SK Materials Performance Co., Ltd.

République de Corée

 
Quantité totale PI 19
Rang # Quantité totale PI 78 666
Note d'activité PI 0,9/5.0    2
Rang # Activité PI 470 764

Brevets

Marques

18 0
0 0
1 0
0
 
Dernier brevet 2025 - Polymer composition for manufact...
Premier brevet 2000 - Chemically amplified resist comp...

Derniers inventions, produits et services

2024 Invention Polymer composition for manufacturing hard mask and method for manufacturing semiconductor device...
2012 Invention Hydrophilic photoacid generator and resist composition comprising same. Disclosed are a hydrophil...
Invention Additive for resist and resist composition comprising same. A resist additive represented by Form...
Invention Additive for resist and resist composition comprising same. Provided are an additive for resist r...
Invention Organic anti reflective layer composition. Disclosed is an organic antireflective film compositio...
Invention Sulfonium compound, photoacid generator, and resist composition. A sulfonium compound represented...
Invention Copolymer for organic antireflective film, monomer, and composition comprising the copolymer. Dis...
Invention Photoacid generator, method for producing the same, and resist composition comprising the same. A...
2011 Invention Sulfonium compound, photo-acid generator, and method for manufacturing the same. A sulfonium comp...
Invention Polymer, method for producing the same, and resist composition containing the same. Provided is a...
Invention Organic anti-reflective layer composition containing ring-opened phthalic anhydride and method fo...
2009 Invention Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pa...
Invention Photoacid generator containing aromatic ring. An acid generator represented by the following form...
Invention Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist c...
2008 Invention Acid generating agent for chemically amplified resist compositions. An acid generating agent repr...
Invention Acid generating agent for chemically amplified resist compositions. An acid generating agent used...
Invention Copolymer and composition for organic and antireflective layer. The present invention provides an...
Invention Light absorbent and organic antireflection coating composition containing the same. The present i...
2005 Invention Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically ...
2004 Invention Polymer and chemically amplified resist composition containing the same. A chemically amplified r...
2003 Invention Acid generator and thin film composition containing the same. wherein X is alkyl or aryl group an...
2002 Invention Polymer for chemically amplified resist and chemically amplified resist composition containing th...
Invention Acid-labile polymer and resist composition. A chemically amplified resist composition consists of...
2001 Invention Chemically amplified resist composition containing low molecular weight additives. Disclosed is a...
2000 Invention Chemically amplified resist composition containing norbornane type low molecular additive. This i...