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2025
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Invention
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Dual force lift and ground pins for electrostatic chuck and method for use thereof. The disclosur... |
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Invention
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Improved energy accuracy for an rf linear accelerator ion implantation system. An ion implantatio... |
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Invention
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Energy accuracy for an rf linear accelerator ion implantation system.
An ion implantation system... |
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Invention
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High aspect ratio beam dump or faraday cup with neutron radiation shielding. A neutron shielding ... |
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Invention
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Semiconductor radioactive wafer decay safety and operation system.
A radiation safety apparatus ... |
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Invention
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Granular sputter source target with repeller cup and method for use thereof. The disclosure is ge... |
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Invention
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Substrate including a pre-epitaxial stacking fault expansion-stop layer, devices including the sa... |
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Invention
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Semiconductor electrical insulator with reduced arcing.
The system includes an insulative assemb... |
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Invention
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Dopant delivery system to ion source using induction heating.
An ion source has an arc chamber d... |
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Invention
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Method and apparatus for ion beam directional deposition. A deposition system has an ion depositi... |
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Invention
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Method and apparatus for ion beam directional deposition.
A deposition system has an ion deposit... |
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Invention
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Liner with raised ribs for particle transport reduction.
A liner for an ion implanter includes a... |
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Invention
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Apparatus and method for angle control of radicals, neutral atoms, and molecules.
Apparatuses an... |
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Invention
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Method, system and apparatus for teaching and verifying end station. The disclosure generally rel... |
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Invention
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Variable vent pressure and flow for flushing loadlock chamber. A workpiece processing system has ... |
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Invention
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Variable vent pressure and flow for flushing loadlock chamber.
A workpiece processing system has... |
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Invention
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Low-temperature vaporizer for ion implanter with in-vacuum controlled flow.
An ion source for an... |
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Invention
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Method, system and apparatus for teaching and verifying end station.
The disclosure generally re... |
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Invention
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Ion stripping apparatus and ion implantation system with selectable stripping gas source.
An ion... |
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Invention
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System and method for managing solid phase precursors for an ion implantation system. A filter is... |
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Invention
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Ion implantation system and method of operation.
An ion implantation system includes an ion sour... |
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Invention
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High temperature ion source. An arc chamber for an ion source provides a source of thermal radiat... |
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Invention
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In-situ, pre-implant wafer characterization system and method. An ion implantation system include... |
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Invention
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Automatic beam uniformity correction through generative ai modeling.
In one embodiment, the disc... |
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2024
|
Invention
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In-situ, pre-implant wafer characterization system and method.
An ion implantation system includ... |
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Invention
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Liquid metal alloy feed materials for ion implantation.
Liquid metal alloy precursor composition... |
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|
Invention
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Liquid metal alloy feed materials for ion implantation. Liquid metal alloy precursor compositions... |
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Invention
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System and method for dynamic loadlock pressure control. A workpiece processing system has a proc... |
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Invention
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System and method for managing solid phase precursors for an ion implantation system.
A filter i... |
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Invention
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Wafer alignment, cleanliness, and surface quality verification using laser light scattering.
A s... |
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Invention
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System and method for dynamic loadlock pressure control.
A workpiece processing system has a pro... |
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Invention
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High-efficiency target for an ion source. 233 and may be fabricated using additive manufacturing. |
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Invention
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Multifaceted target for an ion source. A target body includes a plurality of wave-shaped layers s... |
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Invention
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Multifaceted target for an ion source.
A target body includes a plurality of wave-shaped layers ... |
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Invention
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System and method of verifying workpiece alignment. A workpiece processing system and method are ... |
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Invention
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High-efficiency target for an ion source.
A target body can define a central bore along a centra... |
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Invention
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System and method of verifying workpiece alignment.
A workpiece processing system and method are... |
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Invention
|
Electrostatic chuck with controllable temperature, ion implantation system using the same as well... |
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Invention
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Large range heated electrostatic chuck.
A clamping system has a workpiece clamp having a platen ... |
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Invention
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High bandwidth variable dose ion implantation system and method. An ion implantation system 100 i... |
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Invention
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Backside implant for wafer curvature control.
A method for controlling workpiece deformation pre... |
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Invention
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Fixed position filament.
A cathode filament device for an indirectly heated cathode has a first ... |
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Invention
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Deposition monitor for semiconductor manufacturing system. An ion implantation system includes a ... |
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Invention
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High bandwidth variable dose ion implantation system and method.
An ion implantation system incl... |
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Invention
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Apparatus and method for two-dimensional ion beam profiling. cdd. A rotary input apparatus (240) ... |
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Invention
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Apparatus and method for two-dimensional ion beam profiling.
A profiling apparatus has a hollow ... |
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Invention
|
Deposition monitor for semiconductor manufacturing system.
An ion implantation system includes a... |
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Invention
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Actively heated target to generate an ion beam. An arc chamber for an ion source defines a chambe... |
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Invention
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Actively heated target to generate an ion beam.
An arc chamber for an ion source defines a chamb... |
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Invention
|
Twist and tilt verification using diffraction patterns.
A light source directs an incident beam ... |
|
2000
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P/S
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Electrical equipment, in particular thermal processors, photoresist processors, ashers, photostab... |
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P/S
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electrical equipment, namely, thermal processors, photoresist processors, ashers, photostabilizer... |
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P/S
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Semiconductor manufacturing equipment including thermal processing equipment, photresist processi... |
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P/S
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electrical equipment, namely, thermal processors, photoresist processors, ashers, photostablizers... |
