IMS Nanofabrication GmbH

Autriche

 
Quantité totale PI 60
Rang # Quantité totale PI 22 692
Note d'activité PI 2,3/5.0    26
Rang # Activité PI 30 567
Classe Nice dominante Machines et machines-outils

Brevets

Marques

54 2
0 0
1 2
1
 
Dernier brevet 2024 - Determination of imaging transfe...
Premier brevet 1999 - Lithographic method for producin...
Dernière marque 2023 - MCMW
Première marque 2019 - IMS NANOFABRICATION WE WRITE THE...

Industrie (Classification de Nice)

Derniers inventions, produits et services

2024 Invention Determination of imaging transfer function of a charged-particle exposure apparatus using isofoca...
Invention Optimizing image distortion in a multi beam charged particle processing apparatus. The invention...
Invention Method for determining focal properties in a target beam field of a multi-beam charged-particle p...
Invention Device and method for calibrating a charged-particle beam. A beam calibration device is presente...
2023 Invention Adjustable magnetic lens having permanent-magnetic and electromagnetic components. A fine-adjust...
P/S Semiconductor manufacturing machines and apparatus; machines and apparatus for the production of ...
P/S Semiconductor manufacturing machines and apparatus and machines and apparatus for producing in r...
Invention Adjustable permanent magnetic lens having thermal control device. A fine-adjustable charged part...
Invention Adjustable permanent magnetic lens having shunting device. A fine-adjustable charged particle le...
Invention Multi-beam pattern definition device. The invention relates to a multi-beam pattern definition d...
P/S semiconductor manufacturing machines and apparatus and Machines and apparatus for producing in re...
2022 Invention Beam pattern device having beam absorber structure. A multi-beam pattern definition device for us...
Invention Electromagnetic lens. A fine-adjustable electromagnetic lens for a charged-particle optical appa...
Invention Pattern data processing for programmable direct-write apparatus. In a writing process in a charge...
2021 Invention Electron beam lithography apparatus, electron beam lithography method, and recording medium. An ...
Invention Electron beam rendering device, electron beam rendering method, and recording medium. [Problem] I...
Invention Charged-particle source. A charged-particle source for generating a charged-particle comprises a ...
Invention Correction of blur variation in a multi-beam writer. In order to compensate for undesired effect...
2020 Invention Adapting the duration of exposure slots in multi-beam writers. (iii) calculating durations for th...
2019 Invention Charged-particle source and method for cleaning a charged-particle source using back-sputtering. ...
P/S Machines and apparatus for the production of semiconductors and semiconductor devices, of electr...
P/S Machines and apparatus for the production of semiconductors and semiconductor devices, of electro...
Invention Non-linear dose- and blur-dependent edge placement correction. A rasterized exposure method imple...
2018 Invention Method for irradiating a target using restricted placement grids. A method for irradiating a targ...
Invention Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing appar...
Invention Advanced dose-level quantization of multibeam-writers. In a charged-particle multi-beam writing m...
2017 Invention Method for compensating pattern placement errors caused by variation of pattern exposure density ...
2016 Invention Multi-beam writing using inclined exposure stripes. To irradiate a target with a beam of energeti...
Invention Bi-directional double-pass multi-beam writing. To irradiate a target with a beam of energetic ele...
Invention Multi-beam writing of pattern areas of relaxed critical dimension. To irradiate a target with a b...
2015 Invention Correction of short-range dislocations in a multi-beam writer. Method for computing an exposure p...
Invention Customizing a particle-beam writer using a convolution kernel. An exposure pattern is computed wh...
Invention Compensation of imaging deviations in a particle-beam writer using a convolution kernel. An expos...
Invention Compensation of dose inhomogeneity using overlapping exposure spots. An exposure pattern is compu...
Invention Multi-beam tool for cutting patterns. In a charged-particle multi-beam processing apparatus for e...
Invention Multi-beam tool for cutting patterns. In a charged-particle multi-beam processing apparatus for ...
Invention Compensation of defective beamlets in a charged-particle multi-beam exposure tool. An exposure pa...
2014 Invention Method for charged-particle multi-beam exposure. To irradiate a target with a beam of energetic r...
Invention Pattern definition device having multiple blanking arrays. A pattern definition (PD) device for u...
Invention High-voltage insulation device for charged-particle optical apparatus. A high-voltage insulation ...
2011 Invention Method for multi-beam exposure on a target. 2), possibly a complementary subset with respect to a...
2010 Invention Pattern definition device with multiple multibeam array. A multi-beam pattern definition device (...
Invention Multi-beam deflector array means with bonded electrodes. The invention relates to a multi-beam de...
Invention Method for maskless particle-beam exposure. For maskless irradiating a target with a beam of ener...
Invention Global point spreading function in multi-beam patterning. In a particle multi-beam structuring ap...
Invention Method for producing a multi-beam deflector array device having electrodes. The disclosure relate...
2009 Invention Method for maskless particle-beam exposure. In a maskless particle multibeam processing apparatus...
Invention Constant current multi-beam patterning. The invention relates to a method for forming a pattern o...
Invention Compensation of dose inhomogeneity and image distortion. An improved aperture arrangement in a de...
2008 Invention Multi-beam source. A multi-beam source for generating a plurality of beamlets of energetic electr...
Invention Pattern definition device having distinct counter-electrode array plate. A multi-beam pattern def...
2007 Invention Particle-beam exposure apparatus with overall-modulation of a patterned beam. In a charged-partic...
2006 Invention Charged-particle exposure apparatus. A particle-beam projection processing apparatus for irradiat...
2005 Invention Pattern lock system for particle-beam exposure apparatus. In a pattern-lock system of particle-be...