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2017
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Invention
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Focusing ring and plasma treatment device. Disclosed are a focusing ring (70) and a plasma treatm... |
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2016
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Invention
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Chuck, reaction chamber and semiconductor processing equipment. Provided are a chuck, a reaction ... |
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Invention
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Magnetron element and magnetron sputtering apparatus. Disclosed are a magnetron element (4) and a... |
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Invention
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Compression ring and semiconductor processing equipment. Disclosed are a compression ring and a s... |
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Invention
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Apparatus for implementing impedance matching and power distribution, and semiconductor processin... |
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2015
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Invention
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Reaction chamber and semiconductor processing apparatus. A reaction chamber and semiconductor pro... |
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Invention
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High aspect ratio shallow trench isolation etching method. A high aspect ratio shallow trench iso... |
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Invention
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Atomic layer etching device and atomic layer etching method using same. An atomic layer etching d... |
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2014
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Invention
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Wafer positioning device and method. A wafer positioning device and method, the device being used... |
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Invention
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Magnetron sputtering chamber and magnetron sputtering device. Provided are a magnetron sputtering... |
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Invention
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Mechanical chuck and plasma machining device. Provided are a mechanical chuck and a plasma machin... |
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Invention
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Magnetron and magnetron sputtering device. A magnetron (100) and a magnetron sputtering device, c... |
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Invention
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Cap device and process apparatus. The present invention provides a cap device and a process appar... |
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Invention
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Electrostatic chuck, chamber and fabrication method of electrostatic chuck. An electrostatic chuc... |
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Invention
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Process chamber and semiconductor processing apparatus. Provided in the present invention are a p... |
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Invention
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Method for depositing ito thin film and gan-based led chip. Disclosed is a method for depositing ... |
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Invention
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Pore deposition process on substrate and semiconductor processing device. The present invention p... |
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Invention
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Bearing device and plasma processing apparatus. Provided are a bearing device and plasma processi... |
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Invention
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Support device, reaction chamber and semiconductor processing apparatus. The present invention pr... |
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Invention
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Chamber. A chamber, which is used for semiconductor processing technology and comprises a cavity ... |
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Invention
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Method for patterning substrate. Provided is a method for patterning a substrate, which comprises... |
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Invention
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Reaction chamber and plasma machining device. Provided are a reaction chamber and plasma machinin... |
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Invention
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Upper cover opening mechanism of reaction chamber, and reaction chamber. Provided are a reaction ... |
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Invention
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Semiconductor processing device. A semiconductor processing device, comprising a reaction chamber... |
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Invention
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Reaction cavity and plasma processing apparatus. The present invention relates to a reaction cavi... |
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Invention
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Bottom electrode apparatus and plasma processing device. A bottom electrode apparatus and a plasm... |
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Invention
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Reaction chamber and semi-conductor processing device. A reaction chamber and semi-conductor proc... |
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Invention
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Cassette positioning device and semiconductor processing apparatus. Provided are a cassette posit... |
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Invention
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Etching method for controlling micro-loading effect of depth of shallow trenches. An etching meth... |
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Invention
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Shielding structure for reaction chamber. Provided is a shielding structure for a reaction chambe... |
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Invention
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Plasma etching device and method. A plasma etching device and method. The plasma etching device c... |
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Invention
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Impedance matching method and impedance matching system. An impedance matching method and impedan... |
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Invention
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Substrate etching method. A substrate etching method includes the following steps: step of a roun... |
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Invention
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Precleaning chamber and semiconductor processing device. Provided are a precleaning chamber and a... |
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Invention
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Glass substrate etching method. Provided is a glass substrate etching method, comprising the foll... |
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Invention
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Substrate etching method. The present invention provides a substrate etching method comprising th... |
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2013
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Invention
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Method for ito thin film sputtering process and ito thin film sputtering device. Provided is a IT... |
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Invention
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Ito thin film sputtering process method and ito thin film sputtering device. An ITO thin film spu... |
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Invention
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Heating cavity and semiconductor processing device. The present invention provides a heating cavi... |
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Invention
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Substrate bearing device and plasma processing equipment. Disclosed are a substrate bearing devic... |
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Invention
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Magnetron and magnetron sputtering device using magnetron. A magnetron and a magnetron sputtering... |
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Invention
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Radio frequency power supply system, and method for performing impedance matching by using radio ... |
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Invention
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Reaction chamber and mocvd device. A reaction chamber (100) comprises a tray apparatus (110), a s... |
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Invention
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Pallet and plasma machining apparatus. Disclosed are a pallet (10) and a plasma machining apparat... |
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Invention
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Rotary table positioning device, load transmission system and plasma processing device. A rotary ... |
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Invention
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Substrate etching method. Provided is a substrate etching method, comprising N times of substrate... |
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Invention
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Deep silicon etch method. A deep silicon etch method comprises: a deposition step (S101), generat... |
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Invention
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Manipulator and semiconductor device. Provided are a manipulator and a semiconductor device. The ... |
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Invention
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Plasma device and reaction chamber thereof. A plasma device and a reaction chamber (100) thereof.... |
