|
2020
|
Invention
|
Composition and method for polysilicon cmp. A chemical mechanical polishing composition for polis... |
|
|
Invention
|
Polishing pad employing polyamine and cyclohexanedimethanol curatives. A chemical-mechanical poli... |
|
|
Invention
|
Method to increase barrier film removal rate in bulk tungsten slurry. The invention relates to a ... |
|
|
Invention
|
Chemical mechanical planarization pads via vat-based production. A chemical mechanical polishing ... |
|
|
Invention
|
Chemical mechanical planarization pads with constant groove volume. A chemical mechanical polishi... |
|
|
Invention
|
Chemical-mechanical polishing pad with textured platen adhesive. A chemical-mechanical polishing ... |
|
|
Invention
|
Surface coated abrasive particles for tungsten buff applications. The invention provides a chemic... |
|
|
Invention
|
Additives to improve particle dispersion for cmp slurry. 21010 alkylenediol; and (c) water, where... |
|
2019
|
Invention
|
Dual additive composition for polishing memory hard disks exhibiting edge roll off. The invention... |
|
|
Invention
|
Composition for tungsten cmp. A chemical mechanical polishing composition includes a water based ... |
|
|
Invention
|
Oxidizer free slurry for ruthenium cmp. The invention provides a chemical-mechanical polishing co... |
|
|
Invention
|
Composition and method for cobalt cmp. A chemical mechanical polishing composition for polishing ... |
|
|
Invention
|
Composition and method for metal cmp. A chemical mechanical polishing composition for polishing a... |
|
|
Invention
|
Composition and method for silicon nitride cmp. The invention provides a chemical mechanical poli... |
|
|
Invention
|
Composition and method for copper barrier cmp. A chemical mechanical polishing composition for po... |
|
|
Invention
|
Cmp compositions for sti applications. The invention relates to a chemical-mechanical polishing c... |
|
|
Invention
|
Tungsten bulk polishing method with improved topography. The invention provides a method of chemi... |
|
|
Invention
|
Tungsten buff polishing compositions with improved topography. The invention provides a chemical-... |
|
2018
|
Invention
|
Composition and method for polishing memory hard disks exhibiting reduced surface scratching. The... |
|
|
Invention
|
Surface treated abrasive particles for tungsten buff applications. The invention provides a chemi... |
|
|
Invention
|
Composition for tungsten cmp. A chemical mechanical polishing composition for polishing a substra... |
|
|
Invention
|
Nitride inhibitors for high selectivity of tin-sin cmp applications. The invention provides a che... |
|
|
Invention
|
Chemical-mechanical processing slurry and methods. Described are chemical mechanical processing (... |
|
|
Invention
|
Chemical-mechanical processing slurry and methods for processing a nickel substrate surface. Desc... |
|
|
Invention
|
Self-stopping polishing composition and method for bulk oxide planarization. The invention provid... |
|
2017
|
Invention
|
Composition and method for polishing silicon carbide. The invention provides a chemical mechanica... |
|
|
Invention
|
Composition and method for removing residue from chemical-mechanical planarization substrate. Des... |
|
|
Invention
|
Cmp compositions selective for oxide and nitride with improved dishing and pattern selectivity. T... |
|
|
Invention
|
Alternative oxidizing agents for cobalt cmp. The invention provides a chemical-mechanical polishi... |
|
|
Invention
|
Polishing composition comprising an amine-containing surfactant. The invention provides a chemica... |
|
|
Invention
|
Method of polishing group iii-v materials. Disclosed is a method of chemically-mechanically polis... |
|
|
Invention
|
Polishing composition comprising cationic polymer additive. The invention provides a chemical mec... |
|
|
Invention
|
Method of polishing a low-k substrate. Disclosed is a method of chemically-mechanically polishing... |
|
|
Invention
|
Tungsten processing slurry with catalyst. Described are compositions (e.g., slurries) useful in m... |
|
|
Invention
|
Method of polishing a low-k substrate.
Disclosed is a method of chemically-mechanically polishin... |
|
2016
|
Invention
|
Cmp processing composition comprising alkylamine and cyclodextrin. Described are compositions use... |
|
|
Invention
|
Polishing pad with foundation layer and window attached thereto. Polishing pads having a foundati... |
|
|
Invention
|
Tungsten-processing slurry with cationic surfactant. Described are chemical mechanical polishing ... |
|
|
Invention
|
Tungsten-processing slurry with cationic surfactant and cyclodextrin. Described are chemical-mech... |
|
|
Invention
|
Cobalt inhibitor combination for improved dishing. The invention provides a chemical-mechanical p... |
|
|
Invention
|
Polyurethane cmp pads having a high modulus ratio. A chemical-mechanical polishing pad comprising... |
|
|
Invention
|
Methods and compositions for processing dielectric substrate. Described are materials and methods... |
|
|
Invention
|
Selective nitride slurries with improved stability and improved polishing characteristics. The in... |
|
|
Invention
|
Diamond-based slurries with improved sapphire removal rate and surface roughness.
The invention ... |
|
|
Invention
|
Diamond-based slurries with improved sapphire removal rate and surface roughness. The invention p... |
|
|
Invention
|
Polishing composition containing cationic polymer additive. The invention provides chemical-mecha... |
|
|
Invention
|
Polishing composition containing ceria abrasive. The invention provides a chemical-mechanical pol... |
|
2015
|
Invention
|
Stabilization of tris(2 hydroxyethyl)methylammonium hydroxide against decomposition with dialkyhy... |
