|
2025
|
Invention
|
Semiconductor exfoliation method.
A method of forming two semiconductor wafers from a single reu... |
|
|
Invention
|
Semiconductor exfoliation method.
A semiconductor die having one or more devices such as Schottk... |
|
|
Invention
|
Semiconductor exfoliation method.
A semiconductor substrate comprising a first epitaxial silicon... |
|
|
Invention
|
Wide band gap semiconductor process, device, and method.
An epitaxial silicon carbide substrate ... |
|
2024
|
Invention
|
Hemt (high electron mobility transistor) and method therefor.
A heterogeneous epitaxial structur... |
|
|
Invention
|
Integrated method for low-cost wide band gap semiconductor device manufacturing.
A merge layer o... |
|
|
Invention
|
Integrated method for low-cost wide band gap semiconductor device manufacturing.
A reusable sili... |
|
|
Invention
|
Insulated gate bipolar transistor having improved electrical performance.
Two or more IGBTs (ins... |
|
2023
|
Invention
|
Hetero epitaxial structure and method therefor. A heterogeneous epitaxial structure formed on a S... |
|
|
Invention
|
Integrated method for low-cost wide band gap semiconductor device manufacturing. A method for man... |
|
|
Invention
|
Silicon carbide epitaxy.
A process for creating low defectivity epitaxial layers on a SiC substr... |
|
|
Invention
|
Silicon carbide epitaxy.
A semiconductor substrate comprising a first epitaxial silicon carbide ... |
|
|
Invention
|
Batch mode silicon carbide epitaxial reactor. A batch mode SiC (Silicon Carbide) epitaxial reacto... |
|
|
Invention
|
Cleaning wide bandgap epitaxial susceptors and method therefor. A susceptor configured to hold on... |
|
2022
|
Invention
|
Trench field effect transistor having improved electrical performance. A trench field effect tran... |
|
|
Invention
|
Carbon assisted semiconductor dicing and method. A semiconductor substrate is configured for dici... |
|
|
Invention
|
Wide band gap semiconductor process, device, and method. A semiconductor substrate comprising a f... |
|
|
Invention
|
Semiconductor exfoliation method. A semiconductor substrate comprising a first epitaxial silicon ... |