2009
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Invention
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Method of depositing an amorphus aluminium oxynitride layer by reactive sputtering of an aluminiu... |
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Invention
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Method and apparatus for treating a semi-conductor substrate.
This invention relates to a method... |
2007
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Invention
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Ion source including separate support systems for accelerator grids. a) and the fourth grid is gr... |
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Invention
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Ion sources. This invention relates to an Ion gun (10) which comprises of plasma generator (11) d... |
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Invention
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Microfluidic devices. This invention relates to microfluidic devices including a manifold arrange... |
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Invention
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Plasma sources. This invention relates to a plasma source in the form of plasma generator (13) wh... |
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Invention
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Ion deposition apparatus having rotatable carousel for supporting a plurality of targets. This in... |
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Invention
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Ion deposition apparatus. This invention relates to a broad beam ion deposition apparatus (100) i... |
2006
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Invention
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Positive displacement pumping chamber.
A substrate processing system as illustrated at (1). A su... |
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Invention
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Positive displacement pumping chamber. A substrate processing system as illustrated at (1). A sub... |
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Invention
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A method of etching a feature in a silicone substrate. This invention relates to a method of etch... |
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Invention
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Method of processing substrates. 2 and at least the active element of elements of the etchant gas. |
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Invention
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A method of processing substrates. This invention relates to a method of processing substrates in... |
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Invention
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Microfluidic structures and how to make them. A microfluidic structure includes a first layer (1)... |
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Invention
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A method of forming a bragg reflector stack. A method of forming a Bragg reflector stack includin... |
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Invention
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Methods and apparatus for processing wafers.
A method of processing wafers or batches of wafers ... |
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Invention
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A method of manufacturing a semiconductor device. This invention relates to a method of manufactu... |
2005
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Invention
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Methods and apparatus for sputtering. A method of sputtering with sputtering apparatus is for dep... |
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Invention
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Substrate processing showerheads.
A sheet (200) adapted for fitting in a substrate processing sh... |
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Invention
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Method of forming amorphous tin by thermal chemical vapor deposition (cvd). 3 on a heated substra... |
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Invention
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Film deposition.
Films are deposited on a substrate using a plasma chamber having a target dispo... |
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Invention
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Methods and apparatus for controlling rotating magnetic fields.
This invention relates to method... |
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Invention
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Rf stand offs. This invention relates to RV stand offs or breaks and in particular, but not exclu... |
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Invention
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Method of processing a workpiece. This invention relates to a method of processing a workpiece in... |
2004
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Invention
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Magnet assemblies. This invention relates to magnetic assemblies and, in particular, to assemblie... |
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Invention
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Method of processing a workpiece.
A method of processing a workpiece in a chamber with a reactiv... |
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Invention
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Method of forming a diffusion barrier. A barrier limits the diffusion of a metal, such as copper,... |
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Invention
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Method of forming a substantially closed void. To form a substantially closed void between two st... |
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Invention
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Trench filling methods. The invention consists in methods or processes for filling high aspect ra... |
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Invention
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Method of etching porous dielectric.
The present invention relates to methods of etching a porou... |
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Invention
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Methods of forming tungsten or tungsten containing films. A method of sputtering a tungsten or tu... |
2003
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Invention
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Showerheads. A showerhead for substrate processing including a gas inlet leading to a gas reservo... |
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Invention
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Pedestal. A pedestal for mounting semiconductor fabrication equipment within a clean room. The pe... |
2002
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Invention
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Forming low k dielectric layers. A low k dielectric layer is formed by depositing an unset dielec... |
2000
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Invention
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Method of filling a recess. The invention relates to a process for filling a multiplicity of rece... |
1998
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Invention
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Apparatus for applying pressure to a coated surface of a workpiece. A chamber includes a door whi... |
1996
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Invention
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Method of processing a workpiece. A workpiece is processed which includes a multiplicity of reces... |
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Invention
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Temperature sensing methods and apparatus. This invention relates to apparatus for sensing, remot... |
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Invention
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Processing system. In order to subject a workpiece, such as a semiconductor wafer, to elevated pr... |
1995
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Invention
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Forming a layer. The invention relates to apparatus for use in a process in which a layer is form... |
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Invention
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Method and apparatus for subjecting a workpiece to elevated pressure. In order to subject a workp... |
1994
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Invention
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Method for filing substrate recesses using elevated temperature and pressure. To fill a hole or t... |