processes for manufacturing a TFT-LCD. More specifically, the present disclosure relates to an aqueous photoresist stripper composition capable of being used in all of transition metal, potential metal and oxide semiconductor wires. The aqueous photoresist stripper composition includes (a) a potential metal and metal oxide corrosion inhibitor, (b) a transition metal corrosion inhibitor, (c) a primary alkanolamine, (d) a cyclic alcohol, (e) water, (f) an aprotic polar organic solvent, and (g) a protic polar organic solvent, and has an excellent ability to remove a degenerated photoresist produced after progressing a hard baked process, an implant process and a dry etch process in a semiconductor or flat display panel process, may be used in aluminum that is a potential metal, copper or silver that is a transition metal, and metal oxide wires at the same time, and may be introduced to organic film and COA processes.
C11D 3/20 - Composés organiques contenant de l'oxygène
G03F 7/32 - Compositions liquides à cet effet, p. ex. développateurs
H01L 21/027 - Fabrication de masques sur des corps semi-conducteurs pour traitement photolithographique ultérieur, non prévue dans le groupe ou
H01L 27/12 - Dispositifs consistant en une pluralité de composants semi-conducteurs ou d'autres composants à l'état solide formés dans ou sur un substrat commun comprenant des éléments de circuit passif intégrés avec au moins une barrière de potentiel ou une barrière de surface le substrat étant autre qu'un corps semi-conducteur, p.ex. un corps isolant
12.
DIMMING-TYPE LED LIGHTING APPARATUS HAVING ELECTROLYTIC CAPACITOR-LESS POWER SUPPLY DEVICE
The present invention relates to a dimming-type LED lighting apparatus having an electrolytic capacitor-less power supply device which senses and controls input voltage information of a primary side of a transformer, senses an input current thereof, and operates with reference to input power thereof. Therefore, the apparatus does not require a secondary-side electrolytic capacitor for stabilizing the output voltage and current thereof, and thus can improve the entire lifetime thereof. The LED lighting apparatus, which has an electrolytic capacitor-less power supply device for supplying power to an LED lighting, comprises: a voltage input unit for inputting a commercialized AC voltage; a transformer having a primary side connected to the voltage input unit and a secondary side connected to the LED lighting so as to drive the LED lighting; a power transistor connected between the primary side of the transformer and a ground terminal; a noise filter configured between the transformer and the LED lighting to remove noise included in power input to the LED lighting; a reference voltage generation unit for generating and outputting a commercialized AC voltage input through the voltage input unit, as a reference voltage; and a switching control unit for receiving, as an input, the reference voltage generated by the reference voltage generation unit and driving the power transistor.
The present invention relates to: a high heat resistant and low dielectric polysilsesquioxane resin composition applicable to a liquid crystal display, an OLED, a touch panel, electronic paper, a flexible display and the like; and a light-shielding black resist composition containing the same. More specifically, the present invention relates to a light-shielding black resist composition having high heat resistant and low dielectric characteristics, and comprising: 1) a polysilsesquioxane random copolymer resin composition, which contains a polar heterocyclic structure and can be curable by UV rays; 2) a carbon black dispersion dispersed in the polysilsesquioxane resin and coated therewith; and 3) a photoinitiator. Compared with conventional acrylic or cardo-based black resist, the black resist resin composition of the present invention has excellent heat resistance even in a post high-temperature process of 350°C or higher, has no optical density (O.D.) deterioration, and can satisfy low dielectric properties at the same time.
H01L 51/52 - Dispositifs à l'état solide qui utilisent des matériaux organiques comme partie active, ou qui utilisent comme partie active une combinaison de matériaux organiques et d'autres matériaux; Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de tels dispositifs ou de leurs parties constitutives spécialement adaptés pour l'émission de lumière, p.ex. diodes émettrices de lumière organiques (OLED) ou dispositifs émetteurs de lumière à base de polymères (PLED) - Détails des dispositifs
G06F 3/041 - Numériseurs, p. ex. pour des écrans ou des pavés tactiles, caractérisés par les moyens de transduction
G02F 1/1335 - Association structurelle de cellules avec des dispositifs optiques, p. ex. des polariseurs ou des réflecteurs
14.
Photosensitive resin composition, organic light emitting display device including the same, and method for manufacturing organic light emitting display device
H01L 27/32 - Dispositifs consistant en une pluralité de composants semi-conducteurs ou d'autres composants à l'état solide formés dans ou sur un substrat commun comprenant des composants qui utilisent des matériaux organiques comme partie active, ou qui utilisent comme partie active une combinaison de matériaux organiques et d'autres matériaux avec des composants spécialement adaptés pour l'émission de lumière, p.ex. panneaux d'affichage plats utilisant des diodes émettrices de lumière organiques
C08G 77/16 - Polysiloxanes contenant du silicium lié à des groupes contenant de l'oxygène à des groupes hydroxyle
G03F 7/039 - Composés macromoléculaires photodégradables, p. ex. réserves positives sensibles aux électrons
H01L 51/56 - Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de tels dispositifs ou de leurs parties constitutives
G03F 7/023 - Quinonediazides macromoléculairesAdditifs macromoléculaires, p. ex. liants
C08L 83/14 - Compositions contenant des composés macromoléculaires obtenus par des réactions créant dans la chaîne principale de la macromolécule une liaison contenant uniquement du silicium, avec ou sans soufre, azote, oxygène ou carboneCompositions contenant des dérivés de tels polymères dans lesquels au moins deux atomes de silicium, mais pas la totalité sont liés autrement que par des atomes d'oxygène
H01L 51/50 - Dispositifs à l'état solide qui utilisent des matériaux organiques comme partie active, ou qui utilisent comme partie active une combinaison de matériaux organiques et d'autres matériaux; Procédés ou appareils spécialement adaptés à la fabrication ou au traitement de tels dispositifs ou de leurs parties constitutives spécialement adaptés pour l'émission de lumière, p.ex. diodes émettrices de lumière organiques (OLED) ou dispositifs émetteurs de lumière à base de polymères (PLED)
C08G 77/52 - Composés macromoléculaires obtenus par des réactions créant dans la chaîne principale de la macromolécule une liaison contenant du silicium, avec ou sans soufre, azote, oxygène ou carbone dans lesquels au moins deux atomes de silicium, mais pas la totalité, sont liés autrement que par des atomes d'oxygène par des liaisons au carbone contenant des cycles aromatiques
15.
POLYSILSESQUIOXANE RESIN COMPOSITION FOR FLEXIBLE SUBSTRATE
The present invention relates to a polysilsesquioxane resin composition for a flexible substrate. More specifically, the present invention relates to a polysilsesquioxane resin composition for a flexible substrate, having excellent heat resistance and transparency, the resin composition being usable for a flexible display substrate. More specifically, a transparent thin film can be formed, excellent transmittance is exhibited in the visible range even after curing, heat resistance is excellent, and flexibility and crack resistance can be controlled. Compared to a conventional polyimide-based substrate material, the present invention has excellent insulation characteristics and passivation characteristics, which can be satisfied simultaneously, and is advantageous for productivity since release characteristics are ensured during a delamination process from a glass substrate.
The present invention relates to a highly heat resistant silsesquioxane-based photosensitive resin composition for a liquid crystal display device or an organic EL display device, and a positive resist insulating layer prepared therefrom, and in particular, to a silsesquioxane-based photosensitive resin composition having high heat resistance and a low dielectric property, capable of being used as an insulating layer forming a via hole of the thin film transistor (TFT), and simultaneously, capable of being used as an insulating layer for forming a bank pattern dividing pixels of an organic EL display device.
G03F 7/32 - Compositions liquides à cet effet, p. ex. développateurs
H01L 27/32 - Dispositifs consistant en une pluralité de composants semi-conducteurs ou d'autres composants à l'état solide formés dans ou sur un substrat commun comprenant des composants qui utilisent des matériaux organiques comme partie active, ou qui utilisent comme partie active une combinaison de matériaux organiques et d'autres matériaux avec des composants spécialement adaptés pour l'émission de lumière, p.ex. panneaux d'affichage plats utilisant des diodes émettrices de lumière organiques
G03F 7/038 - Composés macromoléculaires rendus insolubles ou sélectivement mouillables
G02F 1/1333 - Dispositions relatives à la structure
G02F 1/1362 - Cellules à adressage par une matrice active
C08G 77/14 - Polysiloxanes contenant du silicium lié à des groupes contenant de l'oxygène
C08G 77/18 - Polysiloxanes contenant du silicium lié à des groupes contenant de l'oxygène à des groupes alcoxyle ou aryloxyle
17.
PHOTORESIST STRIPPING SOLUTION COMPOSITION FOR LCD MANUFACTURING
The present invention relates to a photoresist stripping solution composition for LCD manufacturing, and to a combined photoresist stripping solution composition capable of being used in all processes for manufacturing a TFT-LCD. More particularly, the present invention relates to a water-based photoresist stripping solution composition that can be applied to all of transition metal, potential metal, and oxide semiconductor wiring. The water-based photoresist stripping solution composition comprises: (a) a potential metal and metal oxide corrosion inhibitor; (b) a transition metal corrosion inhibitor; (c) a primary alkanolamine; (d) a cyclic alcohol; (e) water; (f) an aprotic polar organic solvent; and (g) a protic polar organic solvent, wherein the photoresist stripping solution composition has an excellent ability to remove a photoresist that has been modified after a hard baked process, an implant process, and a dry etch process have been implemented, can be applied simultaneously to an aluminum (potential metal), copper or silver (transition metal), and metal oxide wiring, and can be introduced in organic film and COA processes.
An injection molding apparatus for a worm wheel of the present invention comprises: a boss injection-molding mold for integrally forming a worm wheel hub into which a worm wheel shaft is press-fit and a worm wheel boss, the boss injection-molding mold having a movable side template and a stationary side template; a movable side core on which the worm wheel boss, which is integrally formed with the worm wheel hub by the boss injection-molding mold, is positioned, the movable side core being capable of moving forward and backward; a stationary side core disposed such that the inside thereof faces the movable side core and having a resin injection hole at the outside thereof; a product injection-molding mold disposed inside the movable side core and having a worm gear tooth-form core on the inner peripheral surface thereof, which is configured in the gear tooth form of a worm gear; and an extracting means for extracting a worm wheel product having a worm gear formed by the product injection-molding mold, wherein the extracting means includes: a plurality of extracting pins coupled through the movable side core; an extracting plate to which end portions of the extracting pins are fixedly coupled; and a guide means for guiding the rotation of the worm gear tooth-form core when the worm wheel product is extracted.
B29C 45/40 - Démoulage ou éjection des objets formés
B29C 45/14 - Moulage par injection, c.-à-d. en forçant un volume déterminé de matière à mouler par une buse d'injection dans un moule ferméAppareils à cet effet en incorporant des parties ou des couches préformées, p. ex. moulage par injection autour d'inserts ou sur des objets à recouvrir
F16H 55/22 - Organes dentésVis sans fin pour transmissions à arbres se croisant, en particulier vis sans fin, engrenages à vis sans fin
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YEUNGNAM UNIVERSITY (République de Corée)
Inventeur(s)
Jung, Woosik
Choi, Hosung
Ryu, Kwanghyun
Kim, Wonsik
Kim, Sungkook
Abrégé
The present invention relates to a manufacturing method for an aluminum nitride whisker, and more particularly, to a manufacturing method for an aluminum nitride whisker, the method including: forming a mixture by mixing an aluminum supply source with a carbon supply source; and reduction-nitriding the aluminum supply source to be an aluminum nitride whisker by reacting the mixture under nitriding atmosphere, in which the carbon supply source contains an activator having a predetermined content.
The present invention relates to: a highly heat resistant silsesquioxane-based photosensitive resin composition for a liquid crystal display device or an organic EL display device; and a positive resist insulating layer prepared therefrom and, specifically, to a silsesquioxane-based photosensitive resin composition, having high heat resistance and low dielectric characteristics, capable of being used as an insulating layer forming a via hole of a thin film transistor (TFT) and, simultaneously, capable of being used as an insulating layer for forming a bank pattern dividing pixels of an organic EL display device.
The present invention proposes a method for removing an oxide formed on the surface of a copper film used in the process of manufacturing a circuit for a semiconductor, an organic light-emitting diode, an LED, or a liquid crystal display without causing corrosion on a lower metal film. The composition including corrosive amine may remove a metal oxide depending on the content of additive ranging from 0.01 to 10% regardless of the content of ultrapure water. A polar solvent other than the corrosive amine may efficiently remove an oxide from the surface of the metal when the same contains water and 0.01 to 20% of the additive.
C23C 22/02 - Traitement chimique de surface de matériaux métalliques par réaction de la surface avec un milieu réactif laissant des produits de réaction du matériau de la surface dans le revêtement, p. ex. revêtement par conversion, passivation des métaux au moyen de solutions non aqueuses
C23C 22/63 - Traitement du cuivre ou des alliages à base de cuivre
The present invention proposes a method for removing an oxide formed on the surface of a copper film used in the process of manufacturing a circuit for a semiconductor, an organic light-emitting diode, an LED, or a liquid crystal display without causing corrosion on a lower metal film. The composition comprising corrosive amine may remove a metal oxide depending on the content of additive ranging from 0.01 to 10% regardless of the content of ultrapure water. A polar solvent other than the corrosive amine may efficiently remove an oxide from the surface of metal when same contains water and 0.01 to 20% of the additive.
The present invention relates to a photoresist stripping composition for all process of manufacturing LCD, more specifically to a water-borne united photoresist stripping composition, as a weak basic composite comprising a tertiary alkanolamine, water, and an organic solvent. The composition according to the present invention prevents a corrosion of Al and Cu metal wiring in process of manufacturing LCD, has a good capability of removing photoresist, and is applied to all Al process, Cu process, an organic film process, and COA process.
The present invention relates to an inorganic scattering film having high light extraction performance, and more particularly, to an optical thin film having high light extraction effects caused by forming an inorganic particle film including a void at an interface of a light emitting device or on a transparent substrate, and to a method for manufacturing same. A method for manufacturing a nano-size particle powder according to the present invention may be applied to many types of complex oxide powder composites since the size and shape of composite powders can be controlled, and an inorganic scattering film including the powder has high light extraction effects caused by the inorganic particle scattering film having the void, and can thus be applied to image display devices, lighting elements, solar cells, and the like.
B82B 3/00 - Fabrication ou traitement des nanostructures par manipulation d’atomes ou de molécules, ou d’ensembles limités d’atomes ou de molécules un à un comme des unités individuelles
H01L 31/042 - Modules PV ou matrices de cellules PV individuelles
25.
INORGANIC PARTICLE SCATTERING FILM HAVING A GOOD LIGHT-EXTRACTION PERFORMANCE
The present invention relates to an inorganic particle scattering film which exhibits a good light-extraction effect via a light-scattering effect because of the formation of an inorganic particle layer comprising voids on a light-emitting-element interface or transparent substrate, and which exhibits outstanding flatness and hardness because of the formation of a flattening layer on the inorganic particle layer, and the invention relates to a production method for the inorganic particle scattering film. Because the inorganic particle scattering film according to the present invention has a good light-extraction effect and outstanding flatness and hardness, it can be put to diverse uses in fields such as picture display devices, lighting elements and solar photovoltaic cells.
B82B 3/00 - Fabrication ou traitement des nanostructures par manipulation d’atomes ou de molécules, ou d’ensembles limités d’atomes ou de molécules un à un comme des unités individuelles
H01L 31/042 - Modules PV ou matrices de cellules PV individuelles
B82Y 30/00 - Nanotechnologie pour matériaux ou science des surfaces, p. ex. nanocomposites
26.
VACUUM FORMING APPARATUS AND IMAGE DISPLAY MANUFACTURING FACILITY INCLUDING SAME
The invention relates to a vacuum forming apparatus including a housing, a first valve plate, a second valve plate, a support panel, a first cylinder unit, a second cylinder unit, and a driving unit. The housing includes a first inlet at one side and a second inlet at the other side thereof. The first valve plate is disposed in the housing to open and close the first inlet. The second valve plate is disposed in the housing to open and close the second inlet. The support panel is disposed in the housing. The first cylinder unit is installed on a surface of the support panel to horizontally move the first valve plate. The second cylinder unit is installed on the other surface of the support panel to horizontally move the second valve plate. The driving unit is connected to the support panel to vertically move the first and second valve plates. The valve plate is hydraulically or pneumatically operated by the cylinder unit.
G02F 1/13 - Dispositifs ou dispositions pour la commande de l'intensité, de la couleur, de la phase, de la polarisation ou de la direction de la lumière arrivant d'une source lumineuse indépendante, p. ex. commutation, ouverture de porte ou modulationOptique non linéaire pour la commande de l'intensité, de la phase, de la polarisation ou de la couleur basés sur des cristaux liquides, p. ex. cellules d'affichage individuelles à cristaux liquides
27.
A PHOTORESIST STRIPPING COMPOSITION FOR MANUFACTURING LCD
The present invention relates to a photoresist stripping composition for all process of manufacturing LCD, more specifically to a water-borne united photoresist stripping composition, as a weak basic composite comprising a tertiary alkanolamine, water, and an organic solvent. The composition according to the present invention prevents a corrosion of Al and Cu metal wiring in process of manufacturing LCD, has a good capability of removing photoresist, and is applied to all Al process, Cu process, an organic film process, and COA process.
Provided is a composition for removing polymer residue of a photosensitive etching-resistant layer. The composition includes 0.1 to 80% by weight of a corrosion inhibitor shown in Formula 1; 10 to 80% by weight of a pH control agent of which hydrogen ion concentration is in a weak basic range; 0.1 to 2% by weight of ammonium fluoride; and the remaining percentage by weight of water. The composition for removing the polymer residue can effectively remove insoluble residue generated during a semiconductor fabrication process without inflicting damage on an underlying layer and contains environment-friendly components.
brevets
