Tokyo Electron Limited

Japon


Commandez votre montre hebdomadaire Tokyo Electron Limited
Quantité totale PI 13 207
Quantité totale incluant filiales 13 279 (+ 126 pour les filiales)
Rang # Quantité totale PI 69
Note d'activité PI 4,5/5.0    8 785
Rang # Activité PI 55
Activité incl filiales 4,3/5.0    8 786
Symbole boursier
ISIN JP3571400005
Capitalisation 8668609632540.0  (JPY)
Industrie Semiconductor Equipment & Materials
Secteur Technology
Classe Nice dominante Machines et machines-outils

Brevets

Marques

8 304 94
0 2
4 708 93
6
 
Dernier brevet 2026 - Polishing pad, substrate process...
Premier brevet 1978 - Magnetron sputtering target and ...
Dernière marque 2025 - EPSIRA
Première marque 1989 - TEL

Filiales

6 subsidiaries with IP (126 patents, 0 trademarks)

2 subsidiaries without IP

 S'inscrire grtuitement pour accéder à la liste des filiales

Industrie (Classification de Nice)

Derniers inventions, produits et services

2025 Invention Mask pattern formation method and substrate processing method. A mask pattern formation method i...
Invention Maintenance work support system, control method, and non-transitory computer-readable recording m...
Invention Computer program, information processing method, and information processing device. The present ...
Invention Substrate support assembly and plasma processing device. A substrate support assembly includes a...
Invention Etching method and etching apparatus. An etching method includes a first storage process of supp...
Invention Plasma processing with magnetic ring x point. A plasma etching system that includes a plasma pro...
Invention Silicon carbonitride film-forming method and plasma processing apparatus. A silicon carbonitride...
Invention Apparatus for transporting substrate, system for processing substrate, and method of transporting...
Invention Methods to automatically adjust one or more parameters of a camera system for optimal 3d reconstr...
P/S Semiconductor manufacturing machines and parts therefor; flat panel display manufacturing machine...
P/S Semiconductor manufacturing machines and their component parts and fittings; flat panel display ...
Invention Pattern formation method. A pattern formation method includes: forming a photosensitive hard mas...
Invention Plasma processing method and plasma processing apparatus for using a first plasma generated from ...
Invention Substrate processing method and substrate processing apparatus. A substrate processing method in...
Invention Treatment device and treatment method. Provided are a treatment device and a treatment method whe...
Invention Plasma processing apparatus and reaction tube wall protection member. A plasma processing appara...
Invention Plasma processing apparatus. A plasma processing apparatus includes a processing container, a su...
Invention Plating device and plating treatment method. [Problem] To increase in-plane uniformity of plating...
Invention Processing system, processing method, and transport device. This processing system for processing...
Invention Substrate processing system, substrate processing method, program, and storage medium. This subst...
Invention Polishing pad, substrate processing device, and substrate processing method. This polishing pad p...
Invention Transportation device and connection method. A transportation device for transporting an object t...
Invention Heat medium control device and control method for heat medium. According to the present invention...
Invention Plasma processing apparatus. Provided is a technique that makes it possible to suppress attenuati...
Invention Control valve control method and substrate processing device. Provided are: a control valve contr...
Invention Substrate processing method, substrate processing system, and parameter correction method. In thi...
Invention Film, article, and plasma processing device. abcdd, where: M represents a metal atom; a, b, c, an...
Invention Method for determining optimum thickness measurement position, substrate processing method, and s...
Invention Method for removing titanium oxide film and substrate processing device. The purpose of the prese...
Invention Temperature regulating device and plasma processing device. This temperature regulating device fo...
Invention Substrate support and substrate treatment device. Disclosed is a substrate support comprising: a ...
Invention Substrate treatment method and substrate treatment apparatus. A substrate treatment method inclu...
Invention Film formation method and film formation device. A film formation method according to the present...
Invention Cable connecting method, production method of connecting member, and thermal processing apparatus...
Invention Wafer overlay registration in hybrid bonding. A method of hybrid bonding includes accessing first...
Invention Film-forming method and film-forming apparatus. A film-forming method includes (a) providing a s...
P/S Installation, maintenance and repair of semiconductor manufacturing machines; installation, maint...
P/S Installation, maintenance and repair of semiconductor manufacturing machines; installation, main...
Invention Method for selectively depositing etch stop layer. A method for making a semiconductor device can...
Invention Bonding method with location specific processing. A method of forming a bonded wafer, where the m...
Invention Method and apparatus for damascene etching. A method for etching a wafer includes providing the w...
Invention Substrate processing method and substrate processing apparatus. In one exemplary embodiment of th...
Invention Cleaning method. This cleaning method that is for cleaning the interior of a transport device for...
Invention Wafer overlay registration in hybrid bonding. A method of hybrid bonding includes accessing firs...
2024 P/S Semiconductor manufacturing machines and their component parts and fittings
P/S Semiconductor manufacturing machines and their component parts and fittings; flat panel display m...
P/S Semiconductor manufacturing machines used for coating and deposition processes, and their compone...
Invention Bonding method with location specific processing. A method of forming a bonded wafer, where the ...
Invention Selective etching of top electrode metal to phase-change material by tuning wafer temperature. P...
Invention Method and apparatus for damascene etching. A method for etching a wafer includes providing the ...
Invention Method for patterning mask layer over substrate. A method includes forming a first mask over a s...
P/S Downloadable computer software for controlling semiconductor manufacturing processes; downloadabl...
P/S Downloadable computer software for controlling semiconductor manufacturing processes; downloadab...
2023 Invention Substrate treatment device and film thickness estimation method. A substrate processing apparatu...
Invention Substrate processing method, substrate processing device, and storage medium. A substrate proces...
P/S Machines and instruments used for measuring and testing semiconductor manufacturing machines, nam...
P/S Machines and instruments used for measuring and testing semiconductor manufacturing machines; co...
Invention Processor for controlling pipeline processing based on jump instruction, and program storage medi...
2022 P/S Semiconductor manufacturing machines and their component parts and fittings.
2021 P/S Semiconductor manufacturing machines and their component parts and fittings; machines for mainten...
P/S Semiconductor manufacturing machines and their component parts and fittings; machines for mainte...