Tosoh SMD, Inc.

États‑Unis d’Amérique

 
Quantité totale PI 51
Rang # Quantité totale PI 26 946
Note d'activité PI 1,7/5.0    9
Rang # Activité PI 101 755
Parent Tosoh Corporation
Classe Nice dominante Métaux communs et minerais; obje...

Brevets

Marques

22 3
0 0
25 1
0
 
Dernier brevet 2024 - Low carbon defect copper-mangane...
Premier brevet 1979 - Article comprising a substrate a...
Dernière marque 2014 - BRITE-SPRAY
Première marque 1997 - THE GLOBAL LEADER IN TARGET TECH...

Industrie (Classification de Nice)

Derniers inventions, produits et services

2024 Invention Low carbon defect copper-manganese sputtering target and method for producing the same. Provided...
2023 Invention Dynamic vacuum seal system for physical vapor deposition sputter applications. Provided is a vacu...
Invention High purity sulfur-doped copper sputtering target assembly and method for producing same. Provid...
2020 Invention Method of making a tantalum sputter target and sputter targets made thereby. Methods for making ...
2018 Invention Ultra-fine grain size tantalum sputtering targets with improved voltage performance and methods t...
Invention Titanium-tantalum powders for additive manufacturing. A method of making an atomized spherical β...
Invention Method of production of uniform metal plates and sputtering targets made thereby. A method of mak...
2017 Invention Magnesium oxide sputtering target and method of making same. A sintered compact magnesium oxide ...
Invention Magnesium oxide sputtering target and method of making same. A sintered compact magnesium oxide t...
Invention Tungsten-boron sputter targets and films made thereby. A Me-B based alloy spherical powder for u...
Invention Tungsten-boron sputter targets and films made thereby. A Me-B based alloy spherical powder for us...
2016 Invention Diffusion-bonded sputter target assembly and method of manufacturing. A method of making a diffu...
Invention Silicon sputtering target with special surface treatment and good particle performance and method...
Invention Method of making a tantalum sputtering target with increased deposition rate. Methods of making ...
Invention Method of making a tantalum sputtering target with increased deposition rate. Methods of making T...
Invention Method of making low resistivity tungsten sputter targets and targets made thereby. Tungsten spu...
Invention Method of making low resistivity tungsten sputter targets and targets made thereby. Tungsten sput...
Invention Soft-magnetic based targets having improved pass through flux. Sputter targets and method of pro...
Invention Method of making a tantalum sputter target and sputter targets made thereby. Methods for making T...
Invention Sputtering target having reverse bowng target geometry. Generally planar sputter targets having ...
Invention Sputtering target having reverse bowing target geometry. Generally planar sputter targets having ...
2015 Invention Radio frequency identification in-metal installation and isolation for sputtering target. A RFID...
Invention Radio frequency identification in-metal installation and isolation for sputtering target. A RFID ...
Invention Boron-doped n-type silicon target. Sputter targets and methods of making same. The targets compr...
Invention Boron doped n-type silicon target. Sputter targets and methods of making same. The targets compri...
2014 Invention Optimized textured surfaces and methods of optimizing. Methods for treating texturized surfaces o...
P/S Metal and metal alloy components adapted for use with a cathodic sputtering coating apparatus, n...
Invention Silicon sputtering target with enhanced surface profile and improved performance and methods of m...
2013 P/S treatment of the surfaces of equipment adapted for use in conjunction with a cathodic sputter coa...
Invention Monolithic aluminum alloy target and method of manufacturing. Aluminum or aluminum alloy sputter ...
Invention Low deflection sputtering target assembly and methods of making same. Described is a design and m...
2012 Invention Systems and methods for a target and backing plate assembly. A target and backing plate assembly...
Invention Sputtering target. A sputtering target made of aluminum and one or more alloying elements includi...
Invention Diffusion-bonded sputter target assembly and method of manufacturing. A method of making a diffus...
Invention Diffusion-bonded sputtering target assembly and method of manufacturing. A method of making a dif...
2011 Invention Sputtering target assembly and method of making same. A method for producing a sputtering target ...
Invention Bimetallic target. A bimetallic rotary target formed of a first metal and a second metal for use ...
Invention Sputtering target with an insulating ring and a gap between the ring and the target. A sputterin...
Invention Method of bonding rotatable ceramic targets to a backing structure. This invention relates to a ...
Invention Sputter target. In one aspect of the invention, a sputter target is provided comprising a backin...
Invention Sputter target. In one aspect of the invention, a sputter target is provided comprising a backing...
2009 Invention Method of making a sputter target and sputter targets made thereby. A method of making sputter ta...
Invention Circular groove pressing mechanism and method for sputtering target manufacturing. A method of ma...
1999 P/S sputter targets adapted for use in conjunction with cathodic sputter coating machines
1997 P/S Sputter targets and associated backing plates, both adapted for use in cathodic sputter coating e...